CN113507682A - Recording microphone rear polar plate and recording microphone - Google Patents

Recording microphone rear polar plate and recording microphone Download PDF

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Publication number
CN113507682A
CN113507682A CN202110730439.XA CN202110730439A CN113507682A CN 113507682 A CN113507682 A CN 113507682A CN 202110730439 A CN202110730439 A CN 202110730439A CN 113507682 A CN113507682 A CN 113507682A
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CN
China
Prior art keywords
diaphragm
recording microphone
polar plate
spherical surface
microphone
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CN202110730439.XA
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Chinese (zh)
Inventor
乔琼
王鹏
李亮
吕兆明
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Jiusheng Tangshan Technology Co ltd
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Jiusheng Tangshan Technology Co ltd
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Priority to CN202110730439.XA priority Critical patent/CN113507682A/en
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    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R31/00Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R1/00Details of transducers, loudspeakers or microphones
    • H04R1/08Mouthpieces; Microphones; Attachments therefor
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R31/00Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor
    • H04R31/003Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor for diaphragms or their outer suspension

Abstract

The application relates to a microphone rear polar plate and a recording microphone, which belong to the field of sound-electricity conversion, wherein the surface of the rear polar plate facing a diaphragm is a spherical surface sunken towards the direction far away from the diaphragm. The application provides a recording microphone back polar plate and recording microphone can effectively promote the biggest sound pressure level that can bear of recording microphone, reduces the diaphragm and takes place with the absorbent condition of back polar plate under the effect of big sound pressure level signal.

