CN113972341B - Transparent display substrate, manufacturing method thereof and display device - Google Patents
Transparent display substrate, manufacturing method thereof and display device Download PDFInfo
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- 239000000758 substrate Substances 0.000 title claims abstract description 150
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 20
- 238000002834 transmittance Methods 0.000 claims abstract description 30
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- 239000000463 material Substances 0.000 claims description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 17
- 229910001316 Ag alloy Inorganic materials 0.000 claims description 8
- 235000012239 silicon dioxide Nutrition 0.000 claims description 8
- 239000000377 silicon dioxide Substances 0.000 claims description 8
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 7
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 7
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 claims description 5
- SJCKRGFTWFGHGZ-UHFFFAOYSA-N magnesium silver Chemical compound [Mg].[Ag] SJCKRGFTWFGHGZ-UHFFFAOYSA-N 0.000 claims description 5
- DZPJVKXUWVWEAD-UHFFFAOYSA-N [C].[N].[Si] Chemical compound [C].[N].[Si] DZPJVKXUWVWEAD-UHFFFAOYSA-N 0.000 claims description 3
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- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 2
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/82—Cathodes
- H10K50/828—Transparent cathodes, e.g. comprising thin metal layers
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/82—Cathodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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Abstract
The embodiment of the application provides a transparent display substrate, a manufacturing method thereof and a display device. The transparent display substrate comprises a display area and a transparent area, wherein the display area comprises a plurality of sub-pixels, and the transparent display substrate further comprises: a substrate, a transparent cathode, and a cover layer; the transparent cathode is positioned on one side of the substrate, and the orthographic projection of the transparent cathode on the substrate is positioned in the display area; the covering layer is positioned on one side of the transparent cathode far away from the substrate and coats the transparent cathode, and the transmittance of the covering layer is smaller than that of the transparent cathode. According to the transparent display substrate provided by the invention, the patterned transparent cathode is used, and the patterned covering layer is used for covering the transparent cathode, so that the lateral light leakage of pixels is reduced, and the overall transmittance is improved.
Description
Technical Field
The application relates to the technical field of display, in particular to a transparent display substrate, a manufacturing method thereof and a display device.
Background
When an Organic Light-Emitting diode (OLED) is subjected to current, holes generated by the positive electrode and electrons generated by the negative electrode are recombined in the Light-Emitting layer and emit Light, and photons with different energies can be emitted according to different excitation energies, so that the Organic Light-Emitting diode (OLED) corresponds to Light with different colors. The organic light-emitting display panel using the OLED device as the display device has the advantages of self-luminescence, wide viewing angle, high contrast ratio and the like, and is widely applied to intelligent products such as mobile phones, televisions, notebook computers and the like.
At present, transparent display is a new wide application scene, the characteristics of OLED self-luminescence and the like are very suitable for transparent display design, a transparent display substrate is a display substrate with perspective effect, a user can simultaneously see images displayed in the transparent display substrate and scenes behind the transparent display substrate, and the inventor of the application finds that the influence on the transmittance of the transparent display substrate is larger at present on a cathode part.
Disclosure of Invention
The application provides a transparent display substrate, a manufacturing method thereof and a display device aiming at the defects of the prior art, and aims to solve the technical problem that the transparent display substrate in the prior art is low in transmittance.
In a first aspect, an embodiment of the present application provides a transparent display substrate, including a display area and a transparent area, where the display area includes a plurality of sub-pixels, and further includes: a substrate;
the transparent cathode is positioned on one side of the substrate, and the orthographic projection of the transparent cathode on the substrate is positioned in the display area;
the covering layer is positioned on one side of the transparent cathode, which is far away from the substrate, and coats the transparent cathode, and the transmittance of the covering layer is smaller than that of the transparent cathode.
Optionally, the transparent display substrate further includes a first light-transmitting layer and a second light-transmitting layer sequentially disposed on a side of the cover layer away from the substrate;
the first light-transmitting layer and the second light-transmitting layer cover the display area and the transparent area, and the refractive index of the first light-transmitting layer is smaller than that of the second light-transmitting layer.
