CN114005570B - Apparatus and method for selective capture release of charge in vacuum - Google Patents
Apparatus and method for selective capture release of charge in vacuum Download PDFInfo
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- CN114005570B CN114005570B CN202111188222.7A CN202111188222A CN114005570B CN 114005570 B CN114005570 B CN 114005570B CN 202111188222 A CN202111188222 A CN 202111188222A CN 114005570 B CN114005570 B CN 114005570B
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- 238000000034 method Methods 0.000 title claims abstract description 15
- 239000002245 particle Substances 0.000 claims abstract description 77
- 230000003287 optical effect Effects 0.000 claims abstract description 57
- 230000005684 electric field Effects 0.000 claims abstract description 21
- 230000006698 induction Effects 0.000 claims abstract description 12
- 230000007935 neutral effect Effects 0.000 claims description 9
- 239000013307 optical fiber Substances 0.000 claims description 9
- 239000013077 target material Substances 0.000 claims description 4
- 230000001133 acceleration Effects 0.000 claims description 3
- 238000000605 extraction Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 230000005686 electrostatic field Effects 0.000 abstract description 2
- 210000002381 plasma Anatomy 0.000 description 106
- 239000003574 free electron Substances 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 238000012576 optical tweezer Methods 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/003—Manipulation of charged particles by using radiation pressure, e.g. optical levitation
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Abstract
The invention discloses a device and a method for selectively capturing and releasing charges in vacuum. The optical trap and the particles are positioned in the vacuum chamber, the particles are stably captured in the optical trap, and the grid electrode system conveys charges generated by the plasma system to the particles; the method comprises the following steps: the plasma system emits and induces plasma laser to vertically focus on the surface of a plasma target and generate plasma, and the charges of the plasma are led out under the action of the grid electrode system and collide with particles in the optical trap in unidirectional movement, so that the particles are selectively captured. The invention generates plasma through laser induction, thereby avoiding generating a high-voltage electric field; meanwhile, through reasonable distribution of the electric potential of the grid electrode, the property and the electric quantity of charges moving in the electrostatic field are well controlled, so that the property of charges captured by particles is controlled.
Description
Technical Field
The present invention relates to a charge trapping and releasing device, and more particularly, to a charge selective trapping and releasing device and method in vacuum.
Background
The optical tweezers are also called as single-beam gradient optical traps, and since the beginning of the seventies of the last century by Ashkin of a physicist in the United states, the non-contact remote control mode of the optical tweezers on particles does not cause mechanical damage to objects, and the optical tweezers are widely studied and applied in the fields of molecular biology, nanotechnology, experimental physics and the like as tools for capturing and manipulating particles.
Based on basic physical research of precise sensing of vacuum optical trap technology, a corresponding relation between a particle photoelectric signal and actual motion information (displacement) of particles is often required to be established, namely, a conversion relation between a photovoltage signal and particle displacement is established, and the establishment of the relation is often required to be realized by an accurate dynamic model. There are two common calibration methods: (1) Calibrating according to the thermal equilibrium movement position of the particles in the optical trap; (2) By utilizing the characteristic that particles are easy to charge, the electric field force calibration is carried out by applying an electric field to the particles. Based on the second approach, how to charge neutral particles is a problem that needs to be solved in practice. The conventional method is to charge the particles by high-voltage discharge, but such a method is to charge the particles randomly.
Disclosure of Invention
In order to solve the problems in the prior art, the invention provides a particle charge selective capture and release device and method based on laser-induced plasma.
