CN114185445A - Metal grid, touch panel and manufacturing method thereof - Google Patents

Metal grid, touch panel and manufacturing method thereof Download PDF

Info

Publication number
CN114185445A
CN114185445A CN202010960588.0A CN202010960588A CN114185445A CN 114185445 A CN114185445 A CN 114185445A CN 202010960588 A CN202010960588 A CN 202010960588A CN 114185445 A CN114185445 A CN 114185445A
Authority
CN
China
Prior art keywords
line segment
compensation
width
metal
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN202010960588.0A
Other languages
Chinese (zh)
Other versions
CN114185445B (en
Inventor
黄仲坚
周玫伶
陈智伟
刘家宇
陈铭良
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hannstar Display Corp
Original Assignee
Hannstar Display Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hannstar Display Corp filed Critical Hannstar Display Corp
Priority to CN202010960588.0A priority Critical patent/CN114185445B/en
Publication of CN114185445A publication Critical patent/CN114185445A/en
Application granted granted Critical
Publication of CN114185445B publication Critical patent/CN114185445B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0416Control or interface arrangements specially adapted for digitisers
    • G06F3/0418Control or interface arrangements specially adapted for digitisers for error correction or compensation, e.g. based on parallax, calibration or alignment
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)

Abstract

The invention discloses a metal grid, a touch panel and a manufacturing method thereof, wherein the manufacturing method of the touch panel comprises the following steps: providing a substrate, and forming a metal layer on the substrate; and patterning the metal layer through a mask. The mask has a grid pattern including a first line segment and a second line segment, the two line segments intersecting each other at an intersection. The grid pattern further includes a first compensation pattern and a second compensation pattern, the first compensation pattern is located on the first line segment and separated from the intersection point by a first distance, the second compensation pattern is located on the second line segment and separated from the intersection point by a second distance, the width of the first compensation pattern in the vertical first direction is larger than that of the first line segment in the vertical first direction, and the width of the second compensation pattern in the vertical second direction is larger than that of the second line segment in the vertical second direction. Thereby, it is possible to avoid the formation of broken lines in the vicinity of the intersections when the mesh pattern is formed.

