CN114203837B - Photon screening type terahertz phototransistor and multi-photon detection method thereof - Google Patents
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- 238000001514 detection method Methods 0.000 title claims abstract description 59
- 238000012216 screening Methods 0.000 title claims abstract description 24
- 238000007667 floating Methods 0.000 claims abstract description 55
- 238000010168 coupling process Methods 0.000 claims abstract description 38
- 230000008878 coupling Effects 0.000 claims abstract description 37
- 238000005859 coupling reaction Methods 0.000 claims abstract description 37
- 230000003287 optical effect Effects 0.000 claims abstract description 22
- 230000008859 change Effects 0.000 claims abstract description 11
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- 238000004088 simulation Methods 0.000 claims description 6
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- 230000005672 electromagnetic field Effects 0.000 claims description 5
- 239000002131 composite material Substances 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 230000000737 periodic effect Effects 0.000 claims description 3
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- 238000003199 nucleic acid amplification method Methods 0.000 description 7
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- 238000005516 engineering process Methods 0.000 description 5
- 238000002955 isolation Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- 101001121408 Homo sapiens L-amino-acid oxidase Proteins 0.000 description 3
- 102100026388 L-amino-acid oxidase Human genes 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000004611 spectroscopical analysis Methods 0.000 description 3
- 101000827703 Homo sapiens Polyphosphoinositide phosphatase Proteins 0.000 description 2
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- 238000010521 absorption reaction Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 101100012902 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) FIG2 gene Proteins 0.000 description 1
- 101100233916 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) KAR5 gene Proteins 0.000 description 1
- FTWRSWRBSVXQPI-UHFFFAOYSA-N alumanylidynearsane;gallanylidynearsane Chemical compound [As]#[Al].[As]#[Ga] FTWRSWRBSVXQPI-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000004624 confocal microscopy Methods 0.000 description 1
- 230000001808 coupling effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000004298 light response Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
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Abstract
Description
技术领域Technical Field
本发明涉及太赫兹多光子探测技术领域,尤其是涉及一种光子筛选型太赫兹光晶体管及其多光子探测方法。The present invention relates to the technical field of terahertz multi-photon detection, and in particular to a photon screening type terahertz optical transistor and a multi-photon detection method thereof.
背景技术Background technique
研究太赫兹的高灵敏度多光子探测器,对扩展太赫兹探测器的应用有着十分重要的意义。量子阱太赫兹探测器具有稳定性好、相应速度快、易制作大平面阵列等优点,已经成为近年来太赫兹探测器领域的研究热点。然而,传统半导体量子阱太赫兹探测器不具有光增益功能,因而光响应率差,其应用受到很大限制。不仅如此,随着半导体技术的不断发展,针对单一太赫兹光子的窄带探测器已经满足不了更多功能的需求,如何对入射光束中多种不同太赫兹光子进行同步的、高灵敏度的检测,一直是该领域长期追求却又面临严峻挑战的前沿难题。Research on high-sensitivity multi-photon detectors for terahertz is of great significance to the expansion of the application of terahertz detectors. Quantum well terahertz detectors have the advantages of good stability, fast response speed, and easy production of large planar arrays. They have become a research hotspot in the field of terahertz detectors in recent years. However, traditional semiconductor quantum well terahertz detectors do not have optical gain function, so the light response rate is poor, and their application is greatly limited. Not only that, with the continuous development of semiconductor technology, narrow-band detectors for single terahertz photons can no longer meet the needs of more functions. How to synchronously and highly sensitively detect multiple different terahertz photons in the incident light beam has always been a frontier problem that has been pursued for a long time in this field but faces severe challenges.
传统上,为实现对入射光束中的多种光子进行探测,必须对入射光束进行空间分光,即将不同光子通过衍射光栅等技术分光至不同的空间区域,然后对每一路单一的光子设计专门的探测器单元进行探测。但这样的色散分光方案必须在多个空间光学元件的配合下才能进行,无法在单片集成的探测器上实现,这不仅严重影响了应用的便捷性,在共焦显微镜等对光路校准精度要求苛刻的应用中,将更加难以实现针对不同光子的多光路同步精确校准。因而,单片集成的多光子探测是该领域发展的必然趋势。Traditionally, in order to detect multiple photons in an incident light beam, the incident light beam must be spatially split, that is, different photons are split into different spatial regions through technologies such as diffraction gratings, and then a special detector unit is designed to detect each single photon. However, such a dispersion splitting scheme must be carried out with the cooperation of multiple spatial optical elements and cannot be implemented on a monolithic integrated detector. This not only seriously affects the convenience of application, but also makes it more difficult to achieve synchronous and precise calibration of multiple light paths for different photons in applications such as confocal microscopy that require strict optical path calibration accuracy. Therefore, monolithic integrated multi-photon detection is an inevitable trend in the development of this field.
