CN113512755B - Immersion phosphide synthesizing and growing device under magnetic field - Google Patents
Immersion phosphide synthesizing and growing device under magnetic field Download PDFInfo
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- CN113512755B CN113512755B CN202110760674.1A CN202110760674A CN113512755B CN 113512755 B CN113512755 B CN 113512755B CN 202110760674 A CN202110760674 A CN 202110760674A CN 113512755 B CN113512755 B CN 113512755B
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/006—Controlling or regulating
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B28/00—Production of homogeneous polycrystalline material with defined structure
- C30B28/04—Production of homogeneous polycrystalline material with defined structure from liquids
- C30B28/06—Production of homogeneous polycrystalline material with defined structure from liquids by normal freezing or freezing under temperature gradient
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B28/00—Production of homogeneous polycrystalline material with defined structure
- C30B28/04—Production of homogeneous polycrystalline material with defined structure from liquids
- C30B28/10—Production of homogeneous polycrystalline material with defined structure from liquids by pulling from a melt
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C30B29/42—Gallium arsenide
Abstract
A device for synthesizing and growing a semiconductor phosphide by immersing phosphorus in a metal melt under the action of a static magnetic field belongs to the field of semiconductor material preparation. The device comprises a main furnace body, a crucible in the main furnace body, a heater and a heat insulation layer on the periphery of the crucible, and an injection synthesis system connected with a driving device, wherein the injection synthesis system bears red phosphorus and sinks into the crucible under the action of the driving device. By adopting the device provided by the invention, the red phosphorus is sunk into the melt in a solid form and floats upwards from the bottom of the crucible after being gasified, so that the problems of suck-back and the like caused by adopting phosphorus bubbles are solved; the transverse static magnetic field inhibits the floating rate of bubbles and simultaneously inhibits the convection of melt in the temperature gradient direction, so that the synthesis process is more stable and rapid.
Description
Technical Field
The invention belongs to the field of semiconductor material preparation, and particularly relates to a device for synthesizing and growing semiconductor phosphide by adopting a mode of immersing phosphorus into metal melt under the action of a static magnetic field.
Background
The semiconductor phosphide comprises indium phosphide, gallium phosphide, zinc germanium phosphide and the like, and is widely applied to the fields of microelectronics, photoelectrons, acoustooptics and the like. The synthesis of these phosphides is mainly by injection synthesis techniques and diffusion synthesis techniques.
The diffusion synthesis method has long diffusion time, low efficiency and low purity of the synthetic material. The injection synthesis technology is to directly inject phosphorus gas into the melt, a large amount of bubbles accompany the flow of the melt, and the synthesis efficiency is very high. The injection synthesis technique is the most efficient method for large-scale synthesis of phosphides. The general injection synthesis technology is that a quartz bubble loaded with red phosphorus is heated, and then an injection pipe connected with the quartz bubble injects sublimed phosphorus gas into a melt, and the method has the problems of system pressure balance control and the like, so that the melt is easily sucked back into the injection pipe, is solidified to block the injection pipe, and then explodes.
In order to solve the problem, the invention provides a method for synthesizing by mixing phosphorus powder and metal powder and throwing into a melt, and a method for mixing inert gas into the phosphorus gas to increase the pressure in a quartz bubble so as to prevent suck-back and the like. The method has high requirements on equipment and process.
Disclosure of Invention
The object of the present invention is to solve the above problems.
In order to achieve the purpose of the invention, the following technical scheme is adopted: a magnetic field immersion type phosphide synthesizing and growing device comprises a main furnace body, a crucible in the main furnace body, a heater and a heat insulation layer on the periphery of the crucible, and the synthesizing and growing device further comprises an injection synthesizing system connected with a driving device, wherein the injection synthesizing system bears red phosphorus and sinks into the crucible under the action of the driving device. A static magnetic field generator is arranged outside the main furnace body.
Further, the injection synthesis system includes a red phosphorus injector having a cylindrical shape, the red phosphorus injector being provided with an injection hole; the synthesis system also comprises 3-5 disc-shaped shielding layers above the red phosphorus injector, the diameter of each shielding layer is 1-10mm smaller than the inner diameter of the crucible, and the shielding layers are provided with through holes; the red phosphorus injector and the shielding layer are fixed on the driving device and simultaneously lift.
