CN114113173A - X-ray equipment and scattering correction method applied to X-ray equipment - Google Patents

X-ray equipment and scattering correction method applied to X-ray equipment Download PDF

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CN114113173A
CN114113173A CN202111372005.3A CN202111372005A CN114113173A CN 114113173 A CN114113173 A CN 114113173A CN 202111372005 A CN202111372005 A CN 202111372005A CN 114113173 A CN114113173 A CN 114113173A
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CN114113173B (en
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杨鹏
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Shanghai United Imaging Healthcare Co Ltd
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    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/05Investigating materials by wave or particle radiation by diffraction, scatter or reflection
    • G01N2223/051Investigating materials by wave or particle radiation by diffraction, scatter or reflection correcting for scatter
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/10Different kinds of radiation or particles
    • G01N2223/101Different kinds of radiation or particles electromagnetic radiation
    • G01N2223/1016X-ray

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Abstract

The invention provides an X-ray device and a scattering correction method applied to the X-ray device, wherein the scattering correction method comprises the steps of detecting first ray intensity of X-rays positioned in a main ray irradiation area and detecting second ray intensity of the X-rays positioned in a non-main ray irradiation area, wherein the non-main ray irradiation area is positioned on the outer side of the main ray irradiation area; and establishing a calculation relation between the first ray intensity and the second ray intensity, and calculating and finishing the correction of the scattered rays in the main ray irradiation area according to the calculation relation, so that the influence of the scattered rays on the main rays can be effectively weakened, the dependence on an anti-scatter grid is reduced, a detector is not additionally arranged in a large range to increase the distribution range of the detector, the cost of the detector is not obviously increased, the dependence of a scatter correction method on hardware correction is reduced, and the difficulty of scatter correction is reduced.

Description

X-ray equipment and scattering correction method applied to X-ray equipment
Technical Field
The invention relates to the technical field of medical treatment, in particular to an X-ray device and a scattering correction method applied to the X-ray device.
Background
The X-ray equipment is used as medical equipment with high image resolution, high imaging speed, powerful post-processing function and low radiation dose, and is widely applied to the field of medical diagnosis and treatment. The X-ray equipment comprises an X-ray source and a detector which are oppositely arranged, and an object to be scanned is arranged between the X-ray source and the detector. When an X-ray source irradiates an object under scan, two physical processes occur, namely the photoelectric effect and the compton effect. In the case of a CT system, during image reconstruction, scattered photons generated by the compton effect may cause a large interference to the image reconstruction, and the ratio of the ray intensity of the scattered rays to the ray intensity of the main rays may also increase as the scan collimation width of the CT system and the size of the scanned object increase.
The collimation widths of common CT systems on the market at present are 20mm, 40mm, and even wider collimation widths are obtained by additionally installing an anti-scatter grid (ASG) at a detector end to shield scattered rays, and CT systems of different models design the ASG according to the ray intensity of the corresponding scattered rays. The ASG's manner of shielding scattered radiation may substantially reduce the proportion of the scattered radiation's ray intensity and bring the proportion of scattered radiation down to a level acceptable for image reconstruction. However, because the ASG is located on the optical path between the X-ray source and the ray receiving end of the detector, extra error information is easily introduced into the main ray, wherein the ASG deviates from an ideal state due to factors such as the design of the ASG itself, processing errors or environment, and the like, resulting in poor image quality. In addition, the ASG is difficult to process, so that the requirements on the production process and precision are high, the cost is high, and the overall cost of the CT system is increased.
Disclosure of Invention
The invention aims to provide a scattering correction method applied to an X-ray device and the X-ray device, which can be realized on the basis of not increasing the cost.
In order to achieve the above object, the present invention provides a scatter correction method applied in an X-ray device, comprising the steps of:
detecting a first ray intensity of an X-ray located in a main ray irradiation region and detecting a second ray intensity of an X-ray located in a non-main ray irradiation region, wherein the non-main ray irradiation region is located outside the main ray irradiation region;
and establishing a calculation relation between the first ray intensity and the second ray intensity, and calculating and finishing the correction of the scattered ray of the main ray irradiation area according to the calculation relation.
