CN113913789B - Tray base, airflow driving device and reaction chamber mechanism of epitaxial equipment - Google Patents

Tray base, airflow driving device and reaction chamber mechanism of epitaxial equipment Download PDF

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Publication number
CN113913789B
CN113913789B CN202111187817.0A CN202111187817A CN113913789B CN 113913789 B CN113913789 B CN 113913789B CN 202111187817 A CN202111187817 A CN 202111187817A CN 113913789 B CN113913789 B CN 113913789B
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China
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groove
tray base
air
air flow
tray
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CN113913789A (en
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孔倩茵
唐卓睿
赵海英
王慧勇
刘欣
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Ji Huahengyi Foshan Semiconductor Technology Co ltd
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Individual
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4584—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally the substrate being rotated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices

Abstract

The application relates to the technical field of epitaxial growth, specifically discloses a tray base, air current drive arrangement and epitaxial equipment's reaction chamber mechanism, wherein, tray base bottom is equipped with a plurality of circumference array's air current groove, and a plurality of air current grooves are through an air inlet groove intercommunication, and the air current groove includes: an inner tank communicated with the air inlet tank; an outer groove communicated with the inner groove and the edge of the tray base; the depth of the inner groove is smaller than that of the outer groove, so that air flow guided by the air inlet groove enters the inner groove to increase dynamic pressure so as to support the tray base, and then enters the outer groove to be released outwards so as to drive the tray base to rotate; the tray base is provided with the air flow groove as an inner groove and an outer groove, so that the introduced air flow generates larger dynamic pressure when being introduced into the inner groove from the air inlet groove to float the tray base, and then the air flow enters the outer groove to be outwards released to drive the tray base to rotate, and the starting mode that the tray base floats firstly and then rotates is realized.

Description

Tray base, airflow driving device and reaction chamber mechanism of epitaxial equipment
Technical Field
The invention relates to the technical field of epitaxial growth, in particular to a tray base, an airflow driving device and a reaction chamber mechanism of epitaxial equipment.
Background
In the epitaxial growth process, in order to improve the epitaxial uniformity, a tray with a substrate needs to be rotated at a constant speed so as to enable crystals on the substrate to uniformly grow.
The tray is generally supported by the tray base and rotates as the tray base rotates.
The existing tray base is generally required to be matched with an airflow guiding base for use; the air flow sent out by the air flow guiding base forms vortex between the tray base and the air flow guiding base so that the tray base rotates and floats, however, the phenomenon that the tray base starts to rotate when the existing tray base is not floated frequently occurs, and the tray base is worn and unstable in rotation when the existing tray base starts to rotate.
Accordingly, the prior art is subject to improvement and development.
Disclosure of Invention
An object of the application is to provide a tray base, air current drive arrangement and epitaxial equipment's reaction chamber mechanism, realize tray base and float earlier rotatory start-up mode afterwards, prevent that tray base from carrying out the rotation when not floating completely and lead out the base friction with the air current and cause the damage to guarantee that tray base starts steadily, do not have the clamping stagnation.
In a first aspect, the present application provides a tray base for bearing tray and drive the rotation of tray floating is in order to carry out epitaxial growth, the tray base is discoid, tray base bottom is equipped with a plurality of circumference array's air current groove, tray base bottom still is equipped with an air inlet tank, and is a plurality of the air current groove is through one the air inlet tank intercommunication, the air current groove includes:
an inner tank communicated with the air inlet tank;
an outer groove communicated with the inner groove and the tray base edge;
the depth of the inner groove is smaller than that of the outer groove, so that air flow guided by the air inlet groove enters the inner groove to increase dynamic pressure so as to lift the tray base, and then enters the outer groove to be released outwards so as to drive the tray base to rotate.
The tray base of this application sets up the air current groove into inside groove and external groove two parts, and inside groove depth is less than external groove depth for the leading-in air current produces great dynamic pressure and floats the tray base when leading-in to the inside groove from the air inlet groove, and afterwards air current reentrant external inslot outwards releases in order to drive the tray base rotation, thereby has realized the first mode of lifting up of tray base and then rotatory start-up, prevents that the tray base from rotating when not fully lifting up and lead out the base friction with the air current and cause the damage, and guarantee that the tray base starts steadily, no jamming.
The tray base is characterized in that an included angle between a radial line of the tray base, where an intersection point of the center line of the outer groove and the edge of the tray base is located, and the center line of the outer groove is 36-40 degrees, and an included angle between the center line of the outer groove and the center line of the inner groove is 148-154 degrees.
In the exemplary tray base, the angle between the radial line at the intersection of the outer slot centerline and the tray base edge and the outer slot centerline is designed to be 36-40 °, so that the air flow in the outer slot provides sufficient impetus to drive the tray base to rotate while retaining sufficient kinetic energy to release out of the tray base.
The tray base comprises 3-10 air flow grooves.
In the tray base of this example, the number of the air flow grooves is at least 3, so that the tray base is prevented from tilting during the floating process; in addition, the greater the number of air flow grooves, the greater the flow dividing action on the air inlet grooves, so that the air inlet grooves need to introduce a larger air flow to drive the tray base to float, and therefore, the air flow grooves need to have a set upper limit of 10.
The tray base is characterized in that the groove width of the inner groove is increased towards the edge of the tray base, and the included angle between planes of two side walls of the inner groove is 18-20 degrees.
