Disclosure of Invention
The present invention is directed to solving, at least to some extent, one of the technical problems in the related art. Therefore, the embodiment of the invention provides a backfill method of an underground mining pit, which can avoid the problems of uneven stress, partial stress, stress concentration and the like generated in the construction process, so as to ensure the relative balance of the stress on the roadway and improve the stability of the roadway.
The backfill method of the mining pit on the well according to the embodiment of the invention comprises the following steps: dividing the peripheral area of the roadway into a first backfill area and a second backfill area which are symmetrical, and a third backfill area and a fourth backfill area which are symmetrical; backfilling the first backfilling region and the second backfilling region simultaneously; backfilling the third backfilling region and the fourth backfilling region simultaneously.
According to the backfill method of the pit mined in the well, the peripheral area of the well is divided into the first backfill area and the second backfill area which are symmetrical, the third backfill area and the fourth backfill area which are symmetrical, the first backfill area and the second backfill area are backfilled at the same time, and the third backfill area and the fourth backfill area are backfilled at the same time, so that the problems of uneven stress, partial stress, stress concentration and the like generated in the construction process can be avoided, the relative balance of the stress on the well is ensured, and the stability of the well is improved.
In some embodiments, the method of backfilling an uphole production pit further comprises: backfilling the first backfilling area layer by layer to form a plurality of first backfilling layers; and backfilling the second backfilling area layer by layer to form a plurality of second backfilling layers, wherein the plurality of second backfilling layers correspond to the plurality of first backfilling layers.
In some embodiments, the method of backfilling an uphole production pit further comprises: and the first backfill layer and the corresponding second backfill layer are filled synchronously.
In some embodiments, the method of backfilling an uphole production pit further comprises: backfilling the third backfilling area layer by layer to form a plurality of third backfilling layers; and backfilling the fourth backfilling area layer by layer to form a plurality of fourth backfilling layers, wherein the plurality of fourth backfilling layers correspond to the plurality of third backfilling layers.
In some embodiments, the method of backfilling an uphole production pit further comprises: the third backfill layer and the corresponding fourth backfill layer are filled synchronously.
In some embodiments, the method of backfilling an uphole production pit further comprises: and in the process of backfilling the first backfilling area, the second backfilling area, the third backfilling area and the fourth backfilling area, firstly, a relatively slow side slope angle is adopted for propelling coverage to form a base filling body with a gentle side slope.
In some embodiments, the method of backfilling an uphole production pit further comprises: and continuously filling the basic filling body to form a complete filling body with steep side slope.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings. The embodiments described below with reference to the drawings are illustrative and intended to be illustrative of the invention and are not to be construed as limiting the invention.
As shown in fig. 1 and 2, a backfill method for an uphole pit according to an embodiment of the invention includes: the peripheral area of the roadway 5 is divided into a first backfill area 1 and a second backfill area 2 which are symmetrical, and a third backfill area 3 and a fourth backfill area 4 which are symmetrical, then the first backfill area 1 and the second backfill area 2 are backfilled at the same time, and the third backfill area 3 and the fourth backfill area 4 are backfilled at the same time.
It can be understood that the first backfill region 1 and the second backfill region 2 are symmetrical backfill regions with respect to the roadway 5, in the direction (east-west direction shown in fig. 1) in which the first backfill region 1 and the second backfill region 2 are distributed, the stress generated to the roadway 5 after the first backfill region 1 is filled is opposite and equal to the stress generated to the roadway 5 after the second backfill region is removed, and the third backfill region 3 and the fourth backfill region 4 are symmetrical backfill regions with respect to the roadway 5, in the direction (north-south direction shown in fig. 1) in which the third backfill region 3 and the fourth backfill region 4 are distributed, the stress generated to the roadway 5 after the third backfill region 3 is filled is opposite and equal to the stress generated to the roadway 5 after the fourth backfill region 4 is filled, so that the stresses in all directions are kept balanced when the peripheral region of the roadway 5 is backfilled, thereby preventing the uneven stress generated in the construction process, Bias stress and stress concentration, etc.
According to the backfill method of the pit mined in the well, the peripheral area of the well is divided into the first backfill area and the second backfill area which are symmetrical, the third backfill area and the fourth backfill area which are symmetrical, the first backfill area and the second backfill area are backfilled at the same time, and the third backfill area and the fourth backfill area are backfilled at the same time, so that the problems of uneven stress, partial stress, stress concentration and the like generated in the construction process can be avoided, the relative balance of the stress on the well is ensured, and the stability of the well is improved.
Furthermore, the first backfill region 1 is backfilled layer by layer to form a plurality of first backfill layers, the second backfill region 2 is backfilled layer by layer to form a plurality of second backfill layers, and the plurality of second backfill layers correspond to the plurality of first backfill layers. It can be understood that the stress generated by the layer-by-layer backfill filling mode tends to increase gradually, which is beneficial to the stability of the roadway 5 and avoids the phenomenon of unbalance stress of the roadway 5 caused by sudden stress increase.
Further, the first backfill layer and the corresponding second backfill layer are filled synchronously, so that the stress of the first backfill region 1 and the stress of the second backfill region 2 are opposite and equal at any construction stage.
Similarly, the third backfill regions 3 are backfilled layer by layer to form a plurality of third backfill layers, the fourth backfill regions 4 are backfilled layer by layer to form a plurality of fourth backfill layers, the plurality of fourth backfill layers correspond to the plurality of third backfill layers, and the third backfill layers and the corresponding fourth backfill layers are synchronously filled.
Specifically, in the process of backfilling the first backfilling area 1, the second backfilling area 2, the third backfilling area 3 and the fourth backfilling area 4, a relatively slow side slope angle is adopted for propelling coverage to form a base filling body with a gentle side slope, and then the base filling body is continuously filled to form a complete filling body with a steep side slope. Therefore, the filling stress of the first backfill region 1, the second backfill region 2, the third backfill region 3 and the fourth backfill region 4 is gradually increased to a final state, and the stability of the roadway 5 is facilitated.
In the description of the present invention, it is to be understood that the terms "central," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the invention and to simplify the description, and are not intended to indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and are therefore not to be considered limiting of the invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; may be mechanically coupled, may be electrically coupled or may be in communication with each other; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, the first feature "on" or "under" the second feature may be directly contacting the first and second features or indirectly contacting the first and second features through an intermediate. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.
In the present disclosure, the terms "one embodiment," "some embodiments," "an example," "a specific example," or "some examples" and the like mean that a specific feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present disclosure. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples and features of different embodiments or examples described in this specification can be combined and combined by one skilled in the art without contradiction.
Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention, and that variations, modifications, substitutions and alterations can be made to the above embodiments by those of ordinary skill in the art within the scope of the present invention.