CN114086128B - Coating preparation method for realizing high-efficiency operation of PS-PVD equipment - Google Patents
Coating preparation method for realizing high-efficiency operation of PS-PVD equipment Download PDFInfo
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- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
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- C23C10/06—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
- C23C28/3215—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer at least one MCrAlX layer
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
- C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/06—Metallic material
- C23C4/073—Metallic material containing MCrAl or MCrAlY alloys, where M is nickel, cobalt or iron, with or without non-metal elements
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
Abstract
The invention discloses a coating preparation method for realizing high-efficiency operation of PS-PVD equipment, aiming at the technical problems that the plasma jet utilization rate is low, the preparation cost is increased and the microstructure consistency and the thickness uniformity of a surface coating are difficult to ensure when a workpiece is sprayed in the process of preparing a thermal barrier coating by the conventional plasma physical vapor deposition, the plasma jet diameter is 50-100 mm by regulating the vacuum degree of a vacuum chamber, the spraying power of the PS-PVD equipment and the spraying current in the process of preparing the thermal barrier coating by the plasma physical vapor deposition, an optimized design scheme is provided respectively aiming at the regulating ranges of three parameters and the regulating range of the synergy of the three parameters, the heating capacity of the plasma jet is correspondingly increased, the sprayed powder is gasified more fully, liquid phase and unmelted particles in the jet are correspondingly reduced, and the plasma jet utilization rate is greatly improved, the energy is effectively saved, the production cost is reduced, and the microstructure consistency of the prepared coating is better.
Description
Technical Field
The invention belongs to the technical field of plasma spraying and physical vapor deposition of coatings, and particularly relates to a coating preparation method for realizing high-efficiency operation of PS-PVD equipment.
Background
Plasma spraying technology and electron beam physical vapor deposition (B-PVD) technology are the most widely used thermal barrier coating preparation technology at present. The traditional plasma spraying technology has the advantages of high deposition efficiency, low equipment cost and the like compared with an EB-PVD preparation technology, but only a layered structure coating can be formed, and the thermal shock resistance of the coating is obviously inferior to that of an EB-PVD columnar crystal structure coating. In view of this, plasma physical vapor deposition techniques are beginning to be applied in the field of thermal barrier coating preparation.
The Plasma-Physical Vapor Deposition (PS-PVD) technique is a thermal barrier coating preparation technique developed on the Low Pressure Plasma Spray (LPPS) technique. The pressure of a vacuum working chamber in the traditional atmospheric or low-pressure plasma spraying technology is about 5000-8000 Pa, the pressure of a vacuum chamber in the PS-PVD technology is only 5-200 Pa, the plasma jet is rapidly expanded due to the arrangement of a high-power plasma spray gun, the length can reach 2000 mm, the diameter is about 150-200 mm, and the temperature of the formed supersonic plasma jet can exceed 6000K. Thus, the powder injected into the plasma jet can be melted or even vaporized. In addition, the deposition of coatings with different tissue structures can be realized by regulating the gas phase/liquid phase/solid phase multiphase proportion, and particularly, the quasi-columnar structure coating obtained by deposition mainly by gas phase deposition has good application prospect in the field of thermal barrier coatings. In addition, because the plasma jet has a large size and high velocity, it can flow over the surface of a workpiece with complex geometry, even reaching shadow areas of the workpiece, and thus the PS-PVD technique can achieve deposition in non-line-of-sight regions.
At present, the research and development of PS-PVD are very rapid, but some problems exist in the actual workpiece spraying process and need to be solved urgently. For example, PS-PVD designers initially desire to achieve complete vaporization of powdered materials, on the one hand, to achieve a similar effect as Physical Vapor Deposition (PVD), and on the other hand, to form a broad jet to achieve uniform coating of large-size workpiece surfaces, through high power, high working gas flow, and low vacuum. However, practical research finds that the gasification of powder in PS-PVD is not sufficient, various particles (such as gas phase particles, liquid phase particles, partially fused particles, unmelted particles and the like) are distributed in broad PS-PVD plasma jet, the utilization rate of the plasma jet (the radius of a vapor deposition area at the center of the jet/the radius of a total plasma jet beam spot) is very low in the spraying process caused by the state and distribution difference of unmelted solid particles or liquid drops in the jet, only 1/3-1/2 is found at present, the preparation cost of the coating is greatly increased, and the microstructure consistency and the thickness uniformity of the surface coating are difficult to ensure when a workpiece is sprayed. Therefore, how to improve the utilization rate of the plasma jet in the PS-PVD equipment and reduce the operation cost of the equipment becomes a problem to be solved urgently by the PS-PVD at present.