The technical scheme adopted by the invention is as follows:
1. a charge selective discharge device under vacuum conditions:
The device comprises a vacuum chamber, a grid electrode system, a plasma system, an optical trap and particles, wherein the optical trap and the particles are positioned in the vacuum chamber, the particles are stably captured in the optical trap, and the grid electrode system conveys charges generated by the plasma system to the particles;
The grid electrode system comprises a first grid electrode, a second grid electrode and a third grid electrode, the first grid electrode, the second grid electrode and the third grid electrode are sequentially parallel to each other and vertically arranged in a vacuum chamber at intervals, through holes are formed in the centers of the first grid electrode, the second grid electrode and the third grid electrode, and an optical trap is positioned between the second grid electrode and the third grid electrode;
The plasma system comprises a plasma target, an induced plasma light source and an optical path system, wherein the plasma target and the optical path system are positioned in the vacuum chamber, the plasma target is positioned between the first grid electrode and the second grid electrode through holes, the plasma target is close to the first grid electrode through holes, the target surface of the plasma target faces the second grid electrode through holes, the optical path system is positioned at one side of the third grid electrode far away from the second grid electrode, and the induced plasma light source is positioned at one side of the vacuum chamber close to the optical path system;
the induced plasma light source emits induced plasma laser and is input into the optical path system through the high-power optical fiber, the induced plasma laser is emitted from the optical path system after being collimated and focused through the optical path system and sequentially passes through the through holes in the centers of the third grid electrode and the second grid electrode, and finally is vertically focused on the surface of the plasma target, so that the plasma target generates plasma, and the charges of the plasma are led out from the first grid electrode, the second grid electrode and the third grid electrode and accelerated to collide with the particles at the positions of the particles, so that the particles are charged or are electrically neutral.
The optical trap is formed by generating laser by a light source outside the vacuum chamber and focusing the laser into the vacuum chamber by incidence of an optical fiber.
The grid electrode system further comprises a first grid electrode power supply, a second grid electrode power supply and a third grid electrode power supply, wherein the first grid electrode power supply, the second grid electrode power supply and the third grid electrode power supply are positioned outside the vacuum chamber, and the first grid electrode power supply, the second grid electrode power supply and the third grid electrode power supply are respectively and electrically connected with the first grid electrode, the second grid electrode and the third grid electrode; the plasma system also comprises an induced plasma laser source power supply, wherein the induced plasma laser source power supply is positioned outside the vacuum chamber and is electrically connected with the induced plasma laser source.
The plasma target material is a compact medium.
The plasma-induced laser source comprises, but is not limited to, a gas laser, an excimer laser or a semiconductor laser, and laser light generated by the lasers is an energy source for breaking down a plasma target and generating plasma; the wavelength band of the induced plasma laser includes, but is not limited to, an infrared band, a visible band, or an ultraviolet band.
2. A charge selective trapping and releasing method in vacuum:
1) The induced plasma light source of the device is powered on, the induced plasma light source emits induced plasma laser and is input into an optical path system through a high-power optical fiber, the induced plasma laser is emitted from the optical path system and sequentially passes through holes in the centers of a third grid electrode and a second grid electrode after being collimated and focused by the optical path system, and finally, the induced plasma light source is vertically focused on the surface of a plasma target, and the plasma target generates plasma under the action of the induced plasma laser; the plasma is a quasi-neutral gas which is composed of free electrons, free ions and neutral particles and shows collective behavior, and the conductivity of the plasma is high due to the existence of a plurality of free electrons and free ions; the charges in the plasma are used for replacing the charges generated by high-voltage discharge, so that a high-voltage electric field can be prevented from being generated in a vacuum chamber;
2) The first grid electrode, the second grid electrode and the third grid electrode of the device are powered on, potential difference is generated between the first grid electrode and the second grid electrode to form an extraction electric field, and potential difference is generated between the second grid electrode and the third grid electrode to form an acceleration electric field;
3) In the step 1), charges in the plasma are led out under the action of an led-out electric field and move into an accelerating electric field in a unidirectional way, and move to the optical trap to collide with particles in the optical trap in a unidirectional way under the action of the accelerating electric field;
4) If the particles are electrically neutral, the particles are charged after the charges collide with the particles, and the charging property of the particles is consistent with the charges; if the particles are charged and the charged property of the particles is opposite to that of the particles, the particles are neutralized by the charges after the charges collide with the particles, so that the selective capturing and releasing of the charges in a vacuum environment are realized.
In the step 1), the optical path system comprises a beam expanding device, a collimation device and a focusing device, and the induced plasma laser is finally incident to the surface of the plasma target material by expanding, collimating and focusing the induced plasma laser.
In the step 1), the energy density of the induced plasma laser is larger than the energy density critical value of the surface of the plasma target, so that the surface of the plasma target can be broken down and the plasma target can generate plasma.
