CN114100303B - Air inlet system for semiconductor waste gas treatment and control method - Google Patents
Air inlet system for semiconductor waste gas treatment and control method Download PDFInfo
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- CN114100303B CN114100303B CN202111172337.7A CN202111172337A CN114100303B CN 114100303 B CN114100303 B CN 114100303B CN 202111172337 A CN202111172337 A CN 202111172337A CN 114100303 B CN114100303 B CN 114100303B
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- 239000002912 waste gas Substances 0.000 title claims abstract description 71
- 239000004065 semiconductor Substances 0.000 title claims abstract description 16
- 238000000034 method Methods 0.000 title claims abstract description 12
- 239000007789 gas Substances 0.000 claims abstract description 107
- 230000001105 regulatory effect Effects 0.000 claims abstract description 32
- 230000001276 controlling effect Effects 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000003139 buffering effect Effects 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
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- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Treating Waste Gases (AREA)
Abstract
The invention provides an air inlet system for semiconductor waste gas treatment and a control method, wherein the air inlet system comprises a waste gas inlet pipeline, the outlet end of the waste gas inlet pipeline is connected with a waste gas treatment device, a first pressure sensor is arranged at the outlet end of the waste gas inlet pipeline, and the air inlet system further comprises a gas cache tank and a gas cache inlet pipeline which is used for guiding waste gas in the waste gas inlet pipeline to the gas cache tank, regulating the pressure of the outlet gas of the gas cache tank and then returning the gas to the outlet end of the waste gas inlet pipeline. According to the invention, by reasonably arranging the air inlet system, when the pressure is instantaneously increased due to the overlarge air quantity of the air inlet of the waste gas treatment device, the air inlet pipeline of the air buffer is started, so that the normal operation of equipment is ensured. And when the intake pressure is recovered to be normal, the original intake pipeline is automatically switched back.
Description
Technical Field
The invention relates to the technical field of semiconductor waste gas treatment, in particular to an air inlet system for semiconductor waste gas treatment and a control method.
Background
The exhaust gas treatment device is an important accessory device in the manufacture of semiconductors and liquid crystal panels, and the normal operation of the exhaust gas treatment device can ensure the complete treatment of toxic and harmful gases exhausted from the manufacturing device. Therefore, the stability of the equipment is also related to the continuity of production, the air inlet pipelines of the existing equipment are connected through pipelines with the same pipe diameter, when the air quantity suddenly increases, the air inlet pressure of the waste gas treatment device is increased due to the fact that a buffer device is not arranged, equipment is stopped, the operation of manufacturing equipment is affected, and therefore, the problem of sudden change of the air inlet pressure is very important to solve.
Disclosure of Invention
The invention aims to solve the technical problems existing in the prior art. Therefore, the invention provides an air inlet system for semiconductor waste gas treatment and a control method thereof, and aims to control waste gas flow and prevent the short-term increase of air quantity from affecting the normal operation of equipment.
Based on the above object, the invention provides an air intake system for semiconductor waste gas treatment, which comprises a waste gas air intake pipeline, wherein the outlet end of the waste gas air intake pipeline is connected with a waste gas treatment device, the outlet end of the waste gas air intake pipeline is provided with a first pressure sensor, and the air intake system also comprises a gas cache tank and a gas cache air intake pipeline, wherein the gas cache tank is used for guiding waste gas in the waste gas air intake pipeline to the gas cache tank, and the gas cache air intake pipeline is used for returning to the outlet end of the waste gas air intake pipeline after the gas is subjected to pressure regulation.
The exhaust gas inlet pipeline comprises a first exhaust gas inlet pipe, a second exhaust gas inlet pipe and a first switching valve connected with the first exhaust gas inlet pipe and the second exhaust gas inlet pipe, the outlet end of the second exhaust gas inlet pipe is connected with the exhaust gas treatment device, and the first pressure sensor is arranged at the outlet end of the second exhaust gas inlet pipe.
The gas cache air inlet pipeline comprises a cache conveying pipe and a first return pipe, a second switch valve is arranged on the cache conveying pipe, a regulating valve is arranged on the first return pipe, the inlet end of the cache conveying pipe is connected with a first waste gas inlet pipe, the outlet end of the cache conveying pipe is connected with the air inlet of the gas cache tank, and the first air outlet of the gas cache tank is connected with the outlet end of a second waste gas inlet pipe through the first return pipe.
