CN114047732B - Butterfly valve intelligent control method and system for silicon carbide epitaxial process - Google Patents
Butterfly valve intelligent control method and system for silicon carbide epitaxial process Download PDFInfo
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- CN114047732B CN114047732B CN202111347402.5A CN202111347402A CN114047732B CN 114047732 B CN114047732 B CN 114047732B CN 202111347402 A CN202111347402 A CN 202111347402A CN 114047732 B CN114047732 B CN 114047732B
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- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
- G05B19/41885—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM] characterised by modeling, simulation of the manufacturing system
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- G—PHYSICS
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- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32339—Object oriented modeling, design, analysis, implementation, simulation language
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
Abstract
The invention discloses a butterfly valve intelligent control method and a butterfly valve intelligent control system for a silicon carbide epitaxial process, wherein the method comprises the following steps: s01, acquiring butterfly valve opening historical data under the same process condition in historical process data; s02, predicting butterfly valve opening trend data in the current process state based on butterfly valve opening historical data change trend; s03, based on butterfly valve opening trend data, when the pressure is within a preset threshold range, adjusting the butterfly valve opening according to a preset period to realize low-frequency intelligent control of the butterfly valve opening; and S04, when the pressure exceeds a preset threshold value, immediately switching into a normal pressure control mode, and repeating the steps S01-S03 after the pressure is stabilized. The butterfly valve has low switching frequency, can reduce the cost consumption of relevant parts of the butterfly valve such as the sealing ring and the like, and improves the maintenance period of equipment.
Description
Technical Field
The invention mainly relates to the field of silicon carbide material preparation, in particular to an intelligent butterfly valve control method and system for a silicon carbide epitaxial process.
Background
The development of SiC devices in the large-size, ultra-high voltage and large current directions presents great challenges to the epitaxial layer fabrication techniques, including ultra-thick epitaxial layer growth, large-size and high uniformity. Numerous studies have shown that the growth quality and pressure control of epitaxial layers are indispensible. Pressure is one of the most important parameters in the epitaxial growth process, and whether the pressure is stable or not directly influences the quality of an epitaxial growth layer, so that a butterfly valve is generally adopted in the industry to realize quick and accurate control of the pressure. However, due to the characteristics of high temperature, strong corrosion, high flow rate gas and the like of the epitaxial process, the butterfly valve sealing ring is easy to damage, and the maintenance period is short (about 1000 um), so that the normal use of epitaxial equipment is greatly restricted. The butterfly valve is usually controlled by adopting a pressure control mode, namely, the butterfly valve controller is used for automatically adjusting the opening degree of the butterfly valve in a PID mode, the applicant finds that the opening and closing actions in the pressure adjustment mode are frequent in a stable state, but the adjustment amplitude is small, the frequent opening degree adjustment often causes quicker loss of service life (such as damage of a sealing ring), and the frequent action is because:
the epitaxy process has the characteristics of high temperature, strong corrosion, high flow rate gas and the like, so that the pressure value in the cavity is in a high-frequency fluctuation change state all the time. Butterfly valves (in cooperation with process pumps) are the only control devices that maintain pressure in the chamber stable, and in order to maintain pressure stability, the butterfly valves need to maintain a relatively high frequency (low amplitude) opening switching to achieve a relatively stable chamber pressure. Therefore, in the adjusting process, the valve plate of the butterfly valve is in a high-frequency abrasion contact state with the sealing ring, so that the sealing ring needs to be replaced periodically in a shorter period.
In addition, the applicant also found that, in the process of implementing the present invention, since the epitaxy process has the characteristic of relatively constant process parameters, the process parameters (such as gas flow) have repeatability in a certain range, and meanwhile, the butterfly valve opening value has certain regularity in trend, and the following is briefly analyzed:
(1) The technological process is briefly described: the butterfly valve is always operated in a pressure control mode. The epitaxial process start time is denoted as time Z0. At the moment Z0, the gas a, the gas b and the gas c with fixed flow are introduced into the chamber, and the butterfly valve is switched in a large scale on-off action due to the change of the gas flow in the chamber; after the pressure value of the chamber reaches relatively stable, at time 0, the butterfly valve starts to maintain the opening degree adjustment of high frequency and low amplitude, so as to maintain the pressure stable, and at time 100s, the gas a, the gas b and the gas c are stopped from being introduced into the chamber, and the process is ended.
The process is repeated for more than 50 times in practical application, and in each process, the equipment can accurately record the data such as the pressure value, the butterfly valve opening value, the process parameters and the like at each moment, and store the data in a database for data mining and screening.
