CN114114488B - Visible near infrared metal film reflector with adjustable polarization sensitivity - Google Patents
Visible near infrared metal film reflector with adjustable polarization sensitivity Download PDFInfo
- Publication number
- CN114114488B CN114114488B CN202111324615.6A CN202111324615A CN114114488B CN 114114488 B CN114114488 B CN 114114488B CN 202111324615 A CN202111324615 A CN 202111324615A CN 114114488 B CN114114488 B CN 114114488B
- Authority
- CN
- China
- Prior art keywords
- metal
- film
- film layer
- layer
- near infrared
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
- G02B5/085—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal
- G02B5/0875—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal the reflecting layers comprising two or more metallic layers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
Abstract
The invention discloses a visible near infrared metal film reflecting mirror with adjustable polarization sensitivity, which realizes high reflectivity and accurate polarization sensitivity adjustment of the reflecting mirror by optimizing the thicknesses of a metal film and a dielectric protective film. The high adhesiveness of the reflecting mirror is realized by utilizing the metal nickel-chromium composite material, the high reflection of the reflecting mirror in the visible near infrared band is realized by utilizing the metal silver film, the accurate regulation and control of the polarization sensitivity of the reflecting mirror in the visible near infrared band are realized by utilizing the polarization effect of the metal aluminum film through adjusting the thickness of the aluminum film, the oxidation resistance and the moisture protection of the metal reflecting film are realized by utilizing the combination of the double-layer dielectric film, and the accurate regulation and control of the polarization band of the reflecting mirror are realized by optimizing the thickness of the double-layer dielectric film. The reflecting mirror has high reflectivity, high polarization sensitivity and precisely adjustable polarization wave band.
Description
Technical Field
The invention relates to an optical reflector, in particular to a metal reflector which utilizes a combined structure of two metal material lamination layers and a dielectric film layer to realize energy content high reflection and polarization sensitivity adjustable in the visible near infrared band.
Background
The imaging spectrometer is an optical remote sensing instrument integrating images and spectrums, organically combines a front-mounted telescopic optical system and a spectrum imaging system by utilizing an incident slit, can provide continuous spectrum images of scenes, and is the main stream and the development direction of the space optical remote sensor. In the research of space visible near infrared remote sensing, it is widely considered that polarization remote sensing has larger information content than photometric remote sensing, and has wider application prospect. The combination of spectrum and polarization characteristics is used for remote sensing, and is an important trend of future space remote sensing.
Imaging spectroscopic instruments for remote sensing are typically polarization sensitive optical systems because they contain a plurality of optical elements that have different spectral characteristics for light of different polarization components when the light is obliquely incident on the surface of the optical element, i.e., the element has the characteristic of additional polarization, and the entire optical system also exhibits the additional polarization characteristic. The additional polarization characteristics of the system are usually quantitatively described by polarization sensitivity (LPS). Polarization sensitivity describes the degree of sensitivity of an instrument's optical system to the polarization state of incident light, which reflects the change in intensity of light exiting the system as the polarization state of incident light changes. With the deep research of quantitative remote sensing and the continuous improvement of the requirement of measurement precision, in order to accurately measure the atmospheric radiance, the polarization response of a space remote sensing instrument must be controlled.
The optical system of the imaging spectrometer often comprises various optical elements such as a reflecting mirror, a color separation film, a grating, a lens and the like, and the polarization effect of each element has a cumulative effect. In order to control the polarization sensitivity of an optical system, it is generally necessary to depolarize each element. When some optical elements in the system are difficult to depolarize, all polarization optical elements in the optical system need to be integrally developed, and the polarization sensitivity control of the whole system is realized through mutual polarization compensation among different elements. The mirror is one of the important optical elements in the imaging spectrometer, and when being used as a turning mirror in an optical path system, the mirror often works under a large angle condition, and thus, also often has a large polarization effect. On the one hand, when other optical elements in the system have good depolarization effect, the reflector needs to be depolarized; on the other hand, when depolarization is difficult to achieve in other elements of the system, such as color separations, gratings, lenses, etc., it is desirable that the mirror have certain polarization characteristics with opposite polarization directions to compensate for polarization accumulation in the other elements. Therefore, the polarization sensitivity control technology of the reflecting mirror is one of important technical means for controlling the polarization sensitivity of the optical system for imaging spectrum sensing.