当前已有的单片集成多光子探测技术主要采用基于滤波分光的方法,即入射光束入照到单片集成的含多个像元的阵列探测器上,在不同像元处采用不同的滤波材料或光栅结构,使得不同像元只探测目标光子中的一种。然而,该方法在每个探测像元处均损失了除目标光子之外的其他波长的入射光子,这使得该单片集成的阵列探测器件整体的多光子探测效率性能较差。譬如:针对n种不同光子的探测中,假定每种光子的探测像元面积为a,则总探测面积为na,入射光束则应不小于na,此时对每种光子的理论最高探测效率极限为1/n。不仅如此,由于对不同光子的光敏探测区域在空间上是分散的,因此在需要精准光路的应用中,同样难以对不同光子进行空间光路的精准优化。为实现单一区域的多光子探测,现有技术实现了一种采用同一宽带响应光栅、通过切换半导体能带结构以进行两种波长光子探测切换的方法,然而该方法必须在时序上区分探测两种光子,即只能在t1时段探测λ1光子(或在t2时段探测λ2光子),因此必然会在t1时段损失同时入照的λ2光子(或在t2时段损失同时入照的λ1光子),表明该方法对每种探测光子同样受限于1/n的有效探测效率上限。The current monolithic integrated multi-photon detection technology mainly adopts a method based on filtering and spectroscopy, that is, the incident light beam is irradiated onto a monolithic integrated array detector containing multiple pixels, and different filter materials or grating structures are used at different pixels, so that different pixels only detect one of the target photons. However, this method loses incident photons of other wavelengths except the target photons at each detection pixel, which makes the overall multi-photon detection efficiency performance of the monolithic integrated array detection device poor. For example: for the detection of n different photons, assuming that the detection pixel area of each photon is a, the total detection area is na, and the incident light beam should be no less than na. At this time, the theoretical maximum detection efficiency limit for each photon is 1/n. In addition, since the photosensitive detection areas for different photons are spatially dispersed, it is also difficult to accurately optimize the spatial optical path of different photons in applications that require precise optical paths. To achieve multi-photon detection in a single area, the prior art has implemented a method that uses the same broadband response grating to switch between two wavelength photon detection by switching the semiconductor band structure. However, this method must distinguish the detection of the two photons in terms of timing, that is, only λ 1 photons can be detected in the t 1 period (or λ 2 photons can be detected in the t 2 period). Therefore, the λ 2 photons that are simultaneously incident in the t 1 period will inevitably be lost (or the λ 1 photons that are simultaneously incident in the t 2 period will be lost), indicating that this method is also limited to the effective detection efficiency upper limit of 1/n for each detected photon.
发明内容Summary of the invention
本发明的目的就是为了克服上述现有技术存在的缺陷而提供一种光子筛选型太赫兹光晶体管及其多光子探测方法,以能够突破对每种单一光子探测效率小于1/n的极限,实现多光子同步高灵敏检测的目的。The purpose of the present invention is to overcome the defects of the above-mentioned prior art and provide a photon screening terahertz optical transistor and a multi-photon detection method thereof, so as to break through the limit of less than 1/n detection efficiency for each single photon and achieve the purpose of multi-photon synchronous high-sensitivity detection.
本发明的目的可以通过以下技术方案来实现:一种光子筛选型太赫兹光晶体管,包括由上至下依次相对设置的耦合光栅层、光敏浮栅层和沟道层,所述耦合光栅层包括多个用于耦合增强不同目标太赫兹光子的子光栅,所述光敏浮栅层用于对应吸收经子光栅结构耦合增强后的光子,以改变电化学势、进而改变沟道层的电导,所述沟道层的一端连接至源极,所述沟道层的另一端连接至漏极。The objective of the present invention can be achieved through the following technical scheme: a photon screening terahertz optical transistor, comprising a coupling grating layer, a photosensitive floating gate layer and a channel layer arranged in sequence from top to bottom, wherein the coupling grating layer comprises a plurality of sub-gratings for coupling and enhancing different target terahertz photons, the photosensitive floating gate layer is used to correspondingly absorb photons enhanced by coupling of the sub-grating structure to change the electrochemical potential and thereby change the conductivity of the channel layer, one end of the channel layer is connected to the source, and the other end of the channel layer is connected to the drain.
