CN113985706A - Multichannel parallel super-resolution laser direct writing system - Google Patents
Multichannel parallel super-resolution laser direct writing system Download PDFInfo
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- CN113985706A CN113985706A CN202111241111.8A CN202111241111A CN113985706A CN 113985706 A CN113985706 A CN 113985706A CN 202111241111 A CN202111241111 A CN 202111241111A CN 113985706 A CN113985706 A CN 113985706A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
Abstract
The invention discloses a multichannel parallel super-resolution laser direct writing system, which comprises: the laser comprises a first laser used for generating a direct-writing path light beam, a second laser used for generating a suppression path light beam, at least one direct-writing-suppression light beam combination unit, a secondary beam combination module and a writing module, wherein the direct-writing path light beam and the suppression path light beam are simultaneously incident to the direct-writing-suppression light beam combination unit to form a pair of direct-writing-suppression light beam combination, and then sequentially pass through the secondary beam combination module and the writing module to form a direct-writing-suppression light spot combination. The invention improves the speed of the traditional single-path laser direct writing printing system by times.
Description
Technical Field
The invention relates to the field of laser direct writing processing, in particular to a multichannel parallel super-resolution laser direct writing system.
Background
The sensor technology is one of three main pillars of the current information system, can greatly expand the perception capability of human beings to the nature and the society, and plays an important role in the future Internet of things and the intelligent society. The micro-nano manufacturing technology is one of the core roles in the development of sensors. However, several mainstream micro-nano manufacturing techniques play an important role in industrial development, and meanwhile, some defects and shortcomings are inevitable. For example, the extreme ultraviolet light source can realize extremely high-precision nano etching, but the manufacturing environment of an optical mask plate and vacuum is required to be relied on, and the cost and the complexity of the complete nano manufacturing photoetching machine are extremely high; for example, the electron beam exposure technology can realize nanometer-level processing precision without a mask plate, but the device is expensive and has low processing speed, so that large-area preparation and industrial application cannot be realized; for example, a single-beam laser direct writing system does not need a mask plate and a vacuum processing environment, but has a low processing speed and cannot meet the requirements of actual production and application.
Therefore, in the current technical background, people are urgently needed to develop a nano lithography device which can realize high-precision and rapid processing and manufacturing capability in normal temperature air.
Disclosure of Invention
In view of this, the embodiment of the present invention provides a high-throughput multichannel parallel super-resolution laser direct writing system, so as to solve the problem of slow processing speed in the prior art.
According to an embodiment of the present invention, a multi-channel parallel super-resolution laser direct writing system is provided, which includes: the laser comprises a first laser used for generating a direct-writing path light beam, a second laser used for generating a suppression path light beam, at least one direct-writing-suppression light beam combination unit, a secondary beam combination module and a writing module, wherein the direct-writing path light beam and the suppression path light beam are simultaneously incident to the direct-writing-suppression light beam combination unit to form a pair of direct-writing-suppression light beam combination, and then sequentially pass through the secondary beam combination module and the writing module to form a direct-writing-suppression light spot combination.
Further, the write-through suppression beam combining unit includes a first anti-drift module, a second anti-drift module, a first secondary light splitting module, a second secondary light splitting module, a first energy regulation and control module, a second energy regulation and control module, a third energy regulation and control module, a fourth energy regulation and control module, a first wavefront regulation and control module, a second wavefront regulation and control module, a third wavefront regulation and control module, a fourth wavefront regulation and control module, a first one-level beam combining module, and a second one-level beam combining module, where:
the direct-writing light beam sequentially passes through the first anti-drift module and the first secondary light module to form a first direct-writing sub-light beam and a second direct-writing sub-light beam, the first direct-writing sub-light beam sequentially passes through the first energy regulation and control module and the first wavefront regulation and control module, and the second direct-writing sub-light beam sequentially passes through the second energy regulation and control module and the second wavefront regulation and control module
The suppression path light beam sequentially passes through the second anti-drift module and the second secondary light splitting module to form a first suppression path sub-light beam and a second suppression path sub-light beam, the first suppression path sub-light beam sequentially passes through the third energy regulation and control module and the third wave front regulation and control module, and the second suppression path sub-light beam sequentially passes through the fourth energy regulation and control module and the fourth wave front regulation and control module;
the light beams emitted by the first wave front regulation module and the third wave front regulation module form a direct writing-inhibition light beam combination after passing through the first one-level beam combination module; and the light beams emitted by the second wave front regulation module and the fourth wave front regulation module form another path of direct writing-inhibition light beam combination after passing through the second primary beam combining module.
