CN114062076A - Sample preparation method for copper foil crystal analysis - Google Patents

Sample preparation method for copper foil crystal analysis Download PDF

Info

Publication number
CN114062076A
CN114062076A CN202111298990.8A CN202111298990A CN114062076A CN 114062076 A CN114062076 A CN 114062076A CN 202111298990 A CN202111298990 A CN 202111298990A CN 114062076 A CN114062076 A CN 114062076A
Authority
CN
China
Prior art keywords
copper foil
sample
crystal
foil sample
analysis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202111298990.8A
Other languages
Chinese (zh)
Inventor
李红琴
杨红光
金荣涛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jiujiang Defu Technology Co Ltd
Original Assignee
Jiujiang Defu Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jiujiang Defu Technology Co Ltd filed Critical Jiujiang Defu Technology Co Ltd
Priority to CN202111298990.8A priority Critical patent/CN114062076A/en
Publication of CN114062076A publication Critical patent/CN114062076A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/28Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/286Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q involving mechanical work, e.g. chopping, disintegrating, compacting, homogenising
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/28Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/32Polishing; Etching
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/28Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/286Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q involving mechanical work, e.g. chopping, disintegrating, compacting, homogenising
    • G01N2001/2873Cutting or cleaving

Abstract

The invention discloses a sample preparation method for copper foil crystal analysis, which comprises the following steps: s1 shearing a copper foil sample; s2 polishing the surface of the copper foil sample, and S3 corroding the surface of the copper foil sample. The sample preparation method is simple and convenient to operate, copper foil crystal grains can be rapidly etched, the crystal profile of copper can be obviously displayed, the prepared sample can visually analyze the crystal grain size on the surface of the copper foil and observe the growth direction of the crystal grains under a crystal phase microscope, a tungsten filament and other low-end scanning electron microscopes, the crystal grains with different component contrasts can be observed under a back scattering electron probe for element analysis and phase-aware two-dimensional distribution, the microscopic crystal grain size, the crystal lattice orientation, the crystal boundary and the residual stress of the copper foil can be counted under an electron back scattering diffraction analysis technical device, and a foundation is further laid for the microscopic crystal analysis of the copper foil material.