Description

Metal grid, touch panel and manufacturing method thereof
Technical Field
The invention relates to a manufacturing method of a touch panel, which also comprises a metal grid and the touch panel provided with the metal grid.
Background
The use of metal grids in the field of touch panels has been increasingly adopted by users. FIG. 1 is a diagram of a metal mesh mask according to the prior art. FIG. 2 is a partial schematic view of the metal mesh mask after fabrication. Referring to fig. 1 and 2, fig. 1 is a diagram illustrating a photomask 100 according to the prior art, which is exposed and developed to form a photoresist layer, and a metal layer is etched according to the photoresist layer to form a metal grid 200 of fig. 2. The mask 100 includes line segments 111 and 112 intersecting each other, but due to diffraction, the exposure energy near the intersection point is insufficient, so that the metal mesh 200 is broken in the area 201 near the intersection point. How to solve this problem is an issue of concern to those skilled in the art.
Disclosure of Invention
To solve the above problems, an embodiment of the present invention provides a method for manufacturing a touch panel, including: providing a substrate; forming a metal layer on the substrate; and patterning the metal layer through a mask. The mask has a grid pattern, the grid pattern includes a first line segment and a second line segment, the first line segment extends along a first direction, the second line segment extends along a second direction, an included angle is formed between the first direction and the second direction, and the first line segment and the second line segment intersect at an intersection point. The grid pattern further includes a first compensation pattern and a second compensation pattern, the first compensation pattern is located on the first line segment and separated from the intersection point by a first distance, the second compensation pattern is located on the second line segment and separated from the intersection point by a second distance, the width of the first compensation pattern in the vertical first direction is larger than that of the first line segment in the vertical first direction, and the width of the second compensation pattern in the vertical second direction is larger than that of the second line segment in the vertical second direction.
In some embodiments, the first distance or the second distance is no less than 2.5 microns and no greater than 7.5 microns apart from the intersection point.
In some embodiments, the width of the first compensation pattern in the vertical first direction is 20% to 40% greater than the width of the first line segment in the vertical first direction, and the width of the second compensation pattern in the vertical second direction is 20% to 40% greater than the width of the second line segment in the vertical second direction.
In some embodiments, the length of the first compensation portion in the first direction is equal to or greater than 20 micrometers and equal to or less than 40 micrometers, and the length of the second compensation portion in the second direction is equal to or greater than 20 micrometers and equal to or less than 40 micrometers.
In some embodiments, the included angle is less than or equal to 90 degrees, the included angle is inversely proportional to the length of the first compensation pattern in the first direction, and the included angle is inversely proportional to the length of the second compensation pattern in the second direction.
In some embodiments, the included angle is less than or equal to 90 degrees, the included angle is in direct proportion to the width of the first compensation pattern in the first direction, and the included angle is in direct proportion to the width of the second compensation pattern in the second direction.
In some embodiments, the first and second compensation patterns are octagonal or elliptical.
In some embodiments, the width of the first compensation pattern in the vertical first direction is 10% to 30% greater than the width of the first line segment in the vertical first direction, and the width of the second compensation pattern in the vertical second direction is 10% to 30% greater than the width of the second line segment in the vertical second direction.
In another aspect, an embodiment of the invention also provides a metal grid for a touch panel. The metal grid comprises a first metal line segment and a second metal line segment. The first metal line segment extends along a first direction and comprises a first straight line part and a first compensation part. The second metal line segment extends along a second direction, wherein an included angle is formed between the first direction and the second direction, and the second metal line segment comprises a second straight line part and a second compensation part. The first metal line segment intersects the second metal line segment at an intersection point, the first compensation portion being spaced apart from the intersection point by a first distance, and the second compensation portion being spaced apart from the intersection point by a second distance. The width of the first compensation portion in the vertical first direction is larger than that of the first straight portion in the vertical first direction, and the width of the second compensation portion in the vertical second direction is larger than that of the second straight portion in the vertical second direction.
In another aspect, the present invention also provides a touch panel, which includes a substrate and a metal grid formed on the substrate. The metal grid comprises a first metal line segment and a second metal line segment. The first metal line segment extends along a first direction and comprises a first straight line part and a first compensation part. The second metal line segment extends along a second direction, wherein an included angle is formed between the first direction and the second direction, and the second metal line segment comprises a second straight line part and a second compensation part. The first metal line segment intersects the second metal line segment at an intersection point, the first compensation portion being spaced apart from the intersection point by a first distance, and the second compensation portion being spaced apart from the intersection point by a second distance. The width of the first compensation portion in the vertical first direction is larger than that of the first straight portion in the vertical first direction, and the width of the second compensation portion in the vertical second direction is larger than that of the second straight portion in the vertical second direction.
