CN113731907B - Sapphire product cleaning method and cleaning device - Google Patents

Sapphire product cleaning method and cleaning device Download PDF

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Publication number
CN113731907B
CN113731907B CN202110931089.3A CN202110931089A CN113731907B CN 113731907 B CN113731907 B CN 113731907B CN 202110931089 A CN202110931089 A CN 202110931089A CN 113731907 B CN113731907 B CN 113731907B
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cleaning
sapphire
product
sapphire product
tank
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CN113731907A (en
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秦俊
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Jiangsu Jeshine New Material Co ltd
Tunghsu Technology Group Co Ltd
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Jiangsu Jeshine New Material Co ltd
Tunghsu Technology Group Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00Accessories or details of general applicability for machines or apparatus for cleaning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration

Abstract

The invention provides a sapphire product cleaning method and a cleaning device, wherein the cleaning method comprises the following steps: detecting cleaning end signals of a plurality of cleaning tanks in real time; under the condition that a cleaning end signal of any cleaning tank is detected, acquiring a cleaning flow and a cleaning process of a sapphire product to be cleaned currently, and determining an initial cleaning tank of the sapphire product to be cleaned currently; grouping the sapphire products to be cleaned currently according to the initial cleaning tank to obtain grouping information; determining at least one group of sapphire products corresponding to the cleaning tank sending out the cleaning end signal according to the grouping information; respectively determining the cleaning priority of each sapphire product in the at least one group of sapphire products according to the cleaning process; and putting the sapphire product with the highest priority into a corresponding cleaning tank which sends out a cleaning end signal for cleaning. The method provided by the invention can improve the utilization rate of the cleaning machine, shorten the production period and improve the cleaning efficiency.

Description

Sapphire product cleaning method and cleaning device
Technical Field
The invention relates to the technical field of sapphire product cleaning, in particular to a sapphire product cleaning method and a sapphire product cleaning device.
Background
The sapphire crystal has excellent optical property, physical property and stable chemical property, and can be applied to high-brightness LED substrate materials, various optical components, scanner window materials and the like.
For different sapphire products, the cleaning process is different, for example, the cleaning of the sapphire LED substrate mainly comprises alkaline cleaning and acid cleaning, but the requirement on the surface cleanliness of the sapphire window sheet is not particularly high, and only simple alkaline cleaning or acid cleaning is needed. Different cleaning processes need to design and manufacture different cleaning machines, or a single cleaning machine is provided with two cleaning processes, so that a corresponding process is selected for cleaning a product A, and another process is selected for cleaning a product B.
In the prior art, a single cleaning machine cannot simultaneously operate two set processes, and only after the cleaning process of the product A is completed, the cleaning process is switched to the cleaning process of the product B. The cleaning mode is not suitable for diversified production lines of products, the equipment utilization rate is low, the production period is long, and the cleaning efficiency is poor.
Disclosure of Invention
The invention provides a sapphire product cleaning method and a sapphire product cleaning device, aiming at the technical problems that a cleaning mode in the prior art is not suitable for a product diversified production line, the equipment utilization rate is low, the production period is long, and the cleaning efficiency is poor.
In order to achieve the above object, a first aspect of the present invention provides a method for cleaning a sapphire product, comprising the steps of: detecting cleaning end signals of the plurality of cleaning tanks in real time; under the condition that a cleaning end signal from any one of the plurality of cleaning tanks is detected, acquiring a cleaning flow and a cleaning process of a sapphire product to be cleaned currently; the sapphire product to be cleaned currently is a sapphire product which is not cleaned in any one of the plurality of cleaning tanks currently; determining an initial cleaning tank of the sapphire product to be cleaned currently according to the cleaning flow and the cleaning process; grouping the sapphire products to be cleaned currently according to the determined initial cleaning tank to obtain grouping information, wherein the sapphire products of the same initial cleaning tank are divided into the same group; determining at least one group of sapphire products corresponding to the cleaning tank which sends out the cleaning end signal according to the grouping information; respectively determining the cleaning priority of each sapphire product in at least one group of sapphire products according to the determined cleaning process of the at least one group of sapphire products; and putting the sapphire product with the highest priority in the at least one group of determined sapphire products into the corresponding cleaning tank which sends out a cleaning end signal to perform cleaning operation.