Optionally, before establishing the calculation relationship between the first ray intensity and the second ray intensity, the method further includes:
establishing and determining a main ray irradiation area and a non-main ray irradiation area through Monte Carlo simulation;
acquiring the relation between the scattered ray intensity of the main ray irradiation area and the scattered ray intensity of the non-main ray irradiation area through Monte Carlo simulation; the relationship between the first ray intensity and the scattered ray intensity and the main ray intensity of the main ray irradiation area, and the relationship between the second ray intensity and the non-main ray irradiation area.
Further, the first radiation intensity is the sum of the scattered radiation intensity of the main radiation irradiation region and the main radiation intensity, and the second radiation intensity is the scattered radiation intensity of the non-main radiation irradiation region.
Further, the intensity of the scattered radiation of the primary radiation irradiation region is identical to the intensity of the scattered radiation of the non-primary radiation irradiation region.
Optionally, the non-primary radiation irradiation region includes one, and one non-primary radiation irradiation region is located on one side of the primary radiation irradiation region in the Z direction.
Optionally, the non-primary radiation irradiation area includes two non-primary radiation irradiation areas, and the two non-primary radiation irradiation areas are located on two sides of the primary radiation irradiation area along the Z direction.
In another aspect, the present invention further provides an X-ray apparatus, including a radiation source and a detector, wherein a scan object is disposed between the radiation source and the detector, and the radiation source is configured to emit X-rays;
the detector comprises a first detector and a second detector, the first detector is used for detecting first ray intensity of X rays in a main ray irradiation area, the second detector is used for detecting second ray intensity of the X rays in a non-main ray irradiation area, the main ray irradiation area is an area which can be directly irradiated by the X rays emitted by a radiation source after scanning an object, the non-main ray irradiation area is an area which cannot be directly irradiated by the X rays emitted by the radiation source after scanning the object, and the non-main ray irradiation area is positioned on the outer side of the main ray irradiation area.
Optionally, the non-primary radiation irradiation region includes one, and one non-primary radiation irradiation region is located on one side of the primary radiation irradiation region in the Z direction.
Optionally, the non-primary radiation irradiation area includes two non-primary radiation irradiation areas, and the two non-primary radiation irradiation areas are located on two sides of the primary radiation irradiation area along the Z direction.
Optionally, the system further comprises an operation module, wherein the operation module is respectively in communication connection with the first detector and the second detector, and is configured to receive data of the intensity of the first ray emitted by the first detector and data of the intensity of the second ray emitted by the second detector, establish a calculation relationship between the intensity of the first ray and the intensity of the second ray, and calculate and complete the correction of the scattered ray in the main ray irradiation region according to the calculation relationship.
Compared with the prior art, the invention has at least the following beneficial effects:
the invention provides an X-ray device and a scattering correction method applied to the X-ray device, wherein the scattering correction method can effectively weaken the influence of a scattered ray on a main ray by establishing a calculation relation between the first ray intensity and the second ray intensity and calculating and finishing the correction of the scattered ray in a main ray irradiation area according to the calculation relation, thereby reducing the dependence on an anti-scattering grid, increasing the distribution range of a detector without adding the detector in a large range, obviously increasing the cost of the detector, reducing the dependence of the scattering correction method on hardware correction, and further reducing the difficulty of scattering correction.
Drawings
Fig. 1 is a schematic flowchart of a scatter correction method applied to an X-ray apparatus according to an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a scanning structure of a CT system according to an embodiment of the present invention;
FIG. 3 is a schematic structural diagram of a scanning structure during Z-direction scanning according to an embodiment of the present invention;
FIG. 4 is a diagram illustrating the distribution of primary and scattered radiation on a detector along the Z-direction after passing through a phantom according to an embodiment of the present invention.