Further, the first anti-drift module and the second anti-drift module are used for stabilizing and adaptively adjusting the optical path.
Further, the first secondary light module is used for dividing the direct-write light beam into a first direct-write sub-light beam and a second direct-write sub-light beam, the polarization directions of which are perpendicular to each other;
the second secondary light splitting module is used for splitting the suppression path light beam into a first suppression path sub-light beam and a second suppression path sub-light beam, wherein the polarization directions of the first suppression path sub-light beam and the second suppression path sub-light beam are perpendicular to each other.
Further, the first energy regulation and control module, the second energy regulation and control module, the third energy regulation and control module and the fourth energy regulation and control module are used for stabilizing and controlling on-off of the light beam energy.
Further, the first wavefront modification module and the second wavefront modification module are used for modulating two polarization components of the light beam.
Furthermore, the first one-stage beam combining module is configured to combine the centers of the light beams generated by the first direct-writing sub-light beam and the first suppression sub-light beam to form a direct-writing-suppression light beam combination;
and the second primary beam combining module is respectively used for combining the centers of the beams generated by the second direct-writing path sub-beam and the second inhibition path sub-beam to form another direct-writing-inhibition beam combination.
Further, the first primary beam combining module comprises a first one-half wave plate, a second one-half wave plate and a first dichroic mirror, and the first one-half wave plate and the second one-half wave plate are respectively arranged on two incidence planes of the first dichroic mirror.
Further, the second primary beam combination module comprises a third half wave plate, a fourth half wave plate and a second dichroic mirror, wherein the third half wave plate and the fourth half wave plate are respectively arranged on two incidence planes of the second dichroic mirror.
Further, the secondary beam combining module comprises a reflector group, a 4f system lens group and a beam combining reflector which are sequentially arranged along the beam direction.
The technical scheme provided by the embodiment of the invention can have the following beneficial effects:
it can be known from the above embodiments that, in the embodiments of the present invention, a pair of direct-write-inhibit beam combinations is formed after the direct-write path beam and the inhibit path beam are simultaneously incident on the direct-write-inhibit beam combination unit, and then the direct-write-inhibit beam combinations are sequentially formed by the secondary beam combining module and the writing module, where the number of channels is determined by the number of the direct-write-inhibit beam combination units, and through multi-channel parallel writing, parallel direct-write processing of multiple focal spots is implemented, so that the problems of slow speed and low processing efficiency of a conventional single-path laser direct-write processing system are overcome, and the writing speed is increased by multiple times.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the invention, as claimed.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the invention and together with the description, serve to explain the principles of the invention.
Fig. 1 is a schematic structural diagram illustrating a multi-channel parallel super-resolution laser direct writing system according to an exemplary embodiment.
Fig. 2 is a schematic structural diagram illustrating a direct-write-inhibit beam combining unit according to an exemplary embodiment.
Fig. 3 is a schematic structural diagram illustrating a first primary beam combining module according to an exemplary embodiment.
Fig. 4 is a schematic structural diagram illustrating a second primary beam combining module according to an exemplary embodiment.
FIG. 5 is a schematic diagram illustrating a structure of a secondary beam combining module according to an exemplary embodiment.
Fig. 6 is a schematic diagram illustrating a direct-write spot and a suppression spot, according to an example embodiment.
Fig. 7 is a diagram illustrating ten pairs of direct write-inhibit spots in accordance with an exemplary embodiment.
