CN114114855A - Exposure abnormity detection method of laser direct writing system - Google Patents
Exposure abnormity detection method of laser direct writing system Download PDFInfo
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- CN114114855A CN114114855A CN202111496546.7A CN202111496546A CN114114855A CN 114114855 A CN114114855 A CN 114114855A CN 202111496546 A CN202111496546 A CN 202111496546A CN 114114855 A CN114114855 A CN 114114855A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
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- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention relates to an exposure abnormity detection method of a laser direct writing system, wherein the laser direct writing system is provided with an exposure area and a detection area, the exposure area is used for exposing a workpiece image, the detection area is used for exposing a detection image, the detection area is provided with a mark point, the detection image is subjected to counterpoint exposure according to the mark point, data information of the exposed detection image is obtained, and the exposure abnormity of the laser direct writing system is detected according to the data information of the exposed detection image. The detection image is exposed by the detection area, so that whether the laser direct writing system is abnormal or not can be detected conveniently in time, unqualified exposed workpieces can be processed in time, the outflow of an abnormal plate can be reduced, the problems of the laser direct writing system can be corrected in time, the abnormal plate can be avoided, and the loss can be effectively reduced.
Description
Technical Field
The invention relates to the technical field of laser direct writing, in particular to a self-checking method in the field of laser direct writing.
Background
The laser direct writing exposure system is also called as an image direct projection system, can be applied to the research and development and production in the fields of semiconductor, PCB and plane imaging, and has the principle that a pattern generator is used for replacing the traditional mask technology to directly expose the pattern data of a computer to a product, thereby saving the cost and improving the efficiency.
A commonly used pattern generator of the laser direct writing exposure system is a Digital Micromirror array (DMD), a liquid crystal display, a rotating polygon scanner, or a Grating Light Valve (GLV). When the laser direct writing system exposes a workpiece, the workpiece is covered with photoresist, the image generator is controlled, part of light irradiates the workpiece according to an image to be exposed, part of light deviates from the workpiece and is emitted out, the image to be exposed is obtained on the workpiece, and before exposure, the workpiece is required to be aligned, so that the exposed image is correctly projected to a corresponding position of the workpiece. In the exposure process, if the control of the pattern generator is abnormal or deviation exists in the alignment process, the exposure result has serious defects, if the exposure result is not monitored in time, the workpiece with problems can be transferred to the subsequent process procedure for next processing, the workpiece with problems can only be scrapped finally, and in the case that the system abnormality is not found and exists all the time, the exposure of a new workpiece can be continuously carried out, and finally irretrievable loss is caused.
Disclosure of Invention
The invention aims to provide an exposure abnormity detection device and method suitable for a laser direct writing system.
In order to solve the above problems, the present invention provides a method for detecting an exposure anomaly of a laser direct writing system, wherein the laser direct writing system is provided with an exposure area and a detection area, the exposure area is used for exposing a workpiece image, the detection area is used for exposing a detection image, the detection area is provided with a mark point, the detection image is subjected to para-position exposure according to the mark point, data information of the exposed detection image is obtained, and the exposure anomaly of the laser direct writing system is detected according to the data information of the exposure detection image.
Further, the data information of the exposure detection image includes position information, and whether the alignment of the laser direct writing system has deviation is detected according to the position information of the exposure detection image.
Further, the data information of the exposure detection image comprises image integrity information, and whether the pattern generator of the laser direct writing system is controlled to be abnormal or not is detected according to the image integrity information of the exposure detection image.
Furthermore, the same position area of the detection area is exposed for multiple times of detection images, and the detection images of each exposure are different.
Further, the detection images exposed in the same position area of the detection area have different shapes or sizes.
Further, the detection images exposed in the same position area of the detection area have the same central position.
Further, the photosensitive material of the detection area can display a detection image after exposure, and after a period of time, the portion displaying the detection image is restored to the original state.
Furthermore, the workpiece image of the exposure area and the detection image of the detection area are respectively aligned and integrated into exposure image data, the exposure image data are correspondingly split into exposure strips according to the exposure image data, the exposure area and the detection area are subjected to strip exposure, and each exposure strip contains graphic data of the detection image.
Furthermore, the detection image comprises a characteristic image, and the characteristic image is formed by exposing and splicing two adjacent strips.
