CN114308842B - Automatic cleaning tank for semiconductor wafer tank type cleaning machine - Google Patents
Automatic cleaning tank for semiconductor wafer tank type cleaning machine Download PDFInfo
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- CN114308842B CN114308842B CN202210243895.6A CN202210243895A CN114308842B CN 114308842 B CN114308842 B CN 114308842B CN 202210243895 A CN202210243895 A CN 202210243895A CN 114308842 B CN114308842 B CN 114308842B
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- 238000004140 cleaning Methods 0.000 title claims abstract description 185
- 239000004065 semiconductor Substances 0.000 title claims abstract description 25
- 235000012431 wafers Nutrition 0.000 claims abstract description 97
- 238000005406 washing Methods 0.000 claims abstract description 78
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 76
- 238000001914 filtration Methods 0.000 claims abstract description 42
- 238000011010 flushing procedure Methods 0.000 claims abstract description 14
- 239000007788 liquid Substances 0.000 claims description 77
- 238000003756 stirring Methods 0.000 claims description 67
- 239000007921 spray Substances 0.000 claims description 23
- 210000005056 cell body Anatomy 0.000 claims description 19
- 238000010438 heat treatment Methods 0.000 claims description 14
- 230000001360 synchronised effect Effects 0.000 claims description 6
- 238000007599 discharging Methods 0.000 claims description 3
- 238000009826 distribution Methods 0.000 claims description 3
- 230000008878 coupling Effects 0.000 claims description 2
- 238000010168 coupling process Methods 0.000 claims description 2
- 238000005859 coupling reaction Methods 0.000 claims description 2
- 238000009434 installation Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 3
- 239000012535 impurity Substances 0.000 description 14
- 238000007789 sealing Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 5
- 230000009286 beneficial effect Effects 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000004134 energy conservation Methods 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
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Abstract
The invention belongs to the technical field of wafers, and particularly relates to an automatic cleaning tank for a semiconductor wafer tank type cleaning machine, which comprises a rack, a tank cover, a cleaning tank body, a supporting device, a filtering device and a flushing device, wherein the tank cover, the cleaning tank body, the supporting device, the filtering device and the flushing device are arranged on the rack; the two tank covers are hinged to two sides of the top of the rack, and the cleaning tank body is fixedly mounted on the inner wall of the rack. This automatic cleaning tank for semiconductor wafer slot type cleaning machine, through setting up strutting arrangement and washing unit, can play the supporting role to the wafer, can drive the wafer rotation simultaneously in the cleaning process, carry out the omnidirectional to the wafer and wash, utilize the space of basket of flowers lateral wall, stretch into the gyro wheel, hold up the wafer, realize the rotation again, and simultaneously, set the orifice of partly rotatory nozzle to eccentric, it rotates to recycle its of suction pump driven water pressure drive, solve its washing dead angle problem, the current technical problem that has certain washing dead angle to the washing of wafer cleaning equipment to the wafer has been solved.
Description
Technical Field
The invention relates to the technical field of wafers, in particular to an automatic cleaning tank for a semiconductor wafer tank type cleaning machine.
Background
The wafer is a silicon wafer used for manufacturing a silicon semiconductor integrated circuit, and is called a wafer because the shape is circular, and various circuit element structures can be manufactured on the silicon wafer to form an IC product with specific electrical functions.
The existing wafer needs to be cleaned during production, and the rectangular cleaning tank in the existing cleaning equipment has large volume and is not beneficial to the backflow temperature control of chemical cleaning liquid; when the wafer is cleaned, the flower basket is directly placed in the cleaning tank, and then the cleaning liquid is sprayed upwards from the bottom for cleaning, the cleaning can only realize the cleaning in the vertical direction, a certain cleaning dead angle problem exists, and chemical reagents in the chemical cleaning are easy to volatilize at high temperature, even if a door-type cover is arranged, the speed and the occupied space area are too large, the arrangement of adjacent cleaning tanks is not facilitated, and the length of a production line is easy to increase; and driving sources are respectively arranged among the mechanical structures, so that the whole linkage and energy conservation are not facilitated.
Disclosure of Invention
Based on the technical problems that the conventional rectangular cleaning tank for the wafer cleaning equipment is large in size, is not beneficial to backflow temperature control of chemical cleaning liquid, has certain cleaning dead angles, is not thorough in cleaning, and is not beneficial to integral linkage and energy conservation, the invention provides the automatic cleaning tank for the semiconductor wafer tank type cleaning machine.
The invention provides an automatic cleaning tank for a semiconductor wafer tank type cleaning machine, which comprises a rack, a tank cover, a cleaning tank body, a supporting device, a filtering device and a flushing device, wherein the tank cover, the cleaning tank body, the supporting device, the filtering device and the flushing device are arranged on the rack;
the two tank covers are hinged to two sides of the top of the rack, and the cleaning tank body is fixedly arranged on the inner wall of the rack;
the supporting device comprises a flower basket for containing wafers and a roller, the supporting device is positioned inside the cleaning tank body, and the roller supports the wafers in the flower basket and drives the wafers to rotate circumferentially;
the filtering device is arranged on the lower surface of the cleaning tank body, filters cleaning liquid in the cleaning tank body and then guides the cleaning liquid into the washing device, the filtering device comprises an upper pipeline, a lower pipeline, a flow control valve for controlling the flow of the lower pipeline, a filtering mechanism and a collecting mechanism, and the cleaning liquid flows to the filtering mechanism from the upper pipeline and the lower pipeline after cleaning the wafer and is filtered;
the washing device is positioned below the washing tank body and comprises a stirring mechanism and a washing mechanism, the stirring mechanism heats and stirs the washing liquid filtered by the filtering device, and the washing mechanism sucks the washing liquid in the stirring mechanism to wash the wafers in the washing tank body;
the washing mechanism comprises a water suction pump and a rotary nozzle, and the water suction pump pumps the cleaning liquid stirred by heating and then upwards sprays the cleaning liquid in the rotary nozzle to wash the wafer.