Detailed Description
An X-ray device, a scatter correction method for use in an X-ray device, according to the invention will be described in further detail below, in which preferred embodiments of the invention are shown, it being understood that a person skilled in the art may modify the invention described herein while still achieving the advantageous effects of the invention. Accordingly, the following description should be construed as broadly as possible to those skilled in the art and not as limiting the invention.
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings used in the description of the embodiments will be briefly introduced below. However, it will be apparent to one skilled in the art that the present application may be practiced without these specific details. In other instances, well known methods, procedures, systems, components, and/or circuits have been described at a relatively high-level, diagrammatic, herein, in order to avoid unnecessarily obscuring aspects of the present application. It will be apparent to those of ordinary skill in the art that various changes can be made to the disclosed embodiments and that the general principles defined in this application can be applied to other embodiments and applications without departing from the principles and scope of the application. Thus, the present application is not limited to the embodiments shown, but is to be accorded the widest scope consistent with the claims.
The terminology used herein is for the purpose of describing particular example embodiments only and is not intended to be limiting. As used herein, the singular forms "a", "an" and "the" may include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms "comprises" and/or "comprising," when used in this specification, specify the presence of stated features, integers, steps, operations, components, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, components, and/or groups thereof.
It is to be understood that the terms "system," "module," and/or "block" as used herein are a means for distinguishing, in ascending order, different components, assemblies, parts, portions, or combinations of different levels. However, these terms may be replaced by other expressions if they achieve the same purpose.
These and other features, aspects, and advantages of the present application, as well as the methods of operation and functions of the related elements of structure and the combination of parts and economies of manufacture, will become more apparent upon consideration of the following description of the accompanying drawings, all of which form a part of this specification. It is to be understood, however, that the drawings are designed solely for the purposes of illustration and description and are not intended as a definition of the limits of the application. It should be understood that the drawings are not to scale.
The present embodiments provide an X-ray device including, but not limited to, a CT system. Fig. 2 is a schematic structural diagram of a scanning structure of the CT system of the present embodiment. Fig. 3 is a schematic structural diagram of the scanning structure of the present embodiment in the Z-direction scanning. As shown in fig. 2 and 3, the present embodiment takes a CT system as an example, and the CT system includes a scanning structure, which includes a gantry, a radiation source 10, a collimator 20, a scanning bed, and a detector 30. The scanning bed is used for placing a scanning object 40.
The gantry may support a radiation source 10 and a detector 30. In some embodiments, the radiation source 10 and/or the detector 30 may be mounted on a gantry with the radiation source 10 and the detector 30 on either side of the collimator 20. In some embodiments, the radiation source 10 and/or the detector 20 may be movable or rotatable relative to the gantry. For example, the gantry may rotate around a rotation axis. The radiation source 10 and/or the detector 30 may be rotated as the gantry rotates.
The radiation source 10 may include an imaging source, a treatment source (e.g., an X-ray source, etc.), or a combination thereof. To perform a scan (or during radiation therapy), the radiation source 10 may emit a radiation beam, such as X-rays, towards the scanned object 40. The scan subject 40 may be placed on the scan bed at or near the center of the gantry. The radiation beam emitted by the radiation source 10, after being attenuated by passing through the object 40 to be scanned, impinges upon the detector 30 and is received and detected by the detector 30.
The radiation source 10 includes two regions, namely a main ray irradiation region P and a non-main ray irradiation region S, after passing through the collimator 20 and the scanning object 40, wherein the non-main ray irradiation region S is located outside the main ray irradiation region P, and the non-main ray irradiation region S surrounds the main ray irradiation region P, the main ray irradiation region P is a region where X-rays emitted by the radiation source can be directly irradiated, and the non-main ray irradiation region S is a region where X-rays emitted by the radiation source cannot be directly irradiated.
