CN113560271B - Conductive clamp cleaning liquid recovery device, cleaning liquid recovery method and coating machine - Google Patents
Conductive clamp cleaning liquid recovery device, cleaning liquid recovery method and coating machine Download PDFInfo
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- CN113560271B CN113560271B CN202110857992.XA CN202110857992A CN113560271B CN 113560271 B CN113560271 B CN 113560271B CN 202110857992 A CN202110857992 A CN 202110857992A CN 113560271 B CN113560271 B CN 113560271B
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- 238000004140 cleaning Methods 0.000 title claims abstract description 464
- 238000011084 recovery Methods 0.000 title claims abstract description 272
- 239000007788 liquid Substances 0.000 title claims abstract description 181
- 238000000034 method Methods 0.000 title claims abstract description 24
- 239000011248 coating agent Substances 0.000 title abstract description 16
- 238000000576 coating method Methods 0.000 title abstract description 16
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 101
- 150000002500 ions Chemical class 0.000 claims abstract description 25
- 230000009467 reduction Effects 0.000 claims abstract description 21
- 238000007747 plating Methods 0.000 claims description 61
- 238000004090 dissolution Methods 0.000 claims description 44
- 238000004064 recycling Methods 0.000 claims description 43
- 150000002736 metal compounds Chemical class 0.000 claims description 39
- 239000002699 waste material Substances 0.000 claims description 35
- 239000002893 slag Substances 0.000 claims description 16
- 238000001914 filtration Methods 0.000 claims description 15
- 238000003756 stirring Methods 0.000 claims description 13
- 238000005406 washing Methods 0.000 claims description 11
- 238000001514 detection method Methods 0.000 claims description 9
- 239000003795 chemical substances by application Substances 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 41
- 230000000694 effects Effects 0.000 abstract description 19
- 238000003912 environmental pollution Methods 0.000 abstract description 11
- 238000003860 storage Methods 0.000 description 15
- 238000009713 electroplating Methods 0.000 description 13
- 230000008569 process Effects 0.000 description 11
- 238000010586 diagram Methods 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000010926 purge Methods 0.000 description 6
- 238000007599 discharging Methods 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000002035 prolonged effect Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- 230000002457 bidirectional effect Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000002198 insoluble material Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
Abstract
The invention discloses a conductive clamp cleaning liquid recovery device, a cleaning liquid recovery method and a coating machine, wherein the conductive clamp cleaning liquid recovery device comprises the following components: the cleaning box is internally provided with cleaning liquid for cleaning the conductive clamp; the first metal ion concentration detector is arranged in the cleaning tank and is used for detecting the concentration of metal ions in the cleaning liquid in the cleaning tank; the recovery box is connected with the cleaning box and is used for carrying out ion concentration reduction treatment on the cleaning liquid entering the recovery box; the first control valve is arranged between the cleaning tank and the recovery tank, and at least provided with a first station, and when the first control valve is opened and is positioned at the first station, cleaning liquid in the cleaning tank can enter the recovery tank. Thereby reducing the frequency of the recovery tank for processing the cleaning liquid and the recovery cost of the recovery tank, ensuring the cleaning effect of the conductive clamp, saving water resources and reducing environmental pollution.
Description
Technical Field
The application relates to the technical field of electroplating waste treatment, in particular to a conductive clamp cleaning liquid recovery device, a cleaning liquid recovery method and a coating machine.
Background
The electroplating process is to plate one metal film or alloy film on the surface of the plated part, and has the functions of altering the surface property, preventing oxidation, raising the wear resistance, conductivity, light reflectivity, heat resistance, corrosion resistance, etc.
In the electroplating process, the conductive clamp serving as a plating piece support body is reversely plated with a corresponding metal layer, and the conductive clamp is repeatedly used, so that the conductive clamp is cleaned by using a water washing liquid and a stripping liquid after the plating piece is clamped by the conductive clamp to finish electroplating, the service life of the conductive clamp is prolonged, and the electroplating effect of the plating piece is ensured. However, the liquid after washing the conductive clip is generally directly discharged, thereby causing waste of resources and environmental pollution.
Disclosure of Invention
Aiming at the defects in the prior art, the invention provides a conductive clamp cleaning liquid recovery device, a cleaning liquid recovery method and a coating machine, so as to solve the technical problems of resource waste and environmental pollution caused by direct discharge of waste liquid in the prior art.
In order to solve the above technical problem, in a first aspect, the present invention provides a conductive clip cleaning solution recycling device, including:
the cleaning box is internally provided with cleaning liquid for cleaning the conductive clamp;
the first metal ion concentration detector is arranged in the cleaning tank and is used for detecting the concentration of metal ions in the cleaning liquid in the cleaning tank;
the recovery box is connected with the cleaning box and is used for carrying out ion concentration reduction treatment on the cleaning liquid entering the recovery box;
the first control valve is arranged between the cleaning tank and the recovery tank, and at least provided with a first station, and when the first control valve is opened and is positioned at the first station, cleaning liquid in the cleaning tank can enter the recovery tank.
According to the conductive clamp cleaning liquid recovery device provided by the embodiment of the invention, the first metal ion concentration detector is arranged in the cleaning tank to detect the metal ion concentration in the cleaning liquid in the cleaning tank, and the opening or closing of the first control valve can be accurately controlled according to the metal ion concentration, so that the condition that the cleaning liquid is directly discharged into the recovery tank to carry out ion concentration reduction treatment when the metal ion concentration in the cleaning liquid in the cleaning tank is low is avoided, the effects of reducing the frequency of the cleaning liquid treated by the recovery tank and the recovery cost of the recovery tank are achieved, the condition that the cleaning liquid cannot be timely discharged into the recovery tank to be treated when the metal ion concentration in the cleaning liquid in the cleaning tank is high is also avoided, and the cleaning effect of the conductive clamp is ensured. In addition, the recovery tank can carry out ion concentration reduction treatment on the cleaning liquid discharged from the cleaning tank, and the treated cleaning liquid can be continuously used for cleaning the conductive clamp, so that the cleaning liquid can be recycled, and meanwhile, the direct discharge of the cleaning liquid after cleaning the conductive clamp can be avoided, and therefore, the resource waste and the environmental pollution are reduced.
In a possible implementation manner of the first aspect, the first control valve is a reversing valve, and the first control valve further has a second station, and when the first control valve is opened and is in the second station, the cleaning solution after the treatment of the recovery tank can enter the cleaning tank through the first control valve.
Therefore, the station of the first control valve is switched to change the flow direction of the cleaning liquid in the cleaning tank and the recovery tank, a plurality of openings are not required to be arranged on the cleaning tank and the recovery tank, and the structures of the cleaning tank and the recovery tank are simplified.
In a possible implementation manner of the first aspect, the cleaning tank further has a recovery inlet, the cleaning tank has a waste liquid outlet and a recovery inlet, the recovery tank has an inlet and an outlet, the waste liquid outlet is communicated with the inlet of the recovery tank, the recovery inlet is communicated with the outlet of the recovery tank, the first control valve is a one-way valve, the first control valve is connected between the waste liquid outlet and the inlet of the recovery tank, and when the first control valve is opened, cleaning liquid in the cleaning tank can enter the recovery tank through the first control valve. In this way, the flexibility of the flow direction of the cleaning liquid can be improved.