Preferably, the flower basket is placed when wasing the interior diapire of cell body, the wafer quilt the gyro wheel upwards rolls the back of propping, breaks away from the flower basket, the cross-section of wasing the cell body is down trapezoidal form, the interior diapire both sides fixed mounting who washs the cell body has the bracing that is the rectangular array and distributes, and is a plurality of a gyro wheel homogeneous correspondence is installed in a plurality of the one end of bracing is a plurality of the gyro wheel distributes with the axle center, and is a plurality of the equal fixedly connected with drive shaft in axle center department of gyro wheel, the one end of drive shaft runs through and extends to the outside of frame.
Through the technical scheme, adopt the cross-section for falling trapezoidal washing tank, equal length and width's washing tank, the volume reduces, and its inboard area increases, the junction that the one end of drive shaft runs through the frame is provided with the sealing washer, seals drive shaft and frame junction, prevents that the internal washing liquid of washing tank from revealing, pegs graft in the basket of flowers through the abluent wafer of will needing fix the back, and the basket of flowers places the internal corresponding position of washing tank for the both sides and the corresponding gyro wheel contact of wafer, thereby the rotation of gyro wheel can drive the wafer and rotate and realize carrying out the omnidirectional washing to the wafer, washs more fully.
Preferably, the top end of the upper pipeline penetrates through and extends to the inner walls of the two sides of the cleaning groove body, the top end of the lower pipeline penetrates through and extends to the inner bottom wall of the cleaning groove body, and the flow control valve is fixedly installed on the lower pipeline to control the flow of the cleaning liquid.
Through above-mentioned technical scheme, circulate the water of washing tank body upper portion through the upper tube way, the lower pipeline circulates the water that washs tank body lower part, has guaranteed that the internal water of washing tank carries out abundant circulation, has guaranteed the clean of the internal washing liquid of washing tank, controls the circulation velocity of flow of pipeline down through flow control valve, prevents to cause the pipeline velocity of flow too fast down, and the upper tube way can't circulate, and the interior endless water of lower pipeline gets into down the pipeline gathering.
Preferably, the filtering mechanism includes an outer barrel, the outer surface of the outer barrel is fixedly mounted on the lower surface of the cleaning tank body through a support frame, a rotating shaft is mounted at one end of the outer barrel through a bearing, one end of the rotating shaft penetrates through and extends to the outside of one end of the outer barrel, a filtering cover which has a taper and is provided with a filtering hole is fixedly sleeved on the surface of the rotating shaft in the outer barrel, a water outlet rotary drum which is located inside the filtering cover is fixedly mounted at one end of the rotating shaft, one end of the upper pipeline penetrates through the outer barrel and extends to one end of the water outlet rotary drum which is close to the rotating shaft, then one end of the upper pipeline is rotatably connected with the outer surface of the water outlet rotary drum through a rotary joint, and the outer surface of the outer barrel which is close to one end of the rotating shaft is fixedly communicated with a water outlet pipeline.
Through the technical scheme, after the circulating water is conveyed to enter the water outlet rotary drum through the upper pipeline, the water outlet hole is formed in the outer surface of the water outlet rotary drum, when the water outlet rotary drum rotates, water can be thrown away, the water is filtered through the filter cover, the filtered water enters the outer drum, the water flows out through the water outlet pipeline, the filter cover can filter the circulating water, the diameter of the filter cover is gradually reduced, the water can be conveniently and quickly filtered after being thrown away, the water cannot flow backwards, unfiltered water is caused to enter the outer drum, the filter cover is sealed by the sealing ring arranged at the position connected with the rotation of the inner wall of the outer drum, and the rotating shaft and the connecting part penetrated by the outer drum are provided with the sealing ring.
Preferably, a spiral cover movably arranged inside the filter cover is fixedly installed on the outer surface of the water outlet rotary drum, the spiral cover is composed of a cover body and a spiral piece, and one end of the spiral piece extends and is fixedly installed on the outer surface of the water outlet rotary drum.
Through above-mentioned technical scheme, carry the impurity that flows down to the filter mantle filtration through the flight to the other end, impurity can get into the other end of urceolus and collect.
Preferably, the collecting mechanism comprises a discharge pipe, the discharge pipe is fixedly communicated with the outer surface of the outer barrel, a sliding table is fixedly mounted on the inner wall of the outer barrel, and the inner wall of the sliding table is in an inverted cone shape.
Through above-mentioned technical scheme, prevent through the slip table that the impurity that the spiral shell sent out from piling up in the one end of urceolus, the one end of discharging pipe can set up the collection bag and collect discharged impurity.