The reference numerals in the figures are:
1. a first laser;
2. a second laser;
3. a direct-write-inhibit beam combining unit; 301. a first anti-drift module; 302. a second anti-drift module; 303. a first secondary light module; 304. a second secondary light splitting module; 305. a first energy regulation module; 306. a second energy regulation module; 307. a third energy regulation module; 308. a fourth energy regulation module; 309. a first wavefront regulation module; 310. a second wavefront regulation module; 311. a third pre-wave regulation module; 312. a fourth wavefront regulation and control module; 313. a first primary beam combining module; 314. a second primary beam combining module; 315. a mirror; 3131. a first quarter wave plate; 3132. a second half wave plate; 3133. a first dichroic mirror; 3141. a third half wave plate; 3142. a fourth half wave plate; 3143. a second dichroic mirror;
4. a secondary beam combining module; 401. a reflector group; 402. 4f system lens group; 403. a beam combining mirror;
5. an inscribing module;
6. an actual region of action;
7. a suppressed region.
Detailed Description
Reference will now be made in detail to the exemplary embodiments, examples of which are illustrated in the accompanying drawings. When the following description refers to the accompanying drawings, like numbers in different drawings represent the same or similar elements unless otherwise indicated. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with the present invention. Rather, they are merely examples of apparatus and methods consistent with certain aspects of the invention, as detailed in the appended claims.
The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used in this specification and the appended claims, the singular forms "a", "an", and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It should also be understood that the term "and/or" as used herein refers to and encompasses any and all possible combinations of one or more of the associated listed items.
Fig. 1 is a schematic structural diagram of a multi-channel parallel super-resolution laser direct writing system according to an exemplary embodiment, and referring to fig. 1, an embodiment of the present invention provides a multi-channel parallel super-resolution laser direct writing system, which may include: the laser device comprises a first laser 1 for generating a direct-writing path light beam, a second laser 2 for generating a suppression path light beam, at least one direct-writing-suppression light beam combination unit 3, a secondary beam combination module 4 and a writing module 5, wherein the direct-writing path light beam and the suppression path light beam are simultaneously incident to the direct-writing-suppression light beam combination unit 3 to form two pairs of direct-writing-suppression light beam combinations, and then sequentially pass through the secondary beam combination module 4 and the writing module 5 to form a direct-writing-suppression light spot combination, so that the multichannel parallel super-resolution laser direct writing is realized.
As can be seen from the above embodiments, in the embodiments of the present invention, the direct-write path light beam and the suppressed path light beam are simultaneously incident on the direct-write-suppressed light beam combining unit to form a pair of direct-write-suppressed light beam combinations, and then sequentially pass through the secondary beam combining module and the writing module to form a direct-write-suppressed light spot combination, the number of channels is determined by the number of the direct-write-suppressed light beam combining units 3, and through the multichannel parallel writing, the parallel direct-write processing of multiple focal spots is realized, and the problems of slow speed and low processing efficiency of the conventional single-path laser direct-write processing system are overcome, so that the writing speed is increased in multiples.
In an embodiment of the present invention, the first laser 1 is used for generating a direct-writing path beam, in this embodiment, 780nm laser emitted by an X-780nm femtosecond laser is used as the direct-writing path beam; the second laser 2 is used for generating the inhibition path beam, and 532nm laser emitted by the Y-532nm continuous laser is used as the inhibition path beam in the embodiment.
In an embodiment of the present invention, referring to fig. 1, the number of channels of the multichannel parallel super-resolution laser direct writing system provided in the embodiment of the present invention is determined by the direct-write-inhibit beam combining unit 3, 5 are shown in fig. 1, and now, taking 5 direct-write-inhibit beam combining units 3 as an example, the 5 direct-write-inhibit beam combining units 3 can implement ten-channel parallel super-resolution laser direct writing.
Laser light emitted by the first laser 1 and the second laser 2 is first split and respectively incident on five direct-write-inhibit beam combination units 3 with the same structure, and two pairs of direct-write-inhibit beam combinations are respectively formed in each of the five direct-write-inhibit beam combination units 3 to form ten direct-write-inhibit beam combinations of L1-L10. The internal configuration of the direct-write-suppression beam combining unit 3 is explained in detail below.
