CN113561060B - Control method, device and system of diamond collator - Google Patents
Control method, device and system of diamond collator Download PDFInfo
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- CN113561060B CN113561060B CN202110858395.9A CN202110858395A CN113561060B CN 113561060 B CN113561060 B CN 113561060B CN 202110858395 A CN202110858395 A CN 202110858395A CN 113561060 B CN113561060 B CN 113561060B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
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- Mechanical Engineering (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
The application discloses a control method, a device and a system of a diamond collator. Wherein, the method comprises the following steps: detecting wear data generated by cleaning the polishing pad by the diamond conditioner in the current cleaning stage; determining target cleaning parameters corresponding to the diamond collator according to the wear data; generating a regulating instruction according to the target cleaning parameter, wherein the regulating instruction is used for regulating the diamond conditioner to perform cleaning operation on the grinding pad according to the target cleaning parameter in the current cleaning stage; and sending the adjusting instruction to the diamond collator. The embodiment of the application detects the abrasion data generated between the diamond conditioner and the grinding pad, and adjusts the cleaning parameters of the diamond conditioner to the grinding pad based on the abrasion data, so that the service life of the grinding pad is prolonged. The condition that the polishing pad is polished in advance due to the fact that the expected service life of the polishing pad cannot be reached is avoided, and therefore the polishing cost is guaranteed.
Description
Technical Field
The application relates to the field, in particular to a control method, a device and a system of a diamond collator.
Background
With the emerging gradual application of 5G, the ultra-high speed, ultra-low time delay, ultra-high density and other advantages of the technology enable the emerging technologies of Internet of things, artificial intelligence, unmanned driving and the like to develop rapidly. This requires that the chips produced by the 5G technology have high efficiency and low energy consumption. With the development of semiconductor chip manufacturing technology, the role and requirement of Chemical Mechanical Planarization (CMP) process for 200mm and above wafers in chip production are increasing. The performance requirements for CMP polishing tools are becoming more stringent, including efficiency, stability, cost control, and other parameters.
The cost expenditure of CMP polishing is significant in terms of the consumption of consumables, particularly polishing slurry, polishing pads, diamond conditioners, cleaning brushes, retaining rings, etc., in addition to the inherent cost of the machine itself, the normal wear of parts, and the use of consumables.
In the process of implementing the present invention, the inventor finds that the polishing pad can not be used for the expected time and can be polished in advance, which is a problem which currently troubles the polishing cost of CMP. The method not only causes cost loss, but also greatly influences the quality of the wafer, once the grinding pad is damaged, the uniformity of the wafer after CMP grinding is increased to more than 25% from the original 3% -5%, and the yield of the product is greatly influenced.
Disclosure of Invention
To solve the above technical problem or at least partially solve the above technical problem, the present application provides a method, an apparatus and a system for controlling a diamond dresser.
According to an aspect of an embodiment of the present application, there is provided a method of controlling a diamond conditioner, including:
detecting wear data generated by cleaning the polishing pad by the diamond conditioner in the current cleaning stage;
determining target cleaning parameters corresponding to the diamond collator according to the wear data;
generating a regulating instruction according to the target cleaning parameter, wherein the regulating instruction is used for regulating the diamond conditioner to perform cleaning operation on the grinding pad according to the target cleaning parameter in the current cleaning stage;
and sending the adjusting instruction to the diamond collator.
Further, the detecting the wear data generated by the diamond conditioner cleaning the polishing pad in the current cleaning stage comprises:
acquiring a target electric signal generated when the diamond conditioner cleans the grinding pad, wherein the target electric signal is generated according to the friction force generated between the diamond conditioner and the grinding pad;
and determining target signal strength corresponding to the target electric signal, and determining the target signal strength as the wear data.
Further, the determining the target cleaning parameters of the diamond conditioner to the current polishing pad according to the wear data comprises:
acquiring a corresponding relation between the signal intensity and the cleaning parameters;
and determining a target cleaning parameter corresponding to the target signal intensity based on the corresponding relation, wherein the target cleaning parameter at least comprises cleaning time length.