Preferably, rabbling mechanism includes the agitator tank, agitator tank fixed mounting be in the interior diapire of frame, outlet conduit' S one end with the external fixed surface intercommunication of agitator tank, the inner wall of agitator tank rotates and is connected with the stirring rake, the one end of stirring rake runs through and extends to the lateral surface of frame, the stirring leaf cross section of stirring rake surface annular distribution personally submits the S-shaped.
Through above-mentioned technical scheme, stir the washing liquid in the agitator tank through the stirring rake, the shape of the stirring leaf of stirring rake makes the washing liquid stirring according to even, heats the washing liquid according to abundant.
Preferably, the outer surface of agitator tank has cup jointed electromagnetic heater, the outer fixed surface of agitator tank installs temperature sensor, temperature sensor control electromagnetic heater opens and stops, the outer fixed surface of agitator tank communicates the washing liquid that communicates with washing liquid head tank and adds the valve.
Through above-mentioned technical scheme, temperature sensor detects the temperature of the washing liquid in the agitator tank, control electromagnetic heater's temperature.
Preferably, the surface of suction pump pass through the support frame with wash the lower fixed surface installation of cell body, the end of intaking of suction pump pass through the connecting pipe with the external fixed surface intercommunication of agitator tank, the play water end fixed mounting of suction pump has the spray tube, the top of spray tube with wash the fixed intercommunication of inner bottom wall of cell body, the top of spray tube with rotatory nozzle fixed mounting, the orifice of rotatory nozzle is the slope shape, and inclination is 10-45 degrees.
Through the technical scheme, the heated cleaning liquid is conveyed into the spray pipe through the water suction pump, the cleaning liquid is sprayed out through the rotary spray head, the rotary spray head rotates under the pressure of water pressure, the spray holes are arranged in an inclined shape, the sprayed water columns can be inclined, and the cleaning at dead angles of the outer surface of the wafer is facilitated.
Preferably, the lateral surface fixed mounting of frame has the drive shell, the inside wall fixed mounting of drive shell has driving motor, driving motor's output shaft one end passes through shaft coupling fixed mounting with the one end of stirring rake, driving motor passes through the cooperation drive of hold-in range and synchronizing wheel the drive shaft with the axis of rotation synchronous rotation, the equal fixed mounting in surface both sides of wasing the cell body has the heating piece, the lower fixed surface who washs the cell body installs the supersonic generator who is rectangular array and distributes.
Through above-mentioned technical scheme, rotate through a driving source drive three mechanism, save space and cost, heat the internal washing liquid of washing tank through the heating piece, keep invariable temperature, carry out abundant washing to the internal wafer surface of washing tank through the tiny bubble that supersonic generator produced.
The beneficial effects of the invention are as follows:
1. through setting up strutting arrangement and washing unit, can play the supporting role to the wafer, can drive the wafer rotation simultaneously in the cleaning process, carry out the omnidirectional to the wafer and wash, utilize the space of basket of flowers lateral wall, stretch into the gyro wheel, hold up the wafer, realize the rotation again, and simultaneously, set the orifice of partly rotatory nozzle to eccentric, it rotates to recycle suction pump driven water pressure drive, solve its washing dead angle problem, the current technical problem who has certain washing dead angle to the washing of wafer cleaning equipment to the wafer has been solved.
2. Through setting up filter equipment and washing cell body, adopt the cross-section for falling trapezoidal washing tank, equal length and width's washing tank, the volume reduces, its inside area increases, utilize its surface to increase some heating blocks and can heat the internal washing liquid of washing tank, establish in the below will filtering, the volume that has reduced to occupy, filter equipment can filter the back reuse to endless washing liquid, it is bulky to wafer cleaning equipment rectangle washing tank to have solved current, be unfavorable for the technical problem of the backward flow temperature control of chemical cleaning liquid.
3. Through setting up washing unit, can heat the washing liquid after filtering once more, keep the temperature of its use, can carry out abundant stirring to the liquid in the agitator tank through the stirring leaf that is the shape of falling S, guarantee that the washing liquid heating temperature in the agitator tank is even, be convenient for carry out recycling.
Drawings
FIG. 1 is a schematic view of an automatic cleaning tank for a semiconductor wafer tank cleaning machine according to the present invention;
FIG. 2 is a perspective view of a tank cover structure of an automatic cleaning tank for a semiconductor wafer tank cleaning machine according to the present invention;
FIG. 3 is a perspective view of a basket structure of an automatic cleaning tank for a semiconductor wafer tank cleaning machine according to the present invention;
FIG. 4 is a perspective view of a driving motor structure of an automatic cleaning tank for a semiconductor wafer tank cleaning machine according to the present invention;
FIG. 5 is a perspective view of a cleaning tank structure of an automatic cleaning tank for a semiconductor wafer tank cleaning machine according to the present invention;
FIG. 6 is a perspective view of a heating block structure of an automatic cleaning tank for a semiconductor wafer tank cleaning machine according to the present invention;
FIG. 7 is a perspective view of the outer barrel structure of an automatic cleaning tank for a semiconductor wafer tank cleaning machine according to the present invention;
FIG. 8 is a perspective view of a filter housing structure of an automatic cleaning tank for a semiconductor wafer tank cleaning machine according to the present invention;
FIG. 9 is a perspective view of a spiral cover structure of an automatic cleaning tank for a semiconductor wafer tank cleaning machine according to the present invention;
FIG. 10 is a perspective view of a rotary shaft structure of an automatic cleaning tank for a semiconductor wafer tank cleaning machine according to the present invention;
FIG. 11 is a perspective view of an electromagnetic heater structure of an automatic cleaning tank for a semiconductor wafer tank cleaning machine according to the present invention;
FIG. 12 is a perspective view of a paddle structure of an automatic cleaning tank for a semiconductor wafer tank cleaning machine according to the present invention;
FIG. 13 is a perspective view of a water pump structure of an automatic cleaning tank for a semiconductor wafer tank cleaning machine according to the present invention;
FIG. 14 is a perspective view of a rotary nozzle structure of an automatic cleaning tank for a semiconductor wafer tank cleaning machine according to the present invention;
FIG. 15 is a perspective view of a roller supported wafer of an automatic cleaning tank for a semiconductor wafer tank cleaning machine according to the present invention.