The tray base is characterized in that the groove width of the outer groove is increased towards the edge of the tray base, and the included angle between the planes of the two side walls of the outer groove is 5-8 degrees.
The depth of the outer groove is reduced towards the edge of the tray base, and the included angle between the bottom of the outer groove and the horizontal plane is 0.7-0.8 degrees.
In the tray base of this example, the air flow in the gap space becomes weaker as it approaches the tray base edge, and therefore, the depth of the outer groove is designed to become smaller toward the tray base edge, so that the air flow flowing in the outer groove can be gradually supplemented into the gap space to strengthen the floating ability of the tray base edge, avoiding the unstable floating ability of the tray base edge.
In a second aspect, the present application further provides an air flow driving device for supporting a tray and driving the tray to float and rotate for epitaxial growth, the air flow driving device comprising:
the tray base is used for supporting the tray;
the air flow guiding base is connected with the tray base in a clearance way through a rotating shaft and is used for feeding air flow to the tray base so as to drive the tray base to float and rotate;
the tray base is discoid, tray base bottom is equipped with a plurality of circumference array's air current groove, tray base bottom still is equipped with an air inlet tank, and is a plurality of the air current groove is through one the air inlet tank intercommunication, the air current groove includes:
an inner tank communicated with the air inlet tank;
an outer groove communicated with the inner groove and the tray base edge;
the depth of the inner groove is smaller than that of the outer groove, so that air flow guided by the air inlet groove enters the inner groove to increase dynamic pressure so as to lift the tray base, and then enters the outer groove to be released outwards so as to drive the tray base to rotate.
The air current drive arrangement of this application sets up the air current groove on the tray base into inside groove and external groove two parts, and inside groove depth is less than external groove depth, produce great dynamic pressure and float the tray base when making the air current that the air current was led out the base and send into from the air inlet groove leading-in to the inside groove, even make tray base bottom surface and air current export the separation of base top surface, afterwards the air current reentrant external groove is outwards released in order to drive the tray base rotatory, thereby realized the first mode of starting that floats up earlier of tray base and then rotate, prevent that the tray base from rotating when not floating completely and lead out the base friction with the air current and cause the damage, and guarantee that tray base starts steadily, no jamming.
The air flow driving device is characterized in that a plurality of first air outlet holes and a plurality of second air outlet holes are formed in the air flow guiding-out base, the first air outlet holes are used for feeding air flow into the air inlet grooves, and the second air outlet holes are used for feeding air flow into the outer grooves so as to accelerate the rotating speed of the tray base.
In the air flow driving device of this example, the second air outlet is provided to additionally supply air flow to the outer tub so that there is enough air flow in the outer tub to drive the tray base to rotate, thereby ensuring that the tray base can reach the expected rotation speed.
The aperture of the first air outlet hole is 1.2-1.5 times of that of the second air outlet hole.
In the air flow driving device of this example, the air flow sent out by the first air outlet hole is larger, so that the air flow in the inner groove can be ensured to smoothly float up the tray base, and the air flow sent out by the second air outlet hole is mainly used for supplementing the outer groove so as to increase the air flow in the outer groove.
In a third aspect, the present application further provides a reaction chamber mechanism of an epitaxial apparatus for performing epitaxial growth, the reaction chamber mechanism comprising:
the reaction cavity is used for placing a tray so as to enable the substrate on the tray to carry out epitaxial growth;
the heating component is arranged outside the reaction cavity and is used for heating the reaction cavity to provide the temperature required by epitaxial growth;
the air flow driving device is arranged in the reaction cavity and is used for supporting the tray and driving the tray to float and rotate so as to perform epitaxial growth;
an air flow supply assembly for supplying the air flow required for driving the tray to float and rotate to the air flow driving device;
the airflow driving device includes:
the tray base is used for supporting the tray;
the air flow guiding base is connected with the tray base in a clearance way through a rotating shaft and is used for feeding air flow to the tray base so as to drive the tray base to float and rotate;
the tray base is discoid, tray base bottom is equipped with a plurality of circumference array's air current groove, tray base bottom still is equipped with an air inlet tank, and is a plurality of the air current groove is through one the air inlet tank intercommunication, the air current groove includes:
an inner tank communicated with the air inlet tank;
an outer groove communicated with the inner groove and the tray base edge;
the depth of the inner groove is smaller than that of the outer groove, so that air flow guided by the air inlet groove enters the inner groove to increase dynamic pressure so as to lift the tray base, and then enters the outer groove to be released outwards so as to drive the tray base to rotate.
The utility model provides an epitaxial equipment's reaction chamber mechanism sets up the air current groove on the tray base into inside groove and external groove two parts, and inside groove depth is less than external groove depth, make the air current that the air current derivation base sent in produce great dynamic pressure and float the tray base when leading-in to the inside groove from the air inlet groove, even make tray base bottom surface and air current derivation base top surface separation, afterwards the air current reentrant external groove is outwards released in order to drive the tray base rotation, thereby realized the first mode of starting that floats earlier of tray base and then rotate, prevent that the tray base from rotating when not floating completely and lead out the base friction with the air current and cause the damage, and guarantee that the tray base starts steadily, no clamping stagnation.
