CN113541592A - Based on two-sided cleaning equipment of rotation type photovoltaic wafer - Google Patents
Based on two-sided cleaning equipment of rotation type photovoltaic wafer Download PDFInfo
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- CN113541592A CN113541592A CN202110713664.2A CN202110713664A CN113541592A CN 113541592 A CN113541592 A CN 113541592A CN 202110713664 A CN202110713664 A CN 202110713664A CN 113541592 A CN113541592 A CN 113541592A
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- 238000004140 cleaning Methods 0.000 title claims abstract description 170
- 230000007246 mechanism Effects 0.000 claims abstract description 40
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 33
- 239000000463 material Substances 0.000 claims description 4
- 230000001105 regulatory effect Effects 0.000 claims description 4
- 238000005507 spraying Methods 0.000 claims description 4
- 239000004677 Nylon Substances 0.000 claims description 3
- 238000004891 communication Methods 0.000 claims description 3
- 229920001778 nylon Polymers 0.000 claims description 3
- 229920002635 polyurethane Polymers 0.000 claims description 3
- 239000004814 polyurethane Substances 0.000 claims description 3
- 238000005096 rolling process Methods 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 abstract description 113
- 238000000034 method Methods 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 2
- 239000000428 dust Substances 0.000 description 14
- 239000010865 sewage Substances 0.000 description 14
- 238000005406 washing Methods 0.000 description 6
- 239000012535 impurity Substances 0.000 description 5
- 230000001680 brushing effect Effects 0.000 description 4
- 239000011148 porous material Substances 0.000 description 2
- 238000010408 sweeping Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000009288 screen filtration Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02S—GENERATION OF ELECTRIC POWER BY CONVERSION OF INFRARED RADIATION, VISIBLE LIGHT OR ULTRAVIOLET LIGHT, e.g. USING PHOTOVOLTAIC [PV] MODULES
- H02S40/00—Components or accessories in combination with PV modules, not provided for in groups H02S10/00 - H02S30/00
- H02S40/10—Cleaning arrangements
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/12—Brushes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
- B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B15/00—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area
- B08B15/02—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area using chambers or hoods covering the area
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/04—Cleaning by suction, with or without auxiliary action
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention relates to the technical field of photovoltaic wafers, in particular to a rotary photovoltaic wafer-based double-sided cleaning device and a cleaning method thereof. It at least comprises: the cleaning device comprises a cleaning frame, a brush roller is arranged at the bottom of the cleaning frame in a rotating mode, a bottom edge cleaning mechanism comprises a connecting frame, the connecting frame is fixed at the bottom of the cleaning frame close to the end portion, an adjusting groove is formed in the inner surface of the connecting frame, an adjusting screw rod is arranged inside the adjusting groove in a rotating mode, a cleaning frame is arranged on the outer wall of the adjusting screw rod in a sliding mode, an adjusting plate is arranged on the outer wall of the cleaning frame and connected with the outer wall of the adjusting screw rod in a threaded fit mode, a cleaning roller is arranged inside the cleaning frame in a rotating mode, a plurality of cleaning brushes are arranged on the outer wall of the cleaning roller at equal intervals, the cleaning device can clean the bottom edge of the photovoltaic wafer while cleaning the upper surface of the photovoltaic wafer, the cleaning effect is better, labor intensity is favorably reduced, and the cleaning range can be adjusted according to the length of the photovoltaic wafer.
Description
Technical Field
The invention relates to the technical field of photovoltaic wafers, in particular to double-side cleaning equipment based on a rotary photovoltaic wafer.
Background
The photovoltaic wafer is used as a solar cell separating plate, the wafer mainly refers to the directional growth and subsequent slicing of a silicon crystal of a solar power generation (photovoltaic) upstream material, when the solar photovoltaic wafer is used, as the photovoltaic wafer is located outdoors for a long time for use, a large amount of dust easily falls on the surface of the photovoltaic wafer, and the normal use of the solar photovoltaic wafer can be influenced without long-time cleaning, a worker is required to clean the photovoltaic wafer regularly, the existing cleaning equipment can only clean the upper surface of the photovoltaic wafer and cannot clean the bottom edge of the photovoltaic wafer, so that the worker is required to clean the bottom edge of the photovoltaic wafer again, the workload is increased, the cleaning area of the conventional cleaning equipment cannot be adjusted according to photovoltaic wafers of different lengths, and the practicability is low.
