CN113959370A - Dual wavelength point dispersion confocal microscopic detection method and device - Google Patents
Dual wavelength point dispersion confocal microscopic detection method and device Download PDFInfo
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
- G02B21/0032—Optical details of illumination, e.g. light-sources, pinholes, beam splitters, slits, fibers
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
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Abstract
The invention belongs to the field of dispersion confocal displacement measurement, and realizes the rapid detection of sample surface displacement information by using a dual-wavelength dispersion confocal measurement technology and combining the dispersion characteristic of an objective lens and a dual-wavelength light-splitting detection and differential processing technology. The invention firstly provides a method for separating a measuring beam reflected by a sample and collected by an objective lens into different detection areas according to wavelength by using a wavelength light splitting device, and then obtaining displacement information of the surface of the measured sample along the optical axis direction of the measuring beam by carrying out differential processing on detection dispersion confocal response intensity information under two illumination wavelengths. The invention combines the dual-wavelength dispersion confocal technology, the dispersion of the lens, the dual-wavelength light-splitting detection, the differential processing and other technologies, quickly obtains the surface displacement information of the detected sample, and provides a new idea for quickly detecting the information of the surface profile, the morphology, the form and position tolerance and the like of the sample.
Description
Technical Field
The invention relates to a high-speed confocal microscopic measurement method, which can be applied to the rapid measurement of the surface morphology of various precision parts such as a micro sensor, a micro motor, a micro gear, a chip, a micro lens, a grinding surface and the like, and belongs to the technical field of optical imaging and detection.
Background
The confocal microscope was invented by the american man Marvin Minsky in 1957, the basic principle of which is: the method comprises the steps of placing an illumination pinhole, an object and a detection pinhole at mutually conjugated positions, controlling a microscope objective or a detected sample to move along the optical axis direction of the objective by a high-precision motion device such as a high-precision motor or piezoelectric ceramics, collecting the light intensity reflected by the detected sample and passing through the detection pinhole to obtain a confocal response intensity curve, and processing the confocal response intensity curve to realize the measurement of the surface appearance of various precision parts. Although the design framework of the conjugate pinhole makes the traditional confocal microscope have unique axial tomography capability, the axial scanning speed of the moving device is generally slow, and the scanning precision is also limited, so that the traditional confocal microscope is difficult to realize the rapid and high-precision measurement of the appearance of the precise part sample.
In order to increase the measurement speed of the conventional confocal microscope, in the invention patent CN 109307481 a, "high-speed sensing confocal microscopy method", a moving device is controlled to axially scan at a larger interval, a detector collects a confocal response intensity curve, and the surface morphology of the measured sample is rapidly reconstructed by performing differential processing on intensity values at two sides of the maximum intensity. However, the above method still requires a complicated moving device to scan several times in the optical axis direction of the objective lens, limiting further increase in measurement speed. Published in the literature of local adaptive restriction in capacitive microscopics on Optics Letters: the method adopts a variable threshold peak value extraction algorithm, can meet the high-precision processing requirement of the confocal response intensity curve under a large scanning interval, obviously improves the confocal microscopic measurement speed and simultaneously ensures the measurement precision. However, the above method is similar to the problem of CN 109307481 a, i.e. it still needs a moving device to perform axial scanning, and the confocal micro-measurement speed cannot be further increased. Published in the literature "Real-time laser differential capacitive effects" on Optics Express ": and (3) using two detection pinholes, wherein one detection pinhole is arranged at a micro interval before the conjugate position of the detection pinhole and the other detection pinhole is arranged at a micro interval equal to the conjugate position of the illumination pinhole, acquiring dispersion confocal response intensity values passing through the two detection pinholes, and performing differential operation on the dispersion confocal response intensity values to quickly reconstruct the surface morphology information of the detected sample. However, the above method has the following disadvantages in the device construction process: firstly, the adjustment of the conjugate light path of the detection pinhole is extremely complex, and the light path adjustment is further complex by adopting the design of double detection pinholes in the method; and secondly, the displacement offset of the two detection pinholes along the optical axis direction of the light beam needs to be controlled in a micron order, and extremely high requirements are provided for the machining precision of mechanical parts.
On the other hand, the dispersion confocal microscopic measurement method adopts a broadband light source for illumination, utilizes the axial dispersion of a dispersion objective lens, combines a confocal detection technology, and realizes high-speed displacement information measurement without mechanical axial scanning by processing spectral information acquired by a spectral detection device. However, the spectrum acquisition frequency of the common spectrum detection device can only reach about 100kHz, and the measurement efficiency cannot be further improved.
