CN114089452A - Microlens element - Google Patents
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- CN114089452A CN114089452A CN202111369676.4A CN202111369676A CN114089452A CN 114089452 A CN114089452 A CN 114089452A CN 202111369676 A CN202111369676 A CN 202111369676A CN 114089452 A CN114089452 A CN 114089452A
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- 239000000758 substrate Substances 0.000 claims abstract description 62
- 238000002310 reflectometry Methods 0.000 claims description 26
- 239000000463 material Substances 0.000 claims description 18
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 10
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 10
- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 3
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 3
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 11
- 238000003384 imaging method Methods 0.000 abstract description 11
- 239000010410 layer Substances 0.000 description 326
- 238000002834 transmittance Methods 0.000 description 25
- 238000001228 spectrum Methods 0.000 description 22
- 238000000411 transmission spectrum Methods 0.000 description 15
- 238000000985 reflectance spectrum Methods 0.000 description 13
- 239000003292 glue Substances 0.000 description 7
- 210000000438 stratum basale Anatomy 0.000 description 5
- 238000001514 detection method Methods 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000012790 adhesive layer Substances 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000010408 sweeping Methods 0.000 description 1
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/02—Simple or compound lenses with non-spherical faces
- G02B3/06—Simple or compound lenses with non-spherical faces with cylindrical or toric faces
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
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- Physics & Mathematics (AREA)
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- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The invention provides a microlens element. The microlens element includes: a base layer; the microstructure layer is arranged on the substrate layer and comprises one or more columnar microlenses; the anti-reflection film is arranged on one side surface, far away from the substrate layer, of the microstructure layer and/or on one side surface, far away from the microstructure layer, of the substrate layer, the anti-reflection film comprises a first refractive index film layer and a second refractive index film layer which are stacked alternately, and the refractive index of the first refractive index film layer is larger than that of the second refractive index film layer. The invention solves the problem of poor imaging effect of the micro-lens element in the prior art.
Description
Technical Field
The invention relates to the field of micro-nano optics, in particular to a micro-lens element.
Background
With the development of the field of mobile phones, many types of mobile phones cancel the Home key, and replace the fingerprint identification function with Face ID unlocking, so that a brand-new milestone is established for the 3D detection technology. It is known that the market of 3D detection not only causes a great tide in the field of smart phones, but also can be extended to new fields such as notebook computers, floor sweeping robots, AR/VR, etc. in the future. In order to obtain high-quality practicability, an image system of the 3D detection technology generally adopts a single-wavelength light source in a near-infrared band, on one hand, visible light in a natural environment is distinguished, and on the other hand, the characteristic of strong diffraction capability of infrared light is utilized, so that a clear and useful image is obtained. However, the illuminance of the infrared light source is very low, usually lower than 0.1lux, and in addition, there is a small angle range of the incident light source, which requires the whole imaging system to develop a small-angle antireflection film with high transmittance and low reflectivity in the near infrared band.
At the imaging light source end of the 3D detection technique, the designer may consider configuring the corresponding microlens element. The micro lens element is composed of a lens with micron-scale size, is completed by photoetching and impressing processes, and mainly plays a role in shaping and collimating light beams. The light source passes through the micro lens element from the emitting end, and due to the change of the propagation medium and the distribution of the micro lens, the energy loss of the light source and the poor imaging effect are caused.
That is, the microlens element in the related art has a problem of poor imaging effect.
Disclosure of Invention
The invention mainly aims to provide a micro lens element to solve the problem of poor imaging effect of the micro lens element in the prior art.
In order to achieve the above object, the present invention provides a microlens element comprising: a base layer; the microstructure layer is arranged on the substrate layer and comprises one or more columnar microlenses; the anti-reflection film is arranged on one side surface, far away from the substrate layer, of the microstructure layer and/or on one side surface, far away from the microstructure layer, of the substrate layer, the anti-reflection film comprises a first refractive index film layer and a second refractive index film layer which are stacked alternately, and the refractive index of the first refractive index film layer is larger than that of the second refractive index film layer.
Further, the microstructure layer includes: the residual glue layer is connected with the base layer, and the thickness of the residual glue layer is more than or equal to 30 micrometers and less than or equal to 90 micrometers; the bump layer is positioned on one side of the residual glue layer away from the substrate layer, the bump layer is provided with one or more micro lenses, and the thickness of the bump layer is greater than or equal to 2 mu m and smaller than or equal to 40 mu m.
Further, when there is one microlens, a surface of the microlens on a side away from the base layer includes one of a spherical surface and an aspherical surface, and a length of the microlens is 4mm or more and 9mm or less; and/or the width of the micro lens is more than or equal to 0.1mm and less than or equal to 0.4 mm; and/or the height of the micro lens is more than or equal to 0.2mm and less than or equal to 0.5 mm.
Further, when the number of the micro lenses is multiple, the micro lenses are sequentially arranged along a straight line to form a micro lens array, and the length of the micro lens array is more than or equal to 2mm and less than or equal to 9 mm; and/or the width of the micro lens array is more than or equal to 0.05mm and less than or equal to 0.3 mm; and/or the height of the micro lens array is more than or equal to 0.2mm and less than or equal to 0.8 mm.
