CN113528006B - Coating infrared emissivity regulation and control method - Google Patents

Coating infrared emissivity regulation and control method Download PDF

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CN113528006B
CN113528006B CN202110750028.7A CN202110750028A CN113528006B CN 113528006 B CN113528006 B CN 113528006B CN 202110750028 A CN202110750028 A CN 202110750028A CN 113528006 B CN113528006 B CN 113528006B
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coating
infrared
infrared emissivity
emissivity
regulating
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CN113528006A (en
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朴明星
李朝龙
王啸
史浩飞
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Chongqing Institute of Green and Intelligent Technology of CAS
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/14—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to metal, e.g. car bodies
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
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    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
    • C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
    • C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
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    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/32—Radiation-absorbing paints
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    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/20—Diluents or solvents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2202/00—Metallic substrate
    • B05D2202/20—Metallic substrate based on light metals
    • B05D2202/25—Metallic substrate based on light metals based on Al
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2202/00—Metallic substrate
    • B05D2202/40—Metallic substrate based on other transition elements
    • B05D2202/45—Metallic substrate based on other transition elements based on Cu
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2203/00—Other substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2203/00—Other substrates
    • B05D2203/30—Other inorganic substrates, e.g. ceramics, silicon
    • B05D2203/35—Glass
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    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/30—Sulfur-, selenium- or tellurium-containing compounds
    • C08K2003/3009—Sulfides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/011—Nanostructured additives

Abstract

The invention discloses a method for regulating and controlling the infrared emissivity of a coating. Diluting the film-forming resin by using a proper organic solvent to form a binary homogeneous system, and adding an infrared absorption material to carry out spraying to obtain an infrared absorption coating preliminarily. When the curing environment of the system is changed by adjusting the external temperature and humidity, the system is changed from a thermodynamically stable state to an unsteady state, so that phase separation tends to occur to reduce the free energy of the system, a polymer resin rich phase and a polymer resin poor phase are formed, the polymer resin rich phase forms the pore walls of the material during the curing process, and the spaces left after the polymer resin poor phase is removed form pores on the surface of the material. The pores formed on the surface of the coating are provided with micron-sized pores matched with the wavelength of infrared light, and the infrared absorption performance of the coating is effectively improved by forming a light trapping effect, so that the coating with high infrared emissivity is obtained.

Description

Coating infrared emissivity regulation and control method
Technical Field
The invention relates to a preparation technology of a high-infrared-emissivity coating, in particular to a preparation method of a high-infrared-emissivity coating by regulating and controlling a porous structure on the surface of the coating.
Background
With the development of science and technology and industry, the application range of infrared radiation materials with high emissivity is continuously expanded, and the infrared drying and heating from the beginning are gradually expanded to be applied to various fields such as aerospace, industrial kilns, building coatings, metallurgical manufacturing and the like. The high-emissivity coating is used as a novel heat-resistant protective coating with infrared radiation capability, and has the functions of increasing heat radiation and enhancing heat transfer. The method can be applied to the surfaces of instruments and equipment with emissivity requirements, and has an obvious effect of improving the radiation degree of infrared heat sources of the instruments and equipment. Therefore, the high-radiation coating is used as a novel multifunctional material and has a wide application prospect in China. However, in the prior art, the preparation method of the high infrared emissivity coating is complex, and the infrared emissivity is difficult to be adjusted and controlled by changing the process parameters.
Disclosure of Invention
The invention aims to provide a method for regulating and controlling the infrared emissivity of a coating, which is characterized by comprising the following steps of:
diluting the film-forming resin by adopting an organic solvent to form a binary homogeneous system;
adding an infrared absorption material into the binary homogeneous system to obtain a coating material;
3, spraying the coating material obtained in the step 2 on a base material;
curing the base material sprayed with the coating material under the conditions of constant temperature and constant humidity; in the curing process, a binary homogeneous system of the coating material is subjected to phase separation, a rich phase forms a pore wall of the material in the curing process, and a space left after the lean phase is removed forms pores on the surface of the coating, so that the high-infrared-emissivity coating with a surface porous structure is obtained.
It is worth noting that according to kirchhoff's law, the ratio of radiation force to absorption of any object is the same and is always equal to the radiation force of a black body at the same temperature and is only related to temperature. Therefore, if the coating has a strong absorptivity to infrared waves, the emissivity is also strong. The fact that the reflection in the surface or the interface of the material is caused by the abrupt change of the refractive index of a material system and an air layer means that the reflectivity of the coating is reduced, the porous structure on the surface of the coating can effectively reduce high reflection caused by the abrupt change of the refractive index between the coating and the air layer, and can cooperate with the surface relief microstructure to form a light trapping effect, so that incident light can be reflected and refracted for multiple times on the surface and in the coating, and the effect of efficiently absorbing light energy is achieved. The porous structure of the coating surface is obtained by a microphase separation method. The film-forming resin is diluted by a proper organic solvent to form a binary homogeneous system, and an infrared absorption material is added to carry out spraying to obtain an infrared absorption coating preliminarily. When the curing environment of the system is changed by adjusting the external temperature and humidity, the system is changed from a thermodynamically stable state to an unsteady state, so that phase separation tends to occur to reduce the free energy of the system, a polymer resin rich phase and a polymer resin poor phase are formed, the polymer resin rich phase forms the pore walls of the material during the curing process, and the spaces left after the polymer resin poor phase is removed form pores on the surface of the material. Pores formed on the surface of the coating are provided with micron-sized pores matched with the wavelength of infrared light, and the infrared absorption performance of the coating is effectively improved by forming a light trapping effect, so that the coating with high infrared emissivity is obtained.
Further, in the step 1), the weight ratio of the film-forming resin to the organic solvent is as follows: (30-39) and (5-10).
Further, the film-forming resin is organic silicon resin and fluorocarbon resin;
the organic solvent is ethanol, isopropanol, propylene glycol methyl ether acetate or tetrahydrofuran.
Further, in the step 2, the weight ratio of the film-forming resin to the infrared absorbing material is (30-39): (3-5).
Further, in the step 2), the infrared absorption material is a low-dimensional carbon nano material;
further, in the step 2), the low-dimensional carbon nano material is a carbon nano tube, tungsten disulfide or graphene.
Further, in the step 2), a dispersing agent and a curing agent are added into the binary homogeneous system to obtain a coating material; the weight ratio of the infrared absorption material to the polyethylene glycol is (6-10) to (3-5).
Further, in the step 2), the molecular weight of the dispersant polyethylene glycol is 200-500;
further, in the step 2), the viscosity of the coating material system is controlled to be 500-1000 cp.
Further, before spraying, the coating material system needs to be added into a circulating grinder for dispersion, wherein the rotating speed is 5000-10000 rpm, and the dispersion time is 30 min-2 h.
Further, before spraying, 3-5 parts by weight of curing agent corresponding to the film-forming resin needs to be added into the coating material system, and simultaneously, the curing agent and the coating material system are uniformly mixed by using a mechanical stirrer.
Further, the curing agent is tetrabutyl titanate and hexamethylene diisocyanate, wherein the stirring speed is 300-500 rpm, and the stirring time is 10-30 min.
Further, in step 3), the substrate is washed with acetone, ethyl acetate, ethanol and water respectively, and then is placed into an oven for drying.
Further, in the step 3), the substrate is an aluminum sheet, a copper sheet, a glass sheet, carbon fiber or glass fiber;
further, in the step 3), a spray gun is adopted for spraying, the air pressure is controlled to be 1.5-3.5 atm, the distance between the spray gun and the base material is 10-30 cm, the moving speed of the spray gun is 30-60 cm/s, and the thickness of the coating is 30-80 microns.
Further, in the step 4, the coating is placed in a constant temperature and humidity chamber for 1-3 hours, the temperature adjusting range is controlled to be 25-40 ℃, and the humidity adjusting range is controlled to be 60-90%, so that the high-infrared-emissivity coating with a surface porous structure is obtained, and the effective regulation and control of the infrared emissivity is realized.
Compared with the prior art, the infrared emissivity of the coating is regulated and controlled by preparing the surface porous structure, and the preparation method has the advantages of simple process technical route, low cost, good repeatability and no need of complex and expensive equipment. By selecting the matched film-forming resin and organic solvent system, a micron-submicron porous structure can be formed on the surface of the coating, and the method has the characteristic of strong universality and is easy to popularize and apply the technology.
