CN114105150A - Method for synthesizing silicon dioxide powder by utilizing organosilane - Google Patents
Method for synthesizing silicon dioxide powder by utilizing organosilane Download PDFInfo
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- CN114105150A CN114105150A CN202111570016.2A CN202111570016A CN114105150A CN 114105150 A CN114105150 A CN 114105150A CN 202111570016 A CN202111570016 A CN 202111570016A CN 114105150 A CN114105150 A CN 114105150A
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 65
- 150000001282 organosilanes Chemical class 0.000 title claims abstract description 43
- 238000000034 method Methods 0.000 title claims abstract description 33
- 230000002194 synthesizing effect Effects 0.000 title claims abstract description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims abstract description 45
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 26
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 22
- 239000000843 powder Substances 0.000 claims abstract description 19
- 239000003054 catalyst Substances 0.000 claims abstract description 17
- 238000006243 chemical reaction Methods 0.000 claims abstract description 17
- 238000001704 evaporation Methods 0.000 claims abstract description 11
- 238000010438 heat treatment Methods 0.000 claims abstract description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 8
- 238000001035 drying Methods 0.000 claims abstract description 8
- 239000002002 slurry Substances 0.000 claims abstract description 8
- 239000002904 solvent Substances 0.000 claims abstract description 8
- 238000005406 washing Methods 0.000 claims abstract description 8
- 238000003756 stirring Methods 0.000 claims abstract description 7
- 230000008020 evaporation Effects 0.000 claims abstract description 4
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims description 18
- 239000000243 solution Substances 0.000 claims description 13
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 11
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims description 11
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 9
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims description 6
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 4
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 4
- 235000011054 acetic acid Nutrition 0.000 claims description 3
- 230000007935 neutral effect Effects 0.000 claims description 3
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 2
- 239000005711 Benzoic acid Substances 0.000 claims description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 2
- 235000010233 benzoic acid Nutrition 0.000 claims description 2
- 235000015165 citric acid Nutrition 0.000 claims description 2
- 235000019253 formic acid Nutrition 0.000 claims description 2
- 239000011259 mixed solution Substances 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 229910017604 nitric acid Inorganic materials 0.000 claims description 2
- 235000006408 oxalic acid Nutrition 0.000 claims description 2
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 claims description 2
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims 3
- 238000003786 synthesis reaction Methods 0.000 claims 3
- 238000006460 hydrolysis reaction Methods 0.000 abstract description 15
- 230000007062 hydrolysis Effects 0.000 abstract description 14
- 239000002994 raw material Substances 0.000 abstract description 12
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 5
- 239000011164 primary particle Substances 0.000 abstract description 3
- 239000010453 quartz Substances 0.000 abstract description 2
- 238000011084 recovery Methods 0.000 abstract 1
- 239000012535 impurity Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 150000001298 alcohols Chemical class 0.000 description 4
- 230000002572 peristaltic effect Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000012498 ultrapure water Substances 0.000 description 4
- 238000001354 calcination Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000000635 electron micrograph Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- 239000006004 Quartz sand Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 235000019353 potassium silicate Nutrition 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- 239000011863 silicon-based powder Substances 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/03—Particle morphology depicted by an image obtained by SEM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Abstract
The invention discloses a method for synthesizing silicon dioxide powder by utilizing organosilane, which comprises the steps of dispersing high-purity mixed organosilane into methanol to obtain a mixed organosilane solution; dispersing pure water, a catalyst and methanol in a reactor; slowly adding the mixed organosilane solution into a reactor, and continuously stirring at a constant speed for reaction for 2 hours after the addition is finished; after adding a proper amount of pure water, heating, evaporating and concentrating under negative pressure to recover the alcohol solvent and the catalyst; the remaining slurry in the reactor was washed with pure water to near neutrality and dried to obtain silica powder. The method adopts an organosilane hydrolysis method, and the mixed organosilane seat hydrolysis main raw materials mixed according to a certain proportion are subjected to hydrolysis, evaporation recovery, water washing and drying to synthesize silicon dioxide powder, so that the raw materials for synthesizing quartz are obtained. By adopting the adding mode of mixed organosilane, the primary particle size of the silicon dioxide powder is increased, and the product quality is favorably improved.
Description
Technical Field
The invention belongs to the field of silicon-based material manufacturing, and particularly relates to a method for synthesizing silicon dioxide powder by using organosilane.
