CN113655690B - On-press developing negative thermosensitive CTP plate material - Google Patents

On-press developing negative thermosensitive CTP plate material Download PDF

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CN113655690B
CN113655690B CN202110916017.1A CN202110916017A CN113655690B CN 113655690 B CN113655690 B CN 113655690B CN 202110916017 A CN202110916017 A CN 202110916017A CN 113655690 B CN113655690 B CN 113655690B
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photosensitive
film
forming resin
ethylenically unsaturated
upper layer
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CN113655690A (en
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彭朝珍
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)

Abstract

The embodiment of the invention provides an on-press development type negative thermosensitive CTP plate, which is characterized by comprising the following components: a plate substrate; a hydrophilic layer covering the surface of the plate substrate; the photosensitive underlayer is covered on the surface of the hydrophilic layer and consists of first film forming resin, a first infrared absorber, a first photoinitiator and a first ethylenically unsaturated compound; the photosensitive upper layer is covered on the surface of the photosensitive lower layer, and consists of a second film-forming resin, a second infrared absorbent, a second photoinitiator and a second ethylenically unsaturated compound. The embodiment of the invention sequentially coats the photosensitive lower layer and the photosensitive upper layer on the substrate subjected to hydrophilization surface treatment, so that the plate has the advantages of high photosensitive speed, high on-press development and ink balancing speed, high printing resistance and the like, and has good scratch resistance and storage stability.

Description

On-press developing negative thermosensitive CTP plate material
Technical Field
The invention relates to an on-press development type negative thermosensitive CTP plate.
Background
Currently, on-press development CTP plates are divided into two types, a double-layer structure and a single-layer structure. The upper layer of the plate with the double-layer structure is mainly used for oxygen resistance and protection, water-soluble polymers such as PVA (polyvinyl alcohol) are mainly used as main components, and the lower layer of the plate with the double-layer structure is a photosensitive layer and is mainly used for imaging and printing; however, when the plate with a double-layer structure is developed on the machine, the protective layer is usually dissolved by the fountain solution and then swells the photosensitive layer in the non-imaging area, and the protective layer is dissolved and then enters the fountain system to easily cause pollution, so that the updating frequency of the fountain solution needs to be increased; meanwhile, the protective layer and the photosensitive layer can be mutually dissolved in the coating process, the problem of low inking speed of an imaging area is caused by over-strong surface hydrophilicity, and meanwhile, the printing resistance is reduced. The problems of low inking speed and insufficient printing resistance rate caused by insufficient curing due to oxygen polymerization inhibition in the exposure process of the plate with a single-layer structure, and image-text defects caused by excessive sensitivity to scratches are solved. In the storage process of the on-press developing CTP plate, the on-press developing speed is continuously reduced due to dark reaction of active components, change of binding force between a coating and a plate base and the like, and the storage performance of the plate is generally influenced. Therefore, how to solve the problems of slower photosensitive speed, slow balance speed between on-press development and ink, insufficient printing resistance and excessive sensitivity to scratches of the existing on-press development type CTP plate becomes a current urgent need to be solved.
Disclosure of Invention
The invention aims to provide an on-press development type negative thermosensitive CTP plate material, which is used for solving the problems of low photosensitive speed, low on-press development and ink balance speed, insufficient printing resistance and oversensitivity to scratches of the traditional on-press development type CTP plate.
One aspect of an embodiment of the present invention provides an on-press developed negative thermosensitive CTP plate comprising: a plate substrate; a hydrophilic layer covering the surface of the plate substrate; the photosensitive underlayer is covered on the surface of the hydrophilic layer and consists of first film forming resin, a first infrared absorber, a first photoinitiator and a first ethylenically unsaturated compound; the photosensitive upper layer is covered on the surface of the photosensitive lower layer, and consists of a second film-forming resin, a second infrared absorbent, a second photoinitiator and a second ethylenically unsaturated compound.
Optionally, the plate substrate is an aluminum plate substrate.
Optionally, the surface of the plate substrate is treated with a hydrophilizing surface, and the hydrophilizing layer is coated on the surface treated with the hydrophilizing surface.
Optionally, the photosensitive underlayer is characterized by a water contact angle after drying, wherein the contact angle of water corresponding to the photosensitive underlayer is: 0-60 degrees; the photosensitive upper layer is subjected to characterization treatment of a contact angle of water after drying, wherein the contact angle of water corresponding to the photosensitive upper layer is as follows: 40-120 deg.
Optionally, the first film forming resin is: a high molecular polymer with a main chain containing hydroxyl, carboxyl, alkyl ether chain segments or phosphate groups; or the first film-forming resin is: a polymer having a branched chain comprising a hydroxyl group, a carboxyl group, an alkyl ether segment or a phosphate group; wherein the weight average molecular weight of the first film-forming resin is: 5000-800000.
Optionally, the second film forming resin is: a high molecular polymer with a main chain containing hydroxyl, carboxyl, alkyl ether chain segments or phosphate groups; or the second film-forming resin is: a polymer having a branched chain comprising a hydroxyl group, a carboxyl group, an alkyl ether segment and/or a phosphate group; wherein the hydrophilic group content of the second film-forming resin is reduced as compared to the hydrophilic group content of the first film-forming resin: 20% -80%.
Optionally, the weight percentage of the first film forming resin in the dry film of the photosensitive lower layer is as follows: 10% -50%; the weight percentage of the second film forming resin in the dry film of the photosensitive upper layer is as follows: 10 to 50 percent.
Optionally, the weight percentage of the first infrared absorber in the dry film of the photosensitive underlayer is: 0.5% -5%; the weight percentage of the second infrared absorbing agent in the dry film of the photosensitive upper layer is as follows: 0.5 to 5 percent.
Optionally, the weight percentage of the first photoinitiator in the dry film of the photosensitive lower layer is as follows: 2% -20%; the weight percentage of the second photoinitiator in the dry film of the photosensitive upper layer is as follows: 2% -22%.
Optionally, the weight percentage of the first ethylenically unsaturated compound in the dry film of the photosensitive underlayer is: 5% -80%; the weight percentage of the second ethylenically unsaturated compound in the dry film of the photosensitive upper layer is as follows: 5% -80%.
The embodiment of the invention sequentially coats the photosensitive lower layer and the photosensitive upper layer on the substrate subjected to hydrophilization surface treatment, so that the plate has the advantages of high photosensitive speed, high on-press development and ink balancing speed, high printing resistance and the like, and has good scratch resistance and storage stability.
Drawings
Fig. 1 schematically shows an overall schematic of the on-press development type negative thermosensitive CTP plate of the present embodiment.
Fig. 2 schematically shows a chemical structure diagram of a light absorbing dye of the on-press development type negative thermosensitive CTP plate of the present embodiment.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
It should be noted that the descriptions of "first," "second," etc. in the embodiments of the present invention are for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include at least one such feature. In addition, the technical solutions of the embodiments may be combined with each other, but it is necessary to base that the technical solutions can be realized by those skilled in the art, and when the technical solutions are contradictory or cannot be realized, the combination of the technical solutions should be considered to be absent and not within the scope of protection claimed in the present invention.
An exemplary description of the on-press development type negative thermosensitive CTP plate of the patent protection will be given below by way of examples.
As shown in fig. 1, in this embodiment, the on-press development type negative thermosensitive CTP plate includes a plate substrate 10, wherein the plate substrate 10 is an aluminum plate substrate, and a hydrophilic layer 20, a photosensitive lower layer 30 and a photosensitive upper layer 40 are sequentially disposed on the plate substrate 10. Wherein: the hydrophilic layer 20 covers the surface of the plate substrate 10, the surface of the plate substrate 10 is treated with a hydrophilizing surface, and the hydrophilic layer 20 is coated on the surface treated with the hydrophilizing surface. The photosensitive underlayer 30 covers the surface of the hydrophilic layer 20, and the photosensitive underlayer 30 is composed of a first film forming resin, a first infrared absorber, a first photoinitiator, and a first ethylenically unsaturated compound. The photosensitive upper layer 40 covers the surface of the photosensitive lower layer 30, and the photosensitive upper layer 40 is composed of a second film-forming resin, a second infrared absorber, a second photoinitiator, and a second ethylenically unsaturated compound. In this example, a support subjected to hydrophilization surface treatment is coated with a photosensitive lower layer 30 and a photosensitive upper layer 40 in this order. Wherein, the photosensitive lower layer 30 and the photosensitive upper layer 40 can be composed of film-forming resin, infrared absorbing agent, photoinitiator, ethylenically unsaturated compound, etc.; because the photosensitive underlayer 30 has a relatively strong hydrophilicity, it can be rapidly infiltrated and swelled by the fountain solution before exposure; while the photosensitive upper layer 40 has a high photosensitive speed and weak hydrophilicity than the lower layer, is slowly permeated by the fountain solution before exposure, and has good ink affinity. Therefore, compared with the existing negative type thermosensitive CTP plate, the negative type thermosensitive CTP plate has the advantages of high photosensitive speed, high on-press development and ink balancing speed, high printing resistance and the like, and has good scratch resistance and storage stability.
It should be noted that CTP (Computer To Plate computer to plate) technology has replaced the traditional analog plate making method because of its advantages of digitalization, simplicity, high efficiency, and high quality. Along with the continuous improvement of the green environmental protection requirement of the printing industry, the on-press development type CTP plate material does not need chemical development, so that the influence on the environment is reduced to the greatest extent, the overall plate making cost is reduced, the plate making process is shortened, the production efficiency is improved, and the development direction of the printing plate material technology is realized. After the on-press development type CTP plate is exposed and imaged on direct plate making equipment, the on-press printing can be performed without any subsequent processing procedure, and the chemical development and washing processing procedure is avoided. After the plate is fixed on a plate cylinder of a printing machine, the unexposed area is fully soaked and swelled by a dampening solution system to be loosened; transferring the coating of the unexposed area to a blanket through the viscosity of the ink, and further taking away through paper, wherein the coating is a physical development process; and (3) leaving an exposure curing area, and adhering ink to complete image-text copying.
In an exemplary embodiment, after the photosensitive lower layer 30 is coated on the surface of the hydrophilic layer 20, the photosensitive lower layer 30 may be subjected to a drying process; the coating weight of the dried photosensitive underlayer 30 may be: the coating weight of the photosensitive underlayer 30 after drying is preferably 0.5 to 1.5g/m2 in this embodiment, and is 0.5 to 1.0g/m2.
In an exemplary embodiment, the photosensitive underlayer 30 may perform a characterization process on the contact angle of water after drying, where the contact angle of water corresponding to the photosensitive underlayer 30 is: 0-60 degrees; the contact angle of water corresponding to the photosensitive underlayer 30, which is preferable in this embodiment, is: 5-20 deg.
In an exemplary embodiment, the photosensitive underlayer 30 is composed of a first film forming resin, a first infrared absorber, a first photoinitiator, and a first ethylenically unsaturated compound. Wherein the first film-forming resin is: a high molecular polymer with a main chain containing hydroxyl, carboxyl, alkyl ether chain segments or phosphate groups; or the first film-forming resin is: a polymer having a branched chain comprising a hydroxyl group, a carboxyl group, an alkyl ether segment or a phosphate group; wherein the weight average molecular weight of the first film-forming resin is: 5000-800000. The weight average molecular weight of the first film-forming resin preferable in this example is: 5000-300000. Since the first film-forming resin must be a polymer that is soluble in or swellable by water, the first film-forming resin may be a polymer that contains hydrophilic groups such as hydroxyl groups, carboxyl groups, alkyl ether segments, and phosphate groups in the main chain or in the side chains, and the polymer of such hydrophilic groups may include:
(1) Addition polymers having carboxylic acid groups in the side chains, i.e., methacrylic acid copolymers, acrylic acid copolymers, itaconic acid copolymers, crotonic acid copolymers, maleic acid copolymers, partially esterified maleic acid copolymers, and the like;
(2) An acidic cellulose derivative having a carboxylic acid group in a side chain;
(3) A polymer obtained by adding a cyclic acid anhydride to an addition polymer having a hydroxyl group;
(4) Polyvinyl acetal polymers having carboxylic acid groups in side chains;
(5) Addition polymers having a phosphate group in a side chain such as addition polymers containing a vinyl phosphate unit, and the like.
Wherein the first film-forming resin may be one or a combination of several of the above-mentioned high molecular polymers.
In an exemplary embodiment, the weight percentage of the first film forming resin in the dry film of the photosensitive lower layer 30 is: 10% -50%; the weight percentage of the first film forming resin in the dry film of the photosensitive lower layer 30 is preferably as follows: 20% -35%.
In some embodiments, the first infrared absorber can be any compound that absorbs infrared light and converts the infrared light to heat. For example, an absorbing dye that absorbs light at wavelengths of 760-1200 nm, which does not substantially absorb or absorb but does not sense UV (Ultraviolet Rays ultraviolet) light, and which is not altered by weak ultraviolet light, including white light. The light absorbing dye is specifically shown in fig. 2, and in fig. 2:
Each X may independently be S, O, NR or C (alkyl);
Each R 1 can independently be alkyl, alkylsulfonate, or alkylammonium;
R 2 can be hydrogen, halogen, SR, S0 2 R, OR or NR 2;
Each R 3 can independently be hydrogen, alkyl, COOR, OR, SR, S0 3 —、NR2, halogen, and optionally substituted benzofused rings;
A — represents an anion;
-represents an optional five-or six-membered carbocyclic ring;
wherein each n may independently be 0, 1,2 or 3.
If R 1 is an alkyl sulfonate, A — may not be present due to the formation of the internal salt, and an alkali metal cation would be necessary as a counter ion.
If R 1 is an alkylammonium group, a second anion will be required as a counter ion. The second anion may be the same as a — or may be a different anion.
Among these dyes, preferred are cyanine dyes, polymethine dyes, squarylium dye chromium dyes, pyrylium and thiopyrylium dyes; particularly suitable are cyanine dyes, polymethine dyes, pyrylium dyes and thiopyrylium dyes.
In an exemplary embodiment, the first infrared absorber is present in the dry film of the photoactive underlayer 30 in weight percent: 0.5% -5%; the preferred weight percentages of the first infrared absorber in the dry film of the photoactive underlayer 30 in this embodiment are: 1 to 2.5 percent.
In some embodiments, the first photoinitiator may be any one photoinitiator or a combination of two or more photoinitiators. In this embodiment, photoinitiator onium salts such as sulfonium salts, diazonium salts or iodonium salts, or triazine initiators are preferred, and these photoinitiators can have significant intermolecular electron or energy transfer with the above infrared light absorber during exposure, thus ensuring high infrared initiation efficiency.
In an exemplary embodiment, the first photoinitiator is present in the dry film of the photoactive underlayer 30 in weight percent: 2% -20%; the preferred weight percentages of the first photoinitiator in the dry film of the photoactive underlayer 30 in this embodiment are: 5-15%. In this embodiment, a thiol compound such as 2-mercaptobenzothiazole, 2-mercaptobenzimidazole, 2-mercaptobenzoxazole, or a hydrogen-donating compound such as an amine compound such as N-phenylglycine, N-dialkylamino aromatic alkyl ester may be added to the first photoinitiator to further enhance the initiation ability of the first photoinitiator. Wherein the weight percentage of the hydrogen donating compound in the dry film of the photosensitive underlayer 30 is: 0.1 to 5% by weight of a preferred hydrogen donating compound in this embodiment in the dry film of the photosensitive underlayer 30 is: 0.2 to 2.5 percent.
The ethylenically unsaturated compound is a compound having an ethylenically unsaturated bond that undergoes addition polymerization, crosslinking, and curing by the action of a photopolymerization initiator when the photosensitive composition is irradiated with active light. The first ethylenically unsaturated compound may be a compound containing an ethylenically double bond capable of addition polymerization, and for example, this embodiment may be one arbitrarily selected from compounds having at least 1 terminal ethylenically unsaturated bond as the first ethylenically unsaturated compound, and in this embodiment, the preferred first ethylenically unsaturated compound may be a compound having 2 or more terminal ethylenically unsaturated bonds.
The ethylenically unsaturated bond compound may be a monomer, a prepolymer (i.e., a 2-mer, a 3-mer, and an oligomer), a mixture of the monomer and the prepolymer, a copolymer of the monomer and the prepolymer, or the like. Wherein the monomer and copolymer may be an ester of an unsaturated carboxylic acid (e.g., acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.) and an aliphatic polyol compound, an amide of an unsaturated carboxylic acid and an aliphatic polyamine compound, or the like.
For ease of understanding, the present embodiment provides examples of monomers of the aliphatic polyol compound and the ester of unsaturated carboxylic acid, specifically including: ethylene glycol diacrylate, triethylene glycol diacrylate, 1, 3-butanediol diacrylate, 1, 4-butanediol diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tris (acryloxypropyl) ether, trimethylolethane triacrylate, hexanediol diacrylate, 1, 4-cyclohexanediol diacrylate, tetraethylene glycol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tris (acryloxyethyl) isocyanurate, polyester acrylate oligomers, and the like.
The present embodiment also provides some examples of the methacrylates, specifically including: 1, 4-butanediol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate, ethylene glycol dimethacrylate, 1, 3-butanediol dimethacrylate, hexanediol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol hexamethylacrylate, dipentaerythritol pentamethacrylate, sorbitol trimethacrylate, sorbitol tetramethacrylate, di [ p- (3-methacryloyloxy-2-hydroxypropoxy) phenyl ] dimethylmethane, di [ p- (methacryloyloxy ethoxy) phenyl ] dimethylmethane, and the like.
In an exemplary embodiment, the first ethylenically unsaturated compound is present in the dry film of the photoactive underlayer 30 in weight percent: 5% -80%; the preferred weight percentages of the first ethylenically unsaturated compound in the dry film of the photoactive underlayer 30 in this embodiment are: 30% -70%.
In an exemplary embodiment, the photosensitive upper layer 40 is subjected to a characterization process of a contact angle of water after drying, wherein the contact angle of water corresponding to the photosensitive upper layer 40 is: 40-120 deg.
In an exemplary embodiment, the photosensitive upper layer 40 is composed of a second film-forming resin, a second infrared absorber, a second photoinitiator, and a second ethylenically unsaturated compound. Wherein: the second film-forming resin is: a high molecular polymer with a main chain containing hydroxyl, carboxyl, alkyl ether chain segments or phosphate groups; or the second film-forming resin is: a polymer having a branched chain comprising a hydroxyl group, a carboxyl group, an alkyl ether segment or a phosphate group; wherein the hydrophilic group content of the second film-forming resin is reduced as compared to the hydrophilic group content of the first film-forming resin: 20% -80%.
In some embodiments, the second film-forming resin may be composed of one or several high molecular polymers.
The weight percentage of the second film forming resin in the dry film of the photosensitive upper layer 40 is: 10% -50%; the weight percentage of the second film-forming resin in the dry film of the photosensitive upper layer 40 is preferably as follows: 15% -30%. The second film-forming resin may have the same composition as the first film-forming resin or may have a different composition from the first film-forming resin.
The weight percentage of the second infrared absorbing agent in the dry film of the photosensitive upper layer 40 is: 0.5% -5%; the preferred weight percentages of the second infrared absorbing agent in the dry film of the photosensitive upper layer 40 in this embodiment are: 1 to 3 percent. The composition of the second infrared absorber may be the same as the composition of the first infrared absorber or may be different from the composition of the first infrared absorber.
The weight percentage of the second photoinitiator in the dry film of the photosensitive upper layer 40 is as follows: 2% -22%; the preferred weight percentages of the second photoinitiator in the dry film of the photosensitive upper layer 40 in this embodiment are: 5% -15%. The composition of the second infrared absorber may be the same as the composition of the first photoinitiator or may be different from the composition of the first photoinitiator.
The weight percentage of the second ethylenically unsaturated compound in the dry film of the photosensitive upper layer 40 is: 5% -80%. The preferred second ethylenically unsaturated compound in this embodiment is present in the dry film of the photosensitive upper layer 40 in the weight percent: 30% -70%. The second ethylenically unsaturated compound may have the same composition as the first ethylenically unsaturated compound or may have a different composition from the first ethylenically unsaturated compound.
The foregoing description is only of the preferred embodiments of the present invention, and is not intended to limit the scope of the invention, but rather is intended to cover any equivalents of the structures or equivalent processes disclosed herein or in the alternative, which may be employed directly or indirectly in other related arts.

Claims (9)

1. An on-press developed negative thermosensitive CTP plate, comprising:
A plate substrate;
a hydrophilic layer covering the surface of the plate substrate;
The photosensitive underlayer is covered on the surface of the hydrophilic layer and consists of first film forming resin, a first infrared absorber, a first photoinitiator and a first ethylenically unsaturated compound;
the photosensitive upper layer is covered on the surface of the photosensitive lower layer and consists of a second film-forming resin, a second infrared absorbent, a second photoinitiator and a second ethylenically unsaturated compound;
Wherein the first ethylenically unsaturated compound comprises: a compound capable of addition-polymerizing, crosslinking, and curing an ethylenically unsaturated bond by the action of a photopolymerization initiator, the second ethylenically unsaturated compound comprising: a compound having an ethylenically unsaturated bond which can be addition-polymerized, crosslinked and cured by the action of a photopolymerization initiator;
Wherein, the sensitization underlayer is through the characterization of water contact angle after drying, wherein, the contact angle of the corresponding water of sensitization underlayer is: 0 ο～60ο;
the photosensitive upper layer is characterized by a water contact angle after being dried, wherein the contact angle of water corresponding to the photosensitive upper layer is as follows: 40 ο～120ο.
2. The on-press developed negative thermosensitive CTP plate according to claim 1, wherein the plate substrate is an aluminum plate substrate.
3. The on-press developing type negative thermosensitive CTP plate according to claim 1, wherein the surface of the plate substrate is treated via a hydrophilized surface, and the hydrophilic layer is coated on the surface treated via the hydrophilized surface.
4. The on-press developed negative thermosensitive CTP plate according to claim 1, wherein:
the first film-forming resin is: a high molecular polymer with a main chain containing hydroxyl, carboxyl, alkyl ether chain segments or phosphate groups; or (b)
The first film-forming resin is: a polymer having a branched chain comprising a hydroxyl group, a carboxyl group, an alkyl ether segment or a phosphate group;
wherein the weight average molecular weight of the first film-forming resin is: 5000-800000.
5. The on-press developed negative thermosensitive CTP plate as claimed in claim 4, wherein:
the second film-forming resin is: a high molecular polymer with a main chain containing hydroxyl, carboxyl, alkyl ether chain segments or phosphate groups; or (b)
The second film-forming resin is: a polymer having a branched chain comprising a hydroxyl group, a carboxyl group, an alkyl ether segment or a phosphate group;
Wherein the hydrophilic group content of the second film-forming resin is reduced as compared to the hydrophilic group content of the first film-forming resin: 20% -80%.
6. The on-press developed negative thermosensitive CTP plate according to claim 1, wherein:
the weight percentage of the first film forming resin in the dry film of the photosensitive lower layer is as follows: 10% -50%;
The weight percentage of the second film forming resin in the dry film of the photosensitive upper layer is as follows: 10 to 50 percent.
7. The on-press developed negative thermosensitive CTP plate according to claim 6, wherein:
the weight percentage of the first infrared absorbing agent in the dry film of the photosensitive underlayer is as follows: 0.5% -5%;
the weight percentage of the second infrared absorbing agent in the dry film of the photosensitive upper layer is as follows: 0.5 to 5 percent.
8. The on-press developed negative thermosensitive CTP plate according to claim 7, wherein:
The weight percentage of the first photoinitiator in the dry film of the photosensitive lower layer is as follows: 2% -20%;
The weight percentage of the second photoinitiator in the dry film of the photosensitive upper layer is as follows: 2% -22%.
9. The on-press developed negative thermosensitive CTP plate according to claim 8, wherein:
The weight percentage of the first ethylenically unsaturated compound in the dry film of the photosensitive underlayer is: 5% -80%;
the weight percentage of the second ethylenically unsaturated compound in the dry film of the photosensitive upper layer is as follows: 5% -80%.
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