In this embodiment, the X-ray emitted from the radiation source 10 includes a main radiation irradiation region P and two non-main radiation irradiation regions S in the Z direction after passing through the collimator 20 and scanning the object 40, the two non-main radiation irradiation regions S are located outside the main radiation irradiation region P, the first detector 31 is located in the main radiation irradiation region P, and the second detector 32 is located in the two non-main radiation irradiation regions S. The first detector 31 and the second detector 32 are defined to have an X direction and a Z direction perpendicular to each other on a plane where the first detector 31 and the second detector 32 are located or corresponding to each other, where the Z direction is a direction in which the scanning bed enters the scanning hole, the first detector 31 and the second detector 32 are distributed along the Z direction, and each of the first detector 31 and the second detector 32 has a plurality of rows of strip-shaped sub-detectors. In a square shape in which the first detector and the second detector are integrally formed, the length in the X direction is larger than the length in the Z direction, and due to the low-frequency scattering characteristic, the scattering intensity corresponding to the primary radiation irradiation region P is close to the scattering intensity on both sides in the Z direction, and therefore, a region defined outside (for example, on one side or both sides) the primary radiation irradiation region P in the Z direction is the non-primary radiation irradiation region S, that is, the non-primary radiation irradiation region S is obtained as a result of the collimator correction. The size of the non-main ray irradiation region S (i.e., the number of rows including the sub-detectors) is determined by an actual detector structure and an algorithm, and it is only necessary to satisfy that the scattering intensity corresponding to the main ray irradiation region is close to the scattering intensity on both sides in the Z direction.
In other embodiments, the arrangement direction of the primary radiation irradiation region P and the non-primary radiation irradiation region S may not be in the Z direction, and may be in the X direction, and other directions having an included angle between the X direction and the Z direction.
The X-rays emitted from the radiation source 10 pass through the collimator 20 and the scanning object 40 and then include a main ray irradiation region P and a plurality of non-main ray irradiation regions S in the direction perpendicular to the Z direction, or in the Z direction and any other direction or directions perpendicular to the Z direction, and the non-main ray irradiation regions S are located outside the main ray irradiation region P.
A collimator 20 is located between the detector 30 and the radiation source 10 for collimating X-rays emitted by the radiation source 10. The collimator 20 includes a first blade and a second blade, and is configured to determine a width of a collimating slit formed by the relative movement of the first blade and the second blade along the same reference axis, so as to collimate the X-rays emitted by the radiation source 10. In the present embodiment, the collimator employs a narrow collimator, and the above-described non-principal ray irradiation region S and principal ray irradiation region P can be obtained by the narrow collimator correction.
The detector 30 may convert the received X-rays into electrical signals. The detector may comprise at least two pixels. The pixels are responsive to the intensity of X-rays emitted by the radiation source.
As shown in fig. 3, the detector includes a first detector 31 and a second detector 32, the first detector 31 is distributed in a main radiation irradiation region P where X-rays emitted by the radiation source can be directly irradiated, and is configured to detect a first radiation intensity of the X-rays after the main radiation irradiation region passes through the scanned object, and the first radiation intensity includes a scattered radiation intensity and a main radiation irradiation intensity because the main radiation irradiation region P is a direct irradiation region of the X-rays emitted by the radiation source; the second detector 32 is distributed in the non-primary radiation irradiation region S where the X-rays emitted from the radiation source cannot directly irradiate, and is configured to detect a second radiation intensity of the X-rays located in the non-primary radiation irradiation region S, which includes only the scattered radiation intensity because only the scattered radiation exists in the non-primary radiation irradiation region S. With the development of the technology, most of the detectors can have a wider width in the Z direction, and in a general scanning process, enough pixel regions can be reserved for detecting scattered rays, so that the cost of the detectors is not increased obviously.
The X-ray device further comprises an operation module, which is respectively connected to the first detector 31 and the second detector 32 in communication, and is configured to receive data of the intensity of the first ray emitted by the first detector 31, and data of the intensity of the second ray emitted by the second detector 32, and perform operation calculation according to the calculation relationship between the intensity of the first ray and the intensity of the second ray, so as to complete the correction of the scattered ray of the primary ray irradiation region P.
