CN114192482A - Cleaning system and cleaning method for gas nozzle - Google Patents
Cleaning system and cleaning method for gas nozzle Download PDFInfo
- Publication number
- CN114192482A CN114192482A CN202010991804.8A CN202010991804A CN114192482A CN 114192482 A CN114192482 A CN 114192482A CN 202010991804 A CN202010991804 A CN 202010991804A CN 114192482 A CN114192482 A CN 114192482A
- Authority
- CN
- China
- Prior art keywords
- gas
- cleaning
- ultrapure water
- cleaning liquid
- dry gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 166
- 238000000034 method Methods 0.000 title claims abstract description 32
- 229910021642 ultra pure water Inorganic materials 0.000 claims abstract description 59
- 239000012498 ultrapure water Substances 0.000 claims abstract description 59
- 239000007788 liquid Substances 0.000 claims abstract description 58
- 239000007789 gas Substances 0.000 claims description 149
- 239000012530 fluid Substances 0.000 claims description 17
- 238000001035 drying Methods 0.000 claims description 11
- 238000003860 storage Methods 0.000 claims description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 239000007921 spray Substances 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 238000007599 discharging Methods 0.000 claims description 2
- 238000011066 ex-situ storage Methods 0.000 abstract description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000001680 brushing effect Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 230000003670 easy-to-clean Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
- B05B15/50—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
- B05B15/55—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/004—Nozzle assemblies; Air knives; Air distributors; Blow boxes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
- B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
- B08B2203/0217—Use of a detergent in high pressure cleaners; arrangements for supplying the same
Abstract
The invention provides a cleaning system and a cleaning method of a gas nozzle, wherein the cleaning system comprises: a cleaning liquid supply module for supplying a cleaning liquid, an ultrapure water supply module for supplying ultrapure water, a dry gas supply module for supplying a dry gas, and a cleaning assembly for holding a gas shower to be cleaned during a cleaning process and passing the injected cleaning liquid, ultrapure water, and dry gas through-holes of the gas shower. The invention can realize the ex-situ automatic cleaning of the gas nozzle.
Description
Technical Field
The invention relates to the technical field of semiconductor equipment, in particular to a cleaning system and a cleaning method for a gas nozzle.
Background
In the field of microelectronic integrated circuit fabrication, plasma processing of semiconductor wafers is used in dielectric etching, metal etching, chemical vapor deposition, and other processes. Semiconductor processing equipment typically employs a gas Showerhead (Showerhead) to introduce process gases, typically located at the top of the reaction chamber, during the corresponding processing. Because the aperture of the gas nozzle is very small and the distance from the reaction platform in the reaction chamber is very close, when process gas or chemicals flow through the gas through holes in the gas nozzle, By-products (By-products) can be generated in the gas through holes of the gas nozzle under the influence of temperature or radio frequency plasma, so that the aperture becomes uneven, and further, the drift of process parameters is caused, and the process performance is influenced. Therefore, the gas shower head needs to be cleaned periodically.
At present, the surface of the gas nozzle is cleaned by manual brushing, but the gas nozzle is not easy to clean, and partial substances still remain in the gas through holes. And toxic substances and powder of chemical reaction may exist on the surface of the gas nozzle, which is harmful to human body. In view of the above problems, there is a need to provide a cleaning system for a gas nozzle, which can automatically clean the gas nozzle, save labor, and ensure the stability of the process.
Disclosure of Invention
In view of the above, the present invention provides a cleaning system and a cleaning method for a gas showerhead, which can realize ex-situ automatic cleaning of the gas showerhead.
In a first aspect, the present invention provides a system for cleaning a gas showerhead, the system comprising:
a cleaning liquid supply module for supplying a cleaning liquid;
an ultrapure water supply module for supplying ultrapure water;
a dry gas supply module for supplying a dry gas;
a cleaning assembly for holding a gas shower to be cleaned during a cleaning process and passing injected cleaning liquid, ultrapure water and dry gas through a gas through-hole of the gas shower, wherein the cleaning liquid supply module, the ultrapure water supply module and the dry gas supply module are each communicated with the cleaning assembly through a cleaning liquid supply line, an ultrapure water supply line and a dry gas supply line to inject cleaning liquid, ultrapure water and dry gas into the cleaning assembly, respectively.
Optionally, the cleaning assembly comprises:
the fixing part is connected with the gas nozzle and is used for fixing the gas nozzle;
an input part provided with a fluid inlet for injecting a cleaning liquid, ultrapure water and a dry gas;
an output section provided with a fluid outlet for outputting the injected cleaning liquid, ultrapure water and dry gas from the cleaning assembly to pass through a gas through-hole of a gas shower to be cleaned;
wherein, a fluid uniform cavity is formed between the input part and the output part, so that injected cleaning liquid, ultrapure water and dry gas are uniformly distributed on the whole surface of the output part.