From the above, the application provides a reaction chamber mechanism of tray base, air current drive arrangement and epitaxial equipment, wherein, the tray base sets up the air current groove into inside groove and outside groove two parts, and inside groove depth is less than outside groove depth for the leading-in air current produces great dynamic pressure and floats the tray base when leading-in to the inside groove from the air inlet groove, and afterwards the air current outwards releases in reentrant outside groove in order to drive the tray base rotation, thereby realized the first mode of starting that floats earlier than rotatory of tray base, prevent that the tray base from rotating when not floating completely and lead out the base friction with the air current and cause the damage, and guarantee that tray base starts steadily, no jamming.
Drawings
Fig. 1 is a schematic bottom view of a tray base according to an embodiment of the present disclosure.
Fig. 2 is a partially enlarged schematic view of a tray base according to an embodiment of the present application, which is cut along an extension direction of an outer slot.
Fig. 3 is a schematic cross-sectional structure of an airflow driving device according to an embodiment of the present application.
Fig. 4 is a schematic top view of an airflow guiding base in an airflow driving device according to an embodiment of the present disclosure.
Fig. 5 is a schematic structural diagram of a reaction chamber mechanism of an epitaxial apparatus according to an embodiment of the present application.
Description of the reference numerals: 100. a tray base; 101. an air inlet groove; 102. an inner tank; 103. an outer groove; 200. an air flow guiding base; 201. a first air outlet hole; 202. a second air outlet hole; 203. a rotating shaft; 204. an air guide pipe; 300. a reaction chamber; 400. a heating assembly; 500. an air flow supply assembly.
Detailed Description
Embodiments of the present invention are described in detail below, examples of which are illustrated in the accompanying drawings, wherein the same or similar reference numerals refer to the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the drawings are exemplary only for explaining the present invention and are not to be construed as limiting the present invention.
In the description of the present invention, it should be understood that the terms "center," "longitudinal," "transverse," "length," "width," "thickness," "upper," "lower," "vertical," "horizontal," "inner," "outer," and the like indicate orientations or positional relationships based on the orientation or positional relationships shown in the drawings, merely to facilitate describing the present invention and simplify the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated.
In the description of the present invention, it should be noted that, unless explicitly stated and limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of two elements or the interaction relationship of the two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art according to the specific circumstances.
The following disclosure provides many different embodiments, or examples, for implementing different features of the invention. In order to simplify the present disclosure, components and arrangements of specific examples are described below. They are, of course, merely examples and are not intended to limit the invention. Furthermore, the present invention may repeat reference numerals and/or letters in the various examples, which are for the purpose of brevity and clarity, and which do not themselves indicate the relationship between the various embodiments and/or arrangements discussed.
In the existing horizontal Chemical Vapor Deposition (CVD) equipment, a tray with a substrate is generally supported by a tray base, and the tray base is driven to float and rotate in a cyclone manner to drive the tray to rotate, so that the tray continuously rotates in a reaction cavity, and the reaction gas and the substrate on the tray uniformly contact and react to perform crystal growth.
The phenomenon that the tray base starts to rotate when not floating is mainly caused by the fact that the air flow enters the air flow groove of the tray base and directly applies pushing force to the inner side wall of the air flow groove, so that the tray base starts to rotate under force when starting.
In a first aspect, as shown in fig. 1 and fig. 2, the embodiment of the present application provides a tray base, which is used for supporting a tray and driving the tray to float and rotate for epitaxial growth, the tray base 100 is disc-shaped, a plurality of air flow grooves of circumferential arrays are arranged at the bottom of the tray base 100, an air inlet groove 101 is further arranged at the bottom of the tray base 100, and the plurality of air flow grooves are communicated through the air inlet groove 101, and the air flow grooves comprise:
an inner tank 102 communicating with the air intake tank 101;
an outer groove 103 communicating with the inner groove 102 and the edge of the tray base 100;
the depth of the inner groove 102 is smaller than that of the outer groove 103, so that the air flow guided by the air inlet groove 101 enters the inner groove 102 to increase dynamic pressure so as to lift the tray base 100, and then enters the outer groove 103 to be released outwards so as to drive the tray base 100 to rotate.
The tray base in this embodiment is a tray supporting mechanism in a chemical vapor deposition epitaxy apparatus, the tray base 100 is generally placed on the airflow guiding base 200, and airflow is continuously guided into the bottom surface of the tray base 100 by the airflow guiding base 200 so that the tray base 100 floats and rotates to drive the tray on the tray base 100 to float and rotate.
Specifically, when the tray base of the embodiment of the present application is used, the air inlet groove 101 continuously feeds the air flow, and then feeds the air flowThe inner groove 102 in the air flow grooves is distributed to be smaller than the outer groove 103 in depth, the tray base 100 is installed with the surface with the air flow grooves facing downwards, so the bottom height position of the inner groove 102 is lower than the bottom height position of the outer groove 103, the air flow flows along the air inlet groove 101, the inner groove 102 and the outer groove 103, and the flow rate of the air flow continuously introduced in the air inlet groove 101 is constant to ensure the stable epitaxial growth, so the flow rate of the air flow introduced at the beginning is enough to supply the tray base 100 for floating rotation after the air flow is completely conducted to the edge of the tray base 100, and when the air flow enters the inner groove 102 and does not enter the outer groove 103, the flow area of the inner groove 102 is smaller than the flow area of the outer groove 103 due to the fact that the flow rate of the air flow is unchanged, the flow rate of the air flow in the inner groove 102 is relatively higher according to Q=sv (Q is the air flow rate, S is the flow area, v is flow speed) and the flow rate of the air flow in the inner groove 102 is relatively higher according to P=0.5ρ 2 As can be seen from the fact that (P is dynamic pressure, ρ is gas density, and v is flow speed), assuming that the gas density is unchanged, when the inner tank 102 has a higher flow velocity, the dynamic pressure generated by the gas flow in the inner tank 102 is larger, and the dynamic pressure generated when the dynamic pressure is the gas flow, in this embodiment, the dynamic pressure is represented by the additional pressure to the tray base 100 and the gas flow guiding-out base 200 when the gas flow flows in the gas flow tank, since the dynamic pressure generated by the gas flow in the inner tank 102 is relatively larger, a supporting force larger than the gravity force to which the tray base 100 and the tray are subjected can be generated first, and then the tray base 100 floats up, so that the gas flow guiding-out base 200 and the tray base 100 are separated to generate a gap space, so that excessive gas flow in the inner tank 102 is released from the gap space, then the rest gas flow in the inner tank 102 enters the outer tank 103 and is released outwards under the pushing action of the gas flow flowing in the outer tank 103, and the pushing force is applied to the inner wall of the gas flow tank 103, so that the tray base 100 is pushed to rotate.