Further, when the antireflection film is arranged on the surface of one side, away from the microstructure layer, of the substrate layer, the first refractive index film layer is one layer, and the second refractive index film layer is one layer, the first refractive index film layer is connected with the substrate layer, the second refractive index film layer is connected with the surface of one side, away from the substrate layer, of the first refractive index film layer, and the thickness of the first refractive index film layer is greater than or equal to 22nm and smaller than or equal to 28 nm; and/or the thickness of the second refractive index film layer is not less than 213nm and not more than 226 nm.
Further, when the antireflection film is arranged on the surface of one side, far away from the microstructure layer, of the substrate layer, the first refractive index film layers are two layers, and the second refractive index film layers are two layers, the first film layers are connected with the substrate layer and are the first refractive index film layers, and the thickness of each first film layer is greater than or equal to 36nm and less than or equal to 40 nm; the second film layer is connected with the surface of one side, away from the substrate layer, of the first film layer, the second film layer is a second refractive index film layer, and the thickness of the second film layer is greater than or equal to 42nm and smaller than or equal to 46 nm; the third film layer is connected with the surface of one side, far away from the first film layer, of the second film layer, the third film layer is a first refractive index film layer, and the thickness of the third film layer is larger than or equal to 115nm and smaller than or equal to 123 nm; and the fourth film layer is connected with the surface of one side, far away from the second film layer, of the third film layer, the fourth film layer is a second refractive index film layer, and the thickness of the fourth film layer is more than or equal to 150nm and less than or equal to 165 nm.
Further, when the antireflection film is arranged on the surface of one side, far away from the microstructure layer, of the substrate layer, the first refractive index film layer is three layers, and the second refractive index film layer is three layers, the first film layer is connected with the substrate layer and is the first refractive index film layer, and the thickness of the first film layer is greater than or equal to 28nm and smaller than or equal to 32 nm; the second film layer is connected with the surface of one side, away from the substrate layer, of the first film layer, the second film layer is a second refractive index film layer, and the thickness of the second film layer is greater than or equal to 82nm and less than or equal to 86 nm; the third film layer is connected with the surface of one side, far away from the first film layer, of the second film layer, the third film layer is a first refractive index film layer, and the thickness of the third film layer is greater than or equal to 85nm and smaller than or equal to 93 nm; the fourth film layer is connected with the surface of one side, far away from the second film layer, of the third film layer, the fourth film layer is a second refractive index film layer, and the thickness of the fourth film layer is greater than or equal to 26nm and smaller than or equal to 32 nm; the fifth film layer is connected with the surface of one side, far away from the third film layer, of the fourth film layer, the fifth film layer is a first refractive index film layer, and the thickness of the fifth film layer is greater than or equal to 98nm and smaller than or equal to 112 nm; and the sixth film layer is connected with the surface of one side, far away from the fourth film layer, of the fifth film layer, the sixth film layer is a second refractive index film layer, and the thickness of the sixth film layer is greater than or equal to 172nm and less than or equal to 190 nm.
Further, the material of the first refractive index film layer comprises one of titanium oxide, silicon nitride, tantalum oxide and zirconium oxide; and/or the material of the second refractive index film layer comprises silicon oxide.
Further, the refractive index of the microstructure layer is greater than or equal to 1.45 and less than or equal to 1.65; and/or the material of the substrate layer comprises one of glass and plastic.
Further, when the incidence angle AOI is 0 degree, the reflectivity R of the micro-lens element in the wave band range of 800 nm-1000 nm is less than 0.5%, and the transmissivity T is more than 87%; and/or when the incident angle AOI is 0 degree, the reflectance R of the antireflection film in the wave band range of 800 nm-1000 nm is less than 0.7%, and the transmittance T is more than 99%.
By applying the technical scheme of the invention, the micro-lens element comprises a substrate layer, a micro-structural layer and an antireflection film, wherein the micro-structural layer is arranged on the substrate layer and comprises one or more micro-lenses, and the micro-lenses are columnar; the antireflection film is arranged on one side surface of the microstructure layer far away from the substrate layer and/or on one side surface of the substrate layer far away from the microstructure layer, the antireflection film comprises a first refractive index film layer and a second refractive index film layer which are alternately stacked, and the refractive index of the first refractive index film layer is larger than that of the second refractive index film layer.
