CN113862769A - Electrolytic polishing method for AlSi10Mg alloy surface and workpiece - Google Patents
Electrolytic polishing method for AlSi10Mg alloy surface and workpiece Download PDFInfo
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- CN113862769A CN113862769A CN202111323410.6A CN202111323410A CN113862769A CN 113862769 A CN113862769 A CN 113862769A CN 202111323410 A CN202111323410 A CN 202111323410A CN 113862769 A CN113862769 A CN 113862769A
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- 238000005498 polishing Methods 0.000 title claims abstract description 76
- 239000000956 alloy Substances 0.000 title claims abstract description 67
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 66
- 229910003407 AlSi10Mg Inorganic materials 0.000 title claims abstract description 47
- 238000000034 method Methods 0.000 title claims abstract description 38
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 10
- 230000008018 melting Effects 0.000 claims abstract description 8
- 238000002844 melting Methods 0.000 claims abstract description 8
- 238000005406 washing Methods 0.000 claims abstract description 8
- 238000007517 polishing process Methods 0.000 claims abstract description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 6
- 238000005516 engineering process Methods 0.000 claims description 6
- 238000005238 degreasing Methods 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910021607 Silver chloride Inorganic materials 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 claims description 3
- 238000003756 stirring Methods 0.000 claims description 3
- 238000000861 blow drying Methods 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 7
- 238000012360 testing method Methods 0.000 description 17
- 238000010586 diagram Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- 239000000843 powder Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012876 topography Methods 0.000 description 2
- 229910018125 Al-Si Inorganic materials 0.000 description 1
- 229910018520 Al—Si Inorganic materials 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 235000019441 ethanol Nutrition 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/18—Polishing of light metals
- C25F3/20—Polishing of light metals of aluminium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/20—Direct sintering or melting
- B22F10/28—Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/60—Treatment of workpieces or articles after build-up
- B22F10/62—Treatment of workpieces or articles after build-up by chemical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y80/00—Products made by additive manufacturing
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/25—Process efficiency
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- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
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- Metallurgy (AREA)
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- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Abstract
The invention discloses an electrolytic polishing method and a workpiece for an AlSi10Mg alloy surface, which comprises the steps of carrying out oil removal pretreatment on the surface of an AlSi10Mg alloy sample; performing electrolytic polishing, wherein the electrolytic polishing solution is a phosphoric acid solution, the electrolytic polishing system is a three-electrode system, the electrolytic polishing temperature is 65-75 ℃, the electrolytic polishing time is 15-20 min, and the electrolytic polishing potential is 0-4V; rapidly washing the polished sample with water; the AlSi10Mg alloy was prepared using a selective laser melting technique. Phosphoric acid is used as an electrolytic polishing solution, the electrolytic polishing potential adopts a small potential, the roughness and the surface appearance of the AlSi10Mg alloy fused by selective laser are greatly improved, and the material loss in the electrolytic polishing process is greatly reduced. The formula is simple, the use is safe, and the method is suitable for processing parts with complex shapes.
Description
Technical Field
The invention relates to the technical field of alloy material surface performance detection, in particular to an electrolytic polishing method for an AlSi10Mg alloy surface and a workpiece.
Background
The selective laser melting is a metal material additive manufacturing technology, mainly uses metal powder as raw material, and adopts CAD model to make pre-layering treatment, and uses high-power laser to melt the metal powder layer by layer, and quickly cools and solidifies. However, the selective laser melting technology has high requirements on materials, and currently, a few metals and alloys are used, such as stainless steel, titanium alloy, aluminum alloy and the like.
The alloy produced by selective laser melting often has a very rough surface, seriously affecting its versatility of use, due to the small ridges formed on the surface of the workpiece by the splattering of the metal powder particles. The electrolytic polishing has the characteristics of simple process, strong operation flexibility, no stress influence and the like, and is widely applied to polishing of various metals and alloys. For AlSi10Mg alloy with Al-Si eutectic structure, the difference of Al/Si electrochemical properties is obvious due to the outstanding silicon content, and electrolytic polishing has certain difficulty due to the higher silicon content. The conventional aluminum alloy polishing method cannot meet the requirements of AlSi10Mg alloy with larger surface roughness and high silicon content, and the electrochemical polishing method has certain difficulty in finishing the surface of the AlSi10Mg alloy.