Optionally, the cleaning liquid supply line, the ultrapure water supply line and the dry gas supply line are each provided with a corresponding control valve.
Optionally, the system further comprises: and the system controller is used for controlling control valves on the cleaning liquid supply pipeline, the ultrapure water supply pipeline and the drying gas supply pipeline so as to control the progress of the cleaning treatment.
Optionally, the system controller comprises a programmable logic controller for controlling the control valves as a whole.
Optionally, the cleaning assembly is sized and shaped to match the size and shape of the gas showerhead being cleaned.
Optionally, the drying gas is nitrogen (N)2) Or compressed air.
Optionally, the system further comprises:
a fluid storage tank for storing the cleaning liquid and the ultrapure water flown out from the cleaning assembly during the cleaning process;
and a discharge pipe for discharging the cleaning liquid and the ultrapure water obtained from the fluid storage tank.
In a second aspect, the present invention provides a method of cleaning a gas shower head, the method comprising:
supplying a cleaning liquid to the cleaning assembly through a cleaning liquid supply line such that the cleaning liquid passes through the gas through-holes of the gas shower, thereby cleaning the gas shower;
supplying ultrapure water to the cleaning assembly through an ultrapure water supply pipeline, so that the ultrapure water passes through the gas through hole of the gas spray head, and rinsing the gas spray head;
and supplying a dry gas to the cleaning assembly through a dry gas supply line so that the dry gas passes through the gas through holes of the gas shower head, thereby drying the gas shower head.
The cleaning system and the cleaning method for the gas nozzle provided by the invention can realize the ex-situ automatic cleaning of the gas nozzle, ensure the thorough cleaning of the interior of the gas through hole of the gas nozzle, prevent the problem of uneven technological parameters caused by the blockage of the through hole, shorten the cleaning time, rinse and dry the gas nozzle immediately after the cleaning solution finishes the cleaning procedure, and prevent the cleaning solution from etching the surface of the through hole of the gas nozzle.
Drawings
FIG. 1 is a schematic side view of a cleaning system for a gas showerhead provided in accordance with an embodiment of the present invention;
FIG. 2 is a schematic side view of a cleaning system for a gas showerhead provided in another embodiment of the present invention;
FIG. 3 is a schematic side view of a cleaning system for a gas showerhead provided in another embodiment of the present invention;
FIG. 4 is a schematic side view of a cleaning system for a gas showerhead provided in another embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The present embodiments provide a cleaning system for a gas showerhead for ex-situ cleaning of the gas showerhead. FIG. 1 is a schematic side view of a cleaning system of the present embodiment, which includes a cleaning assembly 101, a cleaning liquid supply module 102, an Ultra Pure Water (UPW) supply module 103, and a dry gas supply module 104, wherein the cleaning liquid supply module 102 communicates with the cleaning assembly 101 through a corresponding cleaning liquid supply line, the ultra pure water supply module 103 communicates with the cleaning assembly 101 through a corresponding ultra pure water supply line, the dry gas supply module 104 communicates with the cleaning assembly 101 through a corresponding dry gas supply line, the cleaning liquid supply module 102 is for supplying the cleaning assembly 101 with a cleaning liquid required during a cleaning process, the ultra pure water supply module 103 is for supplying the cleaning assembly 101 with ultra pure water required during the cleaning process, the dry gas supply module 104 is for supplying the cleaning assembly 101 with a dry gas required during the cleaning process, the cleaning assembly 101 serves to hold the gas shower 100 to be cleaned during a cleaning process and to pass injected cleaning liquid, ultrapure water and dry gas through the gas through-holes of the gas shower 100 to achieve cleaning, rinsing and drying of the gas shower.
Specifically, referring to fig. 1, the cleaning assembly 101 may include a fixing portion 1011, an input portion 1012, and an output portion 1013, the fixing portion 1011 being connected with the gas shower head 100 for fixing the gas shower head 100. The input 1012 is provided with a fluid inlet connected toAnd the outlet of the pipeline is used for injecting cleaning liquid, ultrapure water and dry gas. The output part 1013 is provided with a fluid outlet through which the injected cleaning liquid, ultrapure water, and dry gas are output from the cleaning assembly 101 to pass through the gas through-hole of the gas shower head to be cleaned. A fluid uniform chamber is formed between the input unit 1012 and the output unit 1013, so that the injected cleaning fluid, ultrapure water, and dry gas are uniformly distributed on the entire surface of the output unit 1013. In order for the cleaning assembly to hold the gas showerhead to be cleaned, the size and shape of the cleaning assembly 101 matches the size and shape of the gas showerhead 100 to be cleaned. In one embodiment, the drying gas may be nitrogen (N)2) Compressed air, etc.