Fig. 1 is a schematic flowchart of a scatter correction method applied to an X-ray apparatus according to this embodiment. As shown in fig. 1, the present embodiment provides a scatter correction method applied to an X-ray apparatus. Preferably, the scatter correction method is applicable to any X-ray device that can generate scattered radiation.
The scatter correction method comprises the following steps:
step 1: detecting a first ray intensity of an X-ray positioned in a main ray irradiation area and detecting a second ray intensity of the X-ray positioned in a non-main ray irradiation area, wherein the non-main ray irradiation area is positioned outside the main ray irradiation area and is arranged to surround the main ray irradiation area;
step 2: and establishing a calculation relation between the first ray intensity and the second ray intensity, and calculating and finishing the correction of the scattered ray of the main ray irradiation area according to the calculation relation.
The above-described scatter correction method applied in an X-ray device is described in detail below with reference to fig. 2-4.
First, step 1 is performed to detect a first radiation intensity of the X-rays located in the main radiation irradiation region P and to detect a second radiation intensity of the X-rays located in the non-main radiation irradiation region S, which is located outside the main radiation irradiation region.
In detail, the first detector 31 detects a first radiation intensity of the X-rays located in the main radiation exposure region P, and the second detector 32 detects a second radiation intensity of the X-rays located in the non-main radiation exposure region S.
According to the characteristic of Compton scattering low-frequency change, namely that low-frequency components in scattering distribution are dominant, the relevance between the characteristic and a scanned object is small, and because a non-main ray irradiation region S is not directly irradiated by X rays emitted by a radiation source, the intensity of response rays of pixels corresponding to a second detector 32 is the intensity of scattered rays during line-laying scanning; the main ray irradiation region P is directly irradiated by the X-ray emitted from the radiation source, and during the line-out scan, the corresponding pixel response ray intensity of the first detector 31 is the total ray intensity of the scattered ray intensity and the main ray irradiation intensity.
And secondly, determining a main ray irradiation area P and a non-main ray irradiation area S through Monte Carlo simulation, namely, firstly setting the positions of a radiation source and a collimator, and meanwhile, setting a die body on an optical path, so that the area of a detector, onto which rays emitted by the radiation source are projected through a scanning object, is the main ray irradiation area P, the detector in the area is a first detector, and due to the arrangement of the position of the collimator, the area, which is not irradiated by the main rays, of the detector arranged outside the main ray irradiation area P along the Z direction is the non-main ray irradiation area S, the detector in the area is a second detector, wherein an irregular die body is selected for the scanning object during simulation. As shown in fig. 4, the relationship between the scattered ray intensity of the main ray irradiation region P and the scattered ray intensity of the non-main ray irradiation region S is obtained by monte carlo simulation; the relationship between the first radiation intensity and the scattered radiation intensity and the principal radiation intensity of the principal ray irradiation region P, and the relationship between the second radiation intensity and the non-principal ray irradiation region S are obtained. In the monte carlo simulation, the scattered ray intensity and the main ray intensity can be distinguished by recording the physical process simulation, wherein an X coordinate is the Z-direction distribution condition of the detector, a Y coordinate is the ray intensity, and P1 is the main ray irradiation intensity after the object is scanned; s1 is the scattered ray intensity after scanning the object. As can be seen from the simulation, the first radiation intensity of the main radiation exposure field P is a superposition of the main radiation exposure intensity and the scattered radiation intensity, wherein the main radiation intensity of the main radiation exposure field P reflects the variation of the X-ray scanning object at different positions and thicknesses, so that the radiation intensity of P1 is higher in most areas of the main radiation exposure field P and remains substantially unchanged, for example, all values are close to 3 × 105lx, the scattered ray intensity of the main ray irradiation area P is low frequency, the value is close to 0, and the scattered ray intensity of the main ray irradiation area P is basically not influenced by the change of the main ray of the scanning die body; the chief ray of the non-chief ray irradiation