CN113685923B

CN113685923B - Dust-free workshop environment regulation and control method and system for mask production

Info

Publication number: CN113685923B
Application number: CN202111238519.XA
Authority: CN
Inventors: 吴春飞
Original assignee: Nantong Langdi Machinery Technology Co ltd
Current assignee: Nantong Langdi Machinery Technology Co ltd
Priority date: 2021-10-25
Filing date: 2021-10-25
Publication date: 2021-12-21
Anticipated expiration: 2041-10-25
Also published as: CN113685923A

Abstract

The application discloses a dust-free workshop environment regulation and control method and system for mask production, wherein the method comprises the following steps: obtaining a first planning scheme of a dust-free workshop for mask production; obtaining a production material conveying route and a personnel reciprocating route; further obtaining a first route intersection and a second route intersection; generating environment index display information of the first route intersection based on various sensors; sequentially generating first cross point image information and second cross point image information based on a camera device; uploading the environment index display information, the first intersection image information and the second intersection image information to a dust-free workshop environment monitoring system for evaluation to generate a first evaluation result; and dynamically monitoring and regulating the environment of the dust-free workshop for mask production. The technical problem that in the prior art, the environment of the mask production dust-free workshop can not be intelligently regulated and controlled in real time based on activity factors of workers in the mask production dust-free workshop is solved.

Description

Dust-free workshop environment regulation and control method and system for mask production

Technical Field

The application relates to the field of artificial intelligence, in particular to a dust-free workshop environment regulation and control method and system for mask production.

Background

The mask belongs to two types of medical instruments, and no matter the mask is a medical cup-shaped protective mask or a disposable medical mask, the mask must be produced in a dust-free workshop of 10 ten thousand grade (medical term: D grade clean workshop) or more than 10 ten thousand grade, which is a mandatory requirement of the state. The production environment of the mask is dustless and aseptic, the mask with special requirements is produced in a specified constant-temperature constant-humidity environment, and a dustless workshop effectively controls dust particles, harmful gases and bacteria in the air in a space region range through a special structural design in the workshop, so that the indoor temperature, the humidity, the cleanliness, the pressure, the static index and the like are effectively controlled in a certain specific requirement range, and the mask is an indispensable place for mask production. In the practical production, the dust-free mask production workshop is influenced by various factors such as the surrounding environment and the flowing of workers, so that the adaptive dynamic environment regulation and control are carried out according to the real-time environment monitoring condition of the dust-free mask production workshop, and the method is a research subject with practical significance.

In the process of implementing the technical solution in the embodiment of the present application, the inventor of the present application finds that the above-mentioned technology has at least the following technical problems:

the technical problem that the environment of a dust-free workshop for producing the mask cannot be intelligently regulated and controlled in real time based on activity factors of workers in the dust-free workshop for producing the mask exists in the prior art.

Disclosure of Invention

The application aims to provide a dust-free workshop environment regulation and control method and system for mask production, and the technical problem that the environment of a dust-free workshop for mask production cannot be intelligently regulated and controlled in real time based on activity factors of workers in the dust-free workshop for mask production in the prior art is solved.

In view of the above problems, the embodiments of the present application provide a dust-free workshop environment control method and system for mask production.

In a first aspect, the present application provides a dust-free workshop environment regulation and control method for mask production, which is implemented by a dust-free workshop environment regulation and control system for mask production, wherein the method comprises: the method comprises the steps that a first planning scheme of a dust-free workshop is produced through a mask, wherein the first planning scheme comprises a production functional area and an auxiliary functional area; obtaining a production material conveying route of the production functional area and a personnel round-trip route of the auxiliary functional area based on the first planning scheme; obtaining a first route intersection and a second route intersection according to the production material conveying route and the personnel reciprocating route, wherein the first route intersection is adjacent to the production function area, and the second route intersection is adjacent to the auxiliary function area; based on various sensors, monitoring the environment index of the first route intersection in real time, uploading the monitoring result to a dust-free workshop environment monitoring display screen in real time, and generating the environment index display information of the first route intersection; based on a camera device, respectively and dynamically collecting images of the first route intersection and the second route intersection, and sequentially generating first intersection image information and second intersection image information; uploading the environment index display information, the first intersection image information and the second intersection image information to a dust-free workshop environment monitoring system for evaluation to generate a first evaluation result; and dynamically monitoring and regulating the environment of the mask production dust-free workshop according to the first evaluation result.

In another aspect, the present application further provides a dust-free plant environment control system for mask production, configured to execute the dust-free plant environment control method for mask production according to the first aspect, where the system includes: a first obtaining unit: the first obtaining unit is used for obtaining a first planning scheme of a mask production dust-free workshop, wherein the first planning scheme comprises a production functional area and an auxiliary functional area; a second obtaining unit: the second obtaining unit is used for obtaining a production material conveying route of the production functional area and a personnel reciprocating route of the auxiliary functional area based on the first planning scheme; a third obtaining unit: the third obtaining unit is configured to obtain a first route intersection and a second route intersection according to the production material conveying route and the person shuttle route, where the first route intersection is adjacent to the production function area, and the second route intersection is adjacent to the auxiliary function area; a first generation unit: the first generation unit is used for monitoring the environment index of the first route intersection in real time based on various sensors, uploading the monitoring result to a dust-free workshop environment monitoring display screen in real time and generating environment index display information of the first route intersection; a second generation unit: the second generation unit is used for respectively and dynamically acquiring images of the first route intersection and the second route intersection based on the camera device, and sequentially generating first intersection image information and second intersection image information; a third generation unit: the third generation unit is used for uploading the environment index display information, the first intersection image information and the second intersection image information to a dust-free workshop environment monitoring system for evaluation to generate a first evaluation result; a first execution unit: and the first execution unit is used for dynamically monitoring and regulating the environment of the mask production dust-free workshop according to the first evaluation result.