In the figure: 1. a frame; 11. a slot cover; 12. cleaning the tank body; 2. a flower basket; 21. bracing; 22. a roller; 23. a drive shaft; 3. an upper pipeline; 31. a lower pipeline; 32. a flow control valve; 4. an outer cylinder; 41. a rotating shaft; 42. a filter housing; 43. a water outlet rotary drum; 44. a water outlet pipeline; 45. a spiral cover; 5. a discharge pipe; 51. a sliding table; 6. a stirring tank; 61. a stirring paddle; 62. an electromagnetic heater; 63. a temperature sensor; 64. a cleaning fluid addition valve; 7. a water pump; 71. a nozzle; 72. rotating the spray head; 8. a drive housing; 81. a drive motor; 82. a heating block; 83. an ultrasonic generator.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments.
Referring to fig. 1-15, an automatic cleaning tank for a semiconductor wafer tank type cleaning machine comprises a frame 1, a tank cover 11, a cleaning tank body 12, a supporting device, a filtering device and a flushing device, wherein the tank cover 11, the cleaning tank body 12, the supporting device, the filtering device and the flushing device are mounted on the frame 1;
as shown in fig. 1-2, two tank covers 11 are hinged to two sides of the top of the frame 1, and a micro motor for driving the hinged tank covers 11 to open and close is arranged in the axial direction of the tank covers, so that the control in a dustless workshop is facilitated, and since a cleaning solution, especially a chemical cleaning solution, needs to be heated to clean a wafer, but the heated cleaning solution is easy to volatilize, the tank covers 11 need to be sealed when cleaning the tank body 12, so that the volatilization speed of the cleaning solution is reduced as much as possible.
The cleaning tank body 12 is fixedly arranged on the inner wall of the frame 1, the cleaning tank body 12 adopts a cleaning tank with an inverted trapezoid cross section, the volume of the cleaning liquid can be reduced as much as possible, and the heating temperature of the cleaning liquid can be conveniently controlled.
As shown in fig. 3-7 and fig. 15, in order to dynamically and uniformly clean the wafer in the flower basket 2, the supporting device includes the flower basket 2 for holding the wafer and a roller 22, the supporting device is located inside the cleaning tank 12, the roller 22 supports the wafer in the flower basket 2 and then drives the wafer to rotate circumferentially, the existing wafer is fixed when the flower basket 2 is cleaned, and the existing cleaning mode is that the wafer gushes upwards from the bottom, and cleaning is implemented after being matched with ultrasonic waves, so that the surface of the wafer close to the bottom of the cleaning tank is better cleaned, and the cleaning effect of the wafer at the top of the cleaning tank is different from that of the wafer at the bottom.
Specifically, the flower basket 2 is placed on the inner bottom wall of the cleaning tank body 12 in the supporting device, in order to not obstruct cleaning, a rectangular supporting frame matched with the shape of the four-side frame of the flower basket is connected to the inner bottom wall of the cleaning tank body 12, the rectangular supporting frame is located at the bottom of the roller 22, at the moment, after the wafer is upwards rolled and supported by the roller 22, the wafer is separated from the flower basket 2, then the outer surface of the roller 22 is in contact with the outer surface of the wafer, the wafer is slightly upwards supported a little, so that the main supporting point of the wafer is transferred to the roller 22, after the roller 22 is stressed, the roller 22 rotates, and the wafer can also rotate along with the roller.
In order to conveniently and simultaneously hold up all wafers, inclined struts 21 distributed in a rectangular array mode are fixedly installed on two sides of the inner bottom wall of the cleaning tank body 12, the inclined struts 21 and the bottoms of the flower baskets 2 are distributed in an equidistant crossing mode, the inclined struts 21 can be used for supporting the wafers and cannot obstruct the placement of the flower baskets, a plurality of rollers 22 are uniformly and correspondingly installed at one ends of the inclined struts 21, the rollers 22 are distributed coaxially, driving shafts 23 are fixedly connected to the axial centers of the rollers 22, one ends of the driving shafts 23 penetrate through and extend to the outside of the rack 1, the rollers 22 in the same row are connected in series through the same driving shaft 23, the rotation speed and the rotation speed of the rollers 22 are conveniently controlled integrally, the diameter of the rollers 22 is smaller than that of the wafers, the rotation speed is reduced, and the cleaning effect of cleaning liquid is prevented from being influenced by the fact that the rotation speed of the wafers is too high.
