CN113894082A - Wafer cleaning machine with recovery structure - Google Patents
Wafer cleaning machine with recovery structure Download PDFInfo
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- CN113894082A CN113894082A CN202111038268.0A CN202111038268A CN113894082A CN 113894082 A CN113894082 A CN 113894082A CN 202111038268 A CN202111038268 A CN 202111038268A CN 113894082 A CN113894082 A CN 113894082A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention belongs to the field of wafer cleaning, and particularly relates to a wafer cleaning machine with a recovery structure, which comprises a machine shell, a cleaning mechanism, a liquid recovery mechanism and a grabbing mechanism, wherein the liquid recovery mechanism is arranged above the machine shell, the cleaning mechanism is arranged above the liquid recovery mechanism, and the grabbing mechanism is arranged above the cleaning mechanism; the casing includes support column, connecting plate, bottom support, lower box, door, handle, backup pad, epitheca, the support column top is provided with the connecting plate, support column one side is provided with the bottom support, bottom support top is provided with lower box, lower box front portion is provided with the door one side is provided with the handle utilizes wiper mechanism to wash the crystal, utilizes liquid recovery mechanism to retrieve the waste liquid and recycles, utilizes to snatch the mechanism and snatch the crystal and avoids secondary pollution, reduces the use of cleaner, reduce cost, raise the efficiency.
Description
Technical Field
The invention belongs to the field of wafer cleaning, and particularly relates to a wafer cleaning machine with a recovery structure.
Background
Silicon wafers, also known as wafers, are processed from silicon ingots, on which millions of transistors can be etched by a special process, and are widely used in the manufacture of integrated circuits, and elemental silicon is a gray, fragile, tetravalent, nonmetallic chemical element. The earth crust composition is composed of 27.8% elemental silicon, second only to the oxygen content, which is a relatively rich element in nature. The silicon element is found in quartz, agate, flint and ordinary beach stones. Silicon wafers, also called wafers, are processed from silicon ingots, millions of transistors can be etched on the silicon wafers through a special process, and the silicon wafers are widely applied to the manufacture of integrated circuits.
Disclosure of Invention
The invention aims to provide a wafer cleaning machine with a recovery structure.
The technical scheme adopted by the invention is as follows:
a wafer cleaning machine with a recovery structure comprises a machine shell, a cleaning mechanism, a liquid recovery mechanism and a grabbing mechanism, wherein the liquid recovery mechanism is arranged above the machine shell, the cleaning mechanism is arranged above the liquid recovery mechanism, and the grabbing mechanism is arranged above the cleaning mechanism; the machine shell comprises a support column, a connecting plate, a bottom support, a lower box body, a bin door, a handle, a support plate and an upper shell, wherein the connecting plate is arranged above the support column, the bottom support is arranged on one side of the support column, the lower box body is arranged above the bottom support, the bin door is arranged on the front portion of the lower box body, the handle is arranged on one side of the bin door, the support plate is arranged above the lower box body, and the upper shell is arranged above the support plate; the cleaning mechanism comprises a heat dissipation frame, a driving motor, a gearbox, a rotating disc, a positioning block, a liquid anti-splash disc, a collection bin, a collection hose, a placement disc, a stepping motor, a rotary column, a connector, a supporting arm and a sprayer, wherein the heat dissipation frame is arranged above the bottom support, the driving motor is arranged above the heat dissipation frame, the gearbox is arranged above the driving motor, the rotating disc is arranged above the gearbox, the positioning block is arranged above the rotating disc, the liquid anti-splash disc is arranged outside the rotating disc, the collection bin is arranged below the liquid anti-splash disc, the collection hose is arranged below the collection bin, the placement disc is arranged on one side of the liquid anti-splash disc, the rotary column is arranged on the front portion of the liquid anti-splash disc, the stepping motor is arranged below the rotary column, the connector is arranged above the rotary column, the supporting arm is arranged at the rear part of the connector, and the spray head is arranged below the supporting arm; the liquid recovery mechanism comprises a filter box, a filter screen, a drain valve, a first pump body, a first extraction pipeline, a closed distillation bin, a condensation pipe, a pure liquid storage box, a second pump body, a second extraction pipeline and a heating wire, the filter box is arranged above the bottom bracket, the first pump body and the filter screen are arranged in the filter box, the drain valve is arranged on one side of the filter tank, the first pumping pipeline is arranged above the first pump body, the closed distillation bin is arranged on one side of the first extraction pipeline, the heating wires are arranged in the closed distillation bin, the condensing pipe is arranged on one side of the closed distillation bin, the pure liquid storage box is arranged below the condensing pipe, the inside second pump body that is provided with of pure liquid hutch, second pump body top is provided with the second extraction pipeline.