Compared with the prior art, the metal grid, the touch panel and the manufacturing method thereof have the beneficial effect that the broken lines can be avoided being formed near the cross points when the grid pattern is manufactured.
In order to make the aforementioned and other features and advantages of the invention more comprehensible, embodiments accompanied with figures are described in detail below.
Drawings
FIG. 1 is a diagram of a metal mesh mask according to the prior art.
FIG. 2 is a schematic diagram of a metal grid fabricated according to the metal grid mask described above.
Fig. 3 is a flowchart illustrating a manufacturing process of a touch panel according to an embodiment.
FIG. 4 is a schematic diagram of a mask according to one embodiment.
Fig. 5A to 5C are top views of a metal grid according to an embodiment.
Fig. 5D is a schematic diagram illustrating a formed metal mesh according to an embodiment.
Fig. 6 is a side view of a touch panel according to an embodiment.
Description of the main reference numerals:
100-a photomask; 111, 112-line segment; 200-a metal grid; 201-region; 340-a mask; 310-a substrate; 320-a metal layer; 330,331, 332-a photoresist layer; 321, 322-metal line segment; 410-a grid pattern; 421-a first line segment; 422-second line segment; 430-cross points; 441, 442-first compensation pattern; 451,452 — a second compensation pattern; d 1-first distance; d 2-second distance; d1-first direction; d2-second direction; w1, w2, wc1, wc 2-width; l1, L2-length; theta-included angle; 501-504-metal grids; 510-a first metal line segment; 511-a first straight section; 512-first compensation part; 520-a second metal line segment; 521-a second straight section; 522-a second compensation portion; 530-intersection point; d3, d 4-distance; wc3, wc4, w3, w 4-width; l3, L4-length; 610-a substrate; 620-metal mesh.
Detailed Description
As used herein, the terms "first," "second," and the like, do not denote any particular order or order, but rather are used to distinguish one element from another or from another. In addition, it should be understood by those skilled in the art that the grid patterns or metal grids illustrated in the present invention are partially schematic views, which are mainly used to highlight the technical features of the present invention, so that the grid patterns or metal grids are simplified as shown in the drawings.
Fig. 3 is a flowchart illustrating a manufacturing process of a touch panel according to an embodiment. Referring to fig. 3, a substrate 310 is provided, and a metal layer 320 is formed on the substrate 310, for example, by chemical vapor deposition, physical vapor deposition, sputtering, evaporation, and the like, but the invention is not limited thereto. A photoresist layer 330 is then coated on the metal layer 320. The photoresist layer 330 is then exposed through a mask 340, and developed to obtain exposed photoresist layers 331 and 332. The metal layer 320 is then etched to remove the metal layer 320 not covered by the photoresist layers 331 and 332, leaving the metal line segments 321 and 322. Finally, the photoresist layers 331 and 332 are removed. The steps of coating a photoresist layer, exposing, developing, etching, etc. are collectively referred to as "patterning". In this embodiment, the metal layer 320 is patterned by a mask 340, the mask 340 comprising a transparent substrate and a patterned absorber layer. The transparent substrate may use fused silica (SiO2), such as borosilicate glass or soda lime glass. The absorber layer may include a metal film, such as chromium (Cr), for absorbing radiation, and may be patterned to form one or more openings in the metal film through which radiation may pass. In some embodiments, when an extreme ultraviolet source is employed, the mask 340 may also include one or more reflective mechanisms. The pattern on the mask 340 will be described in detail below.
FIG. 4 is a schematic diagram of a mask according to one embodiment. Referring to fig. 4, the mask 340 has a grid pattern 410, and the grid pattern 410 includes a first line 421 and a second line 422. The first line segment 421 extends along the first direction D1, the second line segment 422 extends along the second direction D2, the first line segment 421 and the second line segment 422 intersect at the intersection 430, and an included angle θ between the first direction D1 and the second direction D2 is smaller than or equal to 90 degrees, and generally, the included angle θ is between 45 degrees and 90 degrees. The grid pattern 410 can be repeatedly arranged, that is, the mask 340 has a plurality of first segments 421 parallel to each other and a plurality of second segments 422 parallel to each other, and the first segments 421 intersect with the second segments 422.
Specifically, the grid pattern 410 further includes first compensation patterns 441 and 442 and second compensation patterns 451 and 452. The first compensation pattern 441 is located on the first line segment 421 and spaced apart from the intersection 430 by a first distance d1. The first compensation pattern 442 is also located on the first line 421, but on the other side of the intersection 430, and the first compensation pattern 442 is also spaced apart from the intersection 430 by the first distance d1(the distance between the first compensation pattern 442 and the intersection 430 is not labeled for simplicity). The second compensation pattern 451 is located at the second line segment 422 and spaced apart from the crossing point 430 by a second distance d2The second compensation pattern 452 is also located at the second line segment 422 but at the other side of the intersection 430, and the second compensation pattern 452 is also spaced apart from the intersection 430 by a second distance d2(the distance between the second compensation pattern 452 and the intersection 430 is not marked for simplicity), the first distance d1Or a second distance d2The length of the cross points 430 is not less than 2.5 microns and not more than 7.5 microns apart, or 2 to 6 times the line width can be achieved by an etch exposure tool. A first compensation pattern 441,442 in a perpendicular first direction D1c1Is larger than the width w of the first line segment 421 in the vertical first direction D11A width w of the second compensation pattern 451,452 in a perpendicular second direction D2c2Is larger than the width w of the second segment 422 in the vertical second direction D22. In some embodiments, the width wc1Specific width w120 to 40% more, width wc2Specific width w2The addition amount is 20 to 40 percent.
