CN113782407A - Electrode of radio frequency ion source neutralizer - Google Patents
Electrode of radio frequency ion source neutralizer Download PDFInfo
- Publication number
- CN113782407A CN113782407A CN202111047642.3A CN202111047642A CN113782407A CN 113782407 A CN113782407 A CN 113782407A CN 202111047642 A CN202111047642 A CN 202111047642A CN 113782407 A CN113782407 A CN 113782407A
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- China
- Prior art keywords
- electrode
- ring
- cup
- ion source
- radio frequency
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32541—Shape
Abstract
The invention discloses an electrode of a radio frequency ion source neutralizer, which is a non-closed-loop cup-shaped body, wherein more than two gaps are arranged on the ring of the cup-shaped body, and 2N-1 gaps are arranged on the ring of the cup-shaped body, wherein N is a natural number without 0 and 1; the central line of the opening of one of the notches and the central line of the opening of the ring opening are the same central line; the central line of the ring is used as a symmetry axis in the rest gaps, and the central lines of the openings of the two opposite gaps are the same central line, so that the defects in the prior art are overcome, the electrode is applied to the radio frequency ion source neutralizer, more radio frequency energy can enter the ceramic cup, the ionization efficiency is increased, and the electron emission efficiency is not greatly reduced.
Description
Technical Field
The invention relates to the technical field of plasma coating equipment, in particular to an electrode of a radio frequency ion source neutralizer.
Background
In the existing coating equipment, most of film structures have requirements on firmness and adhesive force, and if the film structures do not reach the standard, the film can fall off and the like. In order to improve the problem, auxiliary deposition of a high-energy wide-beam ion source is required, the requirement of the ion source on neutralization is extremely strict, if the neutralization is not good, ignition in a vacuum environment is caused, ionic repulsion force is strengthened, and the basic and appearance structure of a film is affected. There is therefore a significant improvement and performance gain in rf ion source neutralizers and in these areas.
The existing radio frequency ion source neutralizer mainly comprises a holding electrode, a radio frequency coil, a ceramic cup, an electrode (also called an electron emission electrode), an inflation seat, an electrode joint and the like, but the electron emission electrode of the existing structure is a cup-shaped body and has a single gap structure, and due to the adoption of the single gap structure, the existing radio frequency ion source neutralizer has the defects of low radio frequency energy utilization rate and low ionization efficiency.
Disclosure of Invention
The invention aims to design an electrode of a radio frequency ion source neutralizer, which solves the defects of the prior art, and the electrode is applied to the radio frequency ion source neutralizer, so that more radio frequency energy can enter a ceramic cup, the ionization efficiency is increased, and the electron emission efficiency is not greatly reduced.
The invention is realized by the following technical scheme: the electrode of the radio frequency ion source neutralizer is a non-closed ring cup-shaped body, and more than two notches are arranged on the ring of the cup-shaped body.
In order to further realize the invention, the following arrangement mode is adopted: 2N-1 notches are arranged on the ring of the cup-shaped body, wherein N is a natural number without 0 and 1; the central line of the opening of one of the notches and the central line of the opening of the ring opening are the same central line; the central line of the ring is taken as a symmetry axis in the rest gaps, and the opening central lines of the two opposite gaps are the same central line.
In order to further realize the invention, the following arrangement mode is adopted: the length of the notch is less than or equal to that of the ring opening.
In order to further realize the invention, the following arrangement mode is adopted: and a negative electric field is introduced to the electrode.
Compared with the prior art, the invention has the following advantages and beneficial effects:
the invention solves the defects of the prior art, and the electrode is applied to the radio frequency ion source neutralizer, so that more radio frequency energy can enter the ceramic cup, the ionization efficiency is increased, and the electron emission efficiency is not greatly reduced.
Compared with the traditional electronic neutralizer, the radio frequency ion source neutralizer has the advantages that the material volatilization etching is small, the temperature rise is small, and the use cost is effectively reduced;
the general filament can be used for tens of hours, the hollow cathode tube can be used for more than one hundred hours, and the service time of the electrode provided by the invention can reach more than one year.
Drawings
Fig. 1 is a schematic diagram of a structure of a neutralizer for an rf ion source according to the present invention.
Fig. 2 is a schematic structural view of the present invention (the upper view is a front view, and the lower view is a view from a-a direction of the upper view).
Wherein, 1-a holding pole, 2-a radio frequency coil, 3-a ceramic cup, 4-an electrode, 5-an inflation seat, 6-an electrode joint, 41-a ring opening, 42-a notch and 43-a ring.
Detailed Description
The present invention will be described in further detail with reference to examples, but the embodiments of the present invention are not limited thereto.
In order to make the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions of the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings of the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, are within the scope of the present invention. Thus, the following detailed description of the embodiments of the present invention, presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention.
In the description of the present invention, it is to be understood that the terms etc. indicate orientations or positional relationships based on those shown in the drawings only for the convenience of describing the present invention and simplifying the description, but do not indicate or imply that the referred devices or elements must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
In the present invention, unless otherwise specifically stated or limited, the terms "mounting," "connecting," "disposing," "fixing," and the like are to be understood in a broad sense, and may be, for example, a fixed connection, a detachable connection, or an integral connection, and are not limited to any conventional mechanical connection means such as screwing, interference fitting, riveting, screw-assisted connection, and the like. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, "above" or "below" a first feature means that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact with each other via another feature therebetween. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.
It is worth noting that: in the present application, when it is necessary to apply the known technology or the conventional technology in the field, the applicant may have the case that the known technology or/and the conventional technology is not specifically described in the text, but the technical means is not specifically disclosed in the text, and the present application is considered to be not in compliance with the twenty-sixth clause of the patent law.
Example 1:
as shown in fig. 1 and fig. 2, an electrode of a radiofrequency ion source neutralizer solves the disadvantages of the prior art, and particularly adopts the following arrangement structure: the electrode 4 is a non-closed ring cup-shaped body, and more than two notches 42 are arranged on a ring 43 of the cup-shaped body.
Compared with the prior art, the electrode 4 has a structure that a multi-notch non-closed-loop cup-shaped body is adopted, wherein a ring opening 41 is formed on a ring 43 of the cup-shaped body, so that the ring is in a non-closed state.
Example 2:
the present embodiment is further optimized based on the above embodiment, and the same parts as those in the foregoing technical solutions will not be described herein again, as shown in fig. 1 and fig. 2, in order to further better implement the present invention, the following setting manner is particularly adopted: 2N-1 notches 42 are arranged on the ring 43 of the cup-shaped body, wherein N is a natural number without 0 and 1; the central line of the opening of one of the notches 42 and the central line of the opening of the ring opening 41 are the same; the remaining notches 42 are symmetrical about the center line of the ring 43, and the opening center lines of the two opposite notches 42 are the same center line.
As a preferable arrangement scheme, according to actual needs, 3 or 5 or 7 or 2N-1 gaps 42 are arranged on the ring 43 of the cup-shaped body, N is a natural number without 0 and 1, and when the gaps and the ring openings are arranged, the centers of the rings are taken as the symmetrical centers, and the center lines of the gaps and the ring openings are taken as symmetrical targets to be arranged in a central symmetry mode.
Example 3:
the present embodiment is further optimized based on any of the above embodiments, and parts that are the same as the above technical solutions will not be described herein again, as shown in fig. 1 and fig. 2, in order to further better implement the present invention, the following setting modes are particularly adopted: the length of the gap 42 is less than or equal to the length of the ring opening 41.
Preferably, the length (opening size) of the notch is equal to or less than the length (opening size) of the ring mouth 41.
Example 4:
the present embodiment is further optimized based on any of the above embodiments, and parts that are the same as the above technical solutions will not be described herein again, as shown in fig. 1 and fig. 2, in order to further better implement the present invention, the following setting modes are particularly adopted: and a negative electric field is introduced to the electrode.
Example 5:
the radio frequency ion source neutralizer applying the electrode mainly comprises a holding electrode 1, a radio frequency coil 2, a ceramic cup 3, an electrode (electron emission electrode) 4, an inflation seat 5 and an electrode joint 6, wherein the electrode 4 is a non-closed ring cup-shaped body, and a ring opening 41 is formed on a ring 43 of the cup-shaped body so that the ring is in a non-closed state; the ring 43 is provided with 7 notches 42, counted from the clockwise direction or the counterclockwise direction of the ring mouth 41, two adjacent notches 42 are equidistant, the opening center line of the middle notch 42 and the opening center line of the ring mouth 41 are the same center line, and the opening center line is a line connecting the notches or the middle part of the ring mouth to the center of the ring 43 under the condition of the view angle of fig. 2; the length (opening size) of the electrode gap is equal to or less than the length (opening size) of the ring opening 41.