Description

Sample preparation method for copper foil crystal analysis
Technical Field
The invention relates to the technical field of copper foil crystal observation and analysis, in particular to a sample preparation method for copper foil crystal analysis.
Background
The copper foil is a key basic raw material for manufacturing Copper Clad Laminate (CCL), Printed Circuit Board (PCB) and lithium battery cathode materials. With the arrival of the 5G information era and the rapid development of new energy automobiles, the electrolytic copper foil industry in China is developed dramatically, which is attributed to the constant research on the principle of electrolytic copper foil by copper foil research personnel. The electrolytic copper foil is prepared by taking a copper material as a main raw material, dissolving the copper material to prepare a copper sulfate electrolytic solution, then carrying out direct current electro-deposition on the copper sulfate electrolytic solution in a special electrolytic device to prepare a foil, carrying out a series of treatments such as surface roughening, anti-oxidation treatment and the like on the foil, and finally carrying out slitting detection on the foil to prepare a finished product. In recent years, based on the recognition of the electrolytic principle, researchers have gradually found that copper foil crystal research is the basis of copper foil process principle research. Therefore, more specialized sample preparation methods for copper foil crystal analysis are urgently needed to be developed.
Ion milling (Ion Mill) as an Ion beam cutting polishing system fabricated using the tip technology provides reliable, high performance sample preparation capability. Ion Mill bombards the surface of a sample under the action of electric field acceleration after ionization of argon, and physically sputters and bombards the surface of the sample in a momentum transfer mode, so that the surface of the sample is finely polished, and the sample preparation requirements of surface sensitive analysis technologies such as a high-magnification scanning electron microscope and EBSD are met.
Currently, reports on preparation methods of copper foil crystal analysis samples are still few.
Disclosure of Invention
In view of the above technical problems in the related art, the present invention provides a sample preparation method for copper foil crystal analysis, which can overcome the above disadvantages in the prior art.
In order to achieve the technical purpose, the technical scheme of the invention is realized as follows:
a sample preparation method for copper foil crystal analysis comprises the following steps:
s1 clipping a copper foil sample: shearing a copper foil sample according to the size of the sample table;
s2, polishing the surface of the copper foil sample, namely putting the copper foil sample into an ion beam cutting polisher, setting parameters of the ion beam cutting polisher, and polishing the copper foil sample;
s3, corroding the surface of the copper foil sample, namely taking out the polished copper foil sample, dipping a cotton swab in corrosive liquid to wipe the surface of the copper foil sample for 2 seconds, and blowing the copper foil sample dry after flushing with running water.
Further, the size of the copper foil sample cut in S1 is 0.5CM in length and 0.5CM in width.
Further, the parameters of the ion beam cutting polisher set in the step S2 are specifically set as a plane sample, the voltage is 8KV, the ion source deflection angle is 6 degrees, and the time is 60 minutes; then the voltage is switched to 2KV, the deflection angle of the ion source is 2 degrees, and the time is 30 minutes; and finally, switching to a section sample, wherein the voltage is 8KV, the ion source deflection angle is 0 DEG, and the time is 20 minutes.
Further, the etching solution in S3 is a solution prepared from a saturated ammonium cupric chloride solution and a saturated ferric chloride solution.
The invention has the beneficial effects that: the sample preparation method is simple and convenient to operate, copper foil crystal grains can be quickly etched, the crystal outline of copper can be obviously displayed, the prepared sample can visually analyze the crystal grain size on the surface of the copper foil and observe the growth direction of the crystal grains under a crystalline phase microscope, a tungsten filament and other low-end scanning electron microscopes, the crystal grains with different component contrasts can be observed under a back scattering electron probe for element analysis and phase-knowing two-dimensional distribution, the microscopic crystal grain size, the lattice orientation, the crystal boundary and the residual stress of the copper foil can be counted under an electron back scattering diffraction analysis technical device, and a foundation is further laid for the microscopic crystal analysis of the copper foil material.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.
FIG. 1 is a graph showing the effects of polishing and etching on a copper foil sample according to a sample preparation method according to an embodiment of the present invention: (1) observation of the crystalline phase of the polished and etched copper foil sample, (2) SEM observation of the polished and etched copper foil sample;
FIG. 2 is a graph showing the effect of a copper foil sample polished according to a sample preparation method of an embodiment of the present invention: (1) BSE observation of the polished copper foil samples, (2) EBSD analysis effect of the polished copper foil samples.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments that can be derived by one of ordinary skill in the art from the embodiments given herein are intended to be within the scope of the present invention.
The sample preparation method for the copper foil crystal analysis comprises the following steps:
s1 clipping a copper foil sample: shearing a copper foil sample according to the size of the sample table;
s2, polishing the surface of the copper foil sample, namely putting the copper foil sample into an ion beam cutting polisher, setting parameters of the ion beam cutting polisher, and polishing the copper foil sample;
s3, corroding the surface of the copper foil sample, namely taking out the polished copper foil sample, dipping a cotton swab in corrosive liquid to wipe the surface of the copper foil sample for 2 seconds, and blowing the copper foil sample dry after flushing with running water.
The dimensions of the copper foil sample cut in S1 described above were 0.5CM in length and 0.5CM in width.
The parameters of the ion beam cutting polisher set in the above S2 are specifically set as a plane sample, voltage 8KV, ion source deflection angle 6 °, time 60 minutes; then the voltage is switched to 2KV, the deflection angle of the ion source is 2 degrees, and the time is 30 minutes; and finally, switching to a section sample, wherein the voltage is 8KV, the ion source deflection angle is 0 DEG, and the time is 20 minutes.
The etching solution in S3 is a solution prepared from a saturated ammonium cupric chloride solution and a saturated ferric chloride solution.
In order to facilitate understanding of the above-described technical aspects of the present invention, the above-described technical aspects of the present invention will be described in detail below in terms of specific usage.
When the copper foil sample is used specifically, a copper foil sample is firstly sheared, the surface of the copper foil sample is polished by an ion beam cutting polisher, then the surface of the copper foil sample is corroded for 2 seconds by a solution prepared from a saturated ammonium copper chloride solution and a saturated ferric chloride solution, the copper foil sample is dried by blowing after running water washing, then the copper foil sample is observed and measured under a crystal phase microscope, and further observed and analyzed under a scanning electron microscope according to analysis requirements.
In summary, as shown in fig. 1-2, with the aid of the above technical solutions of the present invention, the operation is simple and convenient, copper foil grains can be rapidly etched, so that the crystal profile of copper can be clearly shown, the prepared sample can visually analyze the grain size and the grain growth direction on the surface of the copper foil under a crystal phase microscope, a tungsten filament and other low-end scanning electron microscopes, can observe grains with different component contrast for element analysis and phase-aware two-dimensional distribution under a backscattered electron probe, and can count the microscopic grain size, lattice orientation, grain boundary and residual stress of the copper foil under an electron backscattered diffraction analysis technical device, thereby further laying a foundation for the analysis of the microscopic crystals of the copper foil material.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.