Further, the obtaining the corresponding relationship between the signal intensity and the cleaning parameter includes:
obtaining a historical cleaning record, wherein the historical cleaning record comprises: historical electric signals generated when the diamond collator cleans the grinding pad under different states and historical cleaning parameters related to the historical electric signals, wherein the historical electric signals are generated according to the friction force generated between the diamond collator and the grinding pad;
determining the historical signal strength corresponding to the historical electric signal;
based on the historical signal strength and the historical cleaning parameters, a correspondence between signal strength and cleaning parameters is determined.
Further, after sending the adjustment instruction to the diamond conditioner, the method further comprises:
determining a wear state of the diamond conditioner and the polishing pad according to the wear data;
acquiring a cleaning result of the diamond conditioner on the grinding pad under the condition that the abrasion state is in a target abrasion state;
and generating prompt information under the condition that the cleaning result does not meet the preset cleaning requirement, wherein the prompt information is used for prompting the replacement of the diamond conditioner and/or the grinding pad.
Further, before generating the prompt message, the method further includes:
detecting a current service life of the diamond conditioner and/or polishing pad;
and generating the prompt information when the current service life reaches the service life end.
According to another aspect of the embodiments of the present application, there is provided a control apparatus for a diamond conditioner, comprising:
the detection module is used for detecting the abrasion data between the diamond finisher and the current grinding pad;
the processing module is used for determining target cleaning parameters corresponding to the diamond collator according to the wear data;
a generating module, configured to generate a conditioning instruction according to the target cleaning parameter, where the conditioning instruction is used to adjust the diamond conditioner to perform a cleaning operation on the polishing pad according to the target cleaning parameter in the current cleaning stage;
and the sending module is used for sending the control instruction to the diamond collator.
There is also provided in accordance with another aspect of an embodiment of the present application a control system for a diamond conditioner, comprising: the diamond dresser, the grinding pad and the control device, wherein the control device comprises a force sensor and a processor;
the force sensor is used for detecting abrasion data generated by cleaning of the grinding pad by the diamond dresser in the current cleaning stage and sending the abrasion data to the processor;
the processor is used for determining a target cleaning parameter corresponding to the diamond finisher according to the wear data; generating a regulating instruction according to the target cleaning parameter, wherein the regulating instruction is used for regulating the diamond conditioner to perform cleaning operation on the grinding pad according to the target cleaning parameter in the current cleaning stage; and sending the adjusting instruction to the diamond collator.
According to another aspect of the embodiments of the present application, there is also provided a storage medium including a stored program which performs the above steps when the program is executed.
According to another aspect of the embodiments of the present application, there is also provided an electronic apparatus, including a processor, a communication interface, a memory, and a communication bus, where the processor, the communication interface, and the memory complete communication with each other through the communication bus; wherein: a memory for storing a computer program; a processor for executing the steps of the method by running the program stored in the memory.
Embodiments of the present application further provide a computer program product containing instructions, which when executed on a computer, cause the computer to perform the steps of the above method.
Compared with the prior art, the technical scheme provided by the embodiment of the application has the following advantages: according to the embodiment of the application, the abrasion data generated between the diamond collator and the grinding pad are detected, and the cleaning parameters of the diamond collator to the grinding pad are dynamically adjusted based on the abrasion data, so that the service life of the grinding pad is prolonged. The condition that the polishing pad is polished in advance due to the fact that the expected service life of the polishing pad cannot be reached is avoided, and therefore the polishing cost is guaranteed.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the present application and together with the description, serve to explain the principles of the application.
In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, and it is obvious for those skilled in the art to obtain other drawings without inventive exercise.