The laser direct writing system of the exposure anomaly detection method comprises an optical mechanism, an image acquisition mechanism and a platform mechanism, wherein the platform mechanism is used for bearing a workpiece, the platform mechanism drives the workpiece to move to the image acquisition mechanism for alignment detection operation, the platform mechanism drives the workpiece to move to the optical mechanism for exposure operation, the platform mechanism comprises a table top, a detection scale and a motion mechanism, the motion mechanism drives the table top and the detection scale to move, and the detection scale is provided with mark points and is used for detecting alignment of images.
Further, the detection scale comprises a calibration area and a detection area, and the detection area is adjacent to the table top.
Furthermore, the detection scale is provided with positioning points, and the positioning points are used as mark points to align the detection images.
Furthermore, the optical mechanism comprises a first group of optical lenses and a second group of optical lenses, the first group of optical lenses and the second group of optical lenses are arranged at intervals in the scanning direction, and the detection scales are arranged on two opposite sides of the table board.
Compared with the prior art, the detection image is exposed by the detection area, so that whether the laser direct writing system is abnormal or not can be detected conveniently and timely, unqualified exposed workpieces can be processed timely, the outflow of an abnormal plate can be reduced, the problems of the laser direct writing system can be corrected timely, the abnormal plate can be avoided, and the loss can be effectively reduced.
Drawings
FIG. 1 is a schematic diagram of an exposure area and a detection area of an embodiment of a laser direct write system.
FIG. 2 is a schematic diagram of an exposure area and a detection area of another embodiment of a laser direct write system.
FIG. 3 is a schematic diagram of a laser direct write system graphics process.
Fig. 4 is a first embodiment of the detection image.
Fig. 5 is a second embodiment of the detection image.
FIG. 6 is a first schematic diagram of a process for detecting image exposure.
FIG. 7 is a second schematic diagram of the process of detecting image exposure.
Fig. 8 is a schematic view of the center of the marker point and the center of the exposure detection image.
FIG. 9 is a schematic view of an exposed feature image.
Fig. 10 is a schematic view of acquiring an exposure inspection image.
Fig. 11 is a schematic view of acquiring an exposure detection image.
FIG. 12 is a schematic diagram of an embodiment of a laser direct writing system.
FIG. 13 is a schematic diagram of a second embodiment of a laser direct writing system.
FIG. 14 is a schematic view of an embodiment of a detection scale.
Detailed Description
In order that the objects, aspects and advantages of the invention will become more apparent, the invention will be described by way of example only, and in connection with the accompanying drawings.
The invention relates to an exposure anomaly detection method of a laser direct writing system, as shown in fig. 1-2, the laser direct writing system is correspondingly provided with an exposure area 1 and a detection area 2, the exposure area 1 is used for carrying out image exposure on a workpiece, the detection area 2 is used for detecting exposure anomaly, and the detection image after exposure is detected and analyzed by exposing the detection image in the detection area 2 to obtain whether the exposure anomaly exists. Preferably, the detection area 2 is a strip shape, is disposed on one side or two opposite sides of the exposure area 1, and extends perpendicular to the scanning direction of the laser direct writing system. The detection area 2 is adjacent to the exposure area 1, so that the length of an exposure strip is shortened, and the exposure efficiency is improved.
The workpiece placed in the exposure area is provided with a contraposition point, the detection area is provided with a mark point 20, the image to be exposed of the workpiece is contraposition through the contraposition point, and the detection image is contraposition through the mark point 20. As shown in fig. 3, the image to be exposed corresponding to the workpiece and the inspection image to be exposed corresponding to the inspection area are respectively adjusted according to the alignment result, and workpiece image data and inspection image data are obtained. And integrating the workpiece image data and the detection image data into exposure image data, and carrying out image exposure on the exposure area and the detection area according to the exposure image data. When exposure scanning is carried out according to the exposure image data, the exposure image data is split into a plurality of strip data for exposure operation, a single optical lens in the laser direct writing system carries out scanning exposure once in the scanning direction to form an exposure strip, the strip data at least comprises one piece of detection image data, and each exposure strip forms at least one exposure detection image corresponding to the exposure strip in the detection area.
As shown in fig. 4-7, the detection image may be a regular image, such as a plurality of figures, such as a circle, a square, a rectangle, a circular array, a bar array, etc., where the edge of the figure is obtained by regular arrangement of equally large circles, and the bar array is obtained by regular arrangement of rectangles, such as rectangular array arrangement, parallel arrangement and/or vertical arrangement; the exposure inspection image may also take an irregular pattern such as an irregular polygon or an irregular curve.