Disclosure of Invention
In order to solve the technical problems, the invention provides a coating preparation method for realizing low-cost and high-efficiency operation of PS-PVD equipment, and aims to solve the problems of low utilization rate of plasma jet and high coating preparation cost in PS-PVD.
The complete technical scheme of the invention comprises the following steps:
a coating preparation method for realizing high-efficiency operation of PS-PVD equipment comprises the following steps:
(1) starting PS-PVD equipment, assembling a spraying workpiece, and closing a vacuum chamber;
(2) vacuumizing the vacuum chamber, adjusting the total spraying power of the PS-PVD equipment, and regulating and controlling the spraying current;
(3) opening a working gas valve, striking an arc, and gradually adjusting the gas flow to the specified gas flow after the arc is stabilized;
(4) adjusting the rotating speed of a workpiece to be 0-30rpm, preheating blades by adopting plasma jet, and detecting the temperature of a matrix by using an infrared probe until the temperature of the matrix reaches 800-950 ℃;
(5) regulating and controlling the powder feeding speed to be 5-20 g/min, regulating the flow of Ar gas of powder feeding carrier gas to be 8-15L/min, regulating the rotating speed of a workpiece to be 0-30rpm, and regulating the spraying distance to be 500-800 mm;
(6) stopping powder feeding, extinguishing electric arc, cooling the vacuum chamber, releasing vacuum, and taking out the sample to obtain a quasi-columnar structure ceramic coating sample;
in the step (2), the diameter of the plasma jet is 50-100 mm by regulating and controlling the vacuum degree of the vacuum chamber, the total spraying power of the PS-PVD equipment and the spraying current, and specifically, the parameters meet the following conditions:
wherein:
in the formula:Vis the vacuum degree of the vacuum chamber, and the unit is mbar,V 0the reference vacuum degree is 2mbar,Pthe total power of spraying is applied to the PS-PVD equipment,P 0the unit is kW, the reference total power is 100kW,Iis the current of the PS-PVD equipment, with the unit of A,I 0the reference current is taken as 2000A.
In the step (2), the selected specific parameters are as follows: the vacuum chamber pressure was 50mbar, the total spraying power was 70kW, and the spraying current was 1000A.
In the step (3), the working gas is Ar, He or H2、N2The gas flow rate of the mixed gas is as follows: ar: 10-30L/min, He: 0 to 60L/min, H2：0~50L/min，N2：0~50L/min。
Preferably, the flow rate of the working gas is Ar: 20L/min, He: 40L/min, H2：10L/min，N2：10L/min。
In the step (4), the spraying time is determined according to the thickness of the coating to be prepared.
In the step (5), the powder feeding speed is 5 g/min, and the Ar gas flow of the powder feeding carrier gas is 8L/min.
Before starting the PS-PVD equipment, the method also comprises the steps of preparing a high-temperature alloy substrate, preprocessing the substrate and preparing a bonding layer on the substrate.
The bonding layer is a PtAl, modified PtAl, NiCoCrAlY or NiCoCrAlYX bonding layer, and X is one or more of Hf, Ta and Si; the PtAl and modified PtAl bonding layers are prepared by adopting an electroplating and gas-phase infiltration method, and the NiCoCrAlY or NiCoCrAlYX bonding layer is prepared by adopting a low-pressure plasma spraying method or a supersonic spraying method.
The quasi-columnar structure ceramic coating is YSZ: ZrO (ZrO)2And (6 to 8 wt%) Y2O3；GYb-YSZ：（5~10mol%）Gd2O3And Yb2O3Co-doped YSZ; r2Zr2O7R is La, Gd, Eu, Sm or Nd and modified material thereof, La2Ce2O7And modified materials thereof, and the like.