Optionally, the transparent cathode has a thickness greater than 120nm and the cover layer has a thickness less than 10nm.
Optionally, the cover layer material comprises a magnesium silver alloy.
Optionally, the first light-transmitting layer material includes one or more of silicon dioxide, lithium fluoride, silicon carbon nitrogen;
the second light transmissive layer material comprises silicon nitride.
Optionally, an orthographic projection of the transparent cathode on the substrate overlaps the display region; alternatively, the transparent cathode includes a plurality of sub-transparent cathodes, and the orthographic projection of the sub-transparent cathode on the substrate overlaps with the orthographic projection of the sub-pixel on the substrate.
In a second aspect, the present application discloses a display device comprising a transparent display substrate as described in the first aspect.
In a third aspect, the present application discloses a method for preparing a transparent display substrate, the transparent display substrate including a display area and a transparent area, the display area including a plurality of sub-pixels, including:
providing a substrate;
manufacturing a transparent cathode on one side of the substrate through a patterning process, wherein the orthographic projection of the transparent cathode on the substrate is positioned in the display area;
and manufacturing a covering layer on one side of the transparent cathode far away from the substrate through a patterning process, wherein the transparent cathode is covered by the covering layer, and the transmittance of the covering layer is smaller than that of the transparent cathode.
Optionally, a transparent cathode is fabricated on one side of the substrate through a patterning process, and a cover layer is formed on one side of the transparent cathode away from the substrate through the patterning process, including:
manufacturing a transparent cathode on one side of the substrate through a patterning process, wherein orthographic projection of the transparent cathode on the substrate is overlapped with the display area; forming a cover layer on one side of the transparent cathode far away from the substrate through a patterning process, wherein the cover layer covers the transparent cathode;
or alternatively; a transparent cathode is manufactured on one side of the substrate through a patterning process, the transparent cathode comprises a plurality of sub-transparent cathodes, and the positions of the sub-transparent cathodes are in one-to-one correspondence with the positions of the sub-pixels;
and forming a covering layer on one side of the transparent cathode far away from the substrate through a patterning process, wherein the covering layer comprises a plurality of sub-covering layers, the positions of the sub-covering layers are in one-to-one correspondence with the positions of the sub-transparent cathodes, and each sub-covering layer covers the sub-transparent cathode at the corresponding position.
Optionally, a first light-transmitting layer and a second light-transmitting layer are sequentially prepared on one side, far away from the substrate, of the transparent cathode, and the refractive index of the first light-transmitting layer is smaller than that of the second light-transmitting layer.
The beneficial technical effects that technical scheme that this application embodiment provided brought include:
according to the transparent display substrate provided by the embodiment of the application, the transparent cathode is only arranged in the display area through patterning the transparent cathode, and the transparent cathode is not arranged in the transparent area, so that the transmittance of the transparent area is improved, and the overall transmittance of the transparent display substrate is improved; and through setting up overburden cladding transparent cathode, and overburden transmissivity is less than transparent cathode transmissivity for the emergent light of orientation pixel side direction is blockked and is reflected by the overburden, thereby has reduced the light leak of pixel side direction, avoids transparent display substrate to scurry the look, makes transparent display substrate have better visual angle characteristic simultaneously.
The foregoing description is merely an overview of the technical solutions of the embodiments of the present application, and may be implemented according to the content of the specification, so that the technical means of the embodiments of the present application can be more clearly understood, and the following specific implementation of the embodiments of the present application will be more clearly understood.
Drawings
The foregoing and/or additional aspects and advantages of the present application will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings, in which:
FIG. 1 is a cross-sectional view of a transparent display substrate according to an embodiment of the present disclosure;
FIG. 2 is a cross-sectional view of another transparent display substrate according to an embodiment of the disclosure;
FIG. 3 is a schematic diagram illustrating an improvement of lateral light leakage effect of a transparent display substrate according to an embodiment of the present disclosure;
FIG. 4 is a cross-sectional view of another transparent display substrate according to an embodiment of the present disclosure;
FIG. 5 is a partial top view of a transparent display substrate according to an embodiment of the present disclosure;
FIG. 6 is a partial top view of another transparent display substrate according to an embodiment of the present disclosure;
FIG. 7 is a partial top view of yet another transparent display substrate according to an embodiment of the present disclosure;
fig. 8 is a flowchart of a method for manufacturing a transparent display substrate according to an embodiment of the present application.