If the photoresist layer is a positive photoresist layer, the first line 421, the second line 422, the first compensation patterns 441,442 and the second compensation patterns 451,452 are the patterned absorption layer. If a negative photoresist layer is used, the first line 421, the second line 422, the first compensation patterns 441,442 and the second compensation patterns 451,452 are openings in the absorption layer. In fig. 4, the line segments and the compensation patterns are separately illustrated for clarity, and in reality, the line segments and the compensation patterns are continuous absorption layers or openings. Due to the additional arrangement of the compensation pattern, the formed metal grid has no problem of broken lines.
In some embodiments, the length L of the first compensation pattern 441 in the first direction D1120 μm or more, and the length L of the second compensation pattern 451 in the second direction D2220 microns or more, and generally, a length L1Or length L2Also less than or equal to 40 microns. However, the problem of light diffraction becomes more serious as the angle θ is smaller, and thus a longer compensation pattern is required. Specifically, the included angle θ and the length L1In inverse proportion to the angle theta and the length L2In an inverse relationship. In addition, as the included angle θ is smaller, the first compensation pattern 441 is more likely to contact the second compensation pattern 451, and thus the width w must be shortenedc1、wc2. In some embodiments, the included angle θ and the width wc1In direct proportion, the included angle theta is also related to the width wc2In direct proportion.
In the embodiment of fig. 4, the first compensation patterns 441,442 and the second compensation patterns 451,452 are octagonal, but may be other polygons, ellipses or any shapes in other embodiments, which is not limited in the invention.
Fig. 5A to 5C are top views of a metal grid according to an embodiment. Fig. 5D is a schematic diagram illustrating a formed metal mesh according to an embodiment. Referring to fig. 5A to 5D, the mask 340 may form metal grids 501 to 503, wherein an included angle between two metal line segments in the metal grid 501 in fig. 5A is 50 degrees, an included angle between two metal line segments in the metal grid 502 in fig. 5B is 70 degrees, and an included angle between two metal line segments in the metal grid 503 in fig. 5C is 90 degrees. The following description is continued by taking the metal mesh 504 in fig. 5D as an example.
The metal grid 504 includes a first metal line 510 and a second metal line 520, the first metal line 510 extends along a first direction D1, the second metal line 520 extends along a second direction D2, and an included angle θ is formed between the first direction D1 and the second direction D2. The first metal line segment 510 intersects the second metal line segment 520 at an intersection 530. The first metal line segment 510 includes a first straight portion 511 and a first compensation portion 512, the first compensation portion 512 being separated by a distance d from the intersection 5303. The second wire segment 520 includes a second straight portion 521 and a second compensating portion 522, the second compensating portion 522 being spaced apart from the intersection 530 by a distance d4The above distance d3And a distance d4The length of the cross points 530 is not less than 2.5 microns and not more than 7.5 microns, or 2 to 6 times the line width can be achieved by an etching exposure tool.
The width w of the first compensation portion 512 in the perpendicular first direction D1c3Is larger than the width w of the first straight portion 511 in the vertical first direction D13Width w of the second compensation portion 522 in the perpendicular second direction D2c4Is larger than the width w of the second straight line portion 521 in the vertical second direction4. In some embodiments, the width wc3Specific width w320 to 40% more, width wc4Specific width w4The addition amount is 20 to 40 percent. In some embodiments, the width wc3Specific width w310% to 30% more, width wc4Specific width w410 to 30 percent more. In some embodiments, the length L3 of the first compensation portion 512 in the first direction D1 is greater than or equal to 20And micron, the length L4 of the second compensation part 522 in the second direction D2 is greater than or equal to 20 microns. And, in general, the length L3 or the length L4 is also less than or equal to 40 microns.
Fig. 6 is a side view of a touch panel according to an embodiment. The touch panel includes a substrate 610 and a metal grid 620. The metal grids 620 are, for example, the metal grids 501 to 504 described above. Examples of the material of the substrate 610 include glass, polymer (polymer), polyethylene terephthalate (PET), Polycarbonate (PC), Polyethersulfone (PES), triacetyl cellulose (TAC), polymethyl methacrylate (PMMA), Polyethylene (PMMA), cycloolefin polymer (COP), Polyimide (PI), or a composite material of Polycarbonate (PC) and polymethyl methacrylate (PMMA), and the like, but the present invention is not limited thereto. The material of the metal mesh may comprise aluminum, molybdenum, chromium, nickel, tungsten, copper, silver or any suitable metal.
Although the present invention has been described with reference to the above embodiments, it should be understood that various changes and modifications can be made therein by those skilled in the art without departing from the spirit and scope of the invention.