In a possible implementation manner of the first aspect, the conductive clamp cleaning solution recycling device further includes a first controller, the first controller is electrically connected with the first metal ion concentration detector and the first control valve respectively, and the first controller is used for controlling the first control valve to be opened or closed according to detection information of the first metal ion concentration detector so as to improve the automation degree of opening or closing of the first control valve.
In a possible implementation manner of the first aspect, the recovery tank contains a displacer, and the displacer is used for displacing metal ions in the cleaning solution in the recovery tank to generate the water-insoluble metal compound. Thus, the metal ions in the cleaning liquid can be separated from the cleaning liquid.
In a possible implementation manner of the first aspect, a second metal ion concentration detector is arranged in the recovery tank, and the second metal ion concentration detector is used for detecting the metal ion concentration in the cleaning solution in the recovery tank;
a second control valve is arranged between the outlet and the recycling inlet of the recycling box, and when the second control valve is opened, cleaning liquid in the recycling box can enter the cleaning box;
the conductive clamp cleaning liquid recovery device further comprises a second controller, the second controller is respectively and electrically connected with the second metal ion concentration detector and the second control valve, and the second controller is used for controlling the second control valve to be opened or closed according to detection information of the second metal ion concentration detector.
Therefore, the concentration of metal ions in the cleaning liquid in the recovery tank can be detected, whether the cleaning liquid in the recovery tank enters the cleaning tank can be automatically controlled, and further, the cleaning liquid flowing into the cleaning tank from the recovery tank is ensured to meet the standard of cleaning the conductive clamp again.
In a possible implementation manner of the first aspect, a filtering device is provided between the recovery tank and the purge tank, and the filtering device is used for filtering the water-insoluble metal compound. Thereby, the recovery effect of the cleaning liquid is improved.
In a possible implementation manner of the first aspect, the filtering device is a filter screen, and the filter screen allows the cleaning solution to pass through and can prevent the water-insoluble metal compound from passing through so as to improve the filtering effect of the cleaning solution.
In a possible implementation manner of the first aspect, the filter screen is disposed at an outlet of the recovery tank. Thus, the structure of the filter screen is simple.
In a possible implementation manner of the first aspect, the conductive clamp cleaning solution recycling device further includes a dissolution tank, the recycling tank is further provided with a slag discharge port, an inlet of the dissolution tank is connected with the slag discharge port, an outlet of the dissolution tank is used for being connected with the plating solution tank, and a dissolution agent is contained in the dissolution tank and used for dissolving the water-insoluble metal compound so as to generate the plating solution. Thus, the resource waste is reduced.
In a possible implementation manner of the first aspect, a heater is provided on the dissolution tank, and the heater is used for heating the dissolution tank. Thereby, the dissolution rate of the water-insoluble compound by the dissolution tank is improved.
In a possible implementation manner of the first aspect, a stirring device is disposed in the recovery tank, so as to increase a reaction rate of metal ions in the cleaning solution in the recovery tank and the displacer.
In a second aspect, the invention also provides a film plating machine, which comprises the conductive clamp cleaning liquid recovery device in the first aspect.
According to the coating machine provided by the invention, the conductive clamp cleaning liquid recovery device is adopted, so that the cleaning liquid after cleaning the conductive clamp can be recovered and utilized, and the water resource waste and the environmental pollution are reduced. In addition, the conductive clamp cleaning liquid recovery device can recycle the metal ions cleaned from the conductive clamp, so that the resource waste is reduced.
In a possible implementation manner of the second aspect, the film plating machine further includes a plating solution tank, a first conveying device and a second conveying device, and the conductive clamp cleaning solution recovery device includes a first conductive clamp cleaning solution recovery device and a second conductive clamp cleaning solution recovery device;
the plating solution tank comprises a first side wall and a second side wall which extend along the horizontal direction and are oppositely arranged; the first conveying device comprises a first conveying belt which is arranged close to the first side wall, and a plurality of first conductive clamps which are arranged on the first conveying belt, wherein the first conductive clamps are arranged in the horizontal direction, the first conveying belt is used for driving the first conductive clamps to move along a first preset track, a cleaning box in the cleaning liquid recovery device of the first conductive clamps is arranged at the downstream of the plating liquid tank along the first preset track, and an inlet of the plating liquid tank is connected with an outlet of a dissolving box in the cleaning liquid recovery device of the first conductive clamps;
The second conveying device comprises a second conveying belt which is arranged close to the second side wall, a plurality of second conductive clamps which are arranged on the second conveying belt, the plurality of second conductive clamps are arranged along the horizontal direction, the second conveying belt is used for driving the second conductive clamps to move along a second preset track, a cleaning box in the second conductive clamp cleaning liquid recovery device is arranged at the downstream of the plating liquid tank along the second preset track, and an inlet of the plating liquid tank is also connected with an outlet of a dissolving box in the second conductive clamp cleaning liquid recovery device;
the first conductive clamp and the second conductive clamp respectively clamp two opposite sides of the conductive base film which is horizontally placed. Thus, the phenomenon of electric breakdown caused by the reduction of the cooling effect when the conductive base film is partially outside the plating solution tank can be avoided.
In a third aspect, the present invention also provides a cleaning solution recovery method, including the steps of:
detecting the concentration of metal ions in the cleaning liquid in the cleaning box;
when the concentration of metal ions in the cleaning liquid in the cleaning tank is detected to be larger than the preset concentration, the first control valve is opened, so that the cleaning liquid in the cleaning tank enters the recovery tank and is subjected to ion concentration reduction treatment;
and when the concentration of the metal ions in the cleaning liquid in the cleaning tank is detected to be smaller than the preset concentration, closing the first control valve.
According to the cleaning liquid recovery method provided by the invention, the first control valve is accurately controlled to be opened or closed according to the detection information detected by the first metal ion concentration detector, so that the cleaning liquid in the cleaning tank is fully utilized, the frequency of cleaning liquid treatment by the recovery tank and the recovery cost of the recovery tank are reduced, and the cleaning effect of the conductive clamp can be ensured. In addition, the recovery box can carry out ion concentration reduction treatment on the cleaning liquid flowing out of the cleaning box, so that the treated cleaning liquid can be continuously used for cleaning the conductive clamp, direct discharge of the cleaning liquid after cleaning the conductive clamp is avoided, and water resource waste and environmental pollution are reduced.
