CN113964636A - Ultraviolet laser with self-optimized light beam quality - Google Patents
Ultraviolet laser with self-optimized light beam quality Download PDFInfo
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- CN113964636A CN113964636A CN202111214575.XA CN202111214575A CN113964636A CN 113964636 A CN113964636 A CN 113964636A CN 202111214575 A CN202111214575 A CN 202111214575A CN 113964636 A CN113964636 A CN 113964636A
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- 239000013078 crystal Substances 0.000 claims abstract description 36
- 230000003287 optical effect Effects 0.000 claims abstract description 17
- 238000000034 method Methods 0.000 claims abstract description 14
- 238000005086 pumping Methods 0.000 claims abstract description 6
- 229910003327 LiNbO3 Inorganic materials 0.000 claims description 3
- 238000004891 communication Methods 0.000 claims description 3
- 238000005457 optimization Methods 0.000 claims description 3
- 238000009826 distribution Methods 0.000 abstract description 2
- 238000010187 selection method Methods 0.000 abstract description 2
- 238000011160 research Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10053—Phase control
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0813—Configuration of resonator
- H01S3/0816—Configuration of resonator having 4 reflectors, e.g. Z-shaped resonators
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/107—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using electro-optic devices, e.g. exhibiting Pockels or Kerr effect
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Abstract
The invention discloses an ultraviolet laser with self-optimized beam quality, which relates to the technical field of lasers and comprises an infrared fundamental frequency optical module and an ultraviolet frequency doubling module, wherein the infrared fundamental frequency optical module comprises a pumping source, a lens group, a cavity mirror, an electro-optic crystal, a laser crystal, a first reflector, a second reflector, a third reflector, an aperture diaphragm and an SESAM crystal which are sequentially arranged, so that a light path formed by reflecting the laser beam is in a Z-shaped folded shape. The ultraviolet laser adopts electro-optic crystals for phase modulation, so that the phase at different positions in the transverse direction in the cavity can be changed, and the loss of different modes can be controlled; the aperture diaphragm is adopted for spatial modulation, and a high-order mode is actively inhibited through the combination of phase modulation and a spatial mode selection method, so that the efficiency of a transverse fundamental mode is improved, and the light intensity distribution and the quality of an output light beam are improved; and the whole debugging process avoids manual adjustment, improves the precision through electric adjustment, and realizes the automatic adjustment of the light beam quality.
Description
Technical Field
The invention relates to the technical field of solid-state lasers, in particular to an ultraviolet laser with self-optimized beam quality.
Background
The laser is widely applied to the fields of processing, production, scientific research and the like, has certain parameter requirements on the power of output laser, the shape of a light spot, the divergence angle and the like in practical application, and particularly directly influences the research result on the quality and the stability of a laser beam in the scientific research field.
The output mode of the laser is determined by the relative loss of each mode in the cavity, and each mode with the gain exceeding the oscillation threshold value is possibly started, but is limited by competition among the modes; the relative losses of the modes are fixed under certain resonator structure and pumping conditions.
The output beam of the laser often does not meet the requirements of high power and high beam quality, and the output power of the laser is usually increased through special design. Common methods for improving output power or output quality include: the number of the lasers is increased, and the final output power is improved while the quality of the light beam is ensured by beam combination; or the average output power of the laser is increased and the beam quality is improved as much as possible by changing the resonant cavity and using a large-gain laser cavity type. These are passive beam quality enhancements that require manual adjustment.
Disclosure of Invention
The invention provides an ultraviolet laser with self-optimized beam quality aiming at the problems and the technical requirements, and the technical scheme of the invention is as follows:
an ultraviolet laser with self-optimized beam quality comprises an infrared fundamental frequency optical module and an ultraviolet frequency doubling module, wherein the infrared fundamental frequency optical module comprises a pumping source, a lens group, a cavity mirror, an electro-optic crystal, a laser crystal, a first reflector, a second reflector, a third reflector, an aperture diaphragm and an SESAM crystal which are sequentially arranged, so that a light path formed by reflecting the laser beam is in a Z-shaped folded shape; the beam quality self-optimization method of the ultraviolet laser comprises the following steps:
the electric adjusting device moves the small-hole diaphragm to enable the central position of the small-hole diaphragm to coincide with the central position of the light beam facula;
adjusting the aperture size of the small-hole diaphragm to ensure that only the basic transverse mode light beam passes through the small-hole diaphragm;
the refractive index of the electro-optic crystal is changed by adjusting the voltage applied to the electro-optic crystal, so that the output power of the infrared base frequency module and/or the ultraviolet frequency doubling module is the maximum power.
Further, the second reflecting mirror is a light-emitting mirror.
Further, the infrared base frequency module and/or the ultraviolet frequency doubling module further comprise a power detector for detecting the output power of the infrared base frequency module and/or the ultraviolet frequency doubling module.
Further, the electro-optic crystal is made of LiNbO3。
Further, a two-electrode method or a four-electrode method is used to adjust the voltage applied to the electro-optic crystal.
Furthermore, the aperture adjusting range of the aperture diaphragm is 0.5mm-5 mm.
Furthermore, a light outlet of the infrared base frequency module and a light inlet of the ultraviolet frequency doubling module are sealed by window sheets, and the infrared base frequency module is mechanically connected with the ultraviolet frequency doubling module.
And the control module is used for controlling the signal communication of the infrared fundamental frequency optical module and the ultraviolet frequency doubling module.
The beneficial technical effects of the invention are as follows:
the application discloses an ultraviolet laser with self-optimized beam quality, which adopts electro-optic crystals to perform phase modulation, so that the phase at different positions in the transverse direction in a cavity can be changed, and the loss in different modes can be controlled; and the electric aperture diaphragm is adopted for spatial modulation, and a high-order mode is actively inhibited and the TEM is improved by combining the phase modulation and the spatial mode selection method00The efficiency of the mode, and thus the intensity distribution and quality of the output beam. And the whole debugging process avoids manual adjustment, improves the precision through electric adjustment, and realizes the automatic adjustment of the light beam quality.
Drawings
Fig. 1 is a system block diagram of an ultraviolet laser of the present application.
Fig. 2 is a schematic structural diagram of the ultraviolet laser of the present application.
Detailed Description
The following further describes the embodiments of the present invention.
The embodiment of the application discloses beam quality is from ultraviolet laser of optimizing, specifically refer to fig. 1-2, this ultraviolet laser includes infrared fundamental frequency optical module and ultraviolet frequency doubling module, and infrared fundamental frequency optical module is including the pumping source, the battery of lens, chamber mirror, the electro-optic crystal, laser crystal, first speculum, second speculum, third speculum, aperture diaphragm and the SESAM crystal that set gradually for the light path that laser beam formed through the reflection is the Z shape fold form.
The ultraviolet frequency doubling module comprises a lens set, at least one frequency doubling crystal and a reflector.
The infrared base frequency module and the ultraviolet frequency doubling module are independently arranged, preferably, a light outlet of the infrared base frequency module and a light inlet of the ultraviolet frequency doubling module are both provided with window sheet seals, and the infrared base frequency module is mechanically connected with the ultraviolet frequency doubling module. In one embodiment, the cavity of the infrared fundamental frequency optical module is provided with a positioning screw hole, and the ultraviolet frequency doubling module cavity is attached to the cavity of the infrared fundamental frequency optical module and then is positioned and fixed through screws.
In one embodiment, the second mirror is an exit mirror. Specifically, light emitted by the pumping source is integrated with light spots through the lens group, then is transmitted to the cavity mirror, the electro-optic crystal and the laser crystal, passes through the first reflector, the second reflector, the third reflector, the aperture diaphragm and the SESAM crystal to form laser oscillation, and is transmitted out of the laser cavity through the second reflector.
The beam quality self-optimization method of the ultraviolet laser comprises the following steps:
the electric adjusting device moves the small-hole diaphragm to enable the central position of the small-hole diaphragm to coincide with the central position of the light beam facula; in one embodiment, the aperture stop is mounted on an electric adjustment device which controls the direction of movement and the precision of movement of the aperture stop, preferably the precision of movement is < 0.05 mm.
Adjusting the aperture size of the small-hole diaphragm to ensure that only the basic transverse mode light beam passes through the small-hole diaphragm; in one embodiment, the electric adjusting device adjusts the aperture size of the aperture diaphragm, preferably, the aperture adjusting range is 0.5mm-5mm, and the adjusting precision is less than 0.05 mm.
By regulating the voltage applied to the electro-optic crystal to be largeThe refractive index of the electro-optical crystal is changed so that the output power of the infrared base frequency optical module and/or the ultraviolet frequency doubling module is the maximum power. Preferably, the material of the electro-optic crystal is LiNbO3。
In one embodiment, a two-electrode method or a four-electrode method is used to adjust the voltage applied to the electro-optic crystal; specifically, a transverse section of the electro-optical crystal is defined as an xy plane, four electrodes are arranged on the periphery of the electro-optical crystal, two electrodes in the x-axis direction are in one group, two electrodes in the y-axis direction are in one group, when a two-electrode method is adopted, any one of the two groups of electrodes is selected for modulation, and when a four-electrode method is adopted, the two groups of electrodes work simultaneously for modulation. By modulating the electrode voltage of the electro-optical crystal, the refractive index of the electro-optical crystal is changed, so that the phases of different laser modes are changed, and the loss of a high-order mode is increased and restrained.
In one embodiment, the infrared base frequency optical module and/or the ultraviolet frequency doubling module further includes a power detector for detecting the output power of the infrared base frequency optical module and/or the ultraviolet frequency doubling module to determine whether the output power of the infrared base frequency optical module and/or the ultraviolet frequency doubling module reaches the maximum power.
In one embodiment, the laser further includes a control module connected to the infrared fundamental frequency optical module and the ultraviolet frequency doubling module, and configured to control signal communication between the infrared fundamental frequency optical module and the ultraviolet frequency doubling module. Preferably, the control module can also store parameter combinations of the optimal state of the laser beam quality, including the position of the aperture diaphragm, the aperture size, the amplitude of the modulation voltage of the electro-optical crystal, the frequency, the crystal temperature and the like. When the laser performance is reduced, the infrared base frequency module and/or the ultraviolet frequency doubling module can be optimized and adjusted through the controller.
What has been described above is only a preferred embodiment of the present application, and the present invention is not limited to the above embodiment. It is to be understood that other modifications and variations directly derivable or suggested by those skilled in the art without departing from the spirit and concept of the present invention are to be considered as included within the scope of the present invention.
Claims (8)
1. The ultraviolet laser capable of self-optimizing the beam quality is characterized by comprising an infrared fundamental frequency optical module and an ultraviolet frequency doubling module, wherein the infrared fundamental frequency optical module comprises a pumping source, a lens group, a cavity mirror, an electro-optic crystal, a laser crystal, a first reflecting mirror, a second reflecting mirror, a third reflecting mirror, an aperture diaphragm and an SESAM crystal which are sequentially arranged, so that a light path formed by reflecting the laser beam is in a Z-shaped folded shape; the beam quality self-optimization method of the ultraviolet laser comprises the following steps:
the electric adjusting device moves the small aperture diaphragm to enable the central position of the small aperture diaphragm to be superposed with the central position of the light beam facula;
adjusting the aperture size of the small aperture diaphragm to ensure that only the basic transverse mode light beam passes through the small aperture diaphragm;
the refractive index of the electro-optic crystal is changed by adjusting the voltage applied to the electro-optic crystal, so that the output power of the infrared base frequency module and/or the ultraviolet frequency doubling module is the maximum power.
2. The uv laser of claim 1, wherein the second mirror is an exit mirror.
3. The UV laser according to claim 1, wherein the IR fundamental frequency module and/or the UV frequency doubling module further comprises a power detector for detecting an output power of the IR fundamental frequency module and/or the UV frequency doubling module.
4. The UV laser of claim 1, wherein the electro-optic crystal is LiNbO3。
5. The uv laser according to claim 1, wherein the voltage applied to the electro-optic crystal is adjusted using a two-electrode method or a four-electrode method.
6. The uv laser according to claim 1, wherein the aperture adjustment range of the aperture stop is 0.5mm to 5 mm.
7. The UV laser of claim 1, wherein a light outlet of the IR fundamental frequency module and a light inlet of the UV frequency doubling module are sealed by window sheets, and the IR fundamental frequency module is mechanically connected to the UV frequency doubling module.
8. The UV laser of claim 1, further comprising a control module connected to the IR baseband module and the UV frequency doubling module, wherein the control module is configured to control signal communication between the IR baseband module and the UV frequency doubling module.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111214575.XA CN113964636A (en) | 2021-10-19 | 2021-10-19 | Ultraviolet laser with self-optimized light beam quality |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111214575.XA CN113964636A (en) | 2021-10-19 | 2021-10-19 | Ultraviolet laser with self-optimized light beam quality |
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| CN113964636A true CN113964636A (en) | 2022-01-21 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117498134A (en) * | 2023-11-17 | 2024-02-02 | 无锡卓海科技股份有限公司 | Femtosecond vortex laser generation device and generation method |
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|---|---|---|---|---|
| CN206891696U (en) * | 2017-07-17 | 2018-01-16 | 湖北久之洋红外系统股份有限公司 | A kind of laser beam divergence device for quick testing |
| CN207819173U (en) * | 2018-01-09 | 2018-09-04 | 南京信息工程大学 | 1443nm mode-locked lasers based on magnetic fluid saturable absorber |
| CN208078373U (en) * | 2018-02-13 | 2018-11-09 | 南光高科（厦门）激光科技有限公司 | A kind of frequency multiplication of outer-cavity ultraviolet laser |
| CN113078547A (en) * | 2021-03-30 | 2021-07-06 | 电子科技大学 | Single-frequency high-power tunable short-cavity laser |
-
2021
- 2021-10-19 CN CN202111214575.XA patent/CN113964636A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN206891696U (en) * | 2017-07-17 | 2018-01-16 | 湖北久之洋红外系统股份有限公司 | A kind of laser beam divergence device for quick testing |
| CN207819173U (en) * | 2018-01-09 | 2018-09-04 | 南京信息工程大学 | 1443nm mode-locked lasers based on magnetic fluid saturable absorber |
| CN208078373U (en) * | 2018-02-13 | 2018-11-09 | 南光高科（厦门）激光科技有限公司 | A kind of frequency multiplication of outer-cavity ultraviolet laser |
| CN113078547A (en) * | 2021-03-30 | 2021-07-06 | 电子科技大学 | Single-frequency high-power tunable short-cavity laser |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117498134A (en) * | 2023-11-17 | 2024-02-02 | 无锡卓海科技股份有限公司 | Femtosecond vortex laser generation device and generation method |
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Application publication date: 20220121 |
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