CN113534617A - DMD inclination angle adjusting method for direct-writing photoetching lens - Google Patents
DMD inclination angle adjusting method for direct-writing photoetching lens Download PDFInfo
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- CN113534617A CN113534617A CN202110813039.5A CN202110813039A CN113534617A CN 113534617 A CN113534617 A CN 113534617A CN 202110813039 A CN202110813039 A CN 202110813039A CN 113534617 A CN113534617 A CN 113534617A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
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- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
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Abstract
The invention discloses a method for adjusting the inclination angle of a DMD (digital micromirror device) of a direct-writing photoetching lens, which has the technical scheme that the method comprises the following steps: pre-tightening and fixing the lens above the imaging platform, and performing an imaging step; an imaging step: projecting patterns to an imaging platform by two projection points of the DMD element, and entering a center determining step; a center determining step: moving the pattern recognition equipment to respectively recognize the central points of the two patterns and obtain coordinate values of the two central points, and entering an angle calculation step; angle calculation: calculating to obtain a current rotation angle according to the coordinate values, calculating a difference value between the current inclination angle and a preset set rotation angle, and locking the lens if the difference value is within a preset deviation range; and if the difference value is out of the preset deviation range, adjusting the angle of the lens through an adjusting device according to the difference value, and returning to the imaging step. The adjusting method can adjust the angle of the DMD element, and is high in adjusting accuracy and adjusting efficiency.
Description
Technical Field
The invention relates to the technical field of direct-write lithography, in particular to a method for adjusting the inclination angle of a DMD (digital micromirror device) of a direct-write lithography lens.
Background
Direct-write lithography equipment such as laser direct-write lithography is provided with a plurality of direct-write lithography lenses, and each lens is provided with a Digital Micromirror Device (DMD). The DMD element needs to be adjusted to a specified angle before using the direct-write lithography apparatus, and since the DMD is fixed to the lens, the angle of the DMD element is usually adjusted by adjusting the angle of the lens.
The existing adjusting mode is usually to adjust the lens directly by hand or to adjust the angle of the lens by knocking the lens, and the lens is easily damaged if the force is too strong during adjustment. And because the angular accuracy of DMD component requires highly, often need finely tune, and what angle, how much power need be adjusted when manual adjustment completely according to adjustment personnel's experience, lead to that the regulation degree of accuracy is low, adjust inefficiency.
Disclosure of Invention
Aiming at the defects in the prior art, the invention aims to provide a method for adjusting the DMD inclination angle of a direct-writing photoetching lens, which can adjust the angle of a DMD element and has high adjustment accuracy and high adjustment efficiency.
In order to achieve the purpose, the invention provides the following technical scheme: a method for adjusting the inclination angle of a DMD (digital micromirror device) of a direct-write lithography lens is characterized by comprising the following steps of: providing a lens, an imaging platform, a pattern recognition device and an adjusting device, wherein the pattern recognition device is connected to the imaging platform in a sliding manner, the adjusting device is fixed on the imaging platform and used for adjusting the angle of the lens, a DMD element is fixed on the lens, and the angle adjusting method comprises the following steps:
a fixing step: pre-tightening and fixing the lens above the imaging platform, and performing an imaging step;
an imaging step: projecting patterns to the imaging platform by two projection points of the DMD element, wherein the distance between the two projection points is greater than a preset minimum distance value, and entering a center determining step;
a center determining step: constructing a rectangular coordinate system on a plane where the upper surface of the imaging platform is located by taking any point of the upper surface of the imaging platform as an origin, moving the pattern recognition equipment to respectively recognize the central points of the two patterns and obtain coordinate values of the two central points in the rectangular coordinate system, and entering an angle calculation step;
angle calculation: calculating to obtain a current rotation angle through a preset angle algorithm according to the coordinate values, wherein the current rotation angle is an inclination angle of a connecting line of the central points of the two patterns in a rectangular coordinate system, and entering a difference value calculation step;
and a difference value calculation step: calculating a difference value between the current inclination angle and a preset set rotation angle, if the difference value is within a preset deviation range, locking the lens, and finishing the angle adjustment of the DMD element; if the difference value is out of the preset deviation range, entering an angle adjusting step;
angle adjusting: and adjusting the angle of the lens through the adjusting device according to the difference value, and returning to the imaging step.
As a further improvement of the present invention, the angle algorithm is:
where θ is the current rotation angle, x1，y1X-and Y-axis coordinate values, X, respectively of a pattern center2，y2X-axis and Y-axis coordinate values of the center point of another pattern, respectively.
As a further improvement of the invention, two projection points are respectively positioned at two opposite sides of the DMD element.
As a further improvement of the present invention, when the plurality of lenses are linearly arranged, the rectangular coordinate system is constructed with the arrangement direction of the lenses as the X-axis direction.
As a further development of the invention, the pattern projected in the imaging step is circular or square.
As a further improvement of the present invention, in the fixing step, the lens is pre-tightened above the imaging platform through a mounting flange, the lens is fixed on the mounting flange, a through hole is formed in the mounting flange, the imaging platform includes a mounting plate, a threaded hole is formed in the mounting plate, the threaded hole is arranged corresponding to the through hole, a retaining member is screwed in the threaded hole, and the retaining member passes through the through hole and pre-tightens the mounting flange on the mounting plate.
As a further improvement of the present invention, the mounting plate is further provided with a jack, the jack is used for the lens to pass through, the aperture of the jack is matched with the outer diameter of the lens, the through hole is larger than the threaded hole, the adjusting device comprises an adjusting plate and two adjusting columns, the adjusting plate is fixed on the mounting plate, the adjusting columns are both in threaded connection with the adjusting plate, one end of each adjusting column is used for abutting against the mounting flange, when the adjusting column is screwed in the direction of the mounting flange, the adjusting column abuts against the mounting flange and is used for driving the mounting flange to rotate around the central axis of the jack, and the two adjusting columns drive the mounting flange to rotate in opposite directions.
As a further improvement of the invention, the mounting flange is provided with two notches, the notches are provided with contact surfaces, and the two contact platforms are respectively used for the two adjusting columns to contact.
As a further improvement of the invention, one side of the adjusting plate facing the mounting plate is provided with a positioning guide groove, and the mounting plate is provided with an end face matched with the positioning guide groove.
As a further improvement of the invention, the adjusting plate is connected with the mounting plate through a bolt.
The invention has the beneficial effects that: the coordinates of the center points of the two patterns projected by the two projection points on the DMD element are determined through the mobile image recognition equipment, the current rotation angle is calculated through the center point coordinates, the angle required to be adjusted of the DMD element is determined through comparing the current rotation angle with the set rotation angle, and the angle is adjusted through the adjusting device until the difference value between the current rotation angle and the set rotation angle obtained after adjustment is within an acceptable deviation range. Because the specific difference between the angle of the DMD element and the required angle can be directly obtained through calculation, the angle is adjusted according to the specific difference, so that the adjustment can be more accurate, and the adjustment efficiency is higher.
Drawings
FIG. 1 is a flow diagram of the present invention;
FIG. 2 is a schematic perspective view of embodiment 1 of the present invention;
FIG. 3 is a schematic perspective view of an adjusting device according to embodiment 1;
FIG. 4 is a perspective view of the mounting flange of embodiment 1;
FIG. 5 is a schematic perspective view of a mounting plate according to embodiment 1;
FIG. 6 is a schematic perspective view of embodiment 2 of the present invention;
fig. 7 is a schematic perspective view of an adjusting device according to embodiment 2.
Reference numerals: 1. a lens; 2. mounting a plate; 21. a threaded hole; 22. a locking member; 23. a jack; 3. an adjustment device; 31. an adjusting plate; 311. a positioning guide groove; 32. an adjustment column; 33. a bolt; 4. installing a flange; 41. a through hole; 42. and (6) cutting.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. In which like parts are designated by like reference numerals. It should be noted that the terms "front," "back," "left," "right," "upper" and "lower" used in the following description refer to directions in the drawings, and the terms "bottom" and "top," "inner" and "outer" refer to directions toward and away from, respectively, the geometric center of a particular component.