进一步地,所述耦合光栅层具体采用具有多周期特征的周期性超材料结构。Furthermore, the coupling grating layer specifically adopts a periodic metamaterial structure with multi-periodic characteristics.
进一步地,所述耦合光栅层中不同子光栅分别对应施加有不同时序的重置电脉冲信号。Furthermore, reset electrical pulse signals with different timings are applied to different sub-gratings in the coupled grating layer respectively.
进一步地,所述光敏浮栅层位于耦合光栅层正下方近场范围内,以能够直接吸收对应子光栅耦合增强的光子。Furthermore, the photosensitive floating gate layer is located in the near field range directly below the coupling grating layer so as to be able to directly absorb photons corresponding to the sub-grating coupling enhancement.
进一步地,所述光敏浮栅层包括多个对应于不同子光栅的光晶体管浮栅,所述多个光晶体管浮栅之间相互电学隔离。Furthermore, the photosensitive floating gate layer includes a plurality of phototransistor floating gates corresponding to different sub-photogratings, and the plurality of phototransistor floating gates are electrically isolated from each other.
进一步地,所述源极和漏极均为复合金属电极。Furthermore, the source and drain are both composite metal electrodes.
进一步地,所述光敏浮栅层与沟道层之间形成电容耦合关系。Furthermore, a capacitive coupling relationship is formed between the photosensitive floating gate layer and the channel layer.
一种光子筛选型太赫兹光晶体管的多光子探测方法,包括以下步骤:A multi-photon detection method of a photon screening terahertz optical transistor comprises the following steps:
S1、根据多目标光子的探测需求,设计并构造具有多个子光栅的超元胞光栅结构,得到耦合光栅层;S1. According to the detection requirements of multi-target photons, a supercellular grating structure with multiple sub-gratings is designed and constructed to obtain a coupled grating layer;
S2、设计并构造与多个子光栅相匹配、且具有对应太赫兹波段响应能力的多个光晶体管浮栅,得到光敏浮栅层;S2, designing and constructing a plurality of phototransistor floating gates that match the plurality of sub-gratings and have corresponding terahertz band response capabilities to obtain a photosensitive floating gate layer;
S3、将耦合光栅层与光敏浮栅层相互对应上下设置,并在光敏浮栅层下方设置沟道层,将沟道层的两端分别连接源极和漏极,制作单片集成的光子筛选型太赫兹光晶体管结构;S3, arranging the coupling grating layer and the photosensitive floating gate layer corresponding to each other up and down, and arranging a channel layer below the photosensitive floating gate layer, connecting the two ends of the channel layer to the source and the drain respectively, to manufacture a monolithic integrated photon screening type terahertz optical transistor structure;
S4、将源极和漏极外接电表,给源极接电势的同时检测通路电流;S4, connect the source and drain to an external ammeter, connect the source to a potential and detect the path current at the same time;
分别在多个子光栅上施加不同时序的重置电脉冲信号;Applying reset electrical pulse signals with different timings to the multiple sub-gratings respectively;
根据源极与漏极上电流的同步变化,获取得到多个不同光子的信号强度。According to the synchronous changes of the current on the source and the drain, the signal intensities of multiple different photons are obtained.
进一步地,所述步骤S1具体是采用电磁场数值计算模拟方法,以设计具有多个子光栅的超元胞光栅结构,其中,所述电磁场数值计算模拟方法包括有限时域差分方法和有限元法。Furthermore, the step S1 specifically adopts an electromagnetic field numerical calculation simulation method to design a supercellular grating structure with multiple sub-gratings, wherein the electromagnetic field numerical calculation simulation method includes a finite time-domain difference method and a finite element method.
进一步地,所述步骤S2具体是采用半导体能带工程设计方法,以设计出多个光晶体管浮栅。Furthermore, the step S2 specifically adopts a semiconductor energy band engineering design method to design a plurality of phototransistor floating gates.