Compared with the prior art, the invention has the following advantages:
1) aiming at the technical problems that the utilization rate of plasma jet is low, the preparation cost of a coating is increased, and the consistency of the microstructure and the thickness uniformity of the surface coating are difficult to ensure when a workpiece is sprayed, the invention provides a solution idea that the diameter of the plasma jet is reduced and the jet energy is concentrated, so that the diameter of the plasma jet is reduced to 50-100 mm from the original 200-400 mm, the heating capacity of the plasma jet is correspondingly increased under the condition, the spraying powder is gasified more fully, the liquid phase and the particles which are not melted in the jet are correspondingly reduced, the utilization rate of the plasma jet is greatly improved, and the utilization rate of the plasma jet is increased to 75-85% from the original 33-50%.
2) In the aspect of specific solving means, the invention discovers that the main factors influencing the diameter of the plasma jet are the vacuum degree of a vacuum chamber, the total power of equipment and the current through research, respectively analyzes and researches the independent action of each factor and the synergistic action of each factor, and discovers that the diameter of the plasma jet can be reduced to a certain extent by properly reducing the total power and the current of the equipment, but the excessive reduction of the power inevitably influences the gasification degree and the deposition efficiency of powder, and on the contrary, the negative influence is caused. Reducing the vacuum degree of the vacuum chamber, i.e. increasing the ambient pressure in the vacuum chamber, will significantly compress the jet flow, reducing its diameter and concentrating the energy, but reducing the vacuum degree too much may result in the workpiece being oxidized. By comprehensively balancing the factors, an optimized design scheme is provided respectively aiming at the regulation and control ranges of the three parameters and the regulation and control range of the cooperation of the three parameters. By adopting the preparation method designed above, the vacuum degree of the vacuum chamber is reduced in the preparation process of the PS-PVD coating, the spraying power is reduced, the energy can be effectively saved, and the production cost is reduced. The plasma jet is not dispersed any more but is converged more, the utilization rate of the plasma jet is improved, the microstructure consistency of the prepared coating is better, and the uniform preparation of the surface coating of the large-size workpiece is realized through workpiece rotation and spray gun movement in the spraying process.
Drawings
FIG. 1a is a microstructure diagram of the coating in the central region of the jet stream along the radial direction of the jet stream after the conditioning process.
FIG. 1b is a microscopic structure diagram of the coating at a position 58 mm-70 mm away from the center of the jet flow along the radial direction of the jet flow after the regulation and control process.
FIG. 2a is a microscopic structure diagram of the coating of the central region of the jet flow along the radial direction of the jet flow by adopting the original mature process.
FIG. 2b is a microscopic structure diagram of the coating at a distance of 81 mm-150 mm from the center of the jet flow along the radial direction of the jet flow by adopting the original mature process.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only illustrative and are not intended to limit the present application.
Example 1
By adopting the method disclosed by the invention, on a high-purity graphite substrate of 200mm multiplied by 5 mm, the vacuum degree of a vacuum chamber, the total spraying power of PS-PVD equipment and the spraying current are regulated and controlled to obtain plasma jet of 50-100 mm to prepare a YSZ coating and analyze the jet utilization rate, and the specifically adopted process parameters are as follows:
(1) starting PS-PVD equipment, assembling a spraying workpiece, and closing a vacuum chamber;
(2) vacuumizing until the pressure of a vacuum chamber is 50 mbar;
(3) adjusting the spraying power to be 70kW and the spraying current to be 1000A;
(4) opening a working gas valve, striking an arc, and gradually adjusting the gas flow to the specified gas flow Ar: 20L/min, He: 40L/min, H2：10L/min，N2：10L/min；
(5) Adjusting the rotating speed of a workpiece to be 10rpm, preheating the blades by adopting plasma jet, and detecting the temperature of the matrix by using an infrared probe until the temperature of the matrix reaches 850-900 ℃;
(6) regulating and controlling the powder feeding speed to be 5 g/min, regulating the flow of Ar gas of powder feeding carrier gas to be 8L/min, regulating the rotating speed of a workpiece to be 0rpm, enabling a spray gun not to move, and regulating the spraying distance to be 600 mm;
(7) and after the preparation is finished, stopping powder feeding, extinguishing electric arc, cooling the vacuum chamber, releasing the vacuum, and taking out the sample to obtain the ceramic coating sample with the quasi-columnar structure.