Description

Recording microphone rear polar plate and recording microphone
Technical Field
The application relates to the technical field of sound-electricity conversion, in particular to a recording microphone rear pole plate and a recording microphone.
Background
Microphones are indispensable input devices in electroacoustic systems, and can be divided into recording microphones and measuring microphones according to different application scenes. The recording microphone is mainly used for recording music, human voice and the like, and has an essential difference from the use of the measuring microphone, the purpose of measurement is to truly restore the property of things, and the recording microphone provides a user with a 'pleasant and dynamic sound' which has a main function that the more realistic the original sound is, the better the original sound is restored.
The condenser microphone is a microphone which can be used in a recording scene and comprises two polar plates, wherein one polar plate is a diaphragm, and the other polar plate is a rear polar plate. When the sound signal acts on the diaphragm, the diaphragm is forced to vibrate, so that the distance between the diaphragm and the rear polar plate is changed, the capacitance between the two polar plates is changed, and the sound signal is converted into an electric signal under the action of the polarization circuit. In the related art condenser microphone, when the diaphragm is in a static state, the diaphragm is parallel to the surface of the back polar plate facing the diaphragm, when a large sound pressure sound signal acts on the diaphragm, the diaphragm moves towards the back polar plate under the action of polarization voltage, the diaphragm and the back polar plate are infinitely close to each other and are easily adsorbed together, so that the microphone has no sensitivity instantly.
Disclosure of Invention
In order to reduce the situation that the diaphragm is adsorbed with the back polar plate under the effect of a large-sound-pressure sound signal, the application provides a recording microphone back polar plate and a recording microphone.
In a first aspect, the present application provides a recording microphone rear plate, which adopts the following technical scheme:
the surface of the rear polar plate facing to the diaphragm is a spherical surface which is concave towards the direction far away from the diaphragm.
By adopting the technical scheme, the suction film voltage of the recording microphone can be improved, and the situation that the diaphragm is adsorbed with the rear polar plate under the action of a large-sound-pressure-level sound signal is reduced.
Optionally, the chord length of the spherical surface is equal to the diameter of the vibration range of the diaphragm;
the maximum depth of the center of the spherical surface is larger than or equal to the maximum amplitude of the center of the diaphragm.
By adopting the technical scheme, the suction film voltage of the recording microphone can be improved, and the tone quality is improved.
Optionally, the spherical surface is formed by a laser processing process.
By adopting the technical scheme, the processing precision of the spherical surface can be improved.
In a second aspect, the sound recording microphone provided by the present application adopts the following technical solutions:
a recording microphone comprises the recording microphone back polar plate and a diaphragm positioned on one side of the spherical surface of the back polar plate.
To sum up, recording microphone back polar plate and recording microphone that this application provided can effectively promote the biggest sound pressure level that can bear of recording microphone, reduce the diaphragm and take place with the absorptive condition of back polar plate under the effect of big sound pressure level signal.
Drawings
FIG. 1 is a schematic diagram of a back plate structure and the positional relationship between a diaphragm and the back plate;
fig. 2 is a schematic view of an ideal vibration mode of the diaphragm.
Detailed Description
The present application is described in further detail below with reference to figures 1-2.
Referring to fig. 1, the embodiment of the present application discloses a rear pole plate of a recording microphone, which is made of metal materials such as copper, etc. existing in the related art. Because the diaphragm can be idealized to be the parabola shape in the vibration process, therefore, the surface of the back polar plate facing the diaphragm can be set to be a spherical surface which is concave towards the direction far away from the diaphragm, thereby reducing the adsorption of the diaphragm and the back polar plate for providing a certain vibration gap. The spherical surface can be processed by adopting the processes of laser processing and the like, thereby ensuring that the spherical surface has good processing precision.
In the present application, in order to make the diaphragm have a good matching degree with the spherical surface during vibration, the chord length L of the spherical surface is set as the radius R of the back plate12 times of the total weight of the powder. Radius R of the rear plate1Arranged to be at a radius R from the vibration area of the diaphragm2Are equal.
In the present application, the center maximum depth of the spherical surface is determined in the following manner:
referring to fig. 2, according to the vibration mode of the diaphragm, ideally, the displacement of the center of the diaphragm from the equilibrium positionuWith restoring force F of the diaphragm in vibration1The relationship of (1) is:
F1=-2πR2Tsinα
wherein T is the edge tension of the diaphragm, and alpha is the included angle between the edge tension T and the diameter of the diaphragm when the diaphragm is static.
Since the amplitude of the diaphragm is a minute amplitude, there are
Figure BDA0003139151370000021
Then there is
Figure BDA0003139151370000022
According to the performance requirement of the recording microphone and the material property of the diaphragm, the restoring force F of the diaphragm under the condition of maximum amplitude can be calculated1And an edge tension T. Thus, the maximum amplitude of the diaphragm is:
Figure BDA0003139151370000023
here, the center maximum depth H of the spherical surface is set to be equal to or greater than the maximum amplitude u of the diaphragm, which is related to the sound pressure level of the scene to which the recording microphone is applied. According to the characteristics of the recording microphone, along with the increase of the depth of the spherical surface, the capacitance between the diaphragm and the rear polar plate is increased when the diaphragm vibrates under the condition of large sound pressure level, so that the sensitivity of the microphone is improved.
In the present application, taking the diaphragm as an example with a vibration range diameter of 28mm, the central maximum amplitude of the diaphragm under forced vibration of a signal at a large sound pressure level at a certain resonance frequency is 45 μm. When the maximum depth H of the center of the spherical surface is 45 micrometers, the center of the diaphragm is just parallel to the spherical surface when reaching the maximum amplitude, and when the maximum depth of the center of the spherical surface is more than 45 micrometers, the diaphragm still keeps a gap with the back polar plate when reaching the maximum amplitude, so that the adsorption of the diaphragm and the back polar plate is reduced.
In a recording microphone of conventional structure, it is generally necessary to provide a polyester spacer of 40-45 μm thickness between the back plate and the diaphragm in order to allow the diaphragm to vibrate freely. In the application, through the laser processing technology, the spherical surface is directly processed on the rear polar plate, so that a gasket is not needed, the integral structure of the recording microphone is simplified, and the assembly efficiency is improved. In addition, in the traditional recording microphone, the processing precision of the gasket is generally 45 +/-2 microns, and the processing precision of the spherical surface formed by the laser processing technology can reach 45 +/-0.5 microns, so that the consistency of the output of the recording microphone of the same product can be improved, the stability of the output of the recording microphone can be improved, and the tone quality can be improved.
And the first table shows the corresponding pressure data of the suction membrane obtained by testing under the conditions of the same signal-to-noise ratio and different resonant frequencies when the maximum depth of the center of the spherical surface is 45 mu m.
Suction film voltage test data of surface-sphere rear-pole recording microphone
Resonance frequency (Hz) Capacitor (pF) Diaphragm voltage (V) Insulation resistance (omega)
900 77.3 115 4.7T
1200 81 135 4.7T
1400 85 135 4.7T
As can be seen from the table I, the suction membrane voltage reached 135V at the resonance frequencies of 1200Hz and 1400 Hz.
Referring to table two, in the case of a vibration range diameter of 28mm, when the diaphragm is matched with a common plane back plate, the test data of the suction film voltage and the release voltage are as follows:
test data of suction film voltage and release voltage of sound recording microphone with two planar rear electrode plates
Figure BDA0003139151370000031
Figure BDA0003139151370000041
By comparison, under the same high sound pressure level signal, when a common plane rear polar plate is adopted, the maximum voltage of the suction film does not exceed 125V.
Referring to table three, in the case that the diameter of the diaphragm vibration range is 28mm, the performance parameter comparison data when the diaphragm is matched with the spherical surface back plate and the planar back plate is as follows:
comparison data of performance parameters of recording microphone with front polar plate of surface three-sphere surface and back polar plate of surface
Parameter(s) Spherical surface rear polar plate Planar rear polar plate
Polarization voltage 120V 60V
Sensitivity of the probe -23.4dB -32.5dB
Noise(s) 1.8mV/-115.4dB A 1.4mV/-117.4dB A
Equivalent noise level 2.3dB A 9.4dB A
Max in 3.4V 3.6V
Max out 3.0V 3.2V
Magnification factor 0.89 0.89
Testing capacitance 83pF 83pF
It can be known through the comparison of the data in table three, under the condition that other component parameters of the recording microphone are not changed, when the recording microphone adopts the spherical surface rear polar plate, compared with the plane rear polar plate, the polarization voltage of the recording microphone is improved to 120V from 60V, the recording microphone does not absorb the membrane, and the equivalent noise level is reduced to 2.3dB A from 9.4dB A, so that the tone quality of the recording microphone is effectively improved.
The application also discloses a recording microphone, adopts aforementioned back polar plate that has spherical face, is provided with the diaphragm on one side of the spherical face of back polar plate.
The application provides a recording microphone back polar plate sets up to spherical face through the surface that will be close to diaphragm one side, has improved the suction film voltage of recording microphone, can reduce recording microphone diaphragm and back base plate absorption under the effect of big sound pressure level signal and lead to the condition emergence of nothing agility. Meanwhile, the recording microphone adopting the rear polar plate has the advantages of low equivalent noise level and good tone quality.
The above is a preferred embodiment of the present application, and the scope of protection of the present application is not limited by the above, so: all equivalent changes made according to the structure, shape and principle of the present application shall be covered by the protection scope of the present application.