与现有技术相比,本发明采用多光子筛选方式,通过设置具有光子筛选功能的耦合光栅层,能够同时耦合入射的多光子并分别压缩至不同的子光栅近场范围,继而与光敏浮栅层直接耦合并被光敏浮栅层高效吸收,光敏浮栅层吸收各自光子后电势发生改变,进一步通过跨导效应在沟道层的电流信号中反映出光信号强度。因此,本发明综合利用了光栅结构的高效多光子耦合和筛选效率、以及光晶体管的跨导光电增益功能,实现了对多光子在单像元区域的高效高灵敏度同步探测,本发明突破了对每种单一光子探测效率小于1/n的极限,而且具有无需分光的优势,可在同一光敏探测区域同时进行多光子探测器件,在应用中无需对多种光子进行单独的光路校准。Compared with the prior art, the present invention adopts a multi-photon screening method. By setting a coupling grating layer with a photon screening function, it can simultaneously couple the incident multi-photons and compress them to different sub-grating near-field ranges respectively, and then directly couple with the photosensitive floating grating layer and be efficiently absorbed by the photosensitive floating grating layer. After the photosensitive floating grating layer absorbs each photon, the potential changes, and the intensity of the light signal is further reflected in the current signal of the channel layer through the transconductance effect. Therefore, the present invention comprehensively utilizes the efficient multi-photon coupling and screening efficiency of the grating structure and the transconductance photoelectric gain function of the phototransistor to achieve efficient and high-sensitivity synchronous detection of multi-photons in a single pixel area. The present invention breaks through the limit of less than 1/n detection efficiency for each single photon, and has the advantage of not requiring light splitting. Multi-photon detection devices can be performed simultaneously in the same photosensitive detection area, and there is no need to perform separate optical path calibration for multiple photons in the application.
此外,本发明采用具有跨导放大功能的光晶体管结构构造光敏浮栅层,可以同时实现多光子光电增益放大功能,实现单像元的多光子同步高灵敏检测;本发明采用现有成熟的材料和器件工艺,即可有效实现单片集成的多光子单像元探测器件。In addition, the present invention adopts a phototransistor structure with a transconductance amplification function to construct a photosensitive floating gate layer, which can simultaneously realize the multi-photon photoelectric gain amplification function and realize multi-photon synchronous high-sensitivity detection of a single pixel; the present invention adopts existing mature materials and device processes to effectively realize a monolithic integrated multi-photon single-pixel detection device.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
图1为实施例一中光子筛选型太赫兹光晶体管结构示意图;FIG1 is a schematic diagram of the structure of a photon screening terahertz optical transistor in Example 1;
图2为实施例一中光子筛选型光栅的典型频谱响应;FIG2 is a typical spectrum response of the photon screening grating in Example 1;
图3为实施例一中光子筛选型光栅的近场光场分布;FIG3 is a near-field light field distribution of the photon screening grating in Example 1;
图4为实施例二中设置有隔离栅的光子筛选型光栅示意图;FIG4 is a schematic diagram of a photon screening grating provided with an isolation grating in Embodiment 2;
图5为实施例三中二维光子筛选型光栅结构示意图;FIG5 is a schematic diagram of a two-dimensional photon screening grating structure in Embodiment 3;
图中标记说明:100、λ1光子对应子光栅,101、λ2光子对应子光栅,200、λ1光子对应光晶体管浮栅,201、λ2光子对应光晶体管浮栅,300、光晶体管沟道,301、光晶体管源极,302、光晶体管漏极,400、λ1光子对应子光栅重置电脉冲,401、λ2光子对应子光栅重置电脉冲。Explanation of the marks in the figure: 100, λ 1 photon corresponds to sub-grating, 101, λ 2 photon corresponds to sub-grating, 200, λ 1 photon corresponds to phototransistor floating gate, 201, λ 2 photon corresponds to phototransistor floating gate, 300, phototransistor channel, 301, phototransistor source, 302, phototransistor drain, 400, λ 1 photon corresponds to sub-grating reset electric pulse, 401, λ 2 photon corresponds to sub-grating reset electric pulse.
具体实施方式Detailed ways
下面结合附图和具体实施例对本发明进行详细说明。The present invention is described in detail below with reference to the accompanying drawings and specific embodiments.