The reference numerals are introduced as follows:
1-a transparent display substrate; 10-substrate; 21-a transparent cathode; 22-a cover layer; 31-a first light-transmitting layer; 32-a second light-transmitting layer; a-a display area; b-transparent region.
Detailed Description
Examples of embodiments of the present application are illustrated in the accompanying drawings, in which like or similar reference numerals refer to like or similar elements or elements having like or similar functionality throughout. Further, if detailed description of the known technology is not necessary for the illustrated features of the present application, it will be omitted. The embodiments described below by referring to the drawings are exemplary only for the purpose of illustrating the present application and are not to be construed as limiting the present application.
It will be understood by those skilled in the art that all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs unless defined otherwise. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the prior art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.
As used herein, the singular forms "a", "an", "the" and "the" are intended to include the plural forms as well, unless expressly stated otherwise, as understood by those skilled in the art. It will be further understood that the terms "comprises" and/or "comprising," when used in this specification, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof. It will be understood that when an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. Further, "connected" as used herein may include wireless connections. The term "and/or" as used herein includes all or any element and all combination of one or more of the associated listed items.
The transparent display panel is a display panel with a perspective effect, so that a user can simultaneously see images displayed in the transparent display panel and a scene behind the transparent display panel, and the OLED is widely applied to transparent display scenes because the OLED has self-luminescence and other characteristics and is suitable for transparent display design. Considering the display effect and transmittance comprehensively, the transparent OLED substrate in the prior art usually adopts a transparent conductive oxide material as a cathode, and the whole surface of the transparent cathode covers the display area and the transparent area.
The applicant found that the transmittance of the transparent region is greatly affected by the transparent cathode, since the transmittance of the cathode layer made of the transparent conductive oxide film is not 100%, and the transmittance is still lower than that of the film with high transmittance, such as silicon dioxide. Meanwhile, the applicant finds that, due to the adoption of the transparent material as the cathode of the transparent OLED substrate, in normal display, the transparent OLED substrate has the problems of poor visual angle characteristics, color channeling and the like caused by the influence of light leaked from the side direction of the pixel on the whole display effect.
Based on the above, the application provides a transparent display substrate, a preparation method thereof and a display device, which are used for solving the technical problem of lateral light leakage of the transparent display substrate in the prior art and improving the overall transmittance.
The following describes in detail the transparent display substrate and the manufacturing method thereof provided in the embodiments of the present application with reference to the accompanying drawings.
Referring to fig. 1, 5, 6 and 7, an embodiment of the present application provides a transparent display substrate 1, including a display area a and a transparent area b, where the display area a includes a plurality of sub-pixels, the transparent display substrate includes: a substrate 10, a transparent cathode 21, and a cover layer 22; specifically, the transparent cathode 21 is located on one side of the substrate 10, and the orthographic projection of the transparent cathode 21 on the substrate 10 is located in the display area a; the cover layer 22 is located on the side of the transparent cathode 21 away from the substrate 10, and covers the transparent cathode 21, and the transmittance of the cover layer 22 is smaller than that of the transparent cathode 21.
It should be noted that, the base 10 in the embodiment of the present application may refer to a display back plate, where the display back plate includes a substrate, and a driving circuit layer disposed on the substrate, where the orthographic projection of the driving circuit layer on the substrate is located in a display area, and the driving circuit layer includes a pixel circuit composed of a plurality of thin film transistors, and the specific arrangement mode of the display back plate in the embodiment of the present application is similar to that of the prior art, and is not repeated herein. In addition, in the embodiment of the present application, a film layer such as an anode and an organic electroluminescent layer is further disposed between the display back plate and the transparent cathode 21, and since the specific arrangement of these film layers is similar to the prior art and does not relate to the improvement point of the present application, the description thereof will not be repeated here.