Further, the cleaning process includes: the method comprises the following steps that a next cleaning tank to be placed in for a sapphire product to be cleaned, the waiting time of the sapphire product, the emergency degree of the sapphire product and the occupation time of the sapphire product in the corresponding cleaning tank are obtained, wherein the waiting time is the time from the moment when the sapphire product starts to execute the corresponding cleaning process to the current moment.
Further, the determining an initial cleaning tank of the sapphire product to be cleaned according to the cleaning process and the cleaning process includes: the method comprises the following steps that a next cleaning tank into which a sapphire product to be cleaned is to be placed, the waiting time of the sapphire product, the emergency degree of the sapphire product and the occupation time of the sapphire product in the corresponding cleaning tank are obtained; and the waiting time is the time from the moment when the sapphire product starts to execute the cleaning operation according to the cleaning flow to the current moment.
Further, the cleaning priority of the sapphire product is obtained by: the cleaning priority is equal to the waiting weight, the waiting duration + the emergency weight, the emergency degree + the occupation weight/the occupation duration.
Further, the cleaning tank comprises a spraying tank; the method further comprises the following steps: detecting the current temperature of the sapphire product under the condition that the sapphire product is determined to be placed in a spraying groove; under the condition that the current temperature of the sapphire product is higher than the set temperature, determining a plurality of spraying temperatures according to the current temperature of the sapphire product and a pre-stored spraying temperature table, wherein the spraying temperature table is used for representing the corresponding relation between the current temperature of the sapphire product and the plurality of spraying temperatures; and spraying the sapphire product step by step from high to low according to the spraying temperature, starting from the highest spraying temperature in the plurality of determined spraying temperatures.
The invention provides a sapphire product cleaning device, which is applied to a sapphire product cleaning machine, wherein the sapphire product cleaning machine is provided with a plurality of cleaning grooves, and the sapphire product cleaning device comprises: the detection module is used for detecting cleaning end signals of the plurality of cleaning tanks in real time; the determining module is used for acquiring the cleaning flow and the cleaning process of the sapphire product to be cleaned currently under the condition that a cleaning end signal from any one of the plurality of cleaning tanks is detected; the sapphire product to be cleaned currently is a sapphire product which is not cleaned in any one of the plurality of cleaning tanks currently; determining an initial cleaning tank of the sapphire product to be cleaned currently according to the cleaning flow and the cleaning process; grouping the sapphire products to be cleaned currently according to the determined initial cleaning tank to obtain grouping information, wherein the sapphire products of the same initial cleaning tank are divided into the same group; determining at least one group of sapphire products corresponding to the cleaning tank which sends out the cleaning end signal according to the grouping information; respectively determining the cleaning priority of each sapphire product in at least one group of sapphire products according to the determined cleaning process of the at least one group of sapphire products; and the cleaning module is used for putting the sapphire product with the highest priority in the at least one group of determined sapphire products into the corresponding cleaning tank which sends out a cleaning end signal to perform cleaning operation.
Further, the cleaning process includes: the method comprises the following steps that a next cleaning tank into which a sapphire product to be cleaned is to be placed, the waiting time of the sapphire product, the emergency degree of the sapphire product and the occupation time of the sapphire product in the corresponding cleaning tank are obtained; and the waiting time is the time from the moment when the sapphire product starts to execute the cleaning operation according to the cleaning flow to the current moment.
Further, the determining an initial cleaning tank of the sapphire product to be cleaned according to the cleaning process and the cleaning process includes: taking a first cleaning tank in a cleaning flow as the initial cleaning tank according to the cleaning flow under the condition that the sapphire product to be cleaned at present does not start the first cleaning operation; and under the condition that the sapphire product to be cleaned at present starts the first cleaning operation, taking the next cleaning tank into which the sapphire product is to be put as the initial cleaning tank according to the cleaning process.
Further, the cleaning priority of the sapphire product is obtained by: the cleaning priority is equal to the waiting weight, the waiting duration + the emergency weight, the emergency degree + the occupation weight/the occupation duration.