Specifically, the tray base in the embodiment of the present application is provided with an air inlet groove 101 communicated with a plurality of air flow grooves, so that the flow rate of the air flow and the like can be ensured to be split into the plurality of air flow grooves, and the inner groove 102 in the air flow grooves is ensured to have the same air flow rate, so that the part with the air flow grooves in the tray base 100 is floated simultaneously; secondly, the air flow grooves are formed in a circumferential array mode, so that the base tray is enabled to be uniformly stressed and vertically and upwards float, and the base tray is effectively prevented from inclining when floating.
The tray base of this embodiment sets up the air current groove into inside groove 102 and outside groove 103 two parts, and inside groove 102 groove depth is less than outside groove 103 groove depth for great dynamic pressure is produced when leading-in air current from air inlet 101 to inside groove 102 and the tray base 100 floats, and afterwards air current reentrant outside in groove 103 releases outwards in order to drive tray base 100 rotation, thereby has realized the start-up mode of tray base 100 first float then rotatory, prevents tray base 100 and rotates when not fully float and lead out base 200 friction with the air current and cause the damage, and guarantees tray base 100 start-up steadily, no jamming.
Specifically, the outer slots 103 communicate with the tray edges, i.e., such that the outer slots 103 can communicate air flow to the outer peripheral walls of the tray for release.
In some preferred embodiments, the air inlet 101 has a circular ring shape or a regular polygonal ring shape, and a plurality of air flow grooves can be connected at the same time.
In some preferred embodiments, since the air inlet 101 needs to be supplied with air from the air outlet base 200, and the air supply end of the air outlet base 200 is provided at a fixed position, the air inlet 101 should be designed to always receive air from the air supply end at the fixed position, so that the air inlet 101 is preferably designed in a circular shape, so that the air supply end of the air outlet base 200 can always guide air into the circular air inlet 101 during rotation of the tray base 100; secondly, because a plurality of air flow grooves are arranged in a circumferential array, the air inlet grooves 101 are arranged as annular grooves, so that the arrangement length of the air flow grooves is consistent, namely, the distance from the intersection position of the air flow grooves and the air inlet grooves 101 to the axial lead of the tray base 100 is equal, the tray base 100 is ensured to be lifted upwards steadily, and the tray base 100 is enabled to be stressed more uniformly when rotating.
In some preferred embodiments, the angle between the radial line of the pallet base 100 where the intersection of the centerline of the outer slot 103 and the edge of the pallet base 100 is located and the centerline of the outer slot 103 is 36-40, and the angle between the centerline of the outer slot 103 and the centerline of the inner slot 102 is 148-154, i.e., angle a is 36-40 as shown in FIG. 1, and angle b is 148-154.
Specifically, the principle of the air flow release to drive the tray base 100 to rotate is: when the air flows in the air flow groove, acting force is applied to the inner side wall of the air flow groove to drive the tray base 100 to rotate; thus, the air flow slots are generally inclined, i.e., offset from the radial line of the tray base 100, so that the air flow release can create a pushing force on the inner side walls of the air flow slots.
More specifically, the larger the minimum included angle between the flow direction of the air flow entering the air inlet groove and the extending direction of the air flow groove is, the larger the acting force exerted by the air flow on the side wall of the air flow groove is, for example, the maximum value is reached at 90 degrees; however, the tray base 100 needs to realize stable rotation at a constant speed, so the air flow groove needs to be provided with a corresponding flow guiding function, so that the air flow can drive the tray base 100 to rotate and simultaneously be smoothly released out of the tray base 100, so that the air flow can be continuously led into the tray base 100 to rotate; therefore, the included angle between the radial line of the center line of the outer groove 103 on the tray base 100 and the center line of the outer groove 103 is designed to be 36-40 degrees, so that the air flow in the outer groove 103 provides enough driving force for driving the tray base 100 to rotate, and enough kinetic energy is reserved and released outside the tray base 100.
In the present embodiment, the angle between the radial line at the intersection of the center line of the outer groove 103 and the edge of the tray base 100 and the center line of the outer groove 103 is preferably 38 °.
