CN114114849B - Detachable vacuum chamber - Google Patents

Detachable vacuum chamber Download PDF

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Publication number
CN114114849B
CN114114849B CN202111298014.2A CN202111298014A CN114114849B CN 114114849 B CN114114849 B CN 114114849B CN 202111298014 A CN202111298014 A CN 202111298014A CN 114114849 B CN114114849 B CN 114114849B
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China
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vacuum chamber
sealing flange
lower vacuum
sealing
flange plate
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CN202111298014.2A
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CN114114849A (en
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高中彭
刘相波
张鸣
成荣
朱煜
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Tsinghua University
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Tsinghua University
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment

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  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The invention provides a detachable vacuum chamber, which comprises an upper vacuum chamber and a lower vacuum chamber which are detachable, wherein a supporting mechanism for fixing the upper vacuum chamber is arranged outside the upper vacuum chamber; a lifting mechanism is arranged below the lower vacuum chamber and used for butting and separating the lower vacuum chamber and the upper vacuum chamber, a spacing control mechanism is arranged at the butting position of the upper vacuum chamber and the lower vacuum chamber and electrically connected with the lifting mechanism and used for controlling the spacing between the upper vacuum chamber and the lower vacuum chamber; and a traveling mechanism and a traveling guide mechanism are arranged below the lower vacuum chamber. The invention realizes the easy detachment of the vacuum chamber, and the stored objects and the lower vacuum chamber are stably moved in and out together, thereby avoiding the disassembly of external equipment and ensuring the stable operation of the external equipment.

Description

Detachable vacuum chamber
Technical Field
The invention relates to the technical field of vacuum, in particular to a detachable vacuum chamber.
Background
Depending on the specifics of the product manufacturing process, especially the semiconductor manufacturing process, it is required to be done in a vacuum environment, and the vacuum chamber is a core component providing a vacuum system environment.
Depending on the technical requirements of the manufacturing process, it is necessary to store items or equipment in the vacuum chamber, and for smaller items, there is less demand on the size of the space, and they can be easily moved into and out of the vacuum chamber. For larger sized deposits or equipment, sufficient dimensional space needs to be reserved to allow movement into and out of the vacuum chamber.
But most of the existing vacuum chambers are designed to be cavity cover plates or side chamber doors. For a chamber structure adopting the chamber cover plate, the stored objects can be placed into the vacuum chamber with the chamber cover plate opened by adopting a hoisting mode. The process has a large requirement on the space above the vacuum chamber, and simultaneously, in the process of putting the objects into the bottom of the vacuum chamber, along with the increase of the downward displacement, the scraping and colliding frequency among the objects is increased. For the cavity structure adopting the side cavity door, the stored objects are moved in and out through the opened cavity door, a larger cavity door opening space needs to be reserved, and the difficulty is larger when the heavy stored objects are horizontally moved.
Furthermore, in the conventional vacuum equipment, most of the stored materials are required to move together with the chamber, and the equipment connected with the outside of the vacuum chamber is inevitably dismantled, so that additional work is added, and the process operation condition of the dismantled equipment can be influenced. Some equipment adopt avoid the mode continuous with the vacuum chamber, guarantee that the vacuum chamber is independent, do not influence its bulk movement, nevertheless need additionally to increase the installation that fixing device is used for equipping fixed, have so not only increased the counter weight of equipment, also need reserve fixing device's installation space simultaneously. For example, in a vacuum chamber of an EUV (extreme ultraviolet lithography) workpiece stage, the upper part of the vacuum chamber needs to be connected and fixed with other parts, and the chamber and the storage object are moved as a whole, which is cumbersome. That is, the vacuum chamber serves as a mounting/fixing platform for external equipment, and the movement of the vacuum chamber and the stored object as a whole is restricted.
Disclosure of Invention
In view of the above problems, an object of the present invention is to provide a detachable vacuum chamber having an upper vacuum chamber and a lower vacuum chamber, in which an object or equipment is placed, the upper vacuum chamber serves as a fixed platform and a frame for external equipment, and the lower vacuum chamber horizontally moves with respect to the upper vacuum chamber, so that the object or equipment can be easily detached from the lower vacuum chamber, and the object or equipment can be stably moved in and out together with the lower vacuum chamber, thereby making reasonable and effective use of space, preventing the external equipment from being detached, and ensuring the stable operation of the external equipment.
The invention provides a detachable vacuum chamber, which comprises an upper vacuum chamber and a lower vacuum chamber which are detachable, wherein a supporting mechanism for fixing the upper vacuum chamber is arranged outside the upper vacuum chamber; a lifting mechanism is arranged below the lower vacuum chamber and used for butting and separating the lower vacuum chamber and the upper vacuum chamber, a spacing control mechanism is arranged at the butting position of the upper vacuum chamber and the lower vacuum chamber and electrically connected with the lifting mechanism and used for controlling the spacing between the upper vacuum chamber and the lower vacuum chamber; and a traveling mechanism and a traveling guide mechanism are arranged below the lower vacuum chamber, the traveling mechanism is used for moving the lower vacuum chamber, and the traveling guide mechanism provides traveling guide for the traveling mechanism.
The opening outside of last vacuum chamber is provided with a week first sealing flange, the opening outside of lower vacuum chamber is provided with a week second sealing flange.
The supporting mechanism comprises supporting tables respectively arranged below two sides of the first sealing flange plate, the distance between the two supporting tables is larger than the width of the second sealing flange plate, and the length of each supporting table is not smaller than that of the second sealing flange plate.
The walking guide mechanism comprises guide wheel sets, the guide wheel sets are respectively arranged on the lower portions of the two sides of the second sealing flange plate, guide rails matched with the guide wheel sets are arranged on the inner side of the supporting table, and the length of each guide rail is not smaller than that of the supporting table.
The guide wheel set comprises at least two guide wheels, each guide wheel comprises an elastic support connected with the lower part of the second sealing flange plate and a bearing connected below the elastic support, the guide rail is a concave elongated slot, and one side surface of the concave elongated slot is connected with the support table.
The distance control mechanism comprises displacement sensors, the upper portion of the second sealing flange plate is evenly provided with at least two receiving ends of the displacement sensors, the lower portion of the first sealing flange plate is provided with a transmitting end matched with the receiving ends, and the receiving ends and the transmitting ends are respectively arranged in grooves of the second sealing flange plate and the first sealing flange plate.
The first sealing flange plate is evenly provided with at least two vertical first positioning pin holes, and the second sealing flange plate is provided with second positioning pin holes matched with the first positioning pin holes.
The first sealing flange plate is provided with a first sealing rubber ring mounting groove in a circle, the second sealing flange plate is provided with a second sealing rubber ring mounting groove corresponding to the first sealing rubber ring mounting groove, and sealing rubber rings are mounted in the first sealing rubber ring mounting groove and the second sealing rubber ring mounting groove.
The lifting mechanism and the travelling mechanism respectively comprise air floatation lifting tables which are arranged at the four corners of the lower part of the lower vacuum chamber, and a substrate is laid on a road section where the air floatation lifting tables travel.
An external device is provided outside the upper vacuum chamber, and a storage is placed in the lower vacuum chamber.
The detachable vacuum chamber according to the present invention includes an upper vacuum chamber, on which an external device is fixed and which can be mounted, and a lower vacuum chamber, in which a storage is placed and which can be moved horizontally with respect to the upper vacuum chamber, so that the storage and the lower vacuum chamber can be moved together. The vacuum chamber separation device is provided with a traveling mechanism and a traveling guide mechanism to ensure that the lower vacuum chamber moves horizontally and linearly and quickly, and is provided with a lifting mechanism and a spacing control mechanism to ensure that the lower vacuum chamber and the upper vacuum chamber are combined and separated well. The invention realizes the split of the vacuum chamber on the premise of avoiding the disassembly of external equipment connected with the vacuum chamber, and does not influence the stable operation of the external equipment; meanwhile, the limited space is reasonably utilized, the stored objects and the lower vacuum chamber are stably moved in and out together, the stored objects are prevented from being removed, the larger space is provided for the stored objects to be conveniently taken out after the stored objects are moved out, the working efficiency is improved, and the operation stability of each device is ensured.