Disclosure of Invention
In order to solve the problems, the invention proposes that firstly, a dispersion objective lens is utilized to focus light with different wavelengths in a light beam emitted by a dual-wavelength light source at different positions of an optical axis of the dispersion objective lens to form a measuring light beam to be illuminated on the surface of a measured sample; then, a wavelength light splitting device is used for sending the measuring light beam which is reflected from the surface of the detected sample and passes through the detection pinhole into different detection areas of a detector according to the wavelength; secondly, obtaining a dispersion confocal response intensity value under the dual wavelength by using a detector; and finally, carrying out differential processing on the dispersion confocal response intensity value under the dual-wavelength to obtain a dual-wavelength differential dispersion confocal response value, and obtaining displacement information of the surface of the detected sample along the optical axis direction of the measuring light beam according to the size of the dual-wavelength differential dispersion confocal response value. In the invention, the acquisition of the displacement information depends on a dual-wavelength dispersion confocal technology, the dispersion of a dispersion objective lens and a wavelength splitting technology, the technology only needs one conjugate detection pinhole, and the method has the advantages of simple structure, simple assembly and adjustment and the like, and meanwhile, the micro-focusing light spot has small size and high measurement precision. More importantly, if an ultra-fast detector is adopted, the detection frequency of displacement information can reach GHz, and the surface appearance measurement speed of the precision part is greatly improved.
1. In one aspect, the present invention provides a dual wavelengthA point-dispersion confocal microscopy method, wherein: wavelength emitted by dual-wavelength light sourceλ 1Andλ 2the illumination light beam enters the dispersion objective lens after passing through the illumination pinhole and the beam splitter; the chromatic dispersion objective lens has different focal lengths for light with different wavelengths, and focuses the light with different wavelengths on different positions on the optical axis of the chromatic dispersion objective lens; the light beam passing through the dispersive objective lens is focused to form a measuring light beam which is irradiated on the surface of a measured sample; the surface of the tested sample reflects the measuring beam focused on the surface of the tested sample, the reflected beam returns along the original optical path through the dispersion objective lens, and the reflected beam passes through the detection pinhole after being reflected by the beam splitter; the light beams passing through the detection pinholes pass through a wavelength light splitting device, so that the light with different wavelengths enters different detection areas, and the illumination wavelength is obtained by the detection of a detectorλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2(ii) a By modulating the wavelength of illuminationλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2processing to obtain dual-wavelength differential dispersion confocal response valuedI 21(ii) a According to the dual-wavelength differential dispersion confocal response valuedI 21Determines the displacement information of the surface of the measured sample along the optical axis direction of the measuring beam.
2. On the other hand, the invention provides a double-wavelength point dispersion confocal microscopic detection device, which comprises a double-wavelength light source, an illumination pinhole, a spectroscope, a dispersion objective, a detection pinhole, a wavelength light splitting device and a detector; the dual wavelength light source emits wavelengthλ 1Andλ 2the illumination beam entering the dispersive objective lens through the illumination pinhole and the beam splitter; the chromatic dispersion objective lens has different focal lengths for light with different wavelengths, and focuses the light with different wavelengths on different positions on the optical axis of the chromatic dispersion objective lens to form measuring beams which are irradiated on the surface of a measured sample; the surface of the measured sample reflects the measuring beam focused on the surface of the measured sample, and the reflected beam returns along the original optical path through the dispersion objective lens; the spectroscope reflects the measuring beam reflected by the measured sample and sends the measuring beam into the probeAn aperture; the detection needle hole filters the measuring beam reflected by the sample and sends the measuring beam into the wavelength light splitting device; the wavelength light splitting device enables different wavelengths of the measuring light beams to enter different detection areas of the detector; the detector obtains the illumination wavelength in different detection areasλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2。
compared with the prior art, the invention has the following innovation points and remarkable advantages:
1. the dual-wavelength point dispersion confocal microscopic detection method does not need axial mechanical scanning, and can remarkably simplify a measurement structure.
2. The dual-wavelength point dispersion confocal microscopic measurement technology adopts coaxial illumination, has small size of a focusing light spot, and has the advantages of strong capability of adapting to the surface characteristics of an object, high measurement precision, high measurement speed and the like.
3. The invention only needs one probe pinhole to collect the measuring beam reflected by the sample, and has the advantages of simple structure, simple assembly and adjustment and the like.
Drawings
FIG. 1 is a schematic diagram of a dual wavelength point dispersion confocal microscopy method of the present invention;
FIG. 2 is a schematic view of the dual wavelength point dispersion confocal micro-detection apparatus of the present invention;
FIG. 3 is a schematic diagram of a spectrometer-based spectroscopic dual-wavelength point dispersion confocal micro-detection apparatus in embodiment 1 of the present invention;
FIG. 4 is a diagram showing an optical path configuration of a dispersive objective lens in embodiment 1 of the present invention;
FIG. 5 shows the illumination wavelength in example 2 of the present inventionλ 1Andλ 2lower dispersion confocal response intensity curve;
FIG. 6 is a graph showing the relationship between the confocal response value of the two-wavelength differential dispersion and the displacement of the sample in example 2 of the present invention;
FIG. 7 is a schematic diagram of a dichroic beamsplitter-based wavelength splitting device and detector in embodiment 3 of the present invention;
fig. 8 is a schematic diagram of a wavelength splitting device and a detector based on a beam splitter and a filter in embodiment 4 of the present invention;
FIG. 9 is a schematic diagram of a dual wavelength point dispersion confocal micro-detection device based on a polarizer and an analyzer in example 5 of the present invention;
FIG. 10 is a schematic view of a dual wavelength point dispersion confocal micro-detection apparatus based on a polarization splitting prism in example 6 of the present invention;
FIG. 11 is a schematic view of a two-wavelength point dispersion confocal micro-detection apparatus based on a time division driving circuit in embodiment 7 of the present invention;
FIG. 12 is a schematic view of a two-wavelength point-dispersion confocal micro-detection apparatus based on an optical fiber device in example 8 of the present invention;
FIG. 13 is a schematic view of a two-wavelength point dispersion confocal micro-detection apparatus based on an optical fiber device and a time division driving circuit in example 9 of the present invention;
wherein: 1-dual wavelength light source, 2-illumination pinhole, 3-spectroscope, 4-dispersive objective, 5-measured sample, 6-detection pinhole, 7-wavelength light splitting device, 8-detector, 9-microprocessor, 701-spherical reflector, 702-grating, 703-spherical focusing mirror, 401-achromatic lens, 402-concave lens, 403-first convex lens, 404-second convex lens, 405-third convex lens, 704-collimating mirror, 705-dichroic spectroscope, 706-spectroscope, 707-first narrow band filter, 708-second narrow band filter, 709-first analyzer, 710-second analyzer, 711-polarization spectroscope, 712-time division driving circuit, 713-optical fiber wavelength division multiplexer, 801-a first photoelectric detector, 802-a second photoelectric detector, 803-a first optical fiber detector, 804-a second optical fiber detector, 101-a first polarizer, 102-a second polarizer, 103-a first single-wavelength optical fiber light source, 104-a second single-wavelength optical fiber light source, 105-1 x 2 optical fiber beam combiner and 301-an optical fiber coupler.
Detailed Description
The invention is further illustrated by the following figures and examples.
The invention is based on the dual-wavelength dispersion confocal measurement technology, focuses light with two different wavelengths on different positions of an optical axis of a dispersion objective by using a dispersion objective, simultaneously transmits a measurement beam reflected by a measured sample to different areas of a detector according to wavelength light splitting by using a wavelength light splitting device, obtains dispersion confocal response intensity values under two illumination wavelengths by using the detector, and obtains displacement information of the measured sample by processing the dispersion confocal response intensity values under the two illumination wavelengths.
Example 1
As shown in fig. 3, the spectrometer-based spectroscopic dual-wavelength point confocal micro-detection apparatus used in this embodiment includes a multi-wavelength light source 1, an illumination pinhole 2, a beam splitter 3, a dispersive objective 4 (including an achromatic lens 401, a concave lens 402, a first convex lens 403, a second convex lens 404, and a third convex lens 405), a detection pinhole 6, a wavelength splitting device 7 (including a spherical mirror 701, a grating 702, and a spherical mirror 703), and a detector 8 (including a device capable of detecting a wavelength)λ 1Andλ 2detection area of intensity), microprocessor 9. Wherein the dual wavelength light source 1 emits a wavelengthλ 1Andλ 2the light beam of (1); the illumination pinhole 2 filters light beams emitted by the light source to form a dual-wavelength point illumination light source; the spectroscope 3 sends the illumination light beam emitted by the dual-wavelength point illumination light source into the dispersion objective lens, and can reflect the measurement light beam which is collected from the dispersion objective lens and reflected by the measured sample to the detector 8; the dispersion objective 4 is composed of an achromatic lens 401 (focal length 23mm, clear aperture 5.2 mm), a concave lens 402 (focal length-14 mm, clear aperture 15 mm), a first convex lens 403 (focal length 23.8mm, clear aperture 25.4 mm), a second convex lens 404 (focal length 34mm, clear aperture 25.4 mm), and a third convex lens 405 (focal length 34mm, clear aperture 22 mm), as shown in fig. 4. The basic operating principle of the dispersive objective 4 is as follows: the achromatic lens 401 collimates the illumination beam emitted from the dual-wavelength point illumination source into the concave lens 402 for divergence, and then is focused by the first, second, and third convex lenses 403, 404, 405 at different positions on the optical axis OA1, such as wavelengthλ 1=550nm、λ 2The light beam with the wavelength of =555 nm is focused at 17.5mm and 17.505mm of the optical axis of the dispersive objective lens; the detection pinhole 6 filters the measuring beam reflected by the tested sample and sends the measuring beam into the wavelength light splitting device 7; the wavelength splitting device 7 mainly comprises a spherical reflector 701, a grating 702 and a spherical reflector 703, and the basic working principle is as follows: spherical reflectionThe mirror 701 collimates the measuring beam passing through the probe pinhole 6 and irradiates the grating 702, the grating 702 diffracts and deflects the light with different wavelengths to irradiate the spherical reflector 702 at different angles, and the spherical reflector 702 focuses the light with different wavelengths to different areas in the detector 8; the detector 8 obtains the illumination wavelength according to the intensity values of different areasλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2(ii) a Microprocessor 9 pairs collected illumination wavelengthsλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2differential processing is carried out to obtain a dual-wavelength differential dispersion confocal response valuedI 21According to the confocal response value of the two-wavelength differential dispersiondI 21The displacement information of the surface of the measured sample along the optical axis direction of the measuring beam is obtained.
The spectrometer-based spectroscopic dual-wavelength point confocal microscopic detection device used in the embodiment has the following working principle when detecting the displacement information of a detected sample:
the dual wavelength light source 1 emits light including wavelengthλ 1=550nm andλ 2a light beam with the wavelength of =555 nm enters a dispersion objective lens 4 through an illumination pinhole 2 and a spectroscope 3; wavelength of dispersive objective 4λ 1=550nm andλ 2light with wavelength of 555 nm is focused at 17.5mm and 17.505mm of the optical axis of the dispersive objective lens; the illumination light beam entering the dispersion objective 4 is focused to form a measuring light beam which irradiates on the surface of the hole type measured sample 5; the measured sample 5 reflects the measuring light beam focused on the measured sample, and the reflected light beam is collected by the dispersive objective 4 and reflected by the spectroscope 3 to enter the probe pinhole 6; the detection pinhole 6 filters the measuring beam reflected by the tested sample and enters a wavelength light splitting device 7; the wavelength light splitting device 7 focuses light with different wavelengths in the measuring light beam passing through the detection pinhole 6 on different areas of the detector 8; the detector 8 thus obtains the illumination wavelengthλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2 ；by controlling the wavelength of illuminationλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2differential processing is carried out to obtain a dual-wavelength differential dispersion confocal response valuedI 21According to the confocal response value of the two-wavelength differential dispersiondI 21The displacement information of the surface of the measured sample along the optical axis direction of the measuring beam is obtained. When the motion platform is used for moving the dual-wavelength point confocal micro-detection device or the measured sample along the direction vertical to the measuring beam, the displacement information of different positions on the surface of the measured sample is obtained, and the surface profile or the appearance of the sample is reconstructed.
Example 2
Unlike embodiment 1, the acquisition of displacement information of the measuring beam direction in this embodiment depends on the construction of a two-wavelength differential dispersion confocal response valuedI 21And the calibration relation between the measured sample displacement and the measured sample displacement. In the device, the dispersion objective 4, the wavelength light splitting device 7, the detector 8 and other devices have non-uniform spectral response characteristics, so that the dual-wavelength differential dispersion confocal response valuedI 21The relation between the measured sample shift and the measured sample shift deviates from the theoretical design, so the actual test is needed to accurately construct the confocal response value of the dual-wavelength differential dispersiondI 21And the calibration relation between the measured sample displacement and the measured sample displacement. For establishing the above-mentioned calibration relationship, the movement of the sample 5 to be measured in the measuring direction of the measuring beam is precisely controlled, e.g.z 1=0、z 2=0.1 μm、z 3=0.2μm、…、z M =5.0 μm and the illumination wavelength is simultaneously detected by the detector 8λ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2 ，i.e. the wavelength of the illuminationλ 1Andλ 2the confocal response intensity curve below, as shown in fig. 5; by controlling the wavelength of illuminationλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2differential processing is carried out to obtain a dual-wavelength differential dispersion confocal response valuedI 21The relation curve between the measured sample shift and the measured sample shift is shown in FIG. 6, which realizes the confocal response value of the dual-wavelength differential dispersiondI 21And calibrating the relation between the displacement and the sample.
Example 3
Unlike embodiment 1, the wavelength splitting device 7 in this embodiment is composed of a collimator 704 and a dichroic beam splitter 705, as shown in fig. 7. The working principle is as follows: first, the collimator 704 collimates the measuring beam passing through the detection pinhole 6, and sends the collimated beam to the dichroic beam splitter 705; dichroic beam splitter 705 splits the wavelengthλ 1Andλ 2are respectively sent to the photodetectors 801 and 802, and finally the detector 8 (including the photodetectors 801 and 802) obtains the illumination wavelengthλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2。
example 4
Different from embodiment 1, in this embodiment, the wavelength splitting device 7 is composed of a collimating mirror 704, a beam splitter 706, a first narrow band filter 707, and a second narrow band filter 708, as shown in fig. 8. The basic working principle is as follows: firstly, the collimating mirror 704 collimates the measuring beam passing through the detection pinhole 6 and sends the collimated measuring beam into the spectroscope 706; the beam splitter 708 splits the dual-wavelength light beam according to a ratio of 50:50 and sends the dual-wavelength light beam to a first narrow-band filter 707 and a second narrow-band filter 708; the first narrowband filter 707 and the second narrowband filter 708 can only pass the wavelength respectivelyλ 1Andλ 2the light beam, and enters the first photodetector 801 and the second photodetector 802; finally, the detector 8 (including the first photodetector 801 and the second photodetector 802) obtains the illumination wavelengthλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2。
example 5
Unlike embodiment 1, the dual-wavelength point confocal microscopic detection device based on the polarizer and the analyzer in this embodiment is composed of a dual-wavelength light source 1, a first polarizer 101, a second polarizer 102, an illumination pinhole 2, a spectroscope 3, a dispersive objective 4, a detection pinhole 6, a wavelength splitting device 7 (including a collimator 704, a spectroscope 706, a first analyzer 709, and a second analyzer 710), a detector 8 (including a first photodetector 801 and a second photodetector 802), a microprocessor 9, and the like, as shown in fig. 9.The basic working principle is as follows: the dual wavelength light source 1 emits light having a wavelengthλ 1Andλ 2of light of, wherein the wavelengthλ 1The light beam passes through a polarizer 101 with the polarization direction of z direction and the wavelengthλ 2The light beam passes through a polarizer 102 with the polarizing direction being the x direction, and the illumination pinhole 2 filters the light beam emitted by the light source to form a dual-wavelength point illumination light source; the spectroscope 3 sends the illumination light beam emitted by the dual-wavelength point illumination light source into the dispersion objective lens, and can reflect the measurement light beam which is collected from the dispersion objective lens and reflected by the measured sample to the detector 8; dispersive objective 4 converts wavelengthλ 1=550nm andλ 2the light beam with the wavelength of =555 nm is focused at 17.5mm and 17.505mm of the optical axis of the dispersive objective lens; the detection pinhole 6 filters the measuring beam reflected by the tested sample and sends the measuring beam into the wavelength light splitting device 7; the wavelength splitting device 7 mainly comprises a collimating mirror 704, a beam splitter 706, a first analyzer 709 and a second analyzer 710, and the basic working principle is as follows: the collimating mirror 704 collimates the measuring beam passing through the probe pinhole 6 and sends the measuring beam into the beam splitter 706, the beam splitter 706 sends the dual-wavelength beam into the first analyzer 709 and the second analyzer 710 respectively according to the intensity of 50:50, wherein the first analyzer 709 can only pass the beam with the polarization direction parallel to the z direction, the second analyzer 710 can only pass the beam with the polarization direction parallel to the x direction, namely, the first analyzer 709 can only enable the wavelength to pass the beam with the polarization direction parallel to the x directionλ 1The second analyzer 710 can only make the wavelength pass throughλ 2Through a light beam of wavelengthλ 1Andλ 2the light beam passes through a first analyzer 709 and a second analyzer 710 and then enters a first photoelectric detector 801 and a second photoelectric detector 802 respectively; the detector 8 (including the first photodetector 801, the second photodetector 802) derives the illumination wavelength therefromλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2(ii) a Microprocessor 9 pairs collected illumination wavelengthsλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2differential processing is carried out to obtain a dual-wavelength differential dispersion confocal response valuedI 21According to the confocal response value of the two-wavelength differential dispersiondI 21The displacement information of the surface of the measured sample along the optical axis direction of the measuring beam is obtained.
Example 6
Different from embodiment 1, the dual-wavelength point confocal microscopic detection device based on the polarization splitting prism in this embodiment is composed of a dual-wavelength light source 1, a first polarizer 101, a second polarizer 102, an illumination pinhole 2, a beam splitter 3, a dispersive objective lens 4, a detection pinhole 6, a wavelength splitting device 7 (including a collimator lens 704 and a polarization splitter 711), and a detector (including a first photodetector 801 and a second photodetector 802), as shown in fig. 10. The basic working principle is as follows: the dual wavelength light source 1 emits light having a wavelengthλ 1Andλ 2of light of, wherein the wavelengthλ 1The light beam passes through a first polarizer 101 having a polarization direction of z-directionλ 2The light beam passes through a second polarizer 102 with the polarization direction being the x direction, and the illumination pinhole 2 filters the light beam emitted by the light source to form a dual-wavelength point illumination light source; the spectroscope 3 sends the illumination light beam emitted by the dual-wavelength point illumination light source into the dispersion objective lens, and can reflect the measurement light beam which is collected from the dispersion objective lens and reflected by the measured sample to the detector 8; dispersive objective 4 converts wavelengthλ 1=550nm andλ 2the light beam with the wavelength of =555 nm is focused at 17.5mm and 17.505mm of the optical axis of the dispersive objective lens; the detection pinhole 6 filters the measuring beam reflected by the tested sample and sends the measuring beam into the wavelength light splitting device 7; the wavelength splitting device 7 is composed of a collimating mirror 704 and a polarization beam splitter 711, and the basic principle is as follows: the collimating mirror 704 collimates the measuring beam passing through the probe pinhole 6 and sends the collimated measuring beam into the polarizing beam splitter 711, and the polarizing beam splitter 711 collimates the wavelength of the dual-wavelength beamλ 1Andλ 2two lights with different polarization directions respectively enter a first photoelectric detector 801 and a second photoelectric detector 802; the detector 8 (including the first photodetector 801, the second photodetector 802) derives the illumination wavelength therefromλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2(ii) a Microprocessor 9 pairs collected illumination wavelengthsλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2differential processing is carried out to obtain a dual-wavelength differential dispersion confocal response valuedI 21According to the confocal response value of the two-wavelength differential dispersiondI 21The displacement information of the surface of the measured sample along the optical axis direction of the measuring beam is obtained.
Example 7
Different from embodiment 1, the two-wavelength point confocal micro-detection device based on the time division driving circuit in this embodiment is composed of a two-wavelength light source 1, an illumination pinhole 2, a spectroscope 3, a dispersive objective 4, a detection pinhole 6, a time division driving circuit 712, a first photoelectric detector 801 and a microprocessor 9, as shown in fig. 11. The basic working principle is as follows: the microprocessor 9 controls the time division driving circuit 712 to generate a periodic pulse signal, the rising edge of which excites the driving circuit to sequentially supply the dual-wavelength light source with the wavelength ofλ 1Andλ 2the sub-light source module is powered ont 1、t 2At a time, sequentially generating wavelengths ofλ 1Andλ 2the illumination beam of (a); the illumination light beam enters a dispersion objective 4 through an illumination pinhole 2 and a spectroscope 3; the dispersive objective 4 focuses the light of different wavelengths in the illumination beam at different positions on the optical axis OA1 of the dispersive objective; the illumination beam passing through the dispersive objective 4 is focused to form a measuring beam which is irradiated on a sample 5 to be measured; the light beam reflected from the surface of the tested sample 5 returns along the original path, is collected by the dispersive objective 4, is reflected by the spectroscope 3, passes through the probe pinhole 7 and then enters the samplet 1、t 2The time is sequentially received by the detector 8 to obtain the illumination wavelengthλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2(ii) a Microprocessor 9 pairs collected illumination wavelengthsλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2differential processing is carried out to obtain a dual-wavelength differential dispersion confocal response valuedI 21According to the confocal response value of the two-wavelength differential dispersiondI 21The displacement information of the surface of the measured sample along the optical axis direction of the measuring beam is obtained.
Example 8
Unlike embodiment 1, the optical fiber device-based dual-wavelength point confocal micro-detection apparatus in this embodiment is composed of a dual-wavelength light source 1 (including a first single-wavelength optical fiber light source 103, a second single-wavelength optical fiber light source 104, a1 × 2 optical fiber combiner 105, etc.), an optical fiber coupler 301, a dispersive objective 4, a wavelength division multiplexer 713, and a detector 8 (including a first optical fiber detector 803 and a second optical fiber detector 804), as shown in fig. 12. The basic working principle is as follows: the dual-wavelength light source 1 composed of a first single-wavelength fiber light source 103, a second single-wavelength fiber light source 104, and a fiber combiner 105 emits the wavelengthλ 1Andλ 2the illumination light beam enters the optical fiber coupler 301 through the optical fiber combiner 105; the optical fiber coupler 301 sends the dual-wavelength illumination beam to the dispersion objective 4; the dispersive objective 4 focuses the light of different wavelengths in the dual-wavelength illumination beam emitted by the fiber coupler 301 at different positions on the optical axis OA1 of the dispersive objective; the illumination beam passing through the dispersive objective lens is focused to form a measuring beam which is irradiated on the surface of a measuring sample; the measured sample reflects the measuring beam, the reflected beam returns along the original optical path, and is collected by the dispersive objective lens 4 and enters the optical fiber coupler 301; the fiber coupler 301 sends the measuring beam reflected by the measured sample to the wavelength division multiplexer 713; the wavelength division multiplexer 713 will measure the wavelength of the light beamλ 1Andλ 2the light is sent to a first optical fiber photoelectric detector 803 and a second optical fiber photoelectric detector 804 respectively; the detector 8 (including the first fiber photodetector 803 and the second fiber photodetector 804) obtains the illumination wavelength therefromλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2(ii) a Microprocessor 9 pairs collected illumination wavelengthsλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2differential processing is carried out to obtain a dual-wavelength differential dispersion confocal response valuedI 21According to the confocal response value of the two-wavelength differential dispersiondI 21The displacement information of the surface of the measured sample along the optical axis direction of the measuring beam is obtained.
Example 9
Different from embodiment 1In the present embodiment, the dual-wavelength point confocal micro-detection apparatus based on the optical fiber device and the time division driving circuit is composed of a dual-wavelength light source (including the first single-wavelength optical fiber light source 103, the second single-wavelength optical fiber light source 104, and the 1 × 2 optical fiber beam combiner 105), an optical fiber coupler 301, a dispersive objective 4, a time division driving circuit 712, and a first optical fiber detector 803, as shown in fig. 13. The working principle is as follows: the dual-wavelength light source 1 composed of the first single-wavelength fiber light source 101, the second single-wavelength fiber light source 102 and the 1 × 2 fiber combiner 105 can emit the wavelengthλ 1Andλ 2the light beam of (1); the microprocessor 9 controls the time division driving circuit 712 to send out periodic pulse signals, and the rising edge of the pulse signals stimulates the driving circuit to sequentially give the dual-wavelength light source the wavelength of which isλ 1Andλ 2are powered by the single wavelength fiber optic source modules 103 and 104, int 1、t 2At a time, sequentially emitting wavelengths ofλ 1、λ 2The illumination light beam enters the optical fiber coupler 301 through the optical fiber combiner 105; the optical fiber coupler 301 sends the dual-wavelength illumination beam to the dispersion objective 4; the dispersive objective 4 focuses the light of different wavelengths in the dual-wavelength illumination beam emitted by the fiber coupler 301 at different positions on the optical axis OA1 of the dispersive objective; the illumination beam passing through the dispersive objective 4 is focused to form a measuring beam which is irradiated on the surface of a measuring sample; the measured sample reflects the measuring beam, the reflected beam returns along the original optical path, and is collected by the dispersive objective lens 4 and enters the optical fiber coupler 301; the fiber coupler 301 feeds the reflected measuring beam into the first fiber detector 803; in thatt 1、t 2And at the moment, the first optical fiber detector 803 detects the illumination wavelength sequentiallyλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2(ii) a Microprocessor 9 pairs collected illumination wavelengthsλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2differential processing is carried out to obtain a dual-wavelength differential dispersion confocal response valuedI 21According to the confocal response value of the two-wavelength differential dispersiondI 21The size of the sample is obtainedAnd measuring the displacement information of the optical axis direction of the light beam.
While the invention has been described in connection with specific embodiments thereof, it will be understood that these should not be construed as limiting the scope of the invention, which is defined in the appended claims, any modifications to which this invention pertains being applicable being within the scope of the invention defined in the following claims.
Claims (10)
1. The double wavelength point dispersion confocal microscopic detection method is characterized in that: wavelength emitted by dual-wavelength light sourceλ 1Andλ 2the illumination light beam enters the dispersion objective lens after passing through the illumination pinhole and the beam splitter; the chromatic dispersion objective lens has different focal lengths for light with different wavelengths, and focuses the light with different wavelengths on different positions on the optical axis of the chromatic dispersion objective lens; the light beam passing through the dispersive objective lens is focused to form a measuring light beam which is irradiated on the surface of a measured sample; the surface of the tested sample reflects the measuring beam focused on the surface of the tested sample, the reflected beam returns along the original optical path through the dispersion objective lens, and the reflected beam passes through the detection pinhole after being reflected by the beam splitter; the light beams passing through the detection pinholes pass through a wavelength light splitting device, so that the light with different wavelengths enters different detection areas, and the illumination wavelength is obtained by the detection of a detectorλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2(ii) a By modulating the wavelength of illuminationλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2processing to obtain dual-wavelength differential dispersion confocal response valuedI 21(ii) a According to the dual-wavelength differential dispersion confocal response valuedI 21Determines the displacement information of the surface of the measured sample along the optical axis direction of the measuring beam.
2. The dual wavelength point-dispersive confocal microscopy method of claim 1, wherein: confocal response value to dual-wavelength differential dispersiondI 21The method is characterized by calibrating the relation between the measured sample and the displacement, and comprises the following specific steps: controlling calibration sample edge measurementsThe light beam moves along the optical axis direction, the displacement value of the standard sample along the optical axis direction of the measuring light beam is measured by using the displacement measuring device, and the illumination wavelength under the corresponding displacement value is obtained at the same timeλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2(ii) a By aiming at said illumination wavelengthλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2processing to obtain dual-wavelength differential dispersion confocal response valuedI 21(ii) a By constructing standard sample displacement value and dual-wavelength differential dispersion confocal response valuedI 21The corresponding relation between the two components realizes the confocal response value of the dual-wavelength differential dispersiondI 21And calibrating the relation between the measured sample and the displacement.
3. The dual wavelength point-dispersive confocal microscopy method of claim 1, wherein: at the wavelength of the illuminationλ 1Andλ 2lower dispersion confocal response intensity valueI 1、I 2In the course of treatment, by wavelengthλ 1Andλ 2lower dispersion confocal response intensity valueI 1、I 2Is divided by the wavelengthλ 1Andλ 2lower dispersion confocal response intensity valueI 1、I 2To obtain the confocal response value of the dual-wavelength differential dispersiondI 21I.e. bydI 21=(I 2–I 1)/(I 2+I 1)。
4. The dual wavelength point-dispersive confocal microscopy method of claim 1, wherein: at the wavelength of the illuminationλ 1Andλ 2lower dispersion confocal response intensity valueI 1、I 2In the course of treatment, by wavelengthλ 1Andλ 2lower dispersion confocal response intensity valueI 1、I 2Is divided by the wavelengthλ 1Andλ 2lower dispersion confocal response intensity valueI 1、I 2To obtain the confocal response value of the dual-wavelength differential dispersiondI 21I.e. bydI 21=(I 2–I 1)。
5. The dual wavelength point-dispersive confocal microscopy method of claim 1, wherein: and moving the measured sample along the direction vertical to the optical axis of the measuring beam by using the one-dimensional motion platform to obtain displacement information of different positions on a straight line on the surface of the measured sample along the optical axis of the measuring beam, so as to obtain the profile and roughness information of the measured sample.
6. The dual wavelength point-dispersive confocal microscopy method of claim 1, wherein: and moving the measured sample along the direction vertical to the optical axis of the measuring beam by using the two-dimensional motion platform to obtain displacement information of different positions on the surface of the measured sample along the optical axis of the measuring beam, so as to obtain the three-dimensional shape information of the measured sample.
7. The confocal microscopic detection device of dual wavelength point dispersion, its characterized in that: the device comprises a dual-wavelength light source, an illumination pinhole, a spectroscope, a dispersion objective, a detection pinhole, a wavelength light splitting device and a detector; the dual wavelength light source emits wavelengthλ 1Andλ 2the illumination beam entering the dispersive objective lens through the illumination pinhole and the beam splitter; the chromatic dispersion objective lens has different focal lengths for light with different wavelengths, and focuses the light with different wavelengths on different positions on the optical axis of the chromatic dispersion objective lens to form measuring beams which are irradiated on the surface of a measured sample; the surface of the measured sample reflects the measuring beam focused on the surface of the measured sample, and the reflected beam returns along the original optical path through the dispersion objective lens; the spectroscope reflects the measuring light beam reflected by the measured sample and sends the measuring light beam into the detection pinhole; the detection needle hole filters the measuring beam reflected by the sample and sends the measuring beam into the wavelength light splitting device; the wavelength division device enables measurement lightDifferent wavelengths of the beam enter different detection regions of the detector; the detector obtains the illumination wavelength in different detection areasλ 1Andλ 2lower dispersion confocal response intensity valueI 1AndI 2。
8. the dual wavelength point-dispersive confocal microscopy apparatus according to claim 7, wherein: the wavelength light splitting device is one of a spectrometer, a dichroic beam splitter, a combined device formed by a common beam splitter and a filter, a combined device formed by a common beam splitter and an analyzer, a polarization beam splitter prism, a time division driving illumination circuit and an optical fiber wavelength division multiplexing device.
9. The dual wavelength point-dispersive confocal microscopy apparatus according to claim 7, wherein: the device also comprises a propelling mechanism, wherein the propelling mechanism is one of a one-dimensional motion platform and a two-dimensional motion platform; the propulsion mechanism moves the dual-wavelength light source, the illumination pinhole, the dispersion objective lens, the spectroscope, the detection pinhole, the wavelength light splitting device and the detector as a whole in the direction perpendicular to the optical axis of the measuring beam to obtain displacement information of different positions on the surface of the measured sample in the direction of the optical axis of the measuring beam, and further obtain the profile and the morphology information of the measured sample.
10. The dual wavelength point-dispersive confocal microscopy apparatus according to claim 9, wherein: the device also comprises a motion platform, wherein the motion platform is one of a one-dimensional motion platform and a two-dimensional motion platform; the motion platform moves the measured sample along the direction perpendicular to the optical axis of the measuring beam to obtain displacement information of the measured sample at different positions along the optical axis of the measuring beam, and further obtain the profile and the morphology information of the measured sample.
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