CN113589485A - Double-telecentric exposure lens - Google Patents
Double-telecentric exposure lens Download PDFInfo
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- CN113589485A CN113589485A CN202110898114.2A CN202110898114A CN113589485A CN 113589485 A CN113589485 A CN 113589485A CN 202110898114 A CN202110898114 A CN 202110898114A CN 113589485 A CN113589485 A CN 113589485A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/001—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
- G02B13/0015—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras characterised by the lens design
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/22—Telecentric objectives or lens systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
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- Optics & Photonics (AREA)
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Abstract
The invention discloses a double telecentric exposure lens, which comprises a front lens group, a diaphragm and a rear lens group which are arranged in sequence from an object side to an image side; the front lens group comprises a first lens, a second lens, a third lens, a fourth lens, a fifth lens and a sixth lens which are arranged in sequence from an object side to an image side, wherein the first lens is a double convex lens, the second lens is a thick meniscus lens, the third lens is a thick meniscus lens, the fourth lens is a meniscus lens, the fifth lens is a convex lens, and the sixth lens is a concave lens; the rear lens group comprises a seventh lens and an eighth lens from an object side to an image side, wherein the seventh lens and the eighth lens are sequentially arranged, the seventh lens is a meniscus lens, and the eighth lens is a double-convex lens. The double telecentric exposure lens has the advantages of small object image telecentricity, high transmissivity, large depth of field and the like, the telecentricity of an image space and an object space is within 0.8mrad, the distortion is small, the object distance and the image distance are both more than 150mm, and the processing operation is convenient; and the required lens is few, the structure is simple, the cost is low, and the integral transmittance of the lens is high.
Description
Technical Field
The invention relates to a double telecentric exposure lens applied to the field of direct-writing lithography, and belongs to the technical field of optical lenses.
Background
The double telecentric lens is an imaging system which not only meets the characteristics of an object-side telecentric light path, but also meets the characteristics of an image-side telecentric light path, and the double telecentric lens has the advantages of two telecentric light paths, can provide larger depth of field, ensures constant magnification, and is widely applied to the field of direct writing lithography.
The existing double telecentric lens has the problems of large number of lenses, complex structure, low integral transmittance of the lens and the like.
Disclosure of Invention
The invention provides a double telecentric exposure lens which has the advantages of small object image telecentricity, small distortion, high transmittance, large depth of field and the like, and the lens is small in number, simple in structure and high in overall transmittance.
In order to solve the technical problems, the technical scheme adopted by the invention is as follows:
a double telecentric exposure lens comprises a front lens group, a diaphragm and a rear lens group which are arranged in sequence from an object side to an image side; the front lens group comprises a first lens, a second lens, a third lens, a fourth lens, a fifth lens and a sixth lens which are arranged in sequence from an object side to an image side, wherein the first lens is a double convex lens, the second lens is a thick meniscus lens, the third lens is a thick meniscus lens, the fourth lens is a meniscus lens, the fifth lens is a convex lens, and the sixth lens is a concave lens; the rear lens group comprises a seventh lens and an eighth lens from an object side to an image side, wherein the seventh lens and the eighth lens are sequentially arranged, the seventh lens is a meniscus lens, and the eighth lens is a double-convex lens.
The exposure lens has small object image telecentricity, small distortion, high transmittance and large depth of field; and the needed lens is few, and the cost is low.
The exposure lens can be applied to a light source with a wavelength range of about 400-410 nm.
The object plane side of the first lens is a convex surface, and the image plane side of the first lens is a convex surface; the object surface side of the second lens is a convex surface, and the image surface side of the second lens is a concave surface; the object surface side of the third lens is a convex surface, and the image surface side of the third lens is a concave surface; the object surface side of the fourth lens is a convex surface, and the image surface side of the fourth lens is a concave surface; the object plane side of the fifth lens is a plane, and the image plane side of the fifth lens is a convex surface; the object plane side of the sixth lens is a concave surface, and the image plane side of the sixth lens is a concave surface; the object plane side of the seventh lens is a concave surface, and the image plane side of the seventh lens is a convex surface; the object plane side of the eighth lens element is a convex surface, and the image plane side of the eighth lens element is a convex surface.