Claims (4)

1. A sample preparation method for copper foil crystal analysis is characterized by comprising the following steps:
s1 clipping a copper foil sample: shearing a copper foil sample according to the size of the sample table;
s2, polishing the surface of the copper foil sample, namely putting the copper foil sample into an ion beam cutting polisher, setting parameters of the ion beam cutting polisher, and polishing the copper foil sample;
s3, corroding the surface of the copper foil sample, namely taking out the polished copper foil sample, dipping a cotton swab in corrosive liquid to wipe the surface of the copper foil sample for 2 seconds, and blowing the copper foil sample dry after flushing with running water.
2. The method for preparing a sample according to claim 1, wherein the size of the copper foil sample cut in S1 is 0.5CM in length and 0.5CM in width.
3. The sample preparation method according to claim 1, wherein the parameters of the ion beam cutting polisher set in S2 are specifically set as a planar sample, voltage 8KV, ion source deflection angle 6 degrees, time 60 minutes; then the voltage is switched to 2KV, the deflection angle of the ion source is 2 degrees, and the time is 30 minutes; and finally, switching to a section sample, wherein the voltage is 8KV, the ion source deflection angle is 0 DEG, and the time is 20 minutes.
4. The method according to claim 1, wherein the etching solution in S3 is a solution prepared from a saturated ammonium cupric chloride solution and a saturated ferric chloride solution.
CN202111298990.8A 2021-11-04 2021-11-04 Sample preparation method for copper foil crystal analysis Pending CN114062076A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202111298990.8A CN114062076A (en) 2021-11-04 2021-11-04 Sample preparation method for copper foil crystal analysis

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202111298990.8A CN114062076A (en) 2021-11-04 2021-11-04 Sample preparation method for copper foil crystal analysis

Publications (1)

Publication Number Publication Date
CN114062076A true CN114062076A (en) 2022-02-18

Family

ID=80273792

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202111298990.8A Pending CN114062076A (en) 2021-11-04 2021-11-04 Sample preparation method for copper foil crystal analysis

Country Status (1)

Country Link
CN (1) CN114062076A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115728194A (en) * 2022-11-21 2023-03-03 山东大学 Method for detecting crystal grain morphology of copper foil section