Preferably: snatch the mechanism and include first servo motor, first ball screw, first optical axis, base, air push rod, snatch the head, it is provided with to be located the top inside the epitheca, first ball screw one side is provided with first servo motor, first ball screw rear portion is provided with first optical axis, first optical axis with first ball screw outside is provided with the base, the base below is provided with air push rod, air push rod below is provided with snatch the head.
So set up, first servo motor drives first ball screw is rotatory.
Preferably: snatch the mechanism and include first servo motor, first ball screw, first optical axis, base, snatch the head, remove seat, second servo motor, second ball screw, second optical axis, the epitheca is inside and be located the top and be provided with first ball screw, first ball screw one side is provided with first servo motor, first ball screw rear portion is provided with first optical axis, first optical axis with first ball screw outside is provided with the base, base one side is provided with second ball screw, second ball screw rear portion is provided with the second optical axis, second ball screw below is provided with second servo motor, second ball screw with second optical axis outside is provided with remove the seat, it is provided with to remove the seat below snatch the head.
According to the arrangement, the first ball screw is driven to rotate by the first servo motor, and the second ball screw is driven to rotate by the second servo motor.
Preferably: the support column with connecting plate welded connection, the bottom support with the connecting plate with bottom support welded connection, the door with lower box hinge connection, the handle with door welded connection, the backup pad with lower box with epitheca welded connection.
So set up, the assembly and disassembly of being convenient for.
Preferably: the heat dissipation frame is connected with the bottom support and the driving motor through bolts, the driving motor and the rotating disc are connected with the gear box in a meshed mode, the positioning block is connected with the rotating disc in a welded mode, the liquid anti-splash disc, the collection bin and the placement disc are connected with the supporting plate in a welded mode, the collection hose is connected with the collection bin through threads, the stepping motor is connected with the supporting plate through bolts, the rotating column is connected with the stepping motor coupler, the connector is connected with the rotating column in a welded mode, the supporting arm is connected with the connector in a welded mode, and the connector is connected with the second extraction pipeline bearing; the spray head is in threaded connection with the supporting arm.
So set up, driving motor drives the rotary disk rotation.
Preferably: a circular hole is formed between the supporting plate and the collecting bin.
So set up, be convenient for liquid stream to collect the storehouse.
Preferably: the rose box with bottom scaffold weldment connection, the filter screen with rose box bolted connection, the bleeder valve with rose box threaded connection, the first pump body with first extraction pipeline threaded connection, first extraction pipeline with airtight distillation storehouse welded connection, the heater strip with airtight distillation storehouse screwed connection, airtight distillation storehouse with condenser pipe welded connection, pure liquid hutch with airtight distillation storehouse all with connecting plate welded connection, the second pump body with second extraction pipeline threaded connection.
So set up, the heating wire purifies the liquid by distillation.
Preferably: the first pump body is placed in the filter box, the second pump body is placed in the pure liquid storage box, and the condensation pipe is a copper pipe.
So set up, easily vapor condensation.
Preferably: the first servo motor is connected with the upper shell through bolts, the first ball screw is connected with the first servo motor coupler, the first ball screw is connected with the upper shell through bearings, the first optical axis is connected with the upper shell in a welded mode, the base is connected with the first ball screw in a threaded mode, the base is connected with the first optical axis in a sliding mode, the air push rod is connected with the base through bolts, and the grabbing head is connected with the air push rod in a threaded mode.
So set up, be convenient for first servo motor installation is dismantled.
Preferably: first ball screw with first servo motor coupling joint, first ball screw with the epitheca bearing is connected, first optical axis with epitheca welded connection, the base with first ball screw threaded connection, the base with first optical axis sliding connection, the second ball screw with base bearing connects, the second ball screw with second servo motor coupling joint, the second servo motor with base bolted connection, the second optical axis with base welded connection, remove the seat with second optical axis sliding connection, snatch the head with remove a threaded connection.
So set up, be convenient for first servo motor with the installation of second servo motor is dismantled.