Furthermore, according to the positions of the shielding layers, temperature zones are arranged on the periphery of the crucible, and the temperature zone ranges are arranged between the two shielding layers, above the shielding layer at the top end and below the shielding layer at the bottom end; each temperature zone is provided with an independent heater and an independent couple.
The injector loaded with solid red phosphorus is positioned in the lowest region of the crucible, the solid red phosphorus is heated and sublimated into gas, bubbles are formed to float upwards in the melt, and the gas is quickly absorbed in a high-temperature region.
By adopting the device provided by the invention, the red phosphorus is sunk into the melt in a solid form and floats upwards from the bottom of the crucible after being gasified, so that the problems of suck-back and the like caused by adopting phosphorus bubbles are solved; the transverse static magnetic field inhibits the floating rate of bubbles and simultaneously inhibits the convection of melt in the temperature gradient direction, so that the synthesis process is more stable and rapid.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a schematic diagram of a synthesis system;
FIG. 3 is a schematic view of a thermal field and material assembly;
FIG. 4 is a schematic illustration of LEC crystal growth;
FIG. 5 is a schematic view of VGF crystal growth;
FIG. 6 is a schematic view of the structure of the sealing cap;
FIG. 7 is a schematic view of a quartz screen structure;
FIG. 8 is a schematic view of a quartz screen covered with an isolation layer.
Wherein, 1: a main furnace body; 2: putting a furnace cover; 3: a furnace chassis; 4: a static magnetic field generator; 5: injecting into a synthesis system; 5-1: synthesizing a main body rod; 5-2: a first shielding layer; 5-3: a second shielding layer; 5-4: a third shielding layer; 5-5: a red phosphorus injector; 5-6: a through hole; 5-7: a first temperature measuring hole; 5-8: a second temperature measuring hole; 5-9: a third temperature measuring hole; 5-10: an injection hole; 5-11: a charging port; 5-12: sealing the cap; 6: an injection rod; 6-1: injecting a system screw; 6-2: injection rotation driving; 6-3: injecting lifting drive; 6-4: injecting the lifting plate; 7: a crucible; 7-1: a liner; 8: boron oxide; 9: melting the materials; 10: a first insulating layer; 11: a second insulating layer; 12: a third insulating layer; 13: a fourth insulating layer; 14: a lower insulating layer; 15: a first heater; 16: a second heater; 17: a third heater; 18: a fourth heater; 19; supporting a crucible; 20: a crucible rod; 21: driving a crucible rod; 22: a furnace roof thermocouple; 22-1: driving temperature measurement; 22-2: a temperature measurement fixing plate; 22-3: a temperature measuring screw rod; 23: a seed rod; 23-1: a growth system lead screw; 23-2: growth rotation driving; 23-3: growth lifting driving; 23-4: growing a lifting plate; 24: a seed chuck; 25: LEC seed crystal; 26: a first thermocouple; 27: a second thermocouple; 28: a third thermocouple; 29: a fourth thermocouple; 30: red phosphorus; 31: a metallic solid feedstock; 32: a LEC crystal; 33: VGF crystals; 34; fifth heating device; 35: VGF seed crystal; 36: a fifth thermocouple; 37: an upper heat preservation cover; 38: a vacuum line; 39: an inflation line; 40: and (5) a quartz silk screen.
Detailed Description
The invention is further illustrated by the following examples in connection with the accompanying drawings.
Referring to fig. 1, a device for synthesizing and growing phosphide by dipping under magnetic field, a main furnace body 1, an upper furnace cover 2 and a furnace chassis 3 form a crystal growth space, a crucible 7 is arranged in the crystal growth space, and a supporting crucible support 19, a lower insulating layer 14, a crucible rod 20 and a crucible rod drive 21 are arranged in the crystal growth space. The periphery of the crucible 7 is provided with a heater and an insulating layer.
Referring to FIG. 2, the injection composition system 5 in the main furnace body 1 has a composition main body rod 5-1, and 3-5 disc-shaped shield layers are provided at the upper end of the composition main body rod 5-1. The closer the edge of the shielding layer is to the inner wall of the crucible, the better, in order not to influence the injection synthesis system 5 to move up and down in the crucible, in the embodiment, the diameter of the shielding layer is 1-10mm smaller than the inner diameter of the crucible 7, 3 shielding layers are arranged, namely a first shielding layer 5-2, a second shielding layer 5-3 and a third shielding layer 5-4, and each shielding layer is provided with a through hole 5-6; a cylindrical red phosphorus injector 5-5 is provided under the synthetic body rod 5-1, and injection holes 5-10 are provided around the red phosphorus injector 5-5, including the upper surface, the lower surface and the side surface.