In the step 2), if the potential of the first grid electrode is higher than that of the third grid electrode, and the potential of the second grid electrode is between the potentials of the first grid electrode and the third grid electrode, the positive charges of the plasmas are led out and accelerated to the particles by the first grid electrode, the second grid electrode and the third grid electrode; if the potential of the first grid electrode is lower than that of the third grid electrode, and the potential of the second grid electrode is between the potentials of the first grid electrode and the third grid electrode, the first grid electrode, the second grid electrode and the third grid electrode lead out negative charges of the plasma to accelerate to particles; the property of the extracted charge is limited by the potential level between the first and second grid electrodes, and the direction of movement of the extracted charge is limited by the potential level between the second and third grid electrodes.
The beneficial effects of the invention are as follows:
The invention generates plasma through laser induction, thereby avoiding generating a high-voltage electric field; meanwhile, through reasonable distribution of the electric potential of the grid electrode, the property of charges moving in an electrostatic field can be well controlled, so that the property of charges captured by particles is controlled.
Drawings
FIG. 1 is a schematic diagram of the structure of the device;
In the figure: 1. the plasma laser comprises a vacuum chamber, 2, a plasma target, 3, plasma, 4, a first grid electrode, 5, a second grid electrode, 6, a third grid electrode, 7, an induced plasma light source, 8, an optical path system, 9, an induced plasma laser, 10, a first grid electrode power supply, 11, a second grid electrode power supply, 12, a third grid electrode power supply, 13, an induced plasma laser source power supply, 14, an optical trap, 15, particles, 16 and electric charges.
Detailed Description
The invention will be described in further detail with reference to the accompanying drawings and specific examples.
As shown in fig. 1, the device comprises a vacuum chamber 1, a grid electrode system, a plasma system, an optical trap 14 and particles 15, wherein the optical trap 14 and the particles 15 are positioned in the vacuum chamber 1, the particles 15 are stably captured in the optical trap 14, the optical trap 14 is formed by generating laser by a light source outside the vacuum chamber 1 and focusing the laser by incidence of optical fibers into the vacuum chamber 1, and the grid electrode system conveys charges 16 generated by the plasma system to the particles 15.
The grid electrode system comprises a first grid electrode 4, a second grid electrode 5 and a third grid electrode 6, wherein the first grid electrode 4, the second grid electrode 5 and the third grid electrode 6 are sequentially parallel to each other and vertically arranged in the vacuum chamber 1 at intervals, through holes are formed in the centers of the first grid electrode 4, the second grid electrode 5 and the third grid electrode 6, and the optical trap 14 is positioned between the second grid electrode 5 and the third grid electrode 6.
The grid electrode system further comprises a first grid electrode power supply 10, a second grid electrode power supply 11 and a third grid electrode power supply 12, wherein the first grid electrode power supply 10, the second grid electrode power supply 11 and the third grid electrode power supply 12 are positioned outside the vacuum chamber 1, and the first grid electrode power supply 10, the second grid electrode power supply 11 and the third grid electrode power supply 12 are respectively and electrically connected with the first grid electrode 4, the second grid electrode 5 and the third grid electrode 6.
The plasma system comprises a plasma target 2, an induced plasma light source 7 and an optical path system 8, wherein the plasma target 2 and the optical path system 8 are positioned in the vacuum chamber 1, the plasma target 2 is positioned between the through holes of the first grid electrode 4 and the through holes of the second grid electrode 5, the plasma target 2 is made of compact medium, the plasma target 2 is close to the through holes of the first grid electrode 4, the target surface of the plasma target 2 faces to the through holes of the second grid electrode 5, the optical path system 8 is positioned at one side, far away from the second grid electrode 5, of the third grid electrode 6, and the induced plasma light source 7 is positioned at one side, close to the optical path system 8, outside the vacuum chamber 1.
The plasma system further comprises an induced plasma laser source power supply 13, wherein the induced plasma laser source power supply 13 is positioned outside the vacuum chamber 1, and the induced plasma laser source power supply 13 is electrically connected with the induced plasma laser source 9.