(2) Regularity of butterfly valve opening value:
as shown in fig. 1, the abscissa represents time, the ordinate represents an opening value, and in the process batch a, the butterfly valve opening value is 20% on average, and after a plurality of batches of processes, the butterfly valve needs to be opened more in order to maintain the same pressure due to abrasion of the butterfly valve sealing ring, and the butterfly valve opening value is 30% on average in the process batch B. Similarly, after a plurality of processes, the opening value of the butterfly valve reaches 40% in the process batch C. Thus, the opening value of the butterfly valve has a tendency to gradually increase during a continuous, repeated process. It should be noted that after the wear degree of the seal ring exceeds the critical value, the opening degree of the butterfly valve cannot be adjusted to enable the pressure to be stabilized at the target value, and at the moment, the pressure control mode fails, and the seal ring needs to be replaced.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: aiming at the problems existing in the prior art, the invention provides a butterfly valve intelligent control method and a butterfly valve intelligent control system for a silicon carbide epitaxial process, which are regulated at low frequency.
In order to solve the technical problems, the technical scheme provided by the invention is as follows:
an intelligent butterfly valve control method for a silicon carbide epitaxy process comprises the following steps:
s01, acquiring butterfly valve opening historical data under the same process condition in historical process data;
s02, predicting butterfly valve opening trend data in the current process state based on butterfly valve opening historical data;
s03, based on butterfly valve opening trend data, when the pressure is within a preset threshold range, adjusting the butterfly valve opening according to a preset period to realize low-frequency intelligent control of the butterfly valve opening;
and S04, when the pressure exceeds a preset threshold value, immediately switching into a normal pressure control mode, and repeating the steps S01-S03 after the pressure is stabilized.
As a further improvement of the above technical scheme:
in step S02, butterfly valve opening trend data in the current process state is predicted by a time series prediction method.
In step S02, the specific process of predicting the butterfly valve opening trend data in the current process state by the time series prediction method is as follows:
s21, drawing according to historical butterfly valve opening data, and observing whether the butterfly valve opening data is a stable time sequence or not; if the time sequence is the unbalanced time sequence, d-level differential operation is carried out to obtain a stable time sequence;
s22, fitting a differential autoregressive moving average model, and checking the model;
s23, predicting through a differential autoregressive moving average model to obtain a predicted opening value sequence, namely butterfly valve opening trend data.
In step S22, the process of fitting the differential autoregressive moving average model is as follows: respectively obtaining an autocorrelation coefficient ACF and a partial autocorrelation coefficient PACF of the stable time sequence to obtain an optimal level p and an optimal order q; and establishing a differential autoregressive moving average model based on a relative optimal model identification method through calculation.
In step S03, the predicted opening value sequence is converted into a low-frequency opening value sequence based on the predicted opening value sequence.
The predicted opening value sequence is converted into a low-frequency opening value sequence by means of extraction values at fixed time intervals or smoothing filtering.
The preset threshold is within +/-5% of a pressure standard value.
The invention also discloses an intelligent butterfly valve control system for the silicon carbide epitaxy process, which comprises:
the first program module is used for acquiring butterfly valve opening historical data under the same process condition in the historical process data;
the second program module is used for predicting butterfly valve opening trend data under the current process state based on butterfly valve opening historical data;
the third program module is used for adjusting the opening of the butterfly valve according to a preset period when the pressure is in a preset threshold range based on the butterfly valve opening trend data, so as to realize low-frequency intelligent control of the opening of the butterfly valve;
and the fourth program module is used for immediately switching into a normal pressure control mode when the pressure exceeds a threshold value, and repeating the process after the pressure is stabilized.
The invention further discloses a computer readable storage medium having stored thereon a computer program which, when run by a processor, performs the steps of the butterfly valve intelligent control method for silicon carbide epitaxy processes as described above.
The invention also discloses a computer device comprising a memory and a processor, wherein the memory stores a computer program which, when being run by the processor, executes the steps of the butterfly valve intelligent control method for the silicon carbide epitaxial process.
Compared with the prior art, the invention has the advantages that:
according to the control method, aiming at the characteristic that parameters are relatively constant in the epitaxial process, when the pressure of the silicon carbide epitaxial equipment is in a preset threshold value (normal stable state), the low-frequency adjustment is carried out on the opening of the butterfly valve according to a preset period (the opening of the butterfly valve is frequently adjusted in a normal stable state in a normal pressure control mode), so that the maintenance period and the service life of the butterfly valve are prolonged (the service life can be prolonged from 1000um to more than 2000 um), the cost consumption of relevant accessories of the butterfly valve such as a sealing ring is reduced, and the maintenance period of the equipment is prolonged.