Disclosure of Invention
The invention aims to provide a double-sided cleaning device based on a rotary photovoltaic wafer and a cleaning method thereof, so as to solve the problems in the background technology.
In order to achieve the above object, in one aspect, the present invention provides a double-sided cleaning apparatus based on a rotary photovoltaic wafer, comprising at least:
the top cleaning mechanism comprises a cleaning frame, a brush roller is rotatably arranged at the bottom of the cleaning frame, and the end part of the brush roller is connected with an output shaft of a rotating motor;
when the top cleaning mechanism is used specifically, the cleaning frame is positioned on the upper surface of the photovoltaic wafer, and the brush roller is driven by the output shaft of the rotating motor to rotate at the bottom of the cleaning frame, so that the brush roller rotationally brushes dust and impurities on the surface of the photovoltaic wafer.
Bottom edge mechanism of cleaning, bottom edge mechanism of cleaning is provided with two of symmetry, bottom edge mechanism of cleaning includes the link, the link is fixed the bottom that the wash rack is close to the tip, the adjustment tank has been seted up to the link internal surface, the inside rotation of adjustment tank is equipped with accommodate the lead screw, the accommodate the lead screw tip rotates and stretches out inside the adjustment tank, and the fixed connection carousel, accommodate the lead screw outer wall slides and is equipped with the frame of cleaning, it is equipped with the regulating plate to clean the frame outer wall, the regulating plate with accommodate the lead screw outer wall screw-thread fit connects, it is equipped with the roller of cleaning to clean the inside rotation of frame, it is equipped with a plurality of brushes of cleaning to clean the equidistant roller outer wall, it is connected with the motor of cleaning the roller tip.
When the bottom edge cleaning mechanism is used specifically, when the top cleaning mechanism is positioned on the upper surface of the photovoltaic wafer, the cleaning frame is positioned at the bottom of the photovoltaic wafer through the connecting frame, then holding the turntable to drive the adjusting screw rod to rotate in the adjusting groove, driving the surface of the adjusting plate to slide along the thread on the outer wall of the adjusting screw rod, thereby driving the cleaning frame to move up and down, the distance from the cleaning frame to the bottom of the photovoltaic wafer is adjusted according to the thickness of the photovoltaic wafer, so that the end part of the cleaning brush can be attached to the edge of the bottom of the photovoltaic wafer, then the output shaft of the cleaning motor drives the cleaning roller to rotate in the cleaning frame, when the cleaning brush rotates along with the cleaning roller, can clean the bottom edge of photovoltaic wafer, when making top wiper mechanism wash photovoltaic wafer upper surface, the bottom edge is cleaned the mechanism and can be cleaned photovoltaic wafer bottom edge.
Preferably, the inner surface of the connecting frame is provided with a rotating groove, a plurality of rollers are rotatably arranged in the rotating groove, and the rollers are used for rolling on the outer wall of the photovoltaic wafer.
Preferably, a collecting box is inserted into the bottom of an inner cavity of the cleaning frame, an induced draft fan is arranged on the inner wall of the collecting box, a filter screen is arranged at the top of the collecting box and made of a polyurethane filter screen with the mesh diameter of 0.5-1.0mm, and a buffer spring is fixedly connected between the bottom of the filter screen and the top of the collecting box.
Preferably, the edge of the top of the collecting box is provided with a cavity, an eccentric gear is arranged in the cavity in a rotating mode, the end of the eccentric gear is connected with a linkage motor, and the outer wall of the eccentric gear is tightly attached to the bottom of the filter screen.
Preferably, the cleaning rack comprises two symmetrical fixing frames, wherein a groove is formed in the top of one fixing frame, a movable plate is fixedly connected to the end of the other fixing frame, and the movable plate slides inside the fixing frame.
Preferably, the movable plate is arranged on the outer wall of the movable plate close to the end portion, the inner wall of the groove is rotatably provided with a movable screw rod, the surface of the movable screw rod is in threaded fit connection with the surface of the movable plate, and the end portion of the movable screw rod is connected with a movable motor.
