CN114093922A - Display panel, manufacturing method of display panel and display device - Google Patents

Display panel, manufacturing method of display panel and display device Download PDF

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Publication number
CN114093922A
CN114093922A CN202111409762.3A CN202111409762A CN114093922A CN 114093922 A CN114093922 A CN 114093922A CN 202111409762 A CN202111409762 A CN 202111409762A CN 114093922 A CN114093922 A CN 114093922A
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China
Prior art keywords
layer
display panel
retaining wall
light
shielding
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CN202111409762.3A
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Chinese (zh)
Inventor
罗程远
徐攀
张星
韩影
王国英
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BOE Technology Group Co Ltd
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BOE Technology Group Co Ltd
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Priority to CN202111409762.3A priority Critical patent/CN114093922A/en
Publication of CN114093922A publication Critical patent/CN114093922A/en
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/1201Manufacture or treatment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

The disclosure relates to a display panel, a manufacturing method of the display panel and a display device, and relates to the technical field of display. The display panel includes: the light-emitting layer comprises a first electrode layer, a pixel defining layer, a light-emitting functional layer and a second electrode layer. In the embodiment of the present disclosure, at least one of the inner circumferential surface and the outer circumferential surface of the retaining wall has a groove, so that the separation from the retaining wall can be prevented after the lyophobic layer extends into the groove. When the light-emitting functional layer of the light-emitting layer is formed later, due to the lyophobic property of the lyophobic layer, the organic materials for forming the light-emitting functional layer can be prevented from being remained on the surface of the lyophobic layer, so that the formed light-emitting functional layer is limited in the range surrounded by the retaining wall, the problem that the light-emitting functional layer is exposed is avoided, the condition that water and oxygen are immersed into the light-emitting functional layer is effectively blocked, and the service life of the display panel is prolonged.

Description

Display panel, manufacturing method of display panel and display device
Technical Field
The disclosure relates to the technical field of display, in particular to a display panel, a manufacturing method of the display panel and a display device.
Background
An Organic Light-Emitting Diode (OLED) is a display illumination technology that has been gradually developed in recent years, and is widely used in the display industry due to its advantages of high response, high contrast, flexibility, and the like, especially in the display industry.
The OLED display panel is usually a rectangular display panel obtained by the manufacturing method corresponding to the OLED display panel, and in order to obtain the special-shaped display panel, the obtained rectangular display panel needs to be cut by a cutting method so as to obtain the special-shaped display panel with a non-rectangular outer contour, such as a circle, an ellipse, and the like. However, after the special-shaped display panel is obtained by cutting, the service life of the special-shaped display panel is obviously shorter than that of the rectangular display panel.
It is to be noted that the information disclosed in the above background section is only for enhancement of understanding of the background of the present disclosure, and thus may include information that does not constitute prior art known to those of ordinary skill in the art.
Disclosure of Invention
The present disclosure provides a display panel, a method for manufacturing the display panel, and a display device, which can further improve the service life of the display panel, especially the service life of a special-shaped display panel.
According to a first aspect of the present disclosure, there is provided a display panel including:
a substrate having a display region and a non-display region surrounding the display region;
the driving layer is positioned on one side of the substrate base plate and positioned in the display area;
the retaining wall and the driving layer are positioned on the same side of the substrate base plate and positioned in the non-display area, and at least one of the inner circumferential surface and the outer circumferential surface of the retaining wall is provided with a groove;
the lyophobic layer covers the surface, deviating from the substrate base plate, of the retaining wall and extends into the groove;
the light-emitting layer comprises a first electrode layer, a pixel defining layer, a light-emitting functional layer and a second electrode layer, wherein the light-emitting layer is positioned on one side, deviating from the substrate base plate, of the driving layer, and deviates from the driving layer in sequence, and the light-emitting functional layer is positioned in the range surrounded by the retaining wall.
According to the display panel of one embodiment of the present disclosure, the retaining wall surrounds the driving layer, and includes a first insulating layer, a first supporting layer, and a first shielding layer which sequentially depart from the substrate base plate;
the first shielding layer extends out of the first supporting layer along the radial direction, and the lyophobic layer wraps the first shielding layer and the first supporting layer and covers the surface, deviating from the substrate base plate, of the first insulating layer.
According to the display panel of one embodiment of the present disclosure, the inner circumferential surface and the outer circumferential surface of the first support layer are both curved surfaces that contract toward the middle of the first support layer in the radial direction.
According to the display panel of one embodiment of the present disclosure, the driving layer includes a light-shielding layer, a buffer layer, an active layer, a gate insulating layer, a gate layer, a first passivation layer, a source drain layer and a second passivation layer which are sequentially deviated from the substrate, and the source drain layer is a single-layer conductive layer;
the first insulating layer and the buffer layer are arranged on the same layer, the first supporting layer and the source drain layer are arranged on the same layer, and the first shielding layer and the second passivation layer are arranged on the same layer.
According to an embodiment of the present disclosure, the retaining wall further includes: the second shielding layer, the second supporting layer and the third shielding layer are positioned between the first insulating layer and the first supporting layer and sequentially deviate from the first insulating layer;
the third shielding layer extends out of the second supporting layer along the radial direction, the radial width of the first shielding layer is smaller than that of the third shielding layer, and the lyophobic layer covers the surface, away from the substrate base plate, of the third shielding layer.
According to the display panel of an embodiment of the present disclosure, a length of the first blocking layer radially extending out of the first support layer is smaller than a length of the third blocking layer radially extending out of the second support layer.
According to the display panel of one embodiment of the present disclosure, an etching rate of the first shielding layer is less than an etching rate of the first supporting layer, and an etching rate of the third shielding layer is less than an etching rate of the second supporting layer.
According to the display panel of one embodiment of the present disclosure, the thickness of the first support layer is greater than or equal to the thickness of the second support layer.
According to the display panel of one embodiment of the present disclosure, the surface of the lyophobic layer departing from the retaining wall is a convex curved surface.
According to the display panel of one embodiment of the present disclosure, the lyophobic layer and the pixel defining layer are disposed on the same layer.
According to an embodiment of the present disclosure, the display panel includes a plurality of circles of the retaining wall.
According to an embodiment of the present disclosure, the display panel further includes:
the blocking dam and the retaining wall are positioned on the same side of the substrate base plate and in the non-display area, the blocking dam surrounds the retaining wall, the thickness of the blocking dam is smaller than that of the retaining wall, and the radial width of the blocking dam is smaller than that of the retaining wall;
and the packaging layer covers the light-emitting layer, the lyophobic layer and the blocking dam, and comprises an organic film layer which is positioned in the range surrounded by the blocking dam.
According to a second aspect of the present disclosure, there is provided a display device comprising the display panel as described in the first aspect above.