The invention has the beneficial effects that: utilize wiper mechanism to wash the crystal, utilize liquid recovery mechanism to retrieve the waste liquid and recycle, utilize to snatch the mechanism and snatch the crystal and avoid secondary pollution, reduce the use of cleaner, reduce cost raises the efficiency.
Drawings
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention and not to limit the invention. In the drawings:
FIG. 1 is a schematic structural diagram of a wafer cleaning machine with a recycling structure according to embodiment 1 of the present invention;
FIG. 2 is a schematic perspective view of an embodiment 1 of a wafer cleaning machine with a recycling structure according to the present invention;
FIG. 3 is a top view of a wafer cleaning machine with a reclamation structure according to the present invention;
FIG. 4 is a partial cross-sectional view of a wafer cleaning machine according to embodiment 1 of the present invention having a recycling structure;
FIG. 5 is a schematic diagram of a rotating disk and a positioning block of a wafer cleaning machine with a recycling structure according to the present invention;
FIG. 6 is a schematic view of a connection head of a wafer cleaning machine with a recycling structure according to the present invention;
FIG. 7 is a schematic view of a heating wire of a wafer cleaning machine with a recycling structure according to the present invention;
FIG. 8 is a partial schematic view of an embodiment 2 of a wafer cleaning machine with a recycling structure according to the present invention.
The reference numerals are explained below:
1. a housing; 2. a cleaning mechanism; 3. a liquid recovery mechanism; 4. a grabbing mechanism; 101. a support pillar; 102. a connecting plate; 103. a bottom bracket; 104. a lower box body; 105. a bin gate; 106. a handle; 107. a support plate; 108. an upper shell; 201. a heat dissipation frame; 202. a drive motor; 203. a gearbox; 204. rotating the disc; 205. positioning blocks; 206. a liquid splash guard; 207. a collection bin; 208. a collection hose; 209. placing a tray; 210. a stepping motor; 211. a spin column; 212. a connector; 213. a support arm; 214. a spray head; 301. a filter box; 302. a filter screen; 303. a drain valve; 304. a first pump body; 305. a first extraction conduit; 306. sealing the distillation bin; 307. a condenser tube; 308. a pure liquid storage tank; 309. a second pump body; 310. a second extraction conduit; 311. heating wires; 401. a first servo motor; 402. a first ball screw; 403. a first optical axis; 404. a base; 405. an air push rod; 406. a gripper head; 407. a movable seat; 408. a second servo motor; 409. a second ball screw; 410. a second optical axis.
Detailed Description
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on those shown in the drawings, and are used only for convenience in describing the present invention and for simplicity in description, and do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and thus, are not to be construed as limiting the present invention.
The invention is further illustrated by the following examples in conjunction with the accompanying drawings.
Example 1
As shown in fig. 1-7, a wafer cleaning machine with a recycling structure comprises a casing 1, a cleaning mechanism 2, a liquid recycling mechanism 3, and a grabbing mechanism 4, wherein the liquid recycling mechanism 3 is arranged above the casing 1, the cleaning mechanism 2 is arranged above the liquid recycling mechanism 3, and the grabbing mechanism 4 is arranged above the cleaning mechanism 2; the machine shell 1 comprises a support column 101, a connecting plate 102, a bottom support 103, a lower box body 104, a bin door 105, a handle 106, a support plate 107 and an upper shell 108, wherein the connecting plate 102 is arranged above the support column 101, the bottom support 103 is arranged on one side of the support column 101, the lower box body 104 is arranged above the bottom support 103, the bin door 105 is arranged at the front part of the lower box body 104, the handle 106 is arranged on one side of the bin door 105, the support plate 107 is arranged above the lower box body 104, and the upper shell 108 is arranged above the support plate 107; the cleaning mechanism 2 comprises a heat dissipation frame 201, a driving motor 202, a gearbox 203, a rotating disc 204, a positioning block 205, a liquid anti-splash disc 206, a collection bin 207, a collection hose 208, a placement disc 209, a stepping motor 210, a rotating column 211, a connector 212, a support arm 213 and a spray head 214, wherein the heat dissipation frame 201 is arranged above a bottom support 103, the driving motor 202 is arranged above the heat dissipation frame 201, the gearbox 203 is arranged above the driving motor 202, the rotating disc 204 is arranged above the gearbox 203, the positioning block 205 is arranged above the rotating disc 204, the liquid anti-splash disc 206 is arranged outside the rotating disc 204, the collection bin 207 is arranged below the liquid anti-splash disc 206, the collection hose 208 is arranged below the collection bin 207, the placement disc 209 is arranged on one side of the liquid anti-splash disc 206, the rotating column 211 is arranged in front of the liquid anti-splash disc 206, the stepping motor 210 is arranged below the rotating column 211, the connector 212 is arranged above the rotating column 211, a supporting arm 213 is arranged at the rear part of the connector 212, and a spray head 214 is arranged below the supporting arm 213; the liquid recovery mechanism 3 comprises a filter tank 301, a filter screen 302, a drain valve 303, a first pump body 304, a first extraction pipeline 305, a closed distillation bin 306, a condensation pipe 307, a pure liquid storage tank 308, a second pump body 309, a second extraction pipeline 310 and a heating wire 311, wherein the filter tank 301 is arranged above the bottom support 103, the first pump body 304 and the filter screen 302 are arranged inside the filter tank 301, the drain valve 303 is arranged on one side of the filter tank 301, the first extraction pipeline 305 is arranged above the first pump body 304, the closed distillation bin 306 is arranged on one side of the first extraction pipeline 305, the heating wire 311 is arranged inside the closed distillation bin 306, the condensation pipe 307 is arranged on one side of the closed distillation bin 306, the pure liquid storage tank 308 is arranged below the condensation pipe 307, the second pump body 309 is arranged inside the pure liquid storage tank 308, the second extraction pipeline 310 is arranged above the second pump body 309, and the grabbing mechanism 4 comprises a first servo motor 401, The pneumatic gripper comprises a first ball screw 402, a first optical axis 403, a base 404, an air push rod 405 and a grabbing head 406, wherein the first ball screw 402 is arranged inside and above the upper shell 108, a first servo motor 401 is arranged on one side of the first ball screw 402, the first optical axis 403 is arranged at the rear part of the first ball screw 402, the base 404 is arranged outside the first optical axis 403 and the first ball screw 402, the air push rod 405 is arranged below the base 404, and the grabbing head 406 is arranged below the air push rod 405.
Preferably: the supporting column 101 is connected with the connecting plate 102 in a welding mode, the bottom support 103 is connected with the connecting plate 102 and the bottom support 103 in a welding mode, the bin door 105 is connected with the lower box body 104 in a hinge mode, the handle 106 is connected with the bin door 105 in a welding mode, and the supporting plate 107 is connected with the lower box body 104 and the upper shell 108 in a welding mode; the heat dissipation frame 201 is in bolted connection with the bottom support 103 and the driving motor 202, the driving motor 202 and the rotating disc 204 are in tooth meshing connection with the gearbox 203, the positioning block 205 is in welded connection with the rotating disc 204, the liquid anti-splash disc 206, the collection bin 207 and the placing disc 209 are in welded connection with the support plate 107, the collection hose 208 is in threaded connection with the collection bin 207, the stepping motor 210 is in bolted connection with the support plate 107, the rotating column 211 is in coupling connection with the stepping motor 210, the connector 212 is in welded connection with the rotating column 211, the support arm 213 is in welded connection with the connector 212, the connector 212 is in bearing connection with the second extraction pipeline 310, and the spray head 214 is in threaded connection with the support arm 213; a circular hole is arranged between the supporting plate 107 and the collecting bin 207; the filter tank 301 is connected with the bottom bracket 103 in a welding manner, the filter screen 302 is connected with the filter tank 301 through a bolt, the drain valve 303 is connected with the filter tank 301 through a thread, the first pump body 304 is connected with the first extraction pipeline 305 through a thread, the first extraction pipeline 305 is connected with the closed distillation bin 306 through a welding manner, the heating wire 311 is connected with the closed distillation bin 306 through a bolt, the closed distillation bin 306 is connected with the condensation pipe 307 through a welding manner, the pure liquid storage box 308 and the closed distillation bin 306 are both connected with the connecting plate 102 through a welding manner, and the second pump body 309 is connected with the second extraction pipeline 310 through a thread; the first pump body 304 is arranged in the filter tank 301, the second pump body 309 is arranged in the pure liquid storage tank 308, and the condensation pipe 307 is a copper pipe; the first servo motor 401 is connected with the upper shell 108 through bolts, the first ball screw 402 is connected with a coupling of the first servo motor 401, the first ball screw 402 is connected with the upper shell 108 through a bearing, the first optical axis 403 is connected with the upper shell 108 in a welding mode, the base 404 is in threaded connection with the first ball screw 402, the base 404 is in sliding connection with the first optical axis 403, the air push rod 405 is connected with the base 404 through bolts, and the grabbing head 406 is in threaded connection with the air push rod 405.