As shown in fig. 7-10, in order to filter impurities in the recycling process of the cleaning solution without affecting the normal operation of the whole machine, a filtering device for dynamically filtering the cleaning solution is disposed on the lower surface of the cleaning tank 12, and the cleaning solution in the cleaning tank 12 is filtered by the filtering device and then guided to the flushing device.
Specifically, filter equipment is including being used for backward flow to wash the washing liquid upper pipe way 3 that cell body 12 top concentration is less than the normal value, be used for backward flow to wash the lower pipeline 31 that cell body 12 bottom has impurity washing liquid, the flow control valve 32 of control lower pipeline 31 flow, filtering mechanism and collection mechanism, after the washing liquid washs the wafer, the washing liquid at top is quick from upper pipe way 3 backward flows, the washing liquid of bottom takes impurity from lower pipeline 31 backward flow with controllable speed simultaneously, the washing liquid stream of backward flow filters to filtering mechanism, washing liquid water conservancy diversion after the filtration is to washing unit in, and the impurity that filters is then collected the mechanism and is collected unified the processing.
Further, in order to facilitate the control of the flow rate of the lower pipeline 31, the top end of the upper pipeline 3 penetrates and extends to the inner walls of the two sides of the cleaning tank body 12, the top end of the lower pipeline 31 penetrates and extends to the inner bottom wall of the cleaning tank body 12, the flow control valve 32 is fixedly installed on the lower pipeline 31 to control the flow rate of the cleaning solution, the two flow control valves 32 are respectively and fixedly installed at one ends of the two lower pipelines 31, and in order to collect the circulating water of the lower pipeline 31 and the upper pipeline 3, the water outlet ends of the two flow control valves 32 are respectively and fixedly communicated with the outer surfaces of the two lower pipelines 31;
further, in order to realize dynamic filtration of the returned cleaning liquid, a filtering mechanism is arranged on the lower surface of the cleaning tank body 12 and comprises an outer cylinder 4, the outer surface of the outer cylinder 4 is fixedly installed on the lower surface of the cleaning tank body 12 through a support frame, a rotating shaft 41 is installed at one end of the outer cylinder 4 through a bearing, a sealing ring is required to be added at the position of the bearing according to specific actual requirements, and the problems that the cleaning liquid is polluted due to leakage and contact between the bearing and the cleaning liquid are solved.
In order to filter the water in the cleaning tank body 12 and facilitate circulation, the outer cylinder 4 is fixedly installed on the lower surface of the cleaning tank body 12 through a support frame, in order to automatically perform filtering work, a rotating shaft 41 is rotatably connected to the outer side surface of the outer cylinder 4, in order to filter the water conveyed by the upper pipeline 3, a filter cover 42 is fixedly installed after one end of the rotating shaft 41 penetrates through the inner wall of the outer cylinder 4, then the outer surface of one end of the filter cover 42 is rotatably connected with the inner wall of the outer cylinder 4, a sealing ring is arranged at the joint of the filter cover 42 and the outer cylinder 4 for sealing work, the cross section of the filter cover 42 is in a trapezoidal shape to prevent the water from flowing to one end of the lower pipeline 31, in order to throw the water out of the lower pipeline 31, a water outlet rotary cylinder 43 is fixedly installed at one end of the rotating shaft 41, the water outlet rotary cylinder 43 is positioned in the filter cover 42, in order to convey the water into the water outlet rotary cylinder 43, one end of the upper pipeline 3 is fixedly communicated with the inner wall of the outer cylinder 4 and then extends to the interior, then one end of the upper pipeline 3 is rotationally connected with the outer surface of the water outlet rotary drum 43 through a rotary joint, and in order to output the filtered water, a water outlet pipeline 44 is fixedly communicated with the outer surface of the outer drum 4;
further, in order to output the filtered impurities into the outer cylinder 4, a spiral cover 45 is fixedly installed on the outer surface of the water outlet rotary cylinder 43, the spiral cover 45 is composed of a cover body and a spiral piece, then the outer surface of the spiral cover 45 is rotatably connected with the inner wall of the filter cover 42, the outer surface of the spiral piece is in contact with the inner wall of the filter cover 42, and the spiral cover 45 is positioned inside the filter cover 42.
And a collecting mechanism which is installed on the outer surface of the outer cylinder 4, is fixedly communicated with the discharge pipe 5 on the outer surface of the outer cylinder 4 for collecting impurities, is fixedly provided with a sliding table 51 on the inner wall of the outer cylinder 4 for preventing impurities from accumulating in the outer cylinder 4, and the inner wall of the sliding table 51 is in an inverted cone shape.