In the embodiment of the present disclosure, at least one of the inner circumferential surface and the outer circumferential surface of the retaining wall has a groove, so that the separation from the retaining wall can be prevented after the lyophobic layer extends into the groove. When the light-emitting functional layer of the light-emitting layer is formed later, due to the lyophobic property of the lyophobic layer, the organic materials for forming the light-emitting functional layer can be prevented from being remained on the surface of the lyophobic layer, so that the formed light-emitting functional layer is limited in the range surrounded by the retaining wall, the problem that the light-emitting functional layer is exposed is avoided, the condition that water and oxygen are immersed into the light-emitting functional layer is effectively blocked, and the service life of the display panel is prolonged.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the disclosure.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the present disclosure and together with the description, serve to explain the principles of the disclosure. It is to be understood that the drawings in the following description are merely exemplary of the disclosure, and that other drawings may be derived from those drawings by one of ordinary skill in the art without the exercise of inventive faculty.
Fig. 1 is a top view structural diagram of a display panel according to an embodiment of the disclosure.
Fig. 2 is a sectional view along a-a in fig. 1.
Fig. 3 is a schematic partial cross-sectional view of a display panel according to an embodiment of the disclosure.
Fig. 4 is a partial cross-sectional schematic view of another display panel provided in the embodiment of the present disclosure.
Fig. 5 is a partial cross-sectional view of another display panel provided in the embodiment of the disclosure.
Fig. 6 is a schematic partial cross-sectional view of another display panel provided in the embodiment of the present disclosure.
Fig. 7 is another sectional view in the direction of a-a in fig. 1.
Fig. 8 is a schematic partial cross-sectional view of another display panel according to an embodiment of the disclosure.
Fig. 9 is a view showing still another sectional structure taken along the direction a-a in fig. 1.
Fig. 10 is a schematic flowchart of a method for manufacturing a display panel according to an embodiment of the disclosure.
Fig. 11 is a schematic flow chart of forming a driving layer and an enclosure according to an embodiment of the present disclosure.
Fig. 12 is a schematic flow chart illustrating a process of etching the dam to obtain the retaining wall according to an embodiment of the disclosure.
Fig. 13 is a schematic flow chart illustrating another process for forming the driving layer and the barrier according to the embodiment of the disclosure.
Fig. 14 is a schematic flow chart illustrating another method for etching the dam to obtain the retaining wall according to an embodiment of the present disclosure.
Fig. 15 is a schematic flow chart illustrating a manufacturing method of another display panel according to an embodiment of the present disclosure.
Reference numerals:
100. a display panel; 101. a display area; 102. a non-display area;
1. a substrate base plate; 2. a drive layer; 3. retaining walls; 4. draining the liquid layer; 5. a light emitting layer; 6. a blocking dam; 7. a packaging layer;
20. a light-shielding layer; 21. a buffer layer; 22. an active layer; 23. a gate insulating layer; 24. a gate layer; 25. a first passivation layer; 26. a source drain layer; 27. a second passivation layer; 28. a metal structure layer; 29. a third passivation layer; 210. a conductive structure layer;
241. a first metal structure;
31. a groove; 32. a first insulating layer; 33. a first support layer; 34. a first shielding layer; 35. a second shielding layer; 36. a second support layer; 37. a third shielding layer;
51. a first electrode layer; 52. a pixel defining layer; 53. a light-emitting functional layer; 54. a second electrode layer;
531. a first sub light emitting functional layer; 532. a second sub light emitting functional layer;
71. an organic film layer; 72. an inorganic film layer.
Detailed Description
Example embodiments will now be described more fully with reference to the accompanying drawings. Example embodiments may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of example embodiments to those skilled in the art. The same reference numerals in the drawings denote the same or similar structures, and thus their detailed description will be omitted. Furthermore, the drawings are merely schematic illustrations of the present disclosure and are not necessarily drawn to scale.
Although relative terms, such as "upper" and "lower," may be used in this specification to describe one element of an icon relative to another, these terms are used in this specification for convenience only, e.g., in accordance with the orientation of the examples described in the figures. It will be appreciated that if the device of the icon were turned upside down, the element described as "upper" would become the element "lower". When a structure is "on" another structure, it may mean that the structure is integrally formed with the other structure, or that the structure is "directly" disposed on the other structure, or that the structure is "indirectly" disposed on the other structure via another structure.
The terms "a," "an," "the," "said," and "at least one" are used to indicate the presence of one or more elements/components/parts/etc.; the terms "comprising" and "having" are intended to be inclusive and mean that there may be additional elements/components/etc. other than the listed elements/components/etc.; the terms "first," "second," and "third," etc. are used merely as labels, and are not limiting on the number of their objects.
In the related art, as for the problem that the service life of the special-shaped display panel 100 obtained after cutting is short, after intensive research, the inventors find that the light-emitting functional layer 53 in the light-emitting layer 5 included in the cut display panel 100 is easily exposed, and the material of the light-emitting functional layer 53 is an organic material, at this time, water and oxygen in the external environment are easily immersed along the exposed part of the light-emitting functional layer 53, so as to corrode the light-emitting functional layer 53, thereby reducing the service life of the special-shaped display panel 100.
To this end, the disclosed embodiment provides a display panel 100, as shown in fig. 1, 2 and 3, the display panel 100 including: substrate 1, drive layer 2, barricade 3, lyophobic layer 4, luminescent layer 5.
The substrate base plate 1 has a display area 101 and a non-display area 102 surrounding the display area 101; the driving layer 2 is positioned on one side of the substrate base plate 1 and positioned in the display area 101; the retaining wall 3 and the driving layer 2 are positioned on the same side of the substrate base plate 1 and are positioned in the non-display area 102, and at least one of the inner circumferential surface and the outer circumferential surface of the retaining wall 3 is provided with a groove 31; the lyophobic layer 4 covers the surface of the retaining wall 3, which is far away from the substrate base plate 1, and extends into the groove 31; the light emitting layer 5 is located on one side of the driving layer 2, which is away from the substrate 1, and includes a first electrode layer 51, a pixel defining layer 52, a light emitting functional layer 53 and a second electrode layer 54, which are sequentially away from the driving layer 2, and the light emitting functional layer 53 is located in a range surrounded by the retaining wall 3.
In the present embodiment, at least one of the inner circumferential surface and the outer circumferential surface of the retaining wall 3 has the groove 31, so that the separation from the retaining wall 3 can be prevented after the lyophobic layer 4 extends into the groove 31. When the light emitting functional layer 53 of the light emitting layer 5 is formed later, due to the lyophobic property of the lyophobic layer 4, the organic material for forming the light emitting functional layer 53 can be prevented from remaining on the surface of the lyophobic layer 4, so that the formed light emitting functional layer 53 is limited in the range surrounded by the retaining wall 3, the problem that the light emitting functional layer 53 is exposed is avoided, the condition that water and oxygen are immersed into the light emitting functional layer 53 is effectively blocked, and the service life of the display panel 100 is prolonged.