Drawings
FIG. 1 is a time series diagram of the opening of a butterfly valve in different process lots according to the prior art.
Fig. 2 is a flowchart of a control method according to an embodiment of the present invention.
FIG. 3 is a flowchart of calculating current and future opening trend curves based on a time series prediction method in the present invention.
FIG. 4 is a sequence chart showing the increase of the opening value with the process batch under the same pressure parameter in the present invention.
Detailed Description
The invention is further described below with reference to the drawings and specific examples.
As shown in fig. 2, the intelligent butterfly valve control method for the silicon carbide epitaxy process in the embodiment of the invention specifically includes the following steps:
s01, digging butterfly valve opening historical data under the same process condition from a large amount of historical data of epitaxial processes by utilizing a data mining technology, wherein the butterfly valve opening historical data comprise opening variation trends, and the data are embodied in the form of curves or sequences;
s02, predicting butterfly valve opening trend data in the current process state based on butterfly valve opening historical data;
s03, based on butterfly valve opening trend data, when the pressure is in a preset threshold range, adjusting the butterfly valve opening according to a preset period, and realizing low-frequency intelligent control of the butterfly valve opening, namely an opening adjusting mode; the preset period is larger than the switching period of normal pressure control, so that the low-frequency opening degree adjustment is ensured;
and S04, when the pressure exceeds a threshold value, switching from the opening adjustment mode to a normal pressure control mode immediately, and repeating S01-S03 after the pressure is stabilized.
According to the control method, aiming at the characteristic that parameters are relatively constant in the epitaxial process, when the pressure of the silicon carbide epitaxial equipment is in a preset threshold value (normal stable state), the low-frequency adjustment is carried out on the opening of the butterfly valve according to a preset period (the opening of the butterfly valve is frequently adjusted in a normal stable state in a normal pressure control mode), so that the maintenance period and the service life of the butterfly valve are prolonged, the cost consumption of relevant accessories of the butterfly valve such as a sealing ring is reduced, and the maintenance period of the equipment is prolonged.
In a specific embodiment, in step S02, butterfly valve opening trend data in the current process state is predicted by a time series prediction method, and the specific process is as follows:
s21, drawing according to historical butterfly valve opening data, and observing whether the butterfly valve opening data is a stable time sequence or not; if the time sequence is the unbalanced time sequence, d-level differential operation is carried out to obtain a stable time sequence;
s22, fitting a differential autoregressive moving average model, and checking the model; the method comprises the following steps: respectively obtaining an autocorrelation coefficient ACF and a partial autocorrelation coefficient PACF of the stable time sequence to obtain an optimal level p and an optimal order q; through calculation, a differential autoregressive moving average model is established based on a relative optimal model identification method; then detecting the model again;
s23, predicting through a differential autoregressive moving average model to obtain a predicted opening value sequence, namely butterfly valve opening trend data.
The method of the present invention is further described in detail below by way of example of a differential autoregressive moving average model (ARIMA):
(1) Acquiring sequence data of an observed system;
and (3) digging historical data of the process batch and the butterfly valve opening value thereof under the same process condition from a large amount of historical process data by utilizing a data mining technology. Examples: as shown in the following table, 37 sets of data (N-37) to (N-1) were screened out.
Related description: (a) Process batches (N-37) through (N-1) refer to 37 batch process data prior to the nth batch process. Preferably, the number of the batches is larger than 30, and the process batches with the same process conditions and the same interval period are screened out through a data mining technology. For example, all process parameters for batch (N-3) should be the same as (N-2), (N-1), and batches should be (N-3), (N-2), (N-1) in order of occurrence, while the process run length of the butterfly valve between (N-3) and (N-2) should be equal to the process run length of the butterfly valve between (N-2) and (N-1);
(b) The process batch N is the currently running process batch, and X1 refers to the predicted opening value data at the time T;
(c) Process batches (n+1) - (n+4) refer to 4 batch processes after the nth batch process. Wherein X2, X3, X4, and X5 are predicted values of the opening degrees of the 4 batches at time T, respectively.
