CN114225649A - Hydrogen chloride synthesis furnace tail gas absorption system provided with explosion-proof device - Google Patents

Hydrogen chloride synthesis furnace tail gas absorption system provided with explosion-proof device Download PDF

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Publication number
CN114225649A
CN114225649A CN202010943437.4A CN202010943437A CN114225649A CN 114225649 A CN114225649 A CN 114225649A CN 202010943437 A CN202010943437 A CN 202010943437A CN 114225649 A CN114225649 A CN 114225649A
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CN
China
Prior art keywords
falling film
film absorber
pipeline
stop valve
tail gas
Prior art date
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Pending
Application number
CN202010943437.4A
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Chinese (zh)
Inventor
温换军
何春文
赵晓海
朱睿杰
周建华
唐兴东
戴学谱
张文虎
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Jinchuan Group Co Ltd
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Jinchuan Group Co Ltd
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Filing date
Publication date
Application filed by Jinchuan Group Co Ltd filed Critical Jinchuan Group Co Ltd
Priority to CN202010943437.4A priority Critical patent/CN114225649A/en
Publication of CN114225649A publication Critical patent/CN114225649A/en
Pending legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/18Absorbing units; Liquid distributors therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/1406Multiple stage absorption
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/1412Controlling the absorption process
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/1418Recovery of products
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00Halogens; Halogen acids
    • C01B7/01Chlorine; Hydrogen chloride
    • C01B7/012Preparation of hydrogen chloride from the elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2256/00Main component in the product gas stream after treatment
    • B01D2256/16Hydrogen
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/20Halogens or halogen compounds
    • B01D2257/202Single element halogens
    • B01D2257/2025Chlorine

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Treating Waste Gases (AREA)

Abstract

The invention discloses a hydrogen chloride synthetic furnace tail gas absorption system provided with an explosion-proof device, which comprises a primary falling film absorber, a secondary falling film absorber and a tail gas absorption tower, wherein a waste gas pipeline stop valve is arranged at a waste gas discharge port of the primary falling film absorber, a waste gas discharge pipeline between the primary falling film absorber and the secondary falling film absorber is connected with a nitrogen source through a nitrogen main pipeline, an electromagnetic regulating valve electrically connected with a PLC (programmable logic controller) is arranged on the nitrogen main pipeline, a first stop valve and a second stop valve are arranged on the nitrogen main pipeline on the left side and the right side of the electromagnetic regulating valve, and a nitrogen branch pipeline is connected in parallel on one side of the nitrogen main pipeline. According to the invention, nitrogen can be timely filled according to the pressure in the waste gas discharge pipeline through the valve group consisting of the waste gas pipeline stop valve, the first stop valve, the electromagnetic regulating valve and the second stop valve and the PLC, the gas pressure in the waste gas discharge pipeline and the concentration of hydrogen are regulated, and the pipeline explosion and equipment damage are effectively prevented.