Example 2
As shown in fig. 5 to 8, the present embodiment is different from embodiment 1 in that: the grabbing mechanism 4 comprises a first servo motor 401, a first ball screw 402, a first optical axis 403, a base 404, a grabbing head 406, a moving seat 407, a second servo motor 408, a second ball screw 409 and a second optical axis 410, wherein the first ball screw 402 is arranged in the upper shell 108 and above the upper shell, the first servo motor 401 is arranged on one side of the first ball screw 402, the first optical axis 403 is arranged at the rear part of the first ball screw 402, the base 404 is arranged outside the first optical axis 403 and the first ball screw 402, the second ball screw 409 is arranged on one side of the base 404, the second optical axis 410 is arranged on the rear part of the second ball screw 409, the second servo motor 408 is arranged below the second ball screw 409, the moving seat 407 is arranged outside the second ball screw 409 and the second optical axis 410, and the grabbing head 406 is arranged below the moving seat 407; the first ball screw 402 is connected with a coupling of the first servo motor 401, the first ball screw 402 is connected with the upper shell 108 through a bearing, the first optical axis 403 is connected with the upper shell 108 in a welding mode, the base 404 is connected with the first ball screw 402 through a thread, the base 404 is connected with the first optical axis 403 in a sliding mode, the second ball screw 409 is connected with the base 404 through a bearing, the second ball screw 409 is connected with a coupling of the second servo motor 408, the second servo motor 408 is connected with the base 404 through a bolt, the second optical axis 410 is connected with the base 404 in a welding mode, the movable base 407 is connected with the second ball screw 409 through a thread, the movable base 407 is connected with the second optical axis 410 in a sliding mode, and the grabbing head 406 is connected with the movable base 407 through a thread.
The working principle is as follows: the wafer is placed on a rotating disc 204 to start a driving motor 202, a spray head 214 is started to rotationally clean parts, cleaning agents used in the process flow into a filter box 301 through a collection bin 207 and a collection hose 208, primary filtration is carried out through a filter screen 302, the cleaning agents are pumped into a closed distillation bin 306 through a first pump body 304, heating distillation is carried out through a heating wire 311, condensation is carried out through a condensation pipe 307, liquid flows into a pure liquid storage box 308, the cleaning agents are pumped into the spray head 214 through a second pump body 309 for recycling, after cleaning is finished, a first servo motor 401 and an air push rod 405 are started to enable a grabbing head 406 to grab the wafer to a placing disc 209, or the first servo motor 401 and the second servo motor 408 are started to drive a moving seat 407 to enable the grabbing head 406 to grab the wafer to the placing disc 209.
While the preferred embodiments of the present invention have been described in detail with reference to the accompanying drawings, the present invention is not limited to the above embodiments, and various changes can be made within the knowledge of those skilled in the art without departing from the spirit of the present invention.