Preferably, the front surface of the cleaning frame is provided with a water spraying device, the water spraying device comprises two symmetrical fixed boxes, a plurality of water outlets are formed in the bottoms of the fixed boxes at equal intervals, the end parts of the fixed boxes are communicated with water delivery pipes, the end parts of the water delivery pipes are communicated with a water tank through a water pump, and the outer walls of the water tank are fixed to the end parts of the cleaning frame.
Preferably, the two fixed boxes are both of a hollow structure, one end of each fixed box is communicated with a movable box, the movable box slides in the other fixed box, and the bottom of each movable box is communicated with a plurality of communication holes.
Preferably, the brush roller comprises two symmetrical rotating rods, a plurality of cleaning brushes are arranged on the outer walls of the rotating rods, a sliding groove is formed in the rotating rods, a sliding rod is arranged inside the sliding groove in a sliding mode, the end portion of the sliding rod is fixedly connected with the other end portion of the rotating rod, a plurality of extending brushes are arranged on the outer walls of the sliding rods, and the extending brushes are made of nylon materials.
Compared with the prior art, the invention has the beneficial effects that:
1. in this two-sided cleaning equipment based on rotation type photovoltaic wafer, through the distance of cleaning the frame to the photovoltaic wafer bottom according to the thickness regulation of photovoltaic wafer, make and clean brush tip and can laminate photovoltaic wafer bottom edge to when cleaning the brush and rotating along with the roller of cleaning, can clean the bottom edge of photovoltaic wafer, when making top wiper mechanism wash the upper surface of photovoltaic wafer, bottom edge is cleaned the mechanism and can be cleaned photovoltaic wafer bottom edge, improve the photovoltaic wafer cleaning performance, save intensity of labour.
2. In this based on two-sided cleaning equipment of rotation type photovoltaic wafer, when putting the link in the photovoltaic wafer outside, make gyro wheel outer wall laminating photovoltaic wafer outer wall, the push-and-pull link makes top wiper mechanism and bottom edge clean the mechanism and slide at the photovoltaic wafer outer wall, drives the gyro wheel and rotates inside the rotary slot, and the gyro wheel outer wall rolls along the photovoltaic wafer outer wall, can reduce the frictional resistance of link outer wall and photovoltaic wafer outer wall, and it is more light convenient to make the removal wash photovoltaic wafer.
3. In this based on two-sided cleaning equipment of rotation type photovoltaic wafer, the dust through photovoltaic wafer bottom edge and the sewage after the washing adsorb inside the collecting box and collect to make photovoltaic wafer bottom edge dust clean cleaner, dust and sewage can be earlier through the filter screen filtration, make sewage from dropping to the collecting box inside, convenient unified collection sewage, the follow-up recycle of being convenient for.
4. In this based on two-sided cleaning equipment of rotation type photovoltaic wafer, can adjust the distance between two mounts through the length according to the photovoltaic wafer, adjust the scope of watering simultaneously and adjust the scope of brushing, the photovoltaic wafer of the different length of follow-up washing of being convenient for, the suitability is stronger.
Drawings
FIG. 1 is an assembly view showing the overall structure of the present embodiment 1;
FIG. 2 is an exploded view of the top cleaning mechanism of the present embodiment 1;
FIG. 3 is a structural exploded view of the bottom edge sweeping mechanism of the present embodiment 1;
FIG. 4 is an exploded view of the cleaning frame of the present embodiment 1;
FIG. 5 is a schematic view of the roller structure of this embodiment 2;
FIG. 6 is an exploded view of the collecting box of the present embodiment 3;
FIG. 7 is a schematic structural diagram of the embodiment 3 at the point A in FIG. 6;
FIG. 8 is an exploded view of the washing rack of this embodiment 4;
FIG. 9 is an exploded view of the sprinkler of this embodiment 4;
fig. 10 is an exploded view of the brush roller according to the embodiment 4.