To improve the imaging effect, the object plane side of the first lens: 205mm < R < 290mm, image plane side of first lens: -150mm < R < -200 mm; object plane side of the second lens: r is more than 65mm and less than 105mm, and the image surface side of the second lens is as follows: r is more than 600mm and less than 700 mm; object plane side of the third lens: r is more than 50mm and less than 75mm, and the image surface side of the third lens is as follows: r is more than 125mm and less than 195 mm; object plane side of the fourth lens: r is more than 525mm and less than 550mm, and the image surface side of the fourth lens is as follows: r is more than 35mm and less than 65 mm; object plane side of fifth lens: plane, image plane side of fifth lens: -20mm < R < -45 mm; object plane side of sixth lens: -20mm < R < -45mm, image plane side of sixth lens: r is more than 125mm and less than 195 mm; object plane side of the seventh lens: -105 < R < -135mm, image plane side of seventh lens: -85mm < R < -115 mm; object plane side of the eighth lens: 255mm < R < 375mm, image plane side of eighth lens: -600mm < R < -750 mm; the R is the curvature radius.
Preferably, the object plane side of the first lens: r is 268.38 ± 0.2mm, image plane side of the first lens: r is-196.78 +/-0.2 mm; object plane side of the second lens: r is 94.19 ± 0.2mm, image plane side of the second lens: r is 660 +/-0.2 mm; object plane side of the third lens: r is 69.38 ± 0.2mm, image plane side of the third lens: r is 155.245 +/-0.2 mm; object plane side of the fourth lens: r is 540.35 ± 0.2mm, the image plane side of the fourth lens: r is 47.53 +/-0.2 mm; object plane side of fifth lens: plane, image plane side of fifth lens: r is-32.457 +/-0.2 mm; object plane side of sixth lens: r is-30.67 +/-0.2 mm, and the image surface side of the sixth lens is as follows: r is 164 +/-0.2 mm; object plane side of the seventh lens: r is-122.366 + -0.2 mm, the image plane side of the seventh lens: r is-105.298 +/-0.2 mm; object plane side of the eighth lens: r is 331.067 ± 0.2mm, image plane side of eighth lens: r is-691.8 +/-0.2 mm; the R is the curvature radius.
In order to take imaging effect and transmittance into consideration, the center thickness of the first lens is 7.4mm +/-0.02 mm; the central thickness of the second lens is 22 +/-0.02 mm; the central thickness of the third lens is 20 +/-0.02 mm; the central thickness of the fourth lens is 7.2 +/-0.02 mm; the center thickness of the fifth lens is 3.5 +/-0.02 mm; the center thickness of the sixth lens is 2 +/-0.02 mm; the center thickness of the seventh lens is 11.2 +/-0.02 mm; the center thickness of the eighth lens is 8 + -0.02 mm.
In order to improve the imaging effect, the center interval between the first lens and the second lens is 0 +/-0.01 mm; the central interval between the third lens and the fourth lens is 1.944 +/-0.01 mm; the center interval between the fourth lens and the fifth lens is 48.83 +/-0.01 mm; the center interval between the fifth lens and the sixth lens is 0.8 +/-0.01 mm; the central interval between the sixth lens and the diaphragm is 120.469 +/-0.01 mm; the center interval between the seventh lens and the eighth lens is 65.48 + -0.01 mm.
The first lens to the eighth lens are made of high-transmittance glass materials within the range of 405nm +/-5 nm.
The prior art is referred to in the art for techniques not mentioned in the present invention.
The double telecentric exposure lens has the advantages of small object image telecentricity, high transmissivity, large depth of field and the like, the telecentricity of an image space and an object space is within 0.8mrad, the distortion is small, the object distance and the image distance are both more than 150mm, and the processing operation is convenient; and the required lens is few, the structure is simple, the cost is low, and the integral transmittance of the lens is high.
Drawings
FIG. 1 is a schematic structural diagram of a double telecentric exposure lens according to the present invention;
FIG. 2 is a schematic diagram of an optical path of a double telecentric exposure lens according to the present invention;
FIG. 3 is an MTF chart of a double telecentric exposure lens according to an embodiment of the invention;
FIG. 4 is a diagram illustrating distortion of a double telecentric exposure lens according to an embodiment of the present invention;
FIG. 5 is a dot-column diagram of a double telecentric exposure lens in an embodiment of the invention;
in the figure, 1 is a front lens group, 11 is a first lens, 12 is a second lens, 13 is a third lens, 14 is a fourth lens, 15 is a fifth lens, 16 is a sixth lens, 2 is an aperture stop, 3 is a rear lens group, 31 is a seventh lens, and 32 is an eighth lens.
Detailed Description
In order to better understand the present invention, the following examples are further provided to illustrate the present invention, but the present invention is not limited to the following examples.
As shown in fig. 1-2, a double telecentric exposure lens includes a front lens group, a diaphragm and a rear lens group arranged in sequence from an object side to an image side; the front lens group comprises a first lens, a second lens, a third lens, a fourth lens, a fifth lens and a sixth lens which are arranged in sequence from an object side to an image side, wherein the first lens is a double convex lens, the second lens is a thick meniscus lens, the third lens is a thick meniscus lens, the fourth lens is a meniscus lens, the fifth lens is a convex lens, and the sixth lens is a concave lens; the rear lens group comprises a seventh lens and an eighth lens from an object side to an image side, wherein the seventh lens and the eighth lens are sequentially arranged, the seventh lens is a meniscus lens, and the eighth lens is a double-convex lens.
The object surface side of the first lens is a convex surface, and the image surface side of the first lens is a convex surface; the object surface side of the second lens is a convex surface, and the image surface side of the second lens is a concave surface; the object surface side of the third lens is a convex surface, and the image surface side of the third lens is a concave surface; the object surface side of the fourth lens is a convex surface, and the image surface side of the fourth lens is a concave surface; the object plane side of the fifth lens is a plane, and the image plane side of the fifth lens is a convex surface; the object plane side of the sixth lens is a concave surface, and the image plane side of the sixth lens is a concave surface; the object plane side of the seventh lens is a concave surface, and the image plane side of the seventh lens is a convex surface; the object plane side of the eighth lens element is a convex surface, and the image plane side of the eighth lens element is a convex surface.
Table 1 shows the parameters of the double telecentric exposure lens
Fig. 3 is an MTF graph of the exposure lens showing a transfer function of the exposure lens, and it can be seen from fig. 3 that the exposure lens reaches a diffraction limit, and has higher exposure accuracy, higher transmittance, and smaller telecentricity than that of patent 201910743931.3. Fig. 5 is a dot diagram of the exposure lens, and it can be seen that the focused spots of each field are controlled within the diffraction limit.
Fig. 4 is a distortion curve of the exposure lens, in which the abscissa represents the magnitude of distortion and the ordinate represents the change in field of view, and it can be seen that the distortion value is small.
The telecentricity of the image space and the object space of the exposure lens is within 0.8mrad, so that the exposure lens has very good telecentricity; the transmittance is > 92%.
Claims (7)
1. The utility model provides a two telecentric exposure camera lenses which characterized in that: the lens system comprises a front lens group, a diaphragm and a rear lens group which are arranged in sequence from an object space to an image space; the front lens group comprises a first lens, a second lens, a third lens, a fourth lens, a fifth lens and a sixth lens which are arranged in sequence from an object side to an image side, wherein the first lens is a double convex lens, the second lens is a thick meniscus lens, the third lens is a thick meniscus lens, the fourth lens is a meniscus lens, the fifth lens is a convex lens, and the sixth lens is a concave lens; the rear lens group comprises a seventh lens and an eighth lens from an object side to an image side, wherein the seventh lens and the eighth lens are sequentially arranged, the seventh lens is a meniscus lens, and the eighth lens is a double-convex lens.
2. The double telecentric exposure lens of claim 1, wherein: the object surface side of the first lens is a convex surface, and the image surface side of the first lens is a convex surface; the object surface side of the second lens is a convex surface, and the image surface side of the second lens is a concave surface; the object surface side of the third lens is a convex surface, and the image surface side of the third lens is a concave surface; the object surface side of the fourth lens is a convex surface, and the image surface side of the fourth lens is a concave surface; the object plane side of the fifth lens is a plane, and the image plane side of the fifth lens is a convex surface; the object plane side of the sixth lens is a concave surface, and the image plane side of the sixth lens is a concave surface; the object plane side of the seventh lens is a concave surface, and the image plane side of the seventh lens is a convex surface; the object plane side of the eighth lens element is a convex surface, and the image plane side of the eighth lens element is a convex surface.
3. The double telecentric exposure lens according to claim 1 or 2, wherein: object plane side of the first lens: 205mm < R < 290mm, image plane side of first lens: -150mm < R < -200 mm; object plane side of the second lens: r is more than 65mm and less than 105mm, and the image surface side of the second lens is as follows: r is more than 600mm and less than 700 mm; object plane side of the third lens: r is more than 50mm and less than 75mm, and the image surface side of the third lens is as follows: r is more than 125mm and less than 195 mm; object plane side of the fourth lens: r is more than 525mm and less than 550mm, and the image surface side of the fourth lens is as follows: r is more than 35mm and less than 65 mm; object plane side of fifth lens: plane, image plane side of fifth lens: -20mm < R < -45 mm; object plane side of sixth lens: -20mm < R < -45mm, image plane side of sixth lens: r is more than 125mm and less than 195 mm; object plane side of the seventh lens: -105 < R < -135mm, image plane side of seventh lens: -85mm < R < -115 mm; object plane side of the eighth lens: 255mm < R < 375mm, image plane side of eighth lens: -600mm < R < -750 mm; the R is the curvature radius.
4. A double telecentric exposure lens according to claim 3, wherein: object plane side of the first lens: r is 268.38 ± 0.2mm, image plane side of the first lens: r is-196.78 +/-0.2 mm; object plane side of the second lens: r is 94.19 ± 0.2mm, image plane side of the second lens: r is 660 +/-0.2 mm; object plane side of the third lens: r is 69.38 ± 0.2mm, image plane side of the third lens: r is 155.245 +/-0.2 mm; object plane side of the fourth lens: r is 540.35 ± 0.2mm, the image plane side of the fourth lens: r is 47.53 +/-0.2 mm; object plane side of fifth lens: plane, image plane side of fifth lens: r is-32.457 +/-0.2 mm; object plane side of sixth lens: r is-30.67 +/-0.2 mm, and the image surface side of the sixth lens is as follows: r is 164 +/-0.2 mm; object plane side of the seventh lens: r is-122.366 + -0.2 mm, the image plane side of the seventh lens: r is-105.298 +/-0.2 mm; object plane side of the eighth lens: r is 331.067 ± 0.2mm, image plane side of eighth lens: r is-691.8 +/-0.2 mm; the R is the curvature radius.
5. The double telecentric exposure lens according to claim 1 or 2, wherein: the central thickness of the first lens is 7.4mm +/-0.02 mm; the central thickness of the second lens is 22 +/-0.02 mm; the central thickness of the third lens is 20 +/-0.02 mm; the central thickness of the fourth lens is 7.2 +/-0.02 mm; the center thickness of the fifth lens is 3.5 +/-0.02 mm; the center thickness of the sixth lens is 2 +/-0.02 mm; the center thickness of the seventh lens is 11.2 +/-0.02 mm; the center thickness of the eighth lens is 8 + -0.02 mm.
6. The double telecentric exposure lens according to claim 1 or 2, wherein: the central interval between the first lens and the second lens is 0 +/-0.01 mm; the central interval between the third lens and the fourth lens is 1.944 +/-0.01 mm; the center interval between the fourth lens and the fifth lens is 48.83 +/-0.01 mm; the center interval between the fifth lens and the sixth lens is 0.8 +/-0.01 mm; the central interval between the sixth lens and the diaphragm is 120.469 +/-0.01 mm; the center interval between the seventh lens and the eighth lens is 65.48 + -0.01 mm.
7. The double telecentric exposure lens according to claim 1 or 2, wherein: the first lens to the eighth lens are made of high-transmittance glass materials within the range of 405nm +/-5 nm.
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0980306A (en) * | 1995-09-18 | 1997-03-28 | Nikon Corp | Symmetrical type telecentric optical system |
CN108267848A (en) * | 2017-12-19 | 2018-07-10 | 苏州莱能士光电科技股份有限公司 | A kind of doubly telecentric optical imaging system of high telecentricity |
CN209132501U (en) * | 2018-12-29 | 2019-07-19 | 苏州源卓光电科技有限公司 | A kind of doubly telecentric projection lithography camera lens |
CN110824678A (en) * | 2019-11-28 | 2020-02-21 | 广州长步道光电科技有限公司 | High-resolution low-distortion large-target-surface telecentric optical lens system |
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2021
- 2021-08-05 CN CN202110898114.2A patent/CN113589485B/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0980306A (en) * | 1995-09-18 | 1997-03-28 | Nikon Corp | Symmetrical type telecentric optical system |
CN108267848A (en) * | 2017-12-19 | 2018-07-10 | 苏州莱能士光电科技股份有限公司 | A kind of doubly telecentric optical imaging system of high telecentricity |
CN209132501U (en) * | 2018-12-29 | 2019-07-19 | 苏州源卓光电科技有限公司 | A kind of doubly telecentric projection lithography camera lens |
CN110824678A (en) * | 2019-11-28 | 2020-02-21 | 广州长步道光电科技有限公司 | High-resolution low-distortion large-target-surface telecentric optical lens system |
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