Further, the cleaning tank comprises a spraying tank; the cleaning device further comprises: the spraying control module is used for detecting the current temperature of the sapphire product under the condition that the sapphire product is placed in the spraying groove; under the condition that the current temperature of the sapphire product is higher than the set temperature, determining a plurality of spraying temperatures according to the current temperature of the sapphire product and a prestored spraying temperature table, wherein the spraying temperature table is used for representing the corresponding relation between the current temperature of the sapphire product and the plurality of spraying temperatures; and spraying the sapphire products step by step from high spraying temperature to low spraying temperature from the highest spraying temperature in the determined plurality of spraying temperatures.
Through the technical scheme provided by the invention, the invention at least has the following technical effects:
the sapphire product cleaning method is applied to a sapphire product cleaning machine, a plurality of cleaning tanks are arranged on the sapphire product cleaning machine, when the sapphire product cleaning machine is used, cleaning end signals of a plurality of cleaning tanks are detected in real time, under the condition that the cleaning end signal of any cleaning tank is detected, the cleaning flow and the cleaning process of the sapphire product to be cleaned at present are obtained, determining an initial cleaning tank of the sapphire product to be cleaned currently according to the cleaning flow and the cleaning process, the method comprises the steps of grouping sapphire products to be cleaned currently according to an initial cleaning tank, grouping the sapphire products of the same initial cleaning tank into a group, determining at least one group of sapphire products corresponding to the cleaning tank which sends out a cleaning end signal, obtaining the cleaning priority of each sapphire product in the group, and putting the sapphire product with the highest priority into the corresponding cleaning tank which sends out the cleaning end signal for cleaning. The sapphire product cleaning method provided by the invention can improve the utilization rate of the cleaning machine, shorten the production period and improve the cleaning efficiency.
Additional features and advantages of the invention will be set forth in the detailed description which follows.
Drawings
The accompanying drawings, which are included to provide a further understanding of the embodiments of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the embodiments of the invention and not to limit the embodiments of the invention. In the drawings:
fig. 1 is a flowchart of a method for cleaning a sapphire product according to an embodiment of the present invention;
fig. 2 is a schematic view of a sapphire product cleaning apparatus according to an embodiment of the present invention.
Detailed Description
The following detailed description of embodiments of the invention refers to the accompanying drawings. It should be understood that the detailed description and specific examples, while indicating embodiments of the invention, are given by way of illustration and explanation only, not limitation.
It should be noted that the embodiments and features of the embodiments may be combined with each other without conflict.
In the present invention, unless specified to the contrary, use of the terms of orientation such as "upper, lower, top, bottom" or the like are generally described with respect to the orientation shown in the drawings or the positional relationship of the components with respect to each other in the vertical, or gravitational direction.
The present invention will be described in detail below with reference to the embodiments with reference to the attached drawings.
Referring to fig. 1, an embodiment of the present invention provides a method for cleaning a sapphire product, including the following steps: s101: detecting cleaning end signals of the plurality of cleaning tanks in real time; s102: under the condition that a cleaning end signal from any one of the plurality of cleaning tanks is detected, acquiring a cleaning flow and a cleaning process of a sapphire product to be cleaned currently; the sapphire product to be cleaned currently is a sapphire product which is not cleaned in any one of the plurality of cleaning tanks currently; s103: determining an initial cleaning tank of the sapphire product to be cleaned currently according to the cleaning flow and the cleaning process; s104: grouping the sapphire products to be cleaned currently according to the determined initial cleaning tank to obtain grouping information, wherein the sapphire products of the same initial cleaning tank are divided into the same group; s105: determining at least one group of sapphire products corresponding to the cleaning tank which sends out the cleaning end signal according to the grouping information; s106: respectively determining the cleaning priority of each sapphire product in at least one group of sapphire products according to the determined cleaning process of the at least one group of sapphire products; s107: and putting the sapphire product with the highest priority in the at least one group of determined sapphire products into the corresponding cleaning tank which sends out a cleaning end signal to perform cleaning operation.
