CN114121337B - Electronic paste and application thereof in solar cell - Google Patents

Electronic paste and application thereof in solar cell Download PDF

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Publication number
CN114121337B
CN114121337B CN202111577951.1A CN202111577951A CN114121337B CN 114121337 B CN114121337 B CN 114121337B CN 202111577951 A CN202111577951 A CN 202111577951A CN 114121337 B CN114121337 B CN 114121337B
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electronic paste
parts
diethylene glycol
glass
powder
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CN114121337A (en
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张洪旺
龙守星
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Wuxi Dike Electronic Mat Co ltd
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Wuxi Dike Electronic Mat Co ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C12/00Powdered glass; Bead compositions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/14Conductive material dispersed in non-conductive inorganic material
    • H01B1/16Conductive material dispersed in non-conductive inorganic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00Apparatus or processes specially adapted for manufacturing conductors or cables
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes

Abstract

The invention belongs to the technical field of solar cell materials, and particularly relates to electronic paste which comprises the following components in parts by mass: 80-96 parts of silver-coated copper powder, 11-18 parts of glass powder, 15-28 parts of organic carrier and 1-3 parts of inhibitor; the inhibitor is a mixture of rhodium octoate and copper caprate. When the electronic paste is used as the solar cell conductive paste, excellent ohmic contact performance can be generated, high conductivity and excellent photoelectric conversion efficiency are shown, and the electronic paste has wide market prospect.

Description

Electronic paste and application thereof in solar cell
Technical Field
The invention belongs to the technical field of solar cell materials, and particularly relates to electronic paste and application thereof in solar cells.
Background
The electronic paste is a base material for manufacturing thick film elements, and is a paste which is prepared by uniformly mixing solid powder and an organic solvent through three-roller rolling. The fluid material is applied to electronic components in a printing mode and the like to form a module with specific electrical functions, and is a basic material of various components such as a thick film hybrid integrated circuit, a chip component, a photovoltaic device, a flexible battery, an electro-optical device, a display, a logic and memory component, a Field Effect Transistor (FET) and a Thin Film Transistor (TFT), a sensor array, a Radio Frequency Identification (RFID) tag and the like.
According to different purposes, the electronic paste is divided into dielectric paste, resistor paste and conductor paste; the substrate type is classified into ceramic substrate, polymer substrate, glass substrate, metal insulating substrate electronic slurry, etc.; according to different sintering temperatures, the electronic paste can be dried at high temperature, medium temperature and low temperature; according to different purposes, the method can be divided into general electronic paste (for manufacturing general thick film circuits) and special electronic paste (stainless steel substrate electronic paste and thermistor paste); noble metal electronic paste (silver palladium, ruthenium, gold paste, etc.) and base metal electronic paste (molybdenum manganese paste) are classified according to the price of the conductive phase.
Among them, the electronic paste used for solar cells often has technical defects of poor reliability, low conductivity, low conversion efficiency of solar cells, and the like, so development of a special electronic paste suitable for solar cells and capable of industrialization is needed.
Disclosure of Invention
The technical scheme provided by the invention aims to provide a novel electronic paste, which can generate excellent ohmic contact performance, shows high conductivity and excellent photoelectric conversion efficiency when used as solar cell conductive paste, thereby having wide market prospect.
In order to achieve the above purpose, the present invention adopts the following technical scheme:
the first aspect of the invention provides electronic paste, which comprises the following components in parts by mass: 80-96 parts of silver-coated copper powder, 11-18 parts of glass powder, 15-28 parts of organic carrier and 1-3 parts of inhibitor;
wherein the median particle diameter of the silver-coated copper powder is 80-110nm;
wherein, the glass powder consists of the following components: siO (SiO) 2 、Bi 2 O 3 、TeO 2 、BaCO 3 、MgO、TiO 2 And Al 2 O 3
Wherein the organic carrier consists of adhesive resin and organic solvent;
wherein the inhibitor is a mixture of rhodium octoate and copper caprate.
The silver-coated copper powder is a commercially available existing product or a product which can be prepared according to a technical scheme described in the prior art, for example, the silver-coated copper powder can be prepared according to a method described in Chinese patent CN 103128308B. In addition, the silver-coated copper powder may be in a flake form or a sphere form.