FIG. 1 is a flow chart of a method for controlling a diamond conditioner according to an embodiment of the present invention;
FIG. 2 is a flow chart of a method for controlling a diamond conditioner according to another embodiment of the present application;
FIG. 3 is a schematic view of a diamond conditioner according to an embodiment of the present application;
FIG. 4 is a schematic view of a diamond conditioner according to an embodiment of the present application;
FIG. 5 is a schematic view of a polishing pad according to an embodiment of the present disclosure;
FIG. 6 is a schematic view of a polishing pad according to an embodiment of the present disclosure;
FIG. 7 is a flow chart of a method for controlling a diamond conditioner according to another embodiment of the present application;
fig. 8 is a block diagram of a control device of a diamond conditioner according to an embodiment of the present application;
FIG. 9 is a block diagram of a control system for a diamond conditioner according to an embodiment of the present application;
fig. 10 is a schematic structural diagram of an electronic device according to an embodiment of the present application.
Detailed Description
In order to make the purpose, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be described clearly and completely with reference to the drawings in the embodiments of the present application, it is obvious that the described embodiments are some embodiments of the present application, but not all embodiments, and the illustrative embodiments and descriptions thereof of the present application are used for explaining the present application and do not constitute a limitation to the present application. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
It is noted that, in this document, relational terms such as "first" and "second," and the like, are used solely to distinguish one entity or action from another similar entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising a … …" does not exclude the presence of another identical element in a process, method, article, or apparatus that comprises the element.
The embodiment of the application provides a control method, a device and a system of a diamond collator. The method provided by the embodiment of the invention can be applied to any required electronic equipment, for example, the electronic equipment can be electronic equipment such as a server and a terminal, and the method is not particularly limited herein, and is hereinafter simply referred to as electronic equipment for convenience in description.
According to an aspect of an embodiment of the present application, there is provided a method embodiment of a control method of a diamond conditioner, and fig. 1 is a flowchart of the control method of the diamond conditioner provided by the embodiment of the present application, as shown in fig. 1, the method includes:
step S11, detecting abrasion data generated by the diamond conditioner cleaning the grinding pad in the current cleaning stage.
In the embodiment of the present application, step S11 of detecting the wear data generated by the diamond conditioner cleaning the polishing pad in the current cleaning stage includes the following steps A1-A2:
step A1, acquiring a target electric signal generated when the diamond conditioner cleans the grinding pad, wherein the target electric signal is generated according to the friction force generated between the diamond conditioner and the grinding pad.
In this application embodiment, can adopt force sensor to detect the frictional force that produces between diamond collator and the current grinding pad, obtain the frictional force that produces between the two when diamond collator cleans the grinding pad, then convert frictional force into the target signal of telecommunication.
And A2, determining the target signal intensity corresponding to the target electric signal, and determining the target signal intensity as wear data.
In this embodiment of the present application, determining the target signal strength corresponding to the target electrical signal includes: firstly, the electric signal is amplified and filtered to obtain a processed electric signal, the processed electric signal is subjected to analog-to-digital conversion to obtain a digital signal, and the digital signal is input into a digital band-pass filter to obtain the target signal intensity.
In the embodiment of the present application, the larger the friction force is, the stronger the signal intensity of the converted target electrical signal is, and the smaller the friction force is, the weaker the signal intensity of the converted target electrical signal is.
And S12, determining target cleaning parameters corresponding to the diamond collator according to the wear data.
In the embodiment of the present application, the step S12 of determining the target cleaning parameters of the diamond conditioner for the current polishing pad according to the wear data includes the following steps B1-B3:
step B1, acquiring a corresponding relation between signal intensity and cleaning parameters;
in the embodiment of the application, a historical cleaning record is obtained, wherein the historical cleaning record comprises historical electric signals generated when the diamond conditioner cleans the grinding pad under different states and historical cleaning parameters related to the historical electric signals, and the historical electric signals are generated according to friction force generated between the diamond conditioner and the grinding pad. And then establishing a corresponding relation according to the signal intensity of the historical electric signals and the historical cleaning parameters.