As shown in fig. 11-14, the flushing device is located below the cleaning tank 12 and performs flushing operation on the wafer in the cleaning tank 12;
the washing device comprises a stirring mechanism and a washing mechanism, the stirring mechanism heats and stirs the washing liquid filtered by the filtering device, and the washing mechanism sucks the washing liquid in the stirring mechanism to wash the wafer;
a stirring mechanism which is arranged on the inner bottom wall of the frame 1, a stirring tank 6 is fixedly arranged on the inner bottom wall of the frame 1 for stirring the filtered liquid, one end of a water outlet pipeline 44 is fixedly communicated with the outer surface of the stirring tank 6 for conveying the filtered cleaning liquid, a stirring paddle 61 is rotatably connected on the inner wall of the stirring tank 6 for stirring the liquid in the stirring tank 6, one end of the stirring paddle 61 penetrates through and extends to the outer side surface of the frame 1, the cross section of the stirring blade annularly distributed on the outer surface of the stirring paddle 61 is in an inverted S shape for fully stirring, an electromagnetic heater 62 is sleeved on the outer surface of the stirring tank 6 for heating the cleaning liquid in the stirring tank 6, a controller of the electromagnetic heater 62 is fixedly arranged on the inner bottom wall of the frame 1, a temperature sensor 63 is fixedly arranged on the outer surface of the stirring tank 6 for detecting the temperature of the cleaning liquid in the stirring tank 6, then the temperature sensor 63 is electrically connected with the controller of the electromagnetic heater 62 to adjust the heating temperature and time of the electromagnetic heater 62 so as to maintain the constant temperature cleaning state of the cleaning liquid, in order to add new cleaning liquid to the stirring tank 6, a cleaning liquid adding valve 64 is fixedly communicated with the outer surface of the stirring tank 6, the cleaning liquid adding valve 64 can be communicated with the cleaning liquid raw material tank, meanwhile, a sensor for detecting the concentration of the cleaning liquid can be further installed on the stirring tank 6, and when the concentration is lower than a set value, the cleaning liquid adding valve 64 is controlled to be opened so as to adjust the concentration of the cleaning liquid to a normal value.
The washing mechanism is arranged above the stirring tank 6, in order to suck the washing liquid which is stirred in the stirring tank 6, a water suction pump 7 is fixedly arranged on the lower surface of a washing tank body 12 through a support frame, then a water inlet pipe of the water suction pump 7 is fixedly communicated with the outer surface of the stirring tank 6 through a connecting pipe, in order to wash the wafer in the washing tank body 12, a spray pipe 71 is fixedly arranged at the water outlet end of the water suction pump 7, the spray pipe 71 is formed by fixedly communicating a pipe body and short pipes on the pipe body in a rectangular array mode, then the short pipes at multiple ends of the spray pipe 71 are fixedly communicated with the inner bottom wall of the washing tank body 12, in order to wash the dead angle of the wafer, a rotary spray nozzle 72 is fixedly arranged at multiple ends of the spray pipe 71, and then the spray hole of the rotary spray nozzle 72 is in an inclined shape, and the inclined angle is 10-45 degrees;
further, a driving shell 8 is fixedly installed on the outer side surface of the frame 1, in order to drive the driving shaft 23 in the supporting device, the rotating shaft 41 in the filtering device and the stirring paddle 61 in the stirring mechanism to rotate, a driving motor 81 is fixedly installed on the inner side wall of the driving shell 8, then one end of an output shaft of the driving motor 81 and one end of the stirring paddle 61 are fixedly installed through a coupler, further, the driving motor 81 drives the driving shaft 23 and the rotating shaft 41 to synchronously rotate through the matching of a synchronous belt and a synchronous wheel, when speed regulation is needed, the rotating speed can be changed through additionally adding a gear box, in order to perform heat preservation work on the cleaning tank body 12, heating blocks 82 are fixedly installed on both sides of the outer surface of the cleaning tank body 12, and in order to clean wafers more thoroughly, ultrasonic generators 83 distributed in a rectangular array are fixedly installed on the lower surface of the cleaning tank body 12.
The working principle is as follows: by sequentially inserting the wafers to be cleaned into the flower basket 2, after the flower basket 2 is placed at a corresponding position in the cleaning tank body 12 in the frame 1 through the mechanical arm, the wafer contacts with the outer surface of the roller 22 in the cleaning tank 12, the cleaning solution is added in the cleaning tank 12 in advance, the tank cover 11 covers the upper part of the cleaning tank 12, the driving motor 81 in the driving shell 8 drives the stirring paddle 61 in the stirring tank 6 to rotate, the rotation of the stirring paddle 61 drives the driving shafts 23 on the two sides to rotate through the matching of the synchronous wheels and the synchronous belts, the driving shafts 23 drive the rollers 22 on the inclined struts 21 to rotate, the rollers 22 on the two sides rotate in the same speed and the same direction to drive the wafers above to rotate at a constant speed, the heating block 82 on the outer side surface of the cleaning tank body 12 and the ultrasonic generator 83 on the lower surface are started, the heating block 82 heats and preserves the temperature of the cleaning liquid in the cleaning tank body 12, and the ultrasonic generator 83 generates micro bubbles to clean the impurities on the outer surface of the wafers;
meanwhile, cleaning liquid in the cleaning tank body 12 is gathered through the upper pipeline 3 and the lower pipeline 31 and then enters the outer cylinder 4, the flow rate of the lower pipeline 31 can be adjusted through the flow control valve 32, the upper pipeline 3 can be kept to continuously convey water, the water in the lower pipeline 31 enters the water outlet rotary cylinder 43, the driving motor 81 drives the rotary shaft 41 to rotate, the rotary shaft 41 drives the filter cover 42 and the water outlet rotary cylinder 43 to rotate, the water in the water outlet rotary cylinder 43 is thrown out through a water outlet hole in the water outlet rotary cylinder 43 and then enters the inside of the filter cover 42, the water enters the outer cylinder 4 through the filtration of the filter cover 42 and enters the stirring tank 6 through the water outlet pipeline 44, impurities in the cleaning liquid are rotated out through the rotation of the spiral cover 45 and enter the other end of the outer cylinder 4 and enter the collecting bag through the discharge pipe 5 to be collected, and the sliding table 51 prevents the impurities from being accumulated;
stirring rake 61 stirs the washing liquid after filtering in the agitator tank 6, open electromagnetic heater 62, electromagnetic heater 62 heats the washing liquid in the agitator tank 6, stirring rake 61 makes the washing liquid stirring abundant back, the temperature sensor 63 of agitator tank 6 surface detects the washing liquid temperature in the agitator tank 6, after the temperature reaches the threshold value of settlement temperature, control suction pump 7 opens and carries in spray tube 71 behind the washing liquid suction in the agitator tank 6, spout when rotatory 72 limit through rotatory nozzle, wash work to the pivoted wafer, accessible washing liquid adds valve 64 and adds new washing liquid in to agitator tank 6.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered as the technical solutions and the inventive concepts of the present invention within the technical scope of the present invention.