Description

Hydrogen chloride synthesis furnace tail gas absorption system provided with explosion-proof device
Technical Field
The invention relates to the technical field of chemical equipment, in particular to a tail gas absorption system of a hydrogen chloride synthesis furnace with an explosion-proof device.
Background
The tail gas absorption device of the hydrogen chloride synthesis furnace is very commonly used, the traditional process generally adopts a primary falling film absorber, a secondary falling film absorber and a tail gas absorption tower for absorption, and after the primary falling film absorber absorbs partial tail gas, the hydrogen enrichment concentration is increased, and the risk that electrostatic sparks are generated when the tube wall is rubbed by high-speed airflow and are easy to explode is caused, so that the safety problems of pipeline explosion, equipment damage and production influence are caused.
Disclosure of Invention
The invention aims to provide a hydrogen chloride synthesis furnace tail gas absorption system provided with an explosion-proof device, which solves the problems that after a primary falling film absorber absorbs part of tail gas, the concentration of hydrogen is increased, and electrostatic sparks generated by rubbing the tube wall in the case of high-speed airflow are easy to explode, so that the pipeline explosion, equipment damage and production safety influence are caused.
In order to solve the technical problems, the technical scheme adopted by the invention is as follows:
a tail gas absorption system of a hydrogen chloride synthetic furnace provided with an explosion-proof device comprises a primary falling film absorber, a secondary falling film absorber and a tail gas absorption tower, tail gas discharged by the hydrogen chloride synthetic furnace is purified from a waste gas discharge pipeline arranged among the primary falling film absorber, the secondary falling film absorber and the tail gas absorption tower, absorption water flows from an absorption water pipeline arranged among the tail gas absorption tower, the secondary falling film absorber and the primary falling film absorber, a waste gas pipeline stop valve is arranged at a waste gas discharge port of the primary falling film absorber, the waste gas discharge pipeline between the primary falling film absorber and the secondary falling film absorber is connected with a nitrogen source through a nitrogen main pipeline, an electromagnetic regulating valve electrically connected with a PLC (programmable logic controller) is arranged on the nitrogen main pipeline, and a first stop valve and a second stop valve are arranged on the nitrogen main pipeline at the left side and the right side of the electromagnetic regulating valve, and a nitrogen branch pipeline is connected in parallel with one side of the nitrogen main pipeline provided with the first stop valve, the electromagnetic regulating valve and the second stop valve, and a fourth stop valve is arranged on the nitrogen branch pipeline.
Preferably, a pressure transmitter is installed on an exhaust gas discharge pipeline between the primary falling film absorber and the secondary falling film absorber, and the pressure transmitter is electrically connected with the PLC.
Preferably, the tail gas absorption tower is connected with the exhaust fan, and a variable frequency motor of the exhaust fan is electrically connected with the PLC.
The working process of the invention is as follows:
after the absorption of hydrogen chloride synthetic furnace tail gas through one-level falling liquid film absorber, the higher chlorine of content is absorbed in the tail gas, chlorine concentration shock mount in the exhaust emission pipeline that is connected with one-level falling liquid film absorber, the hydrogen concentration in the exhaust emission pipeline rises, it has the hidden danger of explosion to exceed the standard requirement easily, the PLC controller is through the gaseous pressure data in this section exhaust emission pipeline that detects, in time start electromagnetic control valve, let nitrogen gas in the nitrogen source in time fill to this section exhaust emission pipeline through the nitrogen main pipe way, adjust the concentration of gas pressure and hydrogen in the exhaust emission pipeline, pipeline explosion and equipment damage have effectively been prevented.
The invention has the beneficial effects that:
(1) according to the invention, the waste gas discharge pipeline between the primary falling film absorber and the secondary falling film absorber is connected with a nitrogen source, and nitrogen can be timely filled according to the pressure in the waste gas discharge pipeline through the valve group consisting of the waste gas pipeline stop valve, the first stop valve, the electromagnetic regulating valve and the second stop valve and the PLC, so that the gas pressure and the hydrogen concentration in the waste gas discharge pipeline are regulated, and the pipeline explosion and equipment damage are effectively prevented;
(2) according to the invention, the nitrogen branch pipeline is connected in parallel at one side of the nitrogen main pipeline provided with the first stop valve, the electromagnetic regulating valve and the second stop valve, and the fourth stop valve is arranged on the nitrogen branch pipeline, so that the manual control of filling nitrogen can be effectively prevented after the electromagnetic regulating valve is out of control;
(3) the tail gas absorption tower is connected with the exhaust fan, and the start and stop of the exhaust fan can be controlled by the PLC.
Drawings
FIG. 1 is a schematic structural view of the present invention;
wherein: 1. nitrogen source, 2, first stop valve, 3, electromagnetic control valve, 4, second stop valve, 5, PLC controller, 6, fourth solenoid valve, 7, inverter motor, 8, exhaust gas pipeline stop valve, 9, nitrogen main pipe, 10, nitrogen branch pipe, 11, pressure transmitter, 12, exhaust fan.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings.
As shown in figure 1, a tail gas absorption system of a hydrogen chloride synthetic furnace provided with an explosion-proof device comprises a primary falling film absorber, a secondary falling film absorber and a tail gas absorption tower, tail gas discharged by the hydrogen chloride synthetic furnace is purified from a waste gas discharge pipeline arranged between the primary falling film absorber, the secondary falling film absorber and the tail gas absorption tower and then discharged, absorption water flows from an absorption water pipeline arranged between the tail gas absorption tower, the secondary falling film absorber and the primary falling film absorber, a waste gas pipeline stop valve 8 is arranged at a waste gas discharge port of the primary falling film absorber, the waste gas discharge pipeline between the primary falling film absorber and the secondary falling film absorber is connected with a nitrogen source 1 through a nitrogen main pipeline 9, an electromagnetic regulating valve 3 electrically connected with a PLC 5 is arranged on the nitrogen main pipeline 9, a first stop valve 2 and a second stop valve 4 are arranged on the nitrogen main pipeline 9 at the left side and the right side of the electromagnetic regulating valve 3, the nitrogen main pipeline 9 side provided with the first stop valve 2, the electromagnetic regulating valve 3 and the second stop valve 4 is connected in parallel with a nitrogen branch pipeline 10, and the nitrogen branch pipeline 10 is provided with a fourth stop valve 6.
And a pressure transmitter 11 is arranged on a waste gas discharge pipeline between the primary falling film absorber and the secondary falling film absorber, and the pressure transmitter 11 is electrically connected with the PLC 5.
The tail gas absorption tower is connected with an exhaust fan 12, and a variable frequency motor 7 of the exhaust fan 12 is electrically connected with the PLC 5.
The working process of the invention is as follows:
after hydrogen chloride synthetic furnace tail gas passes through the absorption of one-level falling film absorber, the higher chlorine of content is absorbed in the tail gas, chlorine concentration shock mount in the exhaust emission pipeline that is connected with one-level falling film absorber, the hydrogen concentration in the exhaust emission pipeline rises, it has the hidden danger of explosion to exceed the standard requirement easily, PLC controller 5 is through the gaseous pressure data in this section exhaust emission pipeline that detects, in time start electromagnetic control valve 3, let nitrogen gas in the nitrogen source 1 in time fill to this section exhaust emission pipeline through nitrogen main pipe 9, adjust the concentration of gas pressure and hydrogen in the exhaust emission pipeline, pipeline explosion and equipment damage have effectively been prevented.
According to the invention, the waste gas discharge pipeline between the primary falling film absorber and the secondary falling film absorber is connected with a nitrogen source, and nitrogen can be timely filled according to the pressure in the waste gas discharge pipeline through the valve group consisting of the waste gas pipeline stop valve, the first stop valve, the electromagnetic regulating valve and the second stop valve and the PLC, so that the gas pressure and the hydrogen concentration in the waste gas discharge pipeline are regulated, and pipeline explosion and equipment damage are effectively prevented.