region S is blocked, so the chief ray irradiation intensity of the region is zero, so that the non-chief ray irradiation region S only has scatteringAnd under the simulation result and the consideration of errors, the scattered ray intensities of the S1 in the non-main ray irradiation region S and the main ray irradiation region P are consistent and are close to 0, namely the scattered ray intensity of the non-main ray irradiation region S and the scattered ray intensity of the main ray irradiation region P are not basically influenced by the main ray change of the scanning model body, and the two are basically consistent. It should be noted that in practical systems, due to the absence of an ideal point source, plus the effect of mechanical errors, the non-main irradiation region S and the main irradiation region P are not strictly defined, and a penumbra region is generated between the two regions, which is usually confirmed to be distinguished by collimator correction. It is understood that the scattered radiation intensity of the non-principal-ray irradiated region S and the scattered radiation intensity of the principal-ray irradiated region are matched, the first radiation intensity is the sum of the scattered radiation intensity of the principal-ray irradiated region and the principal-ray intensity, and the second radiation intensity is the scattered radiation intensity of the non-principal-ray irradiated region.
And step 2 is executed, a calculation relation between the first ray intensity and the second ray intensity is established, and the scattered ray of the main ray irradiation area is corrected according to the calculation relation.
The method specifically comprises the following steps: the operation module is in communication connection with the first detector 31 and the second detector 32, respectively, and receives data of a first radiation intensity emitted by the first detector 31 and data of a second radiation intensity emitted by the second detector 32, where the first radiation intensity is a sum of a scattered radiation intensity of the main radiation irradiation region and a main radiation intensity, and the second radiation intensity is a scattered radiation intensity of the non-main radiation irradiation region, because the scattered radiation intensity of the non-main radiation irradiation region S and the scattered radiation intensity of the main radiation irradiation region are consistent (for example, the scattered radiation intensity of the non-main radiation irradiation region S and the scattered radiation intensity of the main radiation irradiation region in the Z direction are consistent). The scattered ray intensity of the pixel response of the second detector 32 in the non-main ray irradiation area is taken as the scattered ray intensity of all pixels corresponding to the first detector and the second detector (for example, the scattered ray intensity of all pixels in the Z direction corresponding to the first detector and the second detector), and by calculating the difference value of the first ray intensity and the second ray intensity, the scattered ray correction can be performed on the pixel response of the first detector in the main ray irradiation area, so that the influence of the scattered ray on the main ray can be effectively weakened, and the dependence on an anti-scatter grid (ASG) is reduced.
As shown in fig. 3, for most CT systems, the Z-direction length of the detector is within 100mm, and it can be considered that in this Z-direction length, the scattered ray intensity of the main ray irradiation region P is consistent with the scattered ray intensity of the non-main ray irradiation region S located on both sides of the main ray irradiation region P, and the non-main ray irradiation region S is not within the range directly irradiated by the X-rays emitted from the radiation source, so the ray intensity is completely the scattered ray intensity (i.e., the second ray intensity), and under this assumption, the main ray irradiation intensity of the main ray irradiation region P is equal to the difference between the ray intensity detected by the first detector (i.e., the first ray intensity) and the scattered ray intensity of the non-main ray irradiation region S, and the scattered ray correction of the main ray irradiation region P can be completed. That is, the chief ray irradiation intensity Detector _ P _ scatter call of the chief ray irradiation region P satisfies the formula:
Detector_P_ScatterCali=Detector_P-Detector_S;
wherein, the Detector _ P is a first ray intensity, and the Detector _ S is a second ray intensity.
In summary, the present invention provides an X-ray device and a scatter correction method applied to the X-ray device, which avoids a hardware and software correction method with high technical requirements, and takes a CT system as an example to directly detect scattered photons generated by a scanned object, thereby reducing the dependence on hardware correction and reducing the difficulty of software amplification on scatter correction.