Specifically, in the embodiment of the present invention, the sapphire product cleaning machine can clean a plurality of sapphire products simultaneously, detect the cleaning end signals of a plurality of cleaning tanks in real time when the cleaning machine is used, and acquire the cleaning flow and the cleaning process of the plurality of sapphire products which are not cleaned in the cleaning tanks under the condition that the cleaning end signal of any one cleaning tank is detected. The method comprises the steps of determining an initial cleaning tank into which each sapphire product to be cleaned is to be placed according to a cleaning flow and a cleaning process, grouping the sapphire products to be cleaned currently according to the determined initial cleaning tank, and dividing the sapphire products in the same initial cleaning tank into a group to obtain grouping information. And determining a group of sapphire products corresponding to the cleaning tank sending out the cleaning end signal according to the grouping information. And acquiring the cleaning process of each product in the group of sapphire products, dividing the cleaning priority of each sapphire product in the group according to the cleaning process, and putting the sapphire product with the highest cleaning priority into a corresponding cleaning tank which sends a cleaning end signal for cleaning.
For example, the sapphire product cleaning machine comprises a cleaning tank No. 1-6, the sapphire products to be cleaned currently comprise A, B, C, D and E, and the cleaning process of the product A comprises the following steps: groove No. 1 for 10 minutes, groove No. 2 for 10 minutes, groove No. 3 for 15 minutes, groove No. 5 for 10 minutes, and groove No. 6 for 5 minutes; the cleaning process of the product B comprises the following steps: slot No. 1 for 5 minutes, slot No. 3 for 10 minutes, slot No. 5 for 10 minutes, and slot No. 6 for 5 minutes; the product C cleaning process comprises the following steps: groove No. 1 for 10 minutes, groove No. 2 for 10 minutes, groove No. 3 for 5 minutes, and groove No. 6 for 5 minutes; the cleaning process of the product D comprises the following steps: groove No. 1 for 10 minutes, groove No. 2 for 20 minutes, groove No. 3 for 15 minutes, and groove No. 4 for 10 minutes; the cleaning process of the product E is as follows: tank No. 1 for 5 minutes, and tank No. 4 for 10 minutes. Currently, the product A is cleaned in a No. 3 tank; b, completing the cleaning of the No. 1 tank by the product B, and waiting for entering the No. 3 tank for cleaning; c, the product finishes the cleaning of the No. 2 tank and waits for entering the No. 3 tank for cleaning; d, cleaning the product in a No. 4 tank; and E, finishing the cleaning of the No. 1 tank by the product, and waiting for entering the No. 4 tank for cleaning. When a cleaning end signal of the No. 1 tank is detected, a cleaning flow and a cleaning process of products B, C and E waiting for cleaning are obtained, the initial cleaning tanks of the products B, C are determined to be the No. 3 tank and the initial cleaning tank of the product E is determined to be the No. 4 tank according to the cleaning flow and the cleaning process of the products B, C and E. Products B, C and E were grouped according to the determined initial wash tank, product B, C was grouped and product E was grouped. Products B and C were determined to be a set of sapphire products corresponding to tank No. 3 which issued a cleaning end signal. And respectively determining the cleaning priority of the product B according to the cleaning processes of the product C, if the cleaning priority of the product B is determined to be the highest, putting the product B into a No. 3 cleaning tank for cleaning, and continuing to wait for the product C.
According to the sapphire product cleaning method provided by the invention, the utilization rate of the cleaning machine can be improved, the production period is shortened, and the cleaning efficiency is improved.
Further, the cleaning process includes: the method comprises the following steps that a next cleaning tank into which a sapphire product to be cleaned is to be placed, the waiting time of the sapphire product, the emergency degree of the sapphire product and the occupation time of the sapphire product in the corresponding cleaning tank are obtained; and the waiting time is the time from the moment when the sapphire product starts to execute the cleaning operation according to the cleaning flow to the current moment.
Specifically, in the embodiment of the present invention, the waiting time is a time from the time when the sapphire product starts to execute the corresponding cleaning process to the current time. For example, the cleaning process of the product a starts to execute the cleaning operation, and if the slot No. 1 is occupied, the waiting time of the product a for entering the slot No. 1 is 5 minutes, and the waiting time of the product a is 5 minutes; and the cleaning operation of the product B is started to be executed in the cleaning process, firstly, the cleaning operation of the No. 1 tank is carried out for 5 minutes, after the cleaning operation of the No. 1 tank is finished, the No. 3 tank is occupied, the waiting time for entering the No. 3 tank is 2 minutes, and the waiting time for the product B is 7 minutes. The sapphire product occupies the cleaning tank for a long time, for example, the product A occupies the tank No. 1 for a long time of 10 minutes, and the product B occupies the tank No. 1 for a long time of 5 minutes. The emergency degree of the sapphire product can be classified in the application, for example, the emergency degree can be classified into 1-4 grades, and the higher the grade is, the higher the emergency degree is.