The position in the display area 101 means that the orthographic projection of the device is positioned in the display area 101, and the position in the non-display area 102 means that the orthographic projection of the device is positioned in the non-display area 102.
In the embodiment of the present disclosure, the display panel 100 includes a plurality of loops of the dam 3. In this way, the effective blocking of the water and oxygen immersion path of the light-emitting functional layer 53 included in the light-emitting layer 5 can be ensured by the multiple circles of the retaining walls 3, so as to further improve the service life of the display panel 100. Illustratively, the display panel 100 includes 10 circles of uniformly distributed retaining walls 3 in the non-display region 102.
Wherein, the radial spacing width between two adjacent retaining walls 3 can be determined according to the radial width of the non-display area (102) on the substrate base plate 1. Illustratively, the radial spacing width between two adjacent retaining walls 3 is greater than or equal to 10 micrometers and less than or equal to 60 micrometers. Of course, the radial spacing width between multiple retaining walls 3 can be further determined by combining the structural size of the retaining wall 3 itself. Illustratively, the radial spacing width of the multiple retaining walls 3 is greater than the radial width of the first shielding layer 34 and less than the radial width of the second shielding layer 35. The retaining wall 3 includes a first and a second shielding layer 34, 35, which can be referred to the following explanation of the retaining wall 3.
In the embodiment of the present disclosure, the display panel 100 may be a rectangular display panel 100 or a non-rectangular display panel 100 such as a circular display panel 100 or an elliptical display panel 100, for example, as the non-rectangular display panel 100.
Taking a circular display panel 100 as an example, as shown in fig. 1, it has a circular display area 101 and a circular non-display area 102. The shape of the substrate base plate 1 is circular, the display area 101 on one side of the substrate base plate 1 sequentially forms the driving layer 2 and the light-emitting layer 5 along the direction departing from the substrate base plate 1, and the non-display area 102 on the same side of the substrate base plate 1 sequentially forms the retaining wall 3 and the lyophobic layer 4 along the direction departing from the substrate base plate 1.
Next, each structural layer included in the display panel 100 will be explained.
In the embodiment of the present disclosure, the substrate 1 may be a hard transparent material such as glass, and the corresponding display panel 100 is a flat panel display panel 100, but a flexible transparent material may also be adopted, and the corresponding display panel 100 may be a curved panel display panel 100. For example, the flexible transparent material is PET polyethylene terephthalate or the like.
In the embodiment of the present disclosure, the driving layer 2 is used for driving the light emitting layer 5 to emit light, and the driving layer 2 includes a plurality of switching devices distributed in an array, and the switching devices may be thin film transistors.
Taking the switching device as an example of a top-gate thin film transistor, in some embodiments, as shown in fig. 3 or fig. 4, the driving layer 2 includes a light-shielding layer 20, a buffer layer 21, an active layer 22, a gate insulating layer 23, a gate layer 24, a first passivation layer 25, a source-drain layer 26, and a second passivation layer 27, which are located in the display region 101 on one side of the substrate 1 and sequentially face away from the substrate 1.
The materials, forming methods, connection relationships, and the like used for the structural layers may refer to related technologies, which are not limited in the embodiments of the present application. For example, as shown in fig. 3 or fig. 4, the active layer 22 and the source drain layer 26 are electrically connected through a via hole penetrating through the first passivation layer 25, as shown in fig. 3, the gate insulating layer 23 is formed by a patterning method in a region corresponding to the active layer 22 and on a side of the active layer 22 away from the substrate base plate 1; alternatively, as shown in fig. 4, the gate insulating layer 23 is not patterned, and the entire layer is formed on the side of the active layer 22 away from the substrate 1.
In other embodiments, as shown in fig. 5, the driving layer 2 includes a light-shielding layer 20, a buffer layer 21, an active layer 22, a gate insulating layer 23, a gate layer 24, a first passivation layer 25, a metal structure layer 28, a third passivation layer 29, a source-drain layer 26, and a second passivation layer 27, which are located in the display region 101 on one side of the substrate 1 and sequentially face away from the substrate 1.
The gate layer 24 includes a first metal structure 241 besides the gate, and the first metal structure 241 and the metal structure layer 28 form a capacitor device of the display region 101. The materials, formation methods, connection relationships, and the like used for the other layers can be described with reference to the related art and the above embodiments.
In still other embodiments, as shown in fig. 6, the driving layer 2 further includes a conductive structure layer 210 located between the substrate 1 and the buffer layer 21, in addition to the light shielding layer 20, the buffer layer 21, the active layer 22, the gate insulating layer 23, the gate layer 24, the first passivation layer 25, the source and drain layers 26, and the second passivation layer 27, and the source and drain layers 26 are electrically connected to the conductive structure layer 210 through vias on the first passivation layer 25 and the buffer layer 21. Thus, a dielectric capacitor can be formed to reduce the working resistance. The light-shielding layer 20 and the conductive structure 210 may be disposed in the same layer.
In the embodiment of the present disclosure, as shown in any one of fig. 3 to 6, the light emitting layer 5 includes a first electrode layer 51, a pixel defining layer 52, a light emitting functional layer 53 and a second electrode layer 54, and the first electrode layer 51 is electrically connected to the source drain layer 26 of the driving layer 2 through a via hole.
The light-emitting functional layer 53 has a multilayer structure and comprises a hole transport layer, a composite layer and an electron transport layer; or a hole transport layer, a hole injection layer, a composite layer, an electron injection layer, and an electron transport layer. Each structural layer included in the light-emitting functional layer 53 may be formed by inkjet printing, but it is needless to say that some structural layers in the multilayer structure may be formed by inkjet printing, and the remaining structural layers may be formed by vapor deposition.
Because the light-emitting functional layer 53 is tiled on the display area 101, in order to realize normal display of the display image, the display panel 100 further includes a color film layer, the color film layer may be located on one side of the light-emitting layer 5 close to the substrate base plate 1, and at this time, the light-emitting direction of the light-emitting layer 5 faces the substrate base plate 1, that is, bottom emission is performed; of course, the color film layer may also be located on a side of the light emitting layer 5 departing from the substrate base plate 1, and at this time, the light emitting direction of the light emitting layer 5 is back to the substrate base plate 1, that is, top emission is performed. For the bottom emission case, the color film layer is located between the driving layer 2 and the light emitting layer 5, and for the top emission case, the description is made in conjunction with the encapsulation layer 7 described below. The structure and the forming manner of the color film layer can refer to the related art, which is not limited in the embodiments of the present disclosure.
In the embodiment of the present disclosure, the material used for the lyophobic layer 4 may have lyophobic properties. Illustratively, the material of the lyophobic layer 4 includes a lyophobic photoresist.