The gas inlet system further comprises a second pressure sensor for detecting the pressure inside the gas cache tank.
The waste gas inlet pipeline is further provided with a three-way valve arranged on the first waste gas inlet pipe, an exhaust port of the three-way valve is connected with the exhaust pipeline, the inlet end of the buffer conveying pipe is communicated with the air outlet of the three-way valve, the air inlet system further comprises a second return pipe and a third switch valve arranged on the second return pipe, one end of the second return pipe is connected with the second air outlet of the gas buffer tank, and the other end of the second return pipe is connected with the inlet end of the first waste gas inlet pipe.
And a third pressure sensor is arranged at the air inlet end of the first exhaust air inlet pipe.
The air inlet system further comprises a controller, and the first switch valve, the second switch valve, the third switch valve, the first pressure sensor, the second pressure sensor, the third pressure sensor, the regulating valve and the three-way valve are all electrically connected with the controller.
The invention also provides a control method of the air inlet system for semiconductor waste gas treatment, which comprises the following steps:
when the air intake normally runs, the three-way valve is opened to be in an air intake straight-through state, the first switch valve is opened, the second switch valve and the third switch valve are closed, and the opening of the regulating valve is zero;
when the first pressure sensor detects that the air inlet pressure is higher than a preset range value, the second switch valve is opened, the first switch valve is closed, and the opening of the regulating valve is controlled to enable the pressure P of the air inlet of the exhaust gas treatment device to be the pressure P 1 At the maximum set value P max And a minimum set value P min Between them; the controller opens the first switch valve and closes the second switch valve after the set interval time is reached according to the set check interval time t, the opening degree of the regulating valve is zero, the air inlet pressure of the exhaust gas treatment device is detected by the first pressure sensor, and if the pressure P is the same 1 Restoring normal P min <P 1 <P max Then the control continues to adjust the opening of the regulating valve to keep the pressure at P min <P 1 <P max Until the regulating valve is safely opened, if the pressure P 1 If the pressure is not recovered, returning to the upper order to open the second switch valve, closing the first switch valve, and controlling the opening of the regulating valve to regulate the pressure P 1 Restoring to normal; when the pressure detected by the first pressure sensor is equal to the pressure detected by the second pressure sensor, the control regulating valve is completely closed, and the air intake normal operation mode is switched back.
The device also comprises a three-way valve for bypassing exhaust after the equipment generates fault alarm and stops when the gas is not completely emptied after the waste gas enters the gas buffer tank, a first switch valve, a second switch valve and a regulating valve are closed at the same time, a third switch valve is opened, and the pressure P detected by a third pressure sensor is used for controlling the pressure P 3 And the pressure P detected by the second pressure sensor 2 When the two valves are equal, the third switch valve is controlled to be completely closed.
The invention has the beneficial effects that: according to the invention, by reasonably arranging the air inlet system, when the pressure is instantaneously increased due to the overlarge air quantity of the air inlet of the waste gas treatment device, the air inlet pipeline of the air buffer is started, so that the normal operation of equipment is ensured. And when the intake pressure is recovered to be normal, the original intake pipeline is automatically switched back. The invention can well control the flow of the exhaust gas and prevent the short gas volume from increasing to influence the normal operation of the equipment.
Drawings
In order to more clearly illustrate the embodiments of the invention or the technical solutions in the prior art, the drawings that are required in the embodiments or the description of the prior art will be briefly described, it being obvious that the drawings in the following description are only some embodiments of the invention, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of an air intake system according to the present invention;
FIG. 2 is a first control flow diagram of the present invention;
fig. 3 is a second control flow chart of the present invention.
Marked in the figure as:
1. a three-way valve; 2. a first switching valve; 3. a third switching valve; 4. a second switching valve; 5. a gas buffer tank; 6. a regulating valve; 7. an exhaust gas treatment device; 8. a first pressure sensor; 9. a second pressure sensor; 10. a third pressure sensor; 11. a buffer transport pipe; 12. a first return pipe; 13. and a second return pipe.
Detailed Description
The present invention will be further described in detail below with reference to specific embodiments and with reference to the accompanying drawings, in order to make the objects, technical solutions and advantages of the present invention more apparent.