The bottom of the injection synthesis system 5 is provided with charging ports 5-11 for use with caps 5-12, as shown in fig. 2 and 6.
The diameter of the injection holes 5-10 is 5-10mm, and the center distance between the injection holes 5-10 is more than twice of the diameter.
The diameter of the through holes 5-6 is 5-10mm, and the center distance of the through holes 5-6 is more than twice of the diameter.
The phosphorus bubbles rise in the melt through the injection holes 5-10 and through the holes 5-6. Theoretically, the larger the pores, the smaller the size, the more bubbles are formed, and the best absorption is achieved.
Some of the phosphorus bubbles will break into smaller bubbles as they pass through the injection holes 5-10 and through the holes 5-6.
In order to divide the bubbles more uniformly and to increase the contact area of the bubbles with the melt, bubble dividing means are provided on the red phosphorus injectors 5 to 5 and the shield layer.
The bubble dividing means may be a wire disposed in the hole, but since the diameters of the injection hole 5-10 and the penetration hole 5-6 are not large, the disposition is difficult.
In this embodiment, as shown in fig. 7, a quartz wire mesh 40 is used as the bubble dividing device, the grid of the quartz wire mesh 40 is square, the side length of the square is less than 3mm, and is smaller than the diameter of the through holes 5-6, so as to ensure that the quartz wire is arranged on each through hole 5-6. The quartz screen is circular and fits the size of the red phosphorus injector 5-5 and the shielding layer.
A quartz mesh covering the shield is also provided with holes for fitting the furnace-top thermocouple 22. In this embodiment, there are 3 shielding layers, and the quartz screen 40 may be provided on the red phosphorus injector 5-5 and each shielding layer, or the quartz screen 40 may be provided only on the third lowermost shielding layer 5-4.
The cooperation of the quartz screen with the shielding is shown in fig. 8.
The red phosphorus injector 5-5 and the shielding layer are connected to a driving device through a synthetic main body rod 5-1 and are lifted and lowered simultaneously.
The driving device comprises an injection rod 6, an injection system screw 6-1, an injection rotary drive 6-2, an injection lifting drive 6-3 and an injection lifting plate 6-4, wherein the injection rod 6 is connected with a main body rod 5-1.
The system is also provided with a top thermocouple 22 that is movable up and down through the upper lid 2, the top thermocouple 22 being aligned with the position of the crucible 7.
The first shielding layer 5-2, the second shielding layer 5-3 and the third shielding layer 5-4 are provided with a first temperature measuring hole 5-7, a second temperature measuring hole 5-8 and a third temperature measuring hole 5-9 which are matched with the furnace top thermocouple 22 at the same position, so that the furnace top thermocouple 22 penetrates through the shielding layers and enters the crucible.
The furnace top thermocouple 22 is provided with a driving device for realizing the up-and-down movement, and the driving device comprises a temperature measurement driving device 22-1, a temperature measurement fixing plate 22-2 and a temperature measurement screw rod 22-3.
According to the positions of the shielding layers, the crucible 7 is divided into different temperature zones, and the temperature zone ranges are arranged between the two shielding layers, above the shielding layer at the top end and below the shielding layer at the bottom end; each temperature zone is provided with an independent heater and an independent couple.
Referring to fig. 1, in this example, there are 3 shielding layers, dividing the crucible into 4 temperature zones: a first temperature zone is arranged above the first shielding layer 5-2, a second temperature zone is arranged between the first shielding layer 5-2 and the second shielding layer 5-3, a third temperature zone is arranged between the second shielding layer 5-3 and the third shielding layer 5-4, and a fourth temperature zone is arranged below the third shielding layer 5-4.
Each temperature zone is respectively surrounded by a first heat preservation layer 10, a second heat preservation layer 11, a third heat preservation layer 12 and a fourth heat preservation layer 13; in the range corresponding to each temperature zone at the periphery of the crucible 7, a first heater 15, a second heater 16, a third heater 17 and a fourth heater are arranged as independent heaters, and a first thermocouple 26, a second thermocouple 27, a third thermocouple 28 and a fourth thermocouple 29 are matched.