Further, the determining an initial cleaning tank of the sapphire product to be cleaned according to the cleaning process and the cleaning process includes: taking a first cleaning tank in a cleaning flow as the initial cleaning tank according to the cleaning flow under the condition that the sapphire product to be cleaned at present does not start the first cleaning operation; and under the condition that the sapphire product to be cleaned at present starts the first cleaning operation, taking the next cleaning tank into which the sapphire product is to be put as the initial cleaning tank according to the cleaning process.
Specifically, in the embodiment of the present invention, if the sapphire product to be cleaned has not started the first cleaning operation, the first cleaning tank is used as the initial cleaning tank for the sapphire product according to the cleaning flow, and if the sapphire product to be cleaned has started the first cleaning operation, the next cleaning tank into which the sapphire product is to be placed is used as the initial cleaning tank.
Further, the cleaning priority of the sapphire product is obtained by: the cleaning priority is equal to the waiting weight, the waiting duration + the emergency weight, the emergency degree + the occupation weight/the occupation duration.
Specifically, in the embodiment of the present invention, the cleaning priority of each sapphire product may be determined according to the waiting time, the emergency degree, and the occupied time. The sapphire product that waiting time is longer, emergency degree is high, occupation duration is short in this application is preferred to be washd. In a possible implementation mode, products with high emergency degree need to be processed preferentially, then products with long waiting time need to be processed, and finally products with short occupation time need to be processed, the waiting weight, the emergency weight and the occupation weight are set to be 2, 4 and 1 in sequence; in another possible implementation, the waiting weight, the urgent weight and the occupation weight are set to 3, 2 and 1 in sequence if the products with long waiting time need to be processed preferentially, then the products with high urgency are processed, and finally the products with short occupation time are processed.
The waiting weight, the emergency weight, and the occupation weight may be determined according to actual conditions, and are not limited in the embodiment of the present invention.
According to the sapphire product cleaning method provided by the invention, the cleaning priority of the sapphire product can be comprehensively considered from various factors, and the cleaning priority is more reasonable and accurate.
Further, the cleaning tank comprises a spraying tank; the method further comprises the following steps: detecting the current temperature of the sapphire product under the condition that the sapphire product is determined to be placed in a spraying groove; under the condition that the current temperature of the sapphire product is higher than the set temperature, determining a plurality of spraying temperatures according to the current temperature of the sapphire product and a prestored spraying temperature table, wherein the spraying temperature table is used for representing the corresponding relation between the current temperature of the sapphire product and the plurality of spraying temperatures; and spraying the sapphire product step by step from high to low according to the spraying temperature, starting from the highest spraying temperature in the plurality of determined spraying temperatures.
Specifically, current spray tank adopts single fixed spraying temperature to spray when spraying, and the cooling effect is poor, and the sapphire product ftractures easily moreover. In the embodiment of the invention, a plurality of spraying temperatures are set according to the temperature of the sapphire product before spraying, and are prestored as a spraying temperature table. When the sapphire product is placed into the spraying groove, the current temperature of the sapphire product is detected, the spraying temperature table is searched according to the current temperature to determine a plurality of spraying temperatures, and the sapphire product is sprayed step by step from high to low according to the determined plurality of spraying temperatures. For example, the current temperature of the sapphire product is detected to be 100 ℃, the spraying temperatures of 80 ℃ and 60 ℃ are respectively determined, and then the spraying liquid of 80 ℃ and the spraying liquid of 60 ℃ are sequentially sprayed to cool the sapphire product.
According to the method for cleaning the sapphire product, the sapphire product can be rapidly cooled, and the sapphire product is prevented from cracking.