Taking the calculation of the opening predicted value (X1, X2,..once, X5) at time T as an example, the sequence data of the opening values of the process lots (N-37) to (N-1) at that time are obtained as follows:
(2) Fitting/predicting an opening trend curve in the current process state based on the obtained historical data. Preferably, a time series-based prediction method is used to calculate the current process state and the opening trend curve of the future 4 times of processes, and the calculation flow is shown in fig. 3, specifically:
the first step: plotting data, observing whether the data is a stable time sequence; d-order differential operation is firstly carried out on the non-stationary time sequence to obtain a stationary time sequence;
in the process of SiC epitaxy technology, the sealing ring is in a continuous abrasion state during the opening adjustment process of the butterfly valve. Therefore, under the same pressure parameter conditions, the opening of the butterfly valve appears to be increasing as the process batch increases, as shown in fig. 4.
The sequence time sequence diagram after the first order difference has relatively stable fluctuation near the mean value, the autocorrelation diagram has strong short-term correlation, and the p value is calculated to be smaller than 0.05. The sequence after the first difference is a plateau sequence.
And a second step of: a differential autoregressive moving average model (ARMA model for short) is fitted and the model is checked.
After the above first order difference processing, a stationary time series has been obtained. The optimal level p and the order q are obtained by respectively obtaining the autocorrelation coefficients ACF and the partial autocorrelation coefficients PACF of the stable time sequence. And (3) establishing an ARIMA (0, 1) model based on a relative optimal model identification method through calculation. The model was checked by calculation.
And thirdly, predicting by using the ARIMA model and storing a predicted opening value sequence.
Calculated to obtain [ X1, X2, X3, X4, X5] = [48.7,49.2,49.7,50.2,50.7]
The three steps are aimed at the predicted sequence of the moment T, and the predicted sequence of the rest moments can be obtained by calculation in the same way.
(3) And forming a time sequence according to the batch by the calculation result, and converting the time sequence into an opening sequence value of low frequency. Preferably, the values are decimated by interval fixed time intervals, or a smoothing filtering method is adopted.
For example, for lot N, a sequence of predicted opening values from time 0 to time 100 may be combined, as shown in the following table:
for conversion to a low frequency opening sequence, values may be extracted at intervals of 2 time units, e.g., values at time 0,1, 2 are all converted to values at time 0, and values at time 3, 4, 5 are all converted to values at time 3.
(4) The butterfly valve is switched from the normal pressure control mode to the opening adjustment mode at time 0 in accordance with the opening prediction sequence, and starts to execute the opening adjustment operation. Examples: according to the sequence of the foregoing steps, the butterfly valve adjusts the opening value once every 2 time units.
(5) And (3) correcting, if the pressure value exceeds a preset threshold value (for example, the standard value or the range of +/-5% of the set value) in the adjustment process, switching back to the pressure adjustment mode, and after the pressure is stabilized (for example, within +/-5% of the standard value or the set value), re-entering the opening adjustment mode and repeating the above process, wherein the specific adjustment process is shown in fig. 2.
The embodiment of the invention also discloses a butterfly valve intelligent control system for the silicon carbide epitaxial process, which comprises the following steps:
the first program module is used for acquiring butterfly valve opening historical data under the same process condition in the historical process data;
the second program module is used for predicting butterfly valve opening trend data under the current process state based on butterfly valve opening historical data;
the third program module is used for adjusting the opening of the butterfly valve according to a preset period when the pressure is in a preset threshold range based on the butterfly valve opening trend data, so as to realize low-frequency intelligent control of the opening of the butterfly valve;
and the fourth program module is used for immediately switching into a normal pressure control mode when the pressure exceeds a threshold value, and repeating the process after the pressure is stabilized.
The intelligent butterfly valve control system for the silicon carbide epitaxial process has the advantages similar to those of the control method.
The embodiment of the invention also discloses a computer readable storage medium, on which a computer program is stored, which when being run by a processor, performs the steps of the butterfly valve intelligent control method for silicon carbide epitaxy process. The embodiment of the invention further discloses a computer device, which comprises a memory and a processor, wherein the memory is stored with a computer program which, when being run by the processor, executes the steps of the butterfly valve intelligent control method for the silicon carbide epitaxial process. The present invention may be implemented by implementing all or part of the procedures in the methods of the embodiments described above, or by instructing the relevant hardware by a computer program, which may be stored in a computer readable storage medium, and which when executed by a processor, may implement the steps of the embodiments of the methods described above. Wherein the computer program comprises computer program code, which may be in the form of source code, object code, executable files or in some intermediate form, etc. The computer readable medium may include: any entity or device capable of carrying computer program code, a recording medium, a U disk, a removable hard disk, a magnetic disk, an optical disk, a computer Memory, a Read-Only Memory (ROM), a random access Memory (RAM, random Access Memory), an electrical carrier signal, a telecommunications signal, a software distribution medium, and so forth. The memory may be used to store computer programs and/or modules, and the processor performs various functions by executing or executing the computer programs and/or modules stored in the memory, and invoking data stored in the memory. The memory may include high-speed random access memory, and may also include non-volatile memory, such as a hard disk, memory, plug-in hard disk, smart Media Card (SMC), secure Digital (SD) Card, flash Card (Flash Card), at least one disk storage device, flash memory device, or other volatile solid state storage device, etc.