The lyophobic layer 4 and the pixel defining layer 52 may be disposed on the same layer. For example, the lyophobic layer 4 and the pixel defining layer 52 are made of the same material and are made of lyophobic photoresist, and the pixel defining layer 52 and the lyophobic layer 4 are disposed on the same layer, so that the manufacturing method of the display panel 100 can be simplified. Of course, the lyophobic layer 4 may be formed on the retaining wall 3 alone.
The same-layer arrangement in the embodiments of the present disclosure refers to simultaneously forming two structures located in different regions by a single patterning process. Illustratively, the pixel defining layer 52 and the lyophobic layer 4 are disposed on the same layer, which means that the pixel defining layer 52 is formed in the display area 101 by a single patterning process while the lyophobic layer 4 is formed in the non-display area 102.
Optionally, the surface of the lyophobic layer 4 away from the retaining wall 3 is a convex curved surface, so that the organic material forming the light-emitting functional layer 53 can quickly slide off the lyophobic layer 4, the forming efficiency of the light-emitting functional layer 53 is improved, meanwhile, the accumulation of the organic material forming the light-emitting functional layer 53 on the lyophobic layer 4 is avoided, and the blocking effect on the light-emitting functional layer 53 is improved. Illustratively, the cross-section of the lyophobic layer 4 is a semicircular structure.
In the embodiment of the present disclosure, as shown in any one of fig. 3 to 6 and fig. 7, the display panel 100 further includes a blocking dam 6 located on the same side of the substrate 1 as the retaining wall 3 and located in the non-display region 102, wherein the blocking dam 6 surrounds the retaining wall 3; and the packaging layer 7 covers the light-emitting layer 5, the lyophobic layer 4 and the blocking dam 6, the packaging layer 7 comprises an organic film layer 71, and the organic film layer 71 is positioned in the range surrounded by the blocking dam 6.
Wherein, the thickness of the blocking dam 6 is smaller than that of the retaining wall 3, and the radial width of the blocking dam 6 is smaller than that of the retaining wall 3.
In this way, the organic film layer 71 included in the encapsulation layer 7 is blocked by the blocking dam 6, so that the organic film layer 71 is limited in the range surrounded by the blocking dam 6, the problem of exposure of the organic film layer 71 is avoided, the condition that water and oxygen are immersed into the organic film layer 71 is effectively blocked, and the service life of the display panel 100 is further prolonged.
Wherein, the periphery of the retaining wall 3 can be provided with a plurality of circles of blocking dams 6, and the heights of the plurality of circles of blocking dams 6 are not all the same. The specific structure and formation of the blocking dam 6 can refer to the related art, and the embodiment of the present disclosure is not limited thereto.
The encapsulation layer 7 includes an organic film layer 71 and inorganic film layers 72 located on two sides of the organic film layer 71, and the specific structure can refer to related technologies, which is not limited in the embodiments of the present disclosure. In combination with the above-described color film layer, the color film layer is located on a side of the encapsulation layer 7 away from the light-emitting layer 5.
Further, in the embodiment of the present disclosure, the display panel 100 further includes a touch layer located on a side of the encapsulation layer 7 away from the substrate base plate 1, and a glass cover plate located on a side of the touch layer away from the substrate base plate 1. Thus, the touch operation of the display panel 100 can be realized through the touch layer, and the display panel 100 is protected through the glass cover plate.
The structure of the touch layer and the forming method of the touch layer and the glass cover plate refer to the related art, which is not limited in the embodiments of the present disclosure.
The structure of the retaining wall 3 will be explained in detail below.
In some embodiments, the light emitting function layer 53 includes various structural layers formed by inkjet printing, and in this case, as shown in fig. 2 and 7, the retaining wall 3 surrounds the driving layer 2, and includes a first insulating layer 32, a first supporting layer 33, and a first shielding layer 34 which are sequentially away from the base substrate 1;
the first shielding layer 34 extends out of the first supporting layer 33 along the radial direction, and the lyophobic layer 4 wraps the first shielding layer 34 and the first supporting layer 33. In this way, after the lyophobic layer 4 wraps the first shielding layer 34 and the first supporting layer 33, the blocking of the organic material of the inkjet printing can be formed based on the lyophobic property of the lyophobic layer 4, that is, the blocking of each structural layer of the light emitting functional layer 53 is performed, so that each structural layer of the light emitting functional layer 53 is limited in the range surrounded by the retaining wall 3, and the condition that any structural layer is exposed is avoided.
In order to further ensure the blocking effect of the lyophobic layer 4 on the light-emitting functional layer 53, the lyophobic layer 4 wraps the first shielding layer 34 and the first supporting layer 33, and meanwhile, the lyophobic layer 4 completely covers the surface of the first insulating layer 32 away from the substrate base plate 1, so that the light-emitting functional layer 53 is prevented from partially covering the surface of the first insulating layer 32. Since the retaining walls 3 surround the display region 101, the radial directions referred to in the embodiments of the present disclosure all refer to directions perpendicular to the normal of the display panel 100.
Optionally, the first shielding layer 34 extends out of the first supporting layer 33 in a direction radially away from the central point and a direction close to the central point, that is, both the inner circumferential surface and the outer circumferential surface of the first supporting layer 33 are curved surfaces contracting towards the middle of the first supporting layer 33 in the radial direction, so that the lyophobic layer 4 wraps the first shielding layer 34 on both sides of the first supporting layer 33. The center point refers to a center point of the display panel 100.
For example, as shown in fig. 2 or 7, the structure surrounded by the inner circumferential surface and the structure surrounded by the outer circumferential surface of the first support layer 33 are both spherical structures. Of course, the configuration surrounded by the inner peripheral surface and the configuration surrounded by the outer peripheral surface of the first support layer 33 may have other shapes, and the embodiment of the present disclosure is not limited thereto.
In conjunction with the above description, the first shielding layer 34 includes a supporting portion connected to the first supporting layer 33 and a suspended portion other than the supporting portion. In order to form the structure of the grooves 31 in the inner and outer circumferential surfaces of the retaining wall 3, the etching rates of the first shielding layer 34 and the first supporting layer 33 can be adjusted, and illustratively, the first supporting layer 33 and the first shielding layer 34 are respectively formed by using two materials with different etching rates.
Wherein the etching rate of the first barrier layer 34 is less than that of the first support layer 33. Illustratively, the difference between the etch rate of the first barrier layer 34 and the etch rate of the first support layer 33 is greater than or equal to 2 μm/min. The etching rate of the first barrier layer 34 and the etching rate of the first support layer 33 are both referred to as etching rates under the same etching conditions.
For the first barrier layer 34 and the first support layer 33 having different etching rates, the material of the first barrier layer 34 includes titanium, indium tin oxide, silicon nitride, silicon oxide, or the like, and the material of the first support layer 33 includes aluminum, neodymium, or the like.
