CN113539779A - High-energy ion beam device for processing flexible polymer - Google Patents

High-energy ion beam device for processing flexible polymer Download PDF

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Publication number
CN113539779A
CN113539779A CN202110818293.4A CN202110818293A CN113539779A CN 113539779 A CN113539779 A CN 113539779A CN 202110818293 A CN202110818293 A CN 202110818293A CN 113539779 A CN113539779 A CN 113539779A
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discharge chamber
ion beam
vacuum chamber
energy ion
electrode
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CN202110818293.4A
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Chinese (zh)
Inventor
罗军
陈小曼
陈琳
庞盼
钟三子
卢艳
李肃
林志浩
刘阳波
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Shunshu Technology Tianjin Partnership LP
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Shunshu Technology Tianjin Partnership LP
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32073—Corona discharge
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/28—Treatment by wave energy or particle radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32467—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)

Abstract

The invention discloses a flexible polymer processing high-energy ion beam device, which relates to the technical field of polymer material preparation devices and comprises a discharge chamber, an anode cylinder and a processing vacuum chamber, wherein one end of the discharge chamber is provided with an air inlet, the other end of the discharge chamber is connected with one end of the anode cylinder, and the other end of the anode cylinder is connected with one end of the processing vacuum chamber; a reel polymer matrix is disposed within the process vacuum chamber. The discharge gas enters the discharge chamber after generating a small part of plasma through the corona needle, and the oscillation coil and the external coil outside the discharge chamber provide energy for electrons and guide the electrons to do spiral motion, so that the motion path of the electrons is increased, the collision probability of the electrons and the gas is increased, and more gas is converted into the plasma; the high-purity high-energy ion beam in the processing vacuum chamber is obtained by accelerating the electron beam entering the anode cylinder through the expansion cup and reflecting the electron, so that the electron beam is prevented from entering the processing vacuum chamber, and the bonding strength, the uniformity and the compactness are improved.

Description

High-energy ion beam device for processing flexible polymer
Technical Field
The invention relates to the technical field of polymer material preparation devices, in particular to a high-energy ion beam device for processing a flexible polymer.
Background
The electronic information field has become the pillar type industry of China, and according to conservative estimation, more than 50% of related parts in the electronic field depend on foreign import, such as photoresist, photoetching machines, polymer substrates, high-end ultrathin electronic copper clad plate materials and the like. The main technical difficulty of high-end electronic copper-clad materials lies in the severe requirements of high bonding strength, high uniformity and high compactness, and particularly for ultrathin copper-clad plates, the high compactness, high uniformity and low stress are international difficulties at present. At present, no relevant mature high-energy ion beam processing device is available in China, relevant surface deposition processing is carried out in China, a Hall gas source is mainly adopted for surface processing, and the energy of ions cannot meet the processing requirement because a polymer is processed and a substrate cannot be biased; furthermore, the gas source is mainly plasma, not single ion beam, and the bonding strength, compactness and the like of the polymer and the subsequent metal after the treatment still do not meet the relevant requirements.
Disclosure of Invention
In order to solve the technical problems, the invention provides a flexible polymer treatment high-energy ion beam device, which aims to solve the technical problems of low ion energy, low bonding strength, poor uniformity and poor compactness.
In order to achieve the purpose, the invention provides the following scheme:
the invention provides a flexible polymer processing high-energy ion beam device, which comprises a discharge chamber, an anode cylinder and a processing vacuum chamber; one end of the discharge chamber is provided with an air inlet, the other end of the discharge chamber is connected with one end of the anode cylinder, and the other end of the anode cylinder is connected with one end of the processing vacuum chamber; a reel polymer matrix is disposed within the process vacuum chamber.
Optionally, one end of the discharge chamber located at the gas inlet is further provided with a corona needle.
Optionally, an oscillating coil and an external coil are arranged outside the discharge chamber; the oscillating coil is positioned between the outer wall of the discharge chamber and the external coil.
Optionally, the anode cylinder comprises a suppression electrode and an acceleration electrode; the suppression electrode is arranged at one end, close to the discharge chamber, in the anode cylinder, and the acceleration electrode is arranged at one end, close to the processing vacuum chamber, in the anode cylinder.
Optionally, the accelerating electrode comprises a plurality of electrode strips arranged at intervals.
Optionally, the electrode strip is a strip-shaped electrode with a diameter of 150-260 mm; the width of the slit of the accelerating electrode is 1-3mm, and the distance between the electrodes is 3-6 mm; the plasma is diverged in the short side direction through the accelerating electrode slit, the formed beam spot of the ion beam is in a strip-like shape, and the beam spot is 300-600 mm.
Optionally, the process vacuum chamber further comprises a cryotrap, a plurality of molecular pumps and a mechanical pump; the low-temperature cold trap is arranged in the processing vacuum chamber, the plurality of molecular pumps are arranged on the outer wall of the processing vacuum chamber, the inlet end of the mechanical pump is communicated with the plurality of molecular pumps, and the outlet end of the mechanical pump is provided with an exhaust port.
Optionally, an expansion cup is arranged between the anode cylinder and the discharge chamber, the expansion cup is of a conical structure, a small opening end of the expansion cup faces the discharge chamber, and a large opening end of the expansion cup faces the anode cylinder.
Optionally, an anode is disposed between the small end of the expansion cup and the inner wall of the discharge chamber.
Optionally, the running speed of the reel polymer matrix is 1-3 m/min; the substrate is PI, PET, PTFE, PP or PE, and has a thickness of 12.5-38 μm.
Compared with the prior art, the invention has the following technical effects:
the flexible polymer processing high-energy ion beam device mainly structurally comprises a discharge chamber, an expansion cup, an anode cylinder and a processing vacuum chamber, wherein discharge gas enters the discharge chamber after generating a small part of plasma through a corona needle, energy is provided for electrons by an oscillating coil and an external coil outside the discharge chamber, the electrons are guided to do spiral motion, the motion path of the electrons is increased, and the collision probability of the electrons and the gas is increased, so that more gas is converted into the plasma; the high-purity high-energy ion beam in the processing vacuum chamber is obtained by accelerating the electron beam entering the anode cylinder through the expansion cup and reflecting the electron, so that the electron beam is prevented from entering the processing vacuum chamber, and the bonding strength, the uniformity and the compactness are improved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.
FIG. 1 is a schematic view of an apparatus assembly of the flexible polymer processing high energy ion beam apparatus of the present invention;
FIG. 2 is a cross-sectional view of an accelerating electrode in the flexible polymer processing high-energy ion beam apparatus according to the present invention;
FIG. 3 is a beam spot size obtained using the flexible polymer of the present invention with a high energy ion beam apparatus;
fig. 4 is a graph of the beam size obtained by processing a high energy ion beam apparatus with a flexible polymer of the present invention.
Description of reference numerals: 101. a corona needle; 102. plasma; 103. an anode cylinder; 104. a suppression electrode; 105. a high energy ion beam; 106. a spool polymer matrix; 107. a low-temperature cold trap; 108. a mechanical pump; 109. an exhaust port; 110. a molecular pump; 111. processing the vacuum chamber; 112. an accelerating electrode; 113. expanding the cup; 114. an oscillating coil; 115. an anode; 116. an external coil; 117. a discharge chamber; 118. an air inlet; 201. an electrode strip; 202. accelerating the electrode porosity.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
As shown in fig. 1 and 2, the present embodiment provides a flexible polymer processing high energy ion beam apparatus, comprising a discharge chamber 117, an anode 115 tube 103, and a process vacuum chamber 111; one end of the discharge chamber 117 is provided with an air inlet 118, the other end of the discharge chamber 117 is connected with one end of the anode 115 cylinder 103, and the other end of the anode 115 cylinder 103 is connected with one end of the processing vacuum chamber 111; a spool polymer matrix 106 is disposed within the process vacuum chamber 111.
In this embodiment, a corona pin 101 is further disposed at one end of the discharge chamber 117 located at the gas inlet 118. Gas enters from the gas inlet 118 and is corona discharged by the corona needle 101 to produce a small fraction of plasma 102. The discharge gas may be Ar, O2、N2Etc. discharge gas pressure of 10-1-100 Pa; the gas inlet amount is 100-1000 sccm.
An oscillating coil 114 and an external coil 116 are arranged outside the discharge chamber 117; the oscillating coil 114 is located between the outer wall of the discharge chamber 117 and the outer coil 116. A small part of plasma 102 generated by corona discharge through the corona needle 101 enters the discharge chamber 117 under the assistance of airflow, electrons in the plasma 102 collide with gas to generate gas ions, energy is lost at the same time, and the electrons absorb resonance under the action of the oscillating coil 114 to supplement energy; therefore, the electrons continuously have energy for colliding with the gas and ionizing, and more electrons are generated after ionization; the density of the plasma 102 within the discharge chamber 117 is increasing. The external coil 116 provides a magnetic field to make the electrons move spirally around the magnetic lines of force, so as to increase the moving distance and increase the probability of collision between the electrons and the gas. The current of the oscillating coil 114 is 10-200A, and the oscillation frequency is 1-10 KHz; the external coil 116 has currents 1-20A.
The anode 115 cylinder 103 comprises a suppression electrode 104 and an acceleration electrode 112; the suppression electrode 104 is disposed at one end of the anode 115 cylinder 103 near the discharge chamber 117, and the acceleration electrode 112 is disposed at one end of the anode 115 cylinder 103 near the process vacuum chamber 111. The suppression electrode 104 is used for suppressing the generation of electrons and preventing the electrons from entering the acceleration electrode 112, the suppression voltage is negative voltage, and the voltage is 1-800V; the accelerating electrode 112 accelerates positive ions in the plasma 102, and the accelerating voltage (negative voltage) is 1-100 KV; the spacing between the suppression electrode 104 and the acceleration electrode 112 is 1-5 cm. The accelerating electrode 112 includes a plurality of electrode strips 201 arranged at intervals. The electrode strip 201 is a strip-shaped electrode with the diameter of 150-260 mm; the width of the slit of the accelerating electrode 112 is 1-3mm, and the electrode spacing is 3-6 mm; the plasma 102 is diverged in the short side direction by the slit of the accelerating electrode 112, and the formed beam spot of the ion beam is in a strip-like shape, and the beam spot is 300-600 mm.
The process vacuum chamber 111 further comprises a cryotrap 107, a plurality of molecular pumps 110, and a mechanical pump 108; the cryotrap 107 is disposed inside the process vacuum chamber 111, the plurality of molecular pumps 110 are disposed on an outer wall of the process vacuum chamber 111, an inlet end of the mechanical pump 108 is communicated with the plurality of molecular pumps 110, and an outlet end of the mechanical pump 108 is provided with an exhaust port 109. The energy of ions in the processing vacuum chamber 111 is 1-200KeV, and the beam size is 300-600 mm;
an expansion cup 113 is arranged between the discharge chamber 117 and the anode 115 cylinder 103, the expansion cup 113 is in a conical structure, a small opening end of the expansion cup 113 faces the discharge chamber 117, and a large opening end of the expansion cup 113 faces the anode 115 cylinder 103.
An anode 115 is arranged between the small opening end of the expansion cup 113 and the inner wall of the discharge chamber 117.
The running speed of the reel polymer matrix 106 is 1-3 m/min; the substrate is polymer such as PI, PET, PTFE, PP, PE, etc., and has a thickness of 12.5-38 μm.
When the whole system finishes processing the polymer, the uniformity of the processing is reflected in the uniformity of the hydrophilic angle, and the deviation of the difference is not more than +/-5%.
The use of the flexible polymer processing high energy ion beam apparatus of the present invention is further described with reference to the following examples.
Example 1
1. The discharge gas is Ar, and the discharge pressure is 10 Pa; the gas inflow is 500 sccm;
2. the current of the oscillating coil 114 is 100A, and the oscillation frequency is 5 KHz; external coil 116 current 10A;
3. the suppression voltage is negative voltage, and the voltage is 600V; the accelerating electrode 112 accelerates positive ions in the plasma 102, and the accelerating voltage (negative voltage) is 50 KV; the distance between the suppression electrode 104 and the acceleration electrode 112 is 3 cm;
4. the speed of the scroll polymer matrix 106 is 2m/min, the matrix can be polymers such as PI, PET, PTFE, PP, PE and the like, and the thickness can be 25 μm;
6. the accelerating electrode 112 is a strip-shaped electrode, and the diameter of the accelerating electrode 112 is 200 mm; the width of the slit of the accelerating electrode 112 is 1mm, and the electrode spacing is 3 mm.
Example 2
1. The discharge gas is Ar, and the discharge pressure is 10 Pa; the gas inflow is 500 sccm;
2. the current of the oscillating coil 114 is 100A, and the oscillation frequency is 5 KHz; external coil 116 current 10A;
3. the suppression voltage is negative voltage, and the voltage is 600V; the accelerating electrode 112 accelerates positive ions in the plasma 102, and the accelerating voltage (negative voltage) is 50 KV; the distance between the suppression electrode 104 and the acceleration electrode 112 is 3 cm;
4. the speed of the scroll polymer matrix 106 is 2m/min, the matrix can be polymers such as PI, PET, PTFE, PP, PE and the like, and the thickness can be 25 μm;
6. the accelerating electrode 112 is a strip-shaped electrode, and the diameter of the accelerating electrode 112 is 200 mm; the width of the slit of the accelerating electrode 112 is 2mm, and the electrode spacing is 3 mm.
Example 3
1. The discharge gas is Ar, and the discharge pressure is 10 Pa; the gas inflow is 500 sccm;
2. the current of the oscillating coil 114 is 100A, and the oscillation frequency is 5 KHz; external coil 116 current 10A;
3. the suppression voltage is negative voltage, and the voltage is 600V; the accelerating electrode 112 accelerates positive ions in the plasma 102, and the accelerating voltage (negative voltage) is 50 KV; the distance between the suppression electrode 104 and the acceleration electrode 112 is 3 cm;
4. the speed of the scroll polymer matrix 106 is 2m/min, the matrix can be polymers such as PI, PET, PTFE, PP, PE and the like, and the thickness can be 25 μm;
6. the accelerating electrode 112 is a strip-shaped electrode, and the diameter of the accelerating electrode 112 is 200 mm; the slit width of the accelerating electrode 112 is 3mm, and the electrode spacing is 3 mm.
From fig. 3 and 4, it can be seen that the beam spot size of the high-energy ion beam 105 in the embodiments 1 to 3 is between 360 and 380mm, which satisfies the surface treatment work of the polymer with 270 mm; meanwhile, the beam size of the high-energy ion beam 105 is between 0.7 and 0.9A, which is more than 3 times larger than the traditional corresponding energy (100 KeV).
It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein, and any reference signs in the claims are not intended to be construed as limiting the claim concerned.
The principle and the implementation mode of the present invention are explained by applying specific examples in the present specification, and the above descriptions of the examples are only used to help understanding the method and the core idea of the present invention; meanwhile, for a person skilled in the art, according to the idea of the present invention, the specific embodiments and the application range may be changed. In view of the above, the present disclosure should not be construed as limiting the invention.

Claims (10)

1. The device is characterized by comprising a discharge chamber, an anode cylinder and a processing vacuum chamber; one end of the discharge chamber is provided with an air inlet, the other end of the discharge chamber is connected with one end of the anode cylinder, and the other end of the anode cylinder is connected with one end of the processing vacuum chamber; a reel polymer matrix is disposed within the process vacuum chamber.
2. The flexible polymer processing high energy ion beam device of claim 1, wherein the end of the discharge chamber at the gas inlet is further provided with a corona needle.
3. The flexible polymer processing high energy ion beam device of claim 1, wherein an oscillating coil and an external coil are arranged outside the discharge chamber; the oscillating coil is positioned between the outer wall of the discharge chamber and the external coil.
4. The flexible polymer processing high energy ion beam device of claim 1, wherein the anode cylinder comprises a suppression electrode and an acceleration electrode; the suppression electrode is arranged at one end, close to the discharge chamber, in the anode cylinder, and the acceleration electrode is arranged at one end, close to the processing vacuum chamber, in the anode cylinder.
5. The flexible polymer processing high energy ion beam device of claim 4, wherein the accelerating electrode comprises a plurality of spaced apart electrode strips.
6. The apparatus as claimed in claim 5, wherein the electrode strips are elongated electrodes with a diameter of 150-260 mm; the width of the slit of the accelerating electrode is 1-3mm, and the distance between the electrodes is 3-6 mm; the plasma is diverged in the short side direction through the accelerating electrode slit, the formed beam spot of the ion beam is in a strip-like shape, and the beam spot is 300-600 mm.
7. The flexible polymer processing high energy ion beam device of claim 1, wherein the process vacuum chamber further comprises a cryotrap, a plurality of molecular pumps, and a mechanical pump; the low-temperature cold trap is arranged in the processing vacuum chamber, the plurality of molecular pumps are arranged on the outer wall of the processing vacuum chamber, the inlet end of the mechanical pump is communicated with the plurality of molecular pumps, and the outlet end of the mechanical pump is provided with an exhaust port.
8. The flexible polymer processing high-energy ion beam device according to claim 1, wherein an expansion cup is arranged between the anode cylinders in the discharge chamber, the expansion cup is of a conical structure, a small opening end of the expansion cup faces the discharge chamber, and a large opening end of the expansion cup faces the anode cylinders.
9. The flexible polymer processing high energy ion beam device of claim 8, wherein an anode is disposed between the small end of the expansion cup and an inner wall of the discharge chamber.
10. The flexible polymer processing high energy ion beam device of claim 1, wherein the traveling speed of the polymer matrix of the reel is 1-3 m/min; the substrate is PI, PET, PTFE, PP or PE, and has a thickness of 12.5-38 μm.
CN202110818293.4A 2021-07-20 2021-07-20 High-energy ion beam device for processing flexible polymer Withdrawn CN113539779A (en)

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CN202110818293.4A CN113539779A (en) 2021-07-20 2021-07-20 High-energy ion beam device for processing flexible polymer

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Application Number Priority Date Filing Date Title
CN202110818293.4A CN113539779A (en) 2021-07-20 2021-07-20 High-energy ion beam device for processing flexible polymer

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CN113539779A true CN113539779A (en) 2021-10-22

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114883164A (en) * 2022-04-20 2022-08-09 华南理工大学 Ion implantation deposition device and deposition method based on filtering arc source

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114883164A (en) * 2022-04-20 2022-08-09 华南理工大学 Ion implantation deposition device and deposition method based on filtering arc source

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