CN114213691A - 一种防窥膜的制备方法 - Google Patents
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Abstract
一种防窥膜的制备方法，包括下列步骤：（1）.对基材层涂布透明固化胶；（2）.在透明固化胶层上进行压印；（3）.在印压完成的透明固化胶层表面上充分涂布遮光胶水，并用进行光固化；（4）.薄膜浸入洗涤液中，超声处理，溶解表面透明固化胶；（5）.经干燥处理后，对薄膜表面再涂布透明固化胶，作为保护层。本发明的技术方案，对表面透明固化胶层进行压印处理，得到遮光层的结构模板，再涂布遮光胶水，使遮光层的厚度得以控制，与传统防窥膜相比，本发明大幅度提高了光线的穿透率，制得的防窥膜透光度更高，并且工艺简单。
Description
技术领域
本发明涉及一种防窥膜的制备方法。
背景技术
防窥膜可以很好地保护显示设备在使用过程中的个人隐私问题，目前，市场上的防窥膜主要有光栅结构构成，但是其透光率低一直是难以解决的问题，这会造成显示屏发暗，用户体验感较差。
发明内容
为了克服现有防窥膜的上述不足，本发明提供一种防窥膜的制备方法，使遮光层的厚度得以控制，大幅度提高了光线的穿透率，制得的防窥膜透光度更高。
本发明解决其技术问题的技术方案是：一种防窥膜的制备方法，包括下列步骤：
（1）.对基材层涂布透明固化胶；
（2）.在透明固化胶层上进行压印；
（3）.在印压完成的透明固化胶层表面上充分涂布遮光胶水，并用进行光固化；
（4）.薄膜浸入洗涤液中，超声处理，溶解表面透明固化胶；
（5）.经干燥处理后，对薄膜表面再涂布透明固化胶，作为保护层。
优选的，所述基材层为透明PET膜或PC膜。
优选的，所述透明固化胶层厚度为100~200微米、所述保护层厚度为10~30微米。
优选的，所述压印的深度为80~95微米。
优选的，所述透明固化胶层由低聚物、光引发剂组成，其中低聚物为环氧丙烯酸酯、聚氨酯丙烯酸酯、聚酯丙烯酸酯之一。
优选的，所述遮光胶水主要由低聚物、光引发剂、遮光剂组成，其中低聚物为环氧丙烯酸酯、聚氨酯丙烯酸酯、聚酯丙烯酸酯之一，所述遮光剂为酞菁红、酞菁蓝、酞菁绿之一。
本发明的有益效果在于：本发明的技术方案，对表面透明固化胶层进行压印处理，得到遮光层的结构模板，再涂布遮光胶水，使遮光层的厚度得以控制，与传统防窥膜相比，本发明大幅度提高了光线的穿透率，制得的防窥膜透光度更高，并且工艺简单。
具体实施方式
下面结合具体实施方式对本发明作进一步详细说明。
实施例一，一种防窥膜的制备方法，包括下列步骤：
（1）.对PET基材膜层涂布透明固化胶，该透明固化胶层厚度为100~200微米，该透明固化胶层由低聚物、光引发剂组成，其中低聚物为环氧丙烯酸酯，光引发剂为TPO光引发剂，低聚物和光引发剂的质量比为100:2。
（2）.在透明固化胶层上进行压印，所述压印的深度为80~95微米。
（3）.在印压完成的透明固化胶层表面上充分涂布遮光胶水，并用进行光固化，该遮光胶水主要由低聚物、光引发剂、遮光剂组成，其中低聚物为聚氨酯丙烯酸酯，所述遮光剂为酞菁红，所述光引发剂为TPO-L光引发剂，低聚物、光引发剂、遮光剂的质量比为100:3:2。
（4）.薄膜浸入洗涤液中，超声处理，溶解表面透明固化胶。
（5）.经干燥处理后，对薄膜表面再涂布透明固化胶，作为保护层，该保护层厚度为10~30微米。
实施例二，一种防窥膜的制备方法，包括下列步骤：
（1）.对PC基材膜层涂布透明固化胶，该透明固化胶层厚度为100~200微米，该透明固化胶层由低聚物、光引发剂组成，其中低聚物为聚酯丙烯酸酯，光引发剂为ITX光引发剂，低聚物和光引发剂的质量比为100:1。
（2）.在透明固化胶层上进行压印，所述压印的深度为80~95微米。
（3）.在印压完成的透明固化胶层表面上充分涂布遮光胶水，并用进行光固化，该遮光胶水主要由低聚物、光引发剂、遮光剂组成，其中低聚物为环氧丙烯酸酯，所述遮光剂为酞菁篮，所述光引发剂为TPO光引发剂，低聚物、光引发剂、遮光剂的质量比为100:1:5。
（4）.薄膜浸入洗涤液中，超声处理，溶解表面透明固化胶。