More specifically, the inner tank 102 communicates with the outer tank 103 and the air intake tank 101, and in order to avoid an excessively large or excessively small deflection flow of the air flow, the inner tank 102 serves as a passage for buffering the deflection of the air flow between the outer tank 103 and the air intake tank 101 to ensure that the air flow enters the outer tank 103 with a proper angle for applying the pushing force to drive the tray base 100 to rotate, and therefore, the included angle between the center line of the outer tank 103 and the center line of the inner tank 102 is designed to be 148-154 °, so that the air flow can be more smoothly guided from the air intake tank 101 into the outer tank 103 by the inner tank 102 and the tray base 100 is driven to rotate with a proper angle for applying the pushing force.
In the present embodiment, the angle between the centerline of the outer tank 103 and the centerline of the inner tank 102 is preferably 150 °.
In some preferred embodiments, the number of flow channels is 3-10.
Specifically, the plurality of air flow grooves are used for simultaneously driving the tray base 100 to float and then rotate, and the tray base 100 needs to ensure that the tray base 100 has enough supporting points for balanced lifting in the process of floating, so that at least 3 air flow grooves are arranged to avoid the inclination of the tray base 100 in the process of floating; in addition, the greater the number of air flow grooves, the greater the flow dividing action on the air inlet groove 101, so that the air inlet groove 101 needs to introduce a larger air flow to drive the tray base 100 to float, and therefore, the upper limit of the air flow grooves is set to 10.
In the embodiment of the present application, the number of air flow grooves is preferably 5, and 5 air flow grooves can ensure that the tray base 100 floats smoothly and smoothly, and the air flow rate is not required greatly.
In some preferred embodiments, the inner tank 102 is straight extending to ensure a stable introduction of the air flow into the outer tank 103.
In some preferred embodiments, the slot width of the inner slot 102 is increased toward the edge of the tray base 100, with the included angle between the planes of the two side walls of the inner slot 102 being 18-20.
Specifically, the main purpose of the inner tank 102 is to generate a large dynamic pressure to drive the tray base 100 to float when the air flow enters therein, and after the tray base 100 floats, the inner tank 102 needs to ensure that the air flow is smoothly fed into the outer tank 103 to drive the tray base 100 to rotate, so that the tank width of the inner tank 102 is set to be larger toward the edge of the tray base 100, the air flow has a sufficient dynamic pressure at the narrowest end of the inner tank 102 to drive the tray base 100 to float, and then gradually spread and stabilize in a sufficiently long gradual wide area to form a stable air flow to be introduced into the outer tank 103.
In some preferred embodiments, the outer groove 103 is a straight line extension or a curve extension, the straight line extension outer groove 103 has lower processing difficulty than the curve extension outer groove 103, the curve extension outer groove 103 has better airflow guiding effect than the straight line extension outer groove 103, and both arrangement modes can ensure that the rotation speed of the tray base 100 is stable, so the tray base can be designed according to the use requirement; in the present embodiment, the outer groove 103 preferably extends straight.
In some preferred embodiments, the width of the outer groove 103 is increased toward the edge of the tray base 100, and the angle between the planes of the two side walls of the outer groove 103 is 5-8 °.
Specifically, after the air flow applies a pushing force to the tray base 100 in the outer groove 103, the flow speed of the air flow decreases according to the law of conservation of momentum, so that the groove width of the outer groove 103 is designed to be increased toward the edge of the tray base 100, ensuring that the air flow with the decreased flow speed has enough buffering space to release the flow outwards, and avoiding excessive energy loss caused by pushing the front air flow by the subsequent air flow.
In some preferred embodiments, the depth of the outer groove 103 is reduced toward the edge of the tray base 100, and the groove bottom of the outer groove 103 is at an angle of 0.7-0.8 ° to the horizontal.
Specifically, as can be seen from the foregoing, the tray base 100 is mainly configured to float based on the large dynamic pressure generated in the inner groove 102, so that a gap space is generated by separating the air flow guiding-out base 200 from the tray base 100, during the floating process, the air flow in the inner groove 102 flows into the gap space to separate the tray base 100 from the air flow guiding-out base 200, and the air flow in the gap space is weaker as it approaches the edge of the tray base 100, so that the depth of the outer groove 103 is designed to be smaller toward the edge of the tray base 100, so that the air flow flowing in the outer groove 103 can be gradually supplemented into the gap space to strengthen the floating capability of the edge of the tray base 100, and the unstable floating capability of the edge of the tray base 100 is avoided.
In some preferred embodiments, the inner tank 102 has a depth of 0.4-0.6mm, preferably 0.5mm in this example.
In some preferred embodiments, the innermost depth of the outer groove 103 is 1.2-1.5mm, in this example, preferably 1.3mm.
In some preferred embodiments, the tray base 100 is provided with a shaft hole in the middle for mounting the rotation shaft 203 to connect the air flow guiding-out base 200.
In a second aspect, as shown in fig. 1-4, an embodiment of the present application provides an airflow driving device for supporting a tray and driving the tray to float and rotate for epitaxial growth, where the airflow driving device includes:
a tray base 100 for supporting a tray;
an air flow guiding base 200, which is connected with the tray base 100 through a rotating shaft 203 in a clearance way, and is used for feeding air flow towards the tray base 100 to drive the tray base 100 to float and rotate;
tray base 100 is discoid, and tray base 100 bottom is equipped with a plurality of circumference array's air current groove, and tray base 100 bottom still is equipped with an air inlet groove 101, and a plurality of air current grooves are through an air inlet groove 101 intercommunication, and the air current groove includes:
an inner tank 102 communicating with the air intake tank 101;
an outer groove 103 communicating with the inner groove 102 and the edge of the tray base 100;
the depth of the inner groove 102 is smaller than that of the outer groove 103, so that the air flow guided by the air inlet groove 101 enters the inner groove 102 to increase dynamic pressure so as to lift the tray base 100, and then enters the outer groove 103 to be released outwards so as to drive the tray base 100 to rotate.