Claims (10)

1. A method for manufacturing a touch panel, comprising:
providing a substrate;
forming a metal layer on the substrate; and
patterning the metal layer through a mask, wherein the mask has a grid pattern including a first line segment and a second line segment, the first line segment extends along a first direction, the second line segment extends along a second direction, and an included angle is formed between the first direction and the second direction, the first line segment and the second line segment intersect at an intersection point, the grid pattern further includes a first compensation pattern and a second compensation pattern, the first compensation pattern is located at the first line segment and spaced apart from the intersection by a first distance, the second compensation pattern is located at the second line segment and spaced apart from the intersection by a second distance, the width of the first compensation pattern in the direction perpendicular to the first direction is greater than the width of the first line segment in the direction perpendicular to the first direction, the width of the second compensation pattern in the direction perpendicular to the second direction is larger than the width of the second line segment in the direction perpendicular to the second direction.
2. The method of manufacturing of claim 1, wherein the first distance or the second distance is not less than 2.5 microns and not more than 7.5 microns apart by the length of the intersection.
3. The manufacturing method of claim 1, wherein the width of the first compensation pattern in a direction perpendicular to the first direction is 20% to 40% greater than the width of the first line segment in the direction perpendicular to the first direction, and the width of the second compensation pattern in a direction perpendicular to the second direction is 20% to 40% greater than the width of the second line segment in the direction perpendicular to the second direction.
4. The manufacturing method according to claim 1, wherein a length of the first compensation pattern in the first direction is 20 micrometers or more and 40 micrometers or less, and a length of the second compensation pattern in the second direction is 20 micrometers or more and 40 micrometers or less.
5. The method of manufacturing according to claim 1, wherein the included angle is 90 degrees or less, the included angle being inversely proportional to a length of the first compensation pattern in the first direction, and the included angle being inversely proportional to a length of the second compensation pattern in the second direction.
6. The method of claim 1, wherein the included angle is equal to or less than 90 degrees, the included angle is proportional to the width of the first compensation pattern in the direction perpendicular to the first direction, and the included angle is proportional to the width of the second compensation pattern in the direction perpendicular to the second direction.
7. The method of manufacturing according to claim 1, wherein the first compensation and the second compensation patterns are octagonal or elliptical.
8. The manufacturing method of claim 1, wherein the width of the first compensation pattern in a direction perpendicular to the first direction is 10% to 30% greater than the width of the first line segment in the direction perpendicular to the first direction, and the width of the second compensation pattern in a direction perpendicular to the second direction is 10% to 30% greater than the width of the second line segment in the direction perpendicular to the second direction.
9. A metal grid for a touch panel, the metal grid comprising:
the first metal line segment extends along a first direction, wherein the first metal line segment comprises a first straight part and a first compensation part; and
a second metal line segment extending along a second direction, wherein an included angle is formed between the first direction and the second direction, the second metal line segment comprises a second straight line part and a second compensation part,
wherein the first metal line segment intersects the second metal line segment at an intersection, the first compensation portion is spaced apart from the intersection by a first distance, the second compensation portion is spaced apart from the intersection by a second distance, a width of the first compensation portion in a direction perpendicular to the first direction is greater than a width of the first straight portion in the direction perpendicular to the first direction, and a width of the second compensation portion in the direction perpendicular to the second direction is greater than a width of the second straight portion in the direction perpendicular to the second direction.
10. A touch panel, comprising:
a substrate; and
a metal mesh formed on the substrate, the metal mesh comprising:
the first metal line segment extends along a first direction, wherein the first metal line segment comprises a first straight part and a first compensation part; and
a second metal line segment extending along a second direction, wherein an included angle is formed between the first direction and the second direction, the second metal line segment comprises a second straight line part and a second compensation part,
wherein the first metal line segment intersects the second metal line segment at an intersection, the first compensation portion is spaced apart from the intersection by a first distance, the second compensation portion is spaced apart from the intersection by a second distance, a width of the first compensation portion in a direction perpendicular to the first direction is greater than a width of the first straight portion in the direction perpendicular to the first direction, and a width of the second compensation portion in the direction perpendicular to the second direction is greater than a width of the second straight portion in the direction perpendicular to the second direction.
CN202010960588.0A 2020-09-14 2020-09-14 Metal grid, touch panel and manufacturing method thereof Active CN114185445B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010960588.0A CN114185445B (en) 2020-09-14 2020-09-14 Metal grid, touch panel and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010960588.0A CN114185445B (en) 2020-09-14 2020-09-14 Metal grid, touch panel and manufacturing method thereof