In some embodiments, the length of the first shielding layer 34 extending beyond the first supporting layer 33 in the radial direction is greater than or equal to 200 nm, so that the depth of the grooves 31 on the inner and outer circumferential surfaces of the retaining wall 3 can be ensured, thereby ensuring the stability of the connection between the lyophobic layer 4 and the first shielding layer 34.
The length of the first shielding layer 34 extending out of the first supporting layer 33 in the radial direction is the radial width of the suspended portion of the first shielding layer 34 close to the display area or away from the display area.
In some embodiments, the radial width of first masking layer 34 is greater than or equal to 5 microns and less than or equal to 10 microns. In this way, by limiting the minimum radial width of the first shielding layer 34, the minimum radial width of the lyophobic layer 4 can be ensured, so as to increase the effective width of the lyophobic layer 4 blocking the light-emitting functional layer 53 in the radial direction, thereby increasing the blocking effect on the light-emitting functional layer 53; meanwhile, by limiting the maximum radial width of the first shielding layer 34, the situation that the non-display area 102 of the display panel 100 is large due to the large radial width of the lyophobic layer 4 after the lyophobic layer 4 is formed can be avoided, so that the display ratio of the display panel 100 is improved.
In the embodiments of the present disclosure, the radial width refers to a distance between the inner circumferential surface and the outer circumferential surface.
In some embodiments, the thickness of the first insulating layer 32 is greater than or equal to a preset value, so that by ensuring the thickness of the first insulating layer 32, the part of the light emitting function layer 53 that is formed is prevented from covering the surface of the lyophobic layer 4.
The preset value may be set according to the thickness of the light-emitting functional layer 53 after formation, which is not limited in the embodiment of the present disclosure.
In some embodiments, the sum of the thicknesses of the first shielding layer 34 and the first support layer 33 is greater than or equal to 750 nm and less than or equal to 950 nm. Thus, the overall height of the dam 3 can be ensured, and the organic material forming the light emitting function layer 53 is prevented from crossing the dam 3 in the process of forming the light emitting function layer 53.
In some embodiments, when forming the first insulating layer 32 included in the retaining wall 3, in combination with the structure of the driving layer 2, since the buffer layer 21 of the driving layer 2 has insulating properties, the first insulating layer 32 of the retaining wall 3 may be disposed on the same layer as the buffer layer 21. When the first support layer 33 and the first barrier layer 34 of the bank 3 are formed, the first support layer 33 is disposed on the same layer as the source/drain layer 26, and the first barrier layer 34 is disposed on the same layer as the second passivation layer 27. The source/drain layer 26 is a single-layer conductive structure layer.
Of course, in other embodiments, the source/drain layer 26 is a multi-layer conductive structure layer, and the first blocking layer 34 and the first supporting layer 33 included in the retaining wall 3 may be disposed in combination with the multi-layer conductive structure layer of the source/drain layer 26 at the same layer. The specific layer arrangement mode can refer to the related art, and the embodiment of the disclosure does not limit the specific layer arrangement mode.
Note that, in addition to the respective structural layers of the retaining wall 3 formed at the same time when the driving layer 2 is formed, the respective structural layers of the retaining wall 3 may be formed separately. When the structural layers of the retaining wall 3 are formed separately, the first insulating layer 32, the first supporting layer 33 and the first shielding layer 34 can be formed in sequence by a patterning method, and then the retaining wall 3 with the groove 31 is formed by wet etching based on the difference of the etching rates of the first supporting layer 33 and the first shielding layer 34.
In another embodiment, since each structural layer of the light-emitting functional layer 53 needs to be baked after being formed by ink-jet to be dried, the maximum baking temperature is higher as the number of structural layers increases. In order to avoid the damage of other layers due to the excessively high baking temperature, the light-emitting functional layer 53 is generally formed by a combination of ink-jet printing and vapor deposition. That is, at least one structural layer adjacent to the first electrode layer 51 among the multi-layer structure included in the light emitting functional layer 53 is formed by inkjet printing, and the remaining structural layers are formed by evaporation.
It is assumed that a part of the structure layers formed by inkjet printing is collectively referred to as a first sub light emission function layer 531, and the remaining structure layers formed by vapor deposition are collectively referred to as a second sub light emission function layer 532. As shown in fig. 8, the light emission function layer 53 includes a first sub light emission function layer 531 and a second sub light emission function layer 532, the first sub light emission function layer 531 covers the surface of the pixel defining layer 52 and the first electrode layer 51, and the second sub light emission function layer 532 is located between the first sub light emission function layer 531 and the second electrode layer 54. Illustratively, the first sub light emitting function layer 531 includes a hole transport layer, a hole injection layer, and a composite layer formed by means of inkjet printing, and the second sub light emitting function layer 532 includes an electron injection layer and an electron transport layer formed by means of evaporation.
When the first sub light-emitting functional layer 531 is formed, due to the lyophobic property of the lyophobic layer 4, the first sub light-emitting functional layer 531 can be blocked at the inner side and the outer side of the lyophobic layer, so that the first sub light-emitting functional layer 531 is prevented from forming a continuous structure, and the exposed part of the retaining wall 3 is prevented. When the second sub-luminescence function layer 532 is continuously formed on the upper layer of the first sub-luminescence function layer 531, since the first sub-luminescence function layer 531 may be raised to form the base height of the second sub-luminescence function layer 532, in this case, in order to avoid the second sub-luminescence function layer 532 forming a continuous structure on the inner side of the retaining wall 3 and near the retaining wall 3, as shown in fig. 9, the retaining wall 3 further includes: and the second shielding layer 35, the second supporting layer 36 and the third shielding layer 37 are positioned between the first insulating layer 32 and the first supporting layer 33 and sequentially face away from the first insulating layer 32, the third shielding layer 37 radially extends out of the second supporting layer 36, and the radial width of the first shielding layer 34 is smaller than that of the third shielding layer 37.
In this way, based on the retaining wall 3 described above, as shown in fig. 9, after the organic material forming the first sub light-emitting functional layer 531 is blocked by the lyophobic layer 4, and the first sub light-emitting functional layer 531 is limited within the range surrounded by the retaining wall 3, the height of the lyophobic layer 4 can be raised by the second shielding layer 35, the second support layer 36 and the third shielding layer 37, so that when the second sub light-emitting functional layer 532 is formed, as shown in fig. 9, the organic material forming the second sub light-emitting functional layer 532 is blocked by the structure formed by the second shielding layer 35, the second support layer 36 and the third shielding layer 37, and the second sub light-emitting functional layer 532 is limited within the range surrounded by the retaining wall 3, thereby preventing the first sub light-emitting functional layer 531 and the second sub light-emitting functional layer 532 from being immersed by water and oxygen.