Analysis of the ceramic coated sample obtained revealed that, at this process parameter, the deposition on the graphite substrate gave an irregular circular shape with a diameter of about 70mm, i.e. the cross-section of the plasma jet. The microstructure of the coating at different parts of the jet flow is analyzed by a scanning electron microscope, and the coating in the central area (within 58mm from the origin of the plasma jet flow center) of the jet flow is a quasi-columnar structure coating by taking the jet flow center as the origin, and the average thickness of the coating is 110 micrometers as shown in figure 1 a. The columnar crystals are arranged regularly, the coating at a position 58 mm-70 mm away from the origin also presents a quasi-columnar crystal structure, but some liquid drops and particles are found, the average thickness of the coating in the area is 76 mu m, and the difference of the average thickness of the coating in the area and the thickness of the coating in the central area is not large, as shown in figure 1 b. The utilization rate of the plasma jet can reach 83 percent.
And under the condition of the same other conditions, the ceramic coating sample is obtained under the original mature process parameters of vacuum degree of 2mbar, spraying power of 100kW, spraying current of 2000A, Ar gas and He gas flow of 30L/min and 60L/min respectively, powder conveying speed of 10g/min, Ar gas flow of powder conveying carrier gas of 12L/min, spraying distance of 1200mm, workpiece rotation speed of 0rpm, spray gun immobilization and matrix preheating temperature of 850-900 ℃, and is analyzed and found. Under the process parameters, the diameter of the jet flow is about 160mm, the center of the jet flow is taken as an origin, and the distribution of the microstructure of the coating along the radial direction of the jet flow is observed. The coating in the central region (within 81mm from the origin) of the jet flow is a quasi-columnar structure coating, the columnar crystals are regularly and orderly arranged, and the average thickness of the coating in the region is 141 mu m, as shown in FIG. 2 a; although the coating at the position 81 mm-150 mm away from the origin point also has a quasi-columnar structure, the more droplets and particles in the coating, the closer to the edge of the jet, the more droplets and particles are, and the average thickness of the coating is only 41 μm, which is greatly different from the central area, as shown in fig. 2 b. The jet utilization was calculated to be about 50%.
Example 2
The YSZ ceramic layer is sprayed on the surface of a duplex guide blade of an aero-engine of a certain model by using PS-PVD, the design method is adopted respectively, the vacuum degree of a vacuum chamber, the spraying power of PS-PVD equipment and the spraying current are regulated and controlled to obtain 50-100 mm plasma jet to prepare the YSZ coating, and the jet utilization rate is analyzed, and the specifically adopted process steps comprise the following parameters:
(1) starting PS-PVD equipment, assembling a spraying blade, and closing a vacuum chamber;
(2) vacuumizing until the pressure of a vacuum chamber is 50 mbar;
(3) adjusting the spraying power to be 70kW and the spraying current to be 1000A;
(4) opening a working gas valve, striking an arc, and gradually adjusting the gas flow to the specified gas flow Ar: 20L/min, He: 40L/min, H2：10L/min，N2：10L/min；
(5) Setting the rotating speed of the blades to be 10rpm, preheating the blades by adopting plasma jet, and detecting the temperature of a matrix by using an infrared probe until the temperature of the blades reaches 850-900 ℃;
(6) regulating and controlling the powder feeding speed to be 5 g/min, the Ar gas flow of the powder feeding carrier gas to be 8L/min, the rotating speed of the blades to be 10rpm, and regulating the spraying distance to be 600 mm;
(7) and stopping powder feeding, extinguishing electric arc, cooling the vacuum chamber, releasing vacuum, and taking out the blade.
Meanwhile, under the condition of the same other conditions, the coated blade is obtained and analyzed and compared under the original mature process parameters that the vacuum degree is 2mbar, the spraying power is 100kW, the spraying current is 2000A, Ar, the gas flows of He and gas are respectively 30L/min and 60L/min, the powder conveying speed is 10g/min, the gas flow of Ar of the powder conveying carrier gas is 12L/min, the spraying distance is 1200mm, the rotating speed of a workpiece is 0rpm, the spray gun is not moved, and the preheating temperature of a matrix reaches 850-900 ℃.