The use of the silver-coated copper powder effectively avoids the direct use of expensive silver powder, so that the production cost of the electronic paste is obviously reduced; in addition, the relative molecular weight of silver is higher than that of copper, and after silver powder is coated with copper powder, the specific surface area of spherical silver coated copper powder is larger than that of spherical silver powder under the same quality, so that the dispersion is better, the dispersion is more uniform when the silver powder is used for the conductive paste of the solar cell, the agglomeration phenomenon is obviously reduced, and the improvement of the net passing performance of the conductive paste is facilitated.
Wherein the glass frit composed of specific components is a lead-free glass system, and the use of the glass frit unexpectedly can reduce the parallel resistance and the series resistance of the electronic paste containing the same, thereby obtaining better conductivity.
Wherein, the organic carrier is used for mechanically and uniformly mixing the silver-coated copper powder and the glass powder, so that the composition is endowed with proper viscosity and rheological property.
Wherein rhodium octoate has CAS number of 73482-96-9 and molecular formula of C 32 H 60 O 8 Rh 2 The method comprises the steps of carrying out a first treatment on the surface of the Copper decanoate has a CAS number of 50315-14-5 and a molecular formula of C 20 H 38 CuO 4 . The inventor finds that the addition of rhodium octoate and copper caprate can prevent the excessive sintering of the silver-coated copper powder, inhibit the diffusion of liquefied glass, and is favorable for forming excellent ohmic contact, thereby remarkably improving the photoelectric conversion efficiency.
Preferably, the electronic paste according to the first aspect may further comprise other additives. The other additives are one or more of leveling agents, thickening agents and thixotropic agents. Specifically, the leveling agent is preferably: acrylic leveling agents, such as pure acrylic leveling agents, modified acrylic leveling agents; organosilicon leveling agents, such as polymethylalkylsiloxanes, organomodified polysiloxanes; fluorocarbon leveling agents. The thickener is preferably one or more of sodium fatty acid and tricalcium phosphate. The thixotropic agent is preferably hydrogenated castor oil or/and gum, which increases the thixotropic properties of the conductive paste, resulting in a conductive paste having a higher consistency at rest and which becomes a low consistency fluid under the influence of an external force.
Preferably, in the electronic paste, the glass frit is composed of: 42wt% SiO 2 、25wt%Bi 2 O 3 、13wt%TeO 2 、9wt%BaCO 3 、8.5wt%MgO、1.4wt%TiO 2 And 1.1wt% Al 2 O 3
The above component proportions by mass percent are optimal proportions obtained by the inventors through orthogonal experiments and the like. In addition, the glass frit may also consist of the following components: 45wt% SiO 2 、22wt%Bi 2 O 3 、14wt%TeO 2 、7wt%BaCO 3 、6.8wt%MgO、3wt%TiO 2 And 2.2wt% Al 2 O 3 . As another example, the glass frit may alsoThe composition comprises the following components: 43wt% SiO 2 、26wt%Bi 2 O 3 、10wt%TeO 2 、9wt%BaCO 3 、7.9wt%MgO、2.4wt%TiO 2 And 1.7wt% Al 2 O 3
And, preferably, the glass frit is prepared according to the following steps:
s1: respectively weighing SiO according to mass percent 2 、Bi 2 O 3 、TeO 2 、BaCO 3 、MgO、TiO 2 And Al 2 O 3 Placing the mixture in a crucible, and uniformly mixing;
s2: heating in a muffle furnace to melt to prepare glass liquid;
s3: pouring the glass liquid into deionized water for quenching to prepare coarse glass powder;
s4: the crude glass frit thus obtained was pulverized by a ball mill to prepare the glass frit.
Further preferably, in S2, the heating temperature is 760 to 850 ℃, and the heating duration is 30 to 50 minutes.
Further preferably, in S4, the average particle diameter of the glass frit powder produced by the ball mill pulverization is 300 to 400nm.
Preferably, in the electronic paste, the adhesive resin in the organic vehicle is selected from any one or a combination of more of the following: ethylcellulose, epoxy resins, acrylic resins, phenolic resins, and urea melamine resins. Further preferably, on this basis, the adhesive resin is selected from any one or a combination of the following: acrylic resins, phenolic resins and urea melamine resins. Most preferably, the adhesive resin is a urea melamine resin.
Preferably, in the electronic paste, the organic solvent in the organic carrier is selected from any one or a combination of more of the following: terpineol, dihydroterpineol, ethylene glycol phenyl ether, propylene glycol phenyl ether, butyl carbitol acetate, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, dihydroterpineol acetate, diethylene glycol monoethyl ether acetate, and diethylene glycol monobutyl ether acetate.
Further preferably, the organic solvent is a multi-component solvent, for example, the organic solvent is composed of terpineol, dihydroterpineol, and butyl carbitol acetate; for example, the organic solvent consists of ethylene glycol phenyl ether and propylene glycol phenyl ether; for example, the organic solvent consists of ethylene glycol phenyl ether, propylene glycol phenyl ether and terpinyl diacetate; for another example, the organic solvent is composed of butyl carbitol, diethylene glycol monoethyl ether, and diethylene glycol monobutyl ether.
Still more preferably, the organic solvent consists of butyl carbitol, diethylene glycol monoethyl ether, and diethylene glycol monobutyl ether. On the basis, the volume ratio of butyl carbitol, diethylene glycol monoethyl ether and diethylene glycol monobutyl ether is preferably 4:2:1, or 3:2:2, or 4:2.5:2.
in addition, for exemplary purposes, the organic carrier may be prepared according to the following steps: butyl carbitol, diethylene glycol monoethyl ether and diethylene glycol monobutyl ether are firstly mixed according to the ratio of 3:2:2, uniformly mixing the components in a volume ratio to obtain a mixed solvent; then, according to the mixed solvent: adhesive resin=10:1 (mass ratio) urea melamine resin as adhesive resin was added to obtain an organic vehicle crude solution; and finally, heating in a water bath at 70 ℃, stirring for 1 hour, cooling to room temperature, and covering a preservative film to prevent the solvent from volatilizing, thus obtaining the organic carrier.
Preferably, in the electronic paste, the inhibitor comprises: 36wt% to 45wt% rhodium octoate and 64wt% to 55wt% copper decanoate.
Further preferably, the inhibitor comprises 39wt% rhodium octoate with 61wt% copper decanoate.
Further preferably, the inhibitor comprises 40wt% rhodium octanoate with 60wt% copper decanoate.
Still more preferably, the inhibitor comprises 42wt% rhodium octanoate with 58wt% copper decanoate.
Most preferably, the inhibitor comprises 43wt% rhodium octoate with 57wt% copper decanoate.
Furthermore, a second aspect of the present invention provides a method for preparing the electronic paste according to the first aspect, comprising the steps of:
p1: at room temperature, adding silver-coated copper powder and glass powder into a container, and uniformly mixing to obtain a premix;
p2: sequentially adding an organic carrier and an inhibitor into the premix at room temperature, and stirring until the mixture is uniform;
p3: grinding to obtain a slurry crude product which is uniformly ground;
p4: and (3) carrying out vacuum centrifugal defoaming on the slurry crude product which is uniformly ground, and finally obtaining the electronic slurry.
In the above preparation method, the operations of mixing, grinding, vacuum centrifugal deaeration, etc. are all conventional operations known to those skilled in the art, and thus are not described in detail herein.
The third aspect of the invention provides application of the electronic paste in solar cells. Specifically, an electrode containing the electronic paste according to the first aspect may be used in the solar cell.
In summary, compared with the prior art, the technical scheme provided by the invention has at least the following beneficial effects:
the use of glass powder composed of specific components can reduce the parallel resistance and the series resistance, thereby obtaining better conductivity; particularly, the addition of rhodium octoate and copper caprate can prevent excessive sintering of silver-coated copper powder, inhibit diffusion of liquefied glass, and is favorable for forming excellent ohmic contact, so that the photoelectric conversion efficiency is remarkably improved. Therefore, the electronic paste provided by the invention has high conductivity and excellent photoelectric conversion efficiency, and has wide market prospect.
Detailed Description
The present invention will be specifically described with reference to the following examples. It will be apparent that the described embodiments are only some, but not all, embodiments of the invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
According to the technical scheme provided by the first aspect of the invention, the electronic paste comprises, in parts by mass,comprises the following components: 81 parts of silver-coated copper powder, 12 parts of glass powder, 17 parts of organic carrier and 1 part of inhibitor; wherein the median particle diameter of the silver-coated copper powder is 90 nm; the glass powder consists of the following components: siO (SiO) 2 、Bi 2 O 3 、TeO 2 、BaCO 3 、MgO、TiO 2 And Al 2 O 3 The method comprises the steps of carrying out a first treatment on the surface of the The organic carrier consists of adhesive resin and organic solvent; the inhibitor is a mixture of rhodium octoate and copper caprate.
In a preferred embodiment, an electronic paste comprises the following components in parts by mass: 90 parts of silver-coated copper powder, 15 parts of glass powder, 22 parts of organic carrier and 1 part of inhibitor; wherein the median particle diameter of the silver-coated copper powder is 90 nm; the glass powder consists of the following components: siO (SiO) 2 、Bi 2 O 3 、TeO 2 、BaCO 3 、MgO、TiO 2 And Al 2 O 3 The method comprises the steps of carrying out a first treatment on the surface of the The organic carrier consists of adhesive resin and organic solvent; the inhibitor is a mixture of rhodium octoate and copper caprate.
In a preferred embodiment, the glass frit consists of the following components: 42wt% SiO 2 、25wt%Bi 2 O 3 、13wt%TeO 2 、9wt%BaCO 3 、8.5wt%MgO、1.4wt%TiO 2 And 1.1wt% Al 2 O 3
In another preferred embodiment, the glass frit may also consist of the following components: 45wt% SiO 2 、22wt%Bi 2 O 3 、14wt%TeO 2 、7wt%BaCO 3 、6.8wt%MgO、3wt%TiO 2 And 2.2wt% Al 2 O 3
In a further preferred embodiment, the glass frit may also consist of the following components: 43wt% SiO 2 、26wt%Bi 2 O 3 、10wt%TeO 2 、9wt%BaCO 3 、7.9wt%MgO、2.4wt%TiO 2 And 1.7wt% Al 2 O 3
In a preferred embodiment, the adhesive resin is selected from any one or a combination of the following: ethylcellulose, epoxy resins, acrylic resins, phenolic resins, and urea melamine resins.
In a preferred embodiment, the adhesive resin is selected from any one or a combination of the following: acrylic resins, phenolic resins and urea melamine resins.
In a further preferred embodiment, the adhesive resin is a urea melamine resin.
In a preferred embodiment, the organic solvent is selected from any one or a combination of the following: terpineol, dihydroterpineol, ethylene glycol phenyl ether, propylene glycol phenyl ether, butyl carbitol acetate, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, dihydroterpineol acetate, diethylene glycol monoethyl ether acetate, and diethylene glycol monobutyl ether acetate.
In a further preferred embodiment, the organic solvent consists of butyl carbitol, diethylene glycol monoethyl ether and diethylene glycol monobutyl ether. In a still further preferred embodiment, the volume ratio of butyl carbitol, diethylene glycol monoethyl ether, and diethylene glycol monobutyl ether is preferably 4:2:1.
in a preferred embodiment, the inhibitor comprises: 36wt% to 45wt% rhodium octoate and 64wt% to 55wt% copper decanoate.
In a further preferred embodiment, the glass frit is prepared according to the following steps:
s1: respectively weighing SiO according to mass percent 2 、Bi 2 O 3 、TeO 2 、BaCO 3 、MgO、TiO 2 And Al 2 O 3 Placing the mixture in a crucible, and uniformly mixing;
s2: heating in a muffle furnace to melt to prepare glass liquid; the heating temperature is 760-850 ℃, and the heating duration is 30-50 minutes;
s3: pouring the glass liquid into deionized water for quenching to prepare coarse glass powder;
s4: the crude glass frit thus obtained was pulverized by a ball mill to prepare the glass frit having an average particle size of 300 to 400nm.
According to a second aspect of the present invention, the method for preparing an electronic paste according to the first aspect includes the steps of:
p1: at room temperature, adding silver-coated copper powder and glass powder into a container, and uniformly mixing to obtain a premix;
p2: sequentially adding an organic carrier and an inhibitor into the premix at room temperature, and stirring until the mixture is uniform;
p3: grinding to obtain a slurry crude product which is uniformly ground;
p4: and (3) carrying out vacuum centrifugal defoaming on the slurry crude product which is uniformly ground, and finally obtaining the electronic slurry.
According to the technical scheme provided by the third aspect of the invention, the electronic paste is applied to solar cells. Specifically, an electrode containing the electronic paste according to the first aspect may be used in the solar cell.
The present invention will be described in detail and in detail by way of the following examples, which are not intended to limit the scope of the invention, for better understanding of the invention.
Example 1
The glass powder alpha is prepared according to the following steps:
s1: weighing 42wt% of SiO respectively according to mass percentage 2 、25wt%Bi 2 O 3 、13wt%TeO 2 、9wt%BaCO 3 、8.5wt%MgO、1.4wt%TiO 2 And 1.1wt% Al 2 O 3 Placing the mixture in a crucible, and uniformly mixing;
s2: heating in a muffle furnace to melt to prepare glass liquid; the temperature of the heating is 790 ℃, and the duration of the heating is 40 minutes;
s3: pouring the glass liquid into deionized water for quenching to prepare coarse glass powder;
s4: the crude glass frit thus obtained was pulverized by a ball mill to produce the glass frit α having an average particle diameter of 300 to 400nm.
Example 2
The glass powder beta is prepared according to the following steps:
s1: 45wt% of SiO is respectively weighed according to the mass percentage 2 、22wt%Bi 2 O 3 、14wt%TeO 2 、7wt%BaCO 3 、6.8wt%MgO、3wt%TiO 2 And 2.2wt% Al 2 O 3 Placing the mixture in a crucible, and uniformly mixing;
s2: heating in a muffle furnace to melt to prepare glass liquid; the temperature of the heating is 790 ℃, and the duration of the heating is 40 minutes;
s3: pouring the glass liquid into deionized water for quenching to prepare coarse glass powder;
s4: the crude glass frit thus obtained was pulverized by a ball mill to prepare the glass frit β having an average particle diameter of 300 to 400nm.
Example 3
The glass powder gamma is prepared according to the following steps:
s1: respectively weighing 43wt% of SiO according to mass percent 2 、26wt%Bi 2 O 3 、10wt%TeO 2 、9wt%BaCO 3 、7.9wt%MgO、2.4wt%TiO 2 And 1.7wt% Al 2 O 3 Placing the mixture in a crucible, and uniformly mixing;
s2: heating in a muffle furnace to melt to prepare glass liquid; the temperature of the heating is 790 ℃, and the duration of the heating is 40 minutes;
s3: pouring the glass liquid into deionized water for quenching to prepare coarse glass powder;
s4: the crude glass frit thus obtained was pulverized by a ball mill to prepare the glass frit γ having an average particle diameter of 300 to 400nm.
Example 4
The glass powder delta is prepared according to the following steps:
s1: weighing 60wt% of SiO according to mass percentage 2 、15.7wt%Bi 2 O 3 、9wt%TeO 2 、5wt%BaCO 3 、3.1wt%MgO、4.3wt%TiO 2 And 2.9wt% Al 2 O 3 Placing the mixture in a crucible, and uniformly mixing;
s2: heating in a muffle furnace to melt to prepare glass liquid; the temperature of the heating is 790 ℃, and the duration of the heating is 40 minutes;
s3: pouring the glass liquid into deionized water for quenching to prepare coarse glass powder;
s4: the crude glass frit thus obtained was pulverized by a ball mill to produce the glass frit delta having an average particle diameter of 300 to 400nm.
Example 5
The electronic paste I is prepared according to the following steps:
p1: at room temperature, adding silver-coated copper powder and glass powder into a container, and uniformly mixing to obtain a premix;
p2: sequentially adding an organic carrier and an inhibitor into the premix at room temperature, and stirring until the mixture is uniform;
p3: grinding to obtain a slurry crude product which is uniformly ground;
p4: and (3) carrying out vacuum centrifugal defoaming on the slurry crude product which is uniformly ground, and finally obtaining the electronic slurry I.
Wherein, the electronic paste I comprises the following components in parts by mass: 90 parts of silver-coated copper powder, 15 parts of glass powder, 22 parts of organic carrier and 1 part of inhibitor; wherein the median particle diameter of the silver-coated copper powder is 90 nm; the glass powder is glass powder alpha.
The organic carrier consists of urea melamine resin and an organic solvent, wherein the organic solvent consists of butyl carbitol, diethylene glycol monoethyl ether and diethylene glycol monobutyl ether; and, butyl carbitol, diethylene glycol monoethyl ether and diethylene glycol monobutyl ether have a volume ratio of 4:2:1.
the inhibitor comprises 43wt% rhodium octanoate and 57wt% copper decanoate.
Example 6
In this embodiment, the glass frit is glass frit β; except for the above, the preparation steps and the kinds, proportions, etc. of the components were the same as in example 5, and finally electronic paste II was prepared.
Example 7
In this embodiment, the glass frit is glass frit γ; except for the above, the preparation steps and the kinds, proportions, etc. of the components were the same as in example 5, and electronic paste III was finally produced.
Example 8
In this embodiment, the glass frit is glass frit δ; except for this, the preparation steps and the kinds, proportions, etc. of the components were the same as in example 5, and finally, electronic paste IV was prepared.
Comparative example 1
The electronic paste V was prepared according to the following steps:
p1: at room temperature, adding silver-coated copper powder and glass powder into a container, and uniformly mixing to obtain a premix;
p2: adding an organic carrier into the premix at room temperature, and stirring until the mixture is uniform;
p3: grinding to obtain a slurry crude product which is uniformly ground;
p4: and (3) carrying out vacuum centrifugal defoaming on the slurry crude product which is uniformly ground, and finally obtaining the electronic slurry V.
Wherein, the electronic paste V comprises the following components in parts by mass: 90 parts of silver-coated copper powder, 15 parts of glass powder and 22 parts of organic carrier; wherein the median particle diameter of the silver-coated copper powder is 90 nm; the glass powder is glass powder alpha.
The organic carrier consists of urea melamine resin and an organic solvent, wherein the organic solvent consists of butyl carbitol, diethylene glycol monoethyl ether and diethylene glycol monobutyl ether; and, butyl carbitol, diethylene glycol monoethyl ether and diethylene glycol monobutyl ether have a volume ratio of 4:2:1.
comparative example 2
The electronic paste VI is prepared according to the following steps:
p1: at room temperature, adding silver-coated copper powder and glass powder into a container, and uniformly mixing to obtain a premix;
p2: sequentially adding an organic carrier and an inhibitor into the premix at room temperature, and stirring until the mixture is uniform;
p3: grinding to obtain a slurry crude product which is uniformly ground;
p4: and (3) carrying out vacuum centrifugal defoaming on the slurry crude product which is uniformly ground, and finally obtaining the electronic slurry VI.
Wherein, the electronic paste VI comprises the following components in parts by mass: 90 parts of silver-coated copper powder, 15 parts of glass powder, 22 parts of organic carrier and 1 part of inhibitor; wherein the median particle diameter of the silver-coated copper powder is 90 nm; the glass powder is glass powder alpha.
The organic carrier consists of urea melamine resin and an organic solvent, wherein the organic solvent consists of butyl carbitol, diethylene glycol monoethyl ether and diethylene glycol monobutyl ether; and, butyl carbitol, diethylene glycol monoethyl ether and diethylene glycol monobutyl ether have a volume ratio of 4:2:1.
the inhibitor is 100wt% of copper decanoate.
Comparative example 3
The electronic paste VII was prepared according to the following steps:
p1: at room temperature, adding silver-coated copper powder and glass powder into a container, and uniformly mixing to obtain a premix;
p2: sequentially adding an organic carrier and an inhibitor into the premix at room temperature, and stirring until the mixture is uniform;
p3: grinding to obtain a slurry crude product which is uniformly ground;
p4: and (3) carrying out vacuum centrifugal defoaming on the slurry crude product which is uniformly ground, and finally obtaining the electronic slurry VII.
Wherein, the electronic paste VII comprises the following components in parts by mass: 90 parts of silver-coated copper powder, 15 parts of glass powder, 22 parts of organic carrier and 1 part of inhibitor; wherein the median particle diameter of the silver-coated copper powder is 90 nm; the glass powder is glass powder alpha.
The organic carrier consists of urea melamine resin and an organic solvent, wherein the organic solvent consists of butyl carbitol, diethylene glycol monoethyl ether and diethylene glycol monobutyl ether; and, butyl carbitol, diethylene glycol monoethyl ether and diethylene glycol monobutyl ether have a volume ratio of 4:2:1.
the inhibitor is 100wt% rhodium octoate.
Comparative example 4
The electronic paste VIII is prepared according to the following steps:
p1: at room temperature, adding silver-coated copper powder and glass powder epsilon into a container, and uniformly mixing to obtain a premix;
p2: sequentially adding an organic carrier and an inhibitor into the premix at room temperature, and stirring until the mixture is uniform;
p3: grinding to obtain a slurry crude product which is uniformly ground;
p4: and (3) carrying out vacuum centrifugal defoaming on the slurry crude product which is uniformly ground, and finally obtaining the electronic slurry VIII.
The electronic paste VIII comprises the following components in parts by mass: 90 parts of silver-coated copper powder, 15 parts of glass powder epsilon, 22 parts of organic carrier and 1 part of inhibitor; wherein the median particle diameter of the silver-coated copper powder is 90 nm; wherein, the preparation steps of the glass powder epsilon are as follows:
s1: weighing 55wt% of SiO respectively according to mass percentage 2 、25wt%Bi 2 O 3 、9wt%BaCO 3 、8.5wt%MgO、1.4wt%TiO 2 And 1.1wt% Al 2 O 3 Placing the mixture in a crucible, and uniformly mixing;
s2: heating in a muffle furnace to melt to prepare glass liquid; the temperature of the heating is 790 ℃, and the duration of the heating is 40 minutes;
s3: pouring the glass liquid into deionized water for quenching to prepare coarse glass powder;
s4: the crude glass frit thus obtained was pulverized by a ball mill to produce the glass frit epsilon having an average particle diameter of 300 to 400nm.
The organic carrier consists of urea melamine resin and an organic solvent, wherein the organic solvent consists of butyl carbitol, diethylene glycol monoethyl ether and diethylene glycol monobutyl ether; and, butyl carbitol, diethylene glycol monoethyl ether and diethylene glycol monobutyl ether have a volume ratio of 4:2:1.
the inhibitor comprises 43wt% rhodium octanoate and 57wt% copper decanoate.
Comparative example 5
The electronic paste IX was prepared according to the following steps:
p1: at room temperature, adding silver-coated copper powder and glass powder zeta into a container, and uniformly mixing to obtain a premix;
p2: sequentially adding an organic carrier and an inhibitor into the premix at room temperature, and stirring until the mixture is uniform;
p3: grinding to obtain a slurry crude product which is uniformly ground;
p4: and (3) carrying out vacuum centrifugal defoaming on the slurry crude product which is uniformly ground, and finally obtaining the electronic slurry IX.
Wherein, the electronic paste IX comprises the following components in parts by mass: 90 parts of silver-coated copper powder, 15 parts of glass powder zeta, 22 parts of organic carrier and 1 part of inhibitor; wherein the median particle diameter of the silver-coated copper powder is 90 nm; wherein, the preparation steps of glass powder zeta are:
s1: respectively weighing 64wt% of SiO according to mass percent 2 、25wt%Bi 2 O 3 、8.5wt%MgO、1.4wt%TiO 2 And 1.1wt% Al 2 O 3 Placing the mixture in a crucible, and uniformly mixing;
s2: heating in a muffle furnace to melt to prepare glass liquid; the temperature of the heating is 790 ℃, and the duration of the heating is 40 minutes;
s3: pouring the glass liquid into deionized water for quenching to prepare coarse glass powder;
s4: the crude glass powder thus obtained was pulverized by a ball mill to prepare the glass powder ζ having an average particle diameter of 300 to 400nm.
The organic carrier consists of urea melamine resin and an organic solvent, wherein the organic solvent consists of butyl carbitol, diethylene glycol monoethyl ether and diethylene glycol monobutyl ether; and, butyl carbitol, diethylene glycol monoethyl ether and diethylene glycol monobutyl ether have a volume ratio of 4:2:1.
the inhibitor comprises 43wt% rhodium octanoate and 57wt% copper decanoate.
In addition, the inventor also detects key indexes of the electronic pastes I-IX respectively. Specifically, the electronic pastes I to IX were subjected to viscosity test by measuring with a viscometer (Brookfiled SC4-1410rpm,25 ℃). Brookfiled SC4-1410rpm was printed on a 125mm x 125mm Si substrate at 25℃using a screen printer, and then sintered for 2-4 seconds by a sintering furnace having a peak temperature of 700-730℃and, after sintering, electrical properties were tested using an I-V tester (Shanghai Heisha solar technology Co., ltd., HSC 1-1S) and welded on a main grid line using 40Sn/60Pb at 330-360℃with the test results shown in Table 1 below.
TABLE 1
Project test object viscosity/Pa.s Short-circuit current/mA Parallel resistor/omega Series resistance/mΩ Photoelectric conversion efficiency/%
Electronic paste I 179 9.07 205 1.49 21.3
Electronic paste II 183 9.02 212 1.52 21.0
Electronic paste III 183 8.91 218 1.57 20.7
Electronic paste IV 181 8.93 217 1.61 20.9
Electronic paste V 182 8.92 213 1.53 13.4
Electronic paste VI 180 8.90 214 1.50 15.1
Electronic paste VII 186 8.91 213 1.54 14.5
Electronic paste VIII 197 7.24 379 2.87 19.2
Electronic paste IX 189 6.38 403 3.26 19.4
As can be seen from the above Table 1, the electronic pastes V-VII corresponding to comparative examples 1-3 exhibited lower photoelectric conversion efficiencies; in contrast, the electronic paste I-IV added with rhodium octoate and copper caprate can effectively prevent the excessive sintering of silver-coated copper powder, inhibit the diffusion of liquefied glass, and is favorable for forming excellent ohmic contact, thereby showing higher photoelectric conversion efficiency.
Also, as can be seen from the above table 1, the parallel resistance and the series resistance detected from the electronic pastes viii and ix corresponding to comparative examples 4 and 5 are both high; in contrast, low parallel resistance and series resistance are detected from the electronic pastes I to iv containing the glass frit α, the glass frit β, the glass frit γ, and the glass frit δ, respectively, and the electronic pastes I to iv exhibit high short-circuit current, and thus have high conductivity.
The above description of the specific embodiments of the present invention has been given by way of example only, and the present invention is not limited to the above described specific embodiments. Any equivalent modifications and substitutions for the present invention will occur to those skilled in the art, and are also within the scope of the present invention. Accordingly, equivalent changes and modifications are intended to be included within the scope of the present invention without departing from the spirit and scope thereof.

Claims (10)

1. The electronic paste is characterized by comprising the following components in parts by mass: 80-96 parts of silver-coated copper powder, 11-18 parts of glass powder, 15-28 parts of organic carrier and 1-3 parts of inhibitor;
wherein the median particle diameter of the silver-coated copper powder is 80-110nm;
wherein, the glass powder consists of the following components: siO (SiO) 2 、Bi 2 O 3 、TeO 2 、BaCO 3 、MgO、TiO 2 And Al 2 O 3
Wherein the organic carrier consists of adhesive resin and organic solvent;
wherein the inhibitor is a mixture of rhodium octoate and copper caprate.
2. The electronic paste of claim 1, wherein the glass frit is composed of: 42wt% SiO 2 、25wt%Bi 2 O 3 、13wt%TeO 2 、9wt%BaCO 3 、8.5wt%MgO、1.4wt%TiO 2 And 1.1wt% Al 2 O 3
3. The electronic paste of claim 1, wherein the adhesive resin is selected from any one or a combination of the following: ethylcellulose, epoxy resins, acrylic resins, phenolic resins, and urea melamine resins.
4. The electronic paste of claim 1, wherein the organic solvent is selected from any one or a combination of the following: terpineol, dihydroterpineol, ethylene glycol phenyl ether, propylene glycol phenyl ether, butyl carbitol acetate, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, dihydroterpineol acetate, diethylene glycol monoethyl ether acetate, and diethylene glycol monobutyl ether acetate.
5. The electronic paste according to claim 4, wherein the organic solvent is composed of butyl carbitol, diethylene glycol monoethyl ether, and diethylene glycol monobutyl ether.
6. The electronic paste of claim 1, wherein the inhibitor comprises: 36wt% to 45wt% rhodium octoate and 64wt% to 55wt% copper decanoate.
7. The electronic paste according to claim 2, wherein the glass frit is prepared according to the steps of:
s1: respectively weighing SiO according to mass percent 2 、Bi 2 O 3 、TeO 2 、BaCO 3 、MgO、TiO 2 And Al 2 O 3 Placing the mixture in a crucible, and uniformly mixing;
s2: heating in a muffle furnace to melt to prepare glass liquid;
s3: pouring the glass liquid into deionized water for quenching to prepare coarse glass powder;
s4: the crude glass frit thus obtained was pulverized by a ball mill to prepare the glass frit.
8. The electronic paste according to claim 7, wherein in S2, the heating temperature is 760 to 850 ℃, and the heating duration is 30 to 50 minutes.
9. The electronic paste according to claim 7, wherein in S4, the average particle diameter of the glass frit powder produced by the ball mill pulverization is 300 to 400nm.
10. Use of the electronic paste according to any one of claims 1 to 9 in solar cells.
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