According to the air flow driving device, the air flow grooves on the tray base 100 are formed into the inner groove 102 and the outer groove 103, the groove depth of the inner groove 102 is smaller than that of the outer groove 103, so that large dynamic pressure is generated when air flow fed from the air flow guiding base 200 is guided into the inner groove 102 from the air inlet groove 101 to float the tray base 100, namely, the bottom surface of the tray base 100 is separated from the top surface of the air flow guiding base 200, and then the air flow is outwards released in the outer groove 103 to drive the tray base 100 to rotate, the tray base 100 is started in a mode of firstly floating and then rotating, damage caused by friction between the tray base 100 and the air flow guiding base 200 when the tray base 100 is not completely floating is prevented, and stable starting and no clamping stagnation of the tray base 100 are ensured.
Specifically, the airflow guiding base 200 is connected to the tray base 100 through a rotating shaft 203 in a gap manner, that is, the tray base 100 is rotatably connected to the airflow guiding base 200 through the rotating shaft 203 and can move up and down along the axis of the rotating shaft 203, so that the tray base 100 can float a certain height in the airflow guiding base 200 and can perform a rotation motion about the axis of the rotating shaft 203 as a rotation axis relative to the airflow guiding base 200. In some preferred embodiments, the airflow guiding base 200 is provided with a plurality of first air outlet holes 201 and a plurality of second air outlet holes 202, where the first air outlet holes 201 are used for feeding airflow toward the air inlet slot 101, and the second air outlet holes 202 are used for feeding airflow toward the air outlet slot 103 to accelerate the rotation speed of the tray base 100.
Specifically, the first air outlet hole 201 is used to send an air flow into the air inlet groove 101, so that the air inlet groove 101 can guide the air flow into the inner groove 102 to float the tray base 100; since the depth of the inner slot 102 is smaller than the depth of the outer slot 103 and a part of the air flow in the inner slot 102 is dispersed into the gap space between the tray base 100 and the air flow guiding-out base 200 after the tray base 100 floats, the air flow in the outer slot 103 is small, and the generated rotation driving force is weak, the second air outlet 202 is provided to additionally supply the air flow for the outer slot 103, so that the tray base 100 is driven to rotate by enough air flow in the outer slot 103, and the tray base 100 can achieve the expected rotation speed.
In some preferred embodiments, the first outlet holes 201 are 2-4 and are in a circumferential array.
Specifically, the first air outlet holes 201 are located below the air inlet groove 101, and 2-4 first air outlet holes 201 can make the air flow generated in the air inlet groove 101 more uniform, so that the air flow can be uniformly dispersed and guided into the plurality of inner grooves 102.
More specifically, in the embodiment of the present application, the number of the first air outlet holes 201 is preferably 2.
In some preferred embodiments, the first outlet aperture 201 is vertically disposed or obliquely disposed.
In some preferred embodiments, the first air outlet 201 is preferably disposed obliquely, and the included angle between the axis line and the vertical line is 42-52 °, so that the air flow sent out by the first air outlet 201 has a certain flow velocity in the horizontal direction, which is beneficial for the air flow flowing in the air inlet groove 101.
Specifically, in the embodiment of the present application, the included angle between the axis of the first air outlet hole 201 and the vertical line is 45 °.
In some preferred embodiments, the second gas outlet holes 202 are 2-4 and are in a circumferential array.
More specifically, in the embodiment of the present application, the number of the second air outlet holes 202 is preferably 2.
Specifically, after the tray base 100 floats, the air flow flows from the inner groove 102 into the outer groove 103 and then is released outwards, so that the tray base 100 rotates, and during the rotation of the tray base 100, the outer groove 103 intermittently rotates to above the second air outlet hole 202; when the outer slot 103 is located directly above the second air outlet hole 202, the second air outlet hole 202 sends air flow into the outer slot 103, so that the air flow in the outer slot 103 is increased, and the tray base 100 is further accelerated to rotate, so that the tray base 100 reaches a proper rotation speed, when the outer slot 103 is not located directly above the second air outlet hole 202, the second air outlet hole 202 sends air flow into a clearance space between the tray base 100 and the air flow guiding base 200, and after the air flow is diffused outwards, part of the air flow also flows into the outer slot 103, so that the air flow in the outer slot 103 is increased.
In some preferred embodiments, the second air outlet 202 is disposed obliquely, and the included angle between the axis and the vertical is 42-52 °, so that the air flow sent out by the second air outlet 202 has a certain flow velocity in the horizontal direction, which is beneficial for the air flow flowing in the outer slot 103 to drive the tray base 100 to rotate.
In some preferred embodiments, the airflow guiding-out base 200 is provided with an air duct 204 for connecting to the external airflow supplying assembly 500 and delivering the airflow fed from the airflow supplying assembly 500 into the first air outlet 201 and the second air outlet 202.
In some preferred embodiments, the outer slot 103 has an extended end away from the edge of the tray base 100, and the second air outlet aperture 202 is configured to feed air flow toward the extended end.