Through setting up the stratum basale for the stratum basale provides the position of setting up for micro-structure layer and subtract anti-membrane, has improved the use reliability of micro-structure layer and subtract anti-membrane, guarantees that the microlens component can stable work. Through setting up the anti-reflection film, the anti-reflection film is including first refractive index rete and the second refractive index rete that piles up in turn, the refracting index of first refractive index rete is greater than the refracting index of second refractive index rete, make external light source emission light when little lens element like this, the anti-reflection film can increase the transmissivity of light, reduce the reflectivity of light, thereby can effectively reduce the energy loss of light source emission light process little lens element, the light source utilization ratio has effectively been improved, the imaging effect of little lens element has been increased, can guarantee simultaneously that little lens element obtains good shape preserving effect.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this application, illustrate embodiments of the invention and, together with the description, serve to explain the invention and not to limit the invention. In the drawings:
fig. 1 is a schematic structural diagram of a microlens element according to a first embodiment of the present invention;
FIG. 2 shows a cross-sectional view of the microlens element of FIG. 1;
FIG. 3 shows a cross-sectional scanning electron microscope schematic of the microlens element of FIG. 2;
FIG. 4 shows simulated reflectance spectra of the microlens element of FIG. 1 at different angles of incidence;
FIG. 5 shows measured reflectance spectra of the microlens element of FIG. 1 at different angles;
fig. 6 shows a reflection spectrum and a transmission spectrum of the microlens element in fig. 1 at an incidence angle AOI of 0 °;
fig. 7 shows a reflection spectrum and a transmission spectrum of the microlens element of fig. 1 at an angle of incidence AOI of 45 °;
FIG. 8 is a graph showing a reflection spectrum and a transmission spectrum of an uncoated antireflection film of a microlens element according to a first embodiment;
FIG. 9 is a schematic structural view showing a microlens element according to a second embodiment of the present invention;
FIG. 10 shows a cross-sectional view of the microlens element of FIG. 9;
FIG. 11 shows a cross-sectional scanning electron microscope schematic of the microlens element of FIG. 10;
fig. 12 shows a reflection spectrum and a transmission spectrum of the microlens element in fig. 9 at an incidence angle AOI of 0 °;
fig. 13 shows a reflection spectrum and a transmission spectrum of the microlens element of fig. 9 at an incidence angle AOI of 20 °;
FIG. 14 shows a reflection spectrum and a transmission spectrum of an uncoated antireflection film of a microlens element according to a second embodiment;
FIG. 15 is a graph showing simulated reflection spectra of microlens elements of example three at different incident angles;
fig. 16 shows simulated reflection spectra at different incident angles of the microlens element of example four.
Wherein the figures include the following reference numerals:
10. a base layer; 20. a microstructure layer; 21. a residual glue layer; 22. and (4) raising the layer.
Detailed Description
It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present invention will be described in detail below with reference to the embodiments with reference to the attached drawings.
It is noted that, unless otherwise indicated, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs.
In the present invention, unless specified to the contrary, use of the terms of orientation such as "upper, lower, top, bottom" or the like, generally refer to the orientation as shown in the drawings, or to the component itself in a vertical, perpendicular, or gravitational orientation; likewise, for ease of understanding and description, "inner and outer" refer to the inner and outer relative to the profile of the components themselves, but the above directional words are not intended to limit the invention.
The invention provides a micro lens element, aiming at solving the problem of poor imaging effect of the micro lens element in the prior art.
As shown in fig. 1 to 16, the microlens element includes a substrate layer 10, a microstructure layer 20 and an antireflection film, the microstructure layer 20 is disposed on the substrate layer 10, the microstructure layer 20 includes one or more microlenses, and the microlenses are columnar; the antireflection film is arranged on one side surface of the microstructure layer 20 far away from the substrate layer 10 and/or on one side surface of the substrate layer 10 far away from the microstructure layer 20, the antireflection film comprises a first refractive index film layer and a second refractive index film layer which are alternately stacked, and the refractive index of the first refractive index film layer is greater than that of the second refractive index film layer.
Through setting up stratum basale 10 for stratum basale 10 provides the position of setting for micro-structure layer 20 and antireflection film, has improved the reliability of use of micro-structure layer 20 and antireflection film, guarantees that the microlens element can stable operation. Through setting up the anti-reflection film, the anti-reflection film is including first refractive index rete and the second refractive index rete that piles up in turn, the refracting index of first refractive index rete is greater than the refracting index of second refractive index rete, make external light source emission light when little lens element like this, the anti-reflection film can increase the transmissivity of light, reduce the reflectivity of light, thereby can effectively reduce the energy loss of light source emission light process little lens element, the light source utilization ratio has effectively been improved, the imaging effect of little lens element has been increased, can guarantee simultaneously that little lens element obtains good shape preserving effect.
In addition, the antireflection film is a low-angle near-infrared antireflection film with high transmittance and low reflectivity, can receive incident light in a near-infrared band range of 850nm to 950nm, and achieves an antireflection effect of 0-50 degrees of low-angle AOI. And the anti-reflection film in this application has few number of layers and thin thickness, so that the processing difficulty can be effectively reduced, and the processing cost is saved.
The first refractive index film layer is a high refractive index film layer, and the refractive index of the first refractive index film layer is greater than 1.90; the second refractive index film layer is a low refractive index film layer, and the refractive index of the second refractive index film layer is smaller than 1.55.