It should be noted that unless otherwise defined, technical or scientific terms used in the embodiments of the present invention should be given the ordinary meaning as understood by one of ordinary skill in the art to which the present disclosure pertains. The terms "first," "second," and the like, as used in this disclosure, do not denote any order, quantity, or importance, but rather are used to distinguish one element from another. The word "comprising" or "comprises", and the like, means that elements or items preceding the word are included in the element or item listed after the word and equivalents thereof, but does not exclude other elements or items. The terms "connected" or "connected," and the like, are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "upper", "lower", "left", "right", etc. are used merely to indicate relative positional relationships, which may also be changed when the absolute position of the object to be described is changed.
As shown in fig. 1 to 3, an air intake system for semiconductor exhaust gas treatment includes an exhaust gas intake pipe, an outlet end of which is connected with an exhaust gas treatment device 7, and an outlet end of which is provided with a first pressure sensor 8, and further includes a gas buffer tank 5 and a gas buffer intake pipe for guiding exhaust gas in the exhaust gas intake pipe to the gas buffer tank 5 and returning back to an outlet end of the exhaust gas intake pipe after pressure regulation of the exhaust gas in the gas buffer tank 5. Through the setting of gas cache inlet line, when the excessive volume of exhaust gas treatment device air inlet leads to pressure rising in the twinkling of an eye, start gas cache inlet line for waste gas reenters exhaust gas treatment device after the normal pressure is restoreed to through the pressure regulating, guarantees the normal operating of equipment.
As shown in fig. 1, the exhaust gas inlet pipeline comprises a first exhaust gas inlet pipe, a second exhaust gas inlet pipe and a first switch valve 2 for connecting the first exhaust gas inlet pipe and the second exhaust gas inlet pipe, the outlet end of the second exhaust gas inlet pipe is connected with an exhaust gas treatment device 7, and a first pressure sensor 8 is arranged at the outlet end of the second exhaust gas inlet pipe. The setting of first pressure sensor is convenient for detect the pressure of exhaust treatment device air inlet end, and then is convenient for know whether waste gas is normal at this inlet pressure, if the too big pressure that leads to of exhaust treatment device air inlet tolerance rises, then accessible this first pressure sensor detects the back, is convenient for control start gas buffering inlet line.
The gas cache air inlet pipeline comprises a cache conveying pipe 11 and a first return pipe 12, a second switch valve 4 is arranged on the cache conveying pipe 11, a regulating valve 6 is arranged on the first return pipe 12, the inlet end of the cache conveying pipe 11 is connected with a first waste gas inlet pipe, the outlet end of the cache conveying pipe 11 is connected with the air inlet of the gas cache tank 5, and the first air outlet of the gas cache tank 5 is connected with the outlet end of a second waste gas inlet pipe through the first return pipe 12. After the gas buffer intake pipeline is started, the first switch valve 2 is closed, the second switch valve 4 is opened, the opening degree of the regulating valve is controlled, the intake pressure is regulated, and then the gas is led into the air inlet of the exhaust gas treatment device through the outlet end of the second exhaust gas inlet pipe.
In order to facilitate the detection of the pressure inside the gas-storage tank, the above-described intake system for semiconductor exhaust gas treatment further includes a second pressure sensor 9 for detecting the pressure inside the gas-storage tank 5. The second pressure sensor is used for collecting the internal pressure of the gas cache tank, so that the gas cache pipeline and the waste gas inlet pipeline are facilitated to be assisted to judge whether pressure regulation is needed or not and whether the pressure regulation can be switched back to the original waste gas inlet pipeline to convey waste gas or not after the pressure regulation.
Further, the waste gas inlet pipeline still includes the three-way valve 1 of locating in the first waste gas intake pipe, the gas vent and the exhaust piping connection of three-way valve 1, the entrance point of buffering conveyer pipe 11 communicates with the gas outlet of three-way valve 1, this semiconductor waste gas treatment is with intake system still includes second back flow 13 and locates the third ooff valve 3 on the second back flow 13, the one end of second back flow 13 is connected with the second gas outlet of gas buffering jar 5, the other end of second back flow 13 is connected with the entrance point of first waste gas intake pipe. After the waste gas enters the gas cache tank 5, when the gas is not completely emptied, the equipment generates a fault alarm and stops, and through the arrangement of the structure, the control of all the gas in the gas cache tank is facilitated. Specifically, the three-way valve is opened for exhausting, the first switch valve 2, the second switch valve 4 and the regulating valve 6 are closed, the third switch valve 3 is opened, the gas in the gas cache tank flows to the inlet end of the first exhaust gas inlet pipe through the second return pipe, and then is exhausted through the exhaust port of the three-way valve, and when the pressure P detected by the third pressure sensor 3 And the pressure P detected by the second pressure sensor 2 When the two valves are equal, the third switch valve is controlled to be completely closed.