The plasma-induced laser source 13 includes, but is not limited to, a gas laser, an excimer laser, or a semiconductor laser, and laser light generated by these lasers is an energy source that breaks down the plasma target 2 and generates plasma 3; the wavelength band of the induced plasma laser 9 includes, but is not limited to, an infrared wavelength band, a visible wavelength band, or an ultraviolet wavelength band.
The induced plasma light source 7 emits induced plasma laser 9 and is input into the optical path system 8 through a high-power optical fiber, the induced plasma laser 9 is emitted from the optical path system 8 after being collimated and focused by the optical path system 8 and sequentially passes through the through holes in the centers of the third grid electrode 6 and the second grid electrode 5, and finally is vertically focused on the surface of the plasma target 2, so that the plasma 3 is generated on the target surface of the plasma target 2, and the charges 16 of the plasma 3 are led out by the first grid electrode 4, the second grid electrode 5 and the third grid electrode 6 and accelerated to the position of the particles 15 to collide with the particles 15, so that the particles 15 are charged or are electrically neutral.
The method of the device comprises the following steps:
1) The induced plasma light source 7 of the device is powered on, the induced plasma light source 7 emits induced plasma laser 9 and is input into the optical path system 8 through a high-power optical fiber, the induced plasma laser 9 is emitted from the optical path system 8 and sequentially passes through holes in the centers of the third grid electrode 6 and the second grid electrode 5 after being collimated and focused by the optical path system 8, and finally is vertically focused on the surface of the plasma target 2, the plasma target 2 generates plasma 3 under the action of the induced plasma laser 9, and the energy density of the induced plasma laser 9 is larger than the energy density critical value of the surface of the plasma target 2 so as to break down the surface of the plasma target 2 and enable the plasma target 2 to generate plasma 3; the light path system comprises a beam expanding device, a collimation device and a focusing device, and finally the induced plasma laser 9 is incident to the surface of the plasma target 2 by expanding, collimating and focusing the induced plasma laser 9; the plasma 3 is a quasi-neutral gas composed of free electrons, free ions and neutral particles that exhibit collective behavior, and the conductivity of the plasma 3 is high due to the presence of many free electrons and free ions; the generation of a high voltage electric field in the vacuum chamber 1 can be avoided by using the electric charges in the plasma 3 instead of the electric charges generated by the high voltage discharge.
2) The first grid electrode 4, the second grid electrode 5 and the third grid electrode 6 of the device are powered on, potential difference is generated between the first grid electrode 4 and the second grid electrode 5 to form an extraction electric field, and potential difference is generated between the second grid electrode 5 and the third grid electrode 6 to form an acceleration electric field; if the potential of the first grid electrode 4 is higher than that of the third grid electrode 6, and the potential of the second grid electrode 5 is between the potentials of the first grid electrode 4 and the third grid electrode 6, the positive charges of the plasma 3 are led out and accelerated to the particles 15 by the first grid electrode 4, the second grid electrode 5 and the third grid electrode 6; if the potential of the first grid electrode 4 is lower than that of the third grid electrode 6, and the potential of the second grid electrode 5 is between the potentials of the first grid electrode 4 and the third grid electrode 6, the negative charges of the plasma 3 are led out and accelerated to the particles 15 by the first grid electrode 4, the second grid electrode 5 and the third grid electrode 6; the nature of the extracted charge 16 is limited by the potential level between the first grid electrode 4 and the second grid electrode 5, and the direction of movement of the extracted charge 16 is limited by the potential level between the second grid electrode 5 and the third grid electrode 6.
3) In the step 1), charges 16 in the plasma 3 are led out under the action of an led-out electric field and move into an accelerating electric field in a unidirectional way, and move to the optical trap 14 in a unidirectional way under the action of the accelerating electric field to collide with particles 15 in the optical trap 14;
4) If the particles 15 are electrically neutral, the particles 15 are charged after the charges 16 collide with the particles 15, and the charging property of the particles 15 is consistent with the charges 16; if the particles 15 are charged and the charged nature of the particles 15 is opposite to the charge 16, then the charge 16 collides with the particles 15 such that the particles 15 are neutralized by the charge 16, thereby effecting selective capture and release of the charge 16 in a vacuum environment.