Claims (9)
1. The utility model provides a semiconductor wafer slot type automatic cleaning tank for cleaning machine, includes frame (1), its characterized in that: the cleaning device also comprises a tank cover (11), a cleaning tank body (12), a supporting device, a filtering device and a flushing device which are arranged on the rack (1);
the two tank covers (11) are hinged to two sides of the top of the rack (1), and the cleaning tank body (12) is fixedly mounted on the inner wall of the rack (1);
the supporting device comprises a flower basket (2) used for containing wafers and rollers (22), the supporting device is located inside the cleaning tank body (12), the rollers (22) support the wafers in the flower basket (2) and then drive the wafers to rotate circumferentially, driving shafts (23) are fixedly connected to the axes of the rollers (22), and one ends of the driving shafts (23) penetrate through and extend to the outside of the rack (1);
the filtering device is arranged on the lower surface of the cleaning tank body (12), filters cleaning liquid in the cleaning tank body (12) and then guides the cleaning liquid into the flushing device, the filtering device comprises an upper pipeline (3), a lower pipeline (31), a flow control valve (32) for controlling the flow of the lower pipeline (31), a filtering mechanism and a collecting mechanism, and the cleaning liquid flows to the filtering mechanism from the upper pipeline (3) and the lower pipeline (31) for filtering after cleaning wafers;
the filtering mechanism comprises an outer barrel (4), the outer surface of the outer barrel (4) is fixedly installed with the lower surface of the cleaning groove body (12) through a supporting frame, a rotating shaft (41) is installed at one end of the outer barrel (4) through a bearing, and one end of the rotating shaft (41) penetrates through and extends to the outside of one end of the outer barrel (4);
the flushing device is positioned below the cleaning tank body (12) and comprises a stirring mechanism and a flushing mechanism, the stirring mechanism heats and stirs the cleaning liquid filtered by the filtering device, and the flushing mechanism sucks the cleaning liquid in the stirring mechanism to flush the wafer in the cleaning tank body (12);
the washing mechanism comprises a water suction pump (7) and a rotary spray head (72), and the water suction pump (7) sucks the heated and stirred washing liquid and then upwards sprays the washing liquid from the rotary spray head (72) to wash the wafer;
the stirring mechanism comprises a stirring tank (6), and the inner wall of the stirring tank (6) is rotatably connected with a stirring paddle (61);
the lateral surface fixed mounting of frame (1) has drive shell (8), the inside wall fixed mounting of drive shell (8) has driving motor (81), shaft coupling fixed mounting is passed through with the one end of stirring rake (61) to the output shaft one end of driving motor (81), driving motor (81) pass through the cooperation drive of hold-in range and synchronizing wheel drive shaft (23) with axis of rotation (41) synchronous rotation, the equal fixed mounting in surface both sides of wasing cell body (12) has heating block (82), the lower fixed surface of wasing cell body (12) installs supersonic generator (83) that are the distribution of rectangular array.
2. The automatic cleaning tank of claim 1, wherein: place basket of flowers (2) when wasing the interior diapire of cell body (12), the wafer quilt gyro wheel (22) upwards roll prop up the back, break away from basket of flowers (2), the cross-section of wasing cell body (12) is the trapezoidal form that falls, the interior diapire both sides fixed mounting who washs cell body (12) has bracing (21) that are the rectangle array and distribute, and is a plurality of gyro wheel (22) homogeneous one-to-one is installed a plurality of the one end of bracing (21) is a plurality of gyro wheel (22) distributes with the axle center.
3. The automatic cleaning tank of claim 1, wherein: the top of going up pipeline (3) runs through and extends to wash the both sides inner wall department of cell body (12), the top of lower pipeline (31) runs through and extends to wash the interior diapire of cell body (12), flow control valve (32) fixed mounting be in the flow of control washing liquid on lower pipeline (31).