In a third aspect, an embodiment of the present application further provides a cleanroom environment control system for mask production, including a memory, a processor, and a computer program stored on the memory and executable on the processor, where the processor implements the steps of the method according to the first aspect when executing the program.

One or more technical solutions provided in the embodiments of the present application have at least the following technical effects or advantages:

1. the method comprises the steps that a first planning scheme of a dust-free workshop is produced through a mask, wherein the first planning scheme comprises a production functional area and an auxiliary functional area; obtaining a production material conveying route of the production functional area and a personnel round-trip route of the auxiliary functional area based on the first planning scheme; obtaining a first route intersection and a second route intersection according to the production material conveying route and the personnel reciprocating route, wherein the first route intersection is adjacent to the production function area, and the second route intersection is adjacent to the auxiliary function area; based on various sensors, monitoring the environment index of the first route intersection in real time, uploading the monitoring result to a dust-free workshop environment monitoring display screen in real time, and generating the environment index display information of the first route intersection; based on a camera device, respectively and dynamically collecting images of the first route intersection and the second route intersection, and sequentially generating first intersection image information and second intersection image information; uploading the environment index display information, the first intersection image information and the second intersection image information to a dust-free workshop environment monitoring system for evaluation to generate a first evaluation result; and dynamically monitoring and regulating the environment of the mask production dust-free workshop according to the first evaluation result. The technical effect of intelligently and dynamically regulating and controlling the environment of the mask production dust-free workshop based on the environment of the mask production dust-free workshop monitored by various sensors in real time and combined with the activity factors of workers in the mask production dust-free workshop is achieved.

2. The function area distribution planning meeting all the flows of mask production is obtained through the production function area position distribution model, the production circulation AR model among all the production functions is further utilized to obtain the circulation time corresponding to all the simulation position distributions, the position planning scheme when the circulation time is shortest is screened, and the actual position is dynamically adjusted, so that the shortest circulation time of the mask production process is realized, and the pollution risk of mask materials in the production process is reduced.

3. By determining all influencing factors and corresponding weight coefficients of the dust-free workshop influencing mask production, the comprehensive environment index of the dust-free workshop under different factor conditions can be obtained through calculation, and the technical effect of objectively evaluating the comprehensive environment condition of the dust-free workshop with data basis is achieved.

The foregoing description is only an overview of the technical solutions of the present application, and the present application can be implemented according to the content of the description in order to make the technical means of the present application more clearly understood, and the following detailed description of the present application is given in order to make the above and other objects, features, and advantages of the present application more clearly understandable.

Drawings

In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only exemplary, and for those skilled in the art, other drawings can be obtained according to the provided drawings without creative efforts.

FIG. 1 is a schematic flow chart of a dust-free workshop environment control method for mask production according to an embodiment of the present application;

FIG. 2 is a schematic flow chart illustrating the control of the delivery time of the production material to the first intersection and the round trip time of the worker to and from the second intersection in a dust-free shop environment control method for mask production according to an embodiment of the present disclosure;

FIG. 3 is a schematic flow chart illustrating a dynamic adjustment of the position distribution among the production functions in a dust-free workshop environment control method for mask production according to an embodiment of the present disclosure;

FIG. 4 is a schematic flow chart illustrating the generation of the first environmental index in a dust free shop environment control method for mask production according to an embodiment of the present disclosure;

FIG. 5 is a schematic structural diagram of a dust-free shop environment regulation system for mask production according to an embodiment of the present application;

fig. 6 is a schematic structural diagram of an exemplary electronic device according to an embodiment of the present application.

Description of reference numerals:

a first obtaining unit 11, a second obtaining unit 12, a third obtaining unit 13, a fourth obtaining unit 14, a first constructing unit 15, a fifth obtaining unit 16, a sixth obtaining unit 17, a second constructing unit 18, a seventh obtaining unit 19, an eighth obtaining unit 20, a bus 300, a receiver 301, a processor 302, a transmitter 303, a memory 304, and a bus interface 305.

Detailed Description

The embodiment of the application provides a dust-free workshop environment regulation and control method and system for mask production, and solves the technical problem that the environment of a dust-free workshop for mask production can not be intelligently regulated and controlled in real time based on activity factors of workers in the dust-free workshop for mask production in the prior art. The technical effect of intelligently and dynamically regulating and controlling the environment of the mask production dust-free workshop based on the environment of the mask production dust-free workshop monitored by various sensors in real time and combined with the activity factors of workers in the mask production dust-free workshop is achieved.

In the following, the technical solutions in the embodiments of the present application will be clearly and completely described with reference to the accompanying drawings, and it is to be understood that the described embodiments are only a part of the embodiments of the present application, and not all of the embodiments of the present application, and it should be understood that the present application is not limited by the example embodiments described herein. All other embodiments, which can be derived by a person skilled in the art from the embodiments of the present application without making any creative effort, shall fall within the protection scope of the present application. It should be further noted that, for the convenience of description, only some but not all of the elements relevant to the present application are shown in the drawings.

Summary of the application

In view of the above technical problems, the technical solution provided by the present application has the following general idea:

the application provides a dust-free workshop environment regulation and control method for mask production, which is applied to a dust-free workshop environment regulation and control system for mask production, wherein the method comprises the following steps: obtaining a first planning scheme of a dust-free workshop for mask production; obtaining a production material conveying route and a personnel reciprocating route; further obtaining a first route intersection and a second route intersection; generating environment index display information of the first route intersection based on various sensors; sequentially generating first cross point image information and second cross point image information based on a camera device; uploading the environment index display information, the first intersection image information and the second intersection image information to a dust-free workshop environment monitoring system for evaluation to generate a first evaluation result; and dynamically monitoring and regulating the environment of the dust-free workshop for mask production.

Having thus described the general principles of the present application, various non-limiting embodiments thereof will now be described in detail with reference to the accompanying drawings.

Example one

Referring to fig. 1, an embodiment of the present application provides a dust-free workshop environment control method for mask production, where the method is applied to a dust-free workshop environment control system for mask production, and the method specifically includes the following steps:

step S100: obtaining a first planning scheme of a dust-free workshop for mask production, wherein the first planning scheme comprises a production functional area and an auxiliary functional area;

particularly, the dust-free workshop environment regulation and control method for mask production is applied to a dust-free workshop environment regulation and control system for mask production, can monitor the environment of a dust-free workshop for mask production in real time, and intelligently and dynamically regulate and control the environment of the dust-free workshop for mask production by combining activity factors of workers in the dust-free workshop for mask production. Among them, the Clean room is also called Clean room (Clean room), which is a specially designed room for ensuring the mass production of pollution sensitive parts, and is used to remove the pollutants such as micro-particles, harmful gases and bacteria in the air within a certain space range, thereby achieving a proper level of micro-particle cleanliness, and to control the indoor temperature, cleanliness, air pressure, air flow rate and air flow distribution, noise vibration and illumination, static electricity, etc. within a required range. No matter how the external air condition changes, the indoor can maintain the originally set performance characteristics of cleanliness, temperature and humidity, pressure and the like.

The first planning scheme is planning information corresponding to each area in a dust-free workshop for producing the mask, and is any planning scheme for planning the mask production workshop. The first planning scheme comprises an area for mask production in a workshop and an area planning for mask production auxiliary work, namely the production functional area and the auxiliary functional area. By obtaining the first planning scheme of the mask production dust-free workshop, the area division scheme corresponding to different functions in the mask production dust-free workshop is determined.

Step S200: obtaining a production material conveying route of the production functional area and a personnel round-trip route of the auxiliary functional area based on the first planning scheme;

particularly, in the actual mask production process, a worker needs to go back and forth the production functional area and the auxiliary functional area for multiple times, so that the production materials from the auxiliary functional area to the production functional area are conveyed, and therefore after the area division scheme corresponding to different functions in a mask production dust-free workshop is defined, the production material conveying route corresponding to the production functional area and the production material returning route corresponding to the auxiliary functional area after the production materials are conveyed by the worker corresponding to the auxiliary functional area can be further determined, namely, the production material conveying route and the worker returning route are determined. Based on the planning of a dust-free workshop for mask production, the technical effect of making clear the specific line between the mask production area and the auxiliary mask production area for the workers is achieved.

Step S300: obtaining a first route intersection and a second route intersection according to the production material conveying route and the personnel reciprocating route, wherein the first route intersection is adjacent to the production function area, and the second route intersection is adjacent to the auxiliary function area;

specifically, the intersection of the two routes may be further determined based on the specific route for the worker to and from the mask production area and the subsidiary mask production area to transport the production material. Wherein, in the vicinity of the production function area, the production material conveying route and the man-trip route have a first intersection, i.e., the first route intersection; in the vicinity of the auxiliary function area, the production material transport route and the man-trip route have a second intersection, i.e., the second route intersection. The technical effect that the position of a specific intersection of the two routes near the two areas is determined based on the specific route for conveying the production materials between the mask production area and the auxiliary mask production area when a worker returns is achieved.

Step S400: based on various sensors, monitoring the environment index of the first route intersection in real time, uploading the monitoring result to a dust-free workshop environment monitoring display screen in real time, and generating the environment index display information of the first route intersection;

particularly, based on various sensors, the first route intersection environmental index near the production function area is monitored in real time, the monitoring result is uploaded to a dust-free workshop environment monitoring display screen in real time, and the first route intersection environmental index information monitored by the various sensors is displayed in real time through the dust-free workshop environment monitoring display screen. The sensor (English name: transducer/sensor) is a detection device, can sense measured information, and can convert the sensed information into an electric signal or other information output in a required form according to a certain rule so as to meet the requirements of information transmission, processing, storage, display, recording, control and the like. The various sensors of the mask production dust-free workshop comprise various sensors such as a temperature sensor, a humidity sensor, a photosensitive sensor and a pressure sensor, and are respectively used for monitoring various environmental data indexes such as temperature, humidity, light and pressure of the mask production dust-free workshop. The technical effects of monitoring the environmental index of the intersection point accessory of the first route of the mask production dust-free workshop in real time and displaying the environmental index in real time are achieved.

Step S500: based on a camera device, respectively and dynamically collecting images of the first route intersection and the second route intersection, and sequentially generating first intersection image information and second intersection image information;

specifically, the camera device is intelligent camera equipment and can be used for collecting images of an observed object in real time at multiple angles and multiple distances. And dynamically acquiring images of the first route intersection near the production function area and the second route intersection near the auxiliary function area by using the camera respectively, and generating corresponding first intersection image information and second intersection image information respectively. The technical effect of acquiring field images corresponding to the intersections of the two routes of the material conveying route and the personnel back-and-forth route in real time based on the camera device is achieved.

Step S600: uploading the environment index display information, the first intersection image information and the second intersection image information to a dust-free workshop environment monitoring system for evaluation to generate a first evaluation result;

step S700: and dynamically monitoring and regulating the environment of the mask production dust-free workshop according to the first evaluation result.

Specifically, real-time environment index display information of a first cross point accessory, first cross point image information and second cross point image information in a mask production workshop monitored by various sensors in real time are uploaded to a dust-free workshop environment monitoring system for intelligent workshop environment assessment, the dust-free workshop environment monitoring system automatically carries out environment assessment of the mask production dust-free workshop, and the first assessment result is generated. Further, the dust-free workshop environment regulation and control system for mask production is based on the first assessment result, and is used for automatically and dynamically monitoring and regulating and controlling the environment of the dust-free workshop for mask production. The environment of the mask production dust-free workshop is monitored in real time based on various sensors, the activity factors of workers in the mask production dust-free workshop are combined, the environment of the mask production dust-free workshop is evaluated, and finally, the technical effect of dynamic regulation and control of the environment of the mask production dust-free workshop is achieved intelligently based on the evaluation result.

Further, as shown in fig. 2, step S600 in this embodiment of the present application further includes:

step S610: obtaining first product material delivery information for a first time based on the first intersection image information;

step S620: obtaining first staff round trip information at the first time based on the second intersection image information;

step S630: obtaining first environmental index information of the first time based on the environmental index display information;

step S640: judging whether the first environmental index information fluctuates within a preset range or not according to the first product material conveying information and the first worker round-trip information;

step S650: if the first environmental index information fluctuates within the preset range, generating a first regulation and control instruction;

step S660: and regulating and controlling the conveying time of the production materials to the first route intersection and the round trip time of workers to and from the second route intersection according to the first regulating and controlling instruction, wherein the conveying time is later/earlier than the round trip time.

Specifically, first product material conveying information at the first time can be obtained based on image information near the first intersection collected by a camera; similarly, the first staff round trip information at the first time can be obtained based on the image information near the second intersection collected by the camera. The first time refers to any time when a camera collects images in a dust-free workshop for mask production, and the first product conveying information and the first worker round-trip information are both images collected at the same time when workers convey production materials to the production functional area and images collected when the production materials are conveyed to the production functional area and then return to the auxiliary functional area.

Further, based on the environment index display information, the actual environment information near the first route intersection in the mask production dust-free workshop corresponding to the first time, that is, the first environment index information, may be obtained. And judging whether the first environmental index information has fluctuation within a preset range or not by combining the first product material conveying information and the first worker round-trip information. Wherein the preset range refers to a reasonable range of each index of the environment in a dust-free workshop for mask production. When the first environmental index information fluctuates within the preset range, the dust-free workshop environment regulation and control system for mask production automatically generates a first regulation and control instruction for intelligently regulating and controlling the conveying time of the production materials conveyed to the first route intersection and the round-trip time of workers to and from the second route intersection. Wherein the delivery time is later or earlier than the round trip time.

When environmental indexes fluctuate within a preset range in a dust-free workshop for mask production, the system dynamically regulates and controls the time for conveying production materials to the production functional area by workers and the time for returning the production materials to the auxiliary functional area by the production functional area automatically, so that the two action times are staggered, the probability that the production materials are polluted in the conveying path is reduced, and the technical effect of intelligently regulating and controlling the conveying time of the production materials is achieved.

Further, step S640 in the embodiment of the present application further includes:

step S641: if the first environment index information fluctuates in a range larger than the preset range, image screening is carried out on the first staff round-trip information according to the second intersection image information, and first staff image information is generated;

step S642: judging whether the dressing wearing information of the first worker meets the requirements of a preset workshop or not according to the image information of the first worker;

step S643: if the dressing and wearing information of the first worker does not meet the requirement of the preset workshop, generating a first early warning instruction;

step S644: and according to the first early warning instruction, timely early warning is carried out on the dressing wearing information of the first worker, and the dressing wearing information meeting the requirements of the preset workshop is required to be replaced.

Specifically, once the first environmental index information fluctuates within a range larger than the preset range, the dust-free workshop environment regulation and control system for mask production automatically locks the workers in the second cross point image information according to the second cross point image information, and screens the image information of the workers in the reciprocating auxiliary function area, so as to obtain the first worker image information. And further based on the image information of the first staff, judging whether the dressing wearing information of the first staff meets the requirement of a preset workshop, and when intelligently judging that the dressing wearing information of the first staff does not meet the requirement of the preset workshop, immediately sending a first early warning instruction by a system for timely early warning the dressing wearing information of the first staff to remind the staff of replacing the dressing meeting the requirement of the preset workshop.

The technical effects that the environment indexes of the dust-free workshop for mask production are intelligently monitored, the activities of personnel causing the environment index abnormity are immediately searched in the second cross point image when the abnormity occurs, meanwhile, corresponding personnel are screened and determined, and then, the targeted dressing inspection is immediately carried out, and finally, the dressing of the corresponding personnel meets the corresponding production requirements are achieved.

Further, as shown in fig. 3, step S200 in the embodiment of the present application further includes:

step S210: obtaining the position distribution of each production functional area according to the production material conveying route;

step S220: based on the big data, obtaining the production flow distribution of mask production;

step S230: measuring the actual space size of the production functional area to obtain available space information of the production functional area;

step S240: inputting the production flow distribution and the available spatial information of the production functional area into a production functional area position distribution model for simulation training to generate a first training result;

step S250: generating a second regulation and control instruction according to the first training result;

step S260: and dynamically adjusting the position distribution of each production functional area according to the second regulation and control instruction.

Specifically, according to the production material conveying route, the position distribution information of each production functional area can be determined, and meanwhile, the production flow information of mask production can be known based on big data. And measuring the actual space size of the production functional area to obtain available space condition information corresponding to each production functional area. And inputting the production process distribution and the available spatial information of the production functional areas into a production functional area position distribution model for simulation training, wherein the production functional area position distribution model automatically generates a corresponding production functional area distribution scheme, namely the first training result, based on the mask production process and the actual available spatial information of each production functional area. And generating a second regulation and control instruction according to the first training result, and dynamically adjusting the position distribution among all the production functions by a dust-free workshop environment regulation and control system for mask production based on the second regulation and control instruction. The technical effect of dynamically regulating and controlling the production functional area in the dust-free workshop for mask production by combining each process in mask production and utilizing spatial information based on actual workshop conditions is achieved.

Further, step S250 in the embodiment of the present application further includes:

step S251: inputting the production process distribution and the available spatial information of the production functional area into a production functional area position distribution model for simulation training, and training to obtain first simulation position distribution information, second simulation position distribution information and Nth simulation position distribution information;

step S252: inputting the first simulation position distribution information, the second simulation position distribution information and the distribution information of the production function room until the Nth simulation position distribution information into AR models of production function rooms one by one for virtual simulation, and sequentially obtaining first production circulation time, second production circulation time and the Nth production circulation time, wherein the AR models of the production function rooms are in communication connection with the location distribution models of the production function rooms;

step S253: screening the first production circulation time, the second production circulation time and the Nth production circulation time to obtain preset production circulation time, wherein the preset production circulation time is the minimum value of the production circulation times;

step S254: based on the preset production circulation time, obtaining corresponding preset simulation position distribution information through reverse matching;

step S255: and dynamically adjusting the position distribution of each production functional area according to the corresponding preset simulation position distribution information.

Specifically, the production process distribution and the available spatial information of the production functional area are input into a production functional area position distribution model for simulation training, and a plurality of simulation position distribution information from first simulation position distribution information, second simulation position distribution information to Nth simulation position distribution information can be obtained through training. And further inputting the first simulation position distribution information, the second simulation position distribution information and the Nth simulation position distribution information into the production flow AR models among the production functions one by one for virtual simulation, and sequentially obtaining corresponding first production flow time, second production flow time and the Nth production flow time. The production circulation AR model between the production functions is in communication connection with the production function area position distribution model, and the corresponding mask production circulation duration under different position distribution conditions can be intelligently obtained based on the production function area position distribution model and the actual mask production process.

Further, the first production circulation time, the second production circulation time and the Nth production circulation time are screened, and the preset production circulation time corresponding to mask production is obtained under the condition that the available space of the actual functional area is obtained. And the preset production circulation time is the minimum value of the production circulation times, and is obtained by screening after comparing the first production circulation time with the second production circulation time until the Nth production circulation time. And finally, based on the preset production circulation time, obtaining corresponding preset simulation position distribution information when the production circulation time is the shortest in a reverse matching mode, and based on the corresponding preset simulation position distribution information, dynamically adjusting the position distribution of each production functional area.

The function area distribution planning meeting all the flows of mask production is obtained through the production function area position distribution model, the production circulation AR model among all the production functions is further utilized to obtain the circulation time corresponding to all the simulation position distributions, the position planning scheme when the circulation time is shortest is screened, and the actual position is dynamically adjusted, so that the shortest circulation time of the mask production process is realized, and the pollution risk of mask materials in the production process is reduced.

Further, as shown in fig. 4, step S400 in the embodiment of the present application further includes:

step S410: based on various sensors, real-time monitoring is carried out on the environmental index of the first route intersection to obtain first monitoring temperature and humidity information as a first index characteristic, first monitoring cleanliness information is obtained as a second index characteristic, and first monitoring static electricity information is obtained as a third index characteristic;

step S420: performing feature fusion on the first exponential feature, the second exponential feature and the third exponential feature to generate a first environment index of the first route intersection;

step S430: dynamically monitoring the first environmental index.

Specifically, the various sensors include sensors of various different monitoring items, and when the environmental index of the first route intersection is monitored in real time, temperature and humidity information monitored by the sensors is used as a first index characteristic, cleanliness information monitored by the sensors is used as a second index characteristic, and static information monitored by the sensors is used as a third index characteristic. And then, performing feature fusion on the first index feature, the second index feature and the third index feature to generate comprehensive environment index information corresponding to the first route intersection point, namely the first environment index. And finally, dynamically monitoring the first environment index. The technical goal of dynamically monitoring the comprehensive environment of the dust-free frame produced by the mask is achieved by respectively obtaining various environmental indexes based on various sensors and then fusing all the monitored environmental indexes.

step S440: based on big data, obtaining a first influence factor of temperature and humidity on a dust-free workshop environment, a second influence factor of cleanliness on the dust-free workshop environment and a third influence factor of static electricity on the dust-free workshop environment;

step S450: performing traversal analysis on the first influence factor, the second influence factor and the third influence factor to respectively generate a first weight ratio corresponding to the first influence factor, a second weight ratio corresponding to the second influence factor and a third weight ratio corresponding to the third influence factor;

step S460: and performing corresponding weighted calculation on the first monitored temperature and humidity information, the first monitored cleanliness information and the first monitored static electricity information according to the first weight ratio, the second weight ratio and the third weight ratio to generate the first environmental index.

Specifically, based on big data, the temperature and humidity are used as a first influence factor influencing the whole environment of the dust-free workshop, the cleanliness is used as a second influence factor influencing the environment of the dust-free workshop, and static electricity is used as a third influence factor influencing the environment of the dust-free workshop, then all the influence factors are subjected to traversal analysis, and influence degree indexes corresponding to the influence factors are respectively obtained, namely the first weight ratio, the second weight ratio and the third weight ratio. And finally, performing corresponding weighted calculation on the first monitored temperature and humidity information, the first monitored cleanliness information and the first monitored static electricity information according to the influence degree indexes corresponding to the influence factors, and comprehensively generating a first environment index. By determining all influencing factors and corresponding weight coefficients of the dust-free workshop influencing mask production, the comprehensive environment index of the dust-free workshop under different factor conditions can be obtained through calculation, and the technical effect of objectively evaluating the comprehensive environment condition of the dust-free workshop with data basis is achieved.

In summary, the dust-free workshop environment regulation and control method for mask production provided by the embodiment of the application has the following technical effects:

Example two

Based on the dust-free workshop environment regulation and control method for mask production in the previous embodiment, the invention also provides a dust-free workshop environment regulation and control system for mask production, and please refer to fig. 5, wherein the system comprises:

the first obtaining unit 11: the first obtaining unit 11 is configured to obtain a first planning scheme of a dust-free mask production workshop, where the first planning scheme includes a production functional area and an auxiliary functional area;

the second obtaining unit 12: the second obtaining unit 12 is configured to obtain a production material conveying route of the production functional area and a staff round trip route of the auxiliary functional area based on the first planning scheme;

the third obtaining unit 13: the third obtaining unit 13 is configured to obtain a first route intersection and a second route intersection according to the production material conveying route and the person shuttle route, where the first route intersection is adjacent to the production functional area, and the second route intersection is adjacent to the auxiliary functional area;

the first generation unit 14: the first generation unit 14 is configured to monitor the environment index of the first route intersection in real time based on various sensors, upload a monitoring result to a dust-free workshop environment monitoring display screen in real time, and generate environment index display information of the first route intersection;

the second generation unit 15: the second generating unit 15 is configured to dynamically acquire images of the first route intersection and the second route intersection, respectively, based on a camera device, and sequentially generate first intersection image information and second intersection image information;

third generation unit 16: the third generating unit 16 is configured to upload the environment index display information, the first intersection image information, and the second intersection image information to a dust-free workshop environment monitoring system for evaluation, and generate a first evaluation result;

the first execution unit 17: the first execution unit 17 is configured to dynamically monitor and regulate and control the environment of the mask production dust-free workshop according to the first evaluation result.

Further, the system further comprises:

a fourth obtaining unit configured to obtain first product material transportation information at a first time based on the first intersection image information;

a fifth obtaining unit, configured to obtain first staff round trip information at the first time based on the second intersection image information;

a sixth obtaining unit configured to obtain first environment index information at the first time based on the environment index display information;

the first judgment unit is used for judging whether the first environmental index information fluctuates within a preset range or not according to the first product material conveying information and the first worker round-trip information;

a fourth generating unit, configured to generate a first regulation instruction if the first environmental index information fluctuates within the preset range;

and the second execution unit is used for regulating and controlling the conveying time of the production materials conveyed to the first route intersection and the round trip time of workers to and from the second route intersection according to the first regulating and controlling instruction, wherein the conveying time is later than/earlier than the round trip time.

Further, the system further comprises:

a fifth generating unit, configured to, if the first environment index information fluctuates in a range larger than the preset range, perform image screening on the first staff round-trip information according to the second intersection image information, and generate first staff image information;

the second judging unit is used for judging whether the dressing wearing information of the first worker meets the requirement of a preset workshop or not according to the image information of the first worker;

a sixth generating unit, configured to generate a first warning instruction if the dressing information of the first worker does not meet the preset workshop requirement;

and the first early warning unit is used for carrying out timely early warning on the dressing wearing information of the first worker according to the first early warning instruction, and the dressing wearing information meeting the requirements of the preset workshop is required to be replaced.

Further, the system further comprises:

a seventh obtaining unit, configured to obtain position distribution among the production functions according to the production material conveying route;

an eighth obtaining unit, configured to obtain a production flow distribution of mask production based on the big data;

a ninth obtaining unit, configured to measure an actual space size of the production functional area, and obtain available space information of the production functional area;

a seventh generating unit, configured to input the production process distribution and the spatial information available in the production functional area into a position distribution model of a production functional area position distribution model for simulation training, so as to generate a first training result;

an eighth generating unit, configured to generate a second regulation instruction according to the first training result;

and the third execution unit is used for dynamically adjusting the position distribution among the production functions according to the second regulation and control instruction.

Further, the system further comprises:

a tenth obtaining unit, configured to input the production process distribution and the spatial information available in the production functional area into a production functional area location distribution model for simulation training, where the training obtains first simulation location distribution information, second simulation location distribution information, and up to nth simulation location distribution information;

an eleventh obtaining unit, configured to input the first simulation position distribution information, the second simulation position distribution information, and up to the nth simulation position distribution information one by one into each inter-production-function production flow AR model for virtual simulation, and sequentially obtain a first production flow time, a second production flow time, and up to the nth production flow time, where the inter-production-function production flow AR models are in communication connection with the production-function location position distribution model;

a twelfth obtaining unit, configured to screen the first production circulation time, the second production circulation time, and the nth production circulation time to obtain a preset production circulation time, where the preset production circulation time is a minimum value of the production circulation times;

a thirteenth obtaining unit, configured to obtain, based on the preset production circulation time, corresponding preset simulation position distribution information through reverse matching;

and the fourth execution unit is used for dynamically adjusting the position distribution of each production functional area according to the corresponding preset simulation position distribution information.

Further, the system further comprises:

a fourteenth obtaining unit, configured to perform real-time monitoring on the environmental index of the first route intersection based on various sensors, obtain first monitored temperature and humidity information as a first index feature, obtain first monitored cleanliness information as a second index feature, and obtain first monitored static electricity information as a third index feature;

a ninth generating unit, configured to perform feature fusion on the first exponential feature, the second exponential feature, and the third exponential feature, and generate a first environment index of the first route intersection;

a fifth execution unit to dynamically monitor the first environmental index.

Further, the system further comprises:

a fifteenth obtaining unit, configured to obtain, based on big data, a first influence factor of temperature and humidity on a dust-free workshop environment, a second influence factor of cleanliness on the dust-free workshop environment, and a third influence factor of static electricity on the dust-free workshop environment;

a tenth generating unit, configured to perform traversal analysis on the first, second, and third influencing factors, and generate a first weight ratio corresponding to the first influencing factor, a second weight ratio corresponding to the second influencing factor, and a third weight ratio corresponding to the third influencing factor, respectively;

an eleventh generating unit, configured to perform corresponding weighted calculation on the first monitored temperature and humidity information, the first monitored cleanliness information, and the first monitored static electricity information according to the first weight proportion, the second weight proportion, and the third weight proportion, and generate the first environmental index.

In the present description, each embodiment is described in a progressive manner, and the focus of the description of each embodiment is on the difference from other embodiments, the dust-free shop environment regulation method for mask production in the first embodiment of fig. 1 and the specific example are also applicable to the dust-free shop environment regulation system for mask production in the present embodiment, and through the foregoing detailed description of the dust-free shop environment regulation method for mask production, those skilled in the art can clearly know the dust-free shop environment regulation system for mask production in the present embodiment, so for the brevity of the description, detailed description is not repeated here. The device disclosed by the embodiment corresponds to the method disclosed by the embodiment, so that the description is simple, and the relevant points can be referred to the method part for description.

The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the application. Thus, the present application is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

The electronic apparatus of the embodiment of the present application is described below with reference to fig. 6.

Fig. 6 illustrates a schematic structural diagram of an electronic device according to an embodiment of the present application.

Based on the inventive concept of the dust-free workshop environment regulation and control method for the mask production in the previous embodiment, the invention also provides a dust-free workshop environment regulation and control system for the mask production, wherein a computer program is stored on the dust-free workshop environment regulation and control system, and when the computer program is executed by a processor, the steps of any one of the above-mentioned dust-free workshop environment regulation and control methods for the mask production are realized.

Where in fig. 6 a bus architecture (represented by bus 300), bus 300 may include any number of interconnected buses and bridges, bus 300 linking together various circuits including one or more processors, represented by processor 302, and memory, represented by memory 304. The bus 300 may also link together various other circuits such as peripherals, voltage regulators, power management circuits, and the like, which are well known in the art, and therefore, will not be described any further herein. A bus interface 305 provides an interface between the bus 300 and the receiver 301 and transmitter 303. The receiver 301 and the transmitter 303 may be the same element, i.e., a transceiver, providing a means for communicating with various other apparatus over a transmission medium.

The processor 302 is responsible for managing the bus 300 and general processing, and the memory 304 may be used for storing data used by the processor 302 in performing operations.

The application provides a dust-free workshop environment regulation and control method for mask production, which is applied to a dust-free workshop environment regulation and control system for mask production, wherein the method comprises the following steps: obtaining a first planning scheme of a dust-free workshop for mask production; obtaining a production material conveying route and a personnel reciprocating route; further obtaining a first route intersection and a second route intersection; generating environment index display information of the first route intersection based on various sensors; sequentially generating first cross point image information and second cross point image information based on a camera device; uploading the environment index display information, the first intersection image information and the second intersection image information to a dust-free workshop environment monitoring system for evaluation to generate a first evaluation result; and dynamically monitoring and regulating the environment of the dust-free workshop for mask production. The technical problem that in the prior art, the environment of the mask production dust-free workshop can not be intelligently regulated and controlled in real time based on activity factors of workers in the mask production dust-free workshop is solved. The technical effect of intelligently and dynamically regulating and controlling the environment of the mask production dust-free workshop based on the environment of the mask production dust-free workshop monitored by various sensors in real time and combined with the activity factors of workers in the mask production dust-free workshop is achieved.

As will be appreciated by one skilled in the art, embodiments of the present application may be provided as a method, apparatus, or computer program product. Accordingly, the present application may take the form of an entirely software embodiment, an entirely hardware embodiment, or an embodiment combining software and hardware aspects. Furthermore, the present application is in the form of a computer program product that may be embodied on one or more computer-usable storage media having computer-usable program code embodied therewith. And such computer-usable storage media include, but are not limited to: various media capable of storing program codes, such as a usb disk, a removable hard disk, a Read-Only Memory (ROM), a Random Access Memory (RAM), a magnetic disk Memory, a Compact Disc Read-Only Memory (CD-ROM), and an optical Memory.

The present invention is described with reference to flowchart illustrations and/or block diagrams of methods, apparatus (systems) and computer program products according to embodiments of the invention. It will be understood that each flow and/or block of the flow diagrams and/or block diagrams, and combinations of flows and/or blocks in the flow diagrams and/or block diagrams, can be implemented by computer program instructions. These computer program instructions may be provided to a processor of a general purpose computer, special purpose computer, embedded processor, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, create a system for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.

These computer program instructions may also be stored in a computer-readable memory that can direct a computer or other programmable data processing apparatus to function in a particular manner, such that the instructions stored in the computer-readable memory produce an article of manufacture including an instruction system which implement the function specified in the flowchart flow or flows and/or block diagram block or blocks.

These computer program instructions may also be loaded onto a computer or other programmable data processing apparatus to cause a series of operational steps to be performed on the computer or other programmable apparatus to produce a computer implemented process such that the instructions which execute on the computer or other programmable apparatus provide steps for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks. While preferred embodiments of the present invention have been described, additional variations and modifications in those embodiments may occur to those skilled in the art once they learn of the basic inventive concepts. Therefore, it is intended that the appended claims be interpreted as including preferred embodiments and all such alterations and modifications as fall within the scope of the invention.

It will be apparent to those skilled in the art that various changes and modifications may be made in the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.

Claims

1. A method for dust free plant environment regulation in mask production, wherein the method comprises:

obtaining a first planning scheme of a dust-free workshop for mask production, wherein the first planning scheme comprises a production functional area and an auxiliary functional area;

obtaining a production material conveying route of the production functional area and a personnel round-trip route of the auxiliary functional area based on the first planning scheme;

obtaining a first route intersection and a second route intersection according to the production material conveying route and the personnel reciprocating route, wherein the first route intersection is adjacent to the production function area, and the second route intersection is adjacent to the auxiliary function area;

based on various sensors, monitoring the environment index of the first route intersection in real time, uploading the monitoring result to a dust-free workshop environment monitoring display screen in real time, and generating the environment index display information of the first route intersection;

based on a camera device, respectively and dynamically collecting images of the first route intersection and the second route intersection, and sequentially generating first intersection image information and second intersection image information;

uploading the environment index display information, the first intersection image information and the second intersection image information to a dust-free workshop environment monitoring system for evaluation to generate a first evaluation result;

and dynamically monitoring and regulating the environment of the mask production dust-free workshop according to the first evaluation result.