The display area a in the embodiment of the present application includes a plurality of sub-pixels, which may specifically include a red (R) sub-pixel, a green (G) sub-pixel, and a blue (B) sub-pixel, where the arrangement manner of the R sub-pixel, the G sub-pixel, and the B sub-pixel may be as shown in fig. 5, or other arrangement manners may also be adopted, for example, the R sub-pixel, the G sub-pixel, and the B sub-pixel are sequentially arranged along the row direction, and the embodiment of the present application is not limited to the specific arrangement manner of the R sub-pixel, the G sub-pixel, and the B sub-pixel; in addition, the display area a may further include a red (R) sub-pixel, a green (G) sub-pixel, a blue (B) sub-pixel, and a white (W) sub-pixel, where the arrangement manners of the R sub-pixel, the G sub-pixel, the B sub-pixel, and the W sub-pixel may be as shown in fig. 7, and other arrangement manners, for example, the R sub-pixel, the G sub-pixel, the B sub-pixel, and the W sub-pixel may be sequentially arranged along the row direction.
Alternatively, referring to fig. 1 and 5, in one embodiment, the front projection of the transparent cathode 21 onto the substrate 10 overlaps the display area a; i.e. the position of the display area a corresponds to the position of the transparent cathode 21, in which arrangement the transparent cathode 21 covers all sub-pixels in the display area a at the same time, i.e. all sub-pixels share one transparent cathode 21, and the cover layer 22 is located at the side of the transparent cathode 21 remote from the substrate 10, the cover layer 22 covering the transparent cathode 21.
Alternatively, referring to fig. 2 and 6, in another embodiment, unlike the transparent display substrate 1 shown in fig. 1 and 5, the transparent cathode 21 shown in fig. 2 and 6 includes a plurality of sub-transparent cathodes, such as sub-transparent cathode 211, sub-transparent cathode 212, and sub-transparent cathode 213, and positions of the sub-transparent cathode 211, sub-transparent cathode 212, and sub-transparent cathode 213 are in one-to-one correspondence with positions of R sub-pixels, G sub-pixels, and B sub-pixels; in this arrangement, as shown in fig. 1 and 5, the transparent cathode 21 needs to be patterned into a plurality of strip-shaped sub-transparent cathodes, each sub-pixel has a corresponding sub-transparent cathode, and in this embodiment, the sub-pixel refers to an effectively luminous sub-pixel, specifically, may be an R sub-pixel, a G sub-pixel, a B sub-pixel, or a sub-pixel W as shown in fig. 7, where the orthographic projection area of the sub-transparent cathode on the substrate 10 overlaps with the effective luminous area, and the cover layer 22 is located on one side of the transparent cathode 21 away from the substrate 10, where the cover layer 22 includes a plurality of sub-cover layers, the positions of the sub-cover layers are in one-to-one correspondence with the positions of the sub-transparent cathode 211, the sub-transparent cathode 212, and the sub-transparent cathode 213, and the positions of each sub-cover layer correspond to one-to one.
The transparent cathode 21 in the embodiment of the present application may use a transparent conductive oxide material, and the transparent conductive oxide material used as the cathode has better white light characteristics than the metal material used as the cathode, and specifically, the transparent cathode 21 material includes Indium Tin Oxide (ITO) or Indium Zinc Oxide (IZO), and the like.
In a specific embodiment, the transparent cathode 21 is made of Indium Zinc Oxide (IZO) material, the thickness of the transparent cathode 21 is set according to actual needs, the larger the thickness of the transparent cathode 21 is, the worse the transmittance is, the lower the resistance is, and the thickness of the transparent cathode 21 can be set to be larger than 120nm by comprehensively considering the transmittance and the resistance performance of the transparent cathode 21.
In the present embodiment, the cover layer 22 is provided to cover the transparent electrode 21, and the transmittance of the cover layer 22 is smaller than that of the transparent cathode 21, so that the light leaking laterally from the transparent cathode 21 is blocked and reflected by the cover layer 22, thereby reducing the lateral light leakage of the pixel and improving the viewing angle characteristic and the color gamut.