Referring to fig. 2, the write-through suppression beam combining unit 3 includes a first anti-drift module 301, a second anti-drift module 302, a first secondary light splitting module 303, a second secondary light splitting module 304, a first energy regulating module 305, a second energy regulating module 306, a third energy regulating module 307, a fourth energy regulating module 308, a first wavefront regulating module 309, a second wavefront regulating module 310, a third wavefront regulating module 311, a fourth wavefront regulating module 312, a first primary beam combining module 313, and a second primary beam combining module 314, where: the first anti-drift module 301 and the second anti-drift module 302 are used for stabilizing and adaptively adjusting an optical path; the first secondary light module 303 is configured to divide the direct-write light beam into a first direct-write sub-light beam and a second direct-write sub-light beam, where polarization directions of the first direct-write light beam and the second direct-write light beam are perpendicular to each other; the second secondary splitting module 304 is configured to split the suppression path light beam into a first suppression path sub-light beam and a second suppression path sub-light beam, where polarization directions of the first suppression path sub-light beam and the second suppression path sub-light beam are perpendicular to each other. The first energy regulation and control module 305, the second energy regulation and control module 306, the third energy regulation and control module 307 and the fourth energy regulation and control module 308 are used for stabilizing and controlling the energy of the light beam. The first and second wavefront modification modules 309 and 310 are configured to modulate two polarization components of an optical beam. The first primary beam combining module 313 is configured to combine the centers of the light beams generated by the first direct-write sub-light beam and the first inhibit-path sub-light beam to form a path of direct-write-inhibit-light beam combination; the second primary beam combining module 314 is configured to combine the centers of the light beams generated by the second direct-write sub-light beam and the second inhibit sub-light beam to form another direct-write-inhibit light beam combination.
Specifically, the direct-write path light beam sequentially passes through the first anti-drift module 301 and the first secondary light module 303 to form a first direct-write path sub-light beam and a second direct-write path sub-light beam, the first direct-write path sub-light beam sequentially passes through the first energy regulation and control module 305 and the first wavefront regulation and control module 309, and the second direct-write path sub-light beam sequentially passes through the second energy regulation and control module 306 and the second wavefront regulation and control module 310;
the suppression path light beam sequentially passes through the second anti-drift module 302 and the second secondary light splitting module 304 to form a first suppression path sub-light beam and a second suppression path sub-light beam, the first suppression path sub-light beam sequentially passes through the third energy regulation and control module 307 and the third pre-wave regulation and control module 311, and the second suppression path sub-light beam sequentially passes through the fourth energy regulation and control module 308 and the fourth pre-wave regulation and control module 312;
the light beams emitted by the first wavefront control module 309 and the third wavefront control module 311 pass through the first one-stage beam combining module 313 to form a direct-writing-suppression light beam combination L1; the light beams emitted from the second wavefront regulation module 310 and the fourth wavefront regulation module 312 pass through the second primary beam combining module 314 to form another direct-writing-suppression light beam combination L2.
The first energy regulation and control module 305, the second energy regulation and control module 306, the third energy regulation and control module 307 and the fourth energy regulation and control module 308 have the same structure, and each of the first energy regulation and control module, the second energy regulation and control module and the fourth energy regulation and control module includes an electro-optical regulator and a half-wave plate, and the electro-optical regulator and the half-wave plate are used for regulating and controlling the energy of the light spot and switching the light spot.
The first wavefront regulation and control module 309, the second wavefront regulation and control module 310, the third wavefront regulation and control module 311, and the fourth wavefront regulation and control module 312 have the same structure, and each include a spatial light modulator and a half-wave plate, and are used for controlling the wavefront of a light beam.