Disclosure of Invention
The invention aims to solve the technical problem that the existing electrochemical polishing method cannot meet the requirements of surface finishing of AlSi10Mg alloy with large surface roughness and high silicon content, and aims to provide an electrolytic polishing method for the surface of AlSi10Mg alloy and a workpiece so as to solve the problems.
The first purpose of the invention is to provide an electrolytic polishing method for the surface of AlSi10Mg alloy, which is realized by the following technical scheme:
an electropolishing method for an AlSi10Mg alloy surface, comprising:
(1) carrying out oil removal pretreatment on the surface of an AlSi10Mg alloy sample;
(2) performing electrolytic polishing, wherein the electrolytic polishing solution is a phosphoric acid solution, the electrolytic polishing system is a three-electrode system, the electrolytic polishing temperature is 65-75 ℃, the electrolytic polishing time is 15-20 min, and the electrolytic polishing potential is 0-4V;
(3) rapidly washing the polished sample with water;
the AlSi10Mg alloy is prepared by a selective laser melting technology.
Optionally, the oil removal pretreatment is to perform ultrasonic degreasing on the surface of the sample by using ethanol, and then wash and blow-dry the sample;
the water washing temperature is 15-20 ℃, and the blow-drying temperature is 10-15 ℃.
Optionally, the phosphoric acid solution is 85% by mass.
Optionally, the electrolytic polishing solution is stirred during the electrolytic polishing process, and the stirring speed is 20-30 rpm/min.
Optionally, the electropolishing potential is 2-4V.
Optionally, the electrochemical workstation in the electropolishing process is set to a DC potentiostatic mode.
Optionally, the reference electrode in the three-system electrode is Ag/AgCl, the AlSi10Mg alloy is used as an anode, and the copper sheet is used as a cathode.
Optionally, the polished sample is water rinsed within 30s after electropolishing.
It is a second object of the invention to provide a workpiece comprising an AlSi10Mg alloy treated by the above-described electropolishing method.
Compared with the prior art, the invention has the following advantages and beneficial effects:
according to the electrolytic polishing method for the AlSi10Mg alloy surface, provided by the embodiment of the invention, phosphoric acid is used as an electrolytic polishing solution, the electrolytic polishing potential adopts a small potential, the roughness and the surface morphology of the AlSi10Mg alloy subjected to selective laser melting are greatly improved, and the material loss in the electrolytic polishing process is greatly reduced. The polishing solution has the advantages of simple formula, safe use, small polishing potential, small loss and the like, and is suitable for processing parts with complex shapes.
Drawings
In order to more clearly illustrate the technical solutions of the exemplary embodiments of the present invention, the drawings that are required to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention and therefore should not be considered as limiting the scope, and that for those skilled in the art, other related drawings can be obtained from these drawings without inventive effort. In the attached figures:
FIG. 1 is an XRD diffraction pattern of an alloy surface obtained by an electrolytic polishing method for an AlSi10Mg alloy surface provided by the embodiment 1 of the invention;
FIG. 2 is a schematic diagram illustrating the results of the alloy surface roughness test performed by the electropolishing method for the surface of AlSi10Mg alloy provided in embodiments 1-4 of the present invention;
wherein, a, b, c, d in FIG. 2 represent the test results of electropolishing potentials of 2V, 3V, 4V, and 5V, respectively.
FIG. 3 is a schematic diagram illustrating the results of the alloy surface roughness test performed by the electropolishing method for the surface of AlSi10Mg alloy according to embodiments 5-8 of the present invention;
wherein, e, f, g, h in FIG. 3 represent the test results at the electropolishing potentials of 7V, 8V, 9V, and 10V, respectively.