Further, considering the refraction and transmission of the light by the cover layer 22, the cover layer 22 may be a semi-transparent and semi-reflective film, that is, the transmittance and reflectance of the cover layer 22 are both 50%, and of course, the cover layer 22 may be set to a film with other transmittance and reflectance according to actual requirements, for example: the transmittance is greater than the reflectance, such as 60% transmittance, 40% reflectance, or less than the reflectance, such as 40% transmittance, 60% reflectance, etc.
Further, the cover layer 22 may be a conductive semi-transparent and semi-reflective film layer or a non-conductive semi-transparent and semi-reflective film layer, and the cover layer 22 may cover the transparent cathode 21 to prevent lateral light leakage, and when the cover layer 22 is a conductive semi-transparent and semi-reflective film layer, the cover layer 22 may be an auxiliary cathode of the transparent display substrate, that is, the cover layer 22 may be regarded as a part of the transparent cathode 21, and the arrangement of the cover layer 22 may reduce the resistance of the cathode of the transparent display substrate, thereby improving the transmission characteristics of the electrical signal.
In a specific embodiment, the material of the covering layer 22 in this embodiment of the present application includes a mg-ag alloy, where the mg-ag alloy has a strong reflection capability for light, and specifically, the molar ratio of mg to ag in the mg-ag alloy may be set to be 1:1, the obtained magnesium-silver alloy coating layer 22 has semi-transparent and semi-reflective characteristics, and can reflect part of light emitted to the lateral direction of the transparent cathode, so that lateral light leakage of pixels is reduced, the reflection of lateral light leakage and the transmission of forward emergent light of the pixels of the coating layer 22 are comprehensively considered, and the thickness of the coating layer 22 can be set to be smaller than 10nm.
According to the transparent display substrate provided by the embodiment of the application, the patterned transparent cathode 21 is arranged, so that the transmittance of a transparent area of the transparent display substrate is improved, and the overall transmittance of the transparent display substrate is further improved; and by providing the cover layer 22 for covering the transparent cathode 21, referring to fig. 3, the emergent light emitted to the lateral direction of the transparent cathode 21 is reflected and blocked by the cover layer 22, so that the lateral light leakage of the pixel is greatly reduced, and the viewing angle characteristic and the color gamut of the transparent display substrate are improved.
Referring to fig. 4, in one embodiment, a first light-transmitting layer 31 and a second light-transmitting layer 32 are sequentially disposed on a side of the cover layer 22 remote from the substrate 10; the first light-transmitting layer 31 and the second light-transmitting layer 32 cover the display area a and the transparent area b, and the refractive index of the first light-transmitting layer 31 is smaller than that of the second light-transmitting layer 32; because the refractive index of the first light-transmitting layer 31 is smaller than that of the second light-transmitting layer 32, the first light-transmitting layer 31 and the second light-transmitting layer 32 form a film structure with high and low refractive indexes, and the film structure is similar to a microcavity, can play a role in narrowing a spectrum, and further can improve the efficiency of a device.
Specifically, the first light-transmitting layer 31 is a low refractive index film layer, and the material includes silicon dioxide (SiO 2 ) One or more of lithium fluoride (LiF), silicon carbon nitrogen (SiCN), the second light transmissive layer 32 is a high refractive index film, and the material comprises silicon nitride (SiN).
In a specific embodiment, the material of the first light-transmitting layer 31 is silicon dioxide, the material of the second light-transmitting layer 32 is silicon nitride, the first light-transmitting layer 31 and the second light-transmitting layer 32 form a high-low refractive index design, a film structure similar to a microcavity is formed, and the thickness of the first light-transmitting layer 31 is set to be smaller than 100nm, so that the structure similar to the microcavity has the best spectrum narrowing effect, further plays a role in narrowing the spectrum, and further improves the device efficiency.
Based on the same inventive concept, the embodiment of the present application provides a display device, which includes the above transparent display substrate provided in the embodiment of the present application, and since the display device includes the above transparent display substrate, the display device has the same beneficial effects as the transparent display substrate, so that the beneficial effects of the display device are not repeated.