Claims (10)
1. The utility model provides a wafer cleaning machine with retrieve structure which characterized in that: the cleaning machine comprises a machine shell (1), a cleaning mechanism (2), a liquid recovery mechanism (3) and a grabbing mechanism (4), wherein the liquid recovery mechanism (3) is arranged above the machine shell (1), the cleaning mechanism (2) is arranged above the liquid recovery mechanism (3), and the grabbing mechanism (4) is arranged above the cleaning mechanism (2);
the machine shell (1) comprises a supporting column (101), a connecting plate (102), a bottom support (103), a lower box body (104), a bin door (105), a handle (106), a supporting plate (107) and an upper shell (108), wherein the connecting plate (102) is arranged above the supporting column (101), the bottom support (103) is arranged on one side of the supporting column (101), the lower box body (104) is arranged above the bottom support (103), the bin door (105) is arranged at the front part of the lower box body (104), the handle (106) is arranged on one side of the bin door (105), the supporting plate (107) is arranged above the lower box body (104), and the upper shell (108) is arranged above the supporting plate (107);
the cleaning mechanism (2) comprises a heat dissipation frame (201), a driving motor (202), a gearbox (203), a rotating disc (204), a positioning block (205), a liquid anti-splash disc (206), a collection bin (207), a collection hose (208), a placement disc (209), a stepping motor (210), a rotating column (211), a connector (212), a support arm (213) and a spray head (214), wherein the heat dissipation frame (201) is arranged above the bottom support (103), the driving motor (202) is arranged above the heat dissipation frame (201), the gearbox (203) is arranged above the driving motor (202), the rotating disc (204) is arranged above the gearbox (203), the positioning block (205) is arranged above the rotating disc (204), the liquid anti-splash disc (206) is arranged outside the rotating disc (204), the collection bin (207) is arranged below the liquid anti-splash disc (206), the collecting hose (208) is arranged below the collecting bin (207), the placing disc (209) is arranged on one side of the liquid anti-splash disc (206), the rotary column (211) is arranged at the front part of the liquid anti-splash disc (206), the stepping motor (210) is arranged below the rotary column (211), the connecting head (212) is arranged above the rotary column (211), the supporting arm (213) is arranged at the rear part of the connecting head (212), and the spray head (214) is arranged below the supporting arm (213);
the liquid recovery mechanism (3) comprises a filter box (301), a filter screen (302), a drainage valve (303), a first pump body (304), a first extraction pipeline (305), a closed distillation bin (306), a condensation pipe (307), a pure liquid storage box (308), a second pump body (309), a second extraction pipeline (310) and a heating wire (311), wherein the filter box (301) is arranged above the bottom bracket (103), the first pump body (304) and the filter screen (302) are arranged inside the filter box (301), the drainage valve (303) is arranged on one side of the filter box (301), the first extraction pipeline (305) is arranged above the first pump body (304), the closed distillation bin (306) is arranged on one side of the first extraction pipeline (305), the heating wire (311) is arranged inside the closed distillation bin (306), airtight distillation storehouse (306) one side is provided with condenser pipe (307), condenser pipe (307) below is provided with pure liquid hutch (308), pure liquid hutch (308) inside is provided with second pump body (309), second pump body (309) top is provided with second extraction pipeline (310).
2. The wafer cleaning machine with recycling structure as set forth in claim 1, wherein: the grabbing mechanism (4) comprises a first servo motor (401), a first ball screw (402), a first optical axis (403), a base (404), an air push rod (405) and a grabbing head (406), the upper shell (108) is arranged inside and above the first ball screw (402), the first servo motor (401) is arranged on one side of the first ball screw (402), the first optical axis (403) is arranged on the rear portion of the first ball screw (402), the first optical axis (403) and the first ball screw (402) are arranged outside the base (404), the air push rod (405) is arranged below the base (404), and the grabbing head (406) is arranged below the air push rod (405).
3. The wafer cleaning machine with recycling structure as set forth in claim 1, wherein: the grabbing mechanism (4) comprises a first servo motor (401), a first ball screw (402), a first optical axis (403), a base (404), a grabbing head (406), a moving seat (407), a second servo motor (408), a second ball screw (409) and a second optical axis (410), the first ball screw (402) is arranged in the upper shell (108) and above the upper shell, the first servo motor (401) is arranged on one side of the first ball screw (402), the first optical axis (403) is arranged on the rear portion of the first ball screw (402), the base (404) is arranged on the outer portions of the first optical axis (403) and the first ball screw (402), the second ball screw (409) is arranged on one side of the base (404), the second optical axis (410) is arranged on the rear portion of the second ball screw (409), and the second servo motor (408) is arranged below the second ball screw (409), the moving seat (407) is arranged outside the second ball screw (409) and the second optical axis (410), and the grabbing head (406) is arranged below the moving seat (407).
4. The wafer cleaning machine with recycling structure as set forth in claim 1, wherein: the support column (101) is connected with the connecting plate (102) in a welded mode, the bottom support (103) is connected with the connecting plate (102) and the bottom support (103) in a welded mode, the bin door (105) is connected with the lower box body (104) in a hinge mode, the handle (106) is connected with the bin door (105) in a welded mode, and the support plate (107) is connected with the lower box body (104) and the upper shell (108) in a welded mode.