Referring to fig. 2, a second aspect of the present invention provides a sapphire product cleaning apparatus, which is applied to a sapphire product cleaning machine, the sapphire product cleaning machine having a plurality of cleaning tanks, the sapphire product cleaning apparatus comprising: the detection module is used for detecting cleaning end signals of the plurality of cleaning tanks in real time; the determining module is used for acquiring a cleaning flow and a cleaning process of a sapphire product to be cleaned currently under the condition that a cleaning end signal of any one cleaning tank is detected, wherein the sapphire product to be cleaned currently is a sapphire product which is not cleaned in the plurality of cleaning tanks currently; determining an initial cleaning tank of the sapphire product to be cleaned currently according to the cleaning flow and the cleaning process; grouping the sapphire products to be cleaned currently according to the determined initial cleaning tank to obtain grouping information, wherein the sapphire products of the same initial cleaning tank are divided into a group; determining at least one group of sapphire products corresponding to the cleaning tank which sends out the cleaning end signal according to the grouping information; respectively determining the cleaning priority of each sapphire product in at least one group of sapphire products according to the determined cleaning process of the at least one group of sapphire products; and the cleaning module is used for putting the sapphire product with the highest priority into the corresponding cleaning tank which sends out a cleaning end signal for cleaning.
Further, the cleaning process includes: the method comprises the steps of placing a next cleaning tank to be cleaned into the sapphire product, waiting time of the sapphire product, emergency degree of the sapphire product and occupied time of the sapphire product occupying the corresponding cleaning tank, wherein the waiting time is the time from the moment when the sapphire product starts to execute the corresponding cleaning process to the current moment.
Further, the determining an initial cleaning tank of the sapphire product to be cleaned according to the cleaning process and the cleaning process includes: taking a first cleaning tank in a cleaning flow as the initial cleaning tank according to the cleaning flow under the condition that the sapphire product to be cleaned at present does not start the first cleaning operation; and under the condition that the sapphire product to be cleaned at present starts the first cleaning operation, taking the next cleaning tank into which the sapphire product is to be put as the initial cleaning tank according to the cleaning process.
Further, the cleaning priority of the sapphire product is obtained by: the cleaning priority is equal to the waiting weight, the waiting duration + the emergency weight, the emergency degree + the occupation weight/the occupation duration.
Further, the cleaning tank comprises a spraying tank; the cleaning device further comprises: the spraying control module is used for detecting the current temperature of the sapphire product when the sapphire product is placed in the spraying groove; determining at least one spraying temperature according to the current temperature of the sapphire product under the condition that the current temperature of the sapphire product is greater than the set temperature; and spraying the sapphire products step by step from high temperature to low temperature starting from the determined spraying temperature.
The preferred embodiments of the present invention have been described in detail with reference to the accompanying drawings, however, the present invention is not limited to the specific details of the above embodiments, and various simple modifications can be made to the technical solution of the present invention within the technical idea of the present invention, and these simple modifications are within the protective scope of the present invention.
It should be noted that, in the above embodiments, the various features described in the above embodiments may be combined in any suitable manner, and in order to avoid unnecessary repetition, the present invention does not separately describe various possible combinations.
In addition, any combination of the various embodiments of the present invention is also possible, and the same should be considered as the disclosure of the present invention as long as it does not depart from the spirit of the present invention.

Claims (10)

1. A sapphire product cleaning method is applied to a sapphire product cleaning machine, and the sapphire product cleaning machine is provided with a plurality of cleaning tanks and is characterized by comprising the following steps:
detecting cleaning end signals of the plurality of cleaning tanks in real time;
under the condition that a cleaning end signal from any one of the plurality of cleaning tanks is detected, acquiring a cleaning flow and a cleaning process of a sapphire product to be cleaned; the sapphire product to be cleaned currently is a sapphire product which is not cleaned in any one of the plurality of cleaning tanks currently;
determining an initial cleaning tank of the sapphire product to be cleaned currently according to the cleaning flow and the cleaning process;
grouping the sapphire products to be cleaned currently according to the determined initial cleaning tank to obtain grouping information, wherein the sapphire products of the same initial cleaning tank are divided into the same group;
determining at least one group of sapphire products corresponding to the cleaning tank which sends out the cleaning end signal according to the grouping information;
respectively determining the cleaning priority of each sapphire product in at least one group of sapphire products according to the determined cleaning process of the at least one group of sapphire products;
and putting the sapphire product with the highest priority in the at least one group of determined sapphire products into a corresponding cleaning tank which sends out a cleaning end signal to perform cleaning operation.
2. The method of claim 1, wherein the cleaning process comprises: the method comprises the following steps that a next cleaning tank into which a sapphire product to be cleaned is to be placed, the waiting time of the sapphire product, the emergency degree of the sapphire product and the occupation time of the sapphire product in the corresponding cleaning tank are obtained; and the waiting time is the time from the moment when the sapphire product starts to execute the cleaning operation according to the cleaning flow to the current moment.
3. The method for cleaning sapphire product according to claim 2, wherein the determining an initial cleaning tank for the sapphire product to be cleaned currently according to the cleaning process and the cleaning progress comprises:
taking a first cleaning tank in a cleaning flow as the initial cleaning tank according to the cleaning flow under the condition that the sapphire product to be cleaned at present does not start the first cleaning operation;
and under the condition that the sapphire product to be cleaned at present starts the first cleaning operation, taking the next cleaning tank into which the sapphire product is to be put as the initial cleaning tank according to the cleaning process.
4. The sapphire product cleaning method according to claim 2, wherein the cleaning priority of the sapphire product is obtained by:
the cleaning priority is equal to the waiting weight, the waiting duration + the emergency weight, the emergency degree + the occupation weight/the occupation duration.
5. The sapphire product cleaning method of claim 1, wherein the cleaning tank comprises a spray tank;
the method further comprises the following steps:
detecting the current temperature of the sapphire product under the condition that the sapphire product is determined to be placed in a spraying groove;
under the condition that the current temperature of the sapphire product is higher than the set temperature, determining a plurality of spraying temperatures according to the current temperature of the sapphire product and a prestored spraying temperature table, wherein the spraying temperature table is used for representing the corresponding relation between the current temperature of the sapphire product and the plurality of spraying temperatures;
and spraying the sapphire products step by step from high spraying temperature to low spraying temperature from the highest spraying temperature in the determined plurality of spraying temperatures.
6. The utility model provides a sapphire product belt cleaning device, is applied to sapphire product cleaning machine, sapphire product cleaning machine has a plurality of washing tanks, a serial communication port, sapphire product belt cleaning device includes:
the detection module is used for detecting cleaning end signals of the plurality of cleaning tanks in real time;
the determining module is used for acquiring the cleaning flow and the cleaning process of the sapphire product to be cleaned currently under the condition that a cleaning end signal from any one of the plurality of cleaning tanks is detected; the sapphire product to be cleaned currently is a sapphire product which is not cleaned in any one of the plurality of cleaning tanks currently; determining an initial cleaning tank of the sapphire product to be cleaned currently according to the cleaning flow and the cleaning process; grouping the sapphire products to be cleaned currently according to the determined initial cleaning tank to obtain grouping information, wherein the sapphire products of the same initial cleaning tank are divided into the same group; determining at least one group of sapphire products corresponding to the cleaning tank sending out the cleaning end signal according to the grouping information; respectively determining the cleaning priority of each sapphire product in at least one group of sapphire products according to the determined cleaning process of the at least one group of sapphire products;
and the cleaning module is used for putting the sapphire product with the highest priority in the at least one group of determined sapphire products into the corresponding cleaning tank which sends out a cleaning end signal to perform cleaning operation.
7. The sapphire product cleaning device of claim 6, wherein the cleaning process comprises: the method comprises the following steps that a next cleaning tank into which a sapphire product to be cleaned is to be placed, the waiting time of the sapphire product, the emergency degree of the sapphire product and the occupation time of the sapphire product in the corresponding cleaning tank are obtained; and the waiting time is the time from the moment when the sapphire product starts to execute the cleaning operation according to the cleaning flow to the current moment.
8. The sapphire product cleaning device of claim 7, wherein the determining an initial cleaning tank for the sapphire product currently to be cleaned according to the cleaning process and the cleaning progress comprises:
taking a first cleaning tank in a cleaning flow as the initial cleaning tank according to the cleaning flow under the condition that the sapphire product to be cleaned at present does not start the first cleaning operation;
and under the condition that the sapphire product to be cleaned at present starts the first cleaning operation, taking the next cleaning tank into which the sapphire product is to be put as the initial cleaning tank according to the cleaning process.
9. The sapphire product cleaning device of claim 7, wherein the sapphire product cleaning priority is obtained by:
the cleaning priority is equal to the waiting weight, the waiting duration + the emergency weight, the emergency degree + the occupation weight/the occupation duration.