Based on the same inventive concept, the embodiment of the present application provides a method for preparing a transparent display substrate, where a flow chart of the preparation method is shown in fig. 8, and the method includes:
s101, providing a substrate.
S102, manufacturing a transparent cathode on one side of a substrate through a patterning process, wherein the orthographic projection of the transparent cathode on the substrate is positioned in a display area.
S103, manufacturing a covering layer on one side, far away from the substrate, of the transparent cathode through a patterning process, wherein the transparent cathode is covered by the covering layer, and the transmittance of the covering layer is smaller than that of the transparent cathode.
In a specific embodiment, the embodiment of the present application forms a transparent cathode on one side of a substrate through a patterning process, forms a cover layer on a side of the transparent cathode away from the substrate through the patterning process, and includes:
manufacturing a transparent cathode on one side of a substrate through a patterning process, wherein orthographic projection of the transparent cathode on the substrate is overlapped with a display area; and forming a covering layer on one side of the transparent cathode far away from the substrate through a patterning process, wherein the covering layer covers the transparent cathode.
Specifically, referring to the transparent display substrate shown in fig. 1 and fig. 5, a substrate 10 is provided first, the substrate 10 may be a display back plate, and a specific manufacturing method of each film layer in the display back plate is similar to the prior art, and will not be repeated here. Then, a whole transparent conductive oxide film layer is prepared on the substrate 10 by adopting a magnetron sputtering mode (other film plating modes can be adopted), the thickness of the film layer is larger than 120nm, then the transparent conductive oxide film layer is patterned by etching equipment, the transparent conductive oxide film layer positioned in the display area is reserved, and the transparent conductive oxide film layer positioned in the transparent area is removed, so that the transparent cathode 21 is obtained.
Thereafter, a metal layer is prepared on the side of the transparent cathode 21 far from the substrate 10, and the metal layer may be made of magnesium-silver alloy, specifically, the metal layer may be prepared by adopting a fine metal mask (FFM) sputtering method, so as to form a covering layer 22 for covering the transparent cathode 21, in a specific preparation process, the size of an opening of the fine metal mask needs to be larger than the size of the transparent cathode 21, so that the formed covering layer 22 can wrap the transparent cathode 21, and the thickness of the covering layer 22 is generally smaller than 10nm.
In addition, after the cover layer 22 is manufactured, the embodiment of the present application further includes: a first light-transmitting layer 31 and a second light-transmitting layer 32 are sequentially prepared on the side of the cover layer 22 away from the substrate 10, as shown in fig. 4, the refractive index of the first light-transmitting layer 31 being smaller than that of the second light-transmitting layer 32.
Specifically, the material of the first light-transmitting layer 31 is silicon dioxide, the material of the second light-transmitting layer 32 is silicon nitride, and a silicon dioxide layer is prepared on the side of the cover layer 22 far from the substrate 10 by adopting an Atomic Layer Deposition (ALD) or Chemical Vapor Deposition (CVD), namely the first light-transmitting layer 31, as shown in fig. 4, and the thickness of the silicon dioxide is less than 100nm; then, a silicon nitride layer, i.e., a second light-transmitting layer 32, is formed on the first light-transmitting layer 31 by Atomic Layer Deposition (ALD) or Chemical Vapor Deposition (CVD). The refractive index of the first light-transmitting layer 31 is smaller than that of the second light-transmitting layer 32, so that a high-low refractive index structure is formed, similar to a microcavity structure, and the device efficiency is further improved while the spectrum is narrowed.
In another specific embodiment, the embodiment of the present application forms a transparent cathode on one side of a substrate through a patterning process, and forms a cover layer on a side of the transparent cathode away from the substrate through the patterning process, including:
a transparent cathode is manufactured on one side of the substrate through a patterning process, the transparent cathode comprises a plurality of sub-transparent cathodes, and the positions of the sub-transparent cathodes are in one-to-one correspondence with the positions of the sub-pixels;
and forming a covering layer on one side of the transparent cathode far from the substrate through a patterning process, wherein the covering layer comprises a plurality of sub-covering layers, the positions of the sub-covering layers correspond to the positions of the sub-transparent cathodes one by one, and each sub-covering layer covers the sub-transparent cathode at the corresponding position.