5. The wafer cleaning machine with recycling structure as set forth in claim 1, wherein: heat dissipation frame (201) with bottom support (103) with driving motor (202) bolted connection, driving motor (202) with rotary disk (204) all with gearbox (203) tooth engagement is connected, locating piece (205) with rotary disk (204) welded connection, liquid splash proof dish (206) collect storehouse (207) place dish (209) all with backup pad (107) welded connection, collect hose (208) with collect storehouse (207) threaded connection, step motor (210) with backup pad (107) bolted connection, column spinner (211) with step motor (210) coupling joint, connector (212) with column spinner (211) welded connection, support arm (213) with support arm (212) welded connection, connector (212) with second extraction pipeline (310) bearing connection, the spray head (214) is in threaded connection with the support arm (213).
6. The wafer cleaning machine with recycling structure as set forth in claim 1, wherein: a circular hole is formed between the supporting plate (107) and the collecting bin (207).
7. The wafer cleaning machine with recycling structure as set forth in claim 1, wherein: rose box (301) with bottom support (103) welded connection, filter screen (302) with rose box (301) bolted connection, bleeder valve (303) with rose box (301) threaded connection, first pump body (304) with first extraction pipeline (305) threaded connection, first extraction pipeline (305) with airtight distillation storehouse (306) welded connection, heater wire (311) with airtight distillation storehouse (306) screwed connection, airtight distillation storehouse (306) with condenser pipe (307) welded connection, pure liquid hutch (308) with airtight distillation storehouse (306) all with connecting plate (102) welded connection, second pump body (309) with second extraction pipeline (310) threaded connection.
8. The wafer cleaning machine with recycling structure as set forth in claim 7, wherein: the first pump body (304) is arranged in the filter box (301), the second pump body (309) is arranged in the pure liquid storage box (308), and the condensation pipe (307) is a copper pipe.
9. The wafer cleaning machine with recycling structure as set forth in claim 2, wherein: first servo motor (401) with epitheca (108) bolted connection, first ball screw (402) with first servo motor (401) coupling joint, first ball screw (402) with epitheca (108) bearing connection, first optical axis (403) with epitheca (108) welded connection, base (404) with first ball screw (402) threaded connection, base (404) with first optical axis (403) sliding connection, air push rod (405) with base (404) bolted connection, snatch head (406) with air push rod (405) threaded connection.
10. The wafer cleaning machine with recycling structure as set forth in claim 3, wherein: the first ball screw (402) is connected with a coupling of the first servo motor (401), the first ball screw (402) is connected with a bearing of the upper shell (108), the first optical axis (403) is connected with the upper shell (108) in a welding manner, the base (404) is connected with the first ball screw (402) in a threaded manner, the base (404) is connected with the first optical axis (403) in a sliding manner, the second ball screw (409) is connected with a bearing of the base (404), the second ball screw (409) is connected with a coupling of the second servo motor (408), the second servo motor (408) is connected with the base (404) in a bolt manner, the second optical axis (410) is connected with the base (404) in a welding manner, the movable base (407) is connected with the second ball screw (409) in a threaded manner, and the movable base (407) is connected with the second optical axis (410) in a sliding manner, the grabbing head (406) is in threaded connection with the moving seat (407).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111038268.0A CN113894082A (en) | 2021-09-06 | 2021-09-06 | Wafer cleaning machine with recovery structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111038268.0A CN113894082A (en) | 2021-09-06 | 2021-09-06 | Wafer cleaning machine with recovery structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113894082A true CN113894082A (en) | 2022-01-07 |
Family
ID=79188582
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111038268.0A Withdrawn CN113894082A (en) | 2021-09-06 | 2021-09-06 | Wafer cleaning machine with recovery structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113894082A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115582340A (en) * | 2022-08-20 | 2023-01-10 | 浙江艾科半导体设备有限公司 | Silicon chip cleaning machine sprays water firing equipment |
-
2021
- 2021-09-06 CN CN202111038268.0A patent/CN113894082A/en not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115582340A (en) * | 2022-08-20 | 2023-01-10 | 浙江艾科半导体设备有限公司 | Silicon chip cleaning machine sprays water firing equipment |
| CN115582340B (en) * | 2022-08-20 | 2023-08-15 | 浙江艾科半导体设备有限公司 | Water heating equipment is sprayed to silicon chip cleaning machine |
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Application publication date: 20220107 |
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