Claims (9)
1. A device for selective trapping and releasing of charge in a vacuum, comprising:
The device comprises a vacuum chamber (1), a grid electrode system, a plasma system, an optical trap (14) and particles (15), wherein the optical trap (14) and the particles (15) are positioned in the vacuum chamber (1), the particles (15) are stably captured in the optical trap (14), and the grid electrode system conveys charges (16) generated by the plasma system to the particles (15);
The grid electrode system comprises a first grid electrode (4), a second grid electrode (5) and a third grid electrode (6), wherein the first grid electrode (4), the second grid electrode (5) and the third grid electrode (6) are sequentially parallel to each other and vertically arranged in the vacuum chamber (1) at intervals, through holes are formed in the centers of the first grid electrode (4), the second grid electrode (5) and the third grid electrode (6), and an optical trap (14) is positioned between the second grid electrode (5) and the third grid electrode (6);
The plasma system comprises a plasma target (2), an induced plasma light source (7) and an optical path system (8), wherein the plasma target (2) and the optical path system (8) are positioned in the vacuum chamber (1), the plasma target (2) is positioned between the first grid electrode (4) and the second grid electrode (5) through holes, the plasma target (2) is close to the first grid electrode (4) through holes, the target surface of the plasma target (2) faces to the second grid electrode (5) through holes, the optical path system (8) is positioned at one side, far away from the second grid electrode (5), of the third grid electrode (6), and the induced plasma light source (7) is positioned at one side, close to the optical path system (8), of the vacuum chamber (1);
the induced plasma light source (7) emits induced plasma laser (9) and is input into the optical path system (8) through optical fibers, the induced plasma laser (9) is emitted from the optical path system (8) after being collimated and focused by the optical path system (8) and sequentially passes through holes in the centers of the third grid electrode (6) and the second grid electrode (5), and finally is vertically focused on the surface of the plasma target (2), so that the plasma target (2) generates plasma (3), charges (16) in the plasma (3) are led out by the first grid electrode (4), the second grid electrode (5) and the third grid electrode (6) and accelerated to the position of the particles (15) to collide with the particles (15), and the particles (15) are electrified or are electrically neutral.
2. The apparatus for selective charge trapping and releasing in vacuum according to claim 1, wherein:
The optical trap (14) is formed by generating laser by a light source outside the vacuum chamber (1) and focusing the laser into the vacuum chamber (1) by incidence of an optical fiber.
3. The apparatus for selective charge trapping and releasing in vacuum according to claim 1, wherein:
The grid electrode system further comprises a first grid electrode power supply (10), a second grid electrode power supply (11) and a third grid electrode power supply (12), wherein the first grid electrode power supply (10), the second grid electrode power supply (11) and the third grid electrode power supply (12) are positioned outside the vacuum chamber (1), and the first grid electrode power supply (10), the second grid electrode power supply (11) and the third grid electrode power supply (12) are respectively and electrically connected with the first grid electrode (4), the second grid electrode (5) and the third grid electrode (6); the plasma system also comprises an induction plasma laser source power supply (13), wherein the induction plasma laser source power supply (13) is positioned outside the vacuum chamber (1), and the induction plasma laser source power supply (13) is electrically connected with the induction plasma light source (7).
4. The apparatus for selective charge trapping and releasing in vacuum according to claim 1, wherein:
The plasma target material (2) is made of a compact medium.
5. The apparatus for selective charge trapping and releasing in vacuum according to claim 1, wherein:
the induced plasma light source (7) comprises a gas laser, an excimer laser or a semiconductor laser; the wave band of the induced plasma laser (9) comprises an infrared wave band, a visible wave band or an ultraviolet wave band.