Specifically, in order to avoid that the air flow from the second air outlet hole 202 flows into the inner slot 102 to affect the release of the air flow due to the reverse flow generated after the air flow from the second air outlet hole 202 is sent into the outer slot 103, the outer slot 103 is provided with an extending end far from the edge of the tray base 100, so that the air flow sent from the second air outlet hole 202 flows along the extending direction of the outer slot 103 from the extending end, thereby avoiding the reverse flow of the air flow.
In some preferred embodiments, the aperture of the first outlet aperture 201 is 1.2-1.5 times the aperture of the second outlet aperture 202.
Specifically, as shown in fig. 4, when the number of the first air outlet holes 201 and the second air outlet holes 202 is 2, the number of the air guide pipelines 204 is 2, and each air guide pipeline 204 supplies air for one corresponding first air outlet hole 201 and one corresponding second air outlet hole 202, so that the flow rate of the air flow sent out by the first air outlet holes 201 and the second air outlet holes 202 depends on the caliber of the air flow, therefore, the flow rate of the air flow sent out by the second air outlet holes 202 is smaller than the flow rate of the air flow sent out by the first air outlet holes 201, the flow rate of the air flow sent out by the first air outlet holes 201 is larger, the air flow in the inner groove 102 can be ensured to smoothly float the tray base 100, and the air flow sent out by the second air outlet holes 202 is mainly used for supplementing the outer groove 103 to increase the air flow rate in the outer groove 103.
In the embodiment of the present application, the caliber of the first air outlet hole 201 is 1.3 times that of the second air outlet hole 202.
In some preferred embodiments, the width of the air inlet 101 is 1-1.2 times the caliber of the first air outlet 201, so that air flow can be smoothly sent into the air inlet 101 from the first air outlet 201.
In a third aspect, as shown in fig. 1-5, embodiments of the present application provide a reaction chamber mechanism of an epitaxial apparatus for performing epitaxial growth, the reaction chamber mechanism comprising:
a reaction chamber 300 for placing a tray to epitaxially grow a substrate on the tray;
the heating assembly 400 is arranged outside the reaction chamber 300 and is used for heating the reaction chamber 300 to provide the temperature required by epitaxial growth;
the air flow driving device is arranged in the reaction cavity 300 and is used for supporting the tray and driving the tray to float and rotate so as to perform epitaxial growth;
an air flow supply assembly 500 for supplying air flow required for driving the tray to float and rotate to the air flow driving device;
the airflow driving device includes:
a tray base 100 for supporting a tray;
an air flow guiding base 200, which is connected with the tray base 100 through a rotating shaft 203 in a clearance way, and is used for feeding air flow towards the tray base 100 to drive the tray base 100 to float and rotate;
tray base 100 is discoid, and tray base 100 bottom is equipped with a plurality of circumference array's air current groove, and tray base 100 bottom still is equipped with an air inlet groove 101, and a plurality of air current grooves are through an air inlet groove 101 intercommunication, and the air current groove includes:
an inner tank 102 communicating with the air intake tank 101;
an outer groove 103 communicating with the inner groove 102 and the edge of the tray base 100;
the depth of the inner groove 102 is smaller than that of the outer groove 103, so that the air flow guided by the air inlet groove 101 enters the inner groove 102 to increase dynamic pressure so as to lift the tray base 100, and then enters the outer groove 103 to be released outwards so as to drive the tray base 100 to rotate.
The reaction chamber mechanism of the epitaxial device in this embodiment is used for performing epitaxial growth, and after the reaction chamber 300 of the reaction chamber mechanism is heated to the high temperature of the epitaxial growth requirement based on the heating component 400, the reaction gas is continuously introduced by the external gas supply component, so that the tray with the substrate on the tray base 100 can perform epitaxial growth.
According to the reaction chamber mechanism of the epitaxial device, the airflow groove on the tray base 100 is arranged to be two parts of the inner groove 102 and the outer groove 103, the groove depth of the inner groove 102 is smaller than that of the outer groove 103, so that larger dynamic pressure is generated when airflow fed in by the airflow guiding-out base 200 is guided into the inner groove 102 from the air inlet groove 101 to float the tray base 100, namely, the bottom surface of the tray base 100 is separated from the top surface of the airflow guiding-out base 200, and then the airflow reenters the outer groove 103 to be outwards released to drive the tray base 100 to rotate, so that a starting mode of the tray base 100 which floats firstly and then rotates is realized, damage caused by friction between the tray base 100 and the airflow guiding-out base 200 when the tray base 100 does not float completely is prevented, and stable starting and no clamping stagnation of the tray base 100 are ensured.
In summary, the embodiment of the application provides a reaction chamber mechanism of a tray base, an airflow driving device and an epitaxy device, wherein, the tray base 100 is provided with an airflow groove as an inner groove 102 and an outer groove 103, and the groove depth of the inner groove 102 is smaller than that of the outer groove 103, so that when the introduced airflow is led into the inner groove 102 from the air inlet groove 101, larger dynamic pressure is generated to float the tray base 100, and then the airflow is led into the outer groove 103 to be outwards released to drive the tray base 100 to rotate, thereby realizing a starting mode of firstly floating and then rotating the tray base 100, preventing the tray base 100 from rotating when not completely floating and rubbing with the airflow leading-out base 200 to cause damage, and ensuring that the tray base 100 is started stably and has no clamping stagnation.
In the description of the present specification, reference to the terms "one embodiment," "certain embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiments or examples. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
What has been described above is merely some embodiments of the present invention. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit of the invention.