Citations (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1163318A (en) * 1996-01-16 1997-10-29 三井金属矿业株式会社 Electrolytic copper foil for printed circuit board and its producing method
JP2003338676A (en) * 2002-05-20 2003-11-28 Mec Kk Method of manufacturing copper wiring board
JP2004340851A (en) * 2003-05-19 2004-12-02 Sumitomo Metal Mining Co Ltd Sample polishing method
CN101701886A (en) * 2009-11-09 2010-05-05 宁波江丰电子材料有限公司 Metallographical corrosive, method for eroding copper and method for displaying metallographical organization of copper
JP2013053362A (en) * 2011-09-06 2013-03-21 Mitsubishi Materials Corp Copper foil for forming circuit superior in etching property, and copper-clad laminate plate using the same and printed wiring board
CN103472265A (en) * 2013-09-02 2013-12-25 复旦大学 Method for observing TSV (through-silicon-via) copper crystalline grains
US20170170130A1 (en) * 2015-12-10 2017-06-15 Shinko Electric Industries Co., Ltd. Wiring board, semiconductor package, and semiconductor device
CN107017218A (en) * 2015-12-02 2017-08-04 新光电气工业株式会社 Lead frame, electronic component device and their manufacture method
CN107478668A (en) * 2017-08-15 2017-12-15 合肥工业大学 A kind of preparation method of heterogeneous alloy EBSD analyses test sample
CN108461470A (en) * 2017-02-17 2018-08-28 新光电气工业株式会社 Lead frame
CN109580315A (en) * 2017-09-29 2019-04-05 富士康(昆山)电脑接插件有限公司 The method for displaying metallographic structure of metallographic etching agent, copper and copper alloy
CN110618009A (en) * 2019-10-30 2019-12-27 无锡隆达金属材料有限公司 Method for microcosmic metallographic corrosion of cupronickel alloy
CN111748840A (en) * 2020-07-10 2020-10-09 四川中雅科技有限公司 Electrode foil and electrochemical polishing device and method for metallographic phase of electrode foil
CN211947224U (en) * 2020-04-23 2020-11-17 苏州华锋环保技术有限公司 Extraction system of alkaline etching solution
CN112198178A (en) * 2020-08-25 2021-01-08 合肥国轩高科动力能源有限公司 Method for processing powder sample for argon ion beam cutting
CN112858362A (en) * 2021-01-08 2021-05-28 重庆大学 Preparation method of micron-sized spherical particle section for electron microscope observation
CN113106455A (en) * 2021-05-08 2021-07-13 九江德福科技股份有限公司 Etching solution for copper foil microanalysis and preparation method and etching method thereof
CN113447339A (en) * 2021-06-24 2021-09-28 深圳市美信咨询有限公司 Preparation method of sample for analyzing copper crystal grains of PCB hole

Patent Citations (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1163318A (en) * 1996-01-16 1997-10-29 三井金属矿业株式会社 Electrolytic copper foil for printed circuit board and its producing method
JP2003338676A (en) * 2002-05-20 2003-11-28 Mec Kk Method of manufacturing copper wiring board
JP2004340851A (en) * 2003-05-19 2004-12-02 Sumitomo Metal Mining Co Ltd Sample polishing method
CN101701886A (en) * 2009-11-09 2010-05-05 宁波江丰电子材料有限公司 Metallographical corrosive, method for eroding copper and method for displaying metallographical organization of copper
JP2013053362A (en) * 2011-09-06 2013-03-21 Mitsubishi Materials Corp Copper foil for forming circuit superior in etching property, and copper-clad laminate plate using the same and printed wiring board
CN103472265A (en) * 2013-09-02 2013-12-25 复旦大学 Method for observing TSV (through-silicon-via) copper crystalline grains
CN107017218A (en) * 2015-12-02 2017-08-04 新光电气工业株式会社 Lead frame, electronic component device and their manufacture method
US20170170130A1 (en) * 2015-12-10 2017-06-15 Shinko Electric Industries Co., Ltd. Wiring board, semiconductor package, and semiconductor device
CN108461470A (en) * 2017-02-17 2018-08-28 新光电气工业株式会社 Lead frame
CN107478668A (en) * 2017-08-15 2017-12-15 合肥工业大学 A kind of preparation method of heterogeneous alloy EBSD analyses test sample
CN109580315A (en) * 2017-09-29 2019-04-05 富士康(昆山)电脑接插件有限公司 The method for displaying metallographic structure of metallographic etching agent, copper and copper alloy
CN110618009A (en) * 2019-10-30 2019-12-27 无锡隆达金属材料有限公司 Method for microcosmic metallographic corrosion of cupronickel alloy
CN211947224U (en) * 2020-04-23 2020-11-17 苏州华锋环保技术有限公司 Extraction system of alkaline etching solution
CN111748840A (en) * 2020-07-10 2020-10-09 四川中雅科技有限公司 Electrode foil and electrochemical polishing device and method for metallographic phase of electrode foil
CN112198178A (en) * 2020-08-25 2021-01-08 合肥国轩高科动力能源有限公司 Method for processing powder sample for argon ion beam cutting
CN112858362A (en) * 2021-01-08 2021-05-28 重庆大学 Preparation method of micron-sized spherical particle section for electron microscope observation
CN113106455A (en) * 2021-05-08 2021-07-13 九江德福科技股份有限公司 Etching solution for copper foil microanalysis and preparation method and etching method thereof
CN113447339A (en) * 2021-06-24 2021-09-28 深圳市美信咨询有限公司 Preparation method of sample for analyzing copper crystal grains of PCB hole