FIG. 4 is a schematic diagram of a three-dimensional profile of an alloy surface obtained by an electrolytic polishing method for an AlSi10Mg alloy surface according to embodiments 1-2 of the present invention;
wherein (A) and (B) in FIG. 4 represent the results of the test at the electropolishing potentials of 2V and 3V, respectively.
FIG. 5 is a schematic diagram of a three-dimensional profile of an alloy surface obtained by an electropolishing method for an AlSi10Mg alloy surface according to embodiments 3-4 of the present invention;
wherein (C) and (D) in FIG. 5 represent the results of the tests at the electropolishing potentials of 4V and 5V, respectively.
FIG. 6 is a schematic diagram of a three-dimensional profile of an alloy surface obtained by an electropolishing method for an AlSi10Mg alloy surface according to embodiments 5-6 of the present invention;
wherein (E) and (F) in FIG. 6 represent the results of the test at the electropolishing potentials of 7V and 8V, respectively.
FIG. 7 is a schematic diagram of a three-dimensional profile of an alloy surface obtained by an electropolishing method for an AlSi10Mg alloy surface according to embodiments 7-8 of the present disclosure;
wherein (G) and (H) in FIG. 7 represent the results of the test at the electropolishing potentials of 9V and 10V, respectively.
FIG. 8 is a scanning electron microscope image of an alloy surface obtained by the electropolishing method for an AlSi10Mg alloy surface according to examples 1, 3, 6, 8 and 9 of the present invention;
wherein (1), (2), (3) and (4) in FIG. 8 represent the test results at electropolishing potentials of 2V, 4V, 8V and 10V, respectively, (5) represents the original sample, and (6) represents the test results at the polishing solution of conventional Brytal solution.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be further described in detail with reference to the following examples and the accompanying drawings, and the exemplary embodiments and descriptions thereof are only used for explaining the present invention and are not to be construed as limiting the present invention.
Example 1:
an electrolytic polishing method for an AlSi10Mg alloy surface comprises the following steps:
(1) carrying out oil removal pretreatment: ultrasonically degreasing an AlSi10Mg alloy prepared by a selective laser melting technology for 10min by using absolute ethyl alcohol, then washing the AlSi10Mg alloy in cold water at the temperature of 15-20 ℃, and then drying the alloy in cold air flow at the temperature of 10-15 ℃;
(2) electrolytic polishing: selecting a phosphoric acid solution with the mass fraction of 85% as an electrolytic polishing solution; adopting an Autolab electrochemical workstation as an output power supply, carrying out electrolytic polishing on a three-electrode system, taking Ag/AgCl as a reference electrode, taking a copper sheet as a cathode, and taking AlSi10Mg alloy after oil removal treatment as an anode; setting an electrochemical workstation to be in a direct-current voltage stabilization mode, and selecting a polishing potential to be 2V; heating the three-electrode system in a water bath to 70 ℃, and magnetically stirring the electrolytic polishing solution in the polishing process at a magneton rotating speed of 25 rpm/min; the electrolytic polishing time is 20 min;
(3) and (3) post-treatment: in order to avoid chemical corrosion caused by long-time adhesion of phosphoric acid on the surface of the alloy, the sample after electrolytic polishing is quickly placed in deionized water for washing, and the interval time is less than 30 s.
Example 2:
the difference between this example and example 1 is: the voltage of the electrolytic polishing is 3V, and the magnetic stirring speed is 20 rpm/min. The rest is the same as in example 1.
Example 3:
the difference between this example and example 1 is: the voltage for electropolishing was 4V, otherwise the same as in example 1.
Example 4:
the difference between this example and example 1 is: the electropolishing voltage was 5V, otherwise the same as in example 1.
Example 5:
the difference between this example and example 1 is: the electropolishing voltage was 7V, the same as in example 1.
Example 6:
the difference between this example and example 1 is: the voltage for electropolishing was 8V, otherwise the same as in example 1.