The polarization sensitivity of a single reflective element can be characterized by equation (1):
LPS＝(Rs-Rp)/(Rs+Rp)*100％ ①
where Rs, rp are the reflectivity of the S light component and the reflectivity of the P light component, respectively.
Disclosure of Invention
The invention provides a metal reflector which utilizes a combined structure of two metal material lamination layers and a dielectric film layer on an optical substrate to realize energy high reflection in a visible near infrared band and adjustable polarization sensitivity based on the requirements of system polarization sensitivity control of a space remote sensing spectrum imager on the regulation and control of optical energy and polarization sensitivity of a reflector, and solves the technical problem of system polarization sensitivity control of the spectrum imager.
The technical scheme of the invention is as follows: plating an adhesion layer 2 with strong binding force on an optical substrate 1 to enhance the firmness and reliability of the reflecting mirror; plating a sufficiently thick metal I film layer 3 on the adhesion layer 2, wherein the metal I material has the characteristics of high reflection and low polarization sensitivity so as to ensure that the reflection film has stable high reflectivity and low polarization sensitivity; plating a metal II film layer 4 on the film layer 3, wherein the metal II material has a larger polarization effect in a visible near infrared band, and the thickness of the film layer 4 is adjusted to realize the accurate regulation and control of the polarization sensitivity of the reflector in the visible near infrared band; a medium protective layer 5 with proper thickness is plated on the film layer 4, so that the precise regulation and control of the polarized wave band of the reflecting mirror are realized, the metal layer of the reflecting mirror is ensured not to be oxidized, and the moistureproof and abrasion resistance are improved. The structural design of the reflecting mirror ensures the efficient transmission of optical efficiency and can accurately regulate and control the polarization sensitivity of the reflecting mirror.
Taking a reflecting mirror with a spectrum working range from visible to near infrared band in a light path system of a space remote sensing imaging spectrometer as an example, the reflecting mirror is constructed by the following steps:
1 selecting one of the common substrate materials of the reflector, such as quartz, microcrystalline glass, silicon carbide and the like, as the material of the optical substrate 1;
2, selecting a metal nickel-chromium composite material or a metal chromium material with strong adhesion performance with an optical substrate material as an adhesion layer 2;
3 selecting metallic silver (Ag) with high reflectivity and small polarization effect in the visible to near infrared band as a metallic I film layer 3 so as to ensure that the metallic film layer has high enough reflectivity and does not influence the reliability;
and 4, selecting metal aluminum (Al) with high reflectivity in a visible near infrared band and larger polarization effect as a metal II film layer 4, and adjusting the design thickness of the Al film layer according to the polarization sensitivity index requirement of the reflector. As the thickness of the Al film layer increases, the polarization sensitivity of the reflector also increases, when the thickness of the Al film increases to 20nm, the polarization sensitivity of the reflector does not change with the increase of the thickness of the film layer, and the reflector shows the polarization performance of the traditional Al reflector;
and 5, respectively selecting two high-low refractive index dielectric film material combinations as protective layers 5 of the metal mirror so as to prevent the metal layer of the reflecting mirror from being oxidized and absorbing moisture. The two dielectric materials can be Al 2 O 3 And SiO 2 Combination, hfO 2 And SiO 2 Combination, hfO 2 And Al 2 O 3 Combining, optimally designing the thicknesses of the two dielectric film layers according to the polarization sensitivity regulation and control wave bands, wherein the total thickness of the two dielectric combination layers is more than 80nm, and ensuring that the metal film is reliably protected;
on a film deposition device, an adhesion layer 2, a metal I film layer 3, a metal II film layer 4 and a medium combination protective layer 5 are sequentially deposited on an optical substrate 1 according to a designed reflecting mirror film structure and thickness of each film layer by utilizing deposition technologies such as thermal evaporation, electron beam evaporation and the like, so that the preparation of the reflecting mirror is completed.