And B2, determining a target cleaning parameter corresponding to the target signal intensity based on the corresponding relation between the signal intensity and the cleaning parameter, wherein the target cleaning parameter at least comprises cleaning duration.
In the embodiment of the application, the first corresponding relationship includes a corresponding relationship between signal intensity and cleaning parameters, a signal intensity range where a target signal intensity is located is inquired from the first corresponding relationship, and the cleaning parameters corresponding to the signal intensity range are determined as target cleaning parameters, wherein the target cleaning parameters include parameters such as cleaning duration and cleaning strength.
And S13, generating a regulating instruction according to the target cleaning parameters, wherein the regulating instruction is used for regulating the diamond conditioner to perform cleaning operation on the grinding pad according to the target cleaning parameters in the current cleaning stage.
And S14, sending an adjusting instruction to the diamond collator.
In the embodiment of the present application, after the target cleaning parameters are determined, the adjustment instructions are generated according to the target cleaning parameters and sent to the diamond conditioner, so that the diamond conditioner performs the cleaning operation on the polishing pad according to the target cleaning parameters in the current cleaning stage.
The embodiment of the application detects the abrasion data generated between the diamond conditioner and the grinding pad, and adjusts the cleaning parameters of the diamond conditioner to the grinding pad based on the abrasion data, so that the service life of the grinding pad is prolonged. The condition that the grinding pad is polished in advance because the expected service life of the grinding pad is not reached is avoided, so that the grinding cost is ensured.
In the embodiment of the present application, as shown in fig. 2, a specific process of obtaining the correspondence between the signal intensity and the cleaning parameter includes:
step S21, obtaining a historical cleaning record, wherein the historical cleaning record comprises: historical electric signals generated when the diamond collators in different states clean the grinding pads and historical cleaning parameters related to the historical electric signals, wherein the historical electric signals are generated according to friction force generated between the grinding pads by the diamond collators.
In the embodiments of the present application, the different states refer to the diamond conditioner and the polishing pad under different wear data, and refer to fig. 3 to 6, wherein fig. 3 is the diamond conditioner without wear, and fig. 4 is the diamond conditioner with severe wear. Fig. 5 shows an unworn polishing pad, and fig. 6 shows a heavily worn polishing pad.
Therefore, before collecting the historical friction force and the historical cleaning parameters, the embodiments of the present application further need to determine the characteristic information of the diamond conditioner and the polishing pad, and determine the states of the diamond conditioner and the polishing pad according to the characteristic information, for example: is not abraded and is seriously abraded. Historical electrical signals and historical cleaning parameters generated by the diamond conditioner and the polishing pad are then collected according to different conditions, wherein the historical cleaning parameters can be preset.
In the embodiment of the application, the historical friction force and the historical cleaning parameters under different states are collected, and the historical friction force and the historical cleaning parameters mainly comprise the following four types of data:
(1) The non-worn diamond conditioner cleans the non-worn grinding pad by a plurality of first historical electric signals and first historical cleaning parameters, wherein the first historical cleaning parameters comprise cleaning time length, cleaning force and other parameters.
(2) And a plurality of second historical electric signals and second historical cleaning parameters when the unworn diamond finisher cleans the grinding pad with serious abrasion, wherein the second historical cleaning parameters comprise the cleaning time length, the cleaning force and other parameters.
(3) And a third history electrical signal and a third history cleaning parameter when the seriously worn diamond finishing device cleans the unworn grinding pad, wherein the third history cleaning parameter comprises parameters such as cleaning time length, cleaning force and the like.
(4) And a plurality of fourth historical electric signals and fourth historical cleaning parameters when the severely worn grinding pad is cleaned by the severely worn diamond finishing device, wherein the fourth historical cleaning parameters comprise cleaning time length, cleaning force and other parameters.
And step S22, determining the historical signal intensity corresponding to the historical electric signal.
Step S23, based on the historical signal intensity and the historical cleaning parameters, determining the corresponding relation between the signal intensity and the cleaning parameters.