The working principle is as follows: the radio frequency power supply is connected with the radio frequency coil 2 with high frequency energy of 13.56MHz, the radio frequency coil 2 generates oscillation to enable the ceramic cup 3 to be filled with gas to be excited and ionized, the gas filling seat 5 is used for filling high-purity argon gas into the ceramic cup 3 to enable the cup to generate argon ions, the cup is in a plasma state under the initial condition, and then a negative electric field is supplied to the electrode (electron emission electrode) 4 to enable the argon ions to bombard the surface of the electrode 4 to generate electrons.
The radio frequency coil 2 excites internal ionization, ions bombard the electrode 4, and the electrode 4 is a non-closed-loop cup-shaped body with a plurality of gaps 42, so that more radio frequency energy can enter the ceramic cup 3 through the gaps 42, the ionization efficiency is increased, and the electron emission efficiency is not greatly reduced.
Compared with the traditional electronic neutralizer, the material volatilization etching is smaller, the temperature rise is small, and the use cost is effectively reduced.
The general filament can be used for tens of hours, the hollow cathode tube can be used for more than one hundred hours, and the service time of the electrode provided by the invention can reach more than one year.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the present invention in any way, and all simple modifications and equivalent variations of the above embodiments according to the technical spirit of the present invention are within the scope of the present invention.
Claims (4)
1. An electrode for an rf ion source neutralizer, comprising: the electrode is a non-closed ring cup-shaped body, and more than two notches are arranged on the ring of the cup-shaped body.
2. The electrode of the rf ion source neutralizer of claim 1, wherein: 2N-1 notches are arranged on the ring of the cup-shaped body, wherein N is a natural number without 0 and 1; the central line of the opening of one of the notches and the central line of the opening of the ring opening are the same central line; the central line of the ring is taken as a symmetry axis in the rest gaps, and the opening central lines of the two opposite gaps are the same central line.
3. The electrode of the rf ion source neutralizer of claim 2, wherein: the length of the notch is less than or equal to that of the ring opening.
4. The electrode of the RF ion source neutralizer according to any one of claims 1 to 3, wherein: and a negative electric field is introduced to the electrode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111047642.3A CN113782407A (en) | 2021-09-08 | 2021-09-08 | Electrode of radio frequency ion source neutralizer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111047642.3A CN113782407A (en) | 2021-09-08 | 2021-09-08 | Electrode of radio frequency ion source neutralizer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113782407A true CN113782407A (en) | 2021-12-10 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111047642.3A Pending CN113782407A (en) | 2021-09-08 | 2021-09-08 | Electrode of radio frequency ion source neutralizer |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113782407A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114302548A (en) * | 2021-12-31 | 2022-04-08 | 中山市博顿光电科技有限公司 | Radio frequency ionization device, radio frequency neutralizer and control method thereof |
| CN117510089A (en) * | 2024-01-05 | 2024-02-06 | 成都国泰真空设备有限公司 | Ion beam etching equipment for glass surface treatment |
| CN117510089B (en) * | 2024-01-05 | 2024-04-23 | 成都国泰真空设备有限公司 | Ion beam etching equipment for glass surface treatment |
-
2021
- 2021-09-08 CN CN202111047642.3A patent/CN113782407A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114302548A (en) * | 2021-12-31 | 2022-04-08 | 中山市博顿光电科技有限公司 | Radio frequency ionization device, radio frequency neutralizer and control method thereof |
| CN117510089A (en) * | 2024-01-05 | 2024-02-06 | 成都国泰真空设备有限公司 | Ion beam etching equipment for glass surface treatment |
| CN117510089B (en) * | 2024-01-05 | 2024-04-23 | 成都国泰真空设备有限公司 | Ion beam etching equipment for glass surface treatment |
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Effective date of registration: 20220113 Address after: 618 Kelin West Road, Chengdu cross strait science and Technology Industrial Development Park, Wenjiang District, Chengdu, Sichuan 610000 Applicant after: CHENGDU GUOTAI VACUUM EQUIPMENT CO.,LTD. Address before: 618 Kelin West Road, Chengdu cross strait science and Technology Industrial Development Park, Wenjiang District, Chengdu, Sichuan 610000 Applicant before: Sichuan Jincheng Guotai Vacuum Equipment Co.,Ltd. |