实施例一Embodiment 1
如图1所示,一种光子筛选型太赫兹光晶体管,包括上中下相对设置的耦合光栅层(由λ1光子对应子光栅100和λ2光子对应子光栅101构成)、光敏浮栅层(由λ1光子对应光晶体管浮栅200和λ2光子对应光晶体管浮栅201构成)和沟道层(由光晶体沟道300、光晶体管源极301和光晶体管漏极302构成),上层的耦合光栅层包含可以耦合两种目标太赫兹光子(λ1光子和λ2光子)的子光栅结构(100和101),以分别耦合增强不同光子的近场光场;中层的光敏浮栅层(200和201)具有与耦合子光栅相对应的光敏特性,在吸收对应光子后电化学势发生改变,进而通过跨导效应改变下层沟道层的电导;下层的沟道层(300)的一端连接至源极(301),下层沟道层(300)的另一端连接至漏极(302)。As shown in FIG1 , a photon screening type terahertz optical transistor includes a coupling grating layer (composed of a sub-grating 100 corresponding to a λ 1 photon and a sub-grating 101 corresponding to a λ 2 photon) arranged in an upper, middle and lower direction, a photosensitive floating gate layer (composed of a phototransistor floating gate 200 corresponding to a λ 1 photon and a phototransistor floating gate 201 corresponding to a λ 2 photon) and a channel layer (composed of an optical crystal channel 300, a phototransistor source 301 and a phototransistor drain 302). The upper coupling grating layer includes a photosensitive floating gate 200 and a phototransistor source 301. 2 photons) to couple and enhance the near-field light fields of different photons respectively; the middle photosensitive floating gate layer (200 and 201) has photosensitive characteristics corresponding to the coupled sub-gratings, and the electrochemical potential changes after absorbing the corresponding photons, thereby changing the conductivity of the lower channel layer through the transconductance effect; one end of the lower channel layer (300) is connected to the source (301), and the other end of the lower channel layer (300) is connected to the drain (302).
在实际应用中,金属耦合光栅层选用具有多周期特征的周期性超材料结构,可以将不同的光子筛选并在空间上区分,从而实现光子(λ1)集中在子光栅(100)区域近场增强、实现光子(λ2)集中在子光栅(101)区域近场增强的耦合效果,采用具有超元胞结构的超材料耦合光栅,利用其与入射光子耦合后不同光子在超元胞周期内不同区域实现光场增强效应,使得器件的有效吸收截面显著增加,克服传统片外分光的复杂性和滤波型分光带来的探测效率损失,同时实现对多种光子的理想探测性能;In practical applications, the metal coupling grating layer uses a periodic metamaterial structure with multi-period characteristics, which can screen and spatially distinguish different photons, thereby achieving the coupling effect of photons (λ 1 ) being concentrated in the sub-grating (100) area for near-field enhancement and photons (λ 2 ) being concentrated in the sub-grating (101) area for near-field enhancement. A metamaterial coupling grating with a supercell structure is used to achieve the light field enhancement effect of different photons in different areas within the supercell period after coupling with the incident photons, so that the effective absorption cross section of the device is significantly increased, overcoming the complexity of traditional off-chip spectroscopy and the loss of detection efficiency caused by filter-type spectroscopy, while achieving ideal detection performance for multiple photons.
中层光敏浮栅层(200和201)处于子光栅(100和101)正下方近场范围内,可直接吸收光栅(100和101)耦合增强的光子(λ1和λ2),吸光后光敏浮栅层(200和201)的电势将发生改变;The middle photosensitive floating gate layer (200 and 201) is in the near field range directly below the sub-grating (100 and 101), and can directly absorb the photons (λ 1 and λ 2 ) coupled and enhanced by the grating (100 and 101). After the absorption, the potential of the photosensitive floating gate layer (200 and 201) will change;
中层的光敏浮栅层(200和201)与下层沟道(300)组成晶体管器件结构,并具有良好的跨导放大效应;The middle photosensitive floating gate layer (200 and 201) and the lower channel (300) form a transistor device structure and have a good transconductance amplification effect;
下层的沟道层(300)分别与源极(301)和漏极(302)相连,源极(301)和漏极(302)均为复合金属电极,可直接测量通过源极(301)和漏极(302)的电流,光敏浮栅层(200和201)吸光后电势改变可以通过晶体管结构的跨导效应改变通过源极(301)和漏极(302)的电流;The lower channel layer (300) is connected to the source (301) and the drain (302) respectively. The source (301) and the drain (302) are both composite metal electrodes. The current passing through the source (301) and the drain (302) can be directly measured. The potential change of the photosensitive floating gate layer (200 and 201) after absorbing light can change the current passing through the source (301) and the drain (302) through the transconductance effect of the transistor structure.