In the embodiment of the present application, each historical electrical signal and the cleaning parameter are analyzed, and the analyzing process may be: determining the maximum signal intensity and the minimum signal intensity of the historical electric signals in each state so as to obtain a signal intensity range in the grinding state, simultaneously calculating the average value of the historical cleaning parameters, determining the average value as a standard cleaning parameter, and establishing a corresponding relation between the signal intensity and the cleaning parameter based on the signal intensity range and the standard cleaning parameter.
As an example, a maximum signal intensity a1 and a minimum signal intensity a2 are determined from the plurality of first historical electrical signals, a first signal intensity range [ a1, a2] is determined according to the maximum signal intensity a1 and the minimum signal intensity a2, the first signal intensity range is determined as a signal intensity range when the unworn polishing pad is cleaned by the unworn diamond conditioner, and a first historical cleaning parameter mean value c1 is determined according to the plurality of first historical cleaning parameters, where c1 can be used as a standard cleaning parameter when the unworn polishing pad is cleaned by the unworn diamond conditioner, and a corresponding relationship is finally obtained: [ a1, a2] -c 1. When the subsequent target signal intensity falls within [ a1, a2], then c1 is determined as the target cleaning parameter.
As another example, a maximum signal strength a3 and a minimum signal strength a4 are determined from a plurality of second historical electrical signals, a second signal strength range [ a3, a4] is determined according to the maximum signal strength a3 and the minimum signal strength a4, the second signal strength range is determined as a signal strength range when the abrasive pad with serious wear is cleaned by the diamond conditioner without wear, a second historical cleaning parameter mean value c2 is determined according to a plurality of second historical cleaning parameters, the second historical cleaning parameter mean value is determined as a standard cleaning parameter when the abrasive pad with serious wear is cleaned by the diamond conditioner without wear, and the corresponding relationship is finally obtained: [ a3, a4] -c 2.
In the embodiment of the application, due to the fact that multiple external influence factors exist in the grinding process, the friction force generated in each grinding process is inconsistent, and the signal intensity of the obtained electric signal is different, the signal intensity range in each grinding state can be determined, so that a basis can be provided for rapidly determining the cleaning parameters subsequently, and meanwhile, the states of the diamond dresser and the grinding pad can be determined according to the signal intensity.
In an embodiment of the present application, as shown in fig. 7, after sending the adjustment instruction to the diamond conditioner, the method further comprises:
in step S31, the wear states of the diamond conditioner and the polishing pad are determined based on the wear data.
In an embodiment of the present application, determining the wear status of the diamond conditioner and the polishing pad according to the signal intensity may be: an unworn state and a severely worn state.
In step S32, a result of cleaning the polishing pad by the diamond conditioner is obtained when the wear state is in the target wear state.
In the embodiment of the present application, the target wear state is a wear severity state, and in the case where the wear state of any one of the diamond conditioner and the polishing pad is the wear severity state, the cleaning result of the polishing pad by the diamond conditioner is detected.
And step S33, generating prompt information under the condition that the cleaning result does not meet the preset cleaning requirement, wherein the prompt information is used for prompting the replacement of the diamond conditioner and/or the grinding pad.
In this embodiment of the present application, before generating the prompt message, the method further includes: detecting a current service life of the diamond conditioner and/or polishing pad; and generating prompt information when the current service life reaches the service life end.
In an embodiment of the present application, detecting the current service life of the diamond conditioner and/or the polishing pad may be detecting the current service time of the diamond conditioner and/or the polishing pad, determining the current service life according to the current service time, and generating a prompt message when the current service life reaches the end of the service life.
In the embodiment, in the case that the current service life does not reach the end of the service life, the diamond conditioner is continuously controlled to clean the polishing pad.
According to the embodiment of the application, when the diamond collator and/or the grinding pad are in a serious abrasion state and the cleaning result does not meet the preset cleaning requirement, the service life of the current service life of the diamond collator and/or the grinding pad is detected, and whether prompt information is generated or not is determined according to the service life. On the one hand, the diamond collator and/or the grinding pad can be ensured to be replaced in time, and on the other hand, the grinding cost can be ensured.
Fig. 8 is a block diagram of a control device of a diamond dresser according to an embodiment of the present application, which may be implemented as part or all of an electronic device by software, hardware or a combination of the software and the hardware. As shown in fig. 8, the apparatus includes:
a detection module 81 for detecting wear data between the diamond conditioner and the current polishing pad;
a processing module 82 for determining target cleaning parameters corresponding to the diamond conditioner based on the wear data;
a generating module 83, configured to generate a regulation instruction according to the target cleaning parameter, where the regulation instruction is used to adjust the diamond conditioner to perform a cleaning operation on the polishing pad according to the target cleaning parameter in the current cleaning stage;
and a sending module 84, configured to send a control instruction to the diamond collator.
In the embodiment of the present application, the detecting module 81 is configured to obtain a target electrical signal generated when the diamond conditioner cleans the polishing pad, where the target electrical signal is generated according to a friction force generated between the diamond conditioner and the polishing pad; and determining the target signal intensity corresponding to the target electric signal, and determining the target signal intensity as the wear data.
In this embodiment, the processing module 82 includes:
the acquisition submodule is used for acquiring the corresponding relation between the signal intensity and the cleaning parameter;
and the determining submodule is used for determining a target cleaning parameter corresponding to the target signal intensity based on the corresponding relation, wherein the target cleaning parameter at least comprises cleaning duration.
In an embodiment of the present application, the obtaining sub-module is configured to obtain a historical cleaning record, where the historical cleaning record includes: historical electric signals generated when the diamond collators in different states clean the grinding pads and historical cleaning parameters related to the historical electric signals, wherein the historical electric signals are generated according to friction force generated between the diamond collators and the grinding pads; determining the historical signal intensity corresponding to the historical electric signal; based on the historical signal strength and the historical cleaning parameters, a correspondence between the signal strength and the cleaning parameters is determined.
The device in the embodiment of the application further comprises: the execution module is used for determining the abrasion states of the diamond collator and the polishing pad according to the abrasion data; acquiring a cleaning result of the diamond conditioner on the grinding pad under the condition that the abrasion state is in a target abrasion state; and generating prompt information under the condition that the cleaning result does not meet the preset cleaning requirement, wherein the prompt information is used for prompting the replacement of the diamond conditioner and/or the grinding pad.
The device in the embodiment of the application further comprises: the judging module is used for detecting the current service life of the diamond collator and/or the grinding pad; and generating prompt information when the current service life reaches the service life end.
Fig. 9 is a block diagram of a control device of a diamond dresser according to an embodiment of the present application, where the control device may be implemented as part of or all of an electronic device through software, hardware or a combination of both. As shown in fig. 9, the system includes: a diamond conditioner 91, a polishing pad 92, and a control device 93, wherein the control device comprises a force sensor 931 and a processor 932;
a force sensor 931 for detecting wear data generated by the diamond conditioner cleaning the polishing pad during the current cleaning phase and sending the wear data to the processor;
a processor 932 for determining a target cleaning parameter corresponding to the diamond conditioner based on the wear data; generating a regulating instruction according to the target cleaning parameter, wherein the regulating instruction is used for regulating the diamond conditioner to perform cleaning operation on the grinding pad according to the target cleaning parameter in the current cleaning stage; sending an adjustment instruction to the diamond collator.
An embodiment of the present application further provides an electronic device, as shown in fig. 10, the electronic device may include: the system comprises a processor 1501, a communication interface 1502, a memory 1503 and a communication bus 1504, wherein the processor 1501, the communication interface 1502 and the memory 1503 complete communication with each other through the communication bus 1504.
A memory 1503 for storing a computer program;
the processor 1501 is configured to implement the steps of the above embodiments when executing the computer program stored in the memory 1503.
The communication bus mentioned in the above terminal may be a Peripheral Component Interconnect (PCI) bus, an Extended Industry Standard Architecture (EISA) bus, or the like. The communication bus may be divided into an address bus, a data bus, a control bus, etc. For ease of illustration, only one thick line is shown, but this does not mean that there is only one bus or one type of bus.
The communication interface is used for communication between the terminal and other equipment.
The Memory may include a Random Access Memory (RAM) or a non-volatile Memory (non-volatile Memory), such as at least one disk Memory. Optionally, the memory may also be at least one memory device located remotely from the processor.
The Processor may be a general-purpose Processor, and includes a Central Processing Unit (CPU), a Network Processor (NP), and the like; the Integrated Circuit may also be a Digital Signal Processor (DSP), an Application Specific Integrated Circuit (ASIC), a Field Programmable Gate Array (FPGA) or other Programmable logic device, discrete Gate or transistor logic device, or discrete hardware components.
In a further embodiment provided by the present application, there is also provided a computer readable storage medium having stored therein instructions which, when run on a computer, cause the computer to perform the method of controlling a diamond conditioner as described in any one of the above embodiments.
In a further embodiment provided by the present application there is also provided a computer program product containing instructions which, when run on a computer, cause the computer to carry out the method of controlling a diamond conditioner as described in any one of the above embodiments.
In the above embodiments, the implementation may be wholly or partially realized by software, hardware, firmware, or any combination thereof. When implemented in software, may be implemented in whole or in part in the form of a computer program product. The computer program product includes one or more computer instructions. The procedures or functions described in accordance with the embodiments of the application are all or partially generated when the computer program instructions are loaded and executed on a computer. The computer may be a general purpose computer, a special purpose computer, a network of computers, or other programmable device. The computer instructions may be stored in a computer readable storage medium or transmitted from one computer readable storage medium to another, for example, the computer instructions may be transmitted from one website, computer, server, or data center to another website, computer, server, or data center by wire (e.g., coaxial cable, fiber optic, digital subscriber line) or wirelessly (e.g., infrared, wireless, microwave, etc.). The computer-readable storage medium can be any available medium that can be accessed by a computer or a data storage device, such as a server, a data center, etc., that incorporates one or more of the available media. The usable medium may be a magnetic medium (e.g., floppy Disk, hard Disk, magnetic tape), an optical medium (e.g., DVD), or a semiconductor medium (e.g., solid State Disk), among others.
The above description is only for the preferred embodiment of the present application, and is not intended to limit the scope of the present application. Any modification, equivalent replacement, improvement and the like made within the spirit and principle of the present application are included in the protection scope of the present application.
The above description is merely exemplary of the present application and is presented to enable those skilled in the art to understand and practice the present application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the application. Thus, the present application is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (8)
1. A method of controlling a diamond conditioner, comprising:
detecting wear data generated by cleaning the polishing pad by the diamond conditioner in the current cleaning stage;
determining target cleaning parameters corresponding to the diamond collator according to the wear data;
generating a regulating instruction according to the target cleaning parameter, wherein the regulating instruction is used for regulating the diamond conditioner to perform cleaning operation on the grinding pad according to the target cleaning parameter in the current cleaning stage;
sending the adjustment instruction to the diamond collator;
after sending the adjustment instructions to the diamond conditioner, the method further comprises:
determining a wear state of the diamond conditioner and the polishing pad according to the wear data;
acquiring a cleaning result of the diamond conditioner on the grinding pad under the condition that the abrasion state is in a target abrasion state;
generating prompt information under the condition that the cleaning result does not meet the preset cleaning requirement, wherein the prompt information is used for prompting the replacement of the diamond conditioner and/or the grinding pad;
before generating the prompt message, the method further comprises:
detecting a current service life of the diamond conditioner and/or polishing pad;
and generating the prompt information when the current service life reaches the service life end.
2. The method of claim 1, wherein detecting wear data from cleaning of the polishing pad by the diamond conditioner during the current cleaning phase comprises:
acquiring a target electric signal generated when the diamond conditioner cleans the grinding pad, wherein the target electric signal is generated according to the friction force generated between the diamond conditioner and the grinding pad;
and determining the target signal strength corresponding to the target electric signal, and determining the target signal strength as the wear data.
3. The method of claim 2, wherein said determining a target cleaning parameter of said diamond conditioner for said current polishing pad based on said wear data comprises:
acquiring a corresponding relation between the signal intensity and the cleaning parameters;
and determining a target cleaning parameter corresponding to the target signal intensity based on the corresponding relation, wherein the target cleaning parameter at least comprises cleaning duration.
4. The method of claim 3, wherein obtaining a correspondence between signal strength and cleaning parameters comprises:
obtaining a historical cleaning record, wherein the historical cleaning record comprises: historical electric signals generated when the diamond collators in different states clean the grinding pads and historical cleaning parameters related to the historical electric signals, wherein the historical electric signals are generated according to friction force generated between the diamond collators and the grinding pads;
determining the historical signal strength corresponding to the historical electric signal;
based on the historical signal strength and the historical cleaning parameters, a correspondence between signal strength and cleaning parameters is determined.
5. A control device for a diamond conditioner, comprising:
the detection module is used for detecting the abrasion data between the diamond finisher and the current grinding pad;
the processing module is used for determining target cleaning parameters corresponding to the diamond collator according to the wear data;
a generating module, configured to generate a conditioning instruction according to the target cleaning parameter, where the conditioning instruction is used to adjust the diamond conditioner to perform a cleaning operation on the polishing pad according to the target cleaning parameter in the current cleaning stage;
the sending module is used for sending the control instruction to the diamond collator;
the device further comprises: the execution module is used for determining the abrasion states of the diamond collator and the polishing pad according to the abrasion data; acquiring a cleaning result of the diamond conditioner on the grinding pad under the condition that the abrasion state is in a target abrasion state; generating prompt information under the condition that the cleaning result does not meet the preset cleaning requirement, wherein the prompt information is used for prompting the replacement of the diamond conditioner and/or the grinding pad;
the device further comprises: the judging module is used for detecting the current service life of the diamond collator and/or the grinding pad; and generating prompt information when the current service life reaches the service life end.
6. A control system for a diamond conditioner comprising: the diamond dresser, the grinding pad and the control device, wherein the control device comprises a force sensor and a processor;
the force sensor is used for detecting abrasion data generated by cleaning of the grinding pad by the diamond dresser in the current cleaning stage and sending the abrasion data to the processor;
the processor is used for determining a target cleaning parameter corresponding to the diamond finisher according to the wear data; generating a regulating instruction according to the target cleaning parameter, wherein the regulating instruction is used for regulating the diamond conditioner to perform a cleaning operation on the grinding pad according to the target cleaning parameter in the current cleaning stage; sending the adjustment instruction to the diamond collator;
the processor is further used for determining the wear states of the diamond conditioner and the grinding pad according to the wear data; acquiring a cleaning result of the diamond conditioner on the grinding pad under the condition that the abrasion state is in a target abrasion state; generating prompt information under the condition that the cleaning result does not meet the preset cleaning requirement, wherein the prompt information is used for prompting the replacement of the diamond conditioner and/or the grinding pad;
the processor, prior to generating the cue message, is further configured to detect a current service life of the diamond conditioner and/or polishing pad; and generating the prompt information when the current service life reaches the service life end.
7. A storage medium, characterized in that the storage medium comprises a stored program, wherein the program is operative to perform the method steps of any of the preceding claims 1 to 4.
8. An electronic device is characterized by comprising a processor, a communication interface, a memory and a communication bus, wherein the processor and the communication interface are used for realizing mutual communication by the memory through the communication bus; wherein:
a memory for storing a computer program;
a processor for performing the method steps of any of claims 1-4 by executing a program stored on a memory.
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