Publications (2)

Publication Number Publication Date
CN114185445A true CN114185445A (en) 2022-03-15
CN114185445B CN114185445B (en) 2024-05-07

Family

ID=80601246

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010960588.0A Active CN114185445B (en) 2020-09-14 2020-09-14 Metal grid, touch panel and manufacturing method thereof

Country Status (1)

Country Link
CN (1) CN114185445B (en)

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013246723A (en) * 2012-05-28 2013-12-09 Mitsubishi Paper Mills Ltd Light-transmissive electrode for capacitance touch panel
JP2015143978A (en) * 2013-12-26 2015-08-06 大日本印刷株式会社 Touch panel sensor, touch panel device, display device, and method for manufacturing touch panel sensor
US20170168608A1 (en) * 2015-12-11 2017-06-15 Samsung Display Co., Ltd. Touch screen panel, method of manufacturing touch screen panel, and touch display device including touch screen panel
JP2018081485A (en) * 2016-11-16 2018-05-24 凸版印刷株式会社 Electrode for touch sensor, touch panel, and display device
CN207833472U (en) * 2017-11-30 2018-09-07 昆山工研院新型平板显示技术中心有限公司 A kind of touch panel and touch control display apparatus
JP2018206348A (en) * 2017-06-01 2018-12-27 エルジー ディスプレイ カンパニー リミテッド Touch display device, touch display panel and production method of touch display panel
CN209086887U (en) * 2018-11-29 2019-07-09 信利光电股份有限公司 A kind of metal grill touch screen
CN209086888U (en) * 2018-11-29 2019-07-09 信利光电股份有限公司 A kind of metal grill touch screen
CN110442265A (en) * 2019-07-29 2019-11-12 深圳莱宝高科技股份有限公司 Network and touch screen with it