光敏浮栅层(200和201)中存在的光生载流子可以通过施加在子光栅(100和101)上的电脉冲(400和401)实现重置和初始化,对应光信号强度即可反映在源极(301)和漏极(302)电流在重置前和重置后的变化幅度。The photogenerated carriers in the photosensitive floating gate layer (200 and 201) can be reset and initialized by applying electric pulses (400 and 401) to the sub-gratings (100 and 101), and the corresponding light signal intensity can be reflected in the change amplitude of the source (301) and drain (302) current before and after the reset.
本实施例应用上述光子筛选型太赫兹光晶体管,进行多光子探测,主要包括以下过程:This embodiment uses the above-mentioned photon screening terahertz optical transistor to perform multi-photon detection, which mainly includes the following processes:
首先根据目标多光子设计具有对应多个子光栅结构的超元胞光栅结构,设计方法具体为电磁场数值计算模拟,包括有限时域差分方法和有限元法;Firstly, a super-cell grating structure with corresponding multiple sub-grating structures is designed according to the target multi-photon. The design method is specifically electromagnetic field numerical calculation simulation, including finite time-domain difference method and finite element method.
之后设计与上述光栅相匹配的具有对应太赫兹波段响应能力的光敏浮栅结构,并制作单片集成的光子筛选型太赫兹光晶体管器件结构,其中,设计方法具体是采用半导体能带工程设计方法;Then, a photosensitive floating gate structure having a corresponding terahertz band response capability matching the above grating is designed, and a monolithically integrated photon screening terahertz optical transistor device structure is manufactured, wherein the design method specifically adopts a semiconductor energy band engineering design method;
最后将源极和漏极外接电表,给源极接电势的同时检测通路电流;通过控制电脉冲发生器的输出,分别在子光栅(100和101)上施加不同时序的重置脉冲(400和401),根据源极(301)和漏极(302)电流的同步变化,即可读取出对应光子(λ1和λ2)的信号强度。Finally, the source and drain are connected to an external ammeter, and the source is connected to an electric potential while the path current is detected; by controlling the output of the electric pulse generator, reset pulses (400 and 401) with different timings are applied to the sub-gratings (100 and 101) respectively, and according to the synchronous changes of the source (301) and drain (302) currents, the signal strength of the corresponding photons (λ 1 and λ 2 ) can be read.
本实施例中,耦合光栅层(如图1中100和101)具有图2所示光谱响应,可实现对入射光束(λ1、λ2)的光子筛选功能,即将λ1光子筛选压缩至子光束100附近,将λ2光子筛选压缩至子光束101附近,光场分布如图3所示。图3结构示意图中箭头标识为光场增强的区域,场分布图给出了有限时域差分方法模拟得到的电场Ez分量的空间分布,由图可见,λ1光子被筛选后主要分布于子光栅100下,λ2光子被筛选后主要分布于子光栅101下。In this embodiment, the coupled grating layer (such as 100 and 101 in FIG. 1 ) has a spectral response as shown in FIG. 2 , and can realize the photon screening function of the incident light beam (λ 1 , λ 2 ), that is, the λ 1 photon is screened and compressed to the vicinity of the sub-beam 100, and the λ 2 photon is screened and compressed to the vicinity of the sub-beam 101. The light field distribution is shown in FIG. 3 . The arrow in the structural schematic diagram of FIG. 3 indicates the area where the light field is enhanced. The field distribution diagram shows the spatial distribution of the electric field E z component obtained by finite time-domain difference method simulation. It can be seen from the figure that after the λ 1 photon is screened, it is mainly distributed under the sub-grating 100, and after the λ 2 photon is screened, it is mainly distributed under the sub-grating 101.
本实施例中,金属耦合光栅100和101为5nm Ti/100nm Au复合层,光栅结构参数为(如图1所示):W1=1.0μm(子光栅100宽度),W2=1.6μm(子光栅101宽度);子光栅101之间的周期是D1=4.5μm,子光栅100和101中心间距分别为D2=3μm和D3=1.5μm;In this embodiment, the metal coupling gratings 100 and 101 are 5nm Ti/100nm Au composite layers, and the grating structure parameters are (as shown in FIG1 ): W 1 =1.0μm (width of sub-grating 100 ), W 2 =1.6μm (width of sub-grating 101 ); the period between sub-gratings 101 is D 1 =4.5μm, and the center spacings between sub-gratings 100 and 101 are D 2 =3μm and D 3 =1.5μm respectively;
金属耦合光栅100和101位于浮栅层200和201上方100nm的位置,浮栅层200和201为7nm砷化镓量子阱层,相邻浮栅之间的电学隔离可通过湿法和干法刻蚀实现;The metal coupling gratings 100 and 101 are located 100 nm above the floating gate layers 200 and 201. The floating gate layers 200 and 201 are 7 nm gallium arsenide quantum well layers. The electrical isolation between adjacent floating gates can be achieved by wet and dry etching.