Claims (9)

1. The utility model provides a tray base for bearing tray and be applied to epitaxial growth, tray base (100) are discoid, tray base (100) bottom is equipped with the air current groove of a plurality of circumference arrays, its characterized in that, tray base (100) bottom still is equipped with an air inlet tank (101), and is a plurality of the air current groove is through one air inlet tank (101) intercommunication, the air current groove includes:
an inner tank (102) which communicates with the air intake tank (101);
an outer groove (103) communicating with the inner groove (102) and the tray base (100) edge;
the depth of the inner groove (102) is smaller than that of the outer groove (103) so that the air flow guided by the air inlet groove (101) enters the inner groove (102) to increase dynamic pressure to lift the tray base (100), and then enters the outer groove (103) to be released outwards to drive the tray base (100) to rotate;
the included angle between the radial line of the central line of the outer groove (103) on the tray base (100) and the central line of the outer groove (103) and the central line of the edge of the tray base (100) is 36-40 degrees, and the included angle between the central line of the outer groove (103) and the central line of the inner groove (102) is 148-154 degrees.
2. A pallet base according to claim 1, wherein the number of air flow grooves is 3-10.
3. A pallet base according to claim 1, characterized in that the groove width of the inner groove (102) is increased towards the edge of the pallet base (100), and that the angle between the planes of the two side walls of the inner groove (102) is 18-20 °.
4. A pallet base according to claim 1, characterized in that the groove width of the outer groove (103) is increased towards the edge of the pallet base (100), and the angle between the planes of the two side walls of the outer groove (103) is 5-8 °.
5. A pallet base according to claim 1, characterized in that the depth of the outer groove (103) is smaller towards the edge of the pallet base (100), the groove bottom of the outer groove (103) having an angle of 0.7-0.8 ° to the horizontal.
6. An air flow driving apparatus for holding a tray and applying to epitaxial growth, the air flow driving apparatus comprising:
a tray base (100) for supporting the tray;
an air flow guiding base (200) which is connected with the tray base (100) in a clearance way through a rotating shaft (203) and is used for sending air flow towards the tray base (100) so as to drive the tray base (100) to float and rotate;
the tray base (100) is discoid, tray base (100) bottom is equipped with a plurality of circumference array's air current groove, its characterized in that, tray base (100) bottom still is equipped with one air inlet tank (101), and is a plurality of air current groove is through one air inlet tank (101) intercommunication, the air current groove includes:
an inner tank (102) which communicates with the air intake tank (101);
an outer groove (103) communicating with the inner groove (102) and the tray base (100) edge;
the depth of the inner groove (102) is smaller than that of the outer groove (103) so that the air flow guided by the air inlet groove (101) enters the inner groove (102) to increase dynamic pressure to lift the tray base (100), and then enters the outer groove (103) to be released outwards to drive the tray base (100) to rotate;
the included angle between the radial line of the central line of the outer groove (103) on the tray base (100) and the central line of the outer groove (103) and the central line of the edge of the tray base (100) is 36-40 degrees, and the included angle between the central line of the outer groove (103) and the central line of the inner groove (102) is 148-154 degrees.
7. An air flow driving device according to claim 6, characterized in that the air flow guiding-out base (200) is provided with a plurality of first air outlet holes (201) and a plurality of second air outlet holes (202), the first air outlet holes (201) are used for feeding air flow into the air inlet groove (101), and the second air outlet holes (202) are used for feeding air flow into the outer groove (103) to accelerate the rotation speed of the tray base (100).
8. An air flow driving device according to claim 7, characterized in that the aperture of the first air outlet hole (201) is 1.2-1.5 times the aperture of the second air outlet hole (202).
9. A reaction chamber mechanism of an epitaxial apparatus for performing epitaxial growth, the reaction chamber mechanism comprising:
a reaction chamber (300) for placing a tray to epitaxially grow a substrate on the tray;
the heating component (400) is arranged outside the reaction cavity (300) and is used for heating the reaction cavity (300) to provide the temperature required by epitaxial growth;
the air flow driving device is arranged in the reaction cavity (300) and used for supporting the tray and being applied to epitaxial growth;
an air flow supply assembly (500) for supplying the air flow required for driving the tray to float and rotate to the air flow driving device;
the airflow driving device includes:
a tray base (100) for supporting the tray;
an air flow guiding base (200) which is connected with the tray base (100) in a clearance way through a rotating shaft (203) and is used for sending air flow towards the tray base (100) so as to drive the tray base (100) to float and rotate;
the tray base (100) is discoid, tray base (100) bottom is equipped with a plurality of circumference array's air current groove, its characterized in that, tray base (100) bottom still is equipped with one air inlet tank (101), and is a plurality of air current groove is through one air inlet tank (101) intercommunication, the air current groove includes:
an inner tank (102) which communicates with the air intake tank (101);
an outer groove (103) communicating with the inner groove (102) and the tray base (100) edge;
the depth of the inner groove (102) is smaller than that of the outer groove (103) so that the air flow guided by the air inlet groove (101) enters the inner groove (102) to increase dynamic pressure to lift the tray base (100), and then enters the outer groove (103) to be released outwards to drive the tray base (100) to rotate;
the included angle between the radial line of the central line of the outer groove (103) on the tray base (100) and the central line of the outer groove (103) and the central line of the edge of the tray base (100) is 36-40 degrees, and the included angle between the central line of the outer groove (103) and the central line of the inner groove (102) is 148-154 degrees.
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