Drawings
FIG. 1: example 1 scanning electron microscope photograph of a coating based on a surface porous structure of a silicone resin prepared using an ethanol-water system in accordance with the present invention;
FIG. 2: example 5 of the present invention is a scanning electron microscope photograph of a fluorocarbon resin-based coating layer having a surface porous structure prepared using propylene glycol methyl ether acetate-water system.
Detailed Description
The present invention is further illustrated by the following examples, but it should not be construed that the scope of the above-described subject matter is limited to the following examples. Various substitutions and alterations can be made without departing from the technical idea of the invention and the scope of the invention is covered by the present invention according to the common technical knowledge and the conventional means in the field.
Example 1:
the technology for realizing regulation and control of the infrared emissivity of the coating by preparing the structure with adjustable pores on the surface of the coating is characterized by comprising the following steps of:
(1) weighing 60g of organic silicon resin, diluting the organic silicon resin by 20g of ethanol, adding 10g of carbon nano tube and 5g of polyethylene glycol, wherein the molecular weight is 200, and the viscosity of the system is 800 cp;
(2) adding the system in the step (1) into a circulating grinder for dispersion, wherein the rotating speed is adjusted to 5000rpm, and the dispersion time is 1 h;
(3) weighing 5g of tetrabutyl titanate, adding the tetrabutyl titanate into the mixed dispersion liquid obtained in the step (2), and mixing by using a mechanical stirrer, wherein the stirring speed is 500rpm, and the stirring time is 30min to obtain a liquid to be sprayed;
(4) cleaning a substrate aluminum sheet with acetone, ethyl acetate, ethanol and water respectively, and drying in a drying oven;
(5) putting the spraying liquid prepared in the step (3) into a spray gun, adjusting the air pressure to be 3atm, adjusting the distance between the spray gun and the base material to be 20cm, the moving speed of the spray gun to be 30cm/s, and the thickness of the coating to be 50 mu m; (6) and (4) placing the coating prepared in the step (5) in a constant temperature and humidity box for 1h, adjusting the temperature to be 30 ℃ and the humidity to be 80%, and thus obtaining the high infrared emissivity coating with the micron-scale surface porous structure. The infrared emissivity of the coating at a wave band of 3-16 mu m is 0.982.
Example 2:
the technology for realizing regulation and control of the infrared emissivity of the coating by preparing the structure with adjustable pores on the surface of the coating is characterized by comprising the following steps of:
(1) weighing 60g of organic silicon resin, diluting the organic silicon resin by 20g of isopropanol, and adding 10g of carbon nano tube and 5g of polyethylene glycol, wherein the molecular weight is 200, and the viscosity of the system is 800 cp;
(2) adding the system in the step (1) into a circulating grinder for dispersion, adjusting the rotating speed to 5000rpm, and setting the dispersion time to 1 h;
(3) weighing 5g of tetrabutyl titanate, adding the tetrabutyl titanate into the mixed dispersion liquid obtained in the step (2), and mixing by using a mechanical stirrer, wherein the stirring speed is 500rpm, and the stirring time is 30min, so as to obtain a liquid to be sprayed;
(4) cleaning a substrate aluminum sheet with acetone, ethyl acetate, ethanol and water respectively, and drying in a drying oven;
(5) putting the spraying liquid prepared in the step (3) into a spray gun, adjusting the air pressure to be 3atm, adjusting the distance between the spray gun and the base material to be 20cm, the moving speed of the spray gun to be 30cm/s, and the thickness of the coating to be 50 mu m; (6) and (3) placing the coating prepared in the step (5) in a constant temperature and humidity box for 1h, adjusting the temperature to 30 ℃ and the humidity to 80%, thereby obtaining the high infrared emissivity coating with the micron-scale surface porous structure. The infrared emissivity of the coating at a wave band of 3-8 mu m is 0.984.
Example 3:
the technology for realizing regulation and control of the infrared emissivity of the coating by preparing the structure with adjustable pores on the surface of the coating is characterized by comprising the following steps of:
(1) weighing 60g of organic silicon resin, diluting the organic silicon resin by 20g of ethanol, adding 10g of tungsten disulfide and 5g of polyethylene glycol, wherein the molecular weight is 500, and the viscosity of the system is 800 cp;
(2) adding the system obtained in the step (1) into a circulating grinding machine for dispersing, and adjusting the rotating speed to
5000rpm, and the dispersing time is 1 h;
(3) weighing 5g of tetrabutyl titanate, adding the tetrabutyl titanate into the mixed dispersion liquid obtained in the step (2), and mixing by using a mechanical stirrer, wherein the stirring speed is 500rpm, and the stirring time is 30min to obtain a liquid to be sprayed;
(4) cleaning a substrate aluminum sheet with acetone, ethyl acetate, ethanol and water respectively, and drying in a drying oven;
(5) putting the spraying liquid prepared in the step (3) into a spray gun, adjusting the air pressure to be 3atm, adjusting the distance between the spray gun and the base material to be 20cm, the moving speed of the spray gun to be 30cm/s, and the thickness of the coating to be 50 mu m;
(6) and (3) placing the coating prepared in the step (5) in a constant temperature and humidity box for 1h, adjusting the temperature to 30 ℃ and the humidity to 80%, thereby obtaining the high infrared emissivity coating with the micron-scale surface porous structure. The infrared emissivity of the coating at a wave band of 8-16 mu m is 0.984.
Example 4:
the technology for realizing regulation and control of the infrared emissivity of the coating by preparing the structure with adjustable pores on the surface of the coating is characterized by comprising the following steps of:
(1) 60g of silicone resin was weighed out and diluted with 20g of ethanol, and 10g of graphene and
5g of polyethylene glycol, the molecular weight is 500, and the viscosity of the system is 800 cp;
(2) adding the system obtained in the step (1) into a circulating grinding machine for dispersing, and adjusting the rotating speed to
5000rpm, and the dispersing time is 1 h;
(3) weighing 5g of tetrabutyl titanate, adding the tetrabutyl titanate into the mixed dispersion liquid obtained in the step (2), and mixing by using a mechanical stirrer, wherein the stirring speed is 500rpm, and the stirring time is 30min, so as to obtain a liquid to be sprayed;
(4) cleaning a substrate aluminum sheet with acetone, ethyl acetate, ethanol and water respectively, and drying in a drying oven;
(5) putting the spraying liquid prepared in the step (3) into a spray gun, adjusting the air pressure to be 3atm, adjusting the distance between the spray gun and the base material to be 20cm, the moving speed of the spray gun to be 30cm/s, and the thickness of the coating to be 50 mu m;
(6) and (4) placing the coating prepared in the step (5) in a constant temperature and humidity box for 1h, adjusting the temperature to be 30 ℃ and the humidity to be 80%, and thus obtaining the high infrared emissivity coating with the micron-scale surface porous structure. The infrared emissivity of the coating at a wave band of 3-16 mu m is 0.986.
Example 5:
the technology for realizing regulation and control of the infrared emissivity of the coating by preparing the structure with adjustable pores on the surface of the coating is characterized by comprising the following steps of:
(1) weighing 78g of fluorocarbon resin, diluting the fluorocarbon resin by 10g of propylene glycol methyl ether acetate, and adding 6g of carbon nano tube and 3g of polyethylene glycol, wherein the molecular weight is 200, and the viscosity of the system is 1000 cp;
(2) adding the system in the step (1) into a circulating grinder for dispersion, wherein the rotating speed is adjusted to 8000rpm, and the dispersion time is 2 h;
(3) 3g of hexamethylene diisocyanate is weighed and added into the mixed dispersion liquid obtained in the step (2), a mechanical stirrer is used for mixing, the stirring speed is 500rpm, and the stirring time is 30min, so that a liquid to be sprayed is obtained;
(4) cleaning a substrate aluminum sheet by using acetone, ethyl acetate, ethanol and water respectively, and drying in a drying oven;
(5) putting the spraying liquid prepared in the step (3) into a spray gun, adjusting the air pressure to be 3atm, adjusting the distance between the spray gun and the base material to be 20cm, the moving speed of the spray gun to be 30cm/s, and the thickness of the coating to be 50 mu m; (6) and (3) placing the coating prepared in the step (5) in a constant temperature and humidity box for 1h, controlling the temperature regulation range to be 35 ℃ and the humidity regulation range to be 90%, and thus obtaining the high infrared emissivity coating with the micron-scale surface porous structure. The infrared emissivity of the coating at a wave band of 3-16 mu m is 0.986.