Example 7:
the difference between this example and example 1 is: the voltage for electropolishing was 9V, otherwise the same as in example 1.
Example 8:
the difference between this example and example 1 is: the electropolishing voltage was 10V, and the procedure was otherwise the same as in example 1.
Example 9:
the difference between this example and example 1 is: a conventional electrolyte Brytal solution (15 wt% NaCO) was used3+5wt％NaPO4) The electrolytic polishing is carried out by adopting a two-step mode, wherein the applied potential is 5V in the first step, the applied potential is 0.5V in the second step, and the electrolytic polishing temperature is 75 ℃.
The surface of the AlSi10Mg alloy of each of the above examples after electropolishing was tested. Carrying out phase composition analysis on the surface of the AlSi10Mg alloy before and after electrolytic polishing by an XRD technology; carrying out roughness (Sa) test and three-dimensional topography test by a white light scanning interferometer, and testing the topography of the alloy surface of each embodiment by a scanning electron microscope; weighing mass loss before and after polishing by using balance; wherein the test area of the white light scanning interferometer is a size area of 230 x 230 μm.
In FIG. 1, A represents before polishing, B represents after polishing, and it can be seen from FIG. 1 that no new film layer is generated on the surface of the AlSi10Mg alloy before and after electropolishing, which proves that electrochemical polishing has no influence on the phase composition before and after the alloy.
The results of the roughness test and the mass loss test of examples 1 to 8 are shown in Table 1, FIGS. 2 to 3, and FIGS. 4 to 7.
TABLE 1 roughness and loss of mass before and after polishing for each example
As can be seen from Table 1, when the electropolishing potential is 2-4V, the roughness Sa of the obtained alloy surface is 0.8-1.5 μm, and the roughness after polishing is obviously reduced before intersecting polishing; as can be seen from the attached figures 4-7, when the electrolytic polishing potential is 2-4V, the alloy surface is flat and has no pits; when the electropolishing potential is 5V, the roughness of the alloy surface is increased to 2.206 μm, pits begin to appear, the potential is continuously increased, the roughness is increased after polishing, and the surface is not flat and has pits; before and after polishing, the roughness change is obvious when the potential is not 2-4V, although the roughness is reduced to nearly 1.9 mu m when a larger potential such as 10V is removed, the three-dimensional profile shows that the surface is not flat, the concave-convex is obvious, and the polishing effect is not good. As is clear from the scanning electron micrograph in fig. 8, the alloy surfaces obtained at potentials of 2V and 4V were significantly flatter than those obtained at potentials of 8V and 10V.
Therefore, the polishing effect at a polishing potential of 5 to 10V was far inferior to that at a small potential in examples 1 to 3.
Meanwhile, as can be seen from Table 1, the mass loss before and after the polishing is weighed by a balance, and the calculated loss amount of the material of the embodiment 1 to 3 is only 6 to 13mg/cm2The material loss is small; in examples 5 to 8, when the potential was 6 to 10V, the material loss was 14mg/cm2Above, the material loss is large.
The roughness test of example 9 revealed that the surface had a roughness of 2.422 μm, a large roughness, and pits distributed on the surface as seen by a scanning electron microscope image in (6) of FIG. 8. It can be seen that the conventional Brytal solution and two-step method are adopted for electrolytic polishing, and compared with the method of using phosphoric acid as the electrolytic polishing solution in examples 1 to 3, a plurality of pits are generated on the surface. Compared with the conventional Brytal solution, the polishing solution adopts the phosphoric acid solution as the polishing solution, does not need preparation, simplifies the treatment process, is safe to use and is environment-friendly.