The mirror of the present invention has the following advantages:
1) The metal I film layer ensures that the reflector has high reflectivity in the visible near infrared broadband range, and meets the high-efficiency transmission requirement of the spectral energy of the optical system;
2) The metal II film layer realizes the accurate regulation and control of the polarization sensitivity of the reflector in the visible near infrared broadband range, and the adjustable range of the polarization sensitivity value is larger;
3) The reflecting mirror provided by the invention has the advantages that the high reflection efficiency in the visible near infrared wide band range is realized, meanwhile, the polarization compensation mirror function with accurately controllable polarization sensitivity is exerted, the polarization accumulation of other optical elements in the optical system is effectively compensated, and the effective control of the polarization sensitivity of the optical system is finally satisfied;
4) The reflecting mirror film system has a simple structure and is easy to plate.
Drawings
FIG. 1 is a schematic diagram of a visible near infrared metal mirror structure with adjustable polarization sensitivity, wherein:
1—a mirror substrate;
2-an adhesion layer;
3-a metal I film;
4-a metal II film;
5-a media shield.
Fig. 2 is a graph of measured reflectance of a mirror (45 ° angle of incidence).
Fig. 3 is a graph of measured polarization sensitivity of a mirror (incident angle 45 °).
Detailed Description
The following detailed description of specific embodiments of the invention refers to the accompanying drawings, which illustrate in further detail: silicon carbide with phi 50 multiplied by 5mm is used as a substrate, nickel-chromium composite material is used as an adhesion layer, silver (Ag) is used as a metal I film layer, aluminum (Al) is used as a metal II film layer, and aluminum oxide (Al) 2 O 3 ) And hafnium oxide (HfO) 2 ) Respectively as low refractive index (n L ) And a high refractive index (n H ) Dielectric protective layer material, and reflector structure as shown in schematic figure 1. The working angle of the reflecting mirror is 45 degrees, the high reflection wave band is 400-2500nm, and the polarization sensitivity regulating wave band is 450-850nm.
The thickness of the nickel-chromium composite layer is designed to be 1000nm, the thickness ensures the adhesion between the metal layer and the silicon carbide substrate, and the firmness and the reliability of the reflecting mirror are enhanced. The thickness of the metallic silver (Ag) film is designed to be 120nm, which ensures that the mirror has a sufficiently high reflectivity in the operating band range. The thickness of the metal II aluminum (Al) film layer is designed to be 5nm, and the film layer enables the reflector to generate certain separation between S light and P light in the visible near infrared band range, namely the reflector has certain polarization sensitivity. Dielectric protective layer aluminum oxide (Al) 2 O 3 ) And hafnium oxide (HfO) 2 ) The thickness of the film layer is respectively designed to be 60nm and 85nm, and Al 2 O 3 The film layer is close to the metal II aluminum film and HfO 2 The film layer is the outermost layer near the air side.
The reflection spectrum curve of the reflecting mirror in the visible near infrared band is shown in fig. 2, and the polarization sensitivity curve is shown in fig. 3.
The process implementation of the reflector is as follows: 1) Ultrasonic cleaning and drying silicon carbide substrate, placing the substrate on a workpiece frame in a vacuum chamber, and vacuumizing the vacuum chamber to 1×10 -3 Pa; 2) Sequentially growing a NiCr adhesion layer, an Ag film layer and an Al film layer by adopting a deposition mode of resistance thermal evaporation, wherein the deposition rates of the deposition layers are respectively 15nm/s, 10nm/s and 5nm/s, and the deposition temperature is room temperature by adopting a time monitoring method to control the film thickness; 3) Sequentially depositing Al by adopting an electron beam evaporation method 2 O 3 Film layer and HfO 2 The deposition rates of the film layer and the film layer are respectively 0.8nm/s and 0.2nm/s, and the thickness of the dielectric film layer is monitored by adopting a crystal oscillation film thickness monitoring method. To avoid oxidation of the metal film, al is deposited at room temperature 2 O 3 A film layer; while depositing HfO 2 In the film layer, the substrate is heated to 150 ℃ and the vacuum chamber is filled with O 2 Gas, keep the vacuum chamber pressure at 5.0-6.0X10 -2 Pa range; 4) After the preparation of each film layer is completed, the vacuum chamber is opened to take out the reflecting mirror after vacuum is maintained for 60 minutes. Finally, the preparation of the reflecting mirror is completed.