To the accomplishment of the foregoing and related ends, one or more aspects of the invention comprise the features hereinafter fully described and particularly pointed out in the claims. The following description and the annexed drawings set forth in detail certain illustrative aspects of the invention. These aspects are indicative, however, of but a few of the various ways in which the principles of the invention may be employed. Further, the present invention is intended to include all such aspects and their equivalents.
Drawings
Other objects and results of the present invention will become more apparent and more readily appreciated as the same becomes better understood by reference to the following description and appended claims, taken in conjunction with the accompanying drawings. In the drawings:
FIG. 1 is a schematic structural view of a detachable vacuum chamber according to an embodiment of the present invention;
FIG. 2 is a schematic structural view of an upper vacuum chamber according to an embodiment of the present invention;
FIG. 3 is a side view of an upper vacuum chamber according to an embodiment of the present invention;
FIG. 4 is a schematic structural view of a lower vacuum chamber according to an embodiment of the present invention;
FIG. 5 is a schematic view of the translation of the lower vacuum chamber according to an embodiment of the present invention;
FIG. 6 is a schematic view of the lower vacuum chamber interfacing with the lower vacuum chamber according to an embodiment of the present invention;
the device comprises an upper vacuum chamber 1, a lower vacuum chamber 2, a supporting mechanism 3, a lifting mechanism 4, a spacing control mechanism 5, a travelling mechanism 6, a travelling guide mechanism 7, a first sealing flange 8, a second sealing flange 9, a support table 10, a displacement sensor 11, a guide wheel 12, a guide rail 13, an elastic support 14, a bearing 15, a first positioning pin hole 16, a second positioning pin hole 17, a first sealing rubber ring mounting groove 18, a second sealing rubber ring mounting groove 19, a sealing rubber ring 20, a substrate 21, a storage object 22 and a positioning pin 23.
The same reference numbers in all figures indicate similar or corresponding features or functions.
Detailed Description
In the following description, for purposes of explanation, numerous specific details are set forth in order to provide a thorough understanding of one or more embodiments. It may be evident, however, that such embodiment(s) may be practiced without these specific details. In other instances, well-known structures and devices are shown in block diagram form in order to facilitate describing one or more embodiments
Specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings.
As shown in fig. 1 to 6, the detachable vacuum chamber of the present embodiment can be used in an EUV workpiece stage vacuum system, and can also be used in vacuum systems of other apparatuses.
The detachable vacuum chamber comprises an upper vacuum chamber 1 and a lower vacuum chamber 2 which are detachable, the openings of the upper vacuum chamber 1 and the lower vacuum chamber 2 can be butted together, and the vacuum chambers are tightly attached after being vacuumized to form a vacuum chamber. After the experiment is finished, gas is filled, the upper vacuum chamber 1 is separated from the lower vacuum chamber 2, the upper vacuum chamber 1 is fixed after the separation, and the lower vacuum chamber 2 can move.
The exterior of the upper vacuum chamber 1 is provided with a support mechanism 3 so that it is always stationary, and the exterior of the upper vacuum chamber 1 can be connected to external equipment or used as a working platform or a stand. Lower vacuum chamber 2 below is provided with running gear 6 and walking guiding mechanism 7, the horizontal rectilinear movement of vacuum chamber 2 under being convenient for, and walking guiding mechanism 7 provides the walking direction for running gear, can improve the accuracy and the speed of removal. The lower vacuum chamber 2 drives the storage 22 inside the lower vacuum chamber to move horizontally together, the storage 22 can be a workpiece table assembly, a high-precision instrument and the like, the height of the storage 22 is not higher than that of the lower vacuum chamber 2, the lower vacuum chamber 2 can be easily and conveniently taken out after moving to a larger space, and the precision of the storage is protected. The volume of lower vacuum chamber 2 and upper vacuum chamber 1 is decided according to the concrete technological requirement, and the limit design can be for upper vacuum chamber 1 only designs into the apron, and the volume of lower vacuum chamber 2 is the volume of whole vacuum chamber, and thing mounting platform and location mounting hole are deposited to lower vacuum chamber 2 internal design.
Below the lower vacuum chamber 2, a lifting mechanism 4 is provided for butting and separating the lower vacuum chamber 2 and the upper vacuum chamber 1. Aerify the back, elevating system 4 descends, and lower vacuum chamber 2 follows elevating system 4 and descends to have great interval with last vacuum chamber 1, and the lower vacuum chamber 2 of being convenient for easily shifts out. When the lower vacuum chamber 2 and the upper vacuum chamber 1 are combined as required, the lifting mechanism 4 rises, and the lower vacuum chamber 2 rises to be in butt joint with the upper vacuum chamber 1 along with the lifting mechanism 4, so that the vacuum pumping is facilitated. A spacing control mechanism 5 is further arranged at the butt joint of the upper vacuum chamber 1 and the lower vacuum chamber 2, and the spacing control mechanism 5 is electrically connected with the lifting mechanism 4 and is used for controlling the ascending degree and the descending degree of the lifting mechanism 4, so that the spacing between the upper vacuum chamber 1 and the lower vacuum chamber 2 is controlled, the upper vacuum chamber 1 and the lower vacuum chamber 2 are more tightly jointed and cannot ascend or descend all the time.
The shape of the upper vacuum chamber 1 and the lower vacuum chamber 2 may be determined according to specific process requirements, and in the present embodiment, both the upper vacuum chamber 1 and the lower vacuum chamber 2 are rectangular parallelepipeds. The upper vacuum chamber 1 and the lower vacuum chamber 2 may be joined by providing a single-turn first sealing flange 8 outside the opening of the upper vacuum chamber 1, providing a single-turn second sealing flange 9 outside the opening of the lower vacuum chamber 2, and abutting the first sealing flange 8 and the second sealing flange 9. In order to ensure good sealing effect and high vacuum pressure, a first sealing rubber ring mounting groove 18 is formed in the first sealing flange 8, a second sealing rubber ring mounting groove 19 corresponding to the first sealing rubber ring mounting groove 18 is formed in the second sealing flange 9, and sealing rubber rings 20 are mounted in the first sealing rubber ring mounting groove 18 and the second sealing rubber ring mounting groove 19. The first sealing rubber ring mounting groove 18 and the second sealing rubber ring mounting groove 19 are grooves dug in the surface of the sealing flange plate, and the depth of the grooves is 60% -70% of the thickness of the sealing rubber rings. The sealing rubber ring can be made of fluororubber.