The above embodiments are provided to further explain the objects, technical solutions and advantages of the present invention in detail, it should be understood that the above embodiments are merely exemplary embodiments of the present invention, and are not intended to limit the scope of the present invention, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (9)
1. An electropolishing method for an AlSi10Mg alloy surface, comprising:
(1) carrying out oil removal pretreatment on the surface of an AlSi10Mg alloy sample;
(2) performing electrolytic polishing, wherein the electrolytic polishing solution is a phosphoric acid solution, the electrolytic polishing system is a three-electrode system, the electrolytic polishing temperature is 65-75 ℃, the electrolytic polishing time is 15-20 min, and the electrolytic polishing potential is 0-4V;
(3) rapidly washing the polished sample with water;
the AlSi10Mg alloy is prepared by a selective laser melting technology.
2. The electrolytic polishing method for the AlSi10Mg alloy surface according to claim 1, wherein the degreasing pretreatment is ultrasonic degreasing of the sample surface by ethanol, washing and drying the sample;
the water washing temperature is 15-20 ℃, and the blow-drying temperature is 10-15 ℃.
3. The electrolytic polishing method for the surface of the AlSi10Mg alloy according to claim 1, wherein the mass fraction of the phosphoric acid solution is 85%.
4. The electrolytic polishing method for the surface of the AlSi10Mg alloy according to claim 1, wherein the electrolytic polishing solution is stirred during the electrolytic polishing process, and the stirring speed is 20-30 rpm/min.
5. The electropolishing method for an AlSi10Mg alloy surface according to claim 1, wherein the electropolishing potential is 2-4V.
6. The method for electropolishing an AlSi10Mg alloy surface according to claim 1, wherein the electrochemical workstation during electropolishing is set to DC potentiostatic mode.
7. The electrolytic polishing method for the surface of the AlSi10Mg alloy as claimed in claim 1, wherein the reference electrode in the three-system electrode is Ag/AgCl, the AlSi10Mg alloy is an anode, and the red copper sheet is a cathode.
8. The electropolishing method for an AlSi10Mg alloy surface, according to claim 1, wherein the polished sample is rinsed with water within 30 seconds after electropolishing.
9. A workpiece comprising an AlSi10Mg alloy having a surface polished by the electropolishing method of claim 1.
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20160376724A1 (en) * | 2015-06-24 | 2016-12-29 | Airbus Defence and Space GmbH | Electrolyte and process for the electrolytic polishing of a metallic substrate |
| US20190292681A1 (en) * | 2016-07-13 | 2019-09-26 | Airbus Defence and Space GmbH | A Method For The Surface Finishing Of Metals And Alloys |
| CN113186589A (en) * | 2021-05-10 | 2021-07-30 | 哈尔滨工业大学 | Electrochemical surface treatment method for AlSi10Mg alloy heat treatment product by selective laser melting |
| CN113201738A (en) * | 2021-05-10 | 2021-08-03 | 哈尔滨工业大学 | Electrochemical surface treatment method for selectively laser melting AlSi10Mg formed workpiece |
-
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- 2021-11-08 CN CN202111323410.6A patent/CN113862769A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20160376724A1 (en) * | 2015-06-24 | 2016-12-29 | Airbus Defence and Space GmbH | Electrolyte and process for the electrolytic polishing of a metallic substrate |
| US20190292681A1 (en) * | 2016-07-13 | 2019-09-26 | Airbus Defence and Space GmbH | A Method For The Surface Finishing Of Metals And Alloys |
| CN113186589A (en) * | 2021-05-10 | 2021-07-30 | 哈尔滨工业大学 | Electrochemical surface treatment method for AlSi10Mg alloy heat treatment product by selective laser melting |
| CN113201738A (en) * | 2021-05-10 | 2021-08-03 | 哈尔滨工业大学 | Electrochemical surface treatment method for selectively laser melting AlSi10Mg formed workpiece |
Non-Patent Citations (1)
| Title |
|---|
| S. ANAND KUMAR ET AL: ""Investigation on pulsed electrolytically polished AlSi10Mg alloy processed via selective laser melting technique"", 《PROC IMECHE PART L: J MATERIALS: DESIGN AND APPLICATIONS》 * |
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Application publication date: 20211231 |