In the specific implementation, the present invention does not specifically limit the specific implementation forms of the cleaning liquid supply line, the ultrapure water supply line and the dry gas supply line, and fig. 1 to 3 respectively show 3 possible pipeline connection forms. In fig. 1, the cleaning liquid supply line, the ultrapure water supply line and the dry gas supply line are collected into a main line, and then connected to the cleaning assembly 101 via a plurality of lines. In fig. 2, the cleaning liquid supply line, the ultrapure water supply line and the dry gas supply line are collected to the main line, and then directly connected to the cleaning assembly 101 by the main line. In fig. 3, a cleaning liquid supply line, an ultrapure water supply line and a dry gas supply line are each connected to the cleaning assembly 101. In any connection form, the cleaning liquid supply line, the ultrapure water supply line and the dry gas supply line are respectively provided with a corresponding control valve, so that the on-off of the lines can be controlled. Correspondingly, the cleaning system further includes a system controller (not shown) for controlling the control valves on the cleaning liquid supply line, the ultrapure water supply line and the dry gas supply line to control the progress of the cleaning process.
Generally, the system controller is designed to facilitate overall control and automation of the cleaning system, and typically includes a Central Processing Unit (CPU), memory, and support circuits (or I/O). In one embodiment, the system controller further comprises a Programmable Logic Controller (PLC) to control one or more modules of the cleaning system. With the cleaning system of the present embodiment, cleaning, rinsing, and drying of the gas shower head can be continuously performed until the gas shower head achieves a desired degree of cleanliness.
As shown in fig. 4, the cleaning system further includes a fluid storage tank 105 and a drain pipe 106, the fluid storage tank 105 being used to store the cleaning liquid and the ultrapure water flowing out of the cleaning assembly 101 during the cleaning process, and the drain pipe 106 being used to drain the cleaning liquid and the ultrapure water obtained from the fluid storage tank 105.
The cleaning system of the gas nozzle provided by the embodiment of the invention can realize the ex-situ automatic cleaning of the gas nozzle, ensure the thorough cleaning of the interior of the gas through hole of the gas nozzle, prevent the problem of uneven technological parameters caused by the blockage of the through hole, shorten the cleaning time, rinse and dry the gas nozzle immediately after the cleaning solution finishes the cleaning procedure, and prevent the cleaning solution from etching the surface of the through hole of the gas nozzle.
According to the cleaning system of the gas shower nozzle in the above embodiment, another embodiment of the present invention provides a cleaning method of a gas shower nozzle, which specifically includes the following steps:
firstly, supplying cleaning liquid to the cleaning assembly through a cleaning liquid supply pipeline, so that the cleaning liquid passes through the gas through holes of the gas nozzle to clean the gas nozzle;
then supplying ultrapure water to the cleaning assembly through an ultrapure water supply pipeline, so that the ultrapure water passes through the gas through hole of the gas nozzle to rinse the gas nozzle;
and finally, supplying the dry gas to the cleaning assembly through a dry gas supply pipeline, so that the dry gas passes through the gas through holes of the gas nozzle to dry the gas nozzle.
In one embodiment, the cleaning/rinsing/drying process is repeated cyclically until the gas shower achieves the desired cleanliness. The system controller opens the control valve of the cleaning liquid supply line when cleaning is performed, opens the control valve of the ultrapure water supply line when rinsing is performed, and opens the control valve of the dry gas supply line when drying is performed. It should be noted that the present invention is not limited to the above-described embodiments, and for example, the cleaning assembly may be simultaneously injected with the cleaning liquid and the nitrogen gas, or simultaneously injected with the cleaning liquid and the ultrapure water, or simultaneously injected with the cleaning liquid, the nitrogen gas, and the ultrapure water, which may be adjusted as needed.
It will be understood by those skilled in the art that all or part of the processes of the methods of the embodiments described above can be implemented by a computer program, which can be stored in a computer-readable storage medium, and when executed, can include the processes of the embodiments of the methods described above. The storage medium may be a magnetic disk, an optical disk, a Read-Only Memory (ROM), a Random Access Memory (RAM), or the like.
The above description is only for the specific embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention are included in the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.
Claims (9)
1. A system for cleaning a gas showerhead, the system comprising:
a cleaning liquid supply module for supplying a cleaning liquid;
an ultrapure water supply module for supplying ultrapure water;
a dry gas supply module for supplying a dry gas;
a cleaning assembly for holding a gas shower to be cleaned during a cleaning process and passing injected cleaning liquid, ultrapure water and dry gas through a gas through-hole of the gas shower, wherein the cleaning liquid supply module, the ultrapure water supply module and the dry gas supply module are each communicated with the cleaning assembly through a cleaning liquid supply line, an ultrapure water supply line and a dry gas supply line to inject cleaning liquid, ultrapure water and dry gas into the cleaning assembly, respectively.