In a possible implementation manner of the third aspect, after the cleaning solution in the cleaning tank enters the recovery tank and is subjected to the ion concentration reducing treatment, the method further includes the steps of: detecting the concentration of metal ions in the cleaning solution in the recovery tank, and recovering the cleaning solution in the recovery tank into the cleaning tank when the concentration of metal ions in the cleaning solution in the recovery tank is larger than a preset concentration. So set up, reduced space occupation.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
Fig. 1 is a schematic structural diagram of a conductive clip cleaning solution recycling device according to an embodiment of the present invention;
fig. 2 is a schematic structural diagram of another conductive clip cleaning solution recycling device according to an embodiment of the present invention;
fig. 3 is a schematic structural view of a cleaning tank as a cleaning tank in the conductive clip cleaning liquid recovery device according to the embodiment of the present invention;
fig. 4 is a schematic structural view of a cleaning tank in the conductive clip cleaning liquid recovery device according to the embodiment of the present invention as a cleaning liquid for accumulating and cleaning the conductive clip;
fig. 5 is a schematic structural diagram of a first controller controlling a first control valve in the conductive clip cleaning solution recycling apparatus according to an embodiment of the present invention;
FIG. 6 is a schematic diagram of a recovery tank in a conductive clip cleaning solution recovery device according to an embodiment of the present invention to generate a water-insoluble metal compound;
fig. 7 is a schematic structural diagram of a stirring device in a conductive clip cleaning solution recycling device according to an embodiment of the present invention;
FIG. 8 is a schematic diagram of a structure in which a recovery tank is provided with a second metal ion concentration detector in a conductive clip cleaning solution recovery device according to an embodiment of the present invention;
fig. 9 is a schematic structural diagram of a second controller controlling a second control valve in the conductive clip cleaning solution recycling apparatus according to an embodiment of the present invention;
Fig. 10 is a schematic structural diagram of a cleaning solution in a cleaning tank according to an embodiment of the present invention being pumped into a recovery tank by a second water pump;
FIG. 11 is a schematic diagram of a structure of a conductive clip washing liquid recycling device provided with a filtering device according to an embodiment of the present invention;
fig. 12 is a schematic structural diagram of a filter screen in the conductive clip cleaning solution recycling device according to the embodiment of the present invention;
fig. 13 is a schematic structural view of a conductive clip cleaning solution recycling apparatus provided with a dissolution tank according to an embodiment of the present invention;
FIG. 14 is a schematic view of a structure of a conductive clip cleaning solution recycling apparatus according to an embodiment of the present invention, wherein a water storage tank is provided in the conductive clip cleaning solution recycling apparatus;
FIG. 15 is a schematic view of a structure in which a heater is provided in a dissolution tank in a conductive clip cleaning solution recycling apparatus according to an embodiment of the present invention;
FIG. 16 is a top view of a coating machine according to an embodiment of the present invention;
fig. 17 is a flowchart of a cleaning solution recycling method according to an embodiment of the present invention.
Reference numerals illustrate:
10-a film plating machine; 11-plating bath; 13-a first transfer device; 14-a second conveyor; 20-a conductive base film; 100-a cleaning liquid recovery device of the conductive clamp; 103-a water-insoluble metal compound; 110-a purge bin; 111-recovery inlet; 112-waste liquid outlet; 113-a spray head; 160-a pump; 120-a recovery box; 121-a driver; 122-stirring plate; 123-outlet of recovery tank; 124-a slag discharge port; 131-a first metal ion concentration detector; 132-a second metal ion concentration detector; 141-a first control valve; 142-a second control valve; 150-a dissolution tank; 151-a heater; 161-a first suction pump; 162-a second suction pump; 163-a third suction pump; 170-a filtration device; 171-a filter screen; 181-a first controller; 182-a second controller; 190-a water storage tank; 200-conducting clips; 1101-first purge bin; 1102-a second purge bin; 1201-a first recovery tank; 1202-a second recovery tank; 1301-a first conveyor belt; 1302-a first conductive clip; 1401-a second conveyor belt; 1402-second conductive clip.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
In the present invention, the terms "upper", "lower", "left", "right", "front", "rear", "top", "bottom", "inner", "outer", "vertical", "horizontal", "lateral", "longitudinal" and the like indicate an azimuth or a positional relationship based on that shown in the drawings. These terms are only used to better describe the present invention and its embodiments and are not intended to limit the scope of the indicated devices, elements or components to the particular orientations or to configure and operate in the particular orientations.
Also, some of the terms described above may be used to indicate other meanings in addition to orientation or positional relationships, for example, the term "upper" may also be used to indicate some sort of attachment or connection in some cases. The specific meaning of these terms in the present invention will be understood by those of ordinary skill in the art according to the specific circumstances.
Furthermore, the terms "mounted," "configured," "provided," "connected," and "connected" are to be construed broadly. For example, it may be a fixed connection, a removable connection, or a unitary construction; may be a mechanical connection, or an electrical connection; may be directly connected, or indirectly connected through intervening media, or may be in internal communication between two devices, elements, or components. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art according to the specific circumstances.
Furthermore, the terms "first," "second," and the like, are used primarily to distinguish between different devices, elements, or components (the particular species and configurations may be the same or different), and are not used to indicate or imply the relative importance and number of devices, elements, or components indicated. Unless otherwise indicated, the meaning of "a plurality" is two or more.
Electroplating is a process of plating some plated parts with a layer of other metals or alloys on the surface using the principle of electrolysis. Specifically, plating metal or other insoluble materials are used as an anode, a workpiece to be plated is used as a cathode, and liquid containing plating metal ions is used as plating solution. Before electroplating, the anode and the cathode are electrified, a loop is formed among the anode, the plating solution and the cathode by current, and cations of plating metal are reduced on the surface of a workpiece to be plated to form a plating layer in the electroplating process.
In the process of manufacturing a current collector of a lithium ion battery, a thicker metal plating layer is generally formed on a conductive base film using an electroplating process to manufacture the current collector. The electroplating process can be specifically completed by a coating machine.
The coating machine comprises a coating liquid tank and a conductive base film conveying device, wherein the coating liquid tank is filled with coating liquid, and the conductive base film conveying device is used for conveying the conductive base film into the coating liquid tank. Specifically, the conductive base film conveying device comprises a conveying belt and a conductive clamp, wherein the conductive clamp is used for clamping the conductive base film and electrifying the conductive base film, and the conveying belt is used for driving the conductive clamp to move so that the conductive base film enters the plating solution tank.
In the electroplating process, the conductive clamp serving as a plating piece support body is reversely plated with a corresponding metal layer, and the conductive clamp is repeatedly used, so that the conductive clamp is cleaned by using a water washing liquid and a stripping liquid after the plating piece is clamped by the conductive clamp to finish electroplating, the service life of the conductive clamp is prolonged, and the electroplating effect of the plating piece is ensured. However, the liquid after washing the conductive clip is generally directly discharged, thereby causing waste of resources and environmental pollution.
In view of this, the embodiment of the invention provides a conductive clamp cleaning solution recovery device and a coating machine, which can recover and process the cleaning solution after cleaning the conductive clamp, so that the cleaning solution after the treatment can be reused for cleaning the conductive clamp, thus, the cleaning solution can be recycled, the waste of water resources is avoided, and the environmental pollution is reduced.
The conductive clip cleaning liquid recovery device is described in detail below by specific examples:
example 1
The embodiment of the application provides a conductive clamp cleaning solution recovery device 100, as shown in fig. 1, the conductive clamp cleaning solution recovery device 100 includes a cleaning tank 110, a first metal ion concentration detector 131, a recovery tank 120 and a first control valve 141, wherein the cleaning tank 110 is accommodated with a cleaning solution for cleaning a conductive clamp 200, the first metal ion concentration detector 131 is arranged in the cleaning tank 110 and is used for detecting the concentration of metal ions in the cleaning solution in the cleaning tank 110, the cleaning tank 110 and the recovery tank 120 are connected through the first control valve 141, the recovery tank 120 is used for performing ion concentration reduction treatment on the cleaning solution entering the recovery tank 120, the first control valve 141 is provided with at least a first station, and when the first control valve 141 is opened and is positioned at the first station, the cleaning solution in the cleaning tank 110 can enter the recovery tank 120.