浮栅层200和201位于沟道层300上方100nm的位置,与沟道形成电容耦合并具有跨导放大功能;The floating gate layers 200 and 201 are located 100 nm above the channel layer 300, forming capacitive coupling with the channel and having a transconductance amplification function;
耦合光栅层、浮栅层、沟道层之间由铝镓砷势垒层构成。An aluminum gallium arsenide barrier layer is formed between the coupling grating layer, the floating gate layer and the channel layer.
本实施例只针对λ1光子和λ2光子共两个光子进行探测,在实际应用中,可针对更多不同的目标光子进行探测,由此可知,本技术方案包括上中下相对设置的耦合光栅层、光敏浮栅层和沟道层,其中,上层的耦合光栅层包含可以耦合多种目标太赫兹光子的子光栅结构,能够分别耦合增强不同光子的近场光场;该过程可被看作入射光束中的多光子(λ1、λ2、…、λn)被自动筛选并压缩至各自的子光栅区域内,由于每种子光栅结构均具有亚波长特征(即:线宽<波长),因此其针对目标光子的有效探测截面积(σ有效)不再受限于子光栅本身的几何面积(σ几何),而是被子光栅的近场增强作用放大(设增强倍数为κ>>1),即σ有效=κσ几何。在优化设计的具有多周期结构的耦合光栅中,σ有效可无限接近探测器的光敏探测区域面积,即对入射在光敏探测区域的光子达到理想的接近100%的探测效率。特别值得注意的是,该过程和效率对入射光束中的每种光子均成立,因而可以同时实现每种光子的接近100%探测效率的理想探测,而不再受限于已公开技术的1/n探测效率上限。The present embodiment only detects two photons, namely, the λ 1 photon and the λ 2 photon. In practical applications, more different target photons can be detected. It can be seen that the present technical solution includes a coupling grating layer, a photosensitive floating grating layer and a channel layer which are relatively arranged at the upper, middle and lower parts. The coupling grating layer at the upper part includes a sub-grating structure which can couple a variety of target terahertz photons, and can couple and enhance the near-field light fields of different photons respectively. The process can be regarded as that the multi-photons (λ 1 , λ 2 , ..., λ n ) in the incident light beam are automatically screened and compressed into their respective sub-grating regions. Since each sub-grating structure has a sub-wavelength feature (i.e., line width < wavelength), its effective detection cross-sectional area (σ effective ) for the target photons is no longer limited by the geometric area (σ geometry ) of the sub-grating itself, but is amplified by the near-field enhancement effect of the sub-grating (assuming the enhancement factor is κ>>1), i.e., σ effective = κσ geometry . In the optimally designed coupled grating with a multi-period structure, σ can be infinitely close to the photosensitive detection area of the detector, that is, the detection efficiency of photons incident on the photosensitive detection area is close to 100%. It is particularly noteworthy that this process and efficiency are valid for each photon in the incident light beam, so the ideal detection of each photon with a detection efficiency close to 100% can be achieved at the same time, and it is no longer limited by the 1/n detection efficiency upper limit of the disclosed technology.
中层的光敏浮栅层则具有与耦合子光栅相对应的光敏特性,吸收对应光子后电化学势发生改变,进而通过跨导放大效应改变下层电导。The photosensitive floating gate layer in the middle layer has photosensitivity corresponding to the coupled sub-grating. After absorbing the corresponding photons, the electrochemical potential changes, thereby changing the conductivity of the lower layer through the transconductance amplification effect.