And a heat insulation plate is arranged in the heat insulation layer on the periphery of the crucible 7, and the position of the heat insulation plate corresponds to the positions of the first shielding layer 5-2, the second shielding layer 5-3 and the third shielding layer 5-4.
A static magnetic field generator 4 is provided outside the main furnace body 1 at a position corresponding to the crucible 7.
Using the above-described apparatus, the indium melt was first heated to 250-300 ℃ and then a quartz injection system with multiple baffle plates was insertedIndium meltIn (1). The convection is inhibited by designing a multi-temperature zone to control heating and injecting a multi-layer baffle plate of a system and applying a transverse static magnetic field to the melt, so that the gradient distribution of the temperature of the indium melt is realized. Solid red phosphorus loading injector stationIn the lowest region, the temperature is 600-700 deg.C, and the highest temperature in the high-temperature region is 30-200 deg.C higher than the melting point of the synthetic semiconductor material. The solid red phosphorus is heated to sublimate into gas, bubbles formed in the gas float upwards in the melt and are quickly absorbed in a high-temperature area, and the transverse magnetic field inhibits the floating rate of the bubbles, so that the synthesis of phosphide is realized.
The synthesis method comprises the following steps:
and (4) preparing materials.
As shown in fig. 3, the furnace body and the crucible were assembled.
The block-shaped red phosphorus 30 is loaded into the red phosphorus injector 5-5 through the charging port 5-11, and the sealing cap 5-12 is welded to the charging port 5-11.
The injection synthesis system 5 is assembled to the injection rod 6 through the synthetic body rod 5-1. The injection rotation drive 6-2 and the injection elevation drive 6-3 are started so that the red phosphorus injector 5-5 is away from a position just above the crucible 7.
And (4) synthesizing materials.
As shown in FIG. 1, the crystal growth space is evacuated to 10 via a vacuum line 38 -5 Pa-10 Pa; inert gas is filled through the gas filling pipeline 39, so that the pressure in the crystal growth space reaches the saturated vapor pressure of the melt 9 heated to the highest pressure.
If the indium phosphide grows, the pressure is more than 6-8MPa, and if the gallium phosphide grows, the pressure is more than 6-10 MPa.
The first heater 15, the second heater 16, the third heater 17 and the fourth heater 18 are started, the heating temperature is 250-300 ℃, the metal solid raw material 31 is melted into a melt 9 (the melting point of indium is 156.61 ℃, the melting point of gallium is 29.8 ℃), and the boron oxide 8 is converted into a liquid state.
The temperature is controlled by the results of the measurements of the first thermocouple 26, the second thermocouple 27, the third thermocouple 28, and the fourth thermocouple 29.
The injection rod 6 is rotated by the injection rotation drive 6-2 so that the composite body rod 5-1 is positioned at the center of the crucible 7; the injection synthesis system 5 is lowered by the injection lifting drive 6-3 until the first shield layer 5-2, the second shield layer 5-3, and the third shield layer 5-4 are aligned with the heat insulation plates between the first heater 15, the second heater 16, the third heater 17, and the fourth heater 18. The bottom end of the red phosphorus injector 5-5 is 5mm away from the bottom of the crucible.
The furnace top thermocouple 22 is driven to move downwards by the temperature measurement driver 22-1, sequentially penetrates through the liquid boron oxide, the first temperature measurement hole 5-7, the second temperature measurement hole 5-8 and the third temperature measurement hole 5-9, is inserted into the melt 9, and is used for measuring the temperature of the melt 9 in the first temperature zone, the second temperature zone, the third temperature zone and the fourth temperature zone respectively.
And starting the transverse magnetic field generator 4 to apply a transverse static magnetic field of 0.1-2T to the melt 9 so as to inhibit the up-and-down convection of the melt 9.
The power of the first heater 15, the second heater 16, the third heater 17 and the fourth heater 18 is adjusted so that the temperature of the center of the melt 9 in the first temperature zone, the second temperature zone, the third temperature zone and the fourth temperature zone is slowly heated to T1= Tm + (20-100) deg.c, T2= Tm +20 deg.c, T3=900-1000 deg.c and T4=600-700 deg.c in sequence. Tm is the melting point of the synthesized substance, such as synthesized indium phosphide, and Tm =1062 ℃; gallium phosphide was synthesized, tm =1465 ℃.