Claims (3)

1. The utility model provides an install explosion-proof equipment's hydrogen chloride synthetic furnace tail gas absorption system, it includes one-level falling film absorber, second grade falling film absorber and tail gas absorption tower, and the tail gas that hydrogen chloride synthetic furnace discharged is discharged after purifying from installing the exhaust emission pipeline between one-level falling film absorber, second grade falling film absorber and the tail gas absorption tower, and absorption water flows from installing the absorption water pipeline between tail gas absorption tower, second grade falling film absorber and the one-level falling film absorber, its characterized in that: exhaust gas duct stop valve (8) are installed to the exhaust gas discharge department of one-level falling film absorber, exhaust gas discharge pipeline between one-level falling film absorber and the second grade falling film absorber is connected through nitrogen gas trunk line (9) with nitrogen gas source (1), install electromagnetic control valve (3) of being connected with PLC controller (5) electricity on nitrogen gas trunk line (9), install first stop valve (2) and second stop valve (4) on nitrogen gas trunk line (9) of electromagnetic control valve (3) left and right sides, install first stop valve (2), nitrogen gas trunk line (9) one side parallel connection of electromagnetic control valve (3) and second stop valve (4) has nitrogen gas lateral conduit (10), install fourth stop valve (6) on nitrogen gas lateral conduit (10).
2. The hydrogen chloride synthesis furnace tail gas absorption system provided with the explosion-proof device according to claim 1, which is characterized in that: and a pressure transmitter (11) is arranged on an exhaust gas discharge pipeline between the primary falling film absorber and the secondary falling film absorber, and the pressure transmitter (11) is electrically connected with the PLC (5).
3. The hydrogen chloride synthesis furnace tail gas absorption system provided with the explosion-proof device according to claim 1 or 2, characterized in that: the tail gas absorption tower is connected with an exhaust fan (12), and a variable frequency motor (7) of the exhaust fan (12) is electrically connected with the PLC (5).
CN202010943437.4A 2020-09-09 2020-09-09 Hydrogen chloride synthesis furnace tail gas absorption system provided with explosion-proof device Pending CN114225649A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010943437.4A CN114225649A (en) 2020-09-09 2020-09-09 Hydrogen chloride synthesis furnace tail gas absorption system provided with explosion-proof device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010943437.4A CN114225649A (en) 2020-09-09 2020-09-09 Hydrogen chloride synthesis furnace tail gas absorption system provided with explosion-proof device

Publications (1)

Publication Number Publication Date
CN114225649A true CN114225649A (en) 2022-03-25

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114893792A (en) * 2022-05-24 2022-08-12 苏州金宏气体股份有限公司 Remote ignition system and method for hydrogen bromide synthesis furnace

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114893792A (en) * 2022-05-24 2022-08-12 苏州金宏气体股份有限公司 Remote ignition system and method for hydrogen bromide synthesis furnace
CN114893792B (en) * 2022-05-24 2023-11-21 金宏气体股份有限公司 Remote ignition system and method for hydrogen bromide synthesis furnace

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