2. The system of claim 1, wherein the cleaning assembly comprises:
the fixing part is connected with the gas nozzle and is used for fixing the gas nozzle;
an input part provided with a fluid inlet for injecting a cleaning liquid, ultrapure water and a dry gas;
an output section provided with a fluid outlet for outputting the injected cleaning liquid, ultrapure water and dry gas from the cleaning assembly to pass through a gas through-hole of a gas shower to be cleaned;
wherein, a fluid uniform cavity is formed between the input part and the output part, so that injected cleaning liquid, ultrapure water and dry gas are uniformly distributed on the whole surface of the output part.
3. The system of claim 1, wherein the cleaning liquid supply line, the ultrapure water supply line and the dry gas supply line are each provided with a corresponding control valve.
4. The system of claim 3, further comprising: and the system controller is used for controlling control valves on the cleaning liquid supply pipeline, the ultrapure water supply pipeline and the drying gas supply pipeline so as to control the progress of the cleaning treatment.
5. The system of claim 4, wherein the system controller comprises a programmable logic controller for overall control of each control valve.
6. The system of claim 1, wherein the cleaning assembly is sized and shaped to match a size and shape of a gas showerhead being cleaned.
7. According to the rightThe system of claim 1, wherein the drying gas is nitrogen (N)2) Or compressed air.
8. The system of claim 1, further comprising:
a fluid storage tank for storing the cleaning liquid and the ultrapure water flown out from the cleaning assembly during the cleaning process;
and a discharge pipe for discharging the cleaning liquid and the ultrapure water obtained from the fluid storage tank.
9. A method of cleaning a gas showerhead based on the system of claim 1, the method comprising:
supplying a cleaning liquid to the cleaning assembly through a cleaning liquid supply line such that the cleaning liquid passes through the gas through-holes of the gas shower, thereby cleaning the gas shower;
supplying ultrapure water to the cleaning assembly through an ultrapure water supply pipeline, so that the ultrapure water passes through the gas through hole of the gas spray head, and rinsing the gas spray head;
and supplying a dry gas to the cleaning assembly through a dry gas supply line so that the dry gas passes through the gas through holes of the gas shower head, thereby drying the gas shower head.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010991804.8A CN114192482A (en) | 2020-09-18 | 2020-09-18 | Cleaning system and cleaning method for gas nozzle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010991804.8A CN114192482A (en) | 2020-09-18 | 2020-09-18 | Cleaning system and cleaning method for gas nozzle |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114192482A true CN114192482A (en) | 2022-03-18 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010991804.8A Pending CN114192482A (en) | 2020-09-18 | 2020-09-18 | Cleaning system and cleaning method for gas nozzle |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114192482A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202219208U (en) * | 2011-06-05 | 2012-05-16 | 张燕琴 | Shower having cleaning function |
| CN105546776A (en) * | 2016-01-26 | 2016-05-04 | 太仓苏晟电气技术科技有限公司 | Environment-friendly air conditioner with high cleanliness |
| CN106944281A (en) * | 2017-02-28 | 2017-07-14 | 朱石明 | A kind of automatic liquid matching formula oil stain cleaning device |
| CN107264039A (en) * | 2017-06-30 | 2017-10-20 | 联想(北京)有限公司 | A kind of cleaning control method of printing device and shower nozzle |
| CN207224578U (en) * | 2017-09-15 | 2018-04-13 | 四川梦之兰文化传媒有限公司 | 3D printing device with sprayer cleaning device |
| JP3222948U (en) * | 2019-04-24 | 2019-09-05 | エスピージープリンツ・ベー・フェー | Ink jet printer having print head cleaning device |
-
2020
- 2020-09-18 CN CN202010991804.8A patent/CN114192482A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202219208U (en) * | 2011-06-05 | 2012-05-16 | 张燕琴 | Shower having cleaning function |
| CN105546776A (en) * | 2016-01-26 | 2016-05-04 | 太仓苏晟电气技术科技有限公司 | Environment-friendly air conditioner with high cleanliness |
| CN106944281A (en) * | 2017-02-28 | 2017-07-14 | 朱石明 | A kind of automatic liquid matching formula oil stain cleaning device |
| CN107264039A (en) * | 2017-06-30 | 2017-10-20 | 联想(北京)有限公司 | A kind of cleaning control method of printing device and shower nozzle |
| CN207224578U (en) * | 2017-09-15 | 2018-04-13 | 四川梦之兰文化传媒有限公司 | 3D printing device with sprayer cleaning device |
| JP3222948U (en) * | 2019-04-24 | 2019-09-05 | エスピージープリンツ・ベー・フェー | Ink jet printer having print head cleaning device |
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Application publication date: 20220318 |
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