It is to be understood that while the present invention has been described in conjunction with the preferred embodiments thereof, it is not intended to limit the invention to those embodiments. It will be apparent to those skilled in the art from this disclosure that many changes and modifications can be made, or equivalents modified, in the embodiments of the invention without departing from the scope of the invention. Therefore, any simple modification, equivalent change and modification made to the above embodiments according to the technical essence of the present invention are still within the scope of the protection of the technical solution of the present invention, unless the contents of the technical solution of the present invention are departed.

Claims (10)

1. A scatter correction method for use in an X-ray apparatus, comprising the steps of:
detecting a first ray intensity of an X-ray located in a main ray irradiation region and detecting a second ray intensity of an X-ray located in a non-main ray irradiation region, wherein the non-main ray irradiation region is located outside the main ray irradiation region;
and establishing a calculation relation between the first ray intensity and the second ray intensity, and calculating and finishing the correction of the scattered ray of the main ray irradiation area according to the calculation relation.
2. The scatter correction method of claim 1, wherein establishing the calculated relationship between the first ray intensity and the second ray intensity further comprises:
establishing and determining a main ray irradiation area and a non-main ray irradiation area through Monte Carlo simulation;
acquisition by monte carlo simulation: a relationship between scattered ray intensity of the primary ray irradiation region and scattered ray intensity of the non-primary ray irradiation region;
a relationship between the first ray intensity and the scattered ray intensity and the principal ray intensity of the principal ray irradiation region, an
The second ray intensity is in relation to the non-chief ray irradiation area.
3. The scatter correction method of claim 2, wherein the monte carlo simulation comprises:
the first ray intensity is the sum of the scattered ray intensity of the main ray irradiation area and the main ray intensity, and the second ray intensity is the scattered ray intensity of the non-main ray irradiation area.
4. The scatter correction method of claim 2, wherein the scattered radiation intensity of said primary radiation exposure area is coincident with the scattered radiation intensity of said non-primary radiation exposure area.
5. The scatter correction method of claim 1, wherein said non-primary radiation exposure area comprises one, one of said non-primary radiation exposure areas being located on one side of said primary radiation exposure area in a Z direction.
6. The scatter correction method of claim 1, wherein said non-primary radiation exposure area includes two, and two of said non-primary radiation exposure areas are located on both sides of said primary radiation exposure area in a Z direction.
7. An X-ray apparatus, characterized by comprising a radiation source and a detector, a scanning object is arranged between the radiation source and the detector, and the radiation source is used for emitting X-rays;
the detector comprises a first detector and a second detector, the first detector is used for detecting first ray intensity of X rays in a main ray irradiation area, the second detector is used for detecting second ray intensity of the X rays in a non-main ray irradiation area, the main ray irradiation area is an area which can be directly irradiated by the X rays emitted by a radiation source after scanning an object, the non-main ray irradiation area is an area which cannot be directly irradiated by the X rays emitted by the radiation source after scanning the object, and the non-main ray irradiation area is positioned on the outer side of the main ray irradiation area.
8. The X-ray apparatus according to claim 7, wherein the non-principal ray irradiation region includes one, one of the non-principal ray irradiation regions being located on one side of the principal ray irradiation region in the Z direction.
9. The X-ray apparatus according to claim 7, wherein the non-principal ray irradiation region includes two, and two of the non-principal ray irradiation regions are located on both sides of the principal ray irradiation region in the Z direction.
10. The X-ray apparatus according to claim 7, further comprising an operation module, wherein the operation module is respectively connected to the first detector and the second detector in communication, and is configured to receive data of a first radiation intensity emitted by the first detector and data of a second radiation intensity emitted by the second detector, and is configured to establish a calculation relationship between the first radiation intensity and the second radiation intensity, and further to calculate and complete the correction of the scattered radiation of the main radiation exposure area according to the calculation relationship.
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