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
何东禹 等: "高密度封装基板镀层酸蚀针孔的形成机理及优化方案的研究", 《复旦学报(自然科学版)》, vol. 59, no. 01, pages 83 - 89 *
何东禹;俞宏坤;罗光淋;欧宪勋;程晓玲;: "高密度封装基板镀层酸蚀针孔的形成机理及优化方案的研究", 复旦学报(自然科学版), no. 01 *
宋瑞利 等: "铜箔表面形貌对CVD法生长石墨烯质量的影响", 《材料研究学报》, vol. 30, no. 4, pages 255 - 262 *
宋瑞利;刘平;张柯;刘新宽;陈小红: "铜箔表面形貌对CVD法生长石墨烯质量的影响", 材料研究学报, no. 004 *
陈文博: "加工工艺及氧含量对石墨烯用压延铜箔的影响", 《中国优秀硕士学位论文全文数据库 工程科技Ⅰ辑》, vol. 2018, pages 015 - 91 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115728194A (en) * 2022-11-21 2023-03-03 山东大学 Method for detecting crystal grain morphology of copper foil section

Similar Documents

Publication Publication Date Title
CN109900727B (en) Preparation method of ultralow-temperature weak current control metal material EBSD sample
Man et al. Study of cyclic strain localization and fatigue crack initiation using FIB technique
CN114062076A (en) Sample preparation method for copper foil crystal analysis
US9496477B2 (en) Method for producing substrates for superconducting layers
CN103132039B (en) Metallic film preparation method
CN108470777B (en) Preparation method of material testing unit with nano-scale interval small electrodes for in-situ power-on chip of transmission electron microscope
CN105259002B (en) A kind of preparation method of high magnetic induction grain-oriented silicon steel EBSD samples
CN103226074A (en) Cu-Ni alloy electro-polishing method used for EBSD test
CN102435485B (en) Sample preprocessing method of impurities in steel for scanning electron microscope observation
Blum et al. Atom probe sample preparation
JP5942873B2 (en) Method for producing thin sample and method for observing sample
Sanchez et al. Lithium stripping: anisotropic evolution and faceting of pits revealed by operando 3-D microscopy
Ünlü Preparation of high quality Al TEM specimens via a double-jet electropolishing technique
Citrin et al. From ion to atom to dendrite: Formation and nanomechanical behavior of electrodeposited lithium
Karim et al. Diameter dependent failure current density of gold nanowires
CN108439375A (en) The method of copper foil directional etching when being shifted for graphene
CN101211697A (en) Electrolytic capacitor aluminum foil oxidation film stripping liquid and microscopic appearance measurement method
CN109580684A (en) A kind of battery diaphragm method for making sample for scanning electron microscope detection
JP2002122524A (en) Method of making sample for transmission electron microscope
Tkadletz et al. Efficient preparation of microtip arrays for atom probe tomography using fs-laser processing
McSweeney et al. Fabrication and characterization of single-crystal metal-assisted chemically etched rough Si nanowires for lithium-ion battery anodes
CN111254439A (en) Method for preparing tungsten needle tip electrode based on electric field evaporation and implementation device thereof
JP2000310585A (en) Formation for thin film sample for transmission type electron microscopic observation
McConohy et al. Mechanical origins of lithium-metal intrusions into garnet solid electrolytes revealed by failure statistics
Kuwano et al. TEM sample preparation for microcompressed nanocrystalline Ni

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination