CN113939769A

CN113939769A - Sealing device, component and lithographic apparatus

Info

Publication number: CN113939769A
Application number: CN202080039070.1A
Authority: CN
Inventors: D.巴德; A.奥斯滕多夫; O.弗吕格
Original assignee: Carl Zeiss SMT GmbH
Current assignee: Carl Zeiss SMT GmbH
Priority date: 2019-04-02
Filing date: 2020-04-01
Publication date: 2022-01-14
Also published as: US20220019150A1; TW202105068A; EP3948424A1; WO2020201381A1; DE102019204699B4; US11740562B2; DE102019204699A1

Abstract

A sealing arrangement (300) for sealing a first component part (202) of a lithographic apparatus (100A, 100B) with respect to a second component part (206) of the lithographic apparatus (100A, 100B), the sealing arrangement comprising a number of sealing rings (302) and a number of connection locations (304), wherein the sealing rings (302) are connected to each other by means of the connection locations (304).

Description

Sealing device, component and lithographic apparatus

Technical Field

The present invention relates to a sealing arrangement of a lithographic apparatus, to a component of a lithographic apparatus comprising a sealing arrangement of this type, and to a lithographic apparatus comprising a sealing arrangement of this type and/or a component of this type.

Background

The contents of priority application DE 102019204699.1 are incorporated herein by reference in their entirety.

Photolithography is used to produce microstructured components, such as integrated circuits. The lithographic process is performed using a lithographic apparatus having an illumination system and a projection system. An image of the mask (reticle) illuminated by the illumination system is projected, in this case by a projection system, onto a substrate (for example a silicon wafer) which is coated with a photosensitive layer (photoresist) and arranged in the image plane of the projection system in order to transfer the mask structure to the photosensitive coating of the substrate.

Driven by the demand for ever smaller structures in the production of integrated circuits, EUV lithography apparatuses are currently being developed which use light with wavelengths in the range from 0.1nm to 30nm, in particular 13.5 nm. In the case of such EUV lithography apparatuses, since most materials have a high absorption power for light of this wavelength, it is necessary to use a reflective optical unit, i.e. a mirror, instead of a refractive optical unit, i.e. a lens element, as before.

The EUV lithography apparatus as described above comprises components with cooling circuits, for example for cooling the individual components with water, or with flushing circuits, for example for flushing the individual components with a flushing gas, in particular an inert gas. Components of this type can be, for example, so-called actuation sensor units, by means of which the facets of a facet mirror, for example a field facet mirror or a pupil facet mirror, can be deflected. In this case, in order to deflect the facets, a so-called actuation sensor package is assigned to each facet. The actuation sensor package should be sealed in a fluid tight manner with respect to the body or frame of the actuation sensor unit.

For sealing, an O-ring or a gasket may be used as the sealing member. In order to maintain the sealing function during operation and over the entire service life, the seal can be clamped to the respective actuation sensor package by means of prestressing or bracing in the pressure direction. Thus, centering of the seal may be obtained. In this case, it should be taken into account that the seal requires a certain yield volume to be compressed. The yield volume may be created by maintaining sufficient available space between the respective seal internal profile and the actuation sensor package. However, this space is disadvantageous in terms of good centering of the seal.

Disclosure of Invention

Against this background, it is an object of the present invention to provide an improved sealing device.

Accordingly, a sealing device for sealing a first component part of a lithographic apparatus with respect to a plurality of second component parts of the lithographic apparatus is proposed. The sealing arrangement comprises a plurality of sealing rings and a plurality of connection locations, wherein the sealing rings are connected to each other by means of the connection locations.

This simplifies the mounting of the sealing device compared to a sealing device without such a connection location, due to the fact that the sealing rings are connected to each other by means of the connection location.

The sealing means may also be referred to as a gasket. Preferably, a plurality of sealing rings are provided forming a two-dimensional pattern or grid. That is, the seal rings are arranged in a grid or pattern in particular. Preferably, each sealing ring is assigned a plurality of connection locations, for example four. The connection location may also be referred to as a contact location. Preferably, the sealing rings are connected to one another by means of connecting points in one piece, in particular in one piece in material. By "integrally" is meant in the present case that the sealing rings together form a common component part, i.e. the sealing arrangement. By "in one piece of material" is meant that the sealing device is always made of the same material. Preferably, the sealing means is made of a plastics material. For example, perfluororubber (FFKM) may be used as a suitable material. The sealing means may be cut from a sheet or film of suitable plastics material, for example by means of a laser.

According to one embodiment, the connection locations each comprise a yield volume for pressing the respective sealing ring between one of the first and second component parts.

Due to the provision of the yield volume, the individual sealing rings can be fully compressed at all times, so that leakage of the lithographic apparatus during installation and throughout its lifetime can be prevented or at least significantly reduced. A yield volume may be provided between the inner contour of the respective sealing ring and the second component part accommodated in the inner contour. However, the yield volume can also be provided directly in or at the respective connection location, for example in the form of a cut, a groove, a hole or the like. It is only important here that the material of the sealing ring is pressed into the yield volume during the pressing of the respective sealing ring. The above-mentioned inner contour of the sealing ring can have any shape. The inner contour may be circular, elliptical, triangular, polygonal, etc. Furthermore, the inner profile, as described below, may also be trilobal. The yield volume is in particular provided within or at the sealing device itself.

According to a further embodiment, each sealing ring comprises an inner contour in each of which at least part of the second component part can be accommodated, and wherein the yield volume is formed by the inner contour widening at the connection location.

The fact that the inner contour "widens" means that, in the present case, the inner contour does not abut against the corresponding second component part, at least in the non-compressed state of the respective sealing ring, and is therefore in particular separated from the second component part. Due to the fact that the inner contour widens at the connection location, a yield volume can be provided at the connection location which is sufficiently large for compressing the respective sealing ring.

According to a further embodiment, the inner contour comprises a connecting radius at the connecting location, wherein the inner contour comprises an intermediate radius between two adjacent connecting locations, respectively, and wherein the intermediate radius and the connecting radius differ from each other in their absolute values, such that the inner contour is widened at the connecting location and narrowed between the two adjacent connecting locations.

As the inner contour narrows between two adjacent connection locations, it is possible for the sealing ring to be centered at the respective intermediate radius. Thus, by means of the widening and narrowing, a sufficiently large yield volume can be ensured at the same time for compressing and centering the sealing ring at the second component part.

According to a preferred embodiment of the sealing device, the sealing device comprises a plurality of sealing rings, a plurality of connecting locations, wherein the sealing rings are connected to each other by means of the connecting locations, wherein each sealing ring comprises an inner contour in each of which at least part of the second component part can be accommodated, wherein the inner contour comprises a connecting radius at the connecting location, wherein the inner contour comprises an intermediate radius between two adjacent connecting locations, respectively, wherein the absolute values of the intermediate radius and the connecting radius differ from each other such that the inner contour widens at the connecting location and narrows between two adjacent connecting locations.

The inner contour is formed in particular by a plurality of radii, i.e. the inner contour is preferably not circular. The inner contour may also have any other geometry, as described above. In the region of the connection locations, the inner contour widens or flares out, and in the region between the connection locations, the inner contour narrows, contracts or is constrained. This results in the inner profile being a trilobal or trilobal type geometry, deviating from a circular shape. Accordingly, the inner profile may be referred to as a "trilobe" or "trilobe type". The sealing means is particularly positioned between the sealing surface of the first component part and the sealing surface of the second component part and acts as a liquid-tight seal with respect to both.

In the present invention it is understood that the fact that the second component part is "capable of being accommodated" in the inner contour means that a corresponding sealing ring can be placed on the second component part and vice versa. In this case, the second component part preferably has a cylindrical base part, where the sealing ring is centered by means of an intermediate radius.

Preferably, as mentioned above, four connection locations are provided. The inner contour therefore also has four times the connecting radius and four times the intermediate radius. Thus, in particular, there are also four pairs of adjacent connection locations, between which a connection radius is provided. The radii transition into each other so that the inner contour has no broken line, but a curved shape.

The fact that the intermediate radius and the connecting radius are "different" from each other is to be understood in particular that the intermediate radius is larger than the connecting radius and vice versa. The center point of a connecting radius may be offset with respect to the center point of a middle radius such that if the connecting radius is larger than the middle radius and if the connecting radius is smaller than the middle radius, the condition is fulfilled that the inner contour is both widened at the connecting location and narrowed between two adjacent connecting locations.

According to a further embodiment, the intermediate radius is larger than the connecting radius.

For example, the connection radius may be about 5mm, and the intermediate radius may be about 11 to 12 mm.

According to a further embodiment, the inner contour comprises a first intermediate radius and a second intermediate radius, wherein the first intermediate radius and the second intermediate radius are equal or unequal in size.

Preferably, the first intermediate radius is greater than the second intermediate radius. Additionally, the first intermediate radius may also be less than the second intermediate radius. With the aid of the different intermediate radii, it is possible to take into account the fact that the connection locations are positioned at different azimuthal intervals from one another in the azimuthal or circumferential direction: a sealing ring shortened by an azimuthal angle/360 ° is produced between the two connection locations in order to prevent the connection locations from moving azimuthally during the installation of the sealing device, which would otherwise lead to warping of the sealing device. For equal azimuthal magnitudes, it is preferred that the first intermediate radius and the second intermediate radius are also equal in magnitude. Preferably, the connection locations are constructed symmetrically with respect to the symmetry line assigned to each connection location, respectively. The azimuth angles are measured between the symmetry lines of the connection locations. The respective center points of the connecting radii lie on a line of symmetry of the connecting position to which the connecting radii are assigned.

According to a further embodiment, the magnitude of the second intermediate radius is larger than the magnitude of the first intermediate radius.

Additionally, the second intermediate radius may also have a smaller magnitude than the first intermediate radius.

According to a further embodiment, two adjacent connection locations with a first intermediate radius provided therebetween and two adjacent connection locations with the second intermediate radius provided therebetween are arranged at the same distance or at different distances from each other.

Preferably, the connection locations are located in such a way that they are not equally spaced from each other as viewed in the circumferential direction. That is, different azimuth angles are provided between the connection locations. In this case, the first intermediate radius is located between a pair of connection locations, while providing a smaller azimuth angle between the connection locations. The second intermediate radius is located between a pair of connection locations and provides a greater azimuth angle between the connection locations. For equal azimuthal amplitudes, the connection locations are also arranged at equidistant intervals from each other.

According to a further embodiment, the center points of the intermediate radii are arranged offset with respect to the center point of the connecting radius.

Preferably, the seal ring comprises a first plane of symmetry and a second plane of symmetry, and the seal ring is symmetrically configured with respect to both. The planes of symmetry are located in particular perpendicular to one another. The center point of the intermediate radius is eccentrically located. The center point of the connecting radius is also located off-center. As mentioned above, the center point of the connecting radius is located on the corresponding symmetry line of the connecting location.

According to a further embodiment, the center point of the first intermediate radius is arranged offset in the x-direction and the y-direction of the sealing ring with respect to the center point of the connecting radius, wherein the center point of the second intermediate radius is arranged offset in the x-direction and the y-direction of the sealing ring with respect to the center point of the connecting radius.

In particular, a coordinate system having a first spatial direction or x-direction, a second spatial direction or y-direction and a third spatial direction or z-direction is assigned to the sealing ring. The spatial directions are oriented perpendicular to each other. In particular, the first plane of symmetry spans the y-direction and the z-direction. In particular, the second plane of symmetry spans the x-direction and the z-direction. The inner contour extends as a two-dimensional geometric shape, in particular in the x-direction and in the y-direction. The center point of the first intermediate radius is positioned offset in the x-direction and the y-direction relative to the center point of the connecting radius such that the inner profile is contracted within the first intermediate radius region even if the first intermediate radius is greater than the connecting radius. In particular, the center point of the second intermediate radius is positioned offset in the x-direction and the y-direction relative to the center point of the connecting radius, so that the inner contour is contracted in the region of the second intermediate radius, even if the second intermediate radius is preferably larger than the connecting radius.

According to a further embodiment, the centre points of the two first intermediate radii are arranged at a first distance from each other in the y-direction, wherein the centre points of the two second intermediate radii are arranged at a second distance from each other in the x-direction, and wherein the first distance and the second distance have equal or different magnitudes.

In particular, the center points of the two first intermediate radii lie within the first plane of symmetry and outside the second plane of symmetry. Preferably, the center point is located mirror-symmetrically with respect to the second plane of symmetry. In particular, the center points of the two second intermediate radii lie within the second plane of symmetry and outside the first plane of symmetry. Preferably, the center point of the second intermediate radius is located mirror-symmetrically with respect to the first plane of symmetry. For equal azimuthal magnitude, it is preferred that the first and second distances are equal in magnitude.

According to a further embodiment, the first intermediate radii and the second intermediate radii alternate along the inner contour.

This means that, viewed along the inner contour, each first intermediate radius is arranged between two second intermediate radii and vice versa. The two first intermediate radii are arranged opposite or at a circumferential angle of 180 °. This is also valid for the second intermediate radius.

According to a further embodiment, the inner contour has a transition radius, wherein the intermediate radius transitions into the connecting radius by means of the transition radius.

This ensures a continuously variable transition from the intermediate radius to the transition radius. Preferably, the transition radius is smaller than the intermediate radius and the connecting radius.

According to a further embodiment, each connection location provides two yield volumes, wherein a connection web of the connection location is provided between the two yield volumes, and wherein the connection web connects adjacent sealing rings to each other.

In particular, the connecting webs connect the sealing rings to one another in one piece, in particular in one piece of material.

According to a further embodiment, the yield volume is a groove which completely penetrates the wall thickness of the sealing means or extends only to a defined depth in the wall thickness.

For the case where the groove penetrates only the wall thickness to a defined depth, the cross-section of the groove may be rectangular or circular. The groove can also extend through the connecting web if it does not penetrate completely through the wall thickness. The groove may include sidewalls that are parallel to each other. The sidewalls may also be oriented obliquely with respect to one another such that the groove is wedge-shaped.

According to a further embodiment, the yield volume comprises a plurality of holes which either completely penetrate the wall thickness of the sealing means or extend only to a defined depth in the wall thickness.

The holes may all have the same or different diameters. The holes may be arranged in a uniformly or non-uniformly spaced manner from each other. The apertures may be arranged in one or more rows.

Furthermore, a component for a lithographic apparatus is proposed. The component comprises a first component part, a plurality of second component parts at least partly accommodated within the first component part, and a sealing arrangement of this type.

For example, the component may be part of a beam shaping and illumination system or a projection system of a lithographic apparatus. This component can be a so-called Actuation Sensor Unit (ASU), by means of which the facets of a facet mirror, for example a field facet mirror or a pupil facet mirror, can be deflected. Such a facet mirror with a deflectable facet may be part of a beam shaping and illumination system, for example. The first component part may be, for example, the body or frame of the component. The first component part may comprise a cooling system for cooling the component, in particular the second component part. The cooling system may be formed by means of cooling channels provided in the first component part. The second component part may be, for example, an Actuation Sensor Package (ASP) adapted to deflect a facet of the facet mirror as described above. The second component part may at least partially have a cylindrical geometry. By means of the sealing means, the second component part is sealed with respect to the first component part in order to seal the cooling system with respect to the surroundings of the component.

According to one embodiment, the sealing rings are each pressed between one of the first component part and the second component part such that the respective yield volume of the sealing device is at least partially filled with the respective sealing material.

During the compression of the sealing ring, the sealing ring is at least partially pressed into the yielding volume. As a result, permanent protection against leakage is achieved.

According to a preferred embodiment, the component comprises a first component part, a plurality of second component parts at least partly accommodated in the first component part, a sealing device as described above, wherein the inner contour serves the following purpose: centering the respective sealing ring at one of the second component parts against the second component part having the intermediate radius, and wherein the inner contour is distanced from the second component part by a connecting radius in order to provide a yielding volume between the inner contour and the second component part.

The fact that the inner contour is "remote" from the second component part with a connecting radius in order to provide a yielding volume is to be understood as meaning, in particular, that the inner contour does not come into contact with the second component part in the region of the connecting radius. That is, the inner profile and the second component portion are free of contact or not at the connecting radius.

Furthermore, a lithographic apparatus is provided. The lithographic apparatus accordingly comprises a sealing device as described above and/or a component as described above.

The lithographic apparatus may be an EUV lithographic apparatus or a DUV lithographic apparatus. EUV stands for "extreme ultraviolet", meaning that the wavelength of the operating light is between 0.1nm and 30 nm. DUV stands for "deep ultraviolet", meaning that the wavelength of the operating light is between 30nm and 250 nm.

In the present case, "a" or "an" is not necessarily to be understood as being limited to exactly one element. Conversely, a plurality of elements, for example, two, three or more, may be provided. Likewise, any other numbers used herein should not be construed as an exact limitation on the number of elements specified. Rather, numerical deviations from the upper and lower directions are possible unless indicated to the contrary.

The embodiments and features described for the sealing device are relatively applicable to the proposed component and, respectively, to the proposed lithographic apparatus, and vice versa.

Other possible implementations of the invention also include combinations of features or embodiments not described above or below with respect to the illustrative embodiments. In this case, a person skilled in the art may add further aspects, improve or supplement the respective basic forms of the invention.

Drawings

Further advantageous configurations and aspects of the invention are the subject matter of the dependent claims as well as the subject matter of the exemplary embodiments of the invention, as described below. In the following, the invention is explained in more detail according to preferred embodiments and with reference to the drawings.

FIG. 1A shows a schematic diagram of an embodiment of an EUV lithographic apparatus;

FIG. 1B shows a schematic diagram of an embodiment of a DUV lithographic apparatus;

FIG. 2 depicts a schematic view of an embodiment of a component for a lithographic apparatus according to FIG. 1A or FIG. 1B;

FIG. 3 shows a schematic cross-sectional view of a component according to section line III-III in FIG. 2;

fig. 4 shows a detail IV from fig. 3;

FIG. 5 shows a further schematic cross-sectional view of the component according to section line V-V in FIG. 2;

fig. 6 shows a detail view VI according to fig. 5;

FIG. 7 shows a schematic view of an embodiment of a sealing device for a component according to FIG. 2;

FIG. 8 shows a detail IIX according to FIG. 7;

fig. 9 shows a detail view IX according to fig. 7;

figure 10 shows a schematic cross-sectional view of the sealing device according to section line X-X in figure 9;

FIG. 11 shows a schematic cross-sectional view of a further embodiment of a sealing device for a component according to FIG. 2;

FIG. 12 shows a schematic detail view of a further embodiment of a sealing device for a component according to FIG. 2;

FIG. 13 shows a schematic detail view of a further embodiment of a sealing device for a component according to FIG. 2; and

fig. 14 shows a schematic detail of a further embodiment of a sealing device for a component according to fig. 2.

Detailed Description

Unless indicated to the contrary, identical elements or elements having identical functions in the figures have identical reference numerals. It is also noted that the drawings within the drawings are not necessarily to scale.

FIG. 1A shows a schematic diagram of an EUV lithographic apparatus 100A comprising a beam shaping and illumination system 102 and a projection system 104. In this case, EUV stands for "extreme ultraviolet", meaning that the wavelength of the operating light is between 0.1nm and 30 nm. The beam shaping and illumination system 102 and the projection system 104 are each disposed within a vacuum enclosure (not shown), each of which is evacuated by means of an exhaust (not shown). The vacuum housing is surrounded by a machine room (not shown) in which drive means for mechanically moving or setting the optical elements are provided. Further, an electric controller and the like may be provided in the machine room.

The EUV lithographic apparatus 100A includes an EUV light source 106A. The plasma source (or synchrotron), for example, is provided as an EUV light source 106A, which emits radiation 108A in the EUV range (extreme ultraviolet range), that is to say, for example, in the wavelength range from 5nm to 20 nm. In the beam shaping and illumination system 102, the EUV radiation 108A focuses and filters out a desired operating wavelength from the EUV radiation 108A. The EUV radiation 108A produced by the EUV light source 106A has a relatively low air permeability, thus evacuating the beam-shaping and illumination system 102 and the beam-guiding space within the projection system 104.

The beam shaping and illumination system 102 shown in fig. 1A has five

mirrors

110, 112, 114, 116, 118. After passing through the beam shaping and illumination system 102, the EUV radiation 108A is directed onto a photomask (referred to as reticle) 120. The photomask 120 may be embodied as a reflective optical element and may be disposed outside of the

systems

102, 104. Further, EUV radiation 108A may be directed onto the photomask 120 by a mirror 122. The photomask 120 has a structure that is imaged onto a wafer 124 or the like in a demagnified fashion by the projection system 104.

Projection system 104 (also referred to as a projection lens) has six mirrors M1-M6 for imaging photomask 120 onto wafer 124. In this case, the respective mirrors M1 to M6 of the projection system 104 may be symmetrically arranged with respect to the optical axis 126 of the projection system 104. Note that the number of mirrors M1 to M6 of the EUV lithography apparatus 100A is not limited to the number presented, and a larger or smaller number of mirrors M1 to M6 may be provided. Further, the front faces of the mirrors M1-M6 are generally curved for beam shaping.

FIG. 1B shows a schematic diagram of a DUV lithographic apparatus 100B comprising a beam shaping and illumination system 102 and a projection system 104. In this case, DUV stands for "deep ultraviolet", meaning that the wavelength of the operating light is between 30nm and 250 nm. As already described with reference to fig. 1A, the beam shaping and illumination system 102 and the projection system 104 may be arranged in a vacuum housing and/or be surrounded by a machine room with corresponding drive means.

DUV lithographic apparatus 100B includes DUV light source 106B. For example, an ArF excimer laser, which emits radiation 108B, e.g. in the DUV range of 193nm, may be provided as the DUV light source 106B.

The beam shaping and illumination system 102 shown in FIG. 1B directs DUV radiation 108B onto a photomask 120. The photomask 120 is embodied as a transmissive optical element and may be disposed outside of the

systems

102, 104. The photomask 120 has a structure that is imaged onto a wafer 124 or the like in a demagnified fashion by the projection system 104.

The projection system 104 has a plurality of lens elements 128 and/or mirrors 130 for imaging the photomask 120 onto the wafer 124. In this case, the individual lens elements 128 and/or mirrors 130 of the projection system 104 may be arranged symmetrically with respect to the optical axis 126 of the projection system 104. Note that the number of lens elements 128 and mirrors 130 of DUV lithographic apparatus 100B is not limited to the number presented, and a greater or lesser number of lens elements 128 and/or mirrors 130 may be provided. Further, the front surface of the mirror 130 is generally curved for beam shaping.

The air gap between the last lens element 128 and the wafer 124 may be replaced by a liquid medium 132 having a refractive index greater than 1. The liquid medium 132 may be, for example, high purity water. This configuration is also known as immersion lithography and has improved optical lithographic resolution. The medium 132 may also be referred to as an immersion liquid.

FIG. 2 shows a plan view of a component 200 for an EUV lithographic apparatus 100A as described above. For example, the component 200 may be part of the beam shaping and illumination system 102 or the projection system 104 of the EUV lithography apparatus 100A. However, as mentioned above, the component 200 may also be part of the DUV lithographic apparatus 100B.

The component 200 can be, for example, a so-called Actuation Sensor Unit (ASU), by means of which the facets of a facet mirror, for example a field facet mirror or a pupil facet mirror, can be deflected. Such a facet mirror with a deflectable facet may be part of the beam shaping and illumination system 102, for example.

The component 200 includes a first component portion 202, and the first component portion 202 may be, for example, a body or frame of the component 200. The first component portion 202 may be made of metal, preferably copper, high grade steel or aluminum. Preferably, the first component portion 202 is actively cooled. In the present case, "active cooling" is understood to mean the introduction of a fluid, for example water, through the first component part 202 in order to absorb heat there and to carry it away. To this end, the first component part 202 may comprise a cooling system 204, in particular a cooling circuit, which is schematically shown in detail in fig. 2. The cooling system 204 may be formed by means of cooling channels provided in the first component portion 202.

The component 200 includes a plurality of second component portions 206, however, only one of which is labeled with a reference character in FIG. 2. The second component part 206 may be, for example, an Actuation Sensor Package (ASP) adapted to deflect a facet of a facet mirror as described above. In this case, a second component part 206 of this type is assigned to each facet. Preferably, a plurality of second component portions 206 are provided. For example, hundreds of second member portions 206 may be provided. As shown in fig. 2, the second member portions 206 are arranged in a grid or pattern. The second component portion 206 may have a cylindrical geometry.

The second component portion 206 is at least partially received in the first component portion 202 and is sealed with respect to the first component portion. The second component portion 206 may be cooled by means of the cooling system 204. The first component portion 202 has a receiving portion, such as a hole or recess, in which the second component portion 206 is partially received.

Fig. 3 shows a schematic cross-sectional view through two second component parts 206 according to section line III-III in fig. 2. Fig. 4 shows a detail IV from fig. 3. Please refer to fig. 3 and fig. 4.

As already mentioned, the first component part 202 comprises a receiving portion 208 in which the second component part 206 is accommodated. The receiving portion 208 may be embodied as a hole within the first component portion 202. Further, the first component portion 202 includes a sealing surface 210 or a plurality of sealing surfaces 210. In particular, a sealing surface 210 of this type is assigned to each second component part 206. The sealing surfaces 210 each extend circularly around the respective second component portion 206. As shown in fig. 3, the second component portions 206 each project above the sealing surface 210 assigned thereto.

Each second component portion 206 includes a body 212 having a cylindrical base portion 214 and a flange portion 216 extending around the base portion 214. The base portion 214 may be rotationally symmetric about a central or symmetry axis 218. The flange portion 216 is not rotationally symmetric about the axis of symmetry 218.

The flange portion 216 may be polygonal. The distance a1 between the flange portions 216 of two adjacent second component portions 206, viewed along section line III-III, is only a few hundred μm. For example, the distance A1 may be 200 μm. The base portion 214 is received in the receiving portion 208 and protrudes beyond the corresponding sealing surface 210. In each case, the flange portion 216 includes a sealing surface 220 that faces the respective sealing surface 210 of the first component portion 202.

The annular body 222 is placed over the body 212. The annular body 222 is closed upwards in the orientation of fig. 3 by a ceramic plate. The ceramic plate may be welded to the annular body 222. The annular body 222 may be welded to the body 212. Each second component part 206 comprises a sensor system and an actuator. The actuator may comprise a number of coils.

By means of the sealing arrangement 300, the second component part 206, in particular the sealing surface 220, is sealed with respect to the first component part 202, in particular the sealing surface 210. To this end, the sealing device 300 is positioned and pressed between the sealing

surfaces

210, 220. A yield volume 226 for compressing the sealing device 300 is provided between the sealing device 300 and the base portion 214, respectively. The yield volume 226 may be referred to as a compensation volume.

Fig. 5 shows a schematic cross-section through two second component parts 206 according to the section line V-V in fig. 2. Fig. 6 shows a detail view VI according to fig. 5. Please refer to fig. 5 and fig. 6.

The first member portion 202 extends beyond the sealing surface 210 through the bearing portion 224 when viewed along the section line V-V. The second component portion 206 is supported on the bearing portion 224 such that the sealing surfaces 210, 220 are positioned at a defined distance from each other. Distance A1 is significantly greater when viewed along section line V-V than when viewed along section line III-III.

A comparison of fig. 3 and 4 with fig. 5 and 6 shows that there is little structural space along the section line III-III. The overlap between the sealing surface 220 of the second component portion 206 and the sealing device 300 is small. Thus, the eccentricity of the sealing device 300 with respect to the respective symmetry axis 218 is liable to cause leakage. Furthermore, between adjacent second component parts 206 there is also only little or no yield volume 226 for pressing the sealing device 300. Therefore, leakage may occur between two adjacent second component portions 206.

In contrast, along section line V-V, a ridge bearing portion 224 is provided between two adjacent second member portions 206, and the flange portion 216 of the second member portion 206 is supported by the bearing portion. The sealing device 300 extends between the bearing portion 224 and the base portion 214 of the body 212 of the respective second component portion 206. There is significantly more structural space between adjacent second component parts 206 than in the view along the section line III-III. There is a significantly greater overlap between the sealing surface 220 of the second component portion 206 and the sealing device 300. Thus, the eccentricity of the sealing device 300 is not critical here in terms of leakage. The yield volume 226 for the compression seal 300 is also significantly greater, as viewed along section line V-V.

However, if the inner diameter of the sealing device 300 is increased to increase the yield volume 226, centering of the sealing device 300 is no longer ensured. The lack of centering of the sealing device 300 may have the following effects: in the view along the section line III-III, the sealing device 300 abuts against one of the two adjacent second component parts 206 and is spaced from the other of the two second component parts 206 by a distance of twice. Leakage may occur due to a small amount of overlap between the sealing surface 220 and the sealing device 300. In the worst case, no overlap at all occurs between the sealing surface 220 and the sealing device 300. This must be avoided.

The small structural space between the second component portions 206 does not allow for separation of the sealing device 300 into individual sealing rings, such as O-rings. Furthermore, due to the small structural space, the individual sealing rings cannot be prevented from tilting. Thus, as shown in fig. 7, the sealing device 300 is manufactured as a sealing gasket, which is cut out of a suitable plastic material, for example by means of a laser. For example, perfluororubber (FFKM) can be used as a suitable material.

As shown in fig. 7, the sealing device 300 includes a plurality of sealing rings 302 connected to each other, but only one of them is designated with a reference symbol in fig. 7. This prevents the sealing rings 302 from tilting due to the fact that the sealing rings 302 are connected to each other.

Fig. 8 shows a detail IIX according to fig. 7. The sealing rings 302 are connected to each other at connection locations 304, only two of which are indicated with reference symbols in fig. 8. The sealing device 300 is thus an integral component part, in particular a part that is one-piece in material. In the present case, "integral" is to be understood to mean that in the present case the sealing device 300 forms a single component part, not consisting of mutually separate component parts. That is, the seal rings 302 are fixedly connected to each other, wherein the entirety of all of the seal rings 302 constitutes the seal device 300. In the present case, "one piece on the material" is understood to mean that the sealing device 300 is a one-piece component part made entirely of the same material.

The sealing rings 302 each have a constant outer diameter DA, which is flat only in the region of the connection points 304. For the embodiment of the sealing rings 302 such that they each also have a constant inner diameter, such that the corresponding base portion 214 of the second component part 206 is effective centrally, it is problematic that, viewed along the section line III-III in fig. 2, there is hardly any yield volume 226 for pressing the sealing device 300. Therefore, the sealing device 300 cannot be sufficiently pressed between the adjacent second component portions 206.

This may result in damage to the sealing device 300, resulting in leakage, or failure to reach the desired mounting location for each second component portion 206. This eventually leads to a positional error (z error) of the component 200 in the height direction. To obtain a sufficient yield volume 226, the inner diameter of the sealing ring 302 may be increased to maintain a sufficiently large yield volume 226 between the second component portion 206 and the sealing device 300. However, this has the following disadvantages: sufficient centering at the base portion 214 of the second component portion 206 cannot be ensured. The sealing ring 302 then does not circumferentially abut the base portion 214, which may lead to leakage over time or directly during installation.

In order to obtain both a sufficiently large yield volume 226 and good centering, the sealing rings 302 each comprise an inner contour 306 which is not circular, but is trilobal as will be explained below. That is, the seal ring 302 has a varying inner diameter rather than a constant inner diameter. Reference will be made below to only one sealing ring 302. The theoretical inner diameter DI of the seal ring 302 is indicated in FIG. 8 by a dashed line. The inner diameter DI corresponds to the outer diameter of the base portion 214 of the second member portion 206.

Each seal ring 302 includes a first plane of symmetry E1 and a second plane of symmetry E2. The planes of symmetry E1, E2 are placed perpendicular to each other and intersect. The sealing ring 302 is constructed symmetrically, in particular mirror-symmetrically, with respect to the first plane of symmetry E1 and with respect to the second plane of symmetry E2. The center points of the diameters DA, DI lie on the intersection line of the two planes of symmetry E1, E2. A coordinate system having a first spatial direction or x-direction x, a second spatial direction or y-direction y, and a third spatial direction or z-direction z is assigned to the seal ring 302. The directions x, y, z are positioned perpendicular to each other.

In addition, an azimuthal or circumferential direction U is also assigned to the seal ring 302. The circumferential direction U may be oriented clockwise or counterclockwise. The circumferential direction U is oriented counterclockwise in fig. 8. The circumferential direction U extends along the inner contour 306.

The connection locations 304 are arranged mirror-symmetrically with respect to the first plane of symmetry E1 and with respect to the second plane of symmetry E2. Between two adjacent connection locations 304 respective azimuth angles α, β are provided. Azimuth α may be referred to as a first azimuth angle, azimuth β may be referred to as a second azimuth angle, and azimuth β is greater than azimuth α. For example, the azimuth angle α is about 71 °, and the azimuth angle β is about 108 °. The azimuth angle α is in each case provided between two connection locations 304 arranged mirror-symmetrically with respect to the first plane of symmetry E1. The azimuth angle β is in each case arranged between two connection locations 304 arranged mirror-symmetrically with respect to the second plane of symmetry E2.

The seal ring 302 has a connection radius R304 at the connection location 304. The inner contour 306 therefore has a connecting radius R304 in the region of the connecting location 304. That is, four connection radii R304 are provided, but only one of them is shown in fig. 8. The respective center points MR304-1 to MR304-4 of the connecting radius R304 lie outside the symmetry planes E1, E2. Four center points MR304-1 to MR304-4 are provided, which are located on the symmetry lines L1 to L3 connecting the positions 304. Each connection location 304 is assigned one line of symmetry L1 to L3, of which only three lines of symmetry L1 to L3 are shown in fig. 8. The connection locations 304 are constructed symmetrically with respect to the symmetry lines L1 to L3, respectively. In other words, the symmetry lines L1 to L3 pass through the connection position 304 from the center. The azimuth angles α, β are plotted between the symmetry lines L1 to L3.

The center points MR304-1 to MR304-4 are located mirror-symmetrically with respect to the planes of symmetry E1, E2. The center points MR304-1, MR304-4 and the center points MR304-2, MR304-3 are located a distance A2 apart from each other in the y-direction y. The center points MR304-1, MR304-2 and the center points MR304-3, MR304-4 are located a distance A3 apart from each other in the x-direction x. Distance a2 is greater than distance A3. The respective connecting radius R304 extends in the circumferential direction U over an azimuth angle γ of, for example, 20 °. For the case where the azimuths α, β are 90 °, respectively, the magnitudes of the distances a2, A3 are equal. The coupling radius R304 is less than half the inner diameter DI.

The inner contour 306 has respective first intermediate radii R11, R12 between two adjacent connection locations 304 in the x-direction x. The inner profile 306 includes two first intermediate radii R11, R12. The first intermediate radii R11, R12 are located at the top and bottom, respectively, of the orientation shown in FIG. 8. The first intermediate radii R11, R12 are each larger than the connecting radius R304, so the following applies: r11, R12> R304.

The respective center points MR11, MR12 of the first intermediate radii R11, R12 lie on the first plane of symmetry E1 and are respectively offset upwardly and downwardly in the orientation of fig. 8 relative to the second plane of symmetry E2. As viewed in the y direction y, the center points MR11, MR12 of the first intermediate radii R11, R12 are located at a distance a4 from one another. In this case, the center point MR11 is assigned to the first intermediate radius R11, and the center point MR12 is assigned to the first intermediate radius R12.

The inner contour 306 comprises respective second intermediate radii R21, R22 between two adjacent connection locations 304 in the y-direction y. The inner contour 306 includes two second intermediate radii R21, R22. The second intermediate radii R21, R22 are located to the left and right of the orientation shown in fig. 8, respectively. The second intermediate radii R21, R22 are greater than the connecting radius R304 and less than the first intermediate radii R11, R12, respectively. The following applies: r11, R12> R21, R22> R304. However, other suitable dimensional relationships may be selected. The intermediate radii R11, R12, R21, R22 are greater than half of the inner diameter DI.

The respective center points MR21, MR22 of the second intermediate radii R21, R22 lie on the second plane of symmetry E2 and are offset to the left and right, respectively, in the orientation of fig. 8 with respect to the first plane of symmetry E1. The center points MR21, MR22 of the second intermediate radii R21, R22 are located at a distance a5 from each other as viewed in the x-direction x. In this case, the center point MR21 is assigned to the second intermediate radius R21, and the center point MR22 is assigned to the second intermediate radius R22. Distance a4 is greater than distance a 5. For the case where the azimuths α, β are 90 ° respectively and the amplitudes are equal, the amplitudes of the distances a4, a5 are equal. Thus, the intermediate radii R11, R12, R21, R22 may also be equal in magnitude.

The inner contour 306 further comprises an optional transition radius RU, by means of which the intermediate radii R11, R12, R21, R22 transition into the respective connecting radius R304. In each case, two transition radii RU are provided per connection location 304. The transition radii RU are preferably the same, but can also be implemented separately. The transition radius RU provides a continuously variable transition from the respective connection radius R304 to the intermediate radii R11, R12, R21, R22.

The pre-stress of the seal ring 302 on the base portion 214 of the respective second component portion 206 is proportional to the azimuthal angle α, β. For example, in the case where the known azimuth angle α is 71 °, the sealing rings 302 between the respective connection locations 304 have to be shortened by α/360 ° or 71 °/360 °. As described above, the first intermediate radii R11, R12 and the second intermediate radii R21, R22, which are different from each other, are selected with the different distances or the different azimuths α, β being known. Accordingly, the connection position 304 can be prevented from moving azimuthally during installation, and thus the sealing device 300 is prevented from warping.

By the fact that the inner contour 306 has a connection radius R304 in the region of the connection location 304, which is selected such that it is smaller than the outer diameter, and thus smaller than the inner diameter DI, of the base portion 214 of the second component portion 206, a sufficiently large yield volume 226 for the compression of the sealing ring 302 is provided at the connection location 304.

In contrast, in the region of the intermediate radii R11, R12, R21, R22 disposed between the connection locations 304, the inner profile 306 undergoes a constriction or narrowing such that the inner profile 306 abuts against the base portion 214 and may be centered there. Thus, between the connection locations 304, the inner profile 306 rests with a prestress on the base portion 214. The narrowing of the inner profile 306 between the connection locations 304 and the widening of the inner profile at the connection locations 304 results in the inner profile 306 having a trilobe (trefoil) or trilobe-type design as described above.

Fig. 9 shows a detail IV from fig. 7. Fig. 7 shows in detail the connection point 304 between the two sealing rings 302. A yield volume 308 is provided on both sides at the connecting points 304, which yield volume corresponds to the yield volume 226, so that the sealing ring 302 can be compressed. The yield volume 308 may be referred to as a compensation volume. However, unlike the yield volume 226, the yield volume 308 is provided directly at the sealing device 300. Between the yielding volumes 308, a connecting web 310 is provided, which integrally connects adjacent sealing rings 302 to each other. The connecting locations 304 themselves have a width B304 at the connecting web 310, the width B304 may be, for example, two millimeters.

The yield volume 308 may be embodied as a flat portion of the respective outer diameter DA of the seal ring 302. That is, the outer diameters DA of adjacent seal rings 302 do not transition with one another. The yielding volume 308 is embodied in each case, for example, as a cut or groove extending completely through the wall thickness W300 (fig. 10) of the sealing device 300. In this case, the yield volume 308 of the groove type may have a width B308, and the width B308 may be, for example, 0.1 to 0.3 mm, in particular 0.2 mm. The wall thickness W300 may be 1 to 3 mm, in particular 2 mm.

Fig. 11 shows a development of the connection site 304 described with reference to fig. 9 and 10. In contrast to fig. 9 and 10, the yield volume 308 does not extend completely through the wall thickness W300, but only to a depth T308, which depth T308 may be, for example, 1 millimeter.

Fig. 12 again shows a detail IV from fig. 7, but a development of the connection point 304 shown in fig. 9 and 10 is illustrated in fig. 12. In this case, the yield volume 308 is not embodied as a cut or a groove. In contrast, the yield volume 308 includes a plurality of

holes

312, 314, 316 positioned adjacent to one another, but only three holes have reference characters in fig. 12. The

holes

312, 314, 316 may be any number, for example, six

holes

312, 314, 316 of this type may be provided for each yield volume 308.

The

holes

312, 314, 316 may be circular and each have a diameter D308. However, the

holes

312, 314, 316 may have any other geometry. For example, the

apertures

312, 314, 316 may also be oval or polygonal. The diameter D308 may be, for example, 0.2 millimeters. The

holes

312, 314, 316 may all have the same diameter D308 or different diameters D308 from one another. The

holes

312, 314, 316 may be aligned as shown in FIG. 12. In addition, the

holes

312, 314, 316 may be arranged in multiple rows. The

apertures

312, 314, 316 may be positioned in a uniform or non-uniform spacing from each other.

As shown in fig. 12, the connection locations 304 themselves, i.e., at the connection web 310, along the width B304 may or may not have

apertures

312, 314, 316. The

holes

312, 314, 316 may extend through the entire wall thickness W300 or only to the depth T308 described above.

Fig. 13 again shows a detail IV from fig. 7, but a development of the connection point 304 shown in fig. 12 is illustrated in fig. 13. In this case, each yield volume 308 includes a

multi-hole column

318, 320 having a plurality of

holes

312, 314, 316 in turn, as described above. The

hole rows

318, 320 can be any number. The

holes

312, 314, 316 may be arranged in two rows as shown in FIG. 13. However, the

apertures

312, 314, 316 may also be arranged in three or four rows. The

respective ones

312, 314, 316 of the

hole apertures

318, 320 may be positioned adjacent to one another as shown in fig. 13. However, the

holes

312, 314, 316 may be staggered with respect to each other.

Fig. 14 again shows a detail IV from fig. 7, but a development of the connection point 304 shown in fig. 12 is illustrated in fig. 14. In this embodiment of the connection location 304, the entire connection web 310 is provided with

holes

312, 314, 316, such that only a single continuous yield volume 308 formed by the

holes

312, 314, 316 is provided.

All the yield volume 308 configurations described above reliably enable the respective sealing ring 302 to be pressed in the region of the connection point 304. Therefore, direct leakage during installation and over time can be reliably prevented. At the same time, as described above, due to the trilobal geometry of the inner profile 306, it is always ensured that the sealing ring 302 is centered on the base portion 214 of the second component portion 206.

While the invention has been described in terms of exemplary embodiments, it can be modified in numerous ways.

REFERENCE SIGNS LIST

100A EUV lithographic apparatus

100B DUV lithographic apparatus

102 beam shaping and illumination system

104 projection system

106A EUV light source

106B DUV light source

108A EUV radiation

108B DUV radiation

110 reflecting mirror

112 mirror

114 mirror

116 mirror

118 mirror

120 photo mask

122 mirror

124 wafer

126 optical axis

128 lens element

130 mirror

132 medium

200 parts

202 parts of a component

204 cooling system

206 parts section

208 receive part

210 sealing surface

212 main body

214 base portion

216 Flange portion

218 axis of symmetry

220 sealing surface

222 ring body

224 bearing part

226 yield volume

300 sealing device

302 sealing ring

304 connection location

306 internal profile

308 yield volume

310 connecting web

312 hole

314 hole

316 hole

318 hole array

320 hole array

A1 distance

A2 distance

A3 distance

A4 distance

A5 distance

Width of B304

DA outer diameter

DI inner diameter

D308 diameter

E1 plane of symmetry

E2 plane of symmetry

Line of symmetry L1

Line of symmetry L2

Line of symmetry L3

MR11 center point

MR12 center point

MR21 center point

MR22 center point

MR304-1 center point

MR304-2 center point

MR304-3 center point

MR304-4 center point

M1 reflector

M2 reflector

M3 reflector

M4 reflector

M5 reflector

M6 reflector

RU transition radius

R11 intermediate radius

R12 intermediate radius

R21 intermediate radius

R22 intermediate radius

Radius of R304 junction

T308 depth

In the U circumferential direction

W300 wall thickness

x x direction

y y direction

z z direction

Angle of alpha

Angle of beta

Gamma azimuth angle

Claims

1. A sealing apparatus (300) for sealing a first component part (202) of a lithographic apparatus (100A, 100B) from a plurality of second component parts (206) of the lithographic apparatus (100A, 100B), comprising:

a plurality of seal rings (302), and

a plurality of connection locations (304),

wherein the sealing rings (302) are connected to each other by means of the connection locations (304).

2. The sealing arrangement of claim 1, wherein the connection locations (304) each comprise a yield volume (226,308) for compressing the respective sealing ring (302) between the first component portion (202) and one of the second component portions (206).

3. The sealing arrangement as claimed in claim 2, wherein each sealing ring (302) comprises an inner contour (306), in each of which at least part of the second component part (206) can be accommodated, and wherein the yield volume (226) is formed by the inner contour (306) widening at the connection location (304).

4. The sealing device as claimed in claim 3, wherein the inner contour (306) comprises a connecting radius (R304) at the connecting location (304), wherein the inner contour (306) comprises in each case an intermediate radius (R11, R12, R21, R22) between two adjacent connecting locations (304), and wherein the intermediate radii (R11, R12, R21, R22) and the connecting radius (R304) differ from one another in their absolute values, such that the inner contour (306) widens at the connecting location (304) and narrows between two adjacent connecting locations (304).

5. The sealing device of claim 4, wherein the intermediate radius (R11, R12, R21, R22) is greater than the connecting radius (R304).

6. The sealing device of claim 5, wherein the inner profile (306) comprises a first intermediate radius (R11, R12) and a second intermediate radius (R21, R22), wherein the first intermediate radius (R11, R12) and the second intermediate radius (R21, R22) are equal or unequal in magnitude.

7. The sealing device of claim 6, wherein the magnitude of the second intermediate radius (R21, R22) is greater than the magnitude of the first intermediate radius (R11, R12).

8. The sealing device of claim 6 or 7, wherein two adjacent connection locations (304) between which the first intermediate radius (R11, R12) is provided and two adjacent connection locations (304) between which the second intermediate radius (R21, R22) is provided are arranged at equal distances or at different distances from each other.

9. The sealing device of one of claims 6 to 8, wherein a center point (MR11, MR12, MR21, MR22) of the intermediate radius (R11, R12, R21, R22) is arranged offset with respect to a center point (MR304-1-MR304-4) of the connecting radius (R304).

10. The sealing device of claim 9, wherein the center points (MR21, MR22) of the first intermediate radii (R11, R12) are arranged offset in the x-direction (x) and the y-direction (y) of the seal ring (302) with respect to the center point (MR304-1-MR304-4) of the connecting radius (R304), and wherein the center points (MR21, MR22) of the second intermediate radii (R21, R22) are arranged offset in the x-direction (x) and the y-direction (y) of the seal ring (302) with respect to the center point (MR304) of the connecting radius (R304).

11. The sealing arrangement as claimed in claim 10, wherein the center points (MR11, MR12) of the two first intermediate radii (R11, R12) are arranged at a first distance (a4) from one another in the y-direction (y), wherein the center points (MR21, MR22) of the two second intermediate radii (R21, R22) are arranged at a second distance (a5) from one another in the x-direction (x), and wherein the first distance (a4) and the second distance (a5) have equal or different amplitudes.

12. The sealing device of claim 11, wherein the first intermediate radii (R11, R12) and the second intermediate radii (R21, R22) are staggered along the inner profile (306).

13. The sealing device of any one of claims 4 to 12, wherein the inner contour (306) comprises a transition Radius (RU), and wherein the intermediate radius (R11, R12, R21, R22) transitions to the connecting radius (R304) with the aid of the transition Radius (RU).

14. The sealing device of any one of claims 2 to 13, wherein each connection location (304) provides two yield volumes (308), wherein a connecting web (310) of the connection location (304) is provided between the two yield volumes (308), and wherein the connecting web (310) connects adjacent sealing rings (302) to each other.

15. The sealing device of any one of claims 2 to 14, wherein the yield volume (308) is a groove that completely passes through a wall thickness (W300) of the sealing device (300) or extends only to a defined depth (T308) of the wall thickness (W300).

16. The sealing device of any one of claims 2 to 15, wherein the yield volume (308) comprises a number of holes (312, 314, 316) which completely pass through the wall thickness (W300) of the sealing device (300) or extend only to a defined depth (T308) of the wall thickness (W300).

17. A component (200) for a lithographic apparatus (100A, 100B), comprising:

a first component part (202),

a plurality of second component parts (206) at least partially accommodated within the first component parts (202), and

the sealing device (300) of any of claims 1 to 16.

18. The component of claim 17, wherein the sealing ring (302) is pressed in each case between the first component part (202) and one of the second component parts such that the respective yield volume (226,308) of the sealing device (300) at least partially fills in the material of the respective sealing ring (302).

19. A lithographic apparatus (100A, 100B) comprising a sealing device (300) according to any of claims 1 to 16 and/or a component (200) according to claim 17 or 18.