4. The automatic cleaning tank of claim 1, wherein: the surface of the rotating shaft (41) in the outer cylinder (4) is fixedly sleeved with a filtering cover (42) which has a taper and is provided with a filtering hole, one end of the rotating shaft (41) is fixedly provided with a water outlet rotary cylinder (43) which is positioned in the filtering cover (42), one end of the upper pipeline (3) penetrates through the outer cylinder (4) and extends to one end, close to the rotating shaft (41), of the water outlet rotary cylinder (43), then one end of the upper pipeline (3) is rotatably connected with the outer surface of the water outlet rotary cylinder (43) through a rotary joint, and the outer surface, close to one end of the rotating shaft (41), of the outer cylinder (4) is fixedly communicated with a water outlet pipeline (44).
5. The automatic cleaning tank of claim 4, wherein: the outer surface of the water outlet rotary drum (43) is fixedly provided with a spiral cover (45) movably arranged in the filter cover (42), the spiral cover (45) is composed of a cover body and a spiral sheet, and one end of the spiral sheet extends and is fixedly arranged on the outer surface of the water outlet rotary drum (43).
6. The automatic cleaning tank of claim 5, wherein: the collecting mechanism comprises a discharging pipe (5), the discharging pipe (5) is communicated with the outer surface of the outer barrel (4) in a fixed mode, a sliding table (51) is fixedly mounted on the inner wall of the outer barrel (4), and the inner wall of the sliding table (51) is in an inverted cone shape.
7. The automatic cleaning tank of claim 4 wherein: agitator tank (6) fixed mounting be in the interior diapire of frame (1), the one end of outlet conduit (44) with the external fixed surface intercommunication of agitator tank (6), the one end of stirring rake (61) is run through and is extended to the lateral surface of frame (1), the stirring leaf cross-section of stirring rake (61) surface annular distribution personally submits the S-shaped.
8. The automatic cleaning tank of claim 1, wherein: electromagnetic heater (62) have been cup jointed to the surface of agitator tank (6), the fixed surface of agitator tank (6) installs temperature sensor (63), temperature sensor (63) control opening of electromagnetic heater (62) stops, the fixed surface intercommunication of agitator tank (6) has washing liquid with washing liquid head tank intercommunication to add valve (64).
9. The automatic cleaning tank of claim 1, wherein: the surface of suction pump (7) pass through the support frame with wash the lower fixed surface installation of cell body (12), the end of intaking of suction pump (7) pass through the connecting pipe with the external fixed surface intercommunication of agitator tank (6), the play water end fixed mounting of suction pump (7) has spray tube (71), the top of spray tube (71) with wash the fixed intercommunication of inner bottom wall of cell body (12), the top of spray tube (71) with rotatory shower nozzle (72) fixed mounting, the orifice of rotatory shower nozzle (72) is the slope shape, and inclination is 10 o-45 o.
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| CN202210243895.6A CN114308842B (en) | 2022-03-14 | 2022-03-14 | Automatic cleaning tank for semiconductor wafer tank type cleaning machine |
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| CN202210243895.6A CN114308842B (en) | 2022-03-14 | 2022-03-14 | Automatic cleaning tank for semiconductor wafer tank type cleaning machine |
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Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN115518933B (en) * | 2022-05-05 | 2023-09-19 | 苏州智程半导体科技股份有限公司 | Wafer cleaning equipment with monitoring function |
| CN115069670B (en) * | 2022-08-17 | 2022-11-11 | 智程半导体设备科技(昆山)有限公司 | Slot type ultrasonic cleaning machine is used in processing of semiconductor wafer |
| CN115132644B (en) * | 2022-08-30 | 2022-12-02 | 智程半导体设备科技(昆山)有限公司 | Groove type wafer cleaning device |
| CN115301619A (en) * | 2022-10-10 | 2022-11-08 | 智程半导体设备科技(昆山)有限公司 | Semiconductor wafer cleaning machine and cleaning method |
| CN115945452A (en) * | 2022-12-06 | 2023-04-11 | 杭州铁泰自动化科技有限公司 | Ultrasonic full cleaning equipment and cleaning method for clamp of high-precision machine tool |
| CN116581066B (en) * | 2023-07-07 | 2024-01-12 | 恒超源洗净科技(深圳)有限公司 | Semiconductor silicon wafer cleaning equipment |
| CN117457571B (en) * | 2023-11-16 | 2024-04-19 | 江苏星辉半导体有限公司 | Semiconductor electrical component wafer processing acid dip pickle |
| CN117913002A (en) * | 2024-03-07 | 2024-04-19 | 苏州普伊特自动化系统有限公司 | Automatic adjusting system and method for trough type cleaning device |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JPH11347509A (en) * | 1998-06-04 | 1999-12-21 | Tokyo Electron Ltd | Cleaning apparatus and exhaust method in same |
| JP2002141320A (en) * | 2000-10-31 | 2002-05-17 | Mitsubishi Materials Silicon Corp | Wafer washing device |
| US20020166569A1 (en) * | 2001-05-10 | 2002-11-14 | Speedfam-Ipec Corporation | Method and apparatus for semiconductor wafer cleaning |
| US20110114121A1 (en) * | 2009-11-16 | 2011-05-19 | Miller Kenneth C | Laminar flow tank |
| CN109671653B (en) * | 2018-12-26 | 2020-10-20 | 江苏纳沛斯半导体有限公司 | Semiconductor wafer cleaning device |
| CN113600545B (en) * | 2021-10-08 | 2021-12-10 | 智程半导体设备科技(昆山)有限公司 | Wafer spraying type cleaning device |
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