In order to further ensure the blocking effect of the lyophobic layer 4 on the first sub-light-emitting functional layer 531, the lyophobic layer 4 wraps the first shielding layer 34 and the first supporting layer 33, and as shown in fig. 9, the lyophobic layer 4 completely covers the upper surface of the third shielding layer 37, so as to prevent the first sub-light-emitting functional layer 531 from being formed on the surface of the third shielding layer 37.
In order to ensure that the lyophobic layer 4 is deposited on the third shielding layer 37 when the lyophobic layer 4 covering the first shielding layer 34 and the first support layer 33 is formed, as shown in fig. 9, the radial width of the first shielding layer 34 is smaller than the radial width of the third shielding layer 37. In addition, as shown in fig. 9, the thickness of the first support layer 33 is greater than or equal to the thickness of the second support layer 36, so that the gradient of the lyophobic layer 4 can be increased while the first shielding layer 34 and the first support layer 33 are wrapped by the lyophobic layer 4, thereby facilitating the rolling of the organic material sprayed on the lyophobic layer 4 when the first sub-luminescence function layer 531 is formed; in addition, the height of the lyophobic layer 4 can be raised, and effective blocking of sprayed organic materials is achieved.
In some embodiments, as shown in fig. 9, the third shielding layer 37 extends out of the second support layer 36 in a radial direction, so that the second support layer 36 forms a groove between the second shielding layer 35 and the third shielding layer 37, which is recessed in the radial direction and near the middle of the second support layer 36, and thus, by forming the groove, the material climbing to the side of the third shielding layer 37 away from the second support layer 36 when the second sub-luminescence function layer 532 is formed can be reduced. In addition, when the first sub-light emitting function layer 531 is formed, the formed grooves can prevent ink drops falling from the surface of the lyophobic layer 4 from reversely climbing to the side of the third shielding layer 37 departing from the second support layer 36.
Since the second support layer 36 needs to form a groove between the second and third shielding layers 35 and 37, which is recessed in the radial direction and near the middle of the second support layer 36, this can be achieved by controlling the etching rates of the second and third shielding layers 36 and 37 during the manufacturing process.
Wherein the etch rate of the third barrier layer 37 is less than the etch rate of the second support layer 36. Illustratively, the difference between the etch rate of the third masking layer 37 and the etch rate of the second support layer 36 is greater than or equal to 2 microns/minute. The materials of the second and third shielding layers 35 and 37 are the same as those of the first shielding layer 34, and the material of the second support layer 36 is the same as that of the first support layer 33.
Optionally, the first masking layer 34 extends radially beyond the first support layer 33 by a length less than the third masking layer 37 extends radially beyond the second support layer 36. That is, the degree of concavity of the inner and outer peripheral surfaces of the second support layer 36 is greater than that of the first support layer 33. Thus, the recessed structure formed by the inner circumferential surface and the outer circumferential surface of the second supporting layer 36 can more effectively prevent the first sub-luminous functional layer 531 and the second sub-luminous functional layer 532 from climbing to the upper surface of the third shielding layer 37, so as to achieve a better blocking effect.
In some embodiments, in forming the second shielding layer 35, the second supporting layer 36 and the third shielding layer 37 of the retaining wall 3, in combination with the structure of the driving layer 2, in order to simplify the formation process of the display panel 100, the gate layer 24 includes a plurality of conductive structure layers, and in this case, the second shielding layer 35, the third shielding layer 37 and the second supporting layer 36 included in the retaining wall 3 may be disposed in the same layer in combination with the plurality of structure layers of the gate layer 24. The specific layer arrangement mode can refer to the related art, and the embodiment of the disclosure does not limit the specific layer arrangement mode.
In some embodiments, in order to ensure that the second shielding layer 35, the third shielding layer 37 and the second support layer 36 form a blocking structure when the second sub-emission function layer 532 is formed, the sum of the thicknesses of the second shielding layer 35, the third shielding layer 37 and the second support layer 36 is greater than or equal to 750 nm and less than or equal to 950 nm. In this way, the situation that the second sub-light emitting function layer 532 forms a connection structure at the inner side of the retaining wall 3 and near the retaining wall 3 when the formed first sub-light emitting function layer 531 is too thick can be avoided.
The embodiment of the present disclosure provides a method for manufacturing a display panel, by which the display panel of the above embodiment can be manufactured. As shown in fig. 10, the method includes the following steps S1001 to S1005.
S1001, providing a substrate base plate, wherein the substrate base plate is provided with a display area and a non-display area surrounding the display area.
S1002, forming a driving layer in a display area on one side of the substrate base plate, and forming a surrounding barrier around the driving layer in a non-display area on the same side of the substrate base plate.
S1003, etching the enclosure to obtain the retaining wall with the groove in at least one of the inner circumferential surface and the outer circumferential surface.
And S1004, forming a lyophobic layer which covers the retaining wall and extends into the groove on the retaining wall.
And S1005, forming a light emitting layer in the range surrounded by the retaining wall on the side of the driving layer departing from the substrate under the blocking of the lyophobic layer.
The beneficial effects of the manufacturing method according to the embodiment of the present disclosure can refer to the beneficial effects described in the above embodiment of the present disclosure, and the embodiment of the present disclosure will not be described again. The steps included in the manufacturing method will be described in detail below.
In step S1001, the material of the substrate may be as described in the above-described embodiments. The shape of the substrate base plate is rectangular, but of course, the shape of the substrate base plate may also be non-rectangular, such as circular or oval. The shape of the display area on the substrate may be predetermined according to the outer contour shape of the display panel to be manufactured, for example, if the outer contour of the display panel to be manufactured is circular, the shape of the display area on the substrate is circular.
When the driving layer and the enclosure are formed in step S1002, the configuration may be determined by combining the structural layers included in the driving layer.
In some embodiments, the driving layer includes a buffer layer, an active layer, a gate insulating layer, a gate layer, a first passivation layer, a source drain layer, and a second passivation layer, the source drain layer includes at least a first conductive layer and a second conductive layer, and the barrier includes an un-etched initial insulating layer, a first initial support layer, and a first initial barrier layer. Thus, as shown in FIG. 11, the specific implementation of the above step S1002 includes the following steps S10021A-S10025A.
S10021A, simultaneously forming a buffer layer in a display region and an initial insulating layer in a non-display region on one side of a substrate.
S10022A, sequentially forming an active layer, a gate insulating layer, a gate layer and a first passivation layer on one side of the buffer layer, which is far away from the substrate.
S10023A, forming a first conductive layer on a side of the first passivation layer facing away from the gate layer, and simultaneously forming a first initial supporting layer on a side of the initial insulating layer facing away from the substrate base plate.
S10024A, forming a second conductive layer on a side of the first conductive layer away from the first passivation layer, and forming a first initial shielding layer on a side of the first initial supporting layer away from the initial insulating layer.
And S10025A, forming a second passivation layer on one side of the second conductive layer, which is far away from the first conductive layer.