10. The sapphire product cleaning device of claim 6, wherein the cleaning tank comprises a spray tank;
the cleaning device further comprises:
the spraying control module is used for detecting the current temperature of the sapphire product under the condition that the sapphire product is placed in the spraying groove; under the condition that the current temperature of the sapphire product is higher than the set temperature, determining a plurality of spraying temperatures according to the current temperature of the sapphire product and a prestored spraying temperature table, wherein the spraying temperature table is used for representing the corresponding relation between the current temperature of the sapphire product and the plurality of spraying temperatures; and spraying the sapphire products step by step from high spraying temperature to low spraying temperature from the highest spraying temperature in the determined plurality of spraying temperatures.
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Publication number Priority date Publication date Assignee Title
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Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4892761A (en) * 1985-10-01 1990-01-09 Dainippon Screen Mfg. Co., Ltd. Surface treatment method and apparatus therefor
JPH08153769A (en) * 1994-11-25 1996-06-11 Nippondenso Co Ltd Assembly line system
CN1156898A (en) * 1995-11-24 1997-08-13 日本电气株式会社 Work supplying method and apparatus to batch process apparatus for semiconductor wafer
CN101283440A (en) * 2005-10-05 2008-10-08 东京毅力科创株式会社 Substrate cleaning apparatus, substrate cleaning method, substrate cleaning program and program recording medium
CN102386062A (en) * 2010-09-01 2012-03-21 中芯国际集成电路制造(上海)有限公司 Wafer-cleaning control device and wafer-cleaning control method
CN103913959A (en) * 2014-03-27 2014-07-09 京东方科技集团股份有限公司 Photoresist stripping device and method
CN104662640A (en) * 2012-09-21 2015-05-27 斯克林集团公司 Schedule creation apparatus, schedule creation program, schedule creation method, substrate processing apparatus, and substrate processing method
CN106694443A (en) * 2016-11-30 2017-05-24 北京七星华创电子股份有限公司 Dispatching method and dispatching system for silicon wafer cleaning
CN110534458A (en) * 2019-08-08 2019-12-03 长江存储科技有限责任公司 Cleaning equipment and its cleaning method
CN111487421A (en) * 2019-01-28 2020-08-04 深圳市帝迈生物技术有限公司 Scheduling method, storage medium and sample analyzer
CN112030465A (en) * 2020-08-14 2020-12-04 海尔优家智能科技(北京)有限公司 Method and device for cleaning first object, storage medium and electronic device

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4892761A (en) * 1985-10-01 1990-01-09 Dainippon Screen Mfg. Co., Ltd. Surface treatment method and apparatus therefor
JPH08153769A (en) * 1994-11-25 1996-06-11 Nippondenso Co Ltd Assembly line system
CN1156898A (en) * 1995-11-24 1997-08-13 日本电气株式会社 Work supplying method and apparatus to batch process apparatus for semiconductor wafer
CN101283440A (en) * 2005-10-05 2008-10-08 东京毅力科创株式会社 Substrate cleaning apparatus, substrate cleaning method, substrate cleaning program and program recording medium
CN102386062A (en) * 2010-09-01 2012-03-21 中芯国际集成电路制造(上海)有限公司 Wafer-cleaning control device and wafer-cleaning control method
CN104662640A (en) * 2012-09-21 2015-05-27 斯克林集团公司 Schedule creation apparatus, schedule creation program, schedule creation method, substrate processing apparatus, and substrate processing method
CN103913959A (en) * 2014-03-27 2014-07-09 京东方科技集团股份有限公司 Photoresist stripping device and method
CN106694443A (en) * 2016-11-30 2017-05-24 北京七星华创电子股份有限公司 Dispatching method and dispatching system for silicon wafer cleaning
CN111487421A (en) * 2019-01-28 2020-08-04 深圳市帝迈生物技术有限公司 Scheduling method, storage medium and sample analyzer
CN110534458A (en) * 2019-08-08 2019-12-03 长江存储科技有限责任公司 Cleaning equipment and its cleaning method
CN112030465A (en) * 2020-08-14 2020-12-04 海尔优家智能科技(北京)有限公司 Method and device for cleaning first object, storage medium and electronic device

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