2. The method of claim 1, wherein the method further comprises:

obtaining first product material delivery information for a first time based on the first intersection image information;

obtaining first staff round trip information at the first time based on the second intersection image information;

obtaining first environmental index information of the first time based on the environmental index display information;

judging whether the first environmental index information fluctuates within a preset range or not according to the first product material conveying information and the first worker round-trip information;

if the first environmental index information fluctuates within the preset range, generating a first regulation and control instruction;

and regulating and controlling the conveying time of the production materials to the first route intersection and the round trip time of workers to and from the second route intersection according to the first regulating and controlling instruction, wherein the conveying time is later/earlier than the round trip time.

3. The method of claim 2, wherein the determining whether the first environmental index information has fluctuation within a preset range further comprises:

if the first environment index information fluctuates in a range larger than the preset range, image screening is carried out on the first staff round-trip information according to the second intersection image information, and first staff image information is generated;

judging whether the dressing wearing information of the first worker meets the requirements of a preset workshop or not according to the image information of the first worker;

if the dressing and wearing information of the first worker does not meet the requirement of the preset workshop, generating a first early warning instruction;

and according to the first early warning instruction, timely early warning is carried out on the dressing wearing information of the first worker, and the dressing wearing information meeting the requirements of the preset workshop is required to be replaced.

4. The method of claim 1, wherein the method further comprises:

obtaining the position distribution of each production functional area according to the production material conveying route;

based on the big data, obtaining the production flow distribution of mask production;

measuring the actual space size of the production functional area to obtain available space information of the production functional area;

inputting the production flow distribution and the available spatial information of the production functional area into a production functional area position distribution model for simulation training to generate a first training result;

generating a second regulation and control instruction according to the first training result;

and dynamically adjusting the position distribution of each production functional area according to the second regulation and control instruction.

5. The method of claim 4, wherein the generating second regulatory instructions further comprises:

inputting the production process distribution and the available spatial information of the production functional area into a production functional area position distribution model for simulation training, and training to obtain first simulation position distribution information, second simulation position distribution information and Nth simulation position distribution information;

inputting the first simulation position distribution information, the second simulation position distribution information and the distribution information of the production function room until the Nth simulation position distribution information into AR models of production function rooms one by one for virtual simulation, and sequentially obtaining first production circulation time, second production circulation time and the Nth production circulation time, wherein the AR models of the production function rooms are in communication connection with the location distribution models of the production function rooms;

screening the first production circulation time, the second production circulation time and the Nth production circulation time to obtain preset production circulation time, wherein the preset production circulation time is the minimum value of the production circulation times;

based on the preset production circulation time, obtaining corresponding preset simulation position distribution information through reverse matching;

and dynamically adjusting the position distribution of each production functional area according to the corresponding preset simulation position distribution information.

6. The method of claim 1, wherein the generating environmental index display information for the first route intersection further comprises:

based on various sensors, real-time monitoring is carried out on the environmental index of the first route intersection to obtain first monitoring temperature and humidity information as a first index characteristic, first monitoring cleanliness information is obtained as a second index characteristic, and first monitoring static electricity information is obtained as a third index characteristic;

performing feature fusion on the first exponential feature, the second exponential feature and the third exponential feature to generate a first environment index of the first route intersection;

dynamically monitoring the first environmental index.

7. The method of claim 6, wherein the generating a first environmental index for the first route intersection further comprises:

based on big data, obtaining a first influence factor of temperature and humidity on a dust-free workshop environment, a second influence factor of cleanliness on the dust-free workshop environment and a third influence factor of static electricity on the dust-free workshop environment;

performing traversal analysis on the first influence factor, the second influence factor and the third influence factor to respectively generate a first weight ratio corresponding to the first influence factor, a second weight ratio corresponding to the second influence factor and a third weight ratio corresponding to the third influence factor;

and performing corresponding weighted calculation on the first monitored temperature and humidity information, the first monitored cleanliness information and the first monitored static electricity information according to the first weight ratio, the second weight ratio and the third weight ratio to generate the first environmental index.

8. A dust free plant environment regulation system for mask production, wherein the system comprises:

a first obtaining unit: the first obtaining unit is used for obtaining a first planning scheme of a mask production dust-free workshop, wherein the first planning scheme comprises a production functional area and an auxiliary functional area;

a second obtaining unit: the second obtaining unit is used for obtaining a production material conveying route of the production functional area and a personnel reciprocating route of the auxiliary functional area based on the first planning scheme;

a third obtaining unit: the third obtaining unit is configured to obtain a first route intersection and a second route intersection according to the production material conveying route and the person shuttle route, where the first route intersection is adjacent to the production function area, and the second route intersection is adjacent to the auxiliary function area;

a first generation unit: the first generation unit is used for monitoring the environment index of the first route intersection in real time based on various sensors, uploading the monitoring result to a dust-free workshop environment monitoring display screen in real time and generating environment index display information of the first route intersection;

a second generation unit: the second generation unit is used for respectively and dynamically acquiring images of the first route intersection and the second route intersection based on the camera device, and sequentially generating first intersection image information and second intersection image information;

a third generation unit: the third generation unit is used for uploading the environment index display information, the first intersection image information and the second intersection image information to a dust-free workshop environment monitoring system for evaluation to generate a first evaluation result;

a first execution unit: and the first execution unit is used for dynamically monitoring and regulating the environment of the mask production dust-free workshop according to the first evaluation result.

9. A cleanroom environment conditioning system for mask production, comprising a memory, a processor, and a computer program stored on the memory and executable on the processor, wherein the processor executes the program to perform the steps of the method of any of claims 1-7.