Specifically, the microstructure layer 20 comprises a residual glue layer 21 and a bump layer 22, the residual glue layer 21 is connected with the substrate layer 10, and the thickness of the residual glue layer 21 is greater than or equal to 30 μm and less than or equal to 90 μm; the bump layer 22 is located on the side of the adhesive residue layer 21 away from the base layer 10, the bump layer 22 has one or more microlenses, and the thickness of the bump layer 22 is greater than or equal to 2 μm and less than or equal to 40 μm. It should be noted that the raised layer 22 is formed by one or more microlenses, and the size of the residual adhesive layer 21 is larger than that of the raised layer 22, so that the residual adhesive layer 21 plays a role of receiving the raised layer 22, which is beneficial to ensuring the stability of the operation of the microlenses forming the raised layer 22.
Specifically, the material of the first refractive index film layer comprises one of titanium oxide, silicon nitride, tantalum oxide and zirconium oxide; the material of the second refractive index film layer includes silicon oxide.
In the present application, the refractive index of the microstructure layer 20 is similar to that of the substrate layer 10, the refractive index of the microstructure layer 20 is greater than or equal to 1.45 and less than or equal to 1.65, and the microstructure layer 20 is processed by imprint lithography. The material of the substrate layer 10 includes one of glass and plastic, and may be selected according to the actual situation.
Specifically, when the incident angle AOI is 0 degree, the reflectivity R of the micro-lens element in the wave band range of 800 nm-1000 nm is less than 0.5%, and the transmissivity T is more than 87%; when the incident angle AOI is 0 degree, the reflectance R of the antireflection film in the wave band range of 800 nm-1000 nm is less than 0.7%, and the transmittance T is more than 99%. Therefore, the characteristics of high transmissivity and low reflectivity of the antireflection film can be effectively ensured, the utilization rate of an external light source is increased, and the imaging effect of the micro-lens element is improved.
Example one
As shown in fig. 1 to 8, the raised layer 22 of the microstructure layer 20 is a microlens, the microlens is in a cylindrical shape, a side surface of the microlens away from the substrate layer 10 includes one of a spherical surface and an aspherical surface, and a length of the microlens is greater than or equal to 4mm and less than or equal to 9 mm; the width of the micro lens is more than or equal to 0.1mm and less than or equal to 0.4 mm; the height of the micro lens is more than or equal to 0.2mm and less than or equal to 0.5 mm. In this case, the thickness of the residual adhesive layer 21 is in the range of 0 μm to 200 μm.
As shown in fig. 3, which is a schematic view of a cross-sectional scanning electron microscope of the microlens element in this embodiment, it can be seen that the refractive index of the material of the microstructure layer 20 is similar to that of the material of the substrate layer 10, and the microstructure layer 20 is processed by imprint lithography. In this embodiment, the length, width, and height dimensions of the pillar-shaped microlenses are 6mm 0.25mm 0.38mm, the thickness of the photoresist layer 21 is about 40 μm, and the height of the bump layer 22 is 25 μm to 39 μm.
It should be noted that, the antireflection film is disposed on both the surface of the side of the microstructure layer 20 away from the substrate layer 10 and the surface of the side of the substrate layer 10 away from the microstructure layer 20, or the antireflection film is disposed on one of the surface of the microstructure layer 20 away from the substrate layer 10 and the surface of the side of the substrate layer 10 away from the microstructure layer 20, and the specific disposition position of the antireflection film may be selected according to actual conditions, and when the antireflection film is disposed on both the surface of the microstructure layer 20 away from the substrate layer 10 and the surface of the substrate layer 10 away from the microstructure layer 20, on one hand, the reflectance of the surface of the microstructure layer 20 away from the substrate layer 10 is reduced, and the light source utilization rate is improved, and on the other hand, the reflectance of the surface of the substrate layer 10 away from the microstructure layer 20 is reduced, and stray light in the imaging system is reduced. According to the method, a multilayer film system is designed by taking titanium oxide as a material of a first refractive index film layer and silicon oxide as a material of a second refractive index film layer as targets of reducing reflectivity and taking AOI (angle of incidence) of 0-60 degrees and 905nm as target wavelengths.
Specifically, the film layer composition and thickness of the antireflective film are shown in table 1 below: an antireflection film is arranged on the base layer 10, the antireflection film is designed to be composed of 4 layers of materials, and the total film thickness of the antireflection film is 359 nm. Specifically, the antireflection film is disposed on a side surface of the substrate layer 10 away from the microstructure layer 20, the first refractive index film layer is two-layer, and when the second refractive index film layer is two-layer, the antireflection film includes: a first film layer, a second film layer, a third film layer and a fourth film layer; the first film layer is connected to the substrate layer 10, the first film layer is a first refractive index film layer, the thickness of the first film layer is greater than or equal to 36nm and less than or equal to 40nm, and preferably, the thickness of the first film layer is 39 nm. The second film layer is connected with the surface of one side of the first film layer, which is far away from the substrate layer 10, the second film layer is a second refractive index film layer, the thickness of the second film layer is greater than or equal to 42nm and less than or equal to 46nm, and preferably, the thickness of the second film layer is 45 nm. The third film layer is connected with the surface of one side, far away from the first film layer, of the second film layer, the third film layer is a first refractive index film layer, the thickness of the third film layer is greater than or equal to 115nm and less than or equal to 123nm, and preferably, the thickness of the third film layer is 118 nm. The fourth film layer is connected with the surface of one side, far away from the second film layer, of the third film layer, the fourth film layer is a second refractive index film layer, the thickness of the fourth film layer is greater than or equal to 150nm and less than or equal to 165nm, and preferably, the thickness of the fourth film layer is 157 nm.