In order to facilitate the detection of the pressure at the inlet end of the first exhaust gas inlet pipe, the inlet end of the first exhaust gas inlet pipe is provided with a third pressure sensor 10. The pressure of the air inlet end of the first waste gas inlet pipe is acquired through the second pressure sensor, so that the second pressure sensor on the gas cache tank is facilitated to judge whether the gas in the gas cache tank is completely discharged.
In order to facilitate the automatic control of the opening and closing adjustment of each switch valve and the adjusting valve of the air inlet system and the detection and control of the pressure sensor, the air inlet system for the semiconductor waste gas treatment further comprises a controller, and the first switch valve 2, the second switch valve 4, the third switch valve 3, the first pressure sensor 8, the second pressure sensor 9, the third pressure sensor 10, the adjusting valve 6 and the three-way valve 1 are electrically connected with the controller. Specifically, the controller employs a PLC, and controls the opening and closing of the first switching valve 2, the second switching valve 4, the third switching valve 3, and the three-way valve by the PLC, and controls the opening of the regulator valve, and performs data processing and analysis on the pressures detected by the first pressure sensor 8, the second pressure sensor 9, and the third pressure sensor 10, and then performs corresponding control.
The waste gas enters the waste gas treatment device through the three-way valve in a straight-through state, and when the first pressure sensor detects that the system pressure is high, the gas cache pipeline is started to perform gas intake. As shown in fig. 2, the control method of the air intake system for semiconductor exhaust gas treatment specifically includes a control mode one:
when the air intake normally runs, the three-way valve 1 is opened to be in an air intake straight-through state, the first switching valve 2 is opened, the second switching valve 4 and the third switching valve 3 are closed, and the opening of the regulating valve 6 is zero;
when the first pressure sensor 8 detects that the intake pressure is higher than the preset range value, the second switch valve 4 is opened, the first switch valve 2 is closed, and the opening degree of the regulating valve 6 is controlled to enable the pressure P of the air inlet of the exhaust gas treatment device 7 1 At the maximum set value P max And a minimum set value P min Between them; the controller opens the first switching valve 2 and closes the second switching valve 4 after the set interval time is reached, the opening of the regulating valve 6 is zero, the intake pressure of the exhaust gas treatment device 7 is detected by the first pressure sensor 8, and if the pressure P is the following 1 Restoring normal P min <P 1 <P max Then the control continues to adjust the opening of the regulating valve 6 to maintain the pressure at P min <P 1 <P max Until the regulating valve 6 is safely opened, if the pressure isP 1 Returning to the upper order to open the second switch valve 4, closing the first switch valve 2, and controlling the opening of the regulating valve 6 to regulate the pressure P 1 Restoring to normal; when the pressure detected by the first pressure sensor 8 and the pressure detected by the second pressure sensor 9 are equal, the control regulator valve 6 is completely closed, and the intake normal operation mode is switched back.
As shown in fig. 3, the control method further includes a second control method: when the waste gas enters the gas buffer tank 5, after the equipment generates fault alarm and stops when the gas is not completely emptied, the three-way valve 1 bypasses the exhaust, simultaneously closes the first switch valve 2, the second switch valve 4 and the regulating valve 6, opens the third switch valve 3, and when the pressure P detected by the third pressure sensor 10 is detected 3 And the pressure P detected by the second pressure sensor 9 2 When the two are equal, the third switching valve 3 is controlled to be completely closed.
Those of ordinary skill in the art will appreciate that: the discussion of any of the embodiments above is merely exemplary and is not intended to suggest that the scope of the disclosure, including the claims, is limited to these examples; the technical features of the above embodiments or in the different embodiments may also be combined within the idea of the invention, the steps may be implemented in any order and there are many other variations of the different aspects of the invention as described above, which are not provided in detail for the sake of brevity.
The embodiments of the invention are intended to embrace all such alternatives, modifications and variances which fall within the broad scope of the appended claims. Therefore, any omission, modification, equivalent replacement, improvement, etc. of the present invention should be included in the scope of the present invention.
Claims (2)
1. The control method of the air intake system for the semiconductor waste gas treatment is characterized in that the air intake system comprises a waste gas air intake pipeline, the outlet end of the waste gas air intake pipeline is connected with a waste gas treatment device, a first pressure sensor is arranged at the outlet end of the waste gas air intake pipeline, the air intake system further comprises a gas cache tank and a gas cache air intake pipeline which is used for guiding waste gas in the waste gas air intake pipeline to the gas cache tank and carrying out pressure regulation on the outlet gas of the gas cache tank and then returning to the outlet end of the waste gas air intake pipeline, the waste gas air intake pipeline comprises a first waste gas air intake pipe, a second waste gas air intake pipe and a first switch valve which is connected with the first waste gas air intake pipe, the outlet end of the second waste gas air intake pipe is connected with the waste gas treatment device, the first pressure sensor is arranged at the outlet end of the second waste gas air intake pipe, the gas cache air intake pipeline comprises a cache conveying pipe and a first return pipe, a second switch valve is arranged on the cache conveying pipe, the inlet end of the first return pipe is connected with the first waste gas air intake pipe, and the outlet end of the first waste gas cache conveying pipe is connected with the outlet end of the second waste gas intake pipe through the first outlet pipe; the air inlet system further comprises a second pressure sensor for detecting the internal pressure of the gas cache tank; the waste gas inlet pipeline further comprises a three-way valve arranged on the first waste gas inlet pipeline, an exhaust port of the three-way valve is connected with the exhaust pipeline, an inlet end of the buffer conveying pipe is communicated with an air outlet of the three-way valve, the air inlet system further comprises a second return pipe and a third switch valve arranged on the second return pipe, one end of the second return pipe is connected with a second air outlet of the gas buffer tank, and the other end of the second return pipe is connected with an inlet end of the first waste gas inlet pipeline; a third pressure sensor is arranged at the air inlet end of the first exhaust air inlet pipe;
the control method comprises the following steps:
when the air intake normally runs, the three-way valve is opened to be in an air intake straight-through state, the first switch valve is opened, the second switch valve and the third switch valve are closed, and the opening of the regulating valve is zero;
when the first pressure sensor detects that the air inlet pressure is higher than a preset range value, the second switch valve is opened, the first switch valve is closed, and the opening of the regulating valve is controlled to enable the pressure P of the air inlet of the exhaust gas treatment device to be the pressure P 1 At the maximum set value P max And a minimum set value P min Between them; the controller opens the first switch valve and closes the second switch when the set interval time is reached according to the set check interval time tA valve for adjusting the opening degree of the valve to zero, detecting the intake pressure of the exhaust gas treatment device by the first pressure sensor, and if the pressure P is 1 Restoring normal P min <P 1 <P max Then the control continues to adjust the opening of the regulating valve to keep the pressure at P min <P 1 <P max Until the regulating valve is safely opened, if the pressure P 1 If the pressure is not recovered, returning to the upper order to open the second switch valve, closing the first switch valve, and controlling the opening of the regulating valve to regulate the pressure P 1 Restoring to normal; when the pressure detected by the first pressure sensor is equal to the pressure detected by the second pressure sensor, the control regulating valve is completely closed, and the air intake normal operation mode is switched back;
the device also comprises a three-way valve for bypassing exhaust after the equipment generates fault alarm and stops when the gas is not completely emptied after the waste gas enters the gas buffer tank, a first switch valve, a second switch valve and a regulating valve are closed at the same time, a third switch valve is opened, and the pressure P detected by a third pressure sensor is used for controlling the pressure P 3 And the pressure P detected by the second pressure sensor 2 When the two valves are equal, the third switch valve is controlled to be completely closed.