The above is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above examples, and all technical solutions belonging to the concept of the present invention belong to the protection scope of the present invention. It should be noted that modifications and adaptations to the invention without departing from the principles thereof are intended to be within the scope of the invention as set forth in the following claims.
Claims (7)
1. An intelligent butterfly valve control method for a silicon carbide epitaxial process is characterized by comprising the following steps:
s01, acquiring butterfly valve opening historical data under the same process condition in historical process data;
s02, predicting butterfly valve opening trend data in the current process state based on butterfly valve opening historical data;
s03, based on butterfly valve opening trend data, when the pressure is within a preset threshold range, adjusting the butterfly valve opening according to a preset period to realize low-frequency intelligent control of the butterfly valve opening;
s04, when the pressure exceeds a preset threshold value, immediately switching into a normal pressure control mode, and repeating S01-S03 after the pressure is stable;
in step S02, butterfly valve opening trend data in the current process state is predicted by a time sequence prediction method;
in step S02, the specific process of predicting the butterfly valve opening trend data in the current process state by the time series prediction method is as follows:
s21, drawing according to historical butterfly valve opening data, and observing whether the butterfly valve opening data is a stable time sequence or not; if the time sequence is the unbalanced time sequence, d-level differential operation is carried out to obtain a stable time sequence;
s22, fitting a differential autoregressive moving average model, and checking the model;
s23, predicting through a differential autoregressive moving average model to obtain a predicted opening value sequence, namely butterfly valve opening trend data;
in step S03, the predicted opening value sequence is converted into a low-frequency opening value sequence based on the predicted opening value sequence.
2. The intelligent butterfly valve control method for a silicon carbide epitaxy process according to claim 1, wherein in step S22, the process of fitting a differential autoregressive moving average model is: respectively obtaining an autocorrelation coefficient ACF and a partial autocorrelation coefficient PACF of the stable time sequence to obtain an optimal level p and an optimal order q; and establishing a differential autoregressive moving average model based on a relative optimal model identification method through calculation.
3. The intelligent control method for a butterfly valve for a silicon carbide epitaxy process according to claim 1, wherein the predicted opening value sequence is converted into the low-frequency opening value sequence by extracting values at fixed time intervals or smoothing filtering.
4. The intelligent butterfly valve control method for a silicon carbide epitaxy process according to any one of claims 1 to 3, wherein the preset threshold value is within ±5% of a standard pressure value.
5. A control system for implementing the intelligent control method of a butterfly valve for a silicon carbide epitaxy process according to any one of claims 1 to 4, comprising:
the first program module is used for acquiring butterfly valve opening historical data under the same process condition in the historical process data;
the second program module is used for predicting butterfly valve opening trend data under the current process state based on butterfly valve opening historical data;
the third program module is used for adjusting the opening of the butterfly valve according to a preset period when the pressure is in a preset threshold range based on the butterfly valve opening trend data, so as to realize low-frequency intelligent control of the opening of the butterfly valve;
and the fourth program module is used for immediately switching into a normal pressure control mode when the pressure exceeds a threshold value, and repeating the process after the pressure is stabilized.
6. A computer readable storage medium having stored thereon a computer program, which when run by a processor performs the steps of the butterfly valve intelligent control method for a silicon carbide epitaxy process according to any one of claims 1 to 4.
7. A computer device comprising a memory and a processor, the memory having stored thereon a computer program, characterized in that the computer program, when run by the processor, performs the steps of the butterfly valve intelligent control method for a silicon carbide epitaxy process as claimed in any one of claims 1 to 4.
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| CN116609052B (en) * | 2023-07-20 | 2023-09-26 | 天津银河阀门有限公司 | Butterfly valve operation data acquisition and analysis method based on wireless sensor |
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