（5）.经干燥处理后，对薄膜表面再涂布透明固化胶，作为保护层，该保护层厚度为10~30微米。
实施例三，一种防窥膜的制备方法，包括下列步骤：
（1）.对PET基材膜层涂布透明固化胶，该透明固化胶层厚度为100~200微米，该透明固化胶层由低聚物、光引发剂组成，其中低聚物为聚氨酯丙烯酸酯，光引发剂为EDB光引发剂，低聚物和光引发剂的质量比为100:5。
（2）.在透明固化胶层上进行压印，所述压印的深度为80~95微米。
（3）.在印压完成的透明固化胶层表面上充分涂布遮光胶水，并用进行光固化，该遮光胶水主要由低聚物、光引发剂、遮光剂组成，其中低聚物为聚酯丙烯酸酯，所述遮光剂为酞菁绿，所述光引发剂为EDB光引发剂，低聚物、光引发剂、遮光剂的质量比为100:5:3。
（4）.薄膜浸入洗涤液中，超声处理，溶解表面透明固化胶。
（5）.经干燥处理后，对薄膜表面再涂布透明固化胶，作为保护层，该保护层厚度为10~30微米。
实施例四，一种防窥膜的制备方法，包括下列步骤：
（1）.对PC基材膜层涂布透明固化胶，该透明固化胶层厚度为100~200微米，该透明固化胶层由低聚物、光引发剂组成，其中低聚物为环氧丙烯酸酯，光引发剂为OMBB光引发剂，低聚物和光引发剂的质量比为100:4。
（2）.在透明固化胶层上进行压印，所述压印的深度为80~95微米。
（3）.在印压完成的透明固化胶层表面上充分涂布遮光胶水，并用进行光固化，该遮光胶水主要由低聚物、光引发剂、遮光剂组成，其中低聚物为聚酯丙烯酸酯，所述遮光剂为酞菁红，所述光引发剂为TPO光引发剂，低聚物、光引发剂、遮光剂的质量比为100:2:1。
（4）.薄膜浸入洗涤液中，超声处理，溶解表面透明固化胶。
（5）.经干燥处理后，对薄膜表面再涂布透明固化胶，作为保护层，该保护层厚度为10~30微米。
实施例五，一种防窥膜的制备方法，包括下列步骤：
（1）.对PET基材膜层涂布透明固化胶，该透明固化胶层厚度为100~200微米，该透明固化胶层由低聚物、光引发剂组成，其中低聚物为聚氨酯丙烯酸酯，光引发剂为OMBB光引发剂，低聚物和光引发剂的质量比为100:3。
（2）.在透明固化胶层上进行压印，所述压印的深度为80~95微米。
（3）.在印压完成的透明固化胶层表面上充分涂布遮光胶水，并用进行光固化，该遮光胶水主要由低聚物、光引发剂、遮光剂组成，其中低聚物为环氧丙烯酸酯，所述遮光剂为酞菁绿，所述光引发剂为OMBB光引发剂，低聚物、光引发剂、遮光剂的质量比为100:4:4。
（4）.薄膜浸入洗涤液中，超声处理，溶解表面透明固化胶。
（5）.经干燥处理后，对薄膜表面再涂布透明固化胶，作为保护层，该保护层厚度为10~30微米。
Claims (8)
1.一种防窥膜的制备方法，其特征在于包括下列步骤：
（1）.对基材层涂布透明固化胶；
（2）.在透明固化胶层上进行压印；
（3）.在印压完成的透明固化胶层表面上充分涂布遮光胶水，并用进行光固化；
（4）.薄膜浸入洗涤液中，超声处理，溶解表面透明固化胶；
（5）.经干燥处理后，对薄膜表面再涂布透明固化胶，作为保护层。
2.如权利要求1所述的防窥膜的制备方法，其特征在于：所述基材层为透明PET膜或PC膜。
3.如权利要求1所述的防窥膜的制备方法，其特征在于：所述透明固化胶层厚度为100~200微米、所述保护层厚度为10~30微米。
4.如权利要求1所述的防窥膜的制备方法，其特征在于：所述压印的深度为80~95微米。
5.如权利要求1-4之一所述的防窥膜的制备方法，其特征在于：所述透明固化胶层由低聚物、光引发剂组成，其中低聚物为环氧丙烯酸酯、聚氨酯丙烯酸酯、聚酯丙烯酸酯之一。
6.如权利要求1-4之一所述的防窥膜的制备方法，其特征在于：所述遮光胶水主要由低聚物、光引发剂、遮光剂组成，其中低聚物为环氧丙烯酸酯、聚氨酯丙烯酸酯、聚酯丙烯酸酯之一，所述遮光剂为酞菁红、酞菁蓝、酞菁绿之一。
7.如权利要求5所述的防窥膜的制备方法，其特征在于：所述低聚物和光引发剂的质量比为100:1-5。
8.如权利要求6所述的防窥膜的制备方法，其特征在于：所述低聚物、光引发剂、遮光剂的质量比为100:1-5：1-5。
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