Example 1:
referring to fig. 2, a method for adjusting an inclination angle of a direct-write lithography lens DMD according to this embodiment provides a lens 1, an imaging platform, a pattern recognition device and an adjusting device 3, wherein the pattern recognition device is slidably connected to the imaging platform, and the pattern recognition device may be a camera capable of recognizing a pattern. The adjusting device 3 is fixed on the imaging platform and used for adjusting the angle of the lens 1, and a DMD element is fixed on the lens 1.
Referring to fig. 1, the angle adjusting method includes a fixing step, an imaging step, a center determining step, an angle calculating step, a difference calculating step, and an angle adjusting step.
Referring to fig. 1, 2, 4, and 5, the fixing step: and (3) pre-tightening the lens 1 to be fixed above the imaging platform, and performing an imaging step. Wherein the pre-tightening fixing mode is as follows: lens 1 is through 4 pretensions of a mounting flange in the formation of image platform top, and on lens 1 was fixed in mounting flange 4, lens 1's fixed mode was: the mounting flange 4 is provided with a hole for the lens 1 to pass through, the lens 1 passes through the hole and is fixedly connected with the hole, and the lens 1 is perpendicular to the mounting flange 4. The mounting flange 4 is provided with four through holes 41, and the four through holes 41 are annularly and uniformly distributed around the central axis of the lens 1. The imaging platform comprises a mounting plate 2, threaded holes 21 are formed in the mounting plate 2, the threaded holes 21 and through holes 41 are arranged in a one-to-one correspondence mode, locking pieces 22 are screwed in the threaded holes 21, the locking pieces 22 in the embodiment are screws, and the locking pieces 22 penetrate through the through holes 41 and pre-tighten the mounting flange 4 on the mounting plate 2.
Referring to fig. 1, the imaging step: and both the two projection points of the DMD element project patterns to the imaging platform, the distance between the two projection points is larger than a preset minimum distance value, and the center determining step is carried out.
Specifically, the minimum distance value is a preset value, and the larger the distance between two projection points is, the smaller the error generated in the subsequent imaging process is, so that the calculated current rotation angle is closer to the angle of the DMD element which is actually current. The two projected spots are preferably located on opposite sides of the DMD element when the distance between the two projected spots is sufficiently large. The projected pattern is a pattern with a geometric center, such as a circle or a square.
Referring to fig. 1, the center determination step: and taking any point on the upper surface of the imaging platform as an origin, constructing a rectangular coordinate system on a plane where the upper surface of the imaging platform is located, moving the pattern recognition equipment to respectively recognize the central points of the two patterns and obtain coordinate values of the two central points in the rectangular coordinate system, and entering an angle calculation step.
Specifically, when the plurality of lenses 1 are arranged in a straight line, the rectangular coordinate system is constructed by taking the arrangement direction of the lenses 1 as the X-axis direction and taking the center of the upper surface of the imaging platform as the origin of the coordinate system therebetween.
Referring to fig. 1, the angle calculation step: and calculating to obtain the current rotation angle through a preset angle algorithm according to the coordinate values, and entering a difference value calculation step.
The angle algorithm is as follows:
and theta is the current rotation angle, the current rotation angle in the above formula is an included angle between a connecting line of the center points of the two patterns and the X axis in the rectangular coordinate system, and the included angle also represents the inclination angle of the current DMD element relative to the X axis. x is the number of1，y1X-and Y-axis coordinate values, X, respectively of a pattern center2，y2X-axis and Y-axis coordinate values of the center point of another pattern, respectively.