| Material | Thickness of | |
| First film layer | Titanium oxide | 39nm |
| Second film layer | Silicon oxide | 45nm |
| Third filmLayer(s) | Titanium oxide | 118nm |
| The fourth film layer | Silicon oxide | 157nm |
TABLE 1
As shown in fig. 4, which is a simulated reflectance spectrum of the microlens element at different incident angles, the wavelength of the incident light is 905 nm. As can be seen from the graph, under the wavelength of 905nm, when the incident angle is in the range of 0-30 degrees, the spectral curve change is not obvious, and the reflectivity is close to 0.2%; the reflectance spectrum rapidly increased at an incident angle in the range of 30 ° to 60 °, while the reflectance was 3.5% at an incident angle of 60 °.
As shown in fig. 5, which is a measured reflectance spectrum of the microlens element at different incident angles, the wavelength of the incident light is 905 nm. When the incident angle AOI is 0 °, the reflectance is 0.25%, and the simulated value and the measured value are close to each other. When the angle of incidence AOI is 45 °, the measured reflectance is 0.9%, which is 0.4% greater than the simulated reflectance.
As shown in fig. 6, the reflectance spectrum and the transmittance spectrum of the microlens element at an incidence angle AOI of 0 ° are shown, and the wavelength of the incident light is 905 nm. The lenticular surface refers to a surface of the micro-structural layer 20 away from the substrate layer 10, and the non-lenticular surface refers to a surface of the substrate layer 10 away from the micro-structural layer 20. The surface of the columnar microlens on the side away from the base layer 10 may be spherical or aspherical. As can be seen from the comparison, the reflectivities of the microlens elements of the spherical and aspherical microlenses are similar, and the reflectivities of the lens surfaces of the microlens elements of the spherical and aspherical microlenses are both slightly lower than the reflectivities of the non-lens surfaces.
As shown in the upper left reflectance graph of the figure, when the surface of the microlens element on the side away from the base layer 10 is a spherical surface and the incident angle AOI is 0 °, the reflectance of the lens surface of the spherical surface of the microlens element is about 0.08%, and the reflectance of the non-lens surface is about 0.12%; as shown in the upper right reflectance graph of the figure, when the surface of the microlens element on the side away from the base layer 10 is aspheric, the reflectance of the aspheric lens surface is about 0.08%, and the reflectance of the non-lens surface is about 0.14%. When the incidence angle AOI is 0 ° as shown by the lower left transmittance curve in the graph, the transmittance of the lens surface of the spherical surface of the microlens element after the antireflection film processing is about 98.3% and the transmittance of the non-lens surface is about 99.1% in comparison with the transmittance spectrum; as shown in the lower right transmittance curve in the figure, the transmittance of the aspherical lens surface of the microlens element after the antireflection film processing was about 98.5%, and the transmittance of the non-lens surface was about 98.6%.
As shown in fig. 7, the reflection spectrum and the transmission spectrum of the microlens element at an incidence angle AOI of 45 ° are shown, and the wavelength of the incident light is 905 nm. The reflectivity of the non-lens surface of the microlens element of the spherical and aspherical microlenses is similar, and the reflectivity of the lens surface of the spherical cylindrical lens is obviously lower than that of the aspherical cylindrical lens. As shown by the upper left and lower left curves in the figure, the reflectance spectrum and the transmittance spectrum of the microlens element in which the surface of the microlens remote from the base layer 10 is spherical are shown, respectively. As shown in the upper right and lower right curves of the figure, the reflectance spectrum and the transmittance spectrum of the microlens element in which the surface of the microlens remote from the base layer 10 is aspherical are shown. As can be seen from the figure, when the incident angle AOI is 45 degrees, the reflectance of the lens surface of the spherical microlens after antireflection film processing is about 0.8%, and the reflectance of the non-lens surface is about 1.5%; the reflectance of the lens surface of the aspherical microlens after the antireflection film processing was about 1.6%, and the reflectance of the non-lens surface was about 1.7%. Meanwhile, the transmission spectrograms are compared, and the transmissivity of the two surfaces of the spherical micro lens processed by the antireflection film is higher than that of the aspherical micro lens. When the incidence angle AOI is 45 degrees, the transmittance of the lens surface of the spherical microlens after the antireflection film processing is about 64%, and the transmittance of the non-lens surface is about 66%; the transmittance of the lens surface of the aspherical microlens after the antireflection film processing was about 63%, and the transmittance of the non-lens surface was about 64%.
According to the different incident angles, the reflectivity and the transmissivity spectrum of the spherical or aspherical cylindrical micro lens processed by the antireflection film are analyzed to obtain: on the one hand, the raised layer 22 of the columnar microlens increases the reflectivity of the non-lens surface; on the other hand, when the incident angle is small, for example, the incident angle AOI is 0 °, the reflectance and transmittance of the spherical cylindrical microlens and the aspherical cylindrical microlens are close; when the incident angle is large, for example, AOI is 45 °, the reflectance and transmittance of the spherical cylindrical microlens are slightly better than those of the aspherical cylindrical microlens. For the small-angle antireflection performance of the light source, the spherical cylindrical micro lens is slightly superior to the aspherical cylindrical micro lens.