Thus, by providing the first metal ion concentration detector 131 in the cleaning tank 110, the first metal ion concentration detector 131 can detect the metal ion concentration in the cleaning liquid in the cleaning tank 110 and can precisely control the opening or closing of the first control valve 141 according to the metal ion concentration, thereby avoiding the situation that the cleaning liquid is directly discharged into the recovery tank 120 for ion concentration reduction treatment when the metal ion concentration in the cleaning liquid in the cleaning tank 110 is low, and achieving the effect of reducing the frequency of the recovery tank 120 for treating the cleaning liquid and the recovery cost of the recovery tank 120. But also avoids the situation that the cleaning solution can not be discharged to the recovery tank 120 in time when the concentration of the metal ions in the cleaning solution in the cleaning tank 110 is higher, and ensures the cleaning effect of the conductive clip 200. In addition, the recovery tank 120 can perform ion concentration reduction treatment on the cleaning liquid discharged from the cleaning tank 110, and the treated cleaning liquid can be continuously used for cleaning the conductive clip 200, so that the cleaning liquid can be recycled, and meanwhile, direct discharge of the cleaning liquid after cleaning the conductive clip 200 can be avoided, thereby reducing resource waste and environmental pollution.
In addition, the above description has been given of the connection of the purge tank 110 and the recovery tank 120 through the first control valve 141, and the specific connection form of the first control valve 141 will be described below:
in a possible connection structure of the first control valve 141, when the first control valve 141 is a reversing valve, as shown in fig. 1, the first control valve 141 has a first station and a second station, when the first control valve 141 is in the first station, the cleaning solution in the cleaning tank 110 enters the recovery tank 120 through the first control valve 141, and when the first control valve 141 is in the second station, the cleaning solution after the treatment in the recovery tank 120 can enter the cleaning tank 110 through the first control valve 141. The specification of the reversing valve is not limited herein, and for example, the reversing valve is a two-position two-way reversing valve.
As shown in fig. 1, the power of the cleaning solution entering the recovery tank 120 from the cleaning tank 110 through the first control valve 141 is a pressure difference, and the power of the cleaning solution entering the cleaning tank 110 from the recovery tank 110 through the first control valve 141 is provided by the first water pump 161, so that the cleaning solution after the ion concentration lowering treatment of the recovery tank 120 returns to the cleaning tank 110 again for cleaning the conductive clip 200, and the purpose of recycling the cleaning solution is achieved. Of course, the power from the cleaning tank 110 to the recovery tank 120 and the cleaning liquid from the recovery tank 120 to the cleaning tank 110 is not limited to the above-described structure, and a bidirectional water pump may be provided between the cleaning tank 110 and the recovery tank 120, which will not be described here.
Therefore, when the first control valve 141 is a reversing valve, the stations of the first control valve 141 are switched to change the flow directions of the cleaning liquid in the cleaning tank and the recovery tank, so that a plurality of openings are not required to be arranged on the cleaning tank and the recovery tank, and the structures of the cleaning tank and the recovery tank are simplified.
In another possible connection structure of the first control valve 141, the first control valve 141 is a one-way valve, as shown in fig. 2, the cleaning tank 110 has a waste liquid outlet 112 and a recovery inlet 111, the recovery tank 120 has an inlet and an outlet, the waste liquid outlet 112 is communicated with the inlet of the recovery tank 120, the recovery inlet 111 is communicated with the outlet of the recovery tank 120, the first control valve 141 is connected between the waste liquid outlet and the inlet of the recovery tank, and when the first control valve 141 is opened, the cleaning liquid in the cleaning tank can enter the recovery tank through the first control valve 141.
Wherein, as shown in fig. 2, the cleaning solution enters the recovery tank 120 through the inlet of the recovery tank 120 via the waste liquid outlet 112 via the first control valve 141, and the inner pressure surface of the cleaning tank 110 is higher than the liquid surface in the recovery tank 120, so that the cleaning solution in the cleaning tank 110 enters the recovery tank 120 via the pressure difference, and the outlet of the recovery tank 120 is connected with the recovery inlet 111, and a first water pump 161 is connected between the outlet of the recovery tank 120 and the recovery inlet 111, so that the cleaning solution in the recovery tank 120 is pumped into the cleaning tank 110 via the first water pump 161, so that the cleaning solution after the ion concentration reduction treatment by the recovery tank 120 returns to the cleaning tank 110 for cleaning the conductive clip 200, thereby realizing the purpose of recycling the cleaning solution.
Thus, the waste liquid outlet 112 is communicated with the inlet of the recovery tank 120, and the recovery inlet 111 is communicated with the outlet of the recovery tank 120, so that the cleaning liquid flows from the cleaning tank 110 to the recovery tank 120 and flows from the recovery tank 120 to the cleaning tank 110 at the same time, and the cleaning liquid flows from the cleaning tank 110 to the recovery tank 120 and flows from the recovery tank 120 to the cleaning tank 110 in sequence, thereby improving the flexibility of the cleaning liquid flow direction.
Of course, the installation positions of the purge tank 110 and the recovery tank 120 are not limited to the above configuration, and for example, the first control valve may be provided between the outlet of the recovery tank 120 and the recovery inlet 111, and will not be described here.
The following description will be made with the first control valve 141 as a check valve only:
the cleaning tank 110 may be used as a cleaning tank for cleaning the conductive clip 200, or may be used as a device for accumulating the cleaning liquid after cleaning the conductive clip 200, for example, as shown in fig. 3, when the cleaning tank 110 is used as the cleaning tank, the conductive clip 200 may directly clean the cleaning liquid in the cleaning tank, the concentration of metal ions in the cleaning liquid in the cleaning tank is detected by the first metal ion concentration detector 131, and when the concentration of metal ions is greater than a preset concentration, the first control valve 141 is controlled to be opened so that the cleaning liquid with a higher concentration of metal ions in the cleaning tank flows into the recovery tank 120.
As another example, as shown in fig. 4, the cleaning tank 110 is a device for accumulating the cleaning liquid of the conductive clip 200 cleaned by the cleaning device, wherein the cleaning device further includes a shower head 113 and a pump 160, an outlet of the pump 160 is connected to the shower head 113, an inlet of the pump 160 is connected to the cleaning tank 110, and the pump 160 can pump the cleaning liquid in the cleaning tank 110 to the shower head 113 so that the shower head 113 sprays the cleaning liquid to the conductive clip 200, and the cleaning liquid of the cleaned conductive clip 200 flows into the cleaning tank 110.
The first control valve 141 may be manually controlled or automatically controlled, if the first control valve 141 is manually controlled, when the first metal ion concentration detector 131 detects that the metal ion concentration in the cleaning solution in the cleaning tank 110 is greater than the preset value, an alarm may be used to alert an operator to manually open the first control valve 141 so that the cleaning solution in the cleaning tank 110 flows into the recovery tank 120, otherwise, the first control valve 141 is not operated so that the cleaning solution in the cleaning tank 110 is continuously used for cleaning the conductive clip 200.
If the first control valve 141 is automatically controlled, as shown in fig. 5, the first controller 181 may be implemented by using the first controller 181, where the first controller 181 is electrically connected to the first metal ion concentration detector 131 and the first control valve 141, and the first controller 181 is configured to control the first control valve 141 to be opened or closed according to the detection information of the first metal ion concentration detector 131, specifically, when the first metal ion concentration detector 131 detects that the metal ion concentration in the cleaning solution in the cleaning tank 110 is greater than the preset concentration, the first metal ion concentration detector 131 sends a detection signal to the first controller 181, and the first controller 181 controls the first control valve 141 to be opened according to the received detection signal, so that the cleaning solution in the cleaning tank 110 flows into the recovery tank 120, and the recovery tank 120 can reduce the concentration of the metal ions in the entered cleaning solution, otherwise, the first controller 181 controls the first control valve 141 to be closed, so that the cleaning solution in the cleaning tank 110 is continuously used for cleaning the conductive clip 200, and thus the degree of automation of opening or closing the first control valve 141 is improved.
In one possible implementation of this embodiment, the recovery tank 120 contains a displacer that displaces the metal ions in the cleaning solution in the recovery tank, as shown in fig. 6, to form a water-insoluble metal compound 103, thereby separating the metal ions in the cleaning solution from the cleaning solution.
For example, the metal compound containing metal ions in the cleaning liquid is CuSO 4 The displacer is Na 2 CO 3 The displacement reaction that occurs is:
CuSO 4 +Na 2 CO 3 +H 2 O＝Cu 2 (OH) 2 CO 3 ↓+Na 2 SO 4 +CO 2 ∈ it can be seen that by the displacer Na 2 CO 3 So that the metal ions Cu 2+ Becomes water-insoluble metal compound 103, i.e. Cu 2 (OH) 2 CO 3 。
The foregoing is merely illustrative of the reaction of metal ions with the displacer to form the water-insoluble metal compound 103 and is not to be construed as limiting the metal ions and/or displacer as would be understood by one skilled in the art.
In order to increase the reaction rate of the metal ions in the cleaning solution in the recovery tank 120 and the displacer, a stirring device is provided in the recovery tank 120, and the stirring device is used for stirring the cleaning solution in the recovery tank 120 and the displacer.
Alternatively, as shown in fig. 7, the stirring device includes a driving machine 121 and a stirring plate 122 connected to the driving end of the driving machine 121, where the stirring plate 122 is disposed in the recovery tank 120, and the driving machine 121 provides rotation power to drive the stirring plate 122 to stir in the recovery tank 120, so that the cleaning solution and the displacer in the recovery tank 120 are uniformly stirred, thereby improving the reaction rate of metal ions in the cleaning solution and the displacer, and improving the effect of the recovery tank 120 on the concentration treatment of the cleaning solution for reducing the ion concentration.
By providing the stirring device in the recovery tank 120, the effect of the recovery tank 120 on the ion concentration reduction treatment of the cleaning liquid is improved, but the concentration of the metal ions in the cleaning liquid after the treatment of the recovery tank 120 is difficult to determine, so as to judge whether the cleaning liquid after the treatment of the recovery tank 120 meets the cleaning conductive clamp 200 standard. In one possible implementation manner of this embodiment, as shown in fig. 8 and 9, a second control valve 142 is disposed between the outlet 123 of the recovery tank and the recovery inlet 111, a second metal ion concentration detector 132 is disposed in the recovery tank 120, the second control valve 142 and the second metal ion concentration detector 132 are further electrically connected to a second controller 182, respectively, and the second controller 182 is configured to control the second control valve 142 to be opened or closed according to the metal ion concentration in the cleaning solution in the recovery tank 120 detected by the second metal ion concentration detector 132, so that the metal ion concentration of the cleaning solution in the recovery tank 120 can be detected to control whether the cleaning solution processed in the recovery tank 120 enters into the cleaning tank 110, thereby ensuring that the cleaning solution flowing into the cleaning tank 110 from the recovery tank 120 meets the criterion of cleaning the conductive clip 200 again.
Specifically, a preset concentration is preset in the second controller 182, where the preset concentration is a boundary point where the concentration of metal ions in the cleaning solution capable of cleaning the conductive clip 200 is contained, and when the second metal ion concentration detector 132 detects that the concentration of metal ions in the cleaning solution in the recovery tank 120 is greater than or equal to the preset concentration, the second controller 182 controls the second control valve 142 to close, and the recovery tank 120 continues to perform the ion concentration reducing treatment on the cleaning solution in the recovery tank 120, for example, by increasing the amount of the displacer, so that the metal ions in the cleaning solution in the recovery tank 120 react as completely as possible, and further the concentration of metal ions in the cleaning solution in the recovery tank 120 is reduced. When the second metal ion concentration detector 132 detects that the concentration of metal ions in the cleaning liquid in the recovery tank 120 is less than the preset concentration, the second controller 182 controls the second control valve 142 to be opened, so that the cleaning liquid processed by the recovery tank 120 enters the cleaning tank 110 through the second control valve 142 and the recovery inlet 111 for continuing to clean the conductive clip 200. In this way, the concentration of the metal ions in the cleaning solution in the recovery tank 120 can be detected at any time, and the concentration of the metal ions in the cleaning solution entering the recovery tank 120 can be ensured, so that the cleaning effect of the conductive clip 200 can be improved.
The flow of the cleaning solution from the cleaning tank 110 to the recovery tank 120 includes two types, one type is a power provided according to a pressure difference, specifically, as shown in fig. 2, the cleaning tank 110 is located above the recovery tank 120, and the level of the waste liquid outlet 112 is higher than the level of the inlet of the recovery tank 120, so that a pressure difference is formed between the waste liquid outlet 112 and the inlet of the recovery tank 120, and when the first control valve 141 is opened, the cleaning solution in the cleaning tank 110 flows from the waste liquid outlet 112 to the inlet of the recovery tank 120 to enter the recovery tank 120, without using other power, thereby saving energy. The other is the power provided by the water pump 160, specifically, as shown in fig. 10, the inlet of the second water pump 162 is connected with the waste liquid outlet 112 through the first control valve 141, the outlet of the second water pump 162 is connected with the inlet of the recovery tank 120, the inlet of the third water pump 163 is connected with the outlet 123 of the recovery tank, the outlet of the third water pump 163 is connected with the recovery inlet 111, when the first control valve 141 is opened, the second water pump 162 works to pump the cleaning liquid in the cleaning tank 110 into the recovery tank 120, when the recovery tank 120 finishes the ion concentration lowering treatment, the third water pump 163 works to pump the cleaning liquid in the recovery tank 120 into the cleaning tank 110 without considering the setting positions of the cleaning tank 110 and the recovery tank 120, that is, the setting of the positional relationship of the two is flexible. Accordingly, the selection of the power of the flow of the cleaning liquid from the cleaning tank 110 to the recovery tank 120 can be made by those skilled in the art according to actual needs.
When the concentration of the metal ions in the cleaning solution in the recovery tank 120 is less than the preset concentration, the cleaning solution in the recovery tank 120 is recovered into the cleaning tank 110 to be used for cleaning the conductive clip 200 again, but since the water-insoluble metal compound 103 is mixed in the cleaning solution in the recovery tank 120, in order to remove the water-insoluble metal compound 103 from the cleaning solution, as shown in fig. 11, a filtering device 170 is provided between the recovery tank 120 and the cleaning tank 110, and the filtering device 170 is used for filtering the water-insoluble metal compound 103, so that the water-insoluble metal compound 103 in the cleaning solution entering the cleaning tank 110 from the recovery tank 120 is filtered out, and thus, the cleaning solution containing the lower concentration of the metal ions or not containing the metal ions is recovered for use, thereby improving the recovery effect of the cleaning solution.