Specifically, referring to the transparent display substrate shown in fig. 2 and 6, a substrate 10 is provided first, the substrate 10 may be a display back plate, and a specific manufacturing method of each film layer in the display back plate is similar to the prior art, and will not be repeated here. Then, a patterned transparent cathode 21 is directly prepared by adopting a fine metal mask (FFM) sputtering method, the orthographic projection of the transparent cathode 21 on the substrate 10 is positioned in a display area, the prepared transparent cathode 21 comprises a plurality of strip-shaped sub-transparent cathodes 211, sub-transparent cathodes 212 and sub-transparent cathodes 213, the positions of the sub-transparent cathodes are in one-to-one correspondence with the positions of the sub-pixels, and the sub-pixels in the embodiment of the application refer to sub-pixels capable of effectively emitting light, namely the orthographic projection area of the sub-transparent cathode on the substrate 10 overlaps with the effective light emitting area.
Then, a metal layer is prepared on the side of the transparent cathode 21 far from the substrate 10, the material of the metal layer can be magnesium-silver alloy, specifically, a fine metal mask (FFM) sputtering method is used to prepare a cover layer 22, the cover layer 22 is positioned on the side of the transparent cathode 21 far from the substrate 10, the cover layer 22 comprises a plurality of sub-cover layers, the positions of the sub-cover layers are in one-to-one correspondence with the positions of the sub-transparent cathode 211, the sub-transparent cathode 212 and the sub-transparent cathode 213, and each sub-cover layer covers the sub-transparent cathode at the corresponding position. It should be noted that the opening of the fine metal mask is slightly larger than the size of one sub-transparent cathode, and the thickness of the sputtered coating 22 is less than 10nm.
By applying the embodiment of the application, the following beneficial effects can be realized:
1. according to the transparent display substrate provided by the embodiment of the application, the transparent cathode is only arranged in the display area through patterning the transparent cathode, and the transparent cathode is not arranged in the transparent area, so that the transmittance of the transparent area is improved, and the overall transmittance of the transparent display substrate is improved; and through setting up overburden cladding transparent cathode, and overburden transmissivity is less than transparent cathode transmissivity for the emergent light of directional pixel is blockked and is reflected by the overburden, thereby has reduced the lateral light leak of pixel, avoids transparent display substrate to scurry the look, makes transparent display substrate have more visual angle characteristic simultaneously.
2. The transparent display substrate provided by the embodiment of the application; through setting up first euphotic layer and second euphotic layer, and set up first euphotic layer refracting index and be less than second euphotic layer refracting index, form high low refractive index structure, this kind of rete structure is similar to the microcavity, can play the effect of narrowing the spectrum, and then can promote device efficiency.
Those of skill in the art will appreciate that the various operations, methods, steps in the flow, actions, schemes, and alternatives discussed in the present application may be alternated, altered, combined, or eliminated. Further, other steps, means, or steps in a process having various operations, methods, or procedures discussed in this application may be alternated, altered, rearranged, split, combined, or eliminated. Further, steps, measures, schemes in the prior art with various operations, methods, flows disclosed in the present application may also be alternated, altered, rearranged, decomposed, combined, or deleted.
In the description of the present application, it should be understood that the terms "center," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like indicate orientations or positional relationships based on the orientation or positional relationships shown in the drawings, merely to facilitate description of the present application and simplify the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be configured and operated in a specific orientation, and therefore should not be construed as limiting the present application.
The terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more such feature. In the description of the present application, unless otherwise indicated, the meaning of "a plurality" is two or more.
In the description of the present specification, a particular feature, structure, material, or characteristic may be combined in any suitable manner in one or more embodiments or examples.
It should be understood that, although the steps in the flowcharts of the figures are shown in order as indicated by the arrows, these steps are not necessarily performed in order as indicated by the arrows. The steps are not strictly limited in order and may be performed in other orders, unless explicitly stated herein. Moreover, at least some of the steps in the flowcharts of the figures may include a plurality of sub-steps or stages that are not necessarily performed at the same time, but may be performed at different times, the order of their execution not necessarily being sequential, but may be performed in turn or alternately with other steps or at least a portion of the other steps or stages.