Fig. 3 is a schematic structural diagram of the first primary beam combining module according to the present invention. The first primary beam combining module 313 includes a first half waveplate 3131, a second half waveplate 3132, and a first dichroic mirror 3133, and the first half waveplate 3131 and the second half waveplate 3132 are respectively disposed on two incident surfaces of the first dichroic mirror 3133. The first direct-write sub-beam passes through the first half-wave plate 3131 and the first inhibit-write sub-beam passes through the second half-wave plate 3132 and simultaneously enters the first dichroic mirror 3133 to combine to form a direct-write-inhibit-beam combination L1.
Fig. 4 is a schematic structural diagram of the second primary beam combining module according to the present invention. The second primary beam combining module 314 includes a third half wave plate 3141, a fourth half wave plate 3142, and a second dichroic mirror 3143, and the third half wave plate 3141 and the fourth half wave plate 3142 are respectively disposed on both incident surfaces of the second dichroic mirror 3143. The second direct-write path sub-beam passes through the third half waveplate 3141 and the second inhibit path sub-beam passes through the fourth half waveplate 3142 while entering the second dichroic mirror 3143 for beam combination to form another direct-write-inhibit beam combination L2.
It should be noted that, in order to turn the optical path and adjust the position of the light spot, in fig. 2, a reflecting mirror 315 is disposed between the first anti-drift module 301 and the first secondary light splitting module 303 to change the optical path angle, and a reflecting mirror 315 is disposed between the second anti-drift module 302 and the second secondary light splitting module 304 to change the optical path angle; two first reflectors 315 are arranged between the first secondary light module 303 and the first energy regulation and control module 305, between the first energy regulation and control module 305 and the first wavefront regulation and control module 309, between the first secondary light module 303 and the second energy regulation and control module 306, between the second energy regulation and control module 306 and the second wavefront regulation and control module 310, between the second secondary light module 304 and the third energy regulation and control module 307, and between the second secondary light module 304 and the fourth energy regulation and control module 308 to change the light path angle; a reflector 315 is disposed between the third pre-wave modulating module 311 and the first primary beam combining module 313, and between the fourth pre-wave modulating module 312 and the second primary beam combining module 314 to change the light path angle.
In an embodiment of the present invention, as shown in fig. 5, a schematic structural diagram of the two-stage beam combining module 4 of the present invention is shown. The secondary beam combining module 4 is configured to combine beams L1-L10 emitted from the five write-through-inhibit beam combining units 3, and includes a mirror group 401, a 4f system lens group 402, and a beam combining mirror 403, which are sequentially arranged along a beam direction.
The direct-write-inhibit beam combination L1 enters the secondary beam combining module 4 and passes through the mirror group 401, the 4f system lens group 402 and the beam combining mirror 403 in sequence. The reflector group 401 is used for deflecting and adjusting the light path, and the 4f system lens group 402 is used for adjusting the light path; the beam combining mirror 403 is used to adjust the beam combining angle. The principle of the optical path of L2-L10 is the same as that of L1. And then, forming an included angle of 2 degrees between adjacent light beams, and simultaneously enabling the light beams to enter an objective lens of the writing module 5 to form ten pairs of direct writing-inhibition light spot combinations.
As shown in fig. 6, in (a) the direct-writing light spot is a solid light spot, (b) the suppression light spot is a hollow light spot, and (c) the superposition light spot has an actual active region 6 and a suppressed region 7, and the conventional single path has only one light spot on the focal plane.
As shown in fig. 7, in the embodiment of the present invention, two pairs of direct-write-inhibit beam combinations are formed by the first-stage beam combining module, and ten pairs of direct-write-inhibit spot combinations are formed by the second-stage beam combining module 4, so that the processing speed is increased to ten times that of the conventional single-pass direct-write processing (ten times for ten channels).
The embodiment of the invention realizes parallel PPI direct writing processing of ten focal spots by parallel writing of ten channels, overcomes the problems of low speed and low processing efficiency of the traditional single-path laser direct writing processing system, improves the writing speed by ten times, realizes light source multiplexing by adopting two-stage light splitting, obtains higher characteristic size and processing resolution by using PPI technology, and realizes independent regulation and control of energy of each spot by using wavefront modulation.