The various reference numbers in the figures mean:
100. a top cleaning mechanism; 110. a cleaning frame; 111. a fixed mount; 112. a movable plate; 1120. moving the plate; 113. a groove; 114. moving the screw rod; 1140. a moving motor; 120. a brush roller; 121. rotating the motor; 122. a rotating rod; 1220. cleaning the brush; 123. a chute; 124. a slide bar; 1240. an extension brush; 130. a watering device; 131. a fixed box; 1310. a water outlet; 132. a movable box; 1320. a communicating hole; 133. a water delivery pipe; 134. a water tank;
200. a bottom edge sweeping mechanism; 210. a connecting frame; 211. an adjustment groove; 212. adjusting the screw rod; 213. a turntable; 220. a cleaning frame; 221. a cleaning roller; 2211. cleaning a brush; 2212. a cleaning motor; 222. an adjusting plate; 223. a collection box; 2230. an induced draft fan; 2231. a cavity; 2232. an eccentric gear; 2233. a linkage motor; 224. a filter screen; 2240. a buffer spring; 230. rotating the groove; 231. and a roller.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", and the like, indicate orientations and positional relationships based on those shown in the drawings, and are used only for convenience of description and simplicity of description, and do not indicate or imply that the equipment or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be considered as limiting the present invention.
Example 1
Referring to fig. 1-4, the present embodiment provides a double-side cleaning apparatus based on a rotary photovoltaic wafer, which at least comprises:
the top cleaning mechanism 100 comprises a cleaning frame 110, a brush roller 120 is rotatably arranged at the bottom of the cleaning frame 110, the cleaning frame 110 can be positioned on the upper surface of a photovoltaic wafer, then the brush roller 120 is rotatably arranged at the bottom of the cleaning frame 110, so that the brush roller 120 rotatably brushes dust and impurities on the surface of the photovoltaic wafer to improve the cleaning effect, the end part of the brush roller 120 is connected with an output shaft of a rotating motor 121, the rotating motor 121 is embedded in the inner layer of the cleaning frame 110, the rotating motor 121 is powered on to work, and the output shaft of the rotating motor 121 drives the brush roller 120 to rotate more easily and conveniently;
when the top cleaning mechanism 100 is used specifically, the cleaning frame 110 is positioned on the upper surface of the photovoltaic wafer, and the output shaft of the rotating motor 121 drives the brush roller 120 to rotate at the bottom of the cleaning frame 110, so that the brush roller 120 rotates and brushes dust and impurities on the surface of the photovoltaic wafer.
The bottom edge cleaning mechanism 200 comprises two symmetrical bottom edge cleaning mechanisms 200, each bottom edge cleaning mechanism 200 comprises a connecting frame 210, each connecting frame 210 is fixed at the bottom of a cleaning frame 110 close to the end portion, an adjusting groove 211 is formed in the inner surface of each connecting frame 210, an adjusting screw rod 212 is rotatably arranged in each adjusting groove 211, the end portion of each adjusting screw rod 212 rotatably extends out of each adjusting groove 211 and is fixedly connected with a turntable 213, the turntable 213 is held to drive the adjusting screw rods 212 to rotate in the adjusting grooves 211, a cleaning frame 220 is slidably arranged on the outer wall of each adjusting screw rod 212, an adjusting plate 222 is arranged on the outer wall of each cleaning frame 220, the adjusting plates 222 are in threaded fit connection with the outer wall of each adjusting screw rod 212, when the adjusting screw rods 212 rotate, the surfaces of the adjusting plates 222 can be driven to slide along the threads on the outer wall of the adjusting screw rods 212, so that the cleaning frames 220 are driven to move up and down, a cleaning roller 221 is rotatably arranged in each cleaning frame 220, a plurality of cleaning brushes 2211 are arranged on the outer wall of each cleaning roller 221 at equal intervals, can be according to the thickness regulation of photovoltaic wafer and clean the distance of frame 220 to photovoltaic wafer bottom, make and clean brush 2211 tip and can laminate photovoltaic wafer bottom edge, thereby when cleaning brush 2211 and rotating along with cleaning roller 221, can clean the bottom edge of photovoltaic wafer, when making top wiper mechanism 100 wash the upper surface of photovoltaic wafer, bottom edge cleaning mechanism 200 can clean photovoltaic wafer bottom edge, improve the photovoltaic wafer cleaning performance, save intensity of labour, cleaning roller 221 end connection has cleaning motor 2212, cleaning motor 2212 outer wall is fixed at link 210 outer wall, will clean motor 2212 switch on power, make its work, it is more light convenient inside cleaning frame 220 to drive cleaning roller 221 by cleaning motor 2212 output shaft.