Claims (1)
1. The utility model provides a visible near infrared metal reflector that polarization sensitivity can be regulated and control, includes optical substrate (1), adhesion layer (2), metal I rete (3), metal II rete (4) and medium inoxidizing coating (5), its characterized in that:
the visible near infrared metal reflecting mirror has the structure that: an adhesion layer (2), a metal I film layer (3), a metal II film layer (4) and a medium protection layer (5) are plated on an optical substrate (1) in sequence; wherein:
the optical substrate (1) adopts quartz, microcrystalline glass and silicon carbide;
the adhesion layer (2) adopts a nickel-chromium metal composite film layer or a metal-chromium film layer;
the metal I film layer (3) adopts a metal silver film with high reflectivity in the visible to near infrared band;
the metal II film layer (4) adopts a metal aluminum film with high polarization sensitivity in the visible to near infrared band, the thickness of the metal aluminum film is within 20nm, and the specific thickness of the metal aluminum film is determined according to the reflection mirror polarization sensitivity regulation data;
the medium protective layer (5) is a combination of two oxide medium materials, namely a high refractive index material nH and a low refractive index material nL, and has the structure as follows:
aLbH
wherein a and b represent thickness coefficients of each film layer of the medium protective layer (5), L is lambda 0 nL film layer of low refractive index material with film thickness of/4, H is lambda 0 4 film thickness of high refractive index material nH film layer, thickness of each film layer setting central wavelength lambda according to polarization sensitivity regulation wave band 0 And the thickness of the medium protective layer (5) is more than 80nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111324615.6A CN114114488B (en) | 2021-11-10 | 2021-11-10 | Visible near infrared metal film reflector with adjustable polarization sensitivity |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111324615.6A CN114114488B (en) | 2021-11-10 | 2021-11-10 | Visible near infrared metal film reflector with adjustable polarization sensitivity |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN114114488A CN114114488A (en) | 2022-03-01 |
| CN114114488B true CN114114488B (en) | 2023-09-12 |
Family
ID=80377892
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111324615.6A Active CN114114488B (en) | 2021-11-10 | 2021-11-10 | Visible near infrared metal film reflector with adjustable polarization sensitivity |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114114488B (en) |
Citations (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4900137A (en) * | 1986-09-06 | 1990-02-13 | British Aerospace Public Limited Company | Mirrors |
| JPH0894804A (en) * | 1994-09-21 | 1996-04-12 | Sumitomo Chem Co Ltd | Plastic member with antireflection film and its production |
| US6264336B1 (en) * | 1999-10-22 | 2001-07-24 | 3M Innovative Properties Company | Display apparatus with corrosion-resistant light directing film |
| JP2002372629A (en) * | 2001-06-13 | 2002-12-26 | Toppan Printing Co Ltd | Hologram reflector plate and reflective liquid crystal display device |
| CN101226244A (en) * | 2008-02-01 | 2008-07-23 | 中国科学院上海技术物理研究所 | Membrane series structure of visible/infrared broad spectrum color-separation plate |
| JP2011242475A (en) * | 2010-05-14 | 2011-12-01 | Asahi Kasei E-Materials Corp | Laminate |
| CN102269623A (en) * | 2010-06-02 | 2011-12-07 | 北京智朗芯光科技有限公司 | Perpendicular incident broadband polarity spectrometer and optical measurement system |
| CN103698826A (en) * | 2013-11-21 | 2014-04-02 | 中国科学院上海技术物理研究所 | Polarization-state phase-adjustable wide-spectrum reflecting mirror |
| CN106796312A (en) * | 2014-10-27 | 2017-05-31 | 阿尔姆科有限责任公司 | The surface reflector of temperature and corrosion stable |
| WO2019019138A1 (en) * | 2017-07-28 | 2019-01-31 | South China University Of Technology | OPTICAL Ag MIRROR WITH HIGH VOLVUME FRACTION SiCp/Al COMPOSITE-TITANIUM ALLOY-PbO GLASS METAL PLUS DIELECTRIC FILMS, PREPARATION METHOD THEREFOR AND APPLICATION THEREOF |
| CN110146949A (en) * | 2019-05-29 | 2019-08-20 | 西北工业大学深圳研究院 | A kind of narrow-band spectrum filter structure and preparation method thereof |
| CN110456440A (en) * | 2019-08-28 | 2019-11-15 | 山东劳动职业技术学院（山东劳动技师学院） | A kind of infrared polarizer of three layer line grid structure of metal-dielectric-metal |
| CN110873909A (en) * | 2019-12-02 | 2020-03-10 | 华东交通大学 | Ultra-wideband polarization insensitive absorber of full ultraviolet-mid-infrared band |
| CN111381306A (en) * | 2020-05-12 | 2020-07-07 | 苏州江泓电子科技有限公司 | Polarizing multilayer film for vacuum ultraviolet band of 50-70 nm and preparation method thereof |
| CN112505815A (en) * | 2020-09-15 | 2021-03-16 | 中国科学院上海技术物理研究所 | Polarization regulation spectroscope |
| CN113219566A (en) * | 2021-05-10 | 2021-08-06 | 东北师范大学 | Polarization sensitive broadband response long-wave infrared metamaterial absorber |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE279492T1 (en) * | 2000-03-02 | 2004-10-15 | Merck Patent Gmbh | MULTI-LAYER REFLECTIVE FILM OR PIGMENT HAVING VIEWING ANGLE DEPENDENT REFLECTIVE PROPERTIES |
| TW528891B (en) * | 2000-12-21 | 2003-04-21 | Ind Tech Res Inst | Polarization-independent ultra-narrow bandpass filter |
| US9300036B2 (en) * | 2013-06-07 | 2016-03-29 | Apple Inc. | Radio-frequency transparent window |
| JP6077618B2 (en) * | 2014-09-30 | 2017-02-08 | 日東電工株式会社 | Single protective polarizing film, polarizing film with pressure-sensitive adhesive layer, image display device, and continuous production method thereof |
-
2021
- 2021-11-10 CN CN202111324615.6A patent/CN114114488B/en active Active
Patent Citations (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4900137A (en) * | 1986-09-06 | 1990-02-13 | British Aerospace Public Limited Company | Mirrors |
| JPH0894804A (en) * | 1994-09-21 | 1996-04-12 | Sumitomo Chem Co Ltd | Plastic member with antireflection film and its production |
| US6264336B1 (en) * | 1999-10-22 | 2001-07-24 | 3M Innovative Properties Company | Display apparatus with corrosion-resistant light directing film |
| JP2002372629A (en) * | 2001-06-13 | 2002-12-26 | Toppan Printing Co Ltd | Hologram reflector plate and reflective liquid crystal display device |
| CN101226244A (en) * | 2008-02-01 | 2008-07-23 | 中国科学院上海技术物理研究所 | Membrane series structure of visible/infrared broad spectrum color-separation plate |
| JP2011242475A (en) * | 2010-05-14 | 2011-12-01 | Asahi Kasei E-Materials Corp | Laminate |
| CN102269623A (en) * | 2010-06-02 | 2011-12-07 | 北京智朗芯光科技有限公司 | Perpendicular incident broadband polarity spectrometer and optical measurement system |
| CN103698826A (en) * | 2013-11-21 | 2014-04-02 | 中国科学院上海技术物理研究所 | Polarization-state phase-adjustable wide-spectrum reflecting mirror |
| CN106796312A (en) * | 2014-10-27 | 2017-05-31 | 阿尔姆科有限责任公司 | The surface reflector of temperature and corrosion stable |
| WO2019019138A1 (en) * | 2017-07-28 | 2019-01-31 | South China University Of Technology | OPTICAL Ag MIRROR WITH HIGH VOLVUME FRACTION SiCp/Al COMPOSITE-TITANIUM ALLOY-PbO GLASS METAL PLUS DIELECTRIC FILMS, PREPARATION METHOD THEREFOR AND APPLICATION THEREOF |
| CN110146949A (en) * | 2019-05-29 | 2019-08-20 | 西北工业大学深圳研究院 | A kind of narrow-band spectrum filter structure and preparation method thereof |
| CN110456440A (en) * | 2019-08-28 | 2019-11-15 | 山东劳动职业技术学院（山东劳动技师学院） | A kind of infrared polarizer of three layer line grid structure of metal-dielectric-metal |
| CN110873909A (en) * | 2019-12-02 | 2020-03-10 | 华东交通大学 | Ultra-wideband polarization insensitive absorber of full ultraviolet-mid-infrared band |
| CN111381306A (en) * | 2020-05-12 | 2020-07-07 | 苏州江泓电子科技有限公司 | Polarizing multilayer film for vacuum ultraviolet band of 50-70 nm and preparation method thereof |
| CN112505815A (en) * | 2020-09-15 | 2021-03-16 | 中国科学院上海技术物理研究所 | Polarization regulation spectroscope |
| CN113219566A (en) * | 2021-05-10 | 2021-08-06 | 东北师范大学 | Polarization sensitive broadband response long-wave infrared metamaterial absorber |
Non-Patent Citations (1)
| Title |
|---|
| Experimental measurements and modeling of aluminum reflection gratings on YZ LiNbO3 for OFCSAW sensors;saldanha,N et,al;《PROCEEDINGS OF THE 2006 IEEE INTERNATIONAL FREQUENCY CONTROL SYMPOSIUM AND EXPOSITION》;第368页 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN114114488A (en) | 2022-03-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20080285165A1 (en) | Thin film filter system and method | |
| CN110146949B (en) | Narrow-band spectrum filtering structure and manufacturing method thereof | |
| Liddiard | Application of interferometric enhancement to self-absorbing thin film thermal IR detectors | |
| US7319560B2 (en) | Partitioned-cavity tunable fabry-perot filter | |
| US4929063A (en) | Nonlinear tunable optical bandpass filter | |
| JP7203431B2 (en) | Field effect tunable epsilon near zero absorber | |
| WO2012035110A1 (en) | Spectral band-pass filter having high selectivity and controlled polarization | |
| US7054065B2 (en) | Durable silver thin film coating for diffraction gratings | |
| JPH0627318A (en) | Etalon with dispersion coating | |
| US7576860B2 (en) | Light filter having a wedge-shaped profile | |
| CN114114488B (en) | Visible near infrared metal film reflector with adjustable polarization sensitivity | |
| CN112166487A (en) | Laminated radiation light source | |
| US10353124B1 (en) | Omni-directional ultra-thin reflection optical filters and methods of fabrication | |
| CN110673249A (en) | Reflective filter | |
| CN110703371B (en) | Semiconductor super-surface electromagnetic wave absorber and preparation method thereof | |
| US10162091B1 (en) | Silicon film optical filtering systems and methods of fabrication | |
| US5675414A (en) | Silicon coated mylar beamsplitter | |
| CN110989183B (en) | Spectroscope for marine multi-dimensional imaging system, preparation method and design method thereof | |
| US10254169B2 (en) | Optical detector based on an antireflective structured dielectric surface and a metal absorber | |
| CN112230309A (en) | Optical window film with controllable thermal radiation | |
| Malyarov et al. | Comparative investigations of the bolometric properties of thin film structures based on vanadium dioxide and amorphous hydrated silicon | |
| CN116705887B (en) | Absorption film for infrared detector and preparation method thereof | |
| CN114488371B (en) | Wide-spectrum low-transmittance low-reflectivity reflecting mirror | |
| Piegari et al. | Metal-dielectric coatings for variable transmission filters with wide rejection bands | |
| JP7342390B2 (en) | Optical filter and its manufacturing method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |