CN113604797B - Atomic layer deposition device for silver ornament surface treatment - Google Patents
Atomic layer deposition device for silver ornament surface treatment Download PDFInfo
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- CN113604797B CN113604797B CN202110878716.1A CN202110878716A CN113604797B CN 113604797 B CN113604797 B CN 113604797B CN 202110878716 A CN202110878716 A CN 202110878716A CN 113604797 B CN113604797 B CN 113604797B
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- connecting pipe
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
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- A—HUMAN NECESSITIES
- A44—HABERDASHERY; JEWELLERY
- A44C—PERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
- A44C27/00—Making jewellery or other personal adornments
- A44C27/001—Materials for manufacturing jewellery
- A44C27/005—Coating layers for jewellery
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- Mechanical Engineering (AREA)
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- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The invention provides an atomic layer deposition device for silver ornament surface treatment, which comprises a base, a first electrode, a second electrode, a first electrode and a second electrode, wherein the base is connected to the lower end of a bottom cover and used for supporting; the upper cover is covered at the upper end of the outer cylinder, the upper end of the upper cover is provided with a heating footstock, the inner cylinder is arranged in the outer cylinder, the inner bottom wall of the inner cylinder is provided with a sinking groove, and the sinking groove upper cover is provided with a gas homogenizing disc; a heating tube disposed circumferentially between the outer tube and the inner tube; and the air inlet device is arranged above the inner side of the inner cylinder. The invention overcomes the defects of the prior art, has reasonable design and compact structure, adopts the heat preservation design of the inner cylinder and the outer cylinder, is matched with a comprehensive heating mode, improves the temperature requirement of silver ornaments during deposition reaction, and can improve the deposition effect of the silver ornaments through the structural design of the gas homogenizing ring and the gas homogenizing disc, so that the generated film is more uniform and complete, and simultaneously, the invention can meet the requirements of processing work racks with different sizes and collecting waste gas of redundant precursor sources, and has strong practicability.
Description
Technical Field
The invention relates to the technical field of atomic layer deposition equipment, in particular to an atomic layer deposition device for silver ornament surface treatment.
Background
The silver ornament is an ornament made of metallic silver, has smooth texture and has rich color. However, silver ornaments are susceptible to discoloration and even blackening due to oxidation during storage. The conventional treatment methods such as electroplating, inorganic passivation film, organic passivation film and the like can damage the color of silver ornaments and also have pollution problem. Atomic layer deposition is a method by which substances can be plated onto a substrate surface layer by layer in the form of a monoatomic film. The silver ornament surface treatment has the following characteristics relative to other conventional substrates deposited by atomic layers, such as silicon wafers, glass, metals and the like: 1) Various kinds, irregular shapes, small silver decorations such as earrings, earnails and necklaces, and large silver decorations such as silver caps, and surface treatment is difficult to be carried out at certain edges and corners; 2) The silver ornament has silver luster, and the thickness of the surface coating film cannot generate chromatic aberration.
If the conventional atomic layer deposition device is used for carrying out deposition reaction on ornaments, the following problems occur:
1. the output angle of the precursor source is limited, so that the injection of each angle of the ornaments cannot be ensured, and the attractive effect is affected.
2. The film produced by atomic layer deposition is not uniform enough, the thickness of local places is larger, chromatic aberration is larger, and resource waste is also caused.
3. The precursor source is chaotic in flow, resulting in a great deal of waste.
For this purpose, we propose an atomic layer deposition device for the surface treatment of silver ornaments.
Disclosure of Invention
The present invention aims to solve or at least alleviate the problems of the prior art.
In order to achieve the above purpose, the invention is realized by the following technical scheme:
an atomic layer deposition device for surface treatment of silver ornaments, comprising:
an outer cylinder;
a bottom cover connected to the lower end of the outer cylinder;
a base connected to the lower end of the bottom cover for supporting;
an upper cover arranged at the upper end of the outer cylinder, a heating top seat arranged at the upper end of the upper cover,
an inner cylinder arranged in the outer cylinder, a sinking groove is arranged on the inner bottom wall of the inner cylinder, and a gas homogenizing disc is covered on the sinking groove;
a heating tube disposed circumferentially between the outer tube and the inner tube;
the air inlet device is arranged above the inner side of the inner cylinder and comprises an air homogenizing ring, the air homogenizing ring is in through connection with the precursor source input pipe through a connecting device, and a plurality of rows of annular air outlet holes which are distributed at equal intervals are formed in the inner side of the air homogenizing ring.