Other embodiments of the invention will be apparent to those skilled in the art from consideration of the specification and practice of the disclosure disclosed herein. This invention is intended to cover any variations, uses, or adaptations of the invention following, in general, the principles of the invention and including such departures from the present disclosure as come within known or customary practice within the art to which the invention pertains. It is intended that the specification and examples be considered as exemplary only, with a true scope and spirit of the invention being indicated by the following claims.
It will be understood that the invention is not limited to the precise arrangements described above and shown in the drawings and that various modifications and changes may be made without departing from the scope thereof. The scope of the invention is limited only by the appended claims.
Claims (10)
1. A multi-channel parallel super-resolution laser direct writing system is characterized by comprising: the laser comprises a first laser used for generating a direct-writing path light beam, a second laser used for generating a suppression path light beam, at least one direct-writing-suppression light beam combination unit, a secondary beam combination module and a writing module, wherein the direct-writing path light beam and the suppression path light beam are simultaneously incident to the direct-writing-suppression light beam combination unit to form a pair of direct-writing-suppression light beam combination, and then sequentially pass through the secondary beam combination module and the writing module to form a direct-writing-suppression light spot combination.
2. The multi-channel parallel super-resolution laser direct writing system according to claim 1, wherein the direct writing-rejection beam combining unit comprises a first anti-drift module, a second anti-drift module, a first secondary light splitting module, a second secondary light splitting module, a first energy regulating module, a second energy regulating module, a third energy regulating module, a fourth energy regulating module, a first wavefront regulating module, a second wavefront regulating module, a third wavefront regulating module, a fourth wavefront regulating module, a first primary beam combining module and a second primary beam combining module, wherein:
the direct-writing light beam sequentially passes through the first anti-drift module and the first secondary light module to form a first direct-writing sub-light beam and a second direct-writing sub-light beam, the first direct-writing sub-light beam sequentially passes through the first energy regulation and control module and the first wavefront regulation and control module, and the second direct-writing sub-light beam sequentially passes through the second energy regulation and control module and the second wavefront regulation and control module
The suppression path light beam sequentially passes through the second anti-drift module and the second secondary light splitting module to form a first suppression path sub-light beam and a second suppression path sub-light beam, the first suppression path sub-light beam sequentially passes through the third energy regulation and control module and the third wave front regulation and control module, and the second suppression path sub-light beam sequentially passes through the fourth energy regulation and control module and the fourth wave front regulation and control module;
the light beams emitted by the first wave front regulation module and the third wave front regulation module form a direct writing-inhibition light beam combination after passing through the first one-level beam combination module; and the light beams emitted by the second wave front regulation module and the fourth wave front regulation module form another path of direct writing-inhibition light beam combination after passing through the second primary beam combining module.
3. The multi-channel parallel super-resolution laser direct writing system according to claim 2, wherein the first anti-drift module and the second anti-drift module are used for stabilization and adaptive adjustment of the optical path.
4. The multi-channel parallel super-resolution laser direct-writing system according to claim 2, wherein the first two-level light splitting module is configured to split the direct-writing path light beam into a first direct-writing path sub-light beam and a second direct-writing path sub-light beam with mutually perpendicular polarization directions;
the second secondary light splitting module is used for splitting the suppression path light beam into a first suppression path sub-light beam and a second suppression path sub-light beam, wherein the polarization directions of the first suppression path sub-light beam and the second suppression path sub-light beam are perpendicular to each other.
5. The multi-channel parallel super-resolution laser direct writing system according to claim 2, wherein the first energy regulating module, the second energy regulating module, the third energy regulating module and the fourth energy regulating module are used for stabilizing and on-off regulating the energy of the light beam.
6. The multi-channel parallel super-resolution laser direct writing system according to claim 2, wherein the first and second wavefront modification modules are configured to modulate two polarization components of the light beam.
7. The multi-channel parallel super-resolution laser direct-writing system according to claim 4, wherein the first one-stage beam combining module is configured to combine the beam centers generated by the first direct-writing sub-beam and the first suppression sub-beam to form a direct-writing-suppression beam combination;
and the second primary beam combining module is respectively used for combining the centers of the beams generated by the second direct-writing path sub-beam and the second inhibition path sub-beam to form another direct-writing-inhibition beam combination.