Background
The high-purity silicon dioxide material has excellent high-temperature resistance (used for a long time at the temperature of more than 1100 ℃), extremely low expansion coefficient, extremely high thermal shock resistance, rapid cooling and rapid heating resistance, high-temperature stability, high insulation, corrosion resistance and excellent optical characteristics, is widely applied to industries such as semiconductors, optics, new energy (photovoltaics) and aerospace (military industry), and is a basic key raw material of the semiconductor and photovoltaic industries. The high purity silica includes mainly natural silica and synthetic silica. The natural silicon dioxide is prepared from the quartz sand with less impurities and high grade through a series of purification processes. In recent years, semiconductor and photovoltaic industries are rapidly developed in China, the demand of high-grade quartz sand is more and more high, and raw material ore sand basically depends on import. Therefore, synthetic silica is still a necessary trend in the development of the semiconductor industry.
The process for synthesizing silicon dioxide mainly comprises a water glass ion exchange method, a silicon tetrachloride method, an organosilane hydrolysis method and the like. The water glass ion exchange method has the defects of low product purity, difficult control of particle size, large water resource consumption in the preparation process and the like; the silicon tetrachloride method cannot be cleaned due to the generation of a large amount of chloride ions, and metal equipment is easily corroded due to the existence of the chloride ions.
Disclosure of Invention
The technical problem to be solved by the invention is to overcome the technical defects, and provide a method for synthesizing silicon dioxide powder by utilizing organosilane, wherein the organosilane hydrolysis method is adopted, the conditions are mild, the production process is simple, meanwhile, a catalyst in the hydrolysis process is circulated in a closed loop in a system, and alcohols generated by hydrolysis are separated, purified and returned to hydrolysis equipment again, so that the alcohols can be recycled, the method is very environment-friendly, and the production cost is greatly reduced. In addition, the terminal raw material of the organosilane is metal silicon powder, so that domestic raw materials are sufficiently supplied.
In order to solve the technical problems, the invention provides a method for synthesizing silicon dioxide powder by utilizing organosilane, which comprises the following steps:
(1) dispersing 15 parts by mass of high-purity organosilane in 15-25 parts by mass of methanol to obtain a mixed organosilane solution;
(2) dispersing 1-3 parts by mass of pure water, 1-3 parts by mass of a catalyst and 10-20 parts by mass of methanol in a reactor;
(3) adding the mixed organosilane solution obtained in the step (1) into a reactor within 2h, and after the addition is finished, continuously stirring at a constant speed at a reaction temperature of 5-30 ℃ for reaction for 2 h;
(4) adding 10 parts by mass of pure water, heating under negative pressure, evaporating, concentrating and recovering the alcohol solvent and the catalyst, and keeping the temperature of evaporation and concentration at 70-95 ℃;
(5) washing the residual slurry in the reactor to be neutral by pure water, and drying at the temperature of 600 ℃ to obtain silicon dioxide powder.
Specifically, the catalyst in the step (1) is one of sulfuric acid, hydrochloric acid, nitric acid, citric acid, benzoic acid, oxalic acid, formic acid, acetic acid, high-concentration electronic grade ammonia water, tetramethyl ammonium hydroxide or tetraethyl ammonium hydroxide; the catalyst adjusts the pH value of the mixed solution to 2-4 or 9-11.
Specifically, the organosilane in the step (2) is a mixture of Tetramethoxysilane (TMOS) and Tetraethoxysilane (TEOS) or/and methyltrimethoxysilane (MTMS), wherein the mass of the Tetramethoxysilane (TMOS) accounts for at least 60%.
The invention mainly obtains the following beneficial effects: the method comprises the steps of carrying out full hydrolysis reaction in a pure water, catalyst and methanol system by adopting a mode of taking mixed organosilane mainly comprising Tetramethoxysilane (TMOS) and assisted by Tetraethoxysilane (TEOS) and/or methyltrimethoxysilane (MTMS) as a hydrolysis raw material, then carrying out negative pressure heating, evaporation and concentration to recover alcohol solvent, washing residual slurry in a reactor to be neutral by using pure water, drying at 600 ℃, removing impurities such as bound water, organic matters and the like in the powder, and finally obtaining silicon dioxide powder. The silicon dioxide powder has larger primary particle size, is beneficial to improving the product quality and becomes a raw material meeting the requirement of a subsequent calcining section.
Moreover, the method adopts an organosilane hydrolysis method, the conditions are mild, the production process is simple, the catalyst in the hydrolysis process is in closed cycle in the system, the alcohols generated by hydrolysis are separated, purified and returned to the hydrolysis equipment, the alcohols can be recycled, the method is very environment-friendly, and the production cost is greatly reduced. In addition, the terminal raw material of the organosilane is metal silicon powder, so that domestic raw materials are sufficiently supplied.
Drawings
FIG. 1 is an electron micrograph of the silica powder synthesized in example 1.
FIG. 2 is an electron micrograph of the silica powder synthesized in example 2.
FIG. 3 is an electron micrograph of the silica powder synthesized in example 3.
FIG. 4 is an electron microscope picture of a silica powder synthesized by comparative example.
Detailed Description
The invention will be further understood from the following examples, which are given by way of illustration and are not intended to be limiting.
Example 1
A method for synthesizing silica powder using organosilane, comprising the steps of:
(1) in a dust-free laboratory, 10kg of Tetramethoxysilane (TMOS) and 5kg of Tetraethoxysilane (TEOS) were dispersed in 15kg of methanol to obtain a mixed organosilane solution;
(2) 3kg of high-purity water, 3kg of ammonia water (25%) and 15kg of methanol are weighed and dispersed in a reactor, the pH of a reaction system is controlled to be 10.5, and the components are uniformly mixed at the temperature of 25 ℃;
(3) slowly adding the mixed organosilane solution obtained in the step (1) into a reactor within 2 hours by using a peristaltic pump, and after the addition is finished, continuously stirring at a constant speed of 70 r/min at a reaction temperature of 5-30 ℃ for reaction for 2 hours;
(4) adding 10kg of pure water into a reactor, heating, evaporating and concentrating under the conditions of negative pressure and 90 ℃ to recover alcohol solvent and catalyst;
(5) washing the residual slurry in the reactor with pure water until the pH value is 7.3, drying at 600 ℃, and removing impurities such as bound water and organic matters in the powder to obtain silicon dioxide powder.
Example 2
A method for synthesizing silica powder using organosilane, comprising the steps of:
(1) in a dust-free laboratory, 10kg of Tetramethoxysilane (TMOS) and 5kg of methyltrimethoxysilane (MTMS) were dispersed in 25kg of methanol to obtain a mixed organosilane solution;
(2) 3kg of high-purity water, 3kg of acetic acid (98%) and 10kg of methanol are weighed and dispersed in a reactor, the pH of a reaction system is controlled to be 3.0, and the components are uniformly mixed at the temperature of 20 ℃;
(3) slowly adding the mixed organosilane solution obtained in the step (1) into a reactor within 2 hours by using a peristaltic pump, and after the addition is finished, continuously stirring at a constant speed of 60 revolutions per minute at a reaction temperature of 5-30 ℃ for reaction for 2 hours;
(4) adding 10kg of pure water into a reactor, heating, evaporating and concentrating under the conditions of negative pressure and 80 ℃ to recover alcohol solvent and catalyst;
(5) washing the residual slurry in the reactor with pure water to pH 6.7, drying at 600 deg.C, and removing impurities such as bound water and organic substances to obtain silicon dioxide powder.
Example 3
A method for synthesizing silica powder using organosilane, comprising the steps of:
(1) in a dust-free laboratory, 10kg of Tetramethoxysilane (TMOS), 3kg of Tetraethoxysilane (TEOS) and 2kg of methyltrimethoxysilane (MTMS) were dispersed in 20kg of methanol to obtain a mixed organosilane solution;
(2) 3kg of high-purity water, 2kg of tetramethylammonium hydroxide and 25kg of methanol are weighed and dispersed in a reactor, the pH of a reaction system is controlled to be 9.5, and the components are uniformly mixed at the temperature of 10 ℃;
(3) slowly adding the mixed organosilane solution obtained in the step (1) into a reactor within 2 hours by using a peristaltic pump, and after the addition is finished, continuously stirring at a constant speed of 50 revolutions per minute at a reaction temperature of 5-30 ℃ for reaction for 2 hours;
(4) adding 10kg of pure water into a reactor, heating, evaporating and concentrating under the conditions of negative pressure and 95 ℃ to recover alcohol solvent and catalyst;
(5) washing the residual slurry in the reactor with pure water until the pH value is 7.3, drying at 600 ℃, and removing impurities such as bound water and organic matters in the powder to obtain silicon dioxide powder.
Comparative example
A method for synthesizing silica powder using organosilane, comprising the steps of:
(1) in a dust-free laboratory, 15kg of Tetramethoxysilane (TMOS) was dispersed in 15kg of methanol to obtain an organosilane solution;
(2) 3kg of high-purity water, 3kg of ammonia water (25%) and 15kg of methanol are weighed and dispersed in a reactor, the pH of a reaction system is controlled to be 10.5, and the components are uniformly mixed at the temperature of 25 ℃;
(3) slowly adding the organosilane solution obtained in the step (1) into a reactor within 2 hours by using a peristaltic pump, and after the addition is finished, continuously stirring at a constant speed of 70 r/min at a reaction temperature of 5-30 ℃ for reaction for 2 hours;
(4) adding 10kg of pure water into a reactor, heating, evaporating and concentrating under the conditions of negative pressure and 90 ℃ to recover alcohol solvent and catalyst;
(5) washing the residual slurry in the reactor with pure water until the pH value is 7.3, drying at 600 ℃, and removing impurities such as bound water and organic matters in the powder to obtain silicon dioxide powder.
As is apparent from the electron microscope images of the silica powders obtained in examples 1 to 3 and comparative example, when a mixed organosilane containing Tetramethoxysilane (TMOS) as a main component and Tetraethoxysilane (TEOS) and/or methyltrimethoxysilane (MTMS) as an auxiliary component is used as a raw material for hydrolysis, the primary particle diameter of the produced silica powder is significantly increased from 200nm to about 800 nm. Meanwhile, in the subsequent synthetic quartz calcination process, the product quality is improved, and the product becomes a qualified raw material meeting the subsequent calcination.
The foregoing is merely a preferred embodiment of the invention and is not intended to limit the invention in any manner; those skilled in the art can make numerous possible variations and modifications to the present teachings, or modify equivalent embodiments to equivalent variations, without departing from the scope of the present teachings, using the methods and techniques disclosed above. Therefore, any simple modification, equivalent replacement, equivalent change and modification made to the above embodiments according to the technical essence of the present invention are still within the scope of the protection of the technical solution of the present invention.
Claims (4)
1. A method for synthesizing silica powder using organosilane, comprising the steps of:
(1) dispersing 15 parts by mass of high-purity organosilane in 15-25 parts by mass of methanol to obtain a mixed organosilane solution;
(2) dispersing 1-3 parts by mass of pure water, 1-3 parts by mass of a catalyst and 10-20 parts by mass of methanol in a reactor;
(3) adding the mixed organosilane solution obtained in the step (1) into a reactor within 2h, and after the addition is finished, continuously stirring at a constant speed at a reaction temperature of 5-30 ℃ for reaction for 2 h;
(4) adding 10 parts by mass of pure water, heating under negative pressure, evaporating, concentrating and recovering the alcohol solvent and the catalyst, and keeping the temperature of evaporation and concentration at 70-95 ℃;
(5) washing the residual slurry in the reactor to be neutral by pure water, and drying at the temperature of 600 ℃ to obtain silicon dioxide powder.
2. Process for the synthesis of silica powder with organosilanes according to claim 1, characterized in that: the catalyst in the step (1) is one of sulfuric acid, hydrochloric acid, nitric acid, citric acid, benzoic acid, oxalic acid, formic acid, acetic acid, high-concentration electronic-grade ammonia water, tetramethyl ammonium hydroxide or tetraethyl ammonium hydroxide.
3. Process for the synthesis of silica powder with organosilanes according to claim 2, characterized in that: the catalyst adjusts the pH value of the mixed solution to 2-4 or 9-11.
4. Process for the synthesis of silica powder with organosilanes according to claim 1, characterized in that: the organosilane in the step (2) is a mixture of tetramethoxysilane and tetraethoxysilane or/and methyltrimethoxysilane, wherein the mass of the tetramethoxysilane accounts for at least 60%.
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10287415A (en) * | 1997-04-09 | 1998-10-27 | Shiaru:Kk | Production of highly pure spherical silica |
| CN112010318A (en) * | 2020-08-10 | 2020-12-01 | 深圳市科玺化工有限公司 | Preparation method of nano water-based silica sol for semiconductor polishing |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10287415A (en) * | 1997-04-09 | 1998-10-27 | Shiaru:Kk | Production of highly pure spherical silica |
| CN112010318A (en) * | 2020-08-10 | 2020-12-01 | 深圳市科玺化工有限公司 | Preparation method of nano water-based silica sol for semiconductor polishing |
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Address after: 233000 28 yuan yuan Road, Huaihe Industrial Park, Huaishang District, Bengbu, Anhui Applicant after: Anhui Kaisheng Applied Materials Co.,Ltd. Applicant after: BENGBU ZHONGHENG NEW MATERIALS SCIENTIFIC AND TECHNOLOGICAL Co.,Ltd. Address before: 233000 28 yuan yuan Road, Huaihe Industrial Park, Huaishang District, Bengbu, Anhui Applicant before: ANHUI ZHONGCHUANG ELECTRONIC INFORMATION MATERIAL Co.,Ltd. Applicant before: BENGBU ZHONGHENG NEW MATERIALS SCIENTIFIC AND TECHNOLOGICAL Co.,Ltd. |
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Application publication date: 20220301 |
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