In particular use of the bottom edge cleaning mechanism 200 of the present invention, when the top cleaning mechanism 100 is positioned on the top surface of a photovoltaic wafer, the cleaning frame 220 is positioned on the bottom of the photovoltaic wafer via the connecting frame 210, then, the turntable 213 is held to drive the adjusting screw rod 212 to rotate in the adjusting groove 211, and the surface of the adjusting plate 222 is driven to slide along the thread on the outer wall of the adjusting screw rod 212, so as to drive the cleaning frame 220 to move up and down, the distance from the cleaning frame 220 to the bottom of the photovoltaic wafer is adjusted according to the thickness of the photovoltaic wafer, so that the end of the cleaning brush 2211 can be attached to the edge of the bottom of the photovoltaic wafer, then the output shaft of the cleaning motor 2212 drives the cleaning roller 221 to rotate inside the cleaning frame 220, when the cleaning brush 2211 rotates along with the cleaning roller 221, the bottom edge of the photovoltaic wafer can be cleaned, and the bottom edge cleaning mechanism 200 can clean the bottom edge of the photovoltaic wafer while the top cleaning mechanism 100 cleans the upper surface of the photovoltaic wafer.
Example 2
In order to reduce the frictional resistance between the outer wall of the connecting frame 210 and the outer wall of the photovoltaic wafer, and to make the photovoltaic wafer easier and more convenient to move and clean, the embodiment is different from embodiment 1 in that please refer to fig. 5, in which:
the inner surface of the connecting frame 210 is provided with a rotating groove 230, the rotating groove 230 is internally provided with a plurality of rollers 231 in a rotating manner, the rollers 231 are used for rolling on the outer wall of the photovoltaic wafer, when the connecting frame 210 is placed on the outer side of the photovoltaic wafer, the outer wall of each roller 231 is attached to the outer wall of the photovoltaic wafer, the connecting frame 210 is pushed and pulled, the top cleaning mechanism 100 and the bottom edge cleaning mechanism 200 slide on the outer wall of the photovoltaic wafer, the rollers 231 are driven to rotate inside the rotating groove 230, the outer wall of each roller 231 rolls along the outer wall of the photovoltaic wafer, the friction resistance between the outer wall of the connecting frame 210 and the outer wall of the photovoltaic wafer can be reduced, and the photovoltaic wafer can be more easily and conveniently cleaned by moving.
Example 3
In order to make the dust and the cleaned sewage at the bottom edge of the photovoltaic wafer adsorbed inside the collecting box 223 for collecting, and uniformly collecting the sewage for the convenience of subsequent recycling, the present embodiment is different from embodiment 1 in that please refer to fig. 6 to 7, wherein:
Specifically, in order to avoid filter screen 224 to block up, cavity 2231 has been seted up at collecting box 223 top edge, the inside rotation of cavity 2231 has eccentric gear 2232, eccentric gear 2232 end connection has linkage motor 2233, linkage motor 2233 outer wall inlays and establishes at collecting box 223 inlayer, with linkage motor 2233 switch on, make its work, it is more light convenient inside cavity 2231 to drive eccentric gear 2232 by linkage motor 2233 output shaft, eccentric gear 2232 outer wall is closely laminated with filter screen 224 bottom, when eccentric gear 2232 rotates, can drive the reciprocating up-and-down motion of filter screen 224, thereby can make the better filtration of sewage get off, avoid blockking up, the practicality is stronger.
Example 4
In order to adjust the cleaning range according to the length of the photovoltaic wafer and improve the applicability, the embodiment is different from embodiment 1, please refer to fig. 8-10, in which:
the cleaning rack 110 comprises two symmetrical fixing racks 111, wherein a groove 113 is formed in the top of one fixing rack 111, a movable plate 112 is fixedly connected to the end of the other fixing rack 111, the movable plate 112 slides inside the fixing rack 111, the movable plate 112 can slide inside the groove 113 according to the length of the photovoltaic wafer, the distance between the two fixing racks 111 is adjusted, and the outer wall of the connecting rack 210 can be located on two sides of the photovoltaic wafer, so that the outer wall of the photovoltaic wafer with different lengths can be fixed, and the subsequent cleaning of the photovoltaic wafers with different lengths is facilitated.