下层的沟道层的一端连接至源极、另一端连接至漏极,通过测量源极和漏极的电流,即可反映多光子(λ1、λ2、…、λn)对应的各自光强信息,为区分读出不同光子的信号,可对不同子光栅结构进行脉冲重置操作,在对第i个子光栅进行脉冲重置的同时,根据源极漏极电流的同步变化,即可读出λi光子的光信号强度。One end of the lower channel layer is connected to the source and the other end is connected to the drain. By measuring the current of the source and the drain, the light intensity information corresponding to the multiple photons (λ 1 , λ 2 , …, λ n ) can be reflected. In order to distinguish and read out the signals of different photons, pulse reset operations can be performed on different sub-grating structures. While the i-th sub-grating is pulse reset, the light signal intensity of the λ i photon can be read out according to the synchronous change of the source and drain currents.
实施例二Embodiment 2
为实现光敏浮栅层中各光晶体管浮栅之间的电学隔离,针对实施例一的结构,采用电容耦合切断浮栅200和浮栅201的方式,如图4所示,采用独立隔离栅并施加直流负偏压实现,独立隔离栅宽度约100nm,远远小于子光栅100和101的线宽,因而对光子筛选功能不产生显著影响。In order to realize electrical isolation between the floating gates of each phototransistor in the photosensitive floating gate layer, for the structure of the first embodiment, a capacitive coupling method is adopted to cut off the floating gate 200 and the floating gate 201, as shown in FIG4 , and an independent isolation gate is adopted and a negative DC bias is applied. The width of the independent isolation gate is about 100 nm, which is much smaller than the line width of the sub-gratings 100 and 101, and thus has no significant effect on the photon screening function.
实施例三Embodiment 3
本实施例为实现对4种不同目标光子(λ1、λ2、λ3、λ4)的太赫兹光子高灵敏探测,在平面二维尺度内采用超元胞机构,每个超元胞含有4个不同尺寸的共振结构(如图5所示)。In order to realize high-sensitivity detection of terahertz photons of four different target photons (λ 1 , λ 2 , λ 3 , λ 4 ), this embodiment adopts a supercell structure in a two-dimensional plane, and each supercell contains four resonant structures of different sizes (as shown in FIG. 5 ).
综上所述,将本技术方案应用于实际中(比如显微镜应用),只需对入射光束整体进行聚焦收集,而不需要考虑入射光束的不同光子组成;并从单一的器件可以在时序上分别获取多种光子对应的光信号强度信息。In summary, when the technical solution is applied in practice (such as microscope applications), it is only necessary to focus and collect the entire incident light beam without considering the different photon compositions of the incident light beam; and the light signal intensity information corresponding to multiple photons can be obtained from a single device in a time sequence.
本技术方案提出的一种光子筛选型太赫兹光晶体管,可突破现有多光子探测技术中对每种单一光子探测效率小于1/n极限,可在同一光敏探测区域同时进行多光子探测器件而无需预先进行空间分光,在应用中也无需对多种光子进行单独的光路优化校准;此外,采用具有跨导放大功能的光晶体管结构,可以同时实现多光子光电增益放大功能,从而实现单像元的多光子同步高灵敏检测;制作工艺方面,可采用成熟的材料和器件工艺,实现单片集成的多光子单像元探测器件。The photon screening terahertz optical transistor proposed in the technical solution can break through the limit of less than 1/n detection efficiency of each single photon in the existing multi-photon detection technology, and can simultaneously perform multi-photon detection devices in the same photosensitive detection area without the need for prior spatial splitting, and there is no need to perform separate optical path optimization calibration for multiple photons in the application; in addition, by adopting a phototransistor structure with a transconductance amplification function, the multi-photon photoelectric gain amplification function can be realized simultaneously, thereby realizing multi-photon synchronous high-sensitivity detection of single-pixel multi-photons; in terms of manufacturing process, mature materials and device processes can be used to realize monolithic integrated multi-photon single-pixel detection devices.
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CN111141702A (en) * | 2019-12-19 | 2020-05-12 | 天津大学 | High frequency resolution arrayed terahertz imaging system based on the principle of detection comb |
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CN111141702A (en) * | 2019-12-19 | 2020-05-12 | 天津大学 | High frequency resolution arrayed terahertz imaging system based on the principle of detection comb |
CN112436071A (en) * | 2020-11-02 | 2021-03-02 | 天津大学 | Silicon-based grating grid terahertz detector based on frequency selective surface |
Non-Patent Citations (1)
Title |
---|
Enhanced plasmonic resonant excitation in a grating gated field-effect transistor with supplemental gates;Nan Guo等;《OPTICS EXPRESS》;20130115;第21卷(第2期);全文 * |
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