FIG. 8 shows a reflection spectrum and a transmission spectrum of a microlens element without a plating anti-reflection film in the prior art. As can be seen from the figure, the reflectance of the microlens element coated with the antireflection film is significantly reduced and the transmittance is significantly improved compared with the case of no coating.
Example two
As shown in fig. 9 to 14, the difference from the first embodiment is that there is one microlens in the first embodiment, and there are a plurality of microlenses in the second embodiment.
As shown in fig. 9 and 10, when there are a plurality of microlenses, the plurality of microlenses are sequentially arranged along a straight line to form a microlens array, and the arrangement direction of the microlens array is perpendicular to the extending direction of the single microlens. The length of the micro lens array is more than or equal to 2mm and less than or equal to 9 mm; the width of the micro lens array is more than or equal to 0.05mm and less than or equal to 0.3 mm; the height of the microlens array is 0.2mm or more and 0.8mm or less. The number of the micro lenses is more than 1 and less than or equal to 50. Length width height of individual microlens satisfies: 2mm 0.05mm 0.2mm to 9mm 0.3mm 0.8 mm.
In this example, the length, width, and height of a single microlens in the shape of a pillar are 5mm 0.14mm 0.48mm, and the length, width, and height of a microlens array formed by arranging a plurality of microlenses are 5mm 3.92mm 0.48 mm.
As shown in fig. 11, which is a schematic cross-sectional sem of the microlens element in this embodiment, it can be seen that the material of the microlens array is similar to that of the base layer 10, the microlens array is processed by imprint lithography, the thickness of the primer layer 21 is about 60 μm, and the height of the ridge portion is about 3 μm to 4 μm.
Referring to the first embodiment, the antireflection film is provided, and as shown in fig. 12, the reflection spectrum (left side) and the transmission spectrum (right side) of the microlens element after processing the antireflection film when the wavelength of incident light is 905nm and the incident angle AOI is 0 °. As shown in fig. 13, the reflection spectrum (left side) and the transmission spectrum (right side) of the microlens element after the antireflection film processing when the wavelength of the incident light is 905nm and the incident angle AOI is 20 °. As can be seen from the figure, when the incident angle AOI is 0 °, the reflectance of the lens surface of the microlens array after the antireflection film processing is about 0.06%, and the reflectance of the non-lens surface is about 0.05%; the transmittance of the lens surface of the microlens array after the antireflection film processing is about 90%, and the transmittance of the non-lens surface is about 90%. When the incident angle AOI is 20 degrees, the reflectivity of the lens surface of the micro-lens array processed by the antireflection film is about 0 percent, and the reflectivity of the non-lens surface is about 0.2 percent; the transmittance of the lens surface of the microlens array after the antireflection film processing was about 87%, and the transmittance of the non-lens surface was about 87%.
And comparing the reflectivity spectrum after the antireflection film is processed, when the incidence angle AOI is 0 degrees, the reflectivity of the lens surface and the non-lens surface of the micro-lens array is similar, and when the incidence angle AOI is increased to 20 degrees, the conclusion is similar. Since the reflectance spectra with an angle of incidence AOI of 0 ° and 20 ° are not tested on the same equipment, the equipment accuracy is tested, resulting in a slight difference in the spectra. In addition, when the transmittance spectra after the antireflection film processing were compared, it was found that the incident angle was increased and the transmittance of the microlens array was decreased.
From the above analysis, it can be found that the reflectivities of the lens surface and the non-lens surface of the microlens array after the antireflection film processing are similar at the same incident angle, and the comparison result of the transmittance is similar, and in addition, the spectrum result is similar to that of the actually processed sample in the example.
As shown in fig. 14, a reflection spectrum and a transmission spectrum of a microlens element of a microlens array without plating an antireflection film in the related art are shown. It can be seen that the reflectivity of the microlens element of the present application is significantly reduced and the transmittance is significantly improved compared to that of the microlens element without the anti-reflection coating.
EXAMPLE III
The difference from the first and second examples is that the number of layers of the antireflection film is different.
Specifically, in this embodiment, the number of the antireflection film layers is two, when the antireflection film is disposed on the surface of the side of the substrate layer 10 away from the microstructure layer 20, the first refractive index film layer is one, and the second refractive index film layer is one, the first refractive index film layer is connected to the substrate layer 10, the second refractive index film layer is connected to the surface of the side of the first refractive index film layer away from the substrate layer 10, and the thickness of the first refractive index film layer is greater than or equal to 22nm and less than or equal to 28 nm; the thickness of the second refractive index film layer is not less than 213nm and not more than 226 nm.
The specific structure of the antireflection film is shown in table 2 below, and the total film thickness of the antireflection film was 244 nm. Starting from the base layer 10 are respectively: a first refractive index film layer of 25nm, a second refractive index film layer of 219 nm.
| Material | Thickness of | |
| Film layer with first refractive index | Titanium oxide | 25nm |
| Second refractive index film layer | Silicon oxide | 219nm |
TABLE 2
As shown in fig. 15, simulated reflectance spectra for different angles of incidence. Simulating spectrums at different incidence angles to find that the spectrum change is not obvious and the reflectivity is close to 0.2% when the incidence angle is 0-30 ℃ under the wavelength of 905 nm; the reflectance spectrum rapidly increases at an incident angle of 30-60 DEG, and the reflectance is 4.9% at an incident angle of 60 deg.
Example four
The difference from the first and second examples is that the number of layers of the antireflection film is different.
Specifically, in this embodiment, the number of antireflection films is six.
Specifically, when subtracting anti-membrane setting and keeping away from the side surface of microstructured layer 20 at stratum basale 10, first refractive index rete is the three-layer, and the second refractive index rete includes for the three-layer, subtracts anti-membrane: the film comprises a first film layer, a second film layer, a third film layer, a fourth film layer, a fifth film layer and a sixth film layer; the first film layer is connected with the substrate layer 10, the first film layer is a first refractive index film layer, and the thickness of the first film layer is greater than or equal to 28nm and less than or equal to 32 nm; the second film layer is connected with the surface of one side, far away from the substrate layer 10, of the first film layer, the second film layer is a second refractive index film layer, and the thickness of the second film layer is greater than or equal to 82nm and less than or equal to 86 nm; the third film layer is connected with the surface of one side, far away from the first film layer, of the second film layer, the third film layer is a first refractive index film layer, and the thickness of the third film layer is greater than or equal to 85nm and smaller than or equal to 93 nm; the fourth film layer is connected with the surface of one side, far away from the second film layer, of the third film layer, the fourth film layer is a second refractive index film layer, and the thickness of the fourth film layer is greater than or equal to 26nm and smaller than or equal to 32 nm; the fifth film layer is connected with the surface of one side, far away from the third film layer, of the fourth film layer, the fifth film layer is a first refractive index film layer, and the thickness of the fifth film layer is greater than or equal to 98nm and smaller than or equal to 112 nm; the sixth film layer and the fifth film layer are connected with the surface of one side, far away from the fourth film layer, of the fifth film layer, the sixth film layer is a second refractive index film layer, and the thickness of the sixth film layer is greater than or equal to 172nm and smaller than or equal to 190 nm.
The antireflection film had a specific structure, as shown in table 3 below, and the total thickness of the antireflection film was 521 nm. Starting from the base layer 10 are respectively: the film comprises a first film layer with the thickness of 30nm, a second film layer with the thickness of 85nm, a third film layer with the thickness of 90nm, a fourth film layer with the thickness of 30nm, a fifth film layer with the thickness of 106nm and a sixth film layer with the thickness of 180 nm.
| Material | Thickness of | |
| First film layer | Titanium oxide | 30nm |
| Second film layer | Silicon oxide | 85nm |
| Third film layer | Titanium oxide | 90nm |
| The fourth film layer | Silicon oxide | 30nm |
| The fifth film layer | Titanium oxide | 106nm |
| The sixth film layer | Silicon oxide | 180nm |
TABLE 3
As shown in fig. 16, simulated reflectance spectra for different angles of incidence. Simulating spectrums at different incidence angles to find that the spectrum change is not obvious and the reflectivity is close to 0.1% when the incidence angle is 0-30 ℃ under the wavelength of 905 nm; the reflectance spectrum rapidly increases at an incident angle of 30-60 DEG, and the reflectance is 4.1% at an incident angle of 60 deg.
It is to be understood that the above-described embodiments are only a few, but not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of example embodiments according to the present application. As used herein, the singular is intended to include the plural unless the context clearly dictates otherwise, and it should be further understood that the terms "comprises" and/or "comprising," when used in this specification, specify the presence of features, steps, operations, devices, components, and/or combinations thereof.
It should be noted that the terms "first," "second," and the like in the description and claims of this application and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used is interchangeable under appropriate circumstances such that the embodiments of the application described herein are capable of operation in sequences other than those illustrated or described herein.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. A microlens element, comprising:
a base layer (10);
a microstructure layer (20), the microstructure layer (20) being disposed on the substrate layer (10), the microstructure layer (20) comprising one or more microlenses, the microlenses being cylindrical;
the anti-reflection film is arranged on one side surface, far away from the substrate layer (10), of the micro-structure layer (20) and/or on one side surface, far away from the micro-structure layer (20), of the substrate layer (10), the anti-reflection film comprises a first refractive index film layer and a second refractive index film layer which are stacked alternately, and the refractive index of the first refractive index film layer is larger than that of the second refractive index film layer.
2. A lenticular element according to claim 1, characterized in that the microstructure layer (20) comprises:
the adhesive residue layer (21), the adhesive residue layer (21) is connected with the substrate layer (10), and the thickness of the adhesive residue layer (21) is more than or equal to 30 μm and less than or equal to 90 μm;
a bump layer (22), the bump layer (22) being located on a side of the primer layer (21) away from the substrate layer (10), the bump layer (22) having one or more microlenses, the bump layer (22) having a thickness of 2 μm or more and 40 μm or less.
3. A microlens element according to claim 1, wherein, when said microlens is one, a side surface of said microlens remote from said base layer (10) comprises one of a spherical surface and an aspherical surface,
the length of the micro lens is more than or equal to 4mm and less than or equal to 9 mm; and/or
The width of the micro lens is more than or equal to 0.1mm and less than or equal to 0.4 mm; and/or
The height of the micro lens is more than or equal to 0.2mm and less than or equal to 0.5 mm.
4. The microlens element according to claim 1, wherein when the microlens is plural, the plural microlenses are arranged in series along a line to form a microlens array,
the length of the micro lens array is more than or equal to 2mm and less than or equal to 9 mm; and/or
The width of the micro lens array is more than or equal to 0.05mm and less than or equal to 0.3 mm; and/or
The height of the micro lens array is more than or equal to 0.2mm and less than or equal to 0.8 mm.
5. The microlens element according to claim 1, wherein when the antireflection film is provided on a side surface of the substrate layer (10) remote from the microstructure layer (20), the first refractive index film layer is one layer, and the second refractive index film layer is one layer, the first refractive index film layer is connected to the substrate layer (10), and the second refractive index film layer is connected to a side surface of the first refractive index film layer remote from the substrate layer (10),
the thickness of the first refractive index film layer is greater than or equal to 22nm and less than or equal to 28 nm; and/or
The thickness of the second refractive index film layer is more than or equal to 213nm and less than or equal to 226 nm.
6. The microlens element according to claim 1, wherein when the antireflection film is provided on a surface of the substrate layer (10) on a side away from the microstructure layer (20), the first refractive index film layer is two layers, and the second refractive index film layer is two layers,
the first film layer is connected with the substrate layer (10), the first film layer is a first refractive index film layer, and the thickness of the first film layer is greater than or equal to 36nm and less than or equal to 40 nm;
the second film layer is connected with the surface of one side, away from the base layer (10), of the first film layer, the second film layer is a second refractive index film layer, and the thickness of the second film layer is greater than or equal to 42nm and smaller than or equal to 46 nm;
the third film layer is connected with the surface of one side, far away from the first film layer, of the second film layer, the third film layer is a first refractive index film layer, and the thickness of the third film layer is larger than or equal to 115nm and smaller than or equal to 123 nm;
the fourth film layer is connected with the surface of one side, far away from the second film layer, of the third film layer, the fourth film layer is a second refractive index film layer, and the thickness of the fourth film layer is larger than or equal to 150nm and smaller than or equal to 165 nm.
7. The microlens element according to claim 1, wherein when the antireflection film is provided on a surface of the substrate layer (10) on a side away from the microstructure layer (20), the first refractive index film layer is three layers, and the second refractive index film layer is three layers,
the first film layer is connected with the substrate layer (10), the first film layer is a first refractive index film layer, and the thickness of the first film layer is greater than or equal to 28nm and less than or equal to 32 nm;
the second film layer is connected with the surface of one side, away from the substrate layer (10), of the first film layer, the second film layer is a second refractive index film layer, and the thickness of the second film layer is greater than or equal to 82nm and less than or equal to 86 nm;
the third film layer is connected with the surface of one side, far away from the first film layer, of the second film layer, the third film layer is a first refractive index film layer, and the thickness of the third film layer is greater than or equal to 85nm and smaller than or equal to 93 nm;
the fourth film layer is connected with the surface of one side, far away from the second film layer, of the third film layer, the fourth film layer is a second refractive index film layer, and the thickness of the fourth film layer is greater than or equal to 26nm and smaller than or equal to 32 nm;
the fifth film layer is connected with the surface of one side, far away from the third film layer, of the fourth film layer, the fifth film layer is a first refractive index film layer, and the thickness of the fifth film layer is greater than or equal to 98nm and smaller than or equal to 112 nm;
the sixth film layer is connected with the surface of one side, far away from the fourth film layer, of the fifth film layer, the sixth film layer is a second refractive index film layer, and the thickness of the sixth film layer is greater than or equal to 172nm and smaller than or equal to 190 nm.
8. A microlens element according to claim 1,
the material of the first refractive index film layer comprises one of titanium oxide, silicon nitride, tantalum oxide and zirconium oxide; and/or
The material of the second refractive index film layer includes silicon oxide.
9. A microlens element according to claim 1,
the refractive index of the microstructure layer (20) is more than or equal to 1.45 and less than or equal to 1.65; and/or
The material of the substrate layer (10) comprises one of glass and plastic.
10. A microlens element according to any of claims 1 to 9,
when the incidence angle AOI is 0 degree, the reflectivity R of the micro-lens element in the wave band range of 800 nm-1000 nm is less than 0.5%, and the transmissivity T is more than 87%; and/or
When the incident angle AOI is 0 degree, the reflectivity R of the antireflection film in the wave band range of 800 nm-1000 nm is less than 0.7%, and the transmissivity T is more than 99%.
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