Optionally, a first heater is arranged in the heating top seat.
Optionally, a second heater is disposed in the bottom cover.
Optionally, a plurality of lifting devices are arranged on the base, and the upper ends of the lifting devices are connected to the upper cover.
Optionally, connecting device includes first connecting pipe and second connecting pipe, and first connecting pipe and precursor source input pipe through connection, second connecting pipe and even gaseous ring through connection, and the echelonment groove that corresponds each other has all been seted up to first connecting pipe and second connecting pipe, and first connecting pipe and second connecting pipe are fixed each other through fastener and screw.
Optionally, the stepped groove on the first connecting pipe faces upwards, and the stepped groove on the second connecting pipe faces downwards.
Optionally, the device also comprises a material rack which is arranged inside the inner cylinder and is used for placing ornaments; the bottom of bracket comprises two rings that distribute from top to bottom and interconnect, and the ring that is located the below is placed on even gas dish, and the ring both sides that are located the top are connected with the link that conveniently draws, and the ring center that is located the upper end is connected with upward extension's year thing bracket through the connecting rod, and ornaments are placed on the bracket.
Optionally, the upper end cover of the inner cylinder is provided with a cylinder cover.
Optionally, the lower end of the sinking groove is connected with a supporting pipe in a penetrating way, the supporting pipe is connected with a bottom cover, and the bottom cover is connected with a recovery pipe in a penetrating way with the supporting pipe
The embodiment of the invention provides an atomic layer deposition device for silver ornament surface treatment. The beneficial effects are as follows:
the invention provides an atomic layer deposition device for silver ornament surface treatment, which comprises: the heat preservation design of the inner barrel and the outer barrel is adopted, the temperature requirement of silver ornaments during deposition reaction is improved by matching with a comprehensive heating mode, the deposition effect of the silver ornaments can be improved through the structural design of the gas homogenizing ring and the gas homogenizing disc, the generated film is more uniform and complete, meanwhile, the processing of work racks with different sizes and the collection of redundant precursor source waste gas can be met, and the silver ornament deposition device has strong practicability.
Drawings
FIG. 1 is a schematic perspective view of the present invention;
FIG. 2 is a schematic elevational cross-sectional view of the structure of the present invention;
FIG. 3 is a schematic side cross-sectional view of the structure of the present invention;
FIG. 4 is an enlarged schematic view of the connection structure between the air inlet device and the inner cylinder.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments of the present invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Referring to fig. 1-4, an atomic layer deposition apparatus for surface treatment of silver ornaments,
the atomic layer deposition device for silver ornament surface treatment comprises an outer barrel 1 with heat preservation and insulation functions, a bottom cover 9 connected to the lower end of the outer barrel 1, a base 2 connected to the lower end of the bottom cover 9 and used for supporting, and an upper cover 4 covered on the upper end of the outer barrel 1, wherein the upper end of the upper cover 4 is provided with a heating footstock 5, a first heater 5.1 is arranged in the heating footstock 5, a second heater 9.1 is arranged in the bottom cover 9, the top of the inner barrel 6 is heated, the inner barrel 1 is internally provided with the inner barrel 6, the inner barrel 6 is a reaction chamber, atomic layer deposition occurs in the inner barrel 6, the upper end cover of the inner barrel 6 is provided with a barrel cover 6.1, the improved sealing effect is achieved, the inner bottom wall of the inner barrel 6 is provided with a sink, the upper cover of the sink is provided with a gas homogenizing disc 6.2, and the gas homogenizing disc 6.2 has two functions, one of which can uniformly and downwards transmit air flow to achieve the effect of homogenizing gas; and secondly, the precursor source can be collected.
The lower extreme through connection of heavy groove has stay tube 7, and stay tube 7 connects on bottom 9, and recovery tube 8 passes bottom 9 and with stay tube 7 through connection, through setting up heavy groove, cooperate even gas dish 6.2, stay tube 7 and recovery tube 8, can retrieve unnecessary precursor source, reduce the wasting of resources, the cover is equipped with the sealing membrane between recovery tube 8 and the stay tube 7, improves sealed effect.
In this embodiment, a plurality of lifting devices 3 are disposed on the base 2, and the upper ends of the lifting devices 3 are all connected to the upper cover 4, so that the upper cover 4 can be better opened by disposing the lifting devices 3.
Optionally, still be provided with heating pipe 10 between urceolus 1 and the inner tube 6, and heating pipe 10 is snakelike distribution, can heat the lateral wall of inner tube 6, and cooperation first heater 5.1 and second heater 9.1 can improve the comprehensive heating effect to inner tube 6, and it is more even to be heated simultaneously.
The structural design of the inner and outer cylinders is adopted, so that a good heat preservation effect can be improved, and meanwhile, a sealing effect can be improved.
An air inlet device 11 is arranged above the inner side of the inner cylinder 6, the air inlet device 11 comprises a gas homogenizing ring 11.2 and a precursor source input pipe 11.1, the precursor source input pipe 11.1 is in through connection with the gas homogenizing ring 11.2 through a connecting device, so that precursor sources are conveniently conveyed into the gas homogenizing ring 11.2, a plurality of rows of annular equally-distributed air outlet holes are formed in the inner side of the gas homogenizing ring 11.2, the precursor sources can be uniformly sprayed out from the gas homogenizing ring 11.2 at multiple angles, deposition reaction of ornaments is improved, uniformity of deposited films is improved, and meanwhile, a small-sized material rack 12 can be conveniently fed by adopting the annular gas homogenizing ring 11.2;
the connecting device comprises a first connecting pipe 11.3 and a second connecting pipe 11.4, wherein the first connecting pipe 11.3 is in through connection with a precursor source input pipe 11.1, the second connecting pipe 11.4 is in through connection with a gas homogenizing ring 11.2, the first connecting pipe 11.3 and the second connecting pipe 11.4 are respectively provided with a mutually corresponding stepped groove, leakage can be avoided to the greatest extent by adopting the stepped grooves, meanwhile, the sealing effect can be improved by matching with the fastening piece 11.5, the first connecting pipe 11.3 and the second connecting pipe 11.4 can form a sealing pipeline through the corresponding stepped grooves, the first connecting pipe 11.3 and the second connecting pipe 11.4 are mutually fixed through the fastening piece 11.5 and screws, the stepped groove on the first connecting pipe 11.3 faces upwards, and the stepped groove on the second connecting pipe 11.4 faces downwards, so that the gas homogenizing ring 11.2 can be conveniently and rapidly taken down from the upper part, the gas homogenizing ring 12 can be conveniently and rapidly used, or even gas ring 11.2 can be independently cleaned and replaced.
The work or material rest 12 is placed in inner tube 6, there is the bottom of bracket 12 to be by two upper and lower distribution and interconnect's ring constitution, the ring that is located the below is placed on even gas dish 6.2, the ring both sides that are located the top are connected with the link that conveniently draws, the ring center that is located the upper end is connected with the carrier bracket that upwards extends through the connecting rod, the ornaments are placed on the bracket 12, present precursor source carries out comprehensive sedimentation reaction to ornaments through the multirow venthole on even gas ring 11.2, and unnecessary precursor source can be along even gas dish 6.2 downwardly moving for the air current is more even, improves the effect of film.
When the device is in operation, the upper cover 4 is opened through the lifting device 3, the cylinder cover 6.1 is opened simultaneously, the material frame 12 hung with ornaments is placed in the inner cylinder 6, when the material frame 12 is smaller than the air homogenizing ring 11.2, the material frame can be directly placed in, when the material frame 12 is larger, the air homogenizing ring 11.2 can be detached through the connecting device, then the material frame 12 is conveniently placed in the material frame 12, the material frame is placed on the air homogenizing disc 6.2, the whole device is more flexible and changeable, the device is suitable for processing of different ornaments or the material frame 12, then the cylinder cover 6.1 and the upper cover 4 are closed, then the heating pipe 10, the first heater 5.1 and the second heater 9.1 are opened, meanwhile, the air homogenizing ring 11.2 is matched with the fasteners 11.5 through the first connecting pipe 11.3 and the second connecting pipe 11.4, then the precursor source is evenly sprayed on the ornaments through multiple angles of the air homogenizing ring 11.2 through the precursor source input pipe 11.1, then the precursor source is matched with the air disc 6.2, the precursor source is enabled to flow more evenly, the forming effect of a film is improved, and the precursor source and the waste gas can be recovered through the support pipe 7 and the redundant waste gas can be recovered through the support pipe 8.
It is noted that relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising one … …" does not exclude the presence of other like elements in a process, method, article, or apparatus that comprises the element.
The above embodiments are only for illustrating the technical solution of the present invention, and are not limiting; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present invention.
Claims (3)
1. An atomic layer deposition device for surface treatment of silver ornaments, comprising:
an outer cylinder;
a bottom cover connected to the lower end of the outer cylinder;
a base connected to the lower end of the bottom cover for supporting;
an upper cover arranged at the upper end of the outer cylinder, a heating top seat arranged at the upper end of the upper cover,
an inner cylinder arranged in the outer cylinder, a sinking groove is arranged on the inner bottom wall of the inner cylinder, and a gas homogenizing disc is covered on the sinking groove;
a heating tube disposed circumferentially between the outer tube and the inner tube;
the air inlet device is arranged above the inner side of the inner cylinder and comprises an air homogenizing ring, the air homogenizing ring is in through connection with the precursor source input pipe through a connecting device, and a plurality of rows of annular air outlet holes which are distributed at equal intervals are formed in the inner side of the air homogenizing ring, so that the precursor source can be uniformly sprayed out from the air homogenizing ring at multiple angles;
the material rack is arranged in the inner cylinder and used for placing ornaments; the bottom of the material rack consists of two rings which are distributed up and down and are connected with each other, the ring positioned below is placed on the air homogenizing disc, hanging rings which are convenient to extract are connected with two sides of the ring positioned above, the center of the ring positioned at the upper end is connected with an upward extending carrying bracket through a connecting rod, and ornaments are placed on the bracket;
the lower end of the sinking groove is connected with a supporting pipe in a penetrating way, the supporting pipe is connected to a bottom cover, and a recovery pipe in a penetrating way with the supporting pipe is connected to the bottom cover;
a first heater is arranged in the heating top seat;
a second heater is arranged in the bottom cover;
the connecting device comprises a first connecting pipe and a second connecting pipe, the first connecting pipe is in through connection with the precursor source input pipe, the second connecting pipe is in through connection with the gas homogenizing ring, the first connecting pipe and the second connecting pipe are provided with mutually corresponding stepped grooves, and the first connecting pipe and the second connecting pipe are mutually fixed through fasteners and screws;
the direction of the stepped groove on the first connecting pipe is upward, and the direction of the stepped groove on the second connecting pipe is downward.
2. An atomic layer deposition apparatus for surface treatment of silver ornaments according to claim 1, wherein: the base is provided with a plurality of lifting devices, and the upper ends of the lifting devices are connected to the upper cover.
3. An atomic layer deposition apparatus for surface treatment of silver ornaments according to claim 1, wherein: the upper end cover of the inner cylinder is provided with a cylinder cover.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110878716.1A CN113604797B (en) | 2021-08-02 | 2021-08-02 | Atomic layer deposition device for silver ornament surface treatment |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110878716.1A CN113604797B (en) | 2021-08-02 | 2021-08-02 | Atomic layer deposition device for silver ornament surface treatment |
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| Publication Number | Publication Date |
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| CN113604797A CN113604797A (en) | 2021-11-05 |
| CN113604797B true CN113604797B (en) | 2023-06-23 |
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| JP2004115869A (en) * | 2002-09-26 | 2004-04-15 | Canon Inc | Apparatus and method for forming deposition film by plasma-cvd |
| CN105929972A (en) * | 2016-06-17 | 2016-09-07 | 杨齐成 | Novel night light abrasion-resistant keyboard |
| CN206635415U (en) * | 2017-01-13 | 2017-11-14 | 凯里学院 | A kind of silver jeweleries batch processing equipment |
| CN108048820A (en) * | 2017-12-22 | 2018-05-18 | 江苏鲁汶仪器有限公司 | Vapor deposition apparatus and vapor deposition method |
| CN112853321A (en) * | 2021-01-20 | 2021-05-28 | 无锡市邑晶半导体科技有限公司 | ALD processing equipment and processing method |
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