The transverse magnetic field and the first shielding layer 5-2, the second shielding layer 5-3 and the third shielding layer 5-4 inhibit the convection of the melt between the temperature areas, so that the temperature gradient is established between the temperature areas. Meanwhile, the heat insulation plates arranged at the periphery of the crucible 7 corresponding to the division positions of the temperature zones limit the transfer of heat in the heat insulation layers.
When the temperature of the melt 9 in the fourth temperature zone reaches 600-700 ℃, red phosphorus 30 of the red phosphorus injector 5-5 starts to be heated and sublimated, enters the melt 9 through the injection hole 5-10, sequentially floats upwards through the third shielding layer 5-4, the second shielding layer 5-3 and the through hole 5-6 on the first shielding layer 5-2, and enters the third temperature zone, the second temperature zone and the first temperature zone.
The sublimated phosphorus bubbles are divided into small bubbles by the quartz wire when passing through the quartz wire mesh. In addition, the injection holes 5-10 and the through holes 5-6 also have a dividing effect on the bubbles.
As the bubbles rise into each temperature zone, the phosphorus gas in the bubbles is absorbed more and more quickly as the temperature rises.
The transverse magnetic field reduces the deformation of the bubbles in the floating process, reduces the rising rate of the bubbles, increases the retention time of phosphorus gas in the bubbles in the melt 9, and is more fully absorbed by the melt.
After the phosphorus bubbles are generated, gradually increasing the temperature of the melt 9 in the fourth temperature zone, the third temperature zone and the second temperature zone at a temperature increase rate of 50-100 ℃/h until the temperature of the melt 9 in the fourth temperature zone, the third temperature zone and the second temperature zone reaches T4= Tm +20 ℃, T3= Tm +20 ℃ and T2= Tm + (20-100) DEG C.
The above process completes the material synthesis.
And (5) growing crystals.
Crystal growth by the method:
when the red phosphorus 30 is completely gasified and no bubble occurs, the temperature of the first temperature zone, the second temperature zone, the third temperature zone and the fourth temperature zone is regulated to reach Tm +50 ℃, and the temperature is kept for 20-30min.
The injection synthesis system 5 is slowly lifted out of the crucible 7 by the injection lifting drive 6-3, and the injection synthesis system 5 is rotated so as to be away from the position right above the crucible 7.
And stopping the work of the transverse magnetic field generator 4, and adjusting the temperatures of the first temperature zone, the second temperature zone, the third temperature zone and the fourth temperature zone so as to establish a temperature gradient of 20-100 ℃/cm in the melt 9 from the surface to the bottom of the melt.
As shown in fig. 1 and 4, the seed rod 23 is started to rotate and descend by the growth rotation drive 23-2 and the growth lifting drive 23-3, and pulling is started after the LEC seed crystal 25 mounted on the seed chuck 24 contacts the melt 9 to perform crystal growth, thereby obtaining an LEC crystal 32.
Growing a crystal by a method:
at this time, the VGF seed crystal 35, the fifth heater 34, and the fifth thermocouple 36 are disposed at the bottom of the crucible 7. The temperature of the seed crystal region can be precisely controlled by the fifth heater 34 and the fifth thermocouple 36.
When the red phosphorus 30 is completely gasified and no bubble occurs, the temperature of the first temperature zone, the second temperature zone, the third temperature zone and the fourth temperature zone is regulated to reach Tm +50 ℃, and the temperature is kept for 5 to 10 hours.
The injection synthesis system 5 is slowly lifted out of the crucible 7 by the injection lifting drive 6-3, and the injection synthesis system 5 is rotated so as to be away from the position right above the crucible 7.
And stopping the work of the transverse magnetic field generator 4, descending the upper heat-insulating cover 37 by the growth lifting drive 23-3, and adjusting the temperatures of the first temperature zone, the second temperature zone, the third temperature zone and the fourth temperature zone so as to establish a temperature gradient of 3-5 ℃/cm from the bottom to the surface of the melt in the melt 9.
VGF crystal growth was performed to obtain VGF crystals 33 as shown in FIG. 5. In the figure, furnace top thermocouple 22 is inserted into the melt through upper insulated cap 37.