6. A method for selective charge trapping and releasing in vacuum applied to the device of any one of claims 1-5, characterized by:
the method comprises the following steps:
1) a power supply is connected with an induction plasma light source (7) of the device, the induction plasma light source (7) emits induction plasma laser (9) and is input into a light path system (8) through a high-power optical fiber, the induction plasma laser (9) is emitted from the light path system (8) and sequentially passes through holes in the centers of a third grid electrode (6) and a second grid electrode (5) after being collimated and focused by the light path system (8), and finally, the induction plasma light source (7) is vertically focused on the surface of a plasma target (2), and the plasma target (2) generates plasma (3) under the action of the induction plasma laser (9);
2) The first grid electrode (4), the second grid electrode (5) and the third grid electrode (6) of the device are powered on, potential difference is generated between the first grid electrode (4) and the second grid electrode (5) to form an extraction electric field, and potential difference is generated between the second grid electrode (5) and the third grid electrode (6) to form an acceleration electric field;
3) In the step 1), charges (16) in the plasma (3) are led out under the action of an led-out electric field and move into an accelerating electric field in a unidirectional way, and move to the position of the optical trap (14) in a unidirectional way under the action of the accelerating electric field to collide with particles (15) in the optical trap (14);
4) If the particles (15) are electrically neutral, the particles (15) are charged after the charges (16) collide with the particles (15), and the charging property of the particles (15) is consistent with the charges (16); if the particles (15) are charged and the charged nature of the particles (15) is opposite to the charge (16), the charge (16) collides with the particles (15) to neutralize the particles (15) by the charge (16), thereby realizing selective capture and release of the charge (16) in a vacuum environment.
7. The method of claim 6, wherein the charge selective trapping and releasing in vacuum is characterized by:
In the step 1), the light path system comprises a beam expanding device, a collimation device and a focusing device, and the induced plasma laser (9) is finally incident to the surface of the plasma target material (2) through beam expanding, collimation and focusing of the induced plasma laser (9).
8. The method of claim 6, wherein the charge selective trapping and releasing in vacuum is characterized by:
in the step 1), the energy density of the induced plasma laser (9) is larger than the surface energy density critical value of the plasma target (2).
9. The method of claim 6, wherein the charge selective trapping and releasing in vacuum is characterized by:
In the step 2), if the potential of the first grid electrode (4) is higher than that of the third grid electrode (6), and the potential of the second grid electrode (5) is between the potentials of the first grid electrode (4) and the third grid electrode (6), the positive charges of the plasma (3) are led out and accelerated to the particles (15) by the first grid electrode (4), the second grid electrode (5) and the third grid electrode (6); if the potential of the first grid electrode (4) is lower than that of the third grid electrode (6), the potential of the second grid electrode (5) is between the potentials of the first grid electrode (4) and the third grid electrode (6), and the negative charges of the plasma (3) are led out and accelerated to the particles (15) by the first grid electrode (4), the second grid electrode (5) and the third grid electrode (6).
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Citations (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0645092A (en) * | 1992-07-23 | 1994-02-18 | Ebara Infilco Co Ltd | Method and device for electrically neutralizing charged fine particle in gas |
| JPH09148310A (en) * | 1995-11-22 | 1997-06-06 | Hitachi Ltd | Semiconductor device, its cleaning, and handling of wafer |
| JP2003200400A (en) * | 2001-12-26 | 2003-07-15 | Akira Mizuno | Physically manipulating method for long-chain polymer |
| CN1606145A (en) * | 2003-10-08 | 2005-04-13 | 东京毅力科创株式会社 | Particle sticking prevention apparatus and plasma processing apparatus |