The coating at different positions of the blade is selected for thickness analysis to evaluate the uniformity of the deposited coating on the surface of the blade, the blade is dissected for accurate measurement results, and the thickness of the coating is observed and measured under a metallographic microscope. 3 sections are selected at the blade body position for dissection and are respectively positioned at the positions of 20%, 50% and 80% of the blade body height, 7 points are selected at each section position, and the average value is taken to obtain the thickness of a certain section. The results are as follows:
table 1 shows the thickness of the thermal barrier coating at different sections of the blade sprayed by the original mature process. It can be seen that the thickness of the coating on the blade sprayed by the original mature process is not uniform, the coating at the section with the blade body height of 50% is thicker, and the coating at the sections with the blade body height of 20% and 80% is thinner, which is 48-60 μm different from the thickness at the section with the blade body height of 50%.
Table 2 shows the thickness of the thermal barrier coating at different sections of the blade sprayed by the process designed by the present invention. As can be seen from the data in the table, the difference of the thickness of the coating at each section of the blade sprayed by the optimal process is only 35-44 μm, so that the uniformity of the thickness of the sprayed coating is obviously improved compared with the prior mature process.
TABLE 1 thermal barrier coating thickness at different sections of blade sprayed by original mature process
| Average thickness (μm) | 20% of the blade body section | 50% of the blade body section | 80% of the blade body section |
| Blade 1 | 131 | 179 | 134 |
| Blade 2 | 110 | 169 | 112 |
TABLE 2 thermal barrier coating thickness at different sections of blade sprayed by the process designed by the present invention
| Average thickness (μm) | 20% of the blade body section | 50% of the blade body section | 80% of the blade body section |
| Blade 1 | 145 | 180 | 147 |
| Blade 2 | 130 | 173 | 129 |
In addition, as mentioned above, since the plasma jet of PS-PVD still distributes some liquid phase particles and particles of non-melted solid phase, the state and distribution difference of these particles in the plasma jet still cause the difference of coating structure, thickness, etc. on the surface of the workpiece, and also affect the coating performance. In order to further improve the structural and thickness uniformity of a thermal barrier coating on the surface of a workpiece and improve the deposition rate of gas-phase particles, the invention can also adopt another optimized implementation mode, namely, when the PS-PVD equipment is started in the step (1), the sprayed workpiece is assembled, and the vacuum chamber is closed, a concentric ring type shielding device is assembled at the front end of the plasma spray gun, wherein the concentric ring type shielding device comprises a first concentric ring and a second concentric ring, the first concentric ring comprises a first outer ring and a first inner ring, and the second concentric ring comprises a second outer ring and a second inner ring; the projections of the first outer ring, the first inner ring, the second outer ring and the second inner ring on the surface vertical to the PS-PVD jet flow direction are mutually connected without gaps, and the first outer ring, the first inner ring, the second outer ring and the second inner ring are alternately arranged along the PS-PVD jet flow direction in a staggered mode, namely gaps are reserved between the first outer ring and the second outer ring, between the second outer ring and the first inner ring, and between the first inner ring and the second inner ring; the inner part of the second inner ring is hollow and is not shielded; the width of the hollow area in the second inner ring is 1/3-1/2 of the cross section diameter of the plasma jet; the width relationship of each concentric ring is: the second inner ring is larger than the first inner ring and smaller than the second outer ring and smaller than the first outer ring; the first concentric ring and the second concentric ring are assembled with the outermost connecting part and are installed on the integral device through the connecting part; the width of the connecting part at the outermost side of the shielding device is larger than or equal to the diameter of the plasma jet. The concentric ring type shielding device is fixed at the front part of the plasma spray gun and moves along with the plasma spray gun. In the actual spraying process in the step (5), the jet flow basically composed of gas phase particles passes through the hollow position in the second inner ring at the central position of the jet flow without obstacles, the shielding device shields liquid phase particles and solid phase particles in the jet flow at the position close to the edge of the jet flow, and the gas phase particles pass through the gaps between the concentric rings to ensure that the deposition process is always gas phase deposition. Not only can ensure the filtration of harmful phases, but also can ensure the good deposition rate of the coating. The deposited workpiece surface coating has consistent structure and uniform thickness.
The above applications are but a few of the embodiments of the present application. It will be apparent to those skilled in the art that various changes and modifications can be made without departing from the inventive concept herein, and it is intended to cover all such modifications and variations as fall within the scope of the invention.
Claims (8)
1. A coating preparation method for realizing high-efficiency operation of PS-PVD equipment comprises the following steps:
(1) starting PS-PVD equipment, assembling a spraying workpiece, and closing a vacuum chamber;
(2) vacuumizing the vacuum chamber, adjusting the spraying power of the PS-PVD equipment, and regulating and controlling the spraying current;
(3) opening a working gas valve, striking an arc, and gradually adjusting the gas flow to the specified gas flow after the arc is stabilized; the working gas is Ar, He or H2、N2The gas flow rate of the mixed gas is 10-30L/min, He: 0 to 60L/min, H2：0~50L/min，N2：0~50L/min；
(4) Adjusting the rotating speed of a workpiece to be 0-30rpm, preheating blades by adopting plasma jet, and detecting the temperature of a matrix by using an infrared probe until the temperature of the matrix reaches 800-950 ℃;
(5) regulating and controlling the powder feeding speed to be 5-20 g/min, regulating the flow of Ar gas of powder feeding carrier gas to be 8-15L/min, regulating the rotating speed of a workpiece to be 0-30rpm, and regulating the spraying distance to be 500-800 mm;
(6) stopping powder feeding, extinguishing electric arc, cooling the vacuum chamber, releasing vacuum, and taking out the sample to obtain the ceramic coating with the quasi-columnar structure after preparation;
the method is characterized in that in the step (2), the diameter of the plasma jet is 50-100 mm by regulating and controlling the vacuum degree of the vacuum chamber, the spraying power of the PS-PVD equipment and the spraying current, and specifically, the parameters meet the following conditions:
wherein:
in the formula:Vis the vacuum degree of the vacuum chamber, and the unit is mbar,V 0the reference vacuum degree is 2mbar,Pthe total power of spraying is applied to the PS-PVD equipment,P 0the unit is kW, the reference total power is 100kW,Iis the current of the PS-PVD equipment, with the unit of A,I 0the reference current is 2000A;
the utilization rate of the plasma jet is 75-85%.
2. The method for preparing a coating for realizing high-efficiency operation of PS-PVD equipment as recited in claim 1, wherein in the step (2), the specific parameters are selected as follows: the vacuum chamber pressure was 50mbar, the spraying power was 70kW and the spraying current was 1000A.
3. The method for preparing a coating layer for realizing high-efficiency operation of a PS-PVD apparatus as recited in claim 1 or 2, wherein the flow rate of the working gas in the step (3) is Ar: 20L/min, He: 40L/min, H2：10L/min，N2：10L/min。
4. The method for preparing a coating to realize high-efficiency operation of PS-PVD equipment as recited in claim 1, wherein in the step (4), the spraying time is determined according to the thickness of the coating to be prepared.
5. The method for preparing the coating for realizing the high-efficiency operation of the PS-PVD equipment as recited in claim 1, wherein in the step (5), the powder feeding rate is 5 g/min, and the flow rate of the powder feeding carrier gas Ar gas is 8L/min.
6. The method for preparing a coating for realizing high-efficiency operation of the PS-PVD equipment as recited in claim 1, further comprising the steps of preparing a high-temperature alloy substrate, pre-treating the substrate and preparing a bonding layer on the substrate before starting the PS-PVD equipment.
7. The method as claimed in claim 6, wherein the bonding layer is PtAl, modified PtAl, NiCoCrAlY or NiCoCrAlYX bonding layer, and X is one or more of Hf, Ta and Si; the PtAl and modified PtAl bonding layers are prepared by adopting an electroplating and gas-phase infiltration method, and the NiCoCrAlY or NiCoCrAlYX bonding layer is prepared by adopting a low-pressure plasma spraying method or a supersonic spraying method.
8. The method of claim 1 or 2, wherein the quasi-columnar ceramic coating is YSZ: ZrO (ZrO)2And 6 to 8 wt% of Y2O3；GYb-YSZ：5~10mol%Gd2O3And Yb2O3Co-doped YSZ; r2Zr2O7R is La, Gd, Eu, Sm orNd and modified material thereof, and La2Ce2O7And a modified material thereof.
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