Claims (6)
1. A magnetic field immersion type phosphide synthesis and growth device comprises a main furnace body (1), a crucible (7) in the main furnace body, a heater and a heat insulation layer on the periphery of the crucible (7), and is characterized by further comprising an injection synthesis system (5) connected with a driving device, wherein the injection synthesis system (5) bears red phosphorus (30) and sinks into the crucible (7) under the action of the driving device;
a static magnetic field generator (4) for applying a transverse static magnetic field is arranged outside the main furnace body (1);
the injection synthesis system (5) comprises a cylindrical red phosphorus injector (5-5), and injection holes (5-10) are formed in the periphery of the red phosphorus injector (5-5);
the injection synthesis system (5) also comprises 3-5 disc-shaped shielding layers above the red phosphorus injector (5-5), the diameter of each shielding layer is 1-10mm smaller than the inner diameter of the crucible (7), and the shielding layers are provided with through holes (5-6);
the red phosphorus injector (5-5) and the shielding layer are connected on the driving device and are lifted simultaneously;
a heat insulation plate is arranged in the heat insulation layer at the periphery of the crucible (7) and corresponds to the position of the shielding layer;
according to the positions of the shielding layers, the crucible (7) is divided into different temperature areas, and the temperature area ranges are arranged between the two shielding layers, above the shielding layer at the top end and below the shielding layer at the bottom end; each temperature zone is provided with an independent heater and an independent galvanic couple.
2. The submerged phosphide synthesis and growth apparatus as claimed in claim 1, wherein temperature measuring holes matched with the furnace top thermocouple (22) are formed in the same position of each shielding layer.
3. An apparatus for synthesis and growth of phosphide according to claim 1, wherein the diameter of the injection holes (5-10) is 5-10mm, and the distance between the centers of the injection holes (5-10) is more than twice the diameter;
the diameter of the through holes (5-6) is 5-10mm, and the center distance of the through holes (5-6) is more than twice of the diameter.
4. An immersion phosphide synthesis and growth apparatus as set forth in claim 3, wherein a bubble dividing means is provided on the red phosphorus injector (5-5) and the shield layer.
5. The apparatus according to claim 4, wherein the bubble dividing means is a quartz mesh, the mesh is square, and the side length of the square is less than 3mm.
6. The apparatus of claim 1, wherein the apparatus is used for LEC or VGF crystal growth.
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| US5252175A (en) * | 1990-06-29 | 1993-10-12 | The United States Of America As Represented By The Secretary Of The Air Force | Capillary pressure relief for magnetic Kyropoulos growth of semiconductor crystals |
| JPH0940498A (en) * | 1995-07-29 | 1997-02-10 | Sumitomo Metal Mining Co Ltd | Apparatus for producing gallium phosphate polycrystal |
| US8021481B2 (en) * | 2008-08-07 | 2011-09-20 | Soraa, Inc. | Process and apparatus for large-scale manufacturing of bulk monocrystalline gallium-containing nitride |
| CN105369344A (en) * | 2015-12-15 | 2016-03-02 | 洛阳西格马炉业股份有限公司 | Method and device used for preparing platy monocrystals via temperature field gradient vertical shifting method |
| CN108358180B (en) * | 2017-12-08 | 2019-08-02 | 中国电子科技集团公司第十三研究所 | Phosphide injection synthetic method in situ is carried out using carrying gas |
| WO2019109367A1 (en) * | 2017-12-08 | 2019-06-13 | 中国电子科技集团公司第十三研究所 | Device and method for rotational and continuous crystal growth by vgf process after horizontal injection and synthesis |
| CN109402722B (en) * | 2018-12-14 | 2020-09-01 | 中国电子科技集团公司第十三研究所 | Device and method for synthesizing continuous VGF crystal growth by trans-injection |
| CN110760931B (en) * | 2019-11-22 | 2024-03-19 | 中国电子科技集团公司第十三研究所 | System for preparing indium phosphide crystal by utilizing indium-phosphorus mixture |
| CN212895088U (en) * | 2020-06-02 | 2021-04-06 | 中国电子科技集团公司第十三研究所 | System for synthesizing indium phosphide by liquid phosphorus injection method |
| CN112708935B (en) * | 2020-12-23 | 2021-12-07 | 中国电子科技集团公司第十三研究所 | Control method of semiconductor phosphide injection synthesis system |
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