Claims (4)

1. The rear polar plate of the recording microphone is characterized in that the surface of the rear polar plate facing the diaphragm is a spherical surface which is concave towards the direction far away from the diaphragm.
2. The recording microphone backplate of claim 1, wherein the chord length of the spherical surface is equal to the diameter of the diaphragm vibration range;
the maximum depth of the center of the spherical surface is larger than or equal to the maximum amplitude of the center of the diaphragm.
3. The recording microphone back plate of claim 1, wherein the spherical surface is formed using a laser machining process.
4. A recording microphone comprising the back plate of any one of claims 1 to 3 and a diaphragm located on the spherical surface side of the back plate.
CN202110730439.XA 2021-06-29 2021-06-29 Recording microphone rear polar plate and recording microphone Pending CN113507682A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023272496A1 (en) * 2021-06-29 2023-01-05 九声(唐山)科技有限公司 Rear pole plate for recording microphone and recording microphone

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007194913A (en) * 2006-01-19 2007-08-02 Yamaha Corp Capacitor microphone and its manufacturing method
CN103067833A (en) * 2012-12-27 2013-04-24 山东共达电声股份有限公司 Back counter electrode and microphone
CN206932407U (en) * 2017-06-30 2018-01-26 歌尔科技有限公司 Mems microphone
US20180146299A1 (en) * 2016-11-24 2018-05-24 Hyundai Motor Company Microphone and manufacturing method thereof
US20190047848A1 (en) * 2017-08-11 2019-02-14 Cirrus Logic International Semiconductor Ltd. Mems devices and processes
US20200007992A1 (en) * 2018-01-08 2020-01-02 Nanofone Limited High performance sealed-gap capacitive microphone with various gap geometries

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007194913A (en) * 2006-01-19 2007-08-02 Yamaha Corp Capacitor microphone and its manufacturing method
CN103067833A (en) * 2012-12-27 2013-04-24 山东共达电声股份有限公司 Back counter electrode and microphone
US20180146299A1 (en) * 2016-11-24 2018-05-24 Hyundai Motor Company Microphone and manufacturing method thereof
CN206932407U (en) * 2017-06-30 2018-01-26 歌尔科技有限公司 Mems microphone
US20190047848A1 (en) * 2017-08-11 2019-02-14 Cirrus Logic International Semiconductor Ltd. Mems devices and processes
US20200007992A1 (en) * 2018-01-08 2020-01-02 Nanofone Limited High performance sealed-gap capacitive microphone with various gap geometries

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023272496A1 (en) * 2021-06-29 2023-01-05 九声(唐山)科技有限公司 Rear pole plate for recording microphone and recording microphone
US11877137B2 (en) 2021-06-29 2024-01-16 Jiusheng (Tangshan) Technology Co., Ltd. Backplate for recording microphone, and recording microphone

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