The foregoing is only a partial embodiment of the present application, and it should be noted that, for a person skilled in the art, several improvements and modifications can be made without departing from the principle of the present application, and these improvements and modifications should also be considered as the protection scope of the present application.
Claims (8)
1. A transparent display substrate comprising a display area and a transparent area, the display area comprising a plurality of sub-pixels, the transparent display substrate further comprising:
a substrate;
the transparent cathode is positioned on one side of the substrate, and the orthographic projection of the transparent cathode on the substrate is positioned in the display area;
the covering layer is positioned on one side of the transparent cathode, far away from the substrate, and coats the transparent cathode, and the transmittance of the covering layer is smaller than that of the transparent cathode;
the substrate comprises a substrate body and a cover layer, and is characterized by further comprising a first light-transmitting layer and a second light-transmitting layer which are sequentially arranged on one side of the cover layer away from the substrate body;
the first light-transmitting layer and the second light-transmitting layer cover the display area and the transparent area, and the refractive index of the first light-transmitting layer is smaller than that of the second light-transmitting layer.
2. The transparent display substrate of claim 1, wherein the transparent cathode has a thickness greater than 120nm and the cover layer has a thickness less than 10nm.
3. The transparent display substrate of claim 1, wherein the cover layer material comprises a magnesium silver alloy.
4. The transparent display substrate of claim 1, wherein the first light transmissive layer material comprises one or more of silicon dioxide, lithium fluoride, silicon carbon nitrogen;
the second light transmissive layer material comprises silicon nitride.
5. The transparent display substrate according to any one of claims 1-4, wherein an orthographic projection of the transparent cathode onto the base overlaps the display area; or,
the transparent cathode comprises a plurality of sub-transparent cathodes, and the orthographic projection of the sub-transparent cathodes on the substrate overlaps with the orthographic projection of the sub-pixels on the substrate.
6. A display device comprising the transparent display substrate according to any one of claims 1 to 5.
7. A method for manufacturing a transparent display substrate, the transparent display substrate including a display area and a transparent area, the display area including a plurality of sub-pixels, the method comprising:
providing a substrate;
manufacturing a transparent cathode on one side of the substrate through a patterning process, wherein the orthographic projection of the transparent cathode on the substrate is positioned in the display area;
manufacturing a cover layer on one side of the transparent cathode far away from the substrate through a patterning process, wherein the cover layer covers the transparent cathode, and the transmittance of the cover layer is smaller than that of the transparent cathode;
and sequentially preparing a first light-transmitting layer and a second light-transmitting layer on one side of the covering layer far away from the substrate, wherein the refractive index of the first light-transmitting layer is smaller than that of the second light-transmitting layer.
8. The method of manufacturing according to claim 7, wherein fabricating a transparent cathode on a side of the substrate by a patterning process, and forming a capping layer on a side of the transparent cathode remote from the substrate by a patterning process, comprises:
manufacturing a transparent cathode on one side of the substrate through a patterning process, wherein orthographic projection of the transparent cathode on the substrate is overlapped with the display area; forming a cover layer on one side of the transparent cathode far away from the substrate through a patterning process, wherein the cover layer covers the transparent cathode;
or alternatively;
a transparent cathode is manufactured on one side of the substrate through a patterning process, the transparent cathode comprises a plurality of sub-transparent cathodes, and the positions of the sub-transparent cathodes are in one-to-one correspondence with the positions of the sub-pixels;
and forming a covering layer on one side of the transparent cathode far away from the substrate through a patterning process, wherein the covering layer comprises a plurality of sub-covering layers, the positions of the sub-covering layers are in one-to-one correspondence with the positions of the sub-transparent cathodes, and each sub-covering layer covers the sub-transparent cathode at the corresponding position.
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| KR20160065318A (en) * | 2014-11-28 | 2016-06-09 | 삼성디스플레이 주식회사 | Organic light emitting diode display |
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