It is worth mentioning that, in order to make the movable plate 112 slide more easily and improve the degree of automation, the outer wall of the movable plate 112 near the end portion is provided with the movable plate 1120, the inner wall of the groove 113 is rotatably provided with the movable screw 114, the surface of the movable screw 114 is in threaded fit with the surface of the movable plate 1120, the end portion of the movable screw 114 is connected with the movable motor 1140, the outer wall of the movable motor 1140 is embedded inside the fixed frame 111, the movable motor 1140 is powered on to work, and the output shaft of the movable motor 1140 drives the movable screw 114 to rotate inside the groove 113, so that the surface of the movable plate 1120 slides along the threads on the outer wall of the movable screw 114, the movable plate 112 slides more easily, and the degree of automation is high.
Further, in order to adjust the scope of watering, wash rack 110 front surface is equipped with watering device 130, watering device 130 includes the fixed case 131 of two symmetries, a plurality of delivery ports 1310 have been seted up to fixed case 131 bottom equidistant, fixed case 131 tip intercommunication has raceway 133, raceway 133 tip has water tank 134 through the water pump intercommunication, water tank 134 outer wall is fixed at wash rack 110 tip, can be carried fixed case 131 inside with the inside water of water tank 134 from raceway 133 by the water pump, then wash photovoltaic wafer upper surface by a plurality of delivery port injection department rivers, ensure the cleaning performance 1310, guarantee structural integrity 1310.
Specifically, two fixed casees 131 are hollow structure, wherein a fixed case 131 tip intercommunication has movable box 132, movable box 132 slides inside another fixed case 131, movable box 132 bottom intercommunication has a plurality of intercommunicating pores 1320, can be when adjusting the wash rack 110 according to photovoltaic wafer length, the movable box 132 that drives one of them fixed case 131 tip slides inside another fixed case 131, make movable box 132 roll-off fixed case 131, the inside water that gets into fixed case 131 gets into inside movable box 132, flow from a plurality of intercommunicating pores 1320, can adjust the scope of watering according to photovoltaic wafer's length, and the practicality is stronger.
In addition, in order to adjust the brushing range, the brush roller 120 includes two symmetrical rotating rods 122, a plurality of washing brushes 1220 are provided on the outer walls of the rotating rods 122, a chute 123 is arranged in one rotating rod 122, a sliding rod 124 is arranged in the chute 123 in a sliding manner, the end part of the sliding rod 124 is fixedly connected with the end part of the other rotating rod 122, a plurality of extension brushes 1240 are arranged on the outer wall of the sliding rod 124, the extension brushes 1240 are made of nylon materials and can be twisted at will and have long service life, when the slide bar 124 is located inside the slide slot 123, the extension brush 1240 can be deformed to be located inside the slide slot 123, and, as adjusted according to the length of the photovoltaic wafer, the sliding rod 124 can be driven to slide out of the sliding slot 123, so that the extending brush 1240 can be extended from the outer side of the sliding slot 123, therefore, the brushing range can be adjusted according to different lengths of the photovoltaic wafers, the extending brush 1240 brushes impurities on the surfaces of the photovoltaic wafers along with the rotation of the rotating rod 122, and the practicability is higher.
In another aspect, the invention further provides a cleaning method based on the rotary photovoltaic wafer double-sided cleaning equipment, which comprises the following operation steps:
(I) cleaning preparation stage
S1, the output shaft of the moving motor 1140 drives the moving screw 114 to rotate inside the groove 113, so that the surface of the moving plate 1120 slides along the thread of the outer wall of the moving screw 114, the moving plate 112 slides inside the groove 113 according to the length of the photovoltaic wafer, and the distance between the two fixed frames 111 is adjusted, so that the outer wall of the connecting frame 210 can be positioned at two sides of the photovoltaic wafer;
s2, driving the movable box 132 at the end of one of the fixed boxes 131 to slide in the other fixed box 131, so that the movable box 132 slides out of the fixed box 131, the water entering the fixed box 131 enters the movable box 132 and flows out of the plurality of communication holes 1320, adjusting the sprinkling range, and simultaneously driving the sliding rod 124 to slide out of the chute 123, so that the extension brush 1240 extends from the outer side of the chute 123, thereby adjusting the brushing range according to different lengths of the photovoltaic wafers;
s3, positioning the top cleaning mechanism 100 on the upper surface of the photovoltaic wafer, positioning the cleaning frame 220 at the bottom of the photovoltaic wafer through the connecting frame 210, holding the turntable 213 to drive the adjusting screw rod 212 to rotate inside the adjusting groove 211, driving the surface of the adjusting plate 222 to slide along the thread on the outer wall of the adjusting screw rod 212, driving the cleaning frame 220 to move up and down, adjusting the distance from the cleaning frame 220 to the bottom of the photovoltaic wafer according to the thickness of the photovoltaic wafer, and enabling the end part of the cleaning brush 2211 to be attached to the edge of the bottom of the photovoltaic wafer;
(II) cleaning stage
S4, the output shaft of the rotating motor 121 drives the brush roller 120 to rotate at the bottom of the cleaning frame 110, so that the brush roller 120 rotates to brush dust and impurities on the surface of the photovoltaic wafer, meanwhile, the output shaft of the cleaning motor 2212 drives the cleaning roller 221 to rotate inside the cleaning frame 220, and when the cleaning brush 2211 rotates along with the cleaning roller 221, the bottom edge of the photovoltaic wafer can be cleaned;
s5, conveying the water in the water tank 134 from the water conveying pipe 133 to the inside of the fixed tank 131 by a water pump, and then washing the upper surface of the photovoltaic wafer by water flow at the position sprayed by a plurality of water outlets 1310;
s6, the connecting frame 210 is pushed and pulled, so that the top cleaning mechanism 100 and the bottom edge cleaning mechanism 200 slide on the outer wall of the photovoltaic wafer, the roller 231 is driven to rotate inside the rotary groove 230, the outer wall of the roller 231 rolls along the outer wall of the photovoltaic wafer, and the bottom edge cleaning mechanism 200 can clean the bottom edge of the photovoltaic wafer while the top cleaning mechanism 100 cleans the upper surface of the photovoltaic wafer;
s7, the fan is driven to rotate by the motor inside the induced draft fan 2230, so that dust at the edge of the bottom of the photovoltaic wafer and cleaned sewage are adsorbed inside the collecting box 223 to be collected, the dust and the sewage can be filtered by the filter screen 224 and fall into the collecting box 223, and the sewage is collected uniformly.
The foregoing shows and describes the general principles, essential features, and advantages of the invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, and the preferred embodiments of the present invention are described in the above embodiments and the description, and are not intended to limit the present invention. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (9)
1. Based on two-sided cleaning equipment of rotation type photovoltaic wafer, its characterized in that includes at least:
the top cleaning mechanism (100) comprises a cleaning frame (110), a brush roller (120) is rotatably arranged at the bottom of the cleaning frame (110), and the end part of the brush roller (120) is connected with an output shaft of a rotating motor (121);
bottom edge cleaning mechanism (200), bottom edge cleaning mechanism (200) is provided with two of symmetry, bottom edge cleaning mechanism (200) includes link (210), link (210) are fixed the bottom that wash rack (110) is close to the tip, adjustment tank (211) have been seted up to link (210) internal surface, adjustment tank (211) inside rotation is equipped with accommodate the lead screw (212), accommodate the lead screw (212) tip rotates and stretches out inside adjustment tank (211), and fixed connection carousel (213), accommodate the lead screw (212) outer wall slides and is equipped with cleaning frame (220), cleaning frame (220) outer wall is equipped with regulating plate (222), regulating plate (222) with accommodate the lead screw (212) outer wall screw-thread fit connects, cleaning frame (220) inside rotation is equipped with cleaning roller (221), cleaning roller (221) outer wall equidistant is equipped with a plurality of brushes (2211), the end part of the cleaning roller (221) is connected with a cleaning motor (2212).
2. The rotary photovoltaic wafer-based double-sided cleaning apparatus of claim 1, wherein: the inner surface of the connecting frame (210) is provided with a rotating groove (230), a plurality of rollers (231) are rotatably arranged in the rotating groove (230), and the rollers (231) are used for rolling on the outer wall of the photovoltaic wafer.
3. The rotary photovoltaic wafer-based double-sided cleaning apparatus of claim 1, wherein: clean frame (220) inner chamber bottom and insert and be equipped with collecting box (223), collecting box (223) inner wall is equipped with draught fan (2230), collecting box (223) top is equipped with filter screen (224), filter screen (224) adopt the mesh diameter to make for 0.5-1.0 mm's polyurethane filter screen, filter screen (224) bottom with fixedly connected with buffer spring (2240) between collecting box (223) top.
4. The rotary photovoltaic wafer-based double-sided cleaning apparatus of claim 3, wherein: the collecting box (223) top edge has seted up cavity (2231), cavity (2231) inside rotation has eccentric gear (2232), eccentric gear (2232) end connection has linkage motor (2233), eccentric gear (2232) outer wall with filter screen (224) bottom closely laminates.
5. The rotary photovoltaic wafer-based double-sided cleaning apparatus of claim 1, wherein: the cleaning frame (110) comprises two symmetrical fixed frames (111), wherein a groove (113) is formed in the top of one fixed frame (111), a movable plate (112) is fixedly connected to the end of the other fixed frame (111), and the movable plate (112) slides inside the fixed frame (111).
6. The rotary photovoltaic wafer-based double-sided cleaning apparatus of claim 5, wherein: the outer wall of the movable plate (112) close to the end is provided with a movable plate (1120), the inner wall of the groove (113) is rotatably provided with a movable screw rod (114), the surface of the movable screw rod (114) is in threaded fit connection with the surface of the movable plate (1120), and the end of the movable screw rod (114) is connected with a movable motor (1140).
7. The rotary photovoltaic wafer-based double-sided cleaning apparatus of claim 1, wherein: the cleaning rack is characterized in that a water spraying device (130) is arranged on the front surface of the cleaning rack (110), the water spraying device (130) comprises two symmetrical fixed boxes (131), a plurality of water outlets (1310) are formed in the bottoms of the fixed boxes (131) at equal intervals, the end parts of the fixed boxes (131) are communicated with a water conveying pipe (133), the end parts of the water conveying pipe (133) are communicated with a water tank (134) through a water pump, and the outer wall of the water tank (134) is fixed to the end part of the cleaning rack (110).
8. The rotary photovoltaic wafer-based double-sided cleaning apparatus of claim 7, wherein: the two fixed boxes (131) are both of a hollow structure, the end part of one fixed box (131) is communicated with a movable box (132), the movable box (132) slides in the other fixed box (131), and the bottom of the movable box (132) is communicated with a plurality of communication holes (1320).
9. The rotary photovoltaic wafer-based double-sided cleaning apparatus of claim 1, wherein: the brush roller (120) comprises two symmetrical rotating rods (122), a plurality of cleaning brushes (1220) are arranged on the outer walls of the rotating rods (122), a sliding groove (123) is formed in one of the rotating rods (122), a sliding rod (124) is arranged in the sliding groove (123) in a sliding mode, the end portion of the sliding rod (124) is fixedly connected with the end portion of the rotating rod (122), a plurality of extending brushes (1240) are arranged on the outer wall of the sliding rod (124), and the extending brushes (1240) are made of nylon materials.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110713664.2A CN113541592A (en) | 2021-06-25 | 2021-06-25 | Based on two-sided cleaning equipment of rotation type photovoltaic wafer |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202110713664.2A CN113541592A (en) | 2021-06-25 | 2021-06-25 | Based on two-sided cleaning equipment of rotation type photovoltaic wafer |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114918172A (en) * | 2022-04-12 | 2022-08-19 | 盛富知信(杭州)智能装备有限公司 | Photovoltaic cell dust collector and automatically cleaning photovoltaic cell subassembly |
| CN117277949A (en) * | 2023-11-21 | 2023-12-22 | 海通智能装备(江苏)有限公司 | Dry-type photovoltaic board cleans machine people |
-
2021
- 2021-06-25 CN CN202110713664.2A patent/CN113541592A/en not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114918172A (en) * | 2022-04-12 | 2022-08-19 | 盛富知信(杭州)智能装备有限公司 | Photovoltaic cell dust collector and automatically cleaning photovoltaic cell subassembly |
| CN117277949A (en) * | 2023-11-21 | 2023-12-22 | 海通智能装备(江苏)有限公司 | Dry-type photovoltaic board cleans machine people |
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Application publication date: 20211022 |
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