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013246723A (en) * 2012-05-28 2013-12-09 Mitsubishi Paper Mills Ltd Light-transmissive electrode for capacitance touch panel
JP2015143978A (en) * 2013-12-26 2015-08-06 大日本印刷株式会社 Touch panel sensor, touch panel device, display device, and method for manufacturing touch panel sensor
US20170168608A1 (en) * 2015-12-11 2017-06-15 Samsung Display Co., Ltd. Touch screen panel, method of manufacturing touch screen panel, and touch display device including touch screen panel
JP2018081485A (en) * 2016-11-16 2018-05-24 凸版印刷株式会社 Electrode for touch sensor, touch panel, and display device
JP2018206348A (en) * 2017-06-01 2018-12-27 エルジー ディスプレイ カンパニー リミテッド Touch display device, touch display panel and production method of touch display panel
CN207833472U (en) * 2017-11-30 2018-09-07 昆山工研院新型平板显示技术中心有限公司 A kind of touch panel and touch control display apparatus
CN209086887U (en) * 2018-11-29 2019-07-09 信利光电股份有限公司 A kind of metal grill touch screen
CN209086888U (en) * 2018-11-29 2019-07-09 信利光电股份有限公司 A kind of metal grill touch screen
CN110442265A (en) * 2019-07-29 2019-11-12 深圳莱宝高科技股份有限公司 Network and touch screen with it

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
王莉: "手机触摸屏触控传感电路印制", 《丝网印刷》, no. 7, 15 April 2017 (2017-04-15), pages 17 - 20 *

Also Published As

Publication number Publication date
CN114185445B (en) 2024-05-07

Similar Documents

Publication Publication Date Title
TWI610150B (en) Method for manufacturing conductive mesh pattern, mesh electrode manufactured by the method and laminate
JP3105234B2 (en) Method for manufacturing semiconductor device
KR102304206B1 (en) Photomask and method for manufacturing display device
US7250248B2 (en) Method for forming pattern using a photomask
KR101895122B1 (en) Method of manufacturing a photomask, a photomask and method of manufacturing a display device
TWI512391B (en) A manufacturing method of an electronic device, a manufacturing method of a display device, a method of manufacturing a mask, and a mask
TWI621907B (en) Photomask, method of manufacturing a photomask, photomask blank and method of manufacturing a display device
KR102207837B1 (en) Method for correcting photomask, method for manufacturing photomask, photomask, and method for manufacturing display device
CN105319833A (en) Mask for photolithography, method of manufacturing same, and method of manufacturing substrate using same
CN114185445B (en) Metal grid, touch panel and manufacturing method thereof
KR20210011481A (en) Photomask for use in manufacturing a display device and method of manufacturing a display device
US8765328B2 (en) Exposure mask and method for manufacturing same and method for manufacturing semiconductor device
US6528216B2 (en) Phase shift mask and fabrication method thereof
JP5891406B2 (en) Photomask, pattern forming method using the same, and exposure apparatus
JP2013104960A (en) Photomask and exposure method
CN103969941A (en) Mask as well as preparation method and graphing method thereof
KR101374923B1 (en) Photomask and fabrication method therefor, pattern transfer method, and pellicle
TW200933223A (en) Method for preparing photonic crystal slab waveguides
JP4912648B2 (en) Optical sheet manufacturing method and optical sheet
KR20110052516A (en) Method of manufacturing multi-gray scale photomask and multi-gray scale photomask
CN113835545A (en) Photomask and electronic device
JP2010175597A (en) Photomask, method for manufacturing color filter, color filter, and liquid crystal display device
JP2014191323A (en) Photomask for proximity exposure and pattern exposure method using the same
JP2015072945A (en) Method for manufacturing conductive mesh sheet, and photomask
JP2023030871A (en) Photomask, method for producing photonic crystal, method for producing phononic crystal, and method for producing meta-surface

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant