CN114114966B - Radio frequency power supply control method and system applied to etching machine - Google Patents
Radio frequency power supply control method and system applied to etching machine Download PDFInfo
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- 230000005672 electromagnetic field Effects 0.000 description 4
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- 238000001020 plasma etching Methods 0.000 description 3
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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Abstract
The invention provides a radio frequency power supply control method and a system applied to an etching machine, wherein the method comprises the following steps: obtaining etching information, determining the etching type of an object to be etched, and determining the etching requirement according to the etching type; according to the etching requirement, establishing a radio frequency power supply-based simulation etching model; determining a control scheme of a radio frequency power supply according to the simulated etching model, and controlling the radio frequency power supply according to the control scheme to etch; the system comprises: the system comprises a demand determining module, a model generating module and a scheme outputting module. The invention applies the radio frequency power supply control method to the etching machine, which is beneficial to improving the etching efficiency and the accuracy.
Description
Technical Field
The invention relates to the technical field of radio frequency power supply control, in particular to a radio frequency power supply control method and a radio frequency power supply control system applied to an etching machine.
Background
At present, a radio frequency power supply consists of a driving circuit, a power amplifying circuit, an impedance matching circuit, a directional coupler and a control system, wherein the conventional radio frequency power supply control method is applied to an etching machine and needs two radio frequency power supply modules, one of the two radio frequency power supply modules supplies power to a coil assembly in an etching groove, and the other radio frequency power supply module etches an object to be etched by generating self bias voltage, so that the etching cost of the etching machine is higher, the etching efficiency is lower, and in the etching machine products in the prior art, such as a vacuum etching machine with the product model of XHL-6M6024, the external dimension is as follows: 6024 x 2227 x 2700mm; power: 36KW; and (3) a power supply: 380V/50Hz, two radio frequency power supplies are adopted, the cost for etching the material is high, in addition, in the etching process, the surface of the object to be etched is conductive, so that the etched surface is uneven, and etching damage can occur to the fine pattern; in addition, in the process of etching the etched object, for example, the etching method used in Sano Y, shiozawa K, doi T, et al, high-efficiency planarization method combining mechanical polishing and atmospheric-pressure plasma etching for hard-to-machine semiconductor substrates [ J ]. Mechanical Engineering Journal,2016,3 (1): 15-00527-15-00527, the etching method is used for etching in a manner of combining mechanical polishing with normal pressure plasma etching, so that the surface of the etched object can be effectively protected from being damaged, the etched surface can be kept uniform, however, the method of using mechanical polishing and normal pressure plasma etching is only suitable for etching of two-dimensional surfaces, and uneven etched surface can be caused and the etching efficiency is low when the object to be etched is thicker.
Disclosure of Invention
The invention provides a radio frequency power supply control method and a radio frequency power supply control system applied to an etching machine, which are used for solving the problems that the etching cost of the etching machine is high and the etching efficiency is low due to the fact that two radio frequency power supply modules are needed in the etching machine in the traditional radio frequency power supply control method.
A radio frequency power control method applied to an etching machine, comprising:
obtaining etching information, determining the etching type of an object to be etched, and determining the etching requirement according to the etching type;
according to the etching requirement, establishing a radio frequency power supply-based simulation etching model;
and determining a control scheme of the radio frequency power supply according to the simulated etching model, and controlling the radio frequency power supply according to the control scheme to etch.
As an embodiment of the present invention: the step of obtaining etching information, determining the etching type of an object to be etched, and determining the etching requirement according to the etching type comprises the following steps:
obtaining etching information, determining basic parameters of an object to be etched, and determining retrieval information of the object to be etched according to the basic parameters;
according to the search information, acquiring the etching type and etching flow of the object to be etched through a preset etching database;
And analyzing the etching type and etching flow of the object to be etched to determine the etching requirement.
As an embodiment of the present invention: according to the etching requirement, establishing a radio frequency power supply-based simulated etching model comprises the following steps:
acquiring historical etching data, determining etching parameters, and taking the etching parameters as training set data;
template etching parameters in the etching database are obtained and used as test set data;
training the training set data based on the test set data to generate a simulated etching model based on a radio frequency power supply.
As an embodiment of the present invention: the method comprises the steps of determining a control scheme of a radio frequency power supply according to the simulated etching model, controlling the radio frequency power supply according to the control scheme, and etching, and further comprises:
when the radio frequency power supply is controlled, the radio frequency power is monitored in real time, and the real-time radio frequency power is dynamically regulated;
the dynamic adjustment process includes:
the radio frequency coupler is electrically connected with the signal generator to obtain a control signal and a reflection component result according to the control signal;
based on the reflection component result, acquiring real-time radio frequency power of the etching machine, and dynamically adjusting the real-time radio frequency power; wherein,
When the real-time radio frequency power of the etching machine is lower than a preset radio frequency power range, amplifying the output power by adopting a power amplifier;
when the real-time radio frequency power of the etching machine is higher than a preset radio frequency power range, a power attenuator is adopted to attenuate the output power.
As an embodiment of the present invention: the method for obtaining etching information, determining basic parameters of an object to be etched, determining search information of the object to be etched according to the basic parameters, and further comprises the following steps:
judging whether the basic parameters of the object to be etched meet etching standards or not, wherein the process comprises the following steps:
the radio frequency power supply acquires basic parameters of an object to be etched in real time by sending radio frequency signals; wherein the basic parameters include: material composition, shape data, and size;
according to the basic parameters of the object to be etched, a pre-stored etching object database is called, the basic parameters are compared with template etching parameters in the database one by one, and a comparison result is determined;
judging whether the basic parameters of the object to be etched can reach the working standard or not according to the comparison result;
when the basic parameters of the object to be etched meet the etching standard, triggering an etching machine starting command, sending out a control signal and sending out the control signal;
When the basic parameters of the object to be etched do not meet the working standard, the machine stops running, fault detection is automatically started, and the basic parameters which do not meet the standard are sent to a preset management platform.
As an embodiment of the present invention: when the basic parameters of the object to be etched meet the etching standard, triggering an etching machine starting command, sending a control signal, and sending the control signal, wherein the method comprises the following steps:
according to the control signal, starting a control system to etch the object to be etched and obtaining the etched object, wherein the process comprises the following steps:
the driving circuit receives a control signal, places the object to be etched into the machine, obtains an object entering signal to be etched in the machine, and opens the first etching bath authority;
acquiring the etched quantity of the first etching tank according to a first etching tank permission starting signal, starting a timing function of a machine table, performing primary etching, stopping timing when a primary etching indicator lamp is on, determining a primary etching object, and recording primary time;
and according to the etching result of the first-stage etching object, closing the first etching groove authority, opening the second etching groove authority, obtaining the etched quantity of the second etching groove, starting the timing function of the machine, performing second-stage etching, stopping timing when the second-stage etching indicator lamp is turned on, determining the second-stage etching object, and recording the second-stage time.
As an embodiment of the present invention: starting a control system to etch the object to be etched according to the control signal, and obtaining the etched object, including:
washing the secondary etching object, detecting the quality of the washing object,
the quality detection process comprises the following steps:
closing the second etching trough permission and opening the rinsing trough permission according to the second etching object;
washing the secondary etching object with water to obtain a tertiary etching object;
based on the three-level etching object, adopting a radio frequency matching network to dynamically detect the three-level etching object to obtain a dynamic detection result;
and judging whether the three-level etching object reaches a use standard or not according to the dynamic detection result of the three-level etching object, determining a judgment result and recording the judgment result.
As an embodiment of the present invention: the method for dynamically detecting the three-level etching object by adopting the radio frequency matching network based on the three-level etching object to obtain a dynamic detection result comprises the following steps:
comparing the primary time and the secondary time with a preset time range, and judging whether the primary time and the secondary time are in normal working time or not;
When the primary time and the secondary time are in a preset time range, judging that the primary time and the secondary time are normal working time, and setting a primary detection result as a default result;
based on the three-level etching object, generating resonance for self-excitation frequency and radio frequency in the matching network, detecting corner information of the three-level etching object, and acquiring a detection result;
judging whether the tertiary etching object is damaged or not according to the corner detection result of the tertiary etching object;
when the third-stage etching object is not damaged, setting a second-stage detection result as a default result;
partitioning the three-level etching object, randomly selecting a convex point in each region, carrying out electron microscope analysis on the convex point to obtain quality parameters, and determining an analysis result;
and judging whether the quality parameter of the tertiary etching object reaches a quality standard or not based on the analysis result, and setting the tertiary detection result as a default result when the quality parameter of the tertiary etching object reaches the quality standard.
As an embodiment of the present invention: judging whether the three-level etching object reaches a use standard according to the dynamic detection result of the three-level etching object, determining the judgment result and recording the judgment result, wherein the method comprises the following steps:
Based on the primary detection result, the secondary detection result and the tertiary detection, when the primary detection result, the secondary detection result and the tertiary detection result are all default results;
judging that the three-level etching object accords with a use standard;
when the primary detection result, the secondary detection result and the tertiary detection result have detection results which are not default results;
and judging that the three-level etching object does not accord with the use standard, counting the etching objects which do not accord with the use standard, classifying according to the detection result, determining a classification result, and recording the classification result.
The invention provides a radio frequency power supply control system applied to an etching machine, which comprises:
the demand determination module: the method comprises the steps of judging the etching type of an object to be etched, and determining the etching requirement according to the etching type;
and a model generation module: the method is used for establishing a radio frequency power supply-based simulated etching model according to the etching requirements;
the scheme output module: and the control scheme is used for determining the control scheme of the radio frequency power supply according to the simulated etching model, and etching the object to be etched according to the control scheme.
The invention has the beneficial effects that: according to the invention, the initial parameters of the etching machine are acquired through the radio frequency power supply, so that the operation state of the etching machine is acquired before etching, faults are avoided in the etching process, when the driving circuit receives a control signal, the fact that abnormal data do not appear in the initial parameters of the etching machine is proved, etching and washing treatment are further carried out on an etching object, and the quality detection is carried out on the washing etching object by utilizing the radio frequency matching network, so that the maximization of radio frequency power is realized, noise interference is reduced, power capacity is improved, and frequency response linearity is improved.
Additional features and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. The objectives and other advantages of the invention may be realized and attained by the structure particularly pointed out in the written description and drawings.
The technical scheme of the invention is further described in detail through the drawings and the embodiments.
Drawings
The accompanying drawings are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate the invention and together with the embodiments of the invention, serve to explain the invention. In the drawings:
FIG. 1 is a flow chart of a control method of a radio frequency power supply applied to an etching machine according to an embodiment of the invention;
FIG. 2 is a schematic diagram of a RF power control system for an etcher in accordance with an embodiment of the present invention;
fig. 3 is a prior art vacuum etching machine.
Detailed Description
The preferred embodiments of the present invention will be described below with reference to the accompanying drawings, it being understood that the preferred embodiments described herein are for illustration and explanation of the present invention only, and are not intended to limit the present invention.
The invention aims at solving the problems that two power supply modules are needed in the prior art for applying the radio frequency power supply control method to the etching machine, and the invention adopts one radio frequency power supply module to realize the functions of independently supplying power to a coil assembly in an etching groove, supplying signals and generating self-bias voltage to etch an etching object.
Example 1:
as shown in fig. 1, the present invention includes a radio frequency power supply control method applied to an etching machine, including:
obtaining etching information, determining the etching type of an object to be etched, and determining the etching requirement according to the etching type;
according to the etching requirement, establishing a radio frequency power supply-based simulation etching model;
determining a control scheme of a radio frequency power supply according to the simulated etching model, and controlling the radio frequency power supply according to the control scheme to etch;
the working principle of the technical scheme is as follows: in the prior art, the radio frequency power supply control method is applied to the etching machine, two radio frequency power supply modules are needed, one of the radio frequency power supply modules supplies power to a coil assembly in an etching groove, the other radio frequency power supply module etches an object to be etched through self-bias, so that the etching machine etches cost is high, and etching efficiency is low;
The beneficial effects of the technical scheme are as follows: according to the invention, the etching type of the object to be etched is automatically judged, the etching requirement is determined, so that the system is favorable for automatically determining the etching scheme before etching, manual participation is not needed, the occurrence of error rate is avoided, in addition, the establishment of the scheme is performed by establishing a simulation etching model of a radio frequency power supply, the accurate etching is favorably performed according to the etching requirement of the object to be etched, the error in the etching process is avoided, and the etching accuracy is increased.
Example 2:
in one embodiment of the invention: the step of obtaining etching information, determining the etching type of an object to be etched, and determining the etching requirement according to the etching type comprises the following steps:
obtaining etching information, determining basic parameters of an object to be etched, and determining retrieval information of the object to be etched according to the basic parameters;
according to the search information, acquiring the etching type and etching flow of the object to be etched through a preset etching database;
analyzing the etching type and etching flow of the object to be etched to determine etching requirements;
the working principle of the technical scheme is as follows: according to the invention, the etching requirement is determined by a manual input mode when the etching requirement of an object to be etched is determined, and input information is required to be waited before each etching, so that the etching error rate is increased and more time is spent due to manual errors.
The beneficial effects of the technical scheme are as follows: according to the method, the basic parameters of the object to be etched are obtained, and the basic parameters are integrated to generate the keyword information code matching database, so that the index efficiency is improved, the target object information is found out quickly, the etching efficiency and the accuracy are improved, the etching requirement is determined by analyzing the etching type of the object to be etched, the etching mode of the object to be etched is matched accurately, and the reduction of the etching efficiency caused by manual errors is avoided.
Example 3:
in one embodiment of the invention: according to the etching requirement, establishing a radio frequency power supply-based simulated etching model comprises the following steps:
acquiring historical etching data, determining etching parameters, and taking the etching parameters as training set data;
template etching parameters in the etching database are obtained and used as test set data;
training the training set data based on the test set data to generate a simulated etching model based on a radio frequency power supply.
The working principle of the technical scheme is as follows: in the prior art, the application of the radio frequency power supply control method to the etching machine does not involve the collection and analysis of historical etching data, so that a simulation etching model based on the radio frequency power supply is not established, and the efficiency of etching is not improved although the application of the radio frequency power supply control method to the etching machine.
The beneficial effects of the technical scheme are as follows: in the invention, the historical etching data is tracked and marked, and the historical etching data is trained based on the template etching parameters to generate the simulated etching model based on the radio frequency power supply, so that the predictability of etching is improved by effectively utilizing the historical etching data.
Example 4:
in one embodiment of the invention: the method comprises the steps of determining a control scheme of a radio frequency power supply according to the simulated etching model, controlling the radio frequency power supply according to the control scheme, and etching, and further comprises:
when the radio frequency power supply is controlled, the radio frequency power is monitored in real time, and the real-time radio frequency power is dynamically regulated;
the dynamic adjustment process includes:
the radio frequency coupler is electrically connected with the signal generator to obtain a control signal and a reflection component result according to the control signal;
based on the reflection component result, acquiring real-time radio frequency power of the etching machine, and dynamically adjusting the real-time radio frequency power; wherein,
When the real-time radio frequency power of the etching machine is lower than a preset radio frequency power range, amplifying the output power by adopting a power amplifier;
when the real-time radio frequency power of the etching machine is higher than a preset radio frequency power range, a power attenuator is adopted to attenuate the output power.
The working principle of the technical scheme is as follows: the radio frequency coupler is mainly used for power distribution, dynamic adjustment of power cannot be realized, so that radio frequency power cannot be changed according to real-time change, etching efficiency is reduced, and an etching machine is also caused to be failed; when the real-time radio frequency power of the etching machine is higher than the preset radio frequency power range, the power attenuator is adopted to attenuate the output power, so that the probability of failure of the etching machine is reduced.
The beneficial effects of the technical scheme are as follows: according to the invention, the radio frequency coupler is connected with the signal generator to realize dynamic adjustment of radio frequency power, so that electrical isolation between the input end and the output end is facilitated, the input signal and the output signal are not influenced, the anti-interference capability and the etching stability in the etching process are improved, and the etching efficiency and the service life of the etching machine are improved.
Example 5:
in one embodiment of the invention: the method for obtaining etching information, determining basic parameters of an object to be etched, determining search information of the object to be etched according to the basic parameters, and further comprises the following steps:
judging whether the basic parameters of the object to be etched meet etching standards or not, wherein the process comprises the following steps:
the radio frequency power supply acquires basic parameters of an object to be etched in real time by sending radio frequency signals; wherein the basic parameters include: material composition, shape data, and size;
according to the basic parameters of the object to be etched, a pre-stored etching object database is called, the basic parameters are compared with template etching parameters in the database one by one, and a comparison result is determined;
judging whether the basic parameters of the object to be etched can reach the working standard or not according to the comparison result;
when the basic parameters of the object to be etched meet the etching standard, triggering an etching machine starting command, sending out a control signal and sending out the control signal;
when the basic parameters of the object to be etched do not meet the working standard, the machine stops running, fault detection is automatically started, and the basic parameters which do not meet the standard are sent to a preset management platform.
The working principle of the technical scheme is as follows: the invention relates to a method for controlling a radio frequency power supply, which is applied to an etching machine, and solves the problem that basic parameters of an object to be etched are acquired, wherein an operator can confirm basic parameter information of the object to be etched in advance according to a rule before production and record the basic parameter information in an active input mode only in the control of a manual control machine, and comprises the following steps: after the material composition, the shape data, the size and the like are checked, the button is considered to be clicked to start the etching process, the radio frequency power supply is adopted to automatically collect the basic parameters of the object to be etched before the etching work, the collected basic parameters are automatically compared with the normal working range, if all the parameters are in the normal range, the object to be etched is judged to be capable of working normally, a control signal is emitted, and when the collected basic parameters are not in the normal range, the machine stops running.
The beneficial effects of the technical scheme are as follows: according to the invention, basic parameters of an object to be etched are automatically collected in advance before etching, the whole process is automatically carried out without manual participation, the etching efficiency and the productivity of an etching machine are improved, data can be automatically recorded and classified, the data loss is avoided, the data can be automatically called, a dynamic analysis table is generated, the faults are classified and predicted, the management platform is facilitated to timely acquire the operation parameter change of the etching machine, and if abnormal conditions occur, emergency measures are taken, so that the etching risk is reduced.
Example 6:
in one embodiment of the invention: when the basic parameters of the object to be etched meet the etching standard, triggering an etching machine starting command, sending a control signal, and sending the control signal, wherein the method comprises the following steps:
according to the control signal, starting a control system to etch the object to be etched and obtaining the etched object, wherein the process comprises the following steps:
the driving circuit receives a control signal, places the object to be etched into the machine, obtains an object entering signal to be etched in the machine, and opens the first etching bath authority;
acquiring the etched quantity of the first etching tank according to a first etching tank permission starting signal, starting a timing function of a machine table, performing primary etching, stopping timing when a primary etching indicator lamp is on, determining a primary etching object, and recording primary time;
according to the etching result of the first-stage etching object, closing the first etching trough permission, opening the second etching trough permission, obtaining the etched quantity of the second etching trough, starting the timing function of the machine, performing second-stage etching, stopping timing when a second-stage etching indicator light is on, determining a second-stage etching object, and recording second-stage time;
The working principle of the technical scheme is as follows: in the invention, when basic parameters of the object to be etched are not abnormal, a control signal is sent to a driving circuit, the object to be etched is automatically placed into the machine, the operation steps of controlling the object to be etched by opening and closing the authority in the machine are firstly carried out, the first etching trough authority is opened, the object to be etched is etched for the first time, and after the first etching is finished, the authority of the first etching trough is closed and the authority of the second etching trough is opened, namely, the object to be etched for the second time is etched for the second time, and the water is automatically closed in the whole process by adopting the automatic control of the water-washing process;
In a specific embodiment, when etching an etching object, a high-frequency current is first passed through the induction coil, so that a magnetic field generated by the induction coil in the etching machine is perpendicular to the coil, and the magnetic field is kept in a uniform state before etching,
step 1: the gas in the etching machine is ionized to ensure that electrons acquire energy in an electric field, so that the speed of electron acceleration in the etching process determines the etching accuracy, and a minimum speed calculation formula is as follows:
wherein v is 0 Represents the minimum velocity of electrons in the etching machine, e is the basic charge, r represents the radius of a discharge chamber in the etching machine, M 0 The initial magnetic field of the discharge chamber inside the etching machine is shown, omega is the corresponding angular velocity value of the electron in the etching process, and t is the corresponding time when the object is etchedM represents the corresponding speed of electrons;
step 2: comparing the minimum calculation formula of the electrons with the actual electron speed, judging whether the current electron can reach the minimum standard in the etching process of the etching object, wherein the calculation formula of the actual electron speed during the current etching is as follows:
wherein v is 1 Indicating the actual velocity of the electrons,the mean free path of electrons is represented, f represents the frequency of an electric field, lambda represents the wavelength, and p represents the pressure of gas in an etching machine;
When v is satisfied 0 ≤v 1 Indicating that the velocity of the electrons meets the etching requirement, when v 0 >v 1 Indicating that the velocity of the electrons, which are discarded, is not satisfactory for etching;
step 3: calculating the electromagnetic field intensity in the etching machine, when the electromagnetic field intensity M in the etching machine 1 Can meet the minimum requirement, then the etching is performed for the etching object,
wherein M is 1 Represents the intensity of electromagnetic field in the etching machine station lambda 1 R omega, which is the distance the electron moves in the vacuum radius r, is the angular acceleration value corresponding to the electron, combined with v 0 The minimum standard of the electromagnetic field intensity in the etching machine can be obtained by the calculation formula of (1), M 0 An initial magnetic field of a discharge chamber in the etching machine table is shown;
the beneficial effects of the technical scheme are as follows: in the invention, the object to be etched is operated by controlling the authority and is automatically timed, thereby being beneficial to acquiring data information in the etching process and judging the etching result, in addition, the etching process is carried out twice, being beneficial to improving the efficiency and the quality of the etching process, reducing the etching result with low quality and improving the availability.
Example 7:
in one embodiment of the invention: starting a control system to etch the object to be etched according to the control signal, and obtaining the etched object, including:
washing the secondary etching object, detecting the quality of the washing object,
the quality detection process comprises the following steps:
closing the second etching trough permission and opening the rinsing trough permission according to the second etching object;
washing the secondary etching object with water to obtain a tertiary etching object;
based on the three-level etching object, adopting a radio frequency matching network to dynamically detect the three-level etching object to obtain a dynamic detection result;
judging whether the three-level etching object reaches a use standard or not according to the dynamic detection result of the three-level etching object, determining a judgment result and recording the judgment result;
the working principle of the technical scheme is as follows: according to the invention, the three-level etching object obtained after etching and water washing is directly output, so that the etched object is damaged and the failure rate caused by the direct application of the etched object is not found;
In one particular embodiment, when the etched object is quality inspected through the matching network,
step 1: first, component parameter values are normalized and the response of the filter attenuation to frequency in the matching network is calculated:
where S represents the response of the filter attenuation in the matching network to the power output, the method comprises the steps that the resonant frequency is represented, R represents a corresponding overall resistance value in a matching network, C represents a main capacitance value responsible for charging and discharging in the network, L represents a real-time inductance value in an etching machine, and j is an imaginary symbol;
step 2: for the response of the attenuation of the filter to frequency, the response of the input of the filter to power in the case of an etcher in the power-off condition is calculated:
wherein T represents the adjusting parameter of the frequency when the filter in the matching network works, R represents the corresponding total resistance value in the matching network,the resonance frequency at this time is represented by L, the real-time inductance value in the etching machine is represented by L, and the main capacitance value responsible for charging and discharging in a network is represented by C;
the beneficial effects of the technical scheme are as follows: in the invention, the secondary etching object obtained by secondary etching is washed, and the three-time etching object obtained by washing is dynamically detected through the radio frequency matching network, so that noise interference in the detection process is reduced, the power capacity is improved, the linearity of the power response is improved, and the power loss in the etching process is reduced.
Example 8:
in one embodiment of the invention: the method for dynamically detecting the three-level etching object by adopting the radio frequency matching network based on the three-level etching object to obtain a dynamic detection result comprises the following steps:
comparing the primary time and the secondary time with a preset time range, and judging whether the primary time and the secondary time are in normal working time or not;
when the primary time and the secondary time are in a preset time range, judging that the primary time and the secondary time are normal working time, and setting a primary detection result as a default result;
based on the three-level etching object, generating resonance for self-excitation frequency and radio frequency in the matching network, detecting corner information of the three-level etching object, and acquiring a detection result;
judging whether the tertiary etching object is damaged or not according to the corner detection result of the tertiary etching object;
when the third-stage etching object is not damaged, setting a second-stage detection result as a default result;
partitioning the three-level etching object, randomly selecting a convex point in each region, carrying out electron microscope analysis on the convex point to obtain quality parameters, and determining an analysis result;
Judging whether the quality parameter of the three-level etching object reaches a quality standard or not based on the analysis result, and setting a three-level detection result as a default result when the quality parameter of the three-level etching object reaches the quality standard;
the working principle of the technical scheme is as follows: in the invention, when a matching network is adopted to detect the three-stage etched object obtained by washing, preliminary analysis is carried out through the time of primary etching, secondary etching and washing, if the time is within a preset time range, the detection of the second step is carried out, namely, resonance is generated between self-excitation frequency and radio frequency in the matching network, the corner detection is carried out on the etched object, whether the appearance of the etched object is damaged is judged, if the appearance of the etched object is not detected, the third step is carried out, namely, the etched object is divided into an upper area, a lower area, a left area, a right area and a middle area, a salient point is randomly selected in each area, the electron microscope analysis is carried out on the salient point, the random detection result is obtained, the quality detection is carried out on the etched object through the three steps, and finally, the data of the etched object subjected to the quality detection are summarized and integrated;
The beneficial effects of the technical scheme are as follows: according to the invention, the quality detection is carried out on the three-stage etched objects obtained after etching and water washing, so that the quality information of the etched objects is favorable for obtaining, the etched objects which reach the use standard and the etched objects which do not reach the use standard are classified, the availability of the effective etched objects is improved, the quality of the etched objects is unfolded and detected through three steps, the detection efficiency and accuracy are favorable, and finally the data of the etched objects subjected to the quality detection are summarized and integrated, the fault information in the etching process is favorable for obtaining, the fault information is classified and analyzed, the fault reason is favorable for further improving the etching machine, and the efficiency and the accuracy of the etching machine in the etching process are improved.
Example 9:
in one embodiment of the invention: judging whether the three-level etching object reaches a use standard according to the dynamic detection result of the three-level etching object, determining the judgment result and recording the judgment result, wherein the method comprises the following steps:
based on the primary detection result, the secondary detection result and the tertiary detection, when the primary detection result, the secondary detection result and the tertiary detection result are all default results;
Judging that the three-level etching object accords with a use standard;
when the primary detection result, the secondary detection result and the tertiary detection result have detection results which are not default results;
determining that the three-level etching object does not accord with the use standard, counting the etching objects which do not accord with the use standard, classifying according to the detection result, determining a classification result, and recording the classification result;
the working principle of the technical scheme is as follows: in the invention, three-step quality detection is carried out on the three-stage etched object obtained after etching and washing through a radio frequency matching network, when the etching time and the washing time are both in a preset range, no damage is detected on the appearance of the etched object, when the randomly selected area salient points are normal, the quality detection of the etched object is judged to pass, when the etched object does not reach the standard in one step, namely, the etched object is judged to not meet the use standard, and finally, the data of the etched object which is not detected is recorded and analyzed to obtain the fault reason;
The beneficial effects of the technical scheme are as follows: according to the invention, the quality of the etched object is detected after etching, so that the accuracy of the output etched object is improved, the etching failure rate is reduced, the parameters of the etching result with failure are integrated and analyzed, the failure cause is obtained, and the etching machine is improved in a targeted manner, so that the efficiency and accuracy of the etching machine in the etching process are improved.
Example 10:
as shown in fig. 1, the present invention includes a radio frequency power supply control system for an etching machine, comprising:
the demand determination module: the method comprises the steps of judging the etching type of an object to be etched, and determining the etching requirement according to the etching type;
and a model generation module: the method is used for establishing a radio frequency power supply-based simulated etching model according to the etching requirements;
the scheme output module: the control scheme is used for determining the control scheme of the radio frequency power supply according to the simulated etching model, and etching the object to be etched according to the control scheme
The working principle of the technical scheme is as follows: in the prior art, the radio frequency power supply control method is applied to the etching machine, the etching type of the object to be etched is input by a manual method, and the etching machine is initialized, so that the etching efficiency is low and the etching risk is improved.
The beneficial effects of the technical scheme are as follows: according to the invention, the etching type of the object to be etched is automatically judged, the etching requirement is determined, so that the system is favorable for automatically determining the etching scheme before etching, manual participation is not needed, the occurrence of error rate is avoided, in addition, the establishment of the scheme is performed by establishing a simulation etching model of a radio frequency power supply, the accurate etching is favorably performed according to the etching requirement of the object to be etched, the error in the etching process is avoided, and the etching accuracy is increased.
It will be apparent to those skilled in the art that various modifications and variations can be made to the present invention without departing from the spirit or scope of the invention. Thus, it is intended that the present invention also include such modifications and alterations insofar as they come within the scope of the appended claims or the equivalents thereof.
Claims (8)
1. The radio frequency power supply control method applied to the etching machine is characterized by comprising the steps of obtaining etching information, determining the etching type of an object to be etched, and determining the etching requirement according to the etching type;
according to the etching requirement, establishing a radio frequency power supply-based simulation etching model;
determining a control scheme of a radio frequency power supply according to the simulated etching model, and controlling the radio frequency power supply according to the control scheme to etch;
The step of obtaining etching information, determining the etching type of an object to be etched, and determining the etching requirement according to the etching type comprises the following steps:
obtaining etching information, determining basic parameters of an object to be etched, and determining retrieval information of the object to be etched according to the basic parameters;
according to the search information, acquiring the etching type and etching flow of the object to be etched through a preset etching database;
analyzing the etching type and etching flow of the object to be etched to determine etching requirements;
the method for obtaining etching information, determining basic parameters of an object to be etched, determining search information of the object to be etched according to the basic parameters, and further comprises the following steps:
judging whether the basic parameters of the object to be etched meet etching standards or not, wherein the process comprises the following steps:
the radio frequency power supply acquires basic parameters of an object to be etched in real time by sending radio frequency signals; wherein the basic parameters include: material composition, shape data, and size;
according to the basic parameters of the object to be etched, a pre-stored etching object database is called, the basic parameters are compared with template etching parameters in the database, and a comparison result is determined;
Judging whether the basic parameters of the object to be etched can reach the working standard or not according to the comparison result;
when the basic parameters of the object to be etched meet the etching standard, triggering an etching machine starting command and sending out a control signal;
when the basic parameters of the object to be etched do not meet the working standard, sending an operation stopping instruction to the etching machine, automatically starting fault detection, and sending the basic parameters which do not meet the standard to a preset management platform.
2. The method of claim 1, wherein the creating a simulated etching model based on the rf power supply according to the etching requirement comprises:
acquiring historical etching data, determining etching parameters, and taking the etching parameters as training set data;
template etching parameters in the etching database are obtained and used as test set data;
training the training set data based on the test set data to generate a simulated etching model based on a radio frequency power supply.
3. The method of claim 1, wherein determining a control scheme of the rf power supply according to the simulated etching model, and controlling the rf power supply according to the control scheme, and etching, further comprises:
When the radio frequency power supply is controlled, the radio frequency power is monitored in real time, and the real-time radio frequency power is dynamically regulated;
the dynamic adjustment process includes:
the radio frequency coupler is electrically connected with the signal generator to obtain a control signal and a reflection component result according to the control signal;
based on the reflection component result, acquiring real-time radio frequency power of the etching machine, and dynamically adjusting the real-time radio frequency power; wherein,
when the real-time radio frequency power of the etching machine is lower than a preset radio frequency power range, amplifying the output power by adopting a power amplifier;
when the real-time radio frequency power of the etching machine is higher than a preset radio frequency power range, a power attenuator is adopted to attenuate the output power.
4. The method of claim 1, wherein triggering an etcher start command and issuing a control signal when the basic parameters of the object to be etched meet etching criteria, comprises:
according to the control signal, starting a control system to etch the object to be etched and obtaining the etched object, wherein the process comprises the following steps:
the driving circuit receives a control signal, places the object to be etched into the machine, obtains an object entering signal to be etched in the machine, and opens the first etching bath authority;
Acquiring the etched quantity of the first etching tank according to a first etching tank permission starting signal, starting a timing function of a machine table, performing primary etching, stopping timing when a primary etching indicator lamp is on, determining a primary etching object, and recording primary time;
and according to the etching result of the first-stage etching object, closing the first etching groove authority, opening the second etching groove authority, obtaining the etched quantity of the second etching groove, starting the timing function of the machine, performing second-stage etching, stopping timing when the second-stage etching indicator lamp is turned on, determining the second-stage etching object, and recording the second-stage time.
5. The method of claim 4, wherein starting the control system to etch the object to be etched according to the control signal, and obtaining the etched object, comprises:
washing the secondary etching object, detecting the quality of the washing object,
the quality detection process comprises the following steps:
closing the second etching trough permission and opening the rinsing trough permission according to the second etching object;
washing the secondary etching object with water to obtain a tertiary etching object;
Based on the three-level etching object, adopting a radio frequency matching network to dynamically detect the three-level etching object to obtain a dynamic detection result;
and judging whether the three-level etching object reaches a use standard or not according to the dynamic detection result of the three-level etching object, determining a judgment result and recording the judgment result.
6. The method of claim 5, wherein the step of dynamically detecting the three-stage etching object by using a radio frequency matching network based on the three-stage etching object to obtain a dynamic detection result comprises:
comparing the primary time and the secondary time with a preset time range, and judging whether the primary time and the secondary time are in normal working time or not;
when the primary time and the secondary time are in a preset time range, judging that the primary time and the secondary time are normal working time, and setting a primary detection result as a default result;
based on the three-level etching object, generating resonance for self-excitation frequency and radio frequency in the matching network, detecting corner information of the three-level etching object, and acquiring a detection result;
judging whether the tertiary etching object is damaged or not according to the corner detection result of the tertiary etching object;
When the third-stage etching object is not damaged, setting a second-stage detection result as a default result;
partitioning the three-level etching object, randomly selecting a convex point in each region, carrying out electron microscope analysis on the convex point to obtain quality parameters, and determining an analysis result;
and judging whether the quality parameter of the tertiary etching object reaches a quality standard or not based on the analysis result, and setting the tertiary detection result as a default result when the quality parameter of the tertiary etching object reaches the quality standard.
7. The method of claim 5, wherein determining whether the tertiary etching object meets a use standard according to a dynamic detection result of the tertiary etching object, determining a determination result, and recording the determination result, comprises:
based on the primary detection result, the secondary detection result and the tertiary detection, when the primary detection result, the secondary detection result and the tertiary detection result are all default results;
judging that the three-level etching object accords with a use standard;
when the primary detection result, the secondary detection result and the tertiary detection result have detection results which are not default results;
And judging that the three-level etching object does not accord with the use standard, counting the etching objects which do not accord with the use standard, classifying according to the detection result, determining a classification result, and recording the classification result.
8. A radio frequency power supply control system for an etcher, comprising a demand determination module: the method comprises the steps of judging the etching type of an object to be etched, and determining the etching requirement according to the etching type;
and a model generation module: the method is used for establishing a radio frequency power supply-based simulated etching model according to the etching requirements;
the scheme output module: the control scheme is used for determining a control scheme of the radio frequency power supply according to the simulated etching model, and etching the object to be etched according to the control scheme;
obtaining etching information, determining the etching type of an object to be etched, and determining the etching requirement according to the etching type, wherein the method comprises the following steps:
obtaining etching information, determining basic parameters of an object to be etched, and determining retrieval information of the object to be etched according to the basic parameters;
according to the search information, acquiring the etching type and etching flow of the object to be etched through a preset etching database;
Analyzing the etching type and etching flow of the object to be etched to determine etching requirements;
the method for obtaining etching information, determining basic parameters of an object to be etched, determining search information of the object to be etched according to the basic parameters, and further comprises the following steps:
judging whether the basic parameters of the object to be etched meet etching standards or not, wherein the process comprises the following steps:
the radio frequency power supply acquires basic parameters of an object to be etched in real time by sending radio frequency signals; wherein the basic parameters include: material composition, shape data, and size;
according to the basic parameters of the object to be etched, a pre-stored etching object database is called, the basic parameters are compared with template etching parameters in the database, and a comparison result is determined;
judging whether the basic parameters of the object to be etched can reach the working standard or not according to the comparison result;
when the basic parameters of the object to be etched meet the etching standard, triggering an etching machine starting command and sending out a control signal;
when the basic parameters of the object to be etched do not meet the working standard, sending an operation stopping instruction to the etching machine, automatically starting fault detection, and sending the basic parameters which do not meet the standard to a preset management platform.
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