The support means 3 may comprise two supports 10 arranged under opposite side edges of the first sealing flange 8, the two supports 10 being symmetrical about a centre line of the width of the first sealing flange 8, the width of the first sealing flange 8 being greater than the width of the second sealing flange 9 to allow the supports 10 to be arranged, the distance between the two supports 10 being greater than the width of the second sealing flange 9 to accommodate the second sealing flange 9. The support table 10 has a length not less than the length of the second sealing flange 9. The support table 10 may have a rectangular or right-trapezoidal longitudinal cross section.
The elevating mechanism 4 may be air-floating elevating stages provided at four corners of the lower portion of the lower vacuum chamber 2, and the four air-floating elevating stages are controlled by the controller to simultaneously elevate and lower to maintain the level of the lower vacuum chamber 2. In this embodiment, the traveling mechanism 6 does not need to be separately provided, and the air-float lifting platform can also travel. In order to keep the equipment stable during the walking process, base plates 21 are laid below and in front of the supporting mechanism 3, namely, the base plates 21 are laid on the road section where the air floatation lifting platform is to walk. The substrate 21 may be made of a steel plate or a wood plate. The specification of the air-floating elevating table is determined according to the total weight of the upper vacuum chamber 1 and the elevating height.
The walking guide mechanism 7 comprises guide wheel sets, the lower parts of the edges of the two sides of the width of the second sealing flange plate 9 are respectively provided with one guide wheel set, each set of guide wheel sets can be provided with two or more guide wheels 12 which are uniformly arranged, the inner side of each supporting platform is provided with a guide rail 13 matched with the guide wheel sets, and the length of the guide rail 13 is not less than that of the supporting platform 10. The guide wheel 12 may comprise an elastic support 14 connected to a lower portion of the second sealing flange 9 and a bearing 15 connected to a lower portion of the elastic support 14, the bearing 15 may be a polyurethane bearing having a high elasticity, and the elastic support 14 may comprise a bearing connecting support and a spring connected to an upper portion of the bearing connecting support. The elastic bracket 14 and the urethane bearing help to make a buffering contact with the guide rail 13 when the lower vacuum chamber 2 descends. The guide rail 13 may be a concave elongated slot, one side of which is connected to the support table. The guide wheel set slides in the guide rail to limit the motion track of the upper vacuum chamber 1, so that the motion of the upper vacuum chamber is faster and more accurate.
The distance control sensor comprises a plurality of displacement sensors 11 uniformly arranged at the joint of the upper vacuum chamber 1 and the lower vacuum chamber 2, at least two displacement sensors are uniformly arranged at the upper part of the second sealing flange 9, a transmitting end matched with the receiving ends of the displacement sensors is arranged at the lower part of the first sealing flange 8, and the receiving end and the transmitting end are respectively arranged in grooves of the second sealing flange and the first sealing flange. Grooves can be dug in four corners of the second sealing flange 9 and the first sealing flange 8, and the receiving end and the transmitting end are installed in the grooves, so that the butt joint of the second sealing flange 9 and the first sealing flange 8 is not affected.
Each displacement sensor is connected with the air floatation lifting table at the same angle through the controller, the air floatation lifting table is opened and starts to ascend, when a certain displacement sensor detects that the distance reaches a set minimum value, a signal is sent to the controller, the corresponding air floatation lifting table is controlled to stop ascending, the air floatation lifting table is prevented from always ascending, the gap between two sealing flange plates can meet the requirement, the two sealing rubber rings are tightly attached, and the compression amount of the sealing rubber rings is 5-15%.
When the upper vacuum chamber 1 and the lower vacuum chamber 2 need to be separated, the air-floating lifting platform is opened and begins to descend, when a certain displacement sensor detects that the distance reaches a set maximum value, a signal is sent to the controller, the corresponding air-floating lifting platform is controlled to stop descending, the air-floating lifting platform is prevented from descending all the time, the distance between two sealing flanges can meet the requirement, the guide wheel set just falls on the guide rail, and the lower vacuum chamber 2 leaves smoothly.
In order to ensure that the joint of the upper vacuum chamber 1 and the lower vacuum chamber 2 is accurately butted, a vertical first positioning pin hole 16 can be respectively arranged at the diagonal position of the first sealing flange 8, a second positioning pin hole 17 matched with the first positioning pin hole 16 is arranged on the second sealing flange 9, and in order not to influence the joint of the sealing flanges, the two positioning pin holes are arranged at the outer side of the sealing rubber ring mounting groove. After the lower vacuum chamber 2 moves to the lower portion of the upper vacuum chamber 1, the positioning pins 23 are inserted into the first positioning pin holes 16 and the second positioning pin holes 17, the openings of the upper vacuum chamber 1 and the lower vacuum chamber 2 are positioned at predetermined positions, and the positioning pins serve as a guide for the elevating mechanism 4 to elevate the lower vacuum chamber 2.
The working process is as follows:
installing external equipment outside the upper vacuum chamber 1, hoisting the storage object 22 and installing the storage object in the lower vacuum chamber 2, moving the lower vacuum chamber 2 to the substrate 21 and close to a position between the two support tables, enabling the guide wheel set to enter the corresponding guide rail 13, moving the upper vacuum chamber 1 to a position right below the lower vacuum chamber 2, aligning the first positioning pin hole and the second positioning pin hole, inserting the positioning pins, and determining the butt joint position of the upper vacuum chamber 1 and the lower vacuum chamber 2. And starting the lifting mechanism 4, lifting the upper vacuum chamber 1 until each displacement sensor detects that the distance value reaches a set minimum value, and stopping each air-floatation lifting platform. Vacuumizing the upper vacuum chamber and the lower vacuum chamber which are butted together, and compressing the fluororubber sealing rubber ring under the action of external atmospheric pressure to ensure that the sealing flange plates of the upper vacuum chamber and the lower vacuum chamber are in close contact and the chambers are in a vacuum state.
After the experiment is finished, the chamber is filled with gas to reach an atmospheric pressure, the lifting mechanism 4 is started, the upper vacuum chamber 1 descends, the lower vacuum chamber 2 is separated from the upper vacuum chamber 1 until each displacement sensor 11 detects that the distance value reaches the set maximum value, each air-floating lifting platform stops working, the guide wheel set falls in the guide rail, and the lower vacuum chamber 2 is moved to leave the position below the upper vacuum chamber 1.
A detachable vacuum chamber according to the present invention is described above by way of example with reference to the accompanying drawings. However, it will be appreciated by those skilled in the art that various modifications may be made to the detachable vacuum chamber of the present invention described above without departing from the scope of the invention. Accordingly, the scope of the invention should be determined from the content of the appended claims.