8. The multi-channel parallel super-resolution laser direct writing system according to claim 2, wherein the first primary beam combining module comprises a first one-half wave plate, a second one-half wave plate and a first dichroic mirror, and the first one-half wave plate and the second one-half wave plate are respectively arranged on two incident planes of the first dichroic mirror.
9. The multi-channel parallel super-resolution laser direct writing system according to claim 2, wherein the second primary beam combining module comprises a third half-wave plate, a fourth half-wave plate and a second dichroic mirror, and the third half-wave plate and the fourth half-wave plate are respectively arranged at two incident planes of the second dichroic mirror.
10. The multi-channel parallel super-resolution laser direct writing system according to claim 1, wherein the secondary beam combining module comprises a mirror group, a 4f system lens group and a beam combining mirror in sequential steps along the beam direction.
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| CN202111241111.8A CN113985706A (en) | 2021-10-25 | 2021-10-25 | Multichannel parallel super-resolution laser direct writing system |
| PCT/CN2022/076330 WO2023070991A1 (en) | 2021-10-25 | 2022-02-15 | Multi-channel parallel super-resolution laser direct writing system |
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| WO2023070991A1 (en) * | 2021-10-25 | 2023-05-04 | 之江实验室 | Multi-channel parallel super-resolution laser direct writing system |
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| CN111879737A (en) * | 2019-09-10 | 2020-11-03 | 之江实验室 | Device and method for generating high-flux super-diffraction limit focal spot |
| CN112363322A (en) * | 2020-10-12 | 2021-02-12 | 之江实验室 | Coaxial super-resolution focal spot array generating device for laser direct writing |
| CN113189846A (en) * | 2021-04-12 | 2021-07-30 | 之江实验室 | Double-path parallel super-resolution laser direct writing device based on light field regulation and control |
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| KR20050080059A (en) * | 2005-07-06 | 2005-08-11 | (주)영원테크 | Light exposure apparatus for manufacturing flat panel display based on laser |
| KR101369854B1 (en) * | 2012-03-02 | 2014-03-06 | 마이크로 인스펙션 주식회사 | Exposure apparatus for laser direct imaging |
| CN109283805A (en) * | 2018-11-29 | 2019-01-29 | 暨南大学 | Laser direct-writing device based on Darman raster |
| CN112068400A (en) * | 2020-09-01 | 2020-12-11 | 浙江大学 | Method and device for realizing high-flux parallel laser scanning direct-writing super-resolution photoetching |
| CN113189848B (en) * | 2021-04-21 | 2024-02-13 | 之江实验室 | Multichannel parallel super-resolution direct-writing type photoetching system based on optical fiber array |
| CN113985706A (en) * | 2021-10-25 | 2022-01-28 | 之江实验室 | Multichannel parallel super-resolution laser direct writing system |
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- 2021-10-25 CN CN202111241111.8A patent/CN113985706A/en active Pending
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- 2022-02-15 WO PCT/CN2022/076330 patent/WO2023070991A1/en unknown
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| CN102621823A (en) * | 2012-04-17 | 2012-08-01 | 中国科学院上海光学精密机械研究所 | Multi-beam parallel laser direct writing device and method |
| CN111879737A (en) * | 2019-09-10 | 2020-11-03 | 之江实验室 | Device and method for generating high-flux super-diffraction limit focal spot |
| CN112363322A (en) * | 2020-10-12 | 2021-02-12 | 之江实验室 | Coaxial super-resolution focal spot array generating device for laser direct writing |
| CN113189846A (en) * | 2021-04-12 | 2021-07-30 | 之江实验室 | Double-path parallel super-resolution laser direct writing device based on light field regulation and control |
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| WO2023070991A1 (en) * | 2021-10-25 | 2023-05-04 | 之江实验室 | Multi-channel parallel super-resolution laser direct writing system |
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| WO2023070991A1 (en) | 2023-05-04 |
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