In the above steps S10021A to S10025A, reference may be made to related technologies for forming the structural layers of the driving layer and the method for forming the structural layers of the retaining wall, and details of the embodiments of the present disclosure are not repeated herein.
Accordingly, when the light emitting layer is formed on one side of the driving layer, the light emitting functional layer includes various structural layers formed by ink jet printing.
It should be noted that, when the first initial supporting layer and the first initial shielding layer of the fence are formed, in order to ensure that the first shielding layer of the subsequently formed retaining wall can extend out of the first supporting layer, the etching rate of the first initial shielding layer is less than that of the first initial supporting layer. Illustratively, the difference between the etch rate of the first initial masking layer and the etch rate of the first initial support layer is greater than or equal to 2 microns/minute.
In conjunction with the above embodiment, the enclosure and the driving layer are formed simultaneously, so as to realize the partition between the enclosure and the driving structure and to process the enclosure into a retaining wall, as shown in fig. 12, the specific implementation process of the above step S1003 includes the following steps S10031A-S10032A.
S10031A, dry etching the initial insulating layer, the first initial shielding layer and the first initial supporting layer to obtain the first insulating layer, the first shielding layer and the first supporting layer with rectangular cross sections.
S10032A, wet-etching the first shielding layer and the first supporting layer with rectangular cross sections to obtain the retaining wall with the first shielding layer extending out of the first supporting layer in the radial direction.
The method for dry-etching the structural layers of the enclosure in step S10031A and the method for wet-etching the structural layers with rectangular cross sections in step S10032A refer to related technologies, as long as the first shielding layer can be ensured to extend out of the first supporting layer in the radial direction, which is not limited in the embodiments of the present disclosure.
In other embodiments, the driving layer includes a buffer layer, an active layer, a gate insulating layer, a gate layer, a first passivation layer, a source drain layer, and a second passivation layer, the gate layer includes a third conductive layer, a fourth conductive layer, and a fifth conductive layer, and the source drain layer includes at least a first conductive layer and a second conductive layer; the barrier comprises an unetched initial insulating layer, a second initial shielding layer, a second initial supporting layer, a third initial supporting layer, a first initial shielding layer, a first initial supporting layer and a first initial shielding layer. Thus, as shown in FIG. 13, the specific implementation of the above step S1002 includes the following steps S10021B-S10029B.
S10021B, simultaneously forming a buffer layer in a display region and an initial insulating layer in a non-display region on one side of a substrate.
And S10022B, sequentially forming an active layer and a gate insulating layer on the side of the buffer layer, which is far away from the substrate.
S10023B, forming a third conductive layer on a side of the gate insulating layer facing away from the active layer, and forming a second initial shielding layer on a side of the initial insulating layer facing away from the substrate.
S10024B, forming a fourth conductive layer on a side of the third conductive layer facing away from the gate insulating layer, and simultaneously forming a second preliminary support layer on a side of the second preliminary blocking layer facing away from the preliminary insulating layer.
S10025B, forming a fifth conductive layer on a side of the fourth conductive layer facing away from the third conductive layer, and simultaneously forming a third initial barrier layer on a side of the second initial support layer facing away from the second initial barrier layer.
S10026B, forming a first passivation layer on a side of the fifth conductive layer facing away from the fourth conductive layer.
S10027B, forming a first conductive layer on a side of the first passivation layer facing away from the fifth conductive layer, and simultaneously forming a first preliminary support layer on a side of the third preliminary barrier layer facing away from the second preliminary support layer.
S10028B, forming a second conductive layer on a side of the first conductive layer facing away from the first passivation layer, and simultaneously forming a first initial masking layer on a side of the first initial support layer facing away from the third initial masking layer.
S10029B, forming a second passivation layer on a side of the second conductive layer facing away from the first conductive layer.
In the above steps S10021B-S10029B, reference may be made to related technologies for forming each structural layer of the driving layer and for forming each structural layer of the retaining wall, and details of the embodiments of the present disclosure are not repeated herein.
Correspondingly, when a light emitting layer is formed on one side of the driving layer subsequently, the light emitting function layer comprises a first sub light emitting function layer and a second sub light emitting function layer, each structure layer of the first sub light emitting function layer is formed in an ink jet printing mode, and each structure layer of the second sub light emitting function layer is formed in a true evaporation mode.
It should be noted that, when the second initial supporting layer, the third initial shielding layer, the first initial supporting layer, and the first initial shielding layer of the fence are formed, in order to ensure that the third shielding layer of the subsequently formed retaining wall can extend out of the second supporting layer in the radial direction, and the first shielding layer can extend out of the first supporting layer, the etching rate of the third initial shielding layer is less than the etching rate of the second initial supporting layer, and the etching rate of the first initial shielding layer is less than the etching rate of the first initial supporting layer. Illustratively, the difference between the etch rate of the third initial masking layer and the etch rate of the second initial support layer, and the difference between the etch rate of the first initial masking layer and the etch rate of the first initial support layer, are each greater than or equal to 2 microns/minute.
In conjunction with the above embodiment, the enclosure and the driving layer are formed simultaneously, so as to realize the partition between the enclosure and the driving structure and to process the enclosure into a retaining wall, as shown in fig. 14, the specific implementation process of the above step S1003 includes the following steps S10031B-S10032B.
S10031B, dry etching the initial insulating layer, the second initial barrier layer, the second initial supporting layer, the third initial supporting layer, the first initial supporting layer and the first initial barrier layer to obtain the first insulating layer, the second barrier layer, the second supporting layer, the third supporting layer, the first supporting layer and the first barrier layer with rectangular cross sections.
S10032B, wet-etching the second shielding layer, the second supporting layer, the third supporting layer, the first supporting layer and the first shielding layer, wherein the cross sections of the second shielding layer, the second supporting layer, the third supporting layer, the first shielding layer and the first shielding layer are rectangular, so as to obtain a retaining wall, wherein the first shielding layer radially extends out of the first supporting layer, the third shielding layer radially extends out of the second supporting layer, and the radial width of the first shielding layer is smaller than that of the third shielding layer.
In the above step S10031, both the method for dry-etching the structural layers of the enclosure and the method for wet-etching the structural layers with rectangular cross sections in step S10032 refer to the related art, as long as it is ensured that the third shielding layer radially extends out of the second supporting layer, and the first shielding layer radially extends out of the first supporting layer, which is not limited in the embodiment of the present disclosure.
In some embodiments, the display panel further includes a blocking dam and an encapsulation layer, and since the blocking dam includes structural layers having the same performance as that of a portion of the structural layers included in the driving layer, the blocking dam may be formed at the same time as the driving layer. Thus, as shown in fig. 15, the step S1002 includes: a driving layer is formed in a display region of a first side of a substrate base plate, while a barrier surrounding the driving layer and a blocking dam surrounding the barrier are formed in a non-display region of the first side of the substrate base plate.
Accordingly, since the encapsulation layer is used to encapsulate the light emitting layer, the lyophobic layer, and the barrier dam, as shown in fig. 15, after step S1005 is performed, the method further includes: step S1006 is as follows.
And S1006, forming an encapsulation layer covering the luminous layer, the lyophobic layer and the blocking dam under the blocking of the blocking dam.
In the method for forming the blocking dam and the method for forming the encapsulation layer, reference may be made to the related art, which is not limited in the embodiments of the present disclosure. The encapsulation layer includes an organic film layer within a range surrounded by the barrier dam.
Note that, since the shape of the base substrate is rectangular in the conventional manufacturing method of the display panel, the display panel manufactured in step S1006 is a rectangular display panel. In order to further obtain the special-shaped display panel, as shown in fig. 14, after step S1006 is executed, the method further includes: step S1007 is as follows.
And S1007, cutting the packaged display panel along the outer edge of the blocking dam.
Since the display panel after being packaged is cut along the outer edge of the barrier dam, the shape of the display panel thus obtained depends mainly on the outer contour of the barrier dam. If the outer contour of the blocking dam is circular, the display panel obtained after cutting is a circular display panel, and if the outer contour of the blocking dam is oval, the display panel obtained after cutting is an oval display panel.
In the embodiments of the present disclosure, specific structures, sizes, and the like of each structural layer can refer to the embodiments disclosed above, and the embodiments of the present disclosure are not described in detail herein.
An embodiment of the present disclosure provides a display device including the display panel described in the first embodiment. For the specific structure of the components included in the display device, except for the display panel, reference may be made to related technologies, which are not described in detail in the embodiments of the present disclosure.
Because the exposure of the luminous functional layer included in the luminous layer can be better avoided in the manufacturing process of the display panel, the immersion of water and oxygen is effectively avoided, the service life of the display panel is prolonged, and the service life of the display device using the display panel is prolonged.
Other embodiments of the disclosure will be apparent to those skilled in the art from consideration of the specification and practice of the disclosure disclosed herein. This application is intended to cover any variations, uses, or adaptations of the disclosure following, in general, the principles of the disclosure and including such departures from the present disclosure as come within known or customary practice within the art to which the disclosure pertains. It is intended that the specification and examples be considered as exemplary only, with a true scope and spirit of the disclosure being indicated by the following claims.

Claims (13)

1. A display panel (100), comprising:
a substrate base plate (1) having a display area (101) and a non-display area (102) surrounding the display area (101);
the driving layer (2) is positioned on one side of the substrate base plate (1) and positioned in the display area (101);
the retaining wall (3) is positioned on the same side of the substrate base plate (1) as the driving layer (2) and positioned in the non-display area (102), and at least one of the inner circumferential surface and the outer circumferential surface of the retaining wall (3) is provided with a groove (31);
the lyophobic layer (4) covers the surface, away from the substrate base plate (1), of the retaining wall (3) and extends into the groove (31);
the light-emitting layer (5) is located on one side, deviating from the substrate base plate (1), of the driving layer (2), and comprises a first electrode layer (51), a pixel defining layer (52), a light-emitting functional layer (53) and a second electrode layer (54) deviating from the driving layer (2) in sequence, and the light-emitting functional layer (53) is located in a range surrounded by the retaining wall (3).
2. The display panel (100) according to claim 1, wherein the dam (3) surrounds the driving layer (2) and includes a first insulating layer (32), a first supporting layer (33) and a first shielding layer (34) in this order away from the substrate base plate (1);
the first shielding layer (34) extends out of the first supporting layer (33) along the radial direction, and the lyophobic layer (4) wraps the first shielding layer (34) and the first supporting layer (33) and covers the surface, away from the substrate base plate (1), of the first insulating layer (32).
3. The display panel (100) according to claim 2, wherein the inner circumferential surface and the outer circumferential surface of the first support layer (33) are each a curved surface that converges toward a middle portion of the first support layer (33) in a radial direction.
4. The display panel (100) according to claim 2, wherein the driving layer (2) comprises a light shielding layer (20), a buffer layer (21), an active layer (22), a gate insulating layer (23), a gate layer (24), a first passivation layer (25), a source drain layer (26) and a second passivation layer (27) which are sequentially away from the substrate (1);
the first insulating layer (32) and the buffer layer (21) are arranged on the same layer, the first supporting layer (33) and the source drain layer (26) are arranged on the same layer, and the first shielding layer (34) and the second passivation layer (27) are arranged on the same layer.
5. The display panel (100) according to claim 2, wherein the dam (3) further comprises: a second shielding layer (35), a second supporting layer (36) and a third shielding layer (37) which are positioned between the first insulating layer (32) and the first supporting layer (33) and sequentially face away from the first insulating layer (32);
the third shielding layer (37) extends out of the second supporting layer (36) in the radial direction, the radial width of the first shielding layer (34) is smaller than that of the third shielding layer (37), and the lyophobic layer (4) covers the surface, facing away from the substrate base plate (1), of the third shielding layer (37).
6. The display panel (100) of claim 5, wherein the first barrier layer (34) protrudes radially beyond the first support layer (33) by a length that is less than a length that the third barrier layer (37) protrudes radially beyond the second support layer (36).
7. The display panel (100) of claim 5, wherein the first barrier layer (34) has an etch rate less than an etch rate of the first support layer (33) and the third barrier layer (37) has an etch rate less than an etch rate of the second support layer (36).
8. The display panel (100) of claim 5, wherein the first support layer (33) has a thickness greater than or equal to a thickness of the second support layer (36).
9. The display panel (100) according to any one of claims 1 to 8, wherein a surface of the lyophobic layer (4) facing away from the retaining wall (3) is a convex curved surface.
10. The display panel (100) according to any of claims 1 to 8, wherein the lyophobic layer (4) is disposed in a same layer as the pixel defining layer (52).
11. The display panel (100) according to any of claims 1 to 8, wherein the display panel (100) comprises a plurality of turns of the dam (3).
12. The display panel (100) according to any one of claims 1 to 8, wherein the display panel (100) further comprises:
the blocking dam (6) and the retaining wall (3) are located on the same side of the substrate base plate (1) and located in the non-display area (102), the blocking dam (6) surrounds the retaining wall (3), the thickness of the blocking dam (6) is smaller than that of the retaining wall (3), and the radial width of the blocking dam (6) is smaller than that of the retaining wall (3);
an encapsulation layer (7) covering the light emitting layer (5), the lyophobic layer (4), and the blocking dam (6), the encapsulation layer (7) including an organic film layer (71), the organic film layer (71) being located within a range surrounded by the blocking dam (6).
13. A display device characterized in that it comprises a display panel as claimed in any one of claims 1 to 12.
CN202111409762.3A 2021-11-25 2021-11-25 Display panel, manufacturing method of display panel and display device Pending CN114093922A (en)

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