CN114138128B - Transparent electrode assembly, device and preparation method of transparent electrode assembly - Google Patents
Transparent electrode assembly, device and preparation method of transparent electrode assembly Download PDFInfo
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Classifications
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/13338—Input devices, e.g. touch panels
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/40—OLEDs integrated with touch screens
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Theoretical Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Human Computer Interaction (AREA)
- Mathematical Physics (AREA)
- Non-Insulated Conductors (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
The invention relates to the technical field of electrodes, and provides a transparent electrode assembly, a device and a preparation method of the transparent electrode assembly, wherein the transparent electrode assembly comprises: a transparent base layer; the transparent electrode is arranged on the surface of the basal layer through the patterned transparent electrode; the shadow eliminating layer is made of a photochromic material and comprises a first shadow eliminating area and a second shadow eliminating area, wherein the first shadow eliminating area is arranged on the surface of the transparent electrode, which is opposite to the basal layer, and the second shadow eliminating area is arranged between the etched transparent electrodes and is positioned on the surface of the basal layer. The preparation method comprises the following steps: setting a shadow eliminating layer on the surface of the patterned transparent electrode, wherein the shadow eliminating layer is made of a photochromic material; and irradiating the side of the transparent electrode, which is away from the shadow eliminating layer, by adopting a spectrum with a preset wave band, so that the shadow eliminating layer changes color under the action of the spectrum, and a first shadow eliminating area and a second shadow eliminating area are formed to obtain the transparent electrode assembly. The invention can make the transmittance of the transparent electrode assembly to the spectrum the same, thereby achieving the purpose of eliminating shadow.
Description
Technical Field
The invention relates to the technical field of electrodes, in particular to a transparent electrode assembly, a device and a preparation method of the transparent electrode assembly.
Background
Along with the development of display technology, the development of displays is also called day-to-day, for example, in the structure of a touch screen, the surface of the display screen is further provided with a structure requiring electric conduction so as to realize a touch function. These structures will more or less absorb or reflect the luminescence, have an influence on the luminescence efficiency and even the display effect, and it is necessary to use a conductive material having a high transmittance. For example, a metal oxide film represented by an Indium Tin Oxide (ITO) film doped with tin is widely used in commercial applications.
However, in the process of manufacturing the touch screen, the electrode structure needs to be patterned to meet design requirements, and the patterning can cause the light transmittance of each part of the electrode structure to be changed, so that the light transmittance of each part is different, bottom shadows of the electrodes are easy to appear, and the overall transparent effect is affected.
Disclosure of Invention
The invention aims to provide a transparent electrode assembly, which solves the technical problems that in the prior art, bottom shadow of an electrode is easy to appear and the whole transparent effect is influenced due to patterning.
To achieve the above object, a first aspect of the present invention provides a transparent electrode assembly, comprising:
A transparent base layer;
the patterned transparent electrode is arranged on the surface of the basal layer;
The shadow eliminating layer is made of a photochromic material and comprises a first shadow eliminating area and a second shadow eliminating area, the first shadow eliminating area is arranged on the surface of the transparent electrode, which is opposite to the substrate layer, and the second shadow eliminating area is arranged between the etched transparent electrodes and is positioned on the surface of the substrate layer.
In one embodiment, the second vanishing region is formed by the photochromic material after being irradiated with a spectrum of a predetermined wavelength band.
In one embodiment, the spectrum is ultraviolet light.
In one embodiment, the second vanishing region has a lower light transmittance than the first vanishing region.
In one embodiment, the photochromic material is a conjugated organic molecular material.
In one embodiment, the conjugated organic molecular material comprises at least one of the following materials: conjugated diolefins, alpha, beta unsaturated aldehyde ketones, styrene, acetophenones.
In one embodiment, the thickness of the first vanishing region is 200 nm to 1000 nm;
the thickness of the second vanishing area is 200-1000 nanometers.
In one embodiment, the first vanishing region has a light transmittance of 86-90%;
The light transmittance of the second vanishing area is 86-90%.
In one embodiment, the transparent electrode includes:
the first transparent medium layer is arranged on the surface of the basal layer;
the second transparent medium layer is arranged between the first transparent medium layer and the shadow eliminating layer;
The conductive unit is arranged between the first transparent medium layer and the second transparent medium layer and comprises at least two transparent conductive layers and a third transparent medium layer, and the third transparent medium layer is arranged between every two adjacent conductive layers.
In one embodiment, the conductive layer is made of a metallic material including at least one of silver, gold, copper, aluminum;
Or an alloy containing at least one metal selected from silver, gold, copper and aluminum as a main component.
In one embodiment, the conductive layer has a thickness in the range of 2 to 25 nanometers.
In one embodiment, the transparent electrode has a light transmittance of 40% to 90% and a resistance of 0.05 to 20 ohm/square.
In one embodiment, the transparent electrode further comprises a transparent outer conductive layer;
the surface of the second transparent medium layer, which is opposite to one side of the conductive unit, is provided with the outer conductive layer;
and/or the surface of the first transparent medium layer, which is back to one side of the conductive unit, is provided with the outer conductive layer.
The transparent electrode assembly provided by the invention has the beneficial effects that: according to the embodiment of the invention, the first vanishing area and the second vanishing area are respectively arranged, so that the transmittance of the whole transparent electrode assembly to spectrum (such as visible light) is the same, and when the transparent electrode assembly is watched from the vanishing layer side, the bottom shadow of the transparent electrode is not watched, thereby achieving the purpose of vanishing.
In a second aspect of the present invention, there is provided a device comprising the transparent electrode assembly described above.
In one embodiment, the device is a display device comprising a liquid crystal display, an OLED display, a projection display, a flat panel display, an eyewear display, a transparent display, or a see-through display.
In one embodiment, the device is a touch device.
In one embodiment, the device is a transparent antenna adapted for use in a 4G communication band and/or a 5G communication band and/or a 6G communication band.
In a third aspect of the present invention, there is provided a transparent electrode assembly manufacturing method, comprising:
setting a shadow eliminating layer on the surface of the patterned transparent electrode, wherein the shadow eliminating layer is made of a photochromic material;
The transparent electrode is irradiated by a spectrum of a preset wave band at one side of the transparent electrode, which is opposite to the shadow eliminating layer, so that the shadow eliminating layer changes color under the action of the spectrum, a first shadow eliminating area and a second shadow eliminating area are formed to obtain a transparent electrode assembly, wherein the first shadow eliminating area is arranged on the surface of the transparent electrode, which is opposite to the substrate layer, and the second shadow eliminating area is arranged between the etched transparent electrodes and is positioned on the surface of the substrate layer.
In one embodiment, the spectrum is ultraviolet light.
In one embodiment, the photochromic material is a conjugated organic molecular material.
The preparation method of the transparent electrode assembly provided by the invention has the beneficial effects that: according to the embodiment of the invention, the shadow eliminating layer is arranged on the surface of the patterned transparent electrode, and the shadow eliminating layer is irradiated from the side opposite to the shadow eliminating layer through the spectrum of the preset wave band, so that the structure of the shadow eliminating layer is changed, a first shadow eliminating area and a second shadow eliminating area with different transmittances are formed, the transmittance of the whole transparent electrode assembly to the spectrum is the same, and the bottom shadow of the transparent electrode is not observed when the transparent electrode assembly is watched from the shadow eliminating layer side, so that the shadow eliminating purpose is achieved.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are needed in the embodiments or the description of the prior art will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and that other drawings can be obtained according to these drawings without inventive effort for a person skilled in the art.
Fig. 1 is a schematic structural view of a transparent electrode assembly according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of a first transparent electrode in a transparent electrode assembly according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of a second transparent electrode in a transparent electrode assembly according to an embodiment of the present invention;
FIG. 4 is a schematic structural view of a third transparent electrode in a transparent electrode assembly according to an embodiment of the present invention;
FIG. 5 is a schematic structural view of a fourth transparent electrode in the transparent electrode assembly according to the embodiment of the present invention;
FIG. 6 is a schematic flow chart of a method for preparing a transparent electrode assembly according to an embodiment of the present invention;
fig. 7 is a schematic view illustrating formation of a transparent electrode assembly according to a method for manufacturing a transparent electrode assembly according to an embodiment of the present invention.
Detailed Description
In order to make the technical problems, technical schemes and beneficial effects to be solved more clear, the invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the invention.
It will be understood that when an element is referred to as being "mounted" or "disposed" on another element, it can be directly or indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly or indirectly connected to the other element. The directions or positions indicated by the terms "upper", "lower", "left", "right", "front", "rear", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. are directions or positions based on the drawings, and are merely for convenience of description and are not to be construed as limiting the present technical solution. The terms "first," "second," and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features. The meaning of "a plurality of" is two or more, unless specifically defined otherwise.
Referring to fig. 1, an objective of the present invention is to provide a transparent electrode assembly, which includes a transparent substrate layer 10, a patterned transparent electrode 20 and a shadow layer 30. The patterned transparent electrode 20 is disposed on the surface of the substrate layer 10, the shadow-eliminating layer 30 is made of a photochromic material, and includes a first shadow-eliminating region 301 and a second shadow-eliminating region 302, the first shadow-eliminating region 301 is disposed on the surface of the transparent electrode 20 facing away from the substrate layer 10, and the second shadow-eliminating region 302 is disposed between the etched transparent electrodes 20 and on the surface of the substrate layer 10.
In this embodiment, the substrate layer 10 is made of a transparent material that has a high light transmittance, thereby ensuring that the electromagnetic spectrum can pass through the transparent electrode. During the patterning process, a portion of the transparent electrode 20 is etched to form a predetermined pattern; by laying a layer of photochromic material on the surface of the transparent electrode 20 to form a shadow eliminating layer, a part of the photochromic material will be filled in the etched position of the transparent electrode 20, the part corresponding to the etched position is a second shadow eliminating area 302, and the part arranged on the surface of the unetched transparent electrode 20 is a first shadow eliminating area 301.
In this embodiment, by providing the first vanishing region 301 and the second vanishing region 302 respectively, the transmittance of the entire transparent electrode assembly for spectrum (e.g. visible light) is the same, and when viewing from the vanishing layer 30 side, the bottom shadow of the transparent electrode 20 is not observed, so as to achieve the purpose of vanishing shadow. The transparent electrode assembly provided in this embodiment may be applied to various fields, for example, may be applied to a display field, and may have a good display effect due to a good shadow eliminating effect.
Further, in order to ensure that the image erasing layer 30 can achieve a good image erasing effect, the transmittance of the image erasing layer 30 needs to be adjusted. Since the shadow eliminating layer 30 is made of a photochromic material, when the shadow eliminating layer 30 is irradiated by a spectrum of a preset wave band, the irradiated part of the shadow eliminating layer 30 changes, and the color of the part is deepened, so that the transmittance of light passing through the part is reduced; while the non-irradiated portions will not change. In this embodiment, the spectrum of the light irradiated to the shadow layer 30 is ultraviolet light, and the transparent electrode 20 can absorb the ultraviolet light effectively, so that the ultraviolet light cannot penetrate to reach the first shadow layer 301; the etched portion of the transparent electrode 20 cannot absorb the ultraviolet light, so that the ultraviolet light can be irradiated to the second shadow layer 302, and the second shadow layer 302 is changed. Of course, in other embodiments, depending on the photochromic material, the shadow layer 30 may be irradiated by other bands of spectrum. It will be appreciated that the specific wavelength range of the spectrum may be adjusted accordingly for different photochromic materials.
Further, the light transmittance of the first and second vanishing areas 301 and 302 is different. In consideration of the absorption effect of the transparent electrode 20 on the spectrum, in the patterned transparent electrode 20, the transmittance of the transparent electrode at the non-etched portion is smaller than that of the transparent electrode at the etched portion, so that the transmittance of the transparent electrode needs to be adjusted, and the transmittance of each portion of the transparent electrode assembly can be made to be consistent by adjusting the transmittance of the second vanishing region 302 to be smaller than that of the first vanishing region 301, so as to play a role in vanishing.
Furthermore, the photochromic material is a conjugated organic molecular material, so that a good shadow eliminating effect can be achieved. The conjugated organic molecular material comprises at least one of the following materials: conjugated diolefins, alpha, beta unsaturated aldehyde ketones, styrene, acetophenones. When ultraviolet light meeting the conditions is absorbed by the conjugated organic molecular material, the molecular structure of the ultraviolet light is changed, so that the properties such as light transmittance of the ultraviolet light are changed, and the purpose of adjusting the light transmittance is achieved. In this embodiment, the light transmittance of the first vanishing area is 86-90%, and the light transmittance of the second vanishing area is 86-90%. Of course, in other embodiments, the light transmittance of the first and second vanishing regions may also be other values, not limited to the above.
In order to achieve better shadow eliminating effect, the thickness of the first shadow eliminating area is 200 nm-1000 nm, and the thickness of the second shadow eliminating area is 200 nm-1000 nm. Of course, in other embodiments, the thicknesses of the first and second vanishing regions may also be other values, and are not limited to the above.
Referring to fig. 2, further, the transparent electrode 20 includes a first transparent dielectric layer 21, a conductive unit 22, and a second transparent dielectric layer 23 stacked together. The first transparent dielectric layer 21 is disposed on the surface of the substrate layer 10, the second transparent dielectric layer 23 is disposed between the first transparent dielectric layer 21 and the shadow eliminating layer 30, and the conductive unit 22 is disposed between the first transparent dielectric layer 21 and the second transparent dielectric layer 23. The conductive unit 22 includes at least two transparent conductive layers 221 and a third transparent dielectric layer 222, and the third transparent dielectric layer 222 is disposed between two adjacent conductive layers 221.
In the present embodiment, the base layer 10, the dielectric layer of the transparent electrode (including the first transparent dielectric layer 21, the second transparent dielectric layer 23, and the third transparent dielectric layer 222), and the conductive layer 221 are all made of transparent materials, which have high light transmittance, so as to ensure that the electromagnetic spectrum can pass through the transparent electrode. Furthermore, at least two conductive layers 221 are disposed in the conductive unit 22, which can improve light transmittance and reduce resistance of the transparent electrode, thereby facilitating transmission of electrical signals.
The transparent electrode provided by the embodiment can meet the requirements of low resistance and high light transmittance. Specifically, in this embodiment, a conductive unit is disposed between two transparent dielectric layers, at least two conductive layers are disposed in the conductive unit, and electrical isolation is achieved between two adjacent conductive layers through a transparent dielectric layer. Since the conductive unit comprises a plurality of conductive layers, the conductive unit can be regarded as a special one-dimensional photonic crystal structure, partial reflection and partial transmission of light can occur at each interface, and constructive interference of transmitted light can effectively enhance the overall transmission of the laminated layers in the whole transparent electrode, so that the light transmittance can be improved. Therefore, by arranging a plurality of conductive layers, the thickness of each conductive layer can be reduced, the conductive performance of the transparent electrode can be ensured, the loss of electromagnetic spectrum when the electromagnetic spectrum passes through the conductive unit can be effectively reduced, and the light transmittance is improved.
It should be understood that the number of conductive layers 221 in the conductive element 22 may be set as desired, and several alternatives are given herein.
Referring to fig. 2, in one embodiment, the number of the conductive layers 221 is two, the number of the third transparent dielectric layers 222 is one, the third transparent dielectric layers 222 are disposed between the two conductive layers 221, and the two conductive layers 221 are respectively connected to the first transparent dielectric layer 21 and the second transparent dielectric layer 23. The transparent electrode is in a layered structure, and comprises the following layers in sequence: a first transparent dielectric layer 21, a conductive layer 221, a third transparent dielectric layer 222, a conductive layer 221, and a second transparent dielectric layer 23. The thickness of each conductive layer can be reduced when two conductive layers are used, compared with when one conductive layer is used, so that the entire light transmittance is improved while ensuring low resistance.
Referring to fig. 3, in one embodiment, the number of the conductive layers 221 is three, the number of the third transparent dielectric layers 222 is two, a third transparent dielectric layer 222 is disposed between two adjacent conductive layers 221, and the two conductive layers 221 disposed on two sides are respectively connected to the first transparent dielectric layer 21 and the second transparent dielectric layer 23. The transparent electrode is in a layered structure, and comprises the following layers in sequence: the first transparent dielectric layer 21, the conductive layer 221, the third transparent dielectric layer 222, the conductive layer 221, and the second transparent dielectric layer 23. The thickness of each conductive layer can be further reduced when three conductive layers are used, compared with when one conductive layer is used, so that the entire light transmittance is improved while ensuring low resistance.
Referring to fig. 4, in one embodiment, the number of the conductive layers 221 is four, the number of the third transparent dielectric layers 222 is three, a third transparent dielectric layer 222 is disposed between two adjacent conductive layers 221, and two conductive layers 221 disposed on two sides are respectively connected to the first transparent dielectric layer 21 and the second transparent dielectric layer 23. The transparent electrode is in a layered structure, and comprises the following layers in sequence: the first transparent dielectric layer 21, the conductive layer 221, the third transparent dielectric layer 222, the conductive layer 221, and the second transparent dielectric layer 23. The thickness of each conductive layer can be further reduced when four conductive layers are used, compared with when one conductive layer is used, so that the entire light transmittance is improved while ensuring low resistance.
Of course, in other embodiments, the number of the conductive layers 221 in the conductive unit 22 may be more than four, which is not limited to the above-mentioned case, but is not limited thereto.
Further, the material of the conductive layer 221 may be selected as needed. In order to ensure the conductive performance of the conductive layer, the conductive layer 221 is made of a metal material in this embodiment. The specific type of the metal material may be selected according to the need, and may be, for example, silver (Ag), aluminum (Al), gold (Au), copper (Cu), titanium (Ti), nickel (Ni), chromium (Cr), magnesium (Mg), tantalum (Ta), or the like, which may be a certain metal; an alloy containing at least one metal selected from silver, gold, copper, and aluminum as a main component may be used, and other metals (e.g., nickel, palladium, and tungsten) may be included in the alloy.
For example, the conductive layer 221 is made of a single metal such as metallic silver, and has good conductivity and light transmittance. It should be understood that the multiple conductive layers 221 in the conductive unit 22 may be made of the same metal material (e.g., both made of metallic silver), or may be made of different metal materials (e.g., one conductive layer 221 is made of metallic silver, another conductive layer 221 is made of metallic aluminum, another conductive layer 221 is made of metallic copper, etc.), which is not limited herein. In consideration of the actual process, all of the conductive layers 221 may be selectively made of the same metal material.
For another example, the conductive layer 221 may further include two metals, for example, the conductive layer 221 may include a first metal and a second metal, wherein the first metal is silver, gold or copper, the second metal is aluminum (Al), titanium (Ti), nickel (Ni), chromium (Cr), magnesium (Mg), copper (Cu) or tantalum (Ta), and the ratio of the first metal to the second metal may be adjusted as required to improve the grain size and the surface flatness, so that the transmittance and the resistance of the transparent electrode may be further adjusted to meet various performance requirements. It should be understood that the multiple conductive layers 221 in the conductive unit 22 may be made of the same metal combination (e.g., the first metal is silver, the second metal is aluminum), or may be made of different metal combinations (e.g., the first metal of one conductive layer 221 is silver, the second metal is aluminum, the first metal of another conductive layer 221 is silver, the second metal is titanium, the first metal of another conductive layer 221 is silver, the second metal is nickel, etc.), which is not limited herein. In consideration of the actual process, all of the conductive layers 221 may be selectively formed using the same metal combination.
Further, the materials for forming the dielectric layers (including the first transparent dielectric layer 21, the second transparent dielectric layer 23, and the third transparent dielectric layer 222) may be selected according to the needs. For example, the dielectric layer may be made of an inorganic material, such as Si 3N4、AlN、MoO3, znSe, znS, znTe, IGZO, gaN, etc.; may be made of a metal oxide, for example Ta2O5、ZnO、ITO、AZO、TiO2、TeO2、WO3、NiO,HfO2、Al2O3、SiO2、VO2、V2O5、GeO2、SiO、ZrO2、Y2Os、Yb2O3, and may contain one or a mixture of two or more kinds thereof; it can also be made of organic materials, such as conductive polymer materials, including at least poly (3, 4-ethylenedioxythiophene): one of Poly (styrenesulfonic acid) (PEDOT: PSS), polyaniline (polyandine), polypyrrole (Poly (pprole)) and polythiophene (Polythiophene).
It should be understood that the different dielectric layers may be made of the same type of material (e.g., the first transparent dielectric layer 21, the second transparent dielectric layer 23, and the third transparent dielectric layer 222 may each be made of an inorganic material, a metal oxide, or an organic material), or may be made of different materials (e.g., the first transparent dielectric layer 21 is made of an inorganic material, the second transparent dielectric layer 23 is made of a metal oxide, and the third transparent dielectric layer 222 is made of an organic material). When the number of the third transparent dielectric layers 222 is two or more, the plurality of third transparent dielectric layers 222 may be made of the same material (for example, the plurality of third transparent dielectric layers 222 are all made of ZnO), or may be made of different materials (for example, one third transparent dielectric layer 222 is made of ZnO, another third transparent dielectric layer 222 is made of Al 2O3, etc.), which is not limited herein.
Further, the base layer 10 may be made of different types of transparent materials according to the use scene. In one embodiment, the substrate layer 10 may be made of a rigid transparent material, such as glass, fused silica, al 2O3, etc., where the transparent electrode may be used in a conventional display and electronic device, etc., where the display or electronic device, etc., does not need to be bent, so that the substrate layer 10 may perform a good supporting and fixing function on the dielectric layer and the conductive layer thereon. When the transparent electrode is to be used in a flexible device, the substrate layer 10 may be made of a flexible transparent material, such as PET, PEN, COP, CPI, PC. At the moment, the transparent electrode can have good flexibility, can be bent along with the bending of the flexible device, and meets the use requirement of the flexible device.
In one embodiment, the thickness of the base layer 10 is: 5-500 micrometers (for example, 10-200 micrometers) so as to have good supporting and fixing effects on other layers in the transparent electrode and good light transmittance. For example, when the base layer 10 is Fused Silica (Fused Silica), the thickness thereof may be set to 50-500 μm.
Further, the thickness of each layer in the transparent electrode may be set as needed.
In one embodiment, the thickness of the conductive layer 221 ranges from 2 to 25 nanometers (e.g., may range from 4 to 15 nanometers), so that good conductive properties and light transmittance of the conductive layer 221 can be ensured. It will be appreciated that as the number of conductive layers 221 increases, the thickness of each conductive layer 221 may be reduced. For example, when the number of the conductive layers 221 is two, the thickness of each conductive layer 221 may be set to 20 nm; when the number of the conductive layers 221 is increased to three, the thickness of each conductive layer 221 may be set to 13 nm; when the number of the conductive layers 221 is increased to four, the thickness of each conductive layer 221 may be set to 10 nanometers. Of course, in one transparent electrode, the thickness of each conductive layer 221 may be set to be the same or may be set to be different, which is not limited herein.
In one embodiment, the thickness of the first transparent dielectric layer 21 ranges from 30 nm to 120 nm, so that the first transparent dielectric layer 21 can have a good protection effect and an electrical isolation effect on the conductive layer 221, and has a good light transmittance. It is understood that the thickness of the first transparent dielectric layer 21 may be different depending on the conductive unit 22. For example, when the number of the conductive layers 221 is two, the thickness of the first transparent dielectric layer 21 may be set to 44 nanometers; when the number of the conductive layers 221 is three, the thickness of the first transparent dielectric layer 21 may be set to 42 nm; when the number of the conductive layers 221 is four, the thickness of the first transparent dielectric layer 21 may be set to 40 nm. Of course, in other embodiments, the thickness of the first transparent dielectric layer 21 may be set to be the same for different conductive units 22, which is not limited herein.
In one embodiment, the thickness of the second transparent dielectric layer 23 ranges from 30 nm to 120 nm, so that the second transparent dielectric layer 23 can have a good protection effect and an electrical isolation effect on the conductive layer 221, and has a good light transmittance. It is understood that the thickness of the second transparent dielectric layer 23 may be different depending on the conductive unit 22. For example, when the number of the conductive layers 221 is two, the thickness of the second transparent dielectric layer 23 may be set to 45 nanometers; when the number of the conductive layers 221 is three, the thickness of the second transparent dielectric layer 23 may be set to 43 nm; when the number of the conductive layers 221 is four, the thickness of the second transparent dielectric layer 23 may be set to 41 nm. Of course, in other embodiments, the thickness of the second transparent dielectric layer 23 may be set to be the same for different conductive units 22, which is not limited herein.
In one embodiment, the thickness of the third transparent dielectric layer 222 ranges from 30 nm to 120 nm, so that the third transparent dielectric layer 222 can have a good protection effect and an electrical isolation effect on the conductive layer 221, and has a good light transmittance. It is understood that the thickness of the third transparent dielectric layer 222 may be different depending on the conductive layer 221 in the conductive unit 22. For example, when the number of the conductive layers 221 is two, the number of the third transparent dielectric layers 222 is one, and the thickness thereof may be set to 101 nm; when the number of the conductive layers 221 is three, the number of the third transparent dielectric layers 222 is two, and each layer may be set to 98 nm in thickness; when the number of the conductive layers 221 is four, the number of the third transparent dielectric layers 222 is three, and each layer may be set to 90 nm in thickness.
It should be understood that when the number of the third transparent dielectric layers 222 is more than two, the thickness of each third transparent dielectric layer 222 may be set to be different. For example, when the number of the conductive layers 221 is three, the number of the third transparent dielectric layers 222 is two, wherein the thickness of one layer may be set to 98 nm and the thickness of the other layer may be set to 101 nm; when the number of the conductive layers 221 is four, the number of the third transparent dielectric layers 222 is three, wherein one layer may be 88 nm thick, another layer may be 91 nm thick, and another layer may be 94 nm thick.
In the preparation of the conductive layer 221, the metal conductive layer 221 may be formed on the surface of the third transparent dielectric layer 222 by a Physical Vapor Deposition (PVD) process, a Chemical Vapor Deposition (CVD) process, a sputtering process, an Atomic Layer Deposition (ALD) process, or the like. When the metal in the conductive layer 221 is two or more kinds, the conductive layer can be formed by co-deposition, which is performed by PVD sputtering, such as magnetron sputtering, thermal evaporation, electron beam evaporation, or the like.
The transparent electrode provided in this embodiment preferably has a wavelength of 380nm to 780nm in the electromagnetic spectrum, and a light transmittance range of 40% to 90%. For example, for a selected target wavelength or wavelength range of the electromagnetic spectrum (which may be polarized or unpolarized), its light transmittance may be greater than or equal to 40%, or greater than or equal to 50%, or greater than or equal to 55%, or greater than or equal to 60%, or greater than or equal to 65%, or greater than or equal to 70%, or greater than or equal to 75%, or greater than or equal to 80%, or greater than or equal to 85%, or greater than or equal to 90%. Of course, in some embodiments, the transmittance may be higher for a selected target wavelength of the electromagnetic spectrum. The dielectric layer in the transparent electrode can absorb ultraviolet light, thereby making the ultraviolet light impermeable. Of course, the electromagnetic spectrum transmitted by the transparent electrode can be visible light+infrared light, and can be adjusted according to different application scenes.
The transparent electrode provided in this embodiment has a reflectivity in the range of 50% to 90% for electromagnetic spectrum outside the selected wavelength range. For example, the reflectivity may be greater than or equal to 50%, or greater than or equal to 55%, or greater than or equal to 60%, or greater than or equal to 65%, or greater than or equal to 70%, or greater than or equal to 75%, or greater than or equal to 80%, or greater than or equal to 85%, or greater than or equal to 90% for a target wavelength or range of wavelengths outside of the selected electromagnetic spectrum. Of course, in some embodiments, the reflectivity may be higher for target wavelengths outside of the selected electromagnetic spectrum.
The transparent electrode provided in this embodiment has a resistance in the range of 0.05 to 20 ohms/square (for example, may be 0.5 to 20 ohms/square). For example, the sheet resistance (SHEET RESISTANCE) of the transparent electrode is less than or equal to about 20 ohms/square, or less than or equal to about 15 ohms/square, or less than or equal to about 10 ohms/square, or less than or equal to about 5 ohms/square, or less than or equal to about 4 ohms/square, or less than or equal to about 3 ohms/square, or less than or equal to about 2 ohms/square, or less than or equal to about 1 ohm/square, or less than or equal to about 0.5 ohms/square, or less than or equal to about 0.1 ohms/square, or less than or equal to about 0.05 ohms/square.
Referring to fig. 5, further, in order to further improve the conductivity of the transparent electrode, the transparent electrode further includes a transparent outer conductive layer 24, and the outer conductive layer 24 is disposed on a surface of the second transparent dielectric layer 23 opposite to the conductive unit 22, which may be used to assist the conductive layer 221 in the conductive unit 22. Of course, the surface of the first transparent dielectric layer 20 facing away from the conductive unit 22 may also be provided with an outer conductive layer 24, which further assists the conductive layer 221 in the conductive unit 22.
In one embodiment, the outer conductive layer 24 may be made of a metal mesh material, and the metal may be gold, silver, or the like, and may include one metal, or may include two or more metals. In the preparation of the outer conductive layer 24, the metal outer conductive layer 24 may be formed on the surface of the second transparent dielectric layer 23 or the first transparent dielectric layer 20 by a Physical Vapor Deposition (PVD) process, a Chemical Vapor Deposition (CVD) process, an Atomic Layer Deposition (ALD) process, or the like. When the metal in the outer conductive layer 24 is two or more, it may be prepared by co-deposition by PVD sputtering, such as magnetron sputtering, thermal evaporation, electron beam evaporation, or the like. It may also be formed on the surface of the second transparent dielectric layer 23 or the first transparent dielectric layer 20 by coating.
In one embodiment, the outer conductive layer 24 may also be made of carbon nanotubes, which have good light transmittance, while also meeting the requirements of conductive properties.
In other embodiments, the outer conductive layer 24 may also be made of other materials, and is not limited to the above.
In one embodiment, the thickness of the outer conductive layer 24 ranges from 0.1 to 5 microns, so that good electrical conductivity and light transmittance of the outer conductive layer 24 can be ensured.
It is also an object of this embodiment to provide a device comprising at least one transparent electrode assembly as described above. The transparent electrode assembly provided by the present embodiments can be used in a variety of optical and photonic applications where current transparent conductors, such as ITO, can be replaced. Compared with the device adopting the ITO electrode, the device adopting the transparent electrode assembly provided by the embodiment has obviously improved bending capability and stability, and can well eliminate shadow, thereby having good display effect.
In one embodiment, the device is a display device, including a Liquid Crystal Display (LCD), an OLED display, a projection display (e.g., using digital mirror technology or liquid crystal on silicon (LCoS)), a flat panel display, an eye-worn display, a transparent display, or a see-through display, etc., and the transparent electrode assembly may be applied as a conductor in the display. It should be understood that the display may also be a display with touch functionality, such as a touch screen of an electronic device.
In one embodiment, the device is a touch device, such as a touch assembly of a touch display screen, and the transparent electrode assembly can be used in the touch assembly to improve the display effect of the touch display screen.
In one embodiment, the device is a transparent antenna. The transparent electrode assembly provided by the embodiment can be applied to the transparent antenna to replace the original conductive material, has better light transmittance and conductivity, ensures that the transparent antenna can be applied to other electronic equipment, and achieves better light transmittance effect.
The transparent antenna provided in this embodiment may be applicable to any communication band, for example, at least one of a 4G communication band, a 5G communication band, and a 6G communication band. With the development of communication technology, mobile communication technology has been developed to fifth generation mobile communication technology (5 th Generation Mobile Networks, abbreviated as 5G or 5G technology), and 5G technology is the latest generation cellular mobile communication technology, namely, extension after 4G (LTE-A, wiMax), 3G (UMTS, LTE) and 2G (GSM) systems. The 5G helps achieve high data rates, reduces latency, saves energy, reduces costs, increases system capacity, and large-scale device connections. The transparent antenna provided by the embodiment can be suitable for a 5G communication band and even suitable for a 6G communication band so as to meet the communication requirement of electronic equipment adopting the transparent antenna. The electronic device may be a mobile terminal (e.g., a mobile phone, a tablet computer, etc.), or may be other types of smart devices (e.g., a smart television, etc.), without limitation. The transparent antenna can also be applied to automobiles, and is beneficial to the automobiles to realize functions such as real-time networking and the like. The transparent antenna can also be applied to other devices, not limited to the above, but not limited thereto.
Of course, in other embodiments, the device may be of other types, and is not limited herein.
Referring to fig. 6, it is also an object of the present embodiment to provide a method for manufacturing a transparent electrode assembly, and it is understood that the method for manufacturing a transparent electrode assembly according to the present embodiment can be used for manufacturing the above-mentioned transparent electrode assembly, but is not limited to the above-mentioned transparent electrode assembly.
The preparation method of the transparent electrode assembly comprises the following steps:
Step S10: and setting a shadow eliminating layer on the surface of the patterned transparent electrode, wherein the shadow eliminating layer is made of a photochromic material.
After the transparent electrode is obtained, the transparent electrode is fixed on the base layer, and the transparent electrode is patterned according to a preset requirement, so that the patterned transparent electrode can be obtained (see fig. 7 (a)). The patterned transparent electrode surface is covered with a shadow eliminating layer, and the shadow eliminating layer can be arranged on the patterned transparent electrode surface in a coating manner, or in other manners, without limitation.
Step S20: and (b) irradiating a side of the transparent electrode, which is opposite to the shadow eliminating layer, with a spectrum of a preset wave band (refer to fig. 7 (b)), so that the shadow eliminating layer changes color under the action of the spectrum, and forming a first shadow eliminating area and a second shadow eliminating area to obtain a transparent electrode assembly (refer to fig. 7 (c)), wherein the first shadow eliminating area is arranged on the surface of the transparent electrode, which is opposite to the substrate layer, and the second shadow eliminating area is arranged between the etched transparent electrodes and is positioned on the surface of the substrate layer.
In this embodiment, the spectrum is ultraviolet light, and the photochromic material is a conjugated organic molecular material, so that a good shadow eliminating effect can be achieved. The conjugated organic molecular material comprises at least one of the following materials: conjugated diolefins, alpha, beta unsaturated aldehyde ketones, styrene, acetophenones. When ultraviolet light meeting the conditions is absorbed by the conjugated organic molecular material, the molecular structure of the ultraviolet light is changed, so that the properties such as light transmittance of the ultraviolet light are changed, and the purpose of adjusting the light transmittance is achieved. In this embodiment, the light transmittance of the first vanishing area is 86-90%, and the light transmittance of the second vanishing area is 86-90%. Of course, in other embodiments, the light transmittance of the first and second vanishing regions may also be other values, not limited to the above. The thickness of the first and second shadow eliminating layers in the shadow eliminating layer may be set according to needs, for example, in this embodiment, the thickness of the first shadow eliminating region is 200nm to 1000nm, and the thickness of the second shadow eliminating region is 200nm to 1000nm. Of course, in other embodiments, the thicknesses of the first and second vanishing regions may also be other values, and are not limited to the above.
According to the embodiment, the shadow eliminating layer is arranged on the surface of the patterned transparent electrode, and the shadow eliminating layer is irradiated from the side opposite to the shadow eliminating layer through the spectrum of the preset wave band, so that the structure of the shadow eliminating layer is changed, a first shadow eliminating area and a second shadow eliminating area with different transmittances are formed, the transmittance of the whole transparent electrode assembly to the spectrum (such as visible light) is the same, and when the transparent electrode assembly is watched from the shadow eliminating layer side, the bottom shadow of the transparent electrode is not watched, and the shadow eliminating purpose is achieved.
The foregoing description of the preferred embodiments of the invention is not intended to be limiting, but rather is intended to cover all modifications, equivalents, and alternatives falling within the spirit and principles of the invention.
Claims (19)
1. A transparent electrode assembly, the transparent electrode assembly comprising:
A transparent base layer;
the patterned transparent electrode is arranged on the surface of the basal layer;
the shadow eliminating layer is made of a photochromic material and comprises a first shadow eliminating area and a second shadow eliminating area, the first shadow eliminating area is arranged on the surface of the transparent electrode, which is opposite to the substrate layer, the second shadow eliminating area is arranged between the etched transparent electrodes and is positioned on the surface of the substrate layer, and the light transmittance of the second shadow eliminating area is lower than that of the first shadow eliminating area.
2. The transparent electrode assembly of claim 1, wherein the second vanishing zone is formed from the photochromic material upon irradiation by a spectrum of a predetermined wavelength band.
3. The transparent electrode assembly of claim 2, wherein the spectrum is ultraviolet light.
4. The transparent electrode assembly of claim 1, wherein the photochromic material is a conjugated organic molecular material.
5. The transparent electrode assembly of claim 4, wherein the conjugated organic molecular material comprises at least one of the following materials: conjugated diolefins, alpha, beta unsaturated aldehyde ketones, styrene, acetophenones.
6. The transparent electrode assembly of claim 1, wherein the first shadow region has a thickness of 200 nm to 1000 nm;
the thickness of the second vanishing area is 200-1000 nanometers.
7. The transparent electrode assembly of claim 1, wherein the first vanishing region has a light transmittance of 86-90%;
The light transmittance of the second vanishing area is 86-90%.
8. The transparent electrode assembly according to any one of claims 1 to 7, wherein the transparent electrode comprises:
the first transparent medium layer is arranged on the surface of the basal layer;
the second transparent medium layer is arranged between the first transparent medium layer and the shadow eliminating layer;
The conductive unit is arranged between the first transparent medium layer and the second transparent medium layer and comprises at least two transparent conductive layers and a third transparent medium layer, and the third transparent medium layer is arranged between every two adjacent conductive layers.
9. The transparent electrode of claim 8, wherein the conductive layer is made of a metallic material comprising at least one of silver, gold, copper, aluminum;
Or an alloy containing at least one metal selected from silver, gold, copper and aluminum as a main component.
10. The transparent electrode of claim 8, wherein the conductive layer has a thickness in the range of 2 to 25 nanometers.
11. The transparent electrode of claim 8, wherein the transparent electrode has a light transmittance of 40% to 90%, and the transparent electrode has a resistance of 0.05 to 20 ohm/square.
12. The transparent electrode of claim 8, wherein the transparent electrode further comprises a transparent outer conductive layer;
the surface of the second transparent medium layer, which is opposite to one side of the conductive unit, is provided with the outer conductive layer;
and/or the surface of the first transparent medium layer, which is back to one side of the conductive unit, is provided with the outer conductive layer.
13. A device comprising at least one transparent electrode assembly according to any one of claims 1 to 12.
14. The device of claim 13, wherein the device is a display device comprising a liquid crystal display, an OLED display, a projection display, a flat panel display, an eyewear display, a transparent display, or a see-through display.
15. The device of claim 13, wherein the device is a touch device.
16. The apparatus of claim 13, wherein the apparatus is a transparent antenna adapted for a 4G communication band and/or a 5G communication band and/or a 6G communication band.
17. A method for manufacturing a transparent electrode assembly according to any one of claims 1 to 12, comprising:
setting a shadow eliminating layer on the surface of the patterned transparent electrode, wherein the shadow eliminating layer is made of a photochromic material;
The transparent electrode is irradiated by a spectrum of a preset wave band at one side of the transparent electrode, which is opposite to the shadow eliminating layer, so that the shadow eliminating layer changes color under the action of the spectrum, a first shadow eliminating area and a second shadow eliminating area are formed to obtain a transparent electrode assembly, wherein the first shadow eliminating area is arranged on the surface of the transparent electrode, which is opposite to the substrate layer, and the second shadow eliminating area is arranged between the etched transparent electrodes and is positioned on the surface of the substrate layer.
18. The method of preparing a transparent electrode assembly according to claim 17, wherein the spectrum is ultraviolet light.
19. The method of preparing a transparent electrode assembly according to claim 17, wherein the photochromic material is a conjugated organic molecular material.
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