| WO2007072302A2 (en) * | 2005-12-21 | 2007-06-28 | Koninklijke Philips Electronics N.V. | Fluid focus lens to isolate or trap small particulate matter |
| CN101183115A (en) * | 2007-12-14 | 2008-05-21 | 北京大学 | Electrostatic forceps controlling electrified nanometer microparticles |
| CN102388468A (en) * | 2009-04-24 | 2012-03-21 | 奥维新斯基创新有限公司 | Thin film deposition via charged particle-depleted plasma achieved by magnetic confinement |
| CN102623287A (en) * | 2012-02-22 | 2012-08-01 | 北京交通大学 | Device and method for detecting ion current of vacuum discharge plasma |
| CN103162629A (en) * | 2013-01-31 | 2013-06-19 | 浙江大学 | One-dimensional optical trap particle displacement detection method |
| JP2017078832A (en) * | 2015-10-22 | 2017-04-27 | 株式会社ジェイテクト | Particulate capture method and optical tweezers device |
| CN107450094A (en) * | 2017-06-22 | 2017-12-08 | 山东航天电子技术研究所 | A kind of charged particle beam diagnostic device and diagnosing and measuring method |
| CN107694475A (en) * | 2017-09-25 | 2018-02-16 | 南京航空航天大学 | A kind of ring-type aggregation building mortion of micro-nano material |
| CN107910241A (en) * | 2017-11-14 | 2018-04-13 | 大连民族大学 | A kind of mass spectrometer of laser welding plasma plumage brightness particulate subconstiuent |
| CN110595151A (en) * | 2019-09-19 | 2019-12-20 | 之江实验室 | Method and apparatus for forming optical traps and cooling particles using self-focusing optical fibers |
| CN112863728A (en) * | 2021-04-26 | 2021-05-28 | 之江实验室 | Electric field amount calibration-based multi-dimensional optical tweezers calibration device and method |
| CN216697832U (en) * | 2021-10-12 | 2022-06-07 | 浙江大学 | Device for selectively capturing and releasing electric charge in vacuum |
-
2021
- 2021-10-12 CN CN202111188222.7A patent/CN114005570B/en active Active
Patent Citations (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0645092A (en) * | 1992-07-23 | 1994-02-18 | Ebara Infilco Co Ltd | Method and device for electrically neutralizing charged fine particle in gas |
| JPH09148310A (en) * | 1995-11-22 | 1997-06-06 | Hitachi Ltd | Semiconductor device, its cleaning, and handling of wafer |
| JP2003200400A (en) * | 2001-12-26 | 2003-07-15 | Akira Mizuno | Physically manipulating method for long-chain polymer |
| CN1606145A (en) * | 2003-10-08 | 2005-04-13 | 东京毅力科创株式会社 | Particle sticking prevention apparatus and plasma processing apparatus |
| WO2007072302A2 (en) * | 2005-12-21 | 2007-06-28 | Koninklijke Philips Electronics N.V. | Fluid focus lens to isolate or trap small particulate matter |
| CN101183115A (en) * | 2007-12-14 | 2008-05-21 | 北京大学 | Electrostatic forceps controlling electrified nanometer microparticles |
| CN102388468A (en) * | 2009-04-24 | 2012-03-21 | 奥维新斯基创新有限公司 | Thin film deposition via charged particle-depleted plasma achieved by magnetic confinement |
| CN102623287A (en) * | 2012-02-22 | 2012-08-01 | 北京交通大学 | Device and method for detecting ion current of vacuum discharge plasma |
| CN103162629A (en) * | 2013-01-31 | 2013-06-19 | 浙江大学 | One-dimensional optical trap particle displacement detection method |
| JP2017078832A (en) * | 2015-10-22 | 2017-04-27 | 株式会社ジェイテクト | Particulate capture method and optical tweezers device |
| CN107450094A (en) * | 2017-06-22 | 2017-12-08 | 山东航天电子技术研究所 | A kind of charged particle beam diagnostic device and diagnosing and measuring method |
| CN107694475A (en) * | 2017-09-25 | 2018-02-16 | 南京航空航天大学 | A kind of ring-type aggregation building mortion of micro-nano material |
| CN107910241A (en) * | 2017-11-14 | 2018-04-13 | 大连民族大学 | A kind of mass spectrometer of laser welding plasma plumage brightness particulate subconstiuent |
| CN110595151A (en) * | 2019-09-19 | 2019-12-20 | 之江实验室 | Method and apparatus for forming optical traps and cooling particles using self-focusing optical fibers |
| CN112863728A (en) * | 2021-04-26 | 2021-05-28 | 之江实验室 | Electric field amount calibration-based multi-dimensional optical tweezers calibration device and method |
| CN216697832U (en) * | 2021-10-12 | 2022-06-07 | 浙江大学 | Device for selectively capturing and releasing electric charge in vacuum |
Non-Patent Citations (2)
| Title |
|---|
| Modification of microparticles due to intense laser manipulation;Frank Wieben;《Phys. Plasmas》;20190128;全文 * |
| 介质微粒的光捕陷、光悬浮和光操纵;蔡惟泉;物理学进展;19970320(第01期);全文 * |
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