Claims (5)

1. A detachable vacuum chamber, comprising an upper vacuum chamber and a lower vacuum chamber, which are detachable, wherein,
a support mechanism for fixing the upper vacuum chamber is arranged outside the upper vacuum chamber;
a lifting mechanism is arranged below the lower vacuum chamber and used for butting and separating the lower vacuum chamber and the upper vacuum chamber, a spacing control mechanism is arranged at the butting position of the upper vacuum chamber and the lower vacuum chamber and electrically connected with the lifting mechanism and used for controlling the spacing between the upper vacuum chamber and the lower vacuum chamber;
a travelling mechanism and a travelling guide mechanism are arranged below the lower vacuum chamber, the travelling mechanism is used for moving the lower vacuum chamber, and the travelling guide mechanism provides travelling guide for the travelling mechanism;
a circle of first sealing flange plate is arranged on the outer side of the opening of the upper vacuum chamber, a circle of second sealing flange plate is arranged on the outer side of the opening of the lower vacuum chamber, a circle of first sealing rubber ring mounting groove is arranged on the first sealing flange plate, a second sealing rubber ring mounting groove corresponding to the first sealing rubber ring mounting groove is arranged on the second sealing flange plate, and sealing rubber rings are mounted in the first sealing rubber ring mounting groove and the second sealing rubber ring mounting groove;
the supporting mechanism comprises supporting tables which are respectively arranged below two sides of the first sealing flange plate, the distance between the two supporting tables is greater than the width of the second sealing flange plate, and the length of the supporting tables is not less than the length of the second sealing flange plate;
the walking guide mechanism comprises guide wheel sets which are respectively arranged at the lower parts of two sides of the second sealing flange plate, guide rails matched with the guide wheel sets are arranged on the inner side of the supporting platform, and the length of each guide rail is not less than that of the supporting platform;
the guide wheel set comprises at least two guide wheels, each guide wheel comprises an elastic support connected with the lower part of the second sealing flange plate and a bearing connected below the elastic support, the guide rail is a concave elongated slot, and one side surface of the concave elongated slot is connected with the support table.
2. The detachable vacuum chamber of claim 1, wherein the distance control mechanism comprises displacement sensors, at least two receiving terminals of the displacement sensors are uniformly disposed on the upper portion of the second sealing flange, a transmitting terminal matched with the receiving terminals is disposed on the lower portion of the first sealing flange, and the receiving terminals and the transmitting terminal are disposed in the grooves of the second sealing flange and the first sealing flange, respectively.
3. The detachable vacuum chamber of claim 1, wherein at least two vertical first positioning pin holes are uniformly formed in the first sealing flange, and wherein second positioning pin holes matching with the first positioning pin holes are formed in the second sealing flange.
4. The detachable vacuum chamber of claim 1, wherein the elevating mechanism and the traveling mechanism each comprise an air-floating elevating platform disposed at four lower corners of the lower vacuum chamber, respectively, and a substrate is laid on a section where the air-floating elevating platform travels.
5. The detachable vacuum chamber of claim 1, wherein external equipment is provided outside the upper vacuum chamber, and a storage is placed in the lower vacuum chamber.
CN202111298014.2A 2021-11-04 2021-11-04 Detachable vacuum chamber Active CN114114849B (en)

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Application Number Priority Date Filing Date Title
CN202111298014.2A CN114114849B (en) 2021-11-04 2021-11-04 Detachable vacuum chamber

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Application Number Priority Date Filing Date Title
CN202111298014.2A CN114114849B (en) 2021-11-04 2021-11-04 Detachable vacuum chamber

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CN114114849B true CN114114849B (en) 2022-12-13

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3273560B2 (en) * 1999-08-30 2002-04-08 日本エー・エス・エム株式会社 Sealing mechanism of multi-chamber load lock device
US20060071384A1 (en) * 2004-10-06 2006-04-06 Advanced Display Process Engineering Co. Ltd. Apparatus for manufacturing flat-panel display
JP4837953B2 (en) * 2005-07-26 2011-12-14 コスミック工業株式会社 Lid opening / closing device
JP5158501B2 (en) * 2008-06-26 2013-03-06 新東工業株式会社 Casting equipment
JP5269568B2 (en) * 2008-12-03 2013-08-21 アドヴァンスド・ディスプレイ・プロセス・エンジニアリング・コーポレーション・リミテッド Substrate processing apparatus and method for opening and closing process space inside substrate processing apparatus
CN112829208A (en) * 2020-12-30 2021-05-25 合肥通泰光电科技有限公司 Injection mold is used in production of display screen resin frame

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