When the detection image exposure is carried out on the same area of the detection area, the detection image is exposed on the same area by adopting a mode of setting different detection images, for example, when the detection area is exposed for the first time, the detection image is circular, and the exposure detection image 21 is circular; when the same area of the detection area is exposed for the second time, the exposure detection image 21 is a square, the square does not intersect with the circle, or the side length of the square is the same as the diameter of the circle, and the centers of the circle and the square are overlapped. Of course, other patterns such as triangles, diamonds, etc. may be used, either inside or outside the first exposed circle. The detection image is an image to be exposed, the exposure detection image 21 is an image exposed to the detection area, and the exposure detection image corresponds to the detection image.
As shown in fig. 6-7, the detection images may also be the same pattern, and the size of the images may be different when the same area is exposed at different times. If the inspection image is circular, the circular radius of the exposure inspection image is R1 when the inspection area is exposed for the first time, and the circular radius of the exposure inspection image is R2 when the inspection area is exposed for the second time, where R2 may be larger than R1 or smaller than R1. Preferably, the detection images of the two exposures are circular, although the radii are different, the centers of the circles are the same. When the detection image is exposed in the detection area for multiple times, the detection image is exposed at the same position of the detection area at different moments by gradually increasing or gradually reducing the size of the detection image at equal intervals. As the first timing, the exposure detection image is a circle having a radius R1; at the second time, the exposure detection image is in a circle with the radius of R2 at the same position area; when the detection image exposed in the same position area at the third time is a circle with a radius of R3, the difference R between the radii of the detection images exposed in the same position area in the detection areas at the adjacent times isDifference (D)=R3-R2=R2-R1，RDifference (D)May be positive or negative, and is used for the circle of the detected image at the Nth timeRadius RN = R (N-1) + RDifference (D). The detection images are not limited to circular shapes, and can be various patterns such as square shapes, rectangular shapes, circular shapes, triangular shapes, parallelogram shapes and the like, exposure detection images exposed to the same position area of the detection area at different moments are obtained in a mode of changing the side length of the patterns at equal intervals and the like, the exposure detection images at different moments have a common center, and the different sizes are overlapped and do not interfere with each other.
The photosensitive material in the detection area can be selected from photosensitive materials with multiple exposure functions, the color of the exposed area and the color of the unexposed area of the photosensitive material are different, the color of the exposed area is changed into the color of the unexposed area after a period of time, the secondary exposure can be carried out, and the utilization rate of the detection area is further improved.
The detection area can be recycled by using a photosensitive material capable of being exposed for multiple times and/or using different detection images, and the utilization rate of the detection area is improved. The different detection images comprise the conditions that the detection images have different graphs, or the detection images have the same graph and different sizes.
After the detection area is exposed to detect the image, the image detection device is used for acquiring the image data of the detection area and analyzing the acquired image so as to know the exposure effect of the laser direct writing system, and whether redundant line patterns or lack line patterns exist in the exposure process or not is known by analyzing the integrity of the image of the detection area so as to detect whether the pattern generator has a problem in the exposure process or not. And acquiring whether the contraposition has deviation or not through the position of the detection image, and further evaluating whether the hardware precision of the laser direct writing system changes or not and whether the precision requirement is met or not.
The method for knowing whether the alignment has deviation can adopt a center comparison method. As shown in fig. 8, the image acquiring device acquires the position of the mark point center 22 of the detection area and the position of the exposure detection image center 23, compares whether there is a deviation between the two center positions, determines whether there is a deviation in alignment, and then monitors whether there is a precision change in a hardware device of the laser direct writing system. If the two centers are overlapped or basically overlapped and meet the requirement of alignment precision, no deviation occurs in alignment; if there is a large distance between the two centers, the alignment accuracy will deviate, and the related hardware devices of the laser direct writing system need to be calibrated. Preferably, the detection image is a regular image, such as a circle, rectangle, square, triangle, or other regular polygon.
The image detection device comprises an image acquisition device and an image analysis system, wherein the image acquisition device is used for acquiring an exposure detection image in the detection area and transmitting exposure detection image data to the image analysis system, and the image analysis system analyzes the exposure detection image data to obtain whether the exposure of the laser direct writing system has defects. And judging whether the exposed workpiece needs to be recycled or the next process is carried out according to whether the laser direct writing system has exposure defects and whether the severity of the exposure defects influences the subsequent processes. And judging whether hardware of the laser direct writing system needs to be calibrated or not according to whether the laser direct writing system has alignment deviation or not.
On this basis, the stitching effect of the laser direct writing system is further detected, as shown in fig. 9, in the detection images corresponding to the adjacent strips, at the strip stitching positions, the detection images successively exposed each include a part of the specific image 24, the part of the specific images in the adjacent detection images are stitched into a complete feature image, and the specific images may be circles, squares, straight lines, curves, and the like. And acquiring the splicing effect of the exposure image by acquiring the specific image and judging the splicing effect of the specific image.
As shown in fig. 10-11, the number of image acquisition devices 30 of the image detection device is the same as the number of strips simultaneously exposed by the laser direct writing system. And one exposure strip of the laser direct writing system exposes a corresponding detection image in the detection area and exposes a corresponding workpiece image in the exposure area. The image exposure of the workpiece can be carried out in the exposure area, and the exposure of the detection image is carried out in the detection area after the image exposure of the workpiece is finished; or exposure of the detection image can be carried out in the detection area, and then exposure of the workpiece image is carried out in the exposure area; the inspection image may also be interspersed in the workpiece image, such as: the method is applied to the case of exposing a plurality of workpieces at a time. According to the position of the detection image, before the exposure of the next band is performed or in the process of the exposure of the next band, before the detection image is moved to the position where the image acquisition device acquires the image, the image acquisition device 30 is moved to the position of the detection image corresponding to the previous band, and the exposure detection image is acquired. Such as: completing exposure of the first strip in an exposure area, completing exposure of a first detection image corresponding to the first strip in a detection area, and forming a first exposed detection image 200 in the detection area; moving the workpiece, performing exposure of a second strip, moving the image acquisition device 30 to a position corresponding to the first exposure detection image, and acquiring image data of the first exposure detection image 200 corresponding to the first strip by the image acquisition device 30 while performing exposure of the second strip; the workpiece is moved to expose a third strip, and at this time, the image acquiring device is moved to a position corresponding to the second exposure detection image 201 to acquire image data of the second exposure detection image 201 corresponding to the second strip. And synchronously acquiring data information of the exposure detection image when the exposure operation of the workpiece image is carried out. The two operations are simultaneously carried out, and the time burden of workpiece processing cannot be increased due to the operation of exposure effect detection.
As shown in fig. 12, the laser direct writing system according to an embodiment of the exposure effect detection method includes an optical mechanism 400, an image capturing mechanism 500, and a stage mechanism 600. The platform mechanism 600 is used for bearing a workpiece, the platform mechanism 600 drives the workpiece to move to the image acquisition mechanism 500 for alignment detection operation, and the platform mechanism 600 drives the workpiece to move to the optical mechanism 400 for exposure operation.
The platform mechanism comprises a table-board 601, a detection scale 602 and a motion mechanism, wherein the motion mechanism drives the table-board 601 and the detection scale 602 to move. The detection scale 602 is disposed on one side of the table top 601 or on both sides of the table top 601, and the detection scale 602 is perpendicular to the scanning direction of the table top.
As shown in fig. 13, the detection scale 602 includes a calibration area 603 and a detection area 604, the calibration area 603 includes positioning points 605 for calibrating a camera position relationship, a lens position relationship, and the like, and the detection area 604 includes mark points 606 for exposing a detection image. The calibration area and the detection area are divided, the detection area is adjacent to the table board, the length of an exposure strip is shortened, and the exposure efficiency is improved.
The calibration area 603 and the detection area 604 may also be shared, that is, the positioning point 605 of the calibration area 603 is used as a mark point for alignment, and the detection image is subjected to alignment exposure according to the mark point.
As shown in fig. 14, another embodiment of the laser direct writing system includes an optical mechanism 700, an image capturing mechanism 800, and a stage mechanism 900. The stage mechanism 900 includes a stage 901, a detection scale 902, and a movement mechanism. The optical mechanism 700 includes a plurality of optical lenses 701, the optical lenses 701 are arranged in two rows to respectively form a first group of optical lenses 702 and a second group of optical lenses 703, and each row of optical lenses 701 exposes at least one half of the mesa area. The detection scale 902 is disposed on two sides of the table 901, and detects exposure abnormality of the first group of optical lenses 702 or the second group of optical lenses 703 in corresponding regions respectively. The detection scale also comprises a calibration area and a detection area, and the specific configuration is as described above.
The acquisition of the exposure detection image on the detection scale may be performed after the exposure operation is completed completely, or as described above, an image acquisition device for acquiring the exposure detection image may be provided adjacent to the optical mechanism, so as to acquire the exposure detection image during the exposure operation.
The image acquisition devices for acquiring the alignment points of the workpiece, the image acquisition devices for acquiring the mark points of the detection area and the image acquisition devices for acquiring the exposure detection image in the image acquisition mechanisms (500, 800) can adopt the same image acquisition device, and can also be respectively provided according to different functions.
Claims (13)
1. An exposure anomaly detection method of a laser direct writing system is characterized by comprising the following steps: the laser direct writing system is provided with an exposure area and a detection area, the exposure area is used for exposing a workpiece image, the detection area is used for exposing a detection image, the detection area is provided with a mark point, the detection image is subjected to counterpoint exposure according to the mark point, data information of the exposed detection image is obtained, and the exposure abnormity of the laser direct writing system is detected according to the data information of the exposed detection image.
2. The exposure abnormality detection method of the laser direct writing system according to claim 1, characterized in that: and the data information of the exposure detection image comprises position information, and whether the alignment of the laser direct writing system has deviation or not is detected according to the position information of the exposure detection image.
3. The exposure abnormality detection method of the laser direct writing system according to claim 1, characterized in that: and detecting whether the pattern generator control of the laser direct writing system is abnormal or not according to the image integrity information of the exposure detection image.
4. The exposure abnormality detection method of the laser direct writing system according to claim 1, characterized in that: and carrying out multiple times of detection image exposure in the same position area of the detection area, wherein the detection image of each exposure is different.
5. The exposure abnormality detection method of the laser direct writing system according to claim 4, characterized in that: the shapes or sizes of the detection images exposed in the same position area of the detection area are different.
6. The method of detecting an exposure abnormality of a laser direct write system according to claim 5, characterized in that: the detection images exposed in the same position area of the detection area have the same central position.
7. The exposure abnormality detection method of the laser direct writing system according to claim 1, characterized in that: the photosensitive material of the detection area can display a detection image after exposure, and after a period of time, the part displaying the detection image is recovered to the initial state.
8. The exposure abnormality detection method of the laser direct writing system according to claim 1, characterized in that: and respectively aligning the workpiece image of the exposure area and the detection image of the detection area and integrating the workpiece image and the detection image into exposure image data, correspondingly splitting the exposure area and the detection area into exposure strips according to the exposure image data, and exposing the exposure area and the detection area in strips, wherein each exposure strip contains graphic data of the detection image.
9. The exposure abnormality detection method of the laser direct writing system according to claim 9, characterized in that: the detection image comprises a characteristic image, and the characteristic image is formed by exposing and splicing two adjacent strips.
10. A laser direct writing system to which any one of the exposure abnormality detection methods of claims 1 to 9 is applied, characterized in that: the laser direct writing system comprises an optical mechanism, an image acquisition mechanism and a platform mechanism, wherein the platform mechanism is used for bearing a workpiece, the platform mechanism drives the workpiece to move to the image acquisition mechanism to perform alignment detection operation, the platform mechanism drives the workpiece to move to the optical mechanism to perform exposure operation, the platform mechanism comprises a table top, a detection scale and a motion mechanism, the motion mechanism drives the table top and the detection scale to move, and the detection scale is provided with mark points and is used for detecting alignment of images.
11. The laser direct writing system of claim 10, wherein: the detection scale comprises a calibration area and a detection area, and the detection area is adjacent to the table top.
12. The laser direct writing system of claim 10, wherein: the detection scale is provided with positioning points, and the positioning points are used as mark points to align the detection images.
13. The laser direct writing system of claim 10, wherein: the optical mechanism comprises a first group of optical lenses and a second group of optical lenses, the first group of optical lenses and the second group of optical lenses are arranged at intervals in the scanning direction, and the detection scales are arranged on two opposite sides of the table board.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN116500872A (en) * | 2023-06-28 | 2023-07-28 | 鹏城实验室 | Continuous rotary exposure system and method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN116500872A (en) * | 2023-06-28 | 2023-07-28 | 鹏城实验室 | Continuous rotary exposure system and method |
| CN116500872B (en) * | 2023-06-28 | 2023-10-27 | 鹏城实验室 | Continuous rotary exposure system and method |
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