Specifically, the filter 170 is a filter 171, and the mesh openings on the filter 171 allow the cleaning liquid to pass therethrough, and can prevent the water-insoluble metal compound 103 from passing therethrough. For example, the particle diameter of the water-insoluble metal compound 103 is 0.5mm, and the diameter of the mesh of the filter screen 171 is set to be smaller than 0.5mm, so that the water-insoluble metal compound 103 is ensured to be completely filtered, so that the washing liquid entering the washing tank 110 from the recovery tank 120 does not contain the water-insoluble metal compound 103, thereby improving the filtering effect of the washing liquid.
Optionally, the filter screen 171 is disposed at the outlet 123 of the recovery tank, so that all water-insoluble metal compounds in the cleaning solution passing through the outlet 123 of the recovery tank are filtered out, and the filter has a simple structure and a good filtering effect. For example, as shown in fig. 12, when the cleaning liquid in the recovery tank 120 flows out from the outlet 123 of the recovery tank, the filter screen 171 allows the cleaning liquid to pass therethrough, so that the water-insoluble metal compound 103 is left in the recovery tank 120, and the cleaning liquid in the cleaning tank 110 is pumped to the recovery tank 120 by the second water pump 162 for ion concentration reduction treatment.
In order not to affect the ion concentration reduction treatment of the continuously entering cleaning solution by the recovery tank 120, the water-insoluble metal compound 103 generated by the displacement reaction needs to be removed in time, in one possible implementation manner, as shown in fig. 13, the recovery tank 120 is further provided with a slag discharging port 124, a dissolution tank 150 is further connected to the slag discharging port 124, that is, the slag discharging port 124 is further connected to an inlet of the dissolution tank 150, a dissolution agent is contained in the dissolution tank 150, and the dissolution agent is used for dissolving the water-insoluble metal compound 103 so as to generate a plating solution, and the generated plating solution enters the plating solution tank 11 through an outlet of the dissolution tank 150, so that the generated water-insoluble metal compound 103 is recycled, and resource waste is reduced.
Specifically, the slag discharge port 124 is provided with a control valve, and when the cleaning liquid in the recovery tank 120 is completely discharged to the cleaning tank 110, the control valve is opened to discharge the water-insoluble metal compound 103 in the recovery tank 120 to the dissolution tank 150, and the position of the slag discharge port 124 is not limited, for example, the slag discharge port 124 is provided at the bottom of the recovery tank 120.
Continuing to use the water-insoluble metal compound 103 as Cu 2 (OH) 2 CO 3 The process in which the water-insoluble metal compound 103 is dissolved by the dissolving agent is described as an example: if the dissolving agent is H 2 SO 4 Dissolving in waterAntidote H 2 SO 4 Dissolving Cu 2 (OH) 2 CO 3 The chemical reaction of (a) is:
Cu 2 (OH) 2 CO 3 +2H 2 SO 4 ＝2Cu SO 4 +3H 2 O+CO 2 ∈, cu SO formed 4 And H 2 O is a main component constituting the plating solution, and it can be seen that the water-insoluble metal compound 103 chemically reacts with the dissolving agent and generates the plating solution.
Optionally, as shown in fig. 14, the conductive clip washing liquid recycling apparatus 100 further includes a water storage tank 190, an inlet of the water storage tank 190 is connected to an outlet 123 of the recycling tank, an outlet of the water storage tank 190 is connected to an inlet of the washing tank 110, and a filter screen 171 is provided in the water storage tank 190 so that the water-insoluble metal compound 103 entering the water storage tank 190 is filtered out. The water storage tank 190 is used to store the cleaning solution after the recovery tank 120 is processed, and when the cleaning solution in the cleaning tank 110 is insufficient, the water storage tank 190 supplies the cleaning solution to the cleaning tank 110.
The location of the filter 171 in the water reservoir 190 is not limited, and for example, the filter 171 is disposed at the inlet of the water reservoir 190, or the filter 171 is disposed at the top of the inner space of the water reservoir 190, the water-insoluble metal compound 103 in the cleaning liquid entering the water reservoir 190 can be filtered out.
As illustrated in fig. 14, the filter 171 is disposed at the top of the inner space of the water storage tank 190, and a predetermined angle is formed between the filter 171 and the horizontal direction, that is, a distance between one side of the filter 171 and the top of the water storage tank 190 is smaller than a distance between the other side of the filter 171 and the top of the water storage tank 190, one side of the filter 171 is defined as an inlet side, the other side of the filter 171 is defined as an outlet side, a slag outlet 124 is provided on a side wall of the water storage tank 190 near the outlet side, a control valve is provided at the slag outlet 124, and when more water-insoluble metal compounds 103 are present on the filter 171, the control valve is opened such that the water-insoluble metal compounds 103 are discharged from the slag outlet 124, and because the slag outlet 124 is connected to an inlet of the dissolution tank 150, the water-insoluble metal compounds 103 discharged from the slag outlet 124 enter the dissolution tank 150 to be dissolved.
In addition, the power for the cleaning solution from the recovery tank 120 to the water storage tank 190 and from the water storage tank 190 to the cleaning tank 110 can be provided by the pressure difference or by the water pump 160, and the specific process is similar to that described above and will not be repeated here.
In order to accelerate the dissolution rate of the dissolution tank 150 with respect to the water-insoluble metal compound 103, as shown in fig. 15, a heater 151 is provided on the dissolution tank 150, the heater 151 is used to heat the dissolution tank 150, and the dissolution tank 150 is heated to raise the temperature in the dissolution tank 150, thereby accelerating the chemical reaction in the dissolution tank 150, and in addition, if the water-insoluble metal compound 103 is Cu 2 (OH) 2 CO 3 At the time of heating Cu 2 (OH) 2 CO 3 Can also generate decomposition reaction to further improve the water-insoluble metal compound 103Cu 2 (OH) 2 CO 3 Is not limited, and the dissolution efficiency of the catalyst is improved.
Example two
The present embodiment also provides a coating machine 10, which includes the conductive clip cleaning liquid recovery device 100 of the first embodiment.
In the coating machine 10 provided in this embodiment, the conductive clamp cleaning solution recovery device 100 of the first aspect is adopted, so that the cleaning solution after cleaning the conductive clamp can be recovered and utilized, and water resource waste and environmental pollution are reduced. In addition, the conductive clip cleaning liquid recovery device 100 can also recycle the metal ions cleaned from the conductive clip 200, thereby reducing the resource waste.
Specifically, as shown in fig. 16, the plating machine 10 includes a conductive clip cleaning liquid recovery device 100, a plating liquid tank 11, a first conveying device 13, and a second conveying device 14, wherein the conductive clip cleaning liquid recovery device 100 includes a first conductive clip cleaning liquid recovery device and a second conductive clip cleaning liquid recovery device, the plating liquid tank 11 includes a first side wall and a second side wall extending in a horizontal direction and disposed opposite to each other, the first conveying device 13 includes a first conveying belt 1301 and a first conductive clip 1302 disposed on the first conveying belt 1301, and the second conveying device 14 includes a second conveying belt 1401 and a second conductive clip 1402 disposed on the second conveying belt 1401. The first cleaning tank 1101 in the first conductive clamp cleaning solution recovery device and the second cleaning tank 1102 in the second conductive clamp cleaning solution recovery device are respectively arranged on the opposite sides of the first side wall and the second side wall of the plating solution tank 11, the first conveying belt 1301 is used for driving the first conductive clamp 1302 to enter the first cleaning tank 1101 for cleaning, the second conveying belt 1401 is used for driving the second conductive clamp 1402 to enter the second cleaning tank 1102 for cleaning, the cleaning solution after cleaning the first conductive clamp 1302 and the second conductive clamp 1402 respectively enter the first recovery tank 1201 in the first conductive clamp cleaning solution recovery device and the second recovery tank 1202 in the second conductive clamp cleaning solution recovery device, and the first recovery tank 1201 and the second recovery tank 1202 can carry out ion concentration reduction treatment on the cleaning solution so that the treated cleaning solution can be reused for cleaning the first conductive clamp 1302 and the second conductive clamp 1402, and the waste of resources is effectively reduced.
In addition, as shown in fig. 16, the first conveyor belt 1301 is disposed near the first sidewall, a plurality of first conductive clips 1302 are disposed on the first conveyor belt 1301, the plurality of first conductive clips 1302 are arranged along a horizontal direction, the first conveyor belt 1301 is used for driving the first conductive clips 1302 to move along a first preset track, the first cleaning tank 1101 is disposed downstream of the plating solution tank 11 along the first preset track, and an inlet of the plating solution tank 11 is connected with an outlet of the first dissolution tank 150 in the first conductive clip cleaning solution recovery device, so that the plating solution formed by dissolution of the first dissolution tank 150 can enter the plating solution tank 11 to continue to be used for plating, and resource waste is reduced.
As shown in fig. 16, the second conveyor belt 1401 is disposed near the second side wall, a plurality of second conductive clips 1402 are disposed on the second conveyor belt 1401, the plurality of second conductive clips 1402 are arranged along a horizontal direction, the second conveyor belt 1401 is configured to drive the second conductive clips 1402 to move along a second preset track, the second cleaning tank 1102 is disposed downstream of the plating solution tank 11 along the second preset track, and an inlet of the plating solution tank 11 is further connected with an outlet of the second dissolution tank 150 in the second conductive clip cleaning solution recovery device, so that the plating solution dissolved by the second dissolution tank 150 can enter the plating solution tank 11 to continue to be used for plating, and resource waste is reduced.
It should be noted that, the first preset track refers to the moving track of the first conveyor belt 1301, and the second preset track refers to the moving track of the second conveyor belt 1401, for example, as shown in fig. 16, when the first conveyor belt 1301 and the second conveyor belt 1401 are both oval conveyor belts, then the first preset track and the second preset track are oval conveyor belts.
Second, the first cleaning tank 1101 and the second cleaning tank 1102 are both cleaning tanks 110 in the conductive clip cleaning liquid recovery apparatus 100 of the first aspect. The first recovery tank 1201 and the second recovery tank 1202 are both recovery tanks 120 in the conductive clip cleaning liquid recovery device 100 of the first aspect. The first dissolution tank 150 and the second dissolution tank 150 are both dissolution tanks 150 in the conductive clip cleaning solution recovery apparatus 100 of the first aspect.
The film plating machine 10 is in a horizontal film-moving mode, and when film plating is performed, the first conductive clamp 1302 and the second conductive clamp 1402 clamp opposite sides of the conductive base film 20 placed horizontally respectively, and the conductive base film 20 clamped by the first conductive clamp 1302 and the second conductive clamp 1402 is entirely located in the plating solution tank 11, so that an electric breakdown phenomenon caused by a reduction in cooling effect when the conductive base film 20 is partially located outside the plating solution tank 11 can be avoided.
Example III
The invention also discloses a cleaning solution recovery method, as shown in fig. 17, comprising the following steps:
s10, detecting the concentration of metal ions in the cleaning liquid in the cleaning box.
And S20, when the concentration of metal ions in the cleaning liquid in the cleaning tank is detected to be greater than the preset concentration, opening the first control valve to enable the cleaning liquid in the cleaning tank to enter the recovery tank and perform ion concentration reduction treatment, so that the treated cleaning liquid is used for cleaning the conductive clamp.
And S30, when the concentration of the metal ions in the cleaning liquid in the cleaning box is detected to be smaller than the preset concentration, closing the first control valve so that the cleaning liquid in the cleaning box is continuously used for cleaning the conductive clamp.
The above-mentioned cleaning solution recovery method controls the first control valve 141 to be opened or closed according to the detection information detected by the first metal ion concentration detector 131, so that the cleaning solution in the cleaning tank 110 is fully utilized, the frequency of treating the cleaning solution by the recovery tank 120 and the recovery cost of the recovery tank 120 are reduced, and the cleaning effect of the conductive clip 200 can be ensured. In addition, the recovery tank 120 can perform ion concentration reduction treatment on the cleaning solution flowing out of the cleaning tank 110, so that the cleaning solution after treatment can be continuously used for cleaning the conductive clamp 200, direct discharge of the cleaning solution after cleaning the conductive clamp 200 is avoided, and water resource waste and environmental pollution are reduced.
When the concentration of the metal ions in the cleaning solution in the cleaning tank 110 is detected to be greater than the preset concentration, the first control valve 141 is opened, so that after the cleaning solution in the cleaning tank 110 enters the recovery tank 120 and is subjected to the ion concentration reduction treatment, the cleaning solution after the treatment in the recovery tank 120 is recovered into the cleaning tank 110 through the recovery inlet 111 and is continuously used for cleaning the conductive clamp 200.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present invention, and not for limiting the same; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some or all of the technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit of the invention.
Claims (13)
1. A conductive clip cleaning solution recovery device, comprising:
the cleaning box is internally provided with cleaning liquid for cleaning the conductive clamp, and the conductive clamp is immersed into the cleaning box for cleaning;
The first metal ion concentration detector is arranged in the cleaning box and is used for detecting the concentration of metal ions in the cleaning liquid in the cleaning box;
the recovery box is connected with the cleaning box and is used for carrying out ion concentration reduction treatment on the cleaning liquid entering the recovery box so that the treated cleaning liquid is used for cleaning the conductive clamp;
the first control valve is arranged between the cleaning tank and the recovery tank, when the concentration of metal ions detected by the metal ion concentration detector is larger than a preset concentration, the first control valve is controlled to be opened, the first control valve is provided with at least a first station, and when the first control valve is opened and is positioned at the first station, cleaning liquid in the cleaning tank can enter the recovery tank;
a filtering device is arranged between the recovery tank and the cleaning tank and is used for filtering water-insoluble metal compounds;
the filtering device is a filter screen which allows the cleaning liquid to pass through and can prevent the water-insoluble metal compound from passing through;
The filter screen is arranged at the outlet of the recovery box.
2. The conductive clip cleaning solution recycling apparatus according to claim 1, wherein,
the first control valve is a reversing valve, the first control valve is further provided with a second station, and when the first control valve is opened and is positioned at the second station, cleaning liquid after the recovery tank is processed can enter the cleaning tank through the first control valve.
3. The conductive clip cleaning solution recycling apparatus according to claim 1, wherein said cleaning tank has a waste liquid outlet and a recycling inlet, said recycling tank has an inlet and an outlet, said waste liquid outlet is communicated with said recycling tank inlet, said recycling inlet is communicated with said recycling tank outlet, said first control valve is a one-way valve, said first control valve is connected between said waste liquid outlet and said recycling tank inlet, and cleaning solution in said cleaning tank can enter said recycling tank through said first control valve when said first control valve is opened.
4. The conductive clip washing liquid recycling apparatus according to claim 3, further comprising a first controller electrically connected to the first metal ion concentration detector and the first control valve, respectively, the first controller being configured to control the first control valve to be opened or closed according to detection information of the first metal ion concentration detector.
5. The conductive clip cleaning solution recycling apparatus according to claim 4, wherein said recycling tank contains a displacer for displacing metal ions in the cleaning solution in said recycling tank to produce a water-insoluble metal compound.
6. The conductive clip cleaning solution recycling apparatus according to claim 5, wherein a second metal ion concentration detector is provided in the recycling tank, and the second metal ion concentration detector is used for detecting the metal ion concentration in the cleaning solution in the recycling tank;
a second control valve is arranged between the outlet of the recovery tank and the recovery inlet, and when the second control valve is opened, cleaning liquid in the recovery tank can enter the cleaning tank;
the conductive clamp cleaning liquid recovery device further comprises a second controller, the second controller is respectively and electrically connected with the second metal ion concentration detector and the second control valve, and the second controller is used for controlling the second control valve to be opened or closed according to detection information of the second metal ion concentration detector.
7. The conductive clip cleaning liquid recycling apparatus according to claim 1, further comprising a dissolution tank, said recovery tank further provided with a slag discharge port, an inlet of said dissolution tank being connected to said slag discharge port, an outlet of said dissolution tank being connected to a plating bath, said dissolution tank containing a dissolution agent for dissolving said water-insoluble metal compound to produce a plating bath.
8. The conductive clip cleaning solution recycling apparatus according to claim 7, wherein a heater is provided on said dissolution tank, said heater being for heating said dissolution tank.
9. The conductive clip cleaning solution recycling apparatus according to any one of claims 1 to 6, wherein a stirring device is provided in said recycling bin.
10. A film plating machine comprising the conductive clip cleaning liquid recovery device of any one of claims 1 to 9.
11. The plating machine of claim 10, further comprising a plating solution tank, a first conveyor, and a second conveyor, wherein the conductive clip cleaning solution recovery device comprises a first conductive clip cleaning solution recovery device and a second conductive clip cleaning solution recovery device;
the plating solution tank comprises a first side wall and a second side wall which extend along the horizontal direction and are oppositely arranged;
the first conveying device comprises a first conveying belt and a plurality of first conductive clamps, the first conveying belt is arranged close to the first side wall, the first conductive clamps are arranged on the first conveying belt and are arranged along the horizontal direction, the first conveying belt is used for driving the first conductive clamps to move along a first preset track, a cleaning box in the first conductive clamp cleaning liquid recovery device is arranged at the downstream of the plating liquid tank along the first preset track, and an inlet of the plating liquid tank is connected with an outlet of a dissolving box in the first conductive clamp cleaning liquid recovery device;
The second conveying device comprises a second conveying belt which is arranged close to the second side wall, a plurality of second conductive clamps which are arranged on the second conveying belt, the second conductive clamps are arranged along the horizontal direction, the second conveying belt is used for driving the second conductive clamps to move along a second preset track, a cleaning box in the second conductive clamp cleaning liquid recovery device is arranged at the downstream of the plating solution tank along the second preset track, and an inlet of the plating solution tank is also connected with an outlet of a dissolving box in the second conductive clamp cleaning liquid recovery device;
the first conductive clamp and the second conductive clamp respectively clamp two opposite sides of the conductive base film which is horizontally placed.
12. A cleaning liquid recovery method for a conductive clip cleaning liquid recovery apparatus according to any one of claims 1 to 9, characterized by comprising the steps of:
detecting the concentration of metal ions in the cleaning liquid in the cleaning box;
when the concentration of metal ions in the cleaning liquid in the cleaning tank is detected to be larger than the preset concentration, a first control valve is opened, so that the cleaning liquid in the cleaning tank enters a recovery tank and is subjected to ion concentration reduction treatment;
and when the concentration of the metal ions in the cleaning liquid in the cleaning box is detected to be smaller than the preset concentration, closing the first control valve.
13. The cleaning liquid recovery method according to claim 12, characterized by further comprising, after said passing the cleaning liquid in said cleaning tank into the recovery tank and performing the ion concentration lowering treatment, the steps of:
detecting the concentration of metal ions in the cleaning solution in the recovery tank, and recovering the cleaning solution in the recovery tank into the cleaning tank when the concentration of metal ions in the cleaning solution in the recovery tank is larger than a preset concentration.
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| CN115015344B (en) * | 2022-06-06 | 2022-11-29 | 安徽维德工业自动化有限公司 | System and method for full-automatic online measurement of pH of suspended reaction liquid in reaction kettle |
| CN115106330B (en) * | 2022-06-27 | 2024-06-28 | 湖北金禄科技有限公司 | Stripping and hanging groove for vertical continuous electroplating of circuit board and cleaning method thereof |
| CN116409483B (en) * | 2023-06-12 | 2023-08-11 | 广州玺明机械科技有限公司 | Self-adaptive cleaning control method, device and storage medium for quantitative filling machine |
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| DE1571728A1 (en) * | 1966-10-01 | 1970-12-17 | Duerkes Dipl Chem Dr Karl | Process for the regeneration and / or preparation as well as cleaning of pickling baths, washing and rinsing fluids, galvanic baths and waste water |
| US4394356A (en) * | 1980-09-25 | 1983-07-19 | Peuser Michael F | Recuperation of cyanides from rinsing solutions of cyanidric processes for eletrodeposition of metals |
| JPS59153894A (en) * | 1983-02-19 | 1984-09-01 | Chuo Seisakusho:Kk | Automatic plating apparatus of printed circuit board |
| CN101549917A (en) * | 2008-03-31 | 2009-10-07 | 徐红宇 | Method for recovering cupric salts in electroplating acid copper waste water |
| CN102372354A (en) * | 2010-08-20 | 2012-03-14 | 山东国强五金科技股份有限公司 | Taxonomic treatment and circular utilization method of electroplating waste water |
| CN102745847A (en) * | 2012-06-29 | 2012-10-24 | 倪新军 | Reusing device of high frequency circuit board electroplating wastewater chemical treatment water |
| CN106521611B (en) * | 2016-08-15 | 2018-10-26 | 广州明毅电子机械有限公司 | Electroplating device with automatic stripping and hanging system |
| CN209424187U (en) * | 2018-12-25 | 2019-09-24 | 天津美斯金属表面处理有限公司 | A kind of cleaning fluid circulatory system of electroplating cleaning slot |
| CN211386056U (en) * | 2019-12-31 | 2020-09-01 | 包头汇众磁谷稀土科技有限公司 | Electroplating cleaning tank |
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