2. The method for controlling an intake system for semiconductor exhaust gas treatment according to claim 1, wherein the intake system further comprises a controller, and the first switching valve, the second switching valve, the third switching valve, the first pressure sensor, the second pressure sensor, the third pressure sensor, the regulating valve, and the three-way valve are all electrically connected to the controller.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202111172337.7A CN114100303B (en) | 2021-10-08 | 2021-10-08 | Air inlet system for semiconductor waste gas treatment and control method |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202111172337.7A CN114100303B (en) | 2021-10-08 | 2021-10-08 | Air inlet system for semiconductor waste gas treatment and control method |
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| CN114100303A CN114100303A (en) | 2022-03-01 |
| CN114100303B true CN114100303B (en) | 2024-02-02 |
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| CN114751501B (en) * | 2022-04-14 | 2023-06-30 | 浙江德欧化工制造有限公司 | Environment-friendly post-treatment device suitable for printing and dyeing waste gas treatment |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN205331809U (en) * | 2016-01-29 | 2016-06-22 | 灵宝金源朝辉铜业有限公司 | Steam pressure pressure maintaining system |
| DE102014226843A1 (en) * | 2014-12-22 | 2016-06-23 | Robert Bosch Gmbh | Method and device for bidirectionally controlling a gas flow in a combustion chamber bypass line bypassing a combustion chamber of a supercharged internal combustion engine |
| CN209309659U (en) * | 2018-11-23 | 2019-08-27 | 四川金星清洁能源装备股份有限公司 | It is integrated in compressor and prizes upper automatic gas recovery system |
| CN209613292U (en) * | 2019-01-22 | 2019-11-12 | 重庆灵徽科技有限公司 | A kind of pressure regulation for gas supply device on spraying equipment |
| CN111180365A (en) * | 2020-01-03 | 2020-05-19 | 北京北方华创微电子装备有限公司 | Air intake system and air intake method |
| CN212655468U (en) * | 2020-06-03 | 2021-03-05 | 上海康洁机电设备工程有限公司 | Bypass device for ensuring stable air inlet of ozone system |
| CN113113333A (en) * | 2021-04-01 | 2021-07-13 | 北京北方华创微电子装备有限公司 | Exhaust device and semiconductor processing equipment |
| CN214064567U (en) * | 2020-10-30 | 2021-08-27 | 中国石油化工股份有限公司 | Nitrogen injection device |
| CN214198175U (en) * | 2021-01-28 | 2021-09-14 | 锦益创典(天津)科技有限责任公司 | Stabilize storage tank pressure, reduce exhaust emission's device |
-
2021
- 2021-10-08 CN CN202111172337.7A patent/CN114100303B/en active Active
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102014226843A1 (en) * | 2014-12-22 | 2016-06-23 | Robert Bosch Gmbh | Method and device for bidirectionally controlling a gas flow in a combustion chamber bypass line bypassing a combustion chamber of a supercharged internal combustion engine |
| CN205331809U (en) * | 2016-01-29 | 2016-06-22 | 灵宝金源朝辉铜业有限公司 | Steam pressure pressure maintaining system |
| CN209309659U (en) * | 2018-11-23 | 2019-08-27 | 四川金星清洁能源装备股份有限公司 | It is integrated in compressor and prizes upper automatic gas recovery system |
| CN209613292U (en) * | 2019-01-22 | 2019-11-12 | 重庆灵徽科技有限公司 | A kind of pressure regulation for gas supply device on spraying equipment |
| CN111180365A (en) * | 2020-01-03 | 2020-05-19 | 北京北方华创微电子装备有限公司 | Air intake system and air intake method |
| CN212655468U (en) * | 2020-06-03 | 2021-03-05 | 上海康洁机电设备工程有限公司 | Bypass device for ensuring stable air inlet of ozone system |
| CN214064567U (en) * | 2020-10-30 | 2021-08-27 | 中国石油化工股份有限公司 | Nitrogen injection device |
| CN214198175U (en) * | 2021-01-28 | 2021-09-14 | 锦益创典(天津)科技有限责任公司 | Stabilize storage tank pressure, reduce exhaust emission's device |
| CN113113333A (en) * | 2021-04-01 | 2021-07-13 | 北京北方华创微电子装备有限公司 | Exhaust device and semiconductor processing equipment |
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Inventor after: Yang Chuntao Inventor after: Zhang Kun Inventor after: Yang Chunshui Inventor before: Yang Chunshui Inventor before: Zhang Kun Inventor before: Yang Chuntao |
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| CB03 | Change of inventor or designer information |