Example 6:
the technology for realizing regulation and control of the infrared emissivity of the coating by preparing the structure with adjustable pores on the surface of the coating is characterized by comprising the following steps of:
(1) weighing 78g of fluorocarbon resin, diluting the fluorocarbon resin by 10g of tetrahydrofuran, and adding 6g of carbon nano tube and 3g of polyethylene glycol, wherein the molecular weight is 200, and the viscosity of the system is 1000 cp;
(2) adding the system in the step (1) into a circulating grinder for dispersion, wherein the rotating speed is adjusted to 8000rpm, and the dispersion time is 2 h;
(3) weighing 3g of hexamethylene diisocyanate, adding the hexamethylene diisocyanate into the mixed dispersion liquid obtained in the step (2), and mixing by using a mechanical mixer at the mixing speed of 500rpm for 30min to obtain a liquid to be sprayed;
(4) cleaning a substrate aluminum sheet by using acetone, ethyl acetate, ethanol and water respectively, and drying in a drying oven;
(5) putting the spraying liquid prepared in the step (3) into a spray gun, adjusting the air pressure to be 3atm, setting the distance between the spray gun and the base material to be 20cm, setting the moving speed of the spray gun to be 30cm/s and setting the thickness of the coating to be 50 mu m; (6) and (4) placing the coating prepared in the step (5) in a constant temperature and humidity box for 1h, controlling the temperature regulation range to be 35 ℃ and the humidity regulation range to be 90%, and thus obtaining the high infrared emissivity coating with the micron-scale surface porous structure. The infrared emissivity of the coating at a wave band of 1-3 mu m is 0.981.
Example 7:
the technology for realizing regulation and control of the infrared emissivity of the coating by preparing the structure with adjustable pores on the surface of the coating is characterized by comprising the following steps of:
(1) weighing 78g of fluorocarbon resin, diluting the fluorocarbon resin by 10g of propylene glycol methyl ether acetate, and adding 6g of tungsten disulfide and 3g of polyethylene glycol, wherein the molecular weight is 500, and the viscosity of the system is 1000 cp;
(2) adding the system in the step (1) into a circulating grinder for dispersion, wherein the rotating speed is adjusted to 8000rpm, and the dispersion time is 2 h;
(3) 3g of hexamethylene diisocyanate is weighed and added into the mixed dispersion liquid obtained in the step (2), a mechanical stirrer is used for mixing, the stirring speed is 500rpm, and the stirring time is 30min, so that a liquid to be sprayed is obtained;
(4) cleaning a substrate aluminum sheet by using acetone, ethyl acetate, ethanol and water respectively, and drying in a drying oven;
(5) putting the spraying liquid prepared in the step (3) into a spray gun, adjusting the air pressure to be 3atm, setting the distance between the spray gun and the base material to be 20cm, setting the moving speed of the spray gun to be 30cm/s and setting the thickness of the coating to be 50 mu m;
(6) and (3) placing the coating prepared in the step (5) in a constant temperature and humidity box for 1h, controlling the temperature regulation range to be 35 ℃ and the humidity regulation range to be 90%, and thus obtaining the high infrared emissivity coating with the micron-scale surface porous structure. The infrared emissivity of the coating at a wave band of 8-16 mu m is 0.984.
Example 8:
the technology for realizing regulation and control of the infrared emissivity of the coating by preparing the structure with adjustable pores on the surface of the coating is characterized by comprising the following steps of:
(2) weighing 78g of fluorocarbon resin, diluting the fluorocarbon resin by 10g of propylene glycol methyl ether acetate, and adding 6g of graphene and 3g of polyethylene glycol, wherein the molecular weight is 500, and the viscosity of the system is 1000 cp; (2) adding the system in the step (1) into a circulating grinder for dispersion, wherein the rotating speed is adjusted to 8000rpm, and the dispersion time is 2 h;
(3) weighing 3g of hexamethylene diisocyanate, adding the hexamethylene diisocyanate into the mixed dispersion liquid obtained in the step (2), and mixing by using a mechanical mixer at the mixing speed of 500rpm for 30min to obtain a liquid to be sprayed;
(4) cleaning a substrate aluminum sheet with acetone, ethyl acetate, ethanol and water respectively, and drying in a drying oven;
(5) putting the spraying liquid prepared in the step (3) into a spray gun, adjusting the air pressure to be 3atm, setting the distance between the spray gun and the base material to be 20cm, setting the moving speed of the spray gun to be 30cm/s and setting the thickness of the coating to be 50 mu m;
(6) putting the coating prepared in the step (5) into a constant temperature and humidity box, standing for 1h, and adjusting the temperature
The range is controlled at 35 ℃, and the humidity adjusting range is controlled at 90%, so that the high infrared emissivity coating with the micron-scale surface porous structure is obtained. The infrared emissivity of the coating at a wave band of 3-16 mu m is 0.982.

Claims (7)

1. A method for regulating and controlling the infrared emissivity of a coating is characterized by comprising the following steps of:
diluting film-forming resin by adopting an organic solvent to form a binary homogeneous system; the film-forming resin is organic silicon resin or fluorocarbon resin;
the organic solvent is ethanol, isopropanol, propylene glycol methyl ether acetate or tetrahydrofuran; the weight ratio of the film-forming resin to the organic solvent is as follows: (30-39): (5-10);
respectively adding an infrared absorption material and a dispersing agent into the binary homogeneous system to obtain a coating material system, and then adding a curing agent to obtain a coating material; the dispersing agent is polyethylene glycol; when the curing agent is tetrabutyl titanate when the organic silicon resin is adopted, and when the curing agent is fluorocarbon resin, hexamethylene diisocyanate is adopted,
3, spraying the coating material obtained in the step 2 on a base material;
curing the base material sprayed with the coating material under the conditions of constant temperature and constant humidity; by adjusting the temperature and the humidity, in the curing process, a binary homogeneous system of the coating material is subjected to phase separation, a rich phase forms a pore wall of the material in the curing process, and a space left after a lean phase is removed forms pores on the surface of the coating, so that the high-infrared-emissivity coating with a surface porous structure is obtained;
the curing conditions were: and (3) putting the coating into a constant temperature and humidity box for 1-3 hours, wherein the temperature adjusting range is controlled to be 25-40 ℃, and the humidity adjusting range is controlled to be 80-90%.
2. The method for regulating and controlling the infrared emissivity of the coating of claim 1, wherein the method comprises the following steps: in the step 2, the weight ratio of the film-forming resin to the infrared absorption material is (30-39): (3-5).
3. The method for regulating and controlling the infrared emissivity of the coating according to claim 1 or 2, wherein the coating comprises:
in the step 2), the infrared absorption material is a low-dimensional carbon nano material; the low-dimensional carbon nano material is a carbon nano tube, tungsten disulfide or graphene.
4. The method for regulating and controlling the infrared emissivity of the coating of claim 3, wherein the coating comprises: in the step 2, the weight ratio of the infrared absorption material to the polyethylene glycol is (6-10) to (3-5).
5. The method for regulating and controlling the infrared emissivity of the coating of claim 1, wherein the method comprises the following steps: in the step 2, the molecular weight of the polyethylene glycol is 200-500;
in the step 2), the viscosity of the coating material system is controlled to be 500-1000 cP.
6. The method for regulating and controlling the infrared emissivity of a coating according to claim 1, wherein the method comprises the following steps: in the step 2), the coating material system is added into a circulating grinder for dispersion, wherein the rotating speed is 5000-10000 rpm, and the dispersion time is 30 min-2 h.
7. The method for regulating and controlling the infrared emissivity of a coating according to claim 1, wherein the method comprises the following steps: in the step 3), the base material is respectively washed by acetone, ethyl acetate, ethanol and water and then is put into a drying oven for drying;
in the step 3), the substrate is an aluminum sheet, a copper sheet, a glass sheet, carbon fiber and glass fiber;
and 3) spraying by using a spray gun, wherein the air pressure is controlled to be 1.5-3.5 atm, the distance between the spray gun and the substrate is 10-30 cm, the moving speed of the spray gun is 30-60 cm/s, and the thickness of the coating is 30-80 mu m.
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