Referring to fig. 1, 2, 4, and 5, the difference calculation step: and calculating a difference value between the current inclination angle and a preset set rotation angle, if the difference value is within a preset deviation range, screwing each locking piece 22 to change pre-tightening of the mounting flange 4 into locking, when the mounting flange 4 is locked, the lens 1 on the mounting flange 4 is also locked, the DMD element on the lens 1 is also locked, and at the moment, the angle adjustment of the DMD element is completed. And if the difference value is out of the preset deviation range, entering an angle adjusting step.
Referring to fig. 1, 2, 3, 4, and 5, the angle adjusting step: and adjusting the angle of the lens 1 through the adjusting device 3 according to the difference value, and returning to the imaging step. Specifically, the adjustment angle of the mounting flange 4 is determined by the absolute value of the difference, and the adjustment direction of the mounting flange 4 is determined by the positive and negative values of the difference.
Referring to fig. 4 and 5, the mounting plate 2 is further provided with a jack 23, the jack 23 is used for the lens 1 to pass through, the aperture of the jack 23 is matched with the outer diameter of the lens 1, that is, the jack 23 is in transition fit with the lens 1, the lens 1 can rotate around the central axis of the jack 23, and the inner wall of the jack 23 can limit the movement of the lens 1 in the direction perpendicular to the axial direction of the jack 23. The through holes 41 are larger than the threaded holes 21 so that the mounting flange 4 can still be pushed to adjust the angle after being pre-tightened.
Referring to fig. 2 and 3, the adjusting device 3 is detachably connected to the mounting plate 2, so that one can detach the adjusting assembly to be mounted on another mounting plate 2 to adjust the angle of the DMD element on another lens 1, and is particularly suitable for a direct-writing lithography apparatus with multiple lens 1 arrays. Adjusting device 3 is including regulating plate 31 and two regulation posts 32, and on regulating plate 31 was fixed in mounting panel 2, the regulation post 32 all with the regulating plate 31 spiro union, the one end of regulating post 32 was used for contradicting with mounting flange 4, is provided with two incisions 42 on mounting flange 4, is formed with the face of contradicting on the incision 42, and two conflict platforms are used for supplying two regulation posts 32 to contradict respectively. The provision of the cut-outs 42 increases the contact area between the adjustment post 32 and the mounting flange 4 so that the adjustment post 32 is less prone to slip when pushing the mounting flange 4.
Referring to fig. 2 and 3, when the mounting flange 4 is pre-tightened on the mounting plate 2 by the locking member 22, and the adjusting column 32 is screwed into the mounting flange 4, the adjusting column 32 abuts against an abutting surface on the mounting flange 4 and is used for driving the mounting flange 4 to rotate around the central axis of the insertion hole 23, and the through hole 41 is larger than the threaded hole 21, so that the mounting flange 4 can still be pushed to rotate in a pre-tightened state. The two adjusting columns 32 drive the mounting flange 4 to rotate in opposite directions, so that when one adjusting column 32 rotates towards the mounting flange 4, the other adjusting column 32 needs to be rotated out in advance or simultaneously in a direction away from the mounting flange 4, so that the mounting flange 4 can be smoothly pushed.
Referring to fig. 2 and 3, a positioning guide slot 311 is disposed on one side of the adjusting plate 31 facing the mounting plate 2, an end surface for matching with the positioning guide slot 311 is disposed on the mounting plate 2, and the positioning guide slot 311 is disposed to facilitate people to identify the mounting direction of the adjusting plate 31 relative to the mounting plate 2, thereby facilitating installation. The adjusting plate 31 is connected to the mounting plate 2 by a bolt 33. At least two bolts 33 are arranged, the length direction of the bolts 33 is perpendicular to the length direction of the adjusting column 32, and the bolts 33 penetrate through the adjusting plate 31 from top to bottom and are screwed on the upper end face of the mounting plate 2. When the adjustment plate 31 is mounted on the mounting plate 2, the positioning guide grooves 311 of the adjustment plate 31 are first fitted to the mounting plate 2, and the adjustment plate 31 is fixed to the mounting plate 2 by the bolts 33.
Referring to fig. 2 and 3, the specific process of adjusting the angle of the lens 1 by the adjusting device 3 in the angle adjusting step is as follows: the adjusting column 32 screwed on the adjusting plate 31 is rotated, and the through hole 41 on the mounting flange 4 is larger than the threaded hole 21, so that the adjusting column screwed in the direction of the mounting flange 4 can push the mounting flange 4 to rotate around the central axis of the jack 23, and at the moment, the lens 1 rotates along with the mounting flange 4, so that the DMD element on the lens 1 synchronously rotates to adjust the angle of the DMD element. The adjusting columns 32 are two, the rotating directions of the two adjusting columns 32 for pushing the mounting flange 4 are opposite, an operator judges the direction of the adjusting angle according to the positive and negative difference values, and the corresponding adjusting columns 32 drive the mounting flange 4 to rotate towards the required adjusting direction. When the adjusting column 32 is screwed in the direction of the mounting flange 4 to push the mounting flange 4, the other adjusting column 32 needs to be screwed out in advance or synchronously in the direction away from the mounting flange 4, so that the other adjusting column 32 is prevented from blocking the rotation of the mounting flange 4.
Example 2:
referring to fig. 6 and 7, this embodiment is different from embodiment 1 in that the length direction of the bolt 33 is parallel to the length direction of the adjusting column 32, and the side surface of the adjusting plate 31 of the bolt 33 penetrates through the adjusting plate 31 and is screwed to the side wall of the mounting plate 2. The side of the mounting plate 2 usually leaves more space, so this arrangement facilitates a sufficiently large working space when rotating the bolt 33, facilitating a person to rotate the bolt 33 with a tool.
The above is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above-mentioned embodiments, and all technical solutions belonging to the idea of the present invention belong to the protection scope of the present invention. It should be noted that modifications and embellishments within the scope of the invention may occur to those skilled in the art without departing from the principle of the invention, and are considered to be within the scope of the invention.
Claims (10)
1. A method for adjusting the inclination angle of a DMD (digital micromirror device) of a direct-write lithography lens is characterized by comprising the following steps of: providing a lens (1), an imaging platform, a pattern recognition device and an adjusting device (3), wherein the pattern recognition device is connected to the imaging platform in a sliding manner, the adjusting device (3) is fixed on the imaging platform and used for adjusting the angle of the lens (1), a DMD element is fixed on the lens (1), and the angle adjusting method comprises the following steps:
a fixing step: pre-tightening and fixing the lens (1) above the imaging platform, and performing an imaging step;
an imaging step: projecting patterns to the imaging platform by two projection points of the DMD element, wherein the distance between the two projection points is greater than a preset minimum distance value, and entering a center determining step;
a center determining step: constructing a rectangular coordinate system on a plane where the upper surface of the imaging platform is located by taking any point of the upper surface of the imaging platform as an origin, moving the pattern recognition equipment to respectively recognize the central points of the two patterns and obtain coordinate values of the two central points in the rectangular coordinate system, and entering an angle calculation step;
angle calculation: calculating to obtain a current rotation angle through a preset angle algorithm according to the coordinate values, wherein the current rotation angle is an inclination angle of a connecting line of the central points of the two patterns in a rectangular coordinate system, and entering a difference value calculation step;
and a difference value calculation step: calculating a difference value between the current inclination angle and a preset set rotation angle, if the difference value is within a preset deviation range, locking the lens (1), and finishing the angle adjustment of the DMD element; if the difference value is out of the preset deviation range, entering an angle adjusting step;
angle adjusting: and adjusting the angle of the lens (1) through the adjusting device (3) according to the difference value, and returning to the imaging step.
2. The method for adjusting the inclination angle of the DMD in the direct-write lithography lens according to claim 1, wherein the method comprises the following steps: the angle algorithm is as follows:
where θ is the current rotation angle, x1，y1X-axis and Y-axis coordinates each being the center point of a patternScalar value, x2，y2X-axis and Y-axis coordinate values of the center point of another pattern, respectively.
3. The method for adjusting the inclination angle of the DMD in the direct-write lithography lens according to claim 1, wherein the method comprises the following steps: the two projection points are respectively positioned at two opposite sides of the DMD element.
4. The method for adjusting the inclination angle of the DMD in the direct-write lithography lens according to claim 1, wherein the method comprises the following steps: when the number of the lenses (1) is multiple and the lenses (1) are linearly arranged, the rectangular coordinate system is constructed by taking the arrangement direction of the lenses (1) as the X-axis direction.
5. The method for adjusting the inclination angle of the DMD in the direct-write lithography lens according to claim 1, wherein the method comprises the following steps: the pattern projected in the imaging step is circular or square.
6. The method for adjusting the inclination angle of the DMD in the direct-write lithography lens according to claim 1, wherein the method comprises the following steps: in the fixing step, camera lens (1) through a mounting flange (4) pretension in the imaging platform top, camera lens (1) is fixed in on mounting flange (4), be provided with through-hole (41) on mounting flange (4), imaging platform includes mounting panel (2), be provided with screw hole (21) on mounting panel (2), screw hole (21) with through-hole (41) correspond the setting, threaded connection has retaining member (22) in screw hole (21), retaining member (22) pass through-hole (41) and will mounting flange (4) pretension in on mounting panel (2).
7. The method for adjusting the DMD inclination angle of a direct-write lithography lens according to claim 6, wherein: the mounting plate (2) is also provided with a jack (23), the jack (23) is used for the lens (1) to pass through, the aperture of the jack (23) is matched with the outer diameter of the lens (1), the through hole (41) is larger than the threaded hole (21), the adjusting device (3) comprises an adjusting plate (31) and two adjusting columns (32), the adjusting plate (31) is fixed on the mounting plate (2), the adjusting columns (32) are in threaded connection with the adjusting plate (31), one end of the adjusting column (32) is used for abutting against the mounting flange (4), adjust post (32) to when mounting flange (4) direction was screwed in, adjust post (32) with mounting flange (4) are contradicted and are used for driving mounting flange (4) are wound the central axis of jack (23) rotates, two it drives to adjust post (32) the direction of rotation of mounting flange (4) is opposite.
8. The method for adjusting the DMD inclination angle of a direct-write lithography lens according to claim 7, wherein: be provided with two incisions (42) on mounting flange (4), be formed with the face of contradicting on incision (42), two conflict platform is used for supplying two regulation post (32) to contradict respectively.
9. The method for adjusting the DMD inclination angle of a direct-write lithography lens according to claim 6, wherein: the adjusting plate (31) is provided with a positioning guide groove (311) on one side of the mounting plate (2), and the mounting plate (2) is provided with a terminal surface used for being matched with the positioning guide groove (311).
10. The method for adjusting the inclination angle of the DMD of a direct writing lithography lens according to claim 9, wherein: the adjusting plate (31) is connected with the mounting plate (2) through a bolt (33).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110813039.5A CN113534617A (en) | 2021-07-19 | 2021-07-19 | DMD inclination angle adjusting method for direct-writing photoetching lens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110813039.5A CN113534617A (en) | 2021-07-19 | 2021-07-19 | DMD inclination angle adjusting method for direct-writing photoetching lens |
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|---|---|
| CN113534617A true CN113534617A (en) | 2021-10-22 |
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| CN202110813039.5A Withdrawn CN113534617A (en) | 2021-07-19 | 2021-07-19 | DMD inclination angle adjusting method for direct-writing photoetching lens |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116300342A (en) * | 2023-05-19 | 2023-06-23 | 广东科视光学技术股份有限公司 | Measurement method, calculation equipment and storage medium for angle of direct-writing photoetching lens |
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2021
- 2021-07-19 CN CN202110813039.5A patent/CN113534617A/en not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116300342A (en) * | 2023-05-19 | 2023-06-23 | 广东科视光学技术股份有限公司 | Measurement method, calculation equipment and storage medium for angle of direct-writing photoetching lens |
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Application publication date: 20211022 |