CN113467189A - Signal switching unit of photoetching machine excimer laser - Google Patents

Signal switching unit of photoetching machine excimer laser Download PDF

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Publication number
CN113467189A
CN113467189A CN202010243270.0A CN202010243270A CN113467189A CN 113467189 A CN113467189 A CN 113467189A CN 202010243270 A CN202010243270 A CN 202010243270A CN 113467189 A CN113467189 A CN 113467189A
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signal
excimer laser
switching unit
tvs
digital signal
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CN113467189B (en
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廖密
冯泽斌
张华�
张琴
王香
黄立杰
马天龙
沙鹏飞
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Beijing RSlaser Opto Electronics Technology Co Ltd
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Beijing RSlaser Opto Electronics Technology Co Ltd
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources
    • G03F7/70025Production of exposure light, i.e. light sources by lasers

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  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The application relates to the field of photoetching, in particular to a signal switching unit of an excimer laser of a photoetching machine. The method comprises the following steps: the device comprises a gas discharge tube, a first TVS tube, a self-recovery fuse, a second TVS tube and a digital signal isolation chip. This application is through gas discharge tube, interference signal voltage restriction in the signal of lithography machine carries out the first layer protection within fixed range by first TVS pipe, through the self-resuming fuse when the interference signal current too big break off the current hour resume and second TVS pipe carries out the second floor protection for the voltage limit of interference signal for the target voltage value, control signal through digital signal isolation chip between with signal switching unit and the industrial computer separately carries out the third layer protection, can effectively restrain the great static that outside lithography machine transmitted, interference signal such as surge, when realizing excimer laser ware signal switching function, can also effectively reduce outside interference, protect other hardware units in the excimer laser ware.

Description

Signal switching unit of photoetching machine excimer laser
Technical Field
The application relates to the field of photoetching, in particular to a signal switching unit of an excimer laser of a photoetching machine.
Background
The 193nmARF excimer laser is a pulse type gas laser for deep ultraviolet lithography application, has the characteristics of high repetition frequency, large energy, short wavelength and narrow line width, and is an excellent laser light source for a microelectronic lithography system.
The composition of the excimer laser is a complex composition, the control and acquisition part of the excimer laser is completed by an industrial personal computer, and if each module in the excimer laser is directly connected with the industrial personal computer through a connecting wire, the defects of circuit disorder, poor signal quality, non-ideal EMC (Electro Magnetic Compatibility) and the like exist.
In order to reliably provide laser for an external photoetching machine, a factory, a shutter, an alarm lamp, a heating band, interlocking detection, a motor and the like are controlled internally, signals of the photoetching machine are detected externally, and a signal switching device is connected between an industrial personal computer and other modules and the photoetching machine. At present, an existing signal switching device does not process EMC, if an external photoetching machine transmits larger interference signals such as static electricity, a part of unit modules of a laser or an industrial personal computer are easily damaged, and therefore the EMC function needs to be added to the signal switching device.
Disclosure of Invention
The embodiment of the application provides a signal switching unit of an excimer laser of a photoetching machine, which is used for at least solving the technical problem that the EMC is not processed by the existing signal switching device.
According to an embodiment of the present application, there is provided a signal transfer unit of an excimer laser of a lithography machine, including: the device comprises a gas discharge tube, a first TVS tube, a self-recovery fuse, a second TVS tube and a digital signal isolation chip; gas discharge tube, parallelly connected back one end of first TVS pipe are connected with the signal mouth of lithography machine, and the other end is kept apart the chip with self-resuming fuse, second TVS pipe, digital signal in proper order and is connected, and the chip is kept apart to digital signal is connected with the industrial computer, wherein:
the gas discharge tube and the first TVS tube are used for limiting the voltage of an interference signal in a signal of the photoetching machine within a fixed range;
the self-recovery fuse is used for being disconnected when the current of the interference signal is too large and recovering when the current is small;
the second TVS tube is used for limiting the voltage of the interference signal to a target voltage value;
and the digital signal isolation chip is used for separating the control signal between the signal switching unit and the industrial personal computer.
Further, the signal port of the lithography machine comprises: IO port, serial port, GND.
Further, the signal transfer unit further comprises a ground, and the first TVS tube and the gas discharge tube are connected to the ground and used for discharging the interference signal voltage to the ground to limit the voltage within a fixed range.
Furthermore, the digital signal isolation chip is also used for separating a power supply and a ground between the signal switching unit and the industrial personal computer.
Furthermore, the digital signal isolation chip comprises a signal port and an IO port which are connected, the signal port is connected with the second TVS tube, and the IO port is connected with the industrial personal computer.
Furthermore, the digital signal isolation chip further comprises a system ground and a GND which are connected, the system ground is connected with the second TVS tube, and the GND of the digital signal isolation chip is connected with the industrial personal computer.
Furthermore, the digital signal isolation chip also comprises a system power supply and a power supply which are connected, the system power supply supplies power for the signal switching unit, and the power supply of the digital signal isolation chip is connected with the industrial personal computer.
According to another embodiment of the application, there is provided a lithography system comprising a signal transfer unit as defined in any one of the above applied to an excimer laser on a lithography machine.
Further, the lithography system further comprises: lithography machines, excimer lasers; the excimer laser includes: the system comprises a signal switching unit, a factory, a shutter, a motor, an alarm lamp, an industrial personal computer, a heating belt and an interlock; the signal switching unit is connected with the photoetching machine, and the signal switching unit is respectively connected with the factory, the shutter, the motor, the alarm lamp, the industrial personal computer, the heating belt and the interlocking.
Further, the photoetching machine comprises an IO port, a serial port and a GND, and the industrial personal computer comprises a power supply, the IO port and the GND; IO port, serial ports, GND on the photoetching machine are respectively connected with gas discharge tube, the first TVS tube on the signal switching unit, and power, IO port, GND on the industrial computer are connected with power, IO port, GND on the signal switching unit in a one-to-one correspondence manner.
The utility model provides a signal switching unit and photoetching system of photoetching machine excimer laser in embodiment, through gas discharge tube, interference signal voltage restriction in the signal of photoetching machine carries out the first layer protection within fixed range with first TVS pipe, through the self-resuming fuse when interference signal current too big break off when the current hour resume and second TVS pipe with interference signal's voltage restriction for the target voltage value carry out the second layer protection, control signal through digital signal isolation chip between with signal switching unit and the industrial computer separately carries out the third layer protection, can effectively restrain the great static that outside photoetching machine transmitted, interference signal such as surge. Compared with the prior art, this application is aimed at the molecule laser instrument specially and is designed, and when the signal switching unit in this application realized excimer laser instrument signal switching function, can also effectively reduce outside interference, other hardware units in the protection excimer laser instrument, extension excimer laser instrument's life.
Drawings
The accompanying drawings, which are included to provide a further understanding of the application and are incorporated in and constitute a part of this application, illustrate embodiment(s) of the application and together with the description serve to explain the application and not to limit the application. In the drawings:
FIG. 1 is a block diagram of a signal transfer unit according to the present application;
FIG. 2 is a connection frame of the excimer laser of the present application.
Detailed Description
In order to make the technical solutions better understood by those skilled in the art, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only partial embodiments of the present application, but not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
It should be noted that the terms "first," "second," and the like in the description and claims of this application and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used is interchangeable under appropriate circumstances such that the embodiments of the application described herein are capable of operation in sequences other than those illustrated or described herein. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
Example 1
According to an embodiment of the present application, there is provided a signal transfer unit of an excimer laser of a lithography machine, referring to fig. 1, including: the device comprises a gas discharge tube, a first TVS tube, a self-recovery fuse, a second TVS tube and a digital signal isolation chip; gas discharge tube, parallelly connected back one end of first TVS pipe are connected with the signal mouth of lithography machine, and the other end is kept apart the chip with self-resuming fuse, second TVS pipe, digital signal in proper order and is connected, and the chip is kept apart to digital signal is connected with the industrial computer, wherein:
the gas discharge tube and the first TVS tube are used for limiting the voltage of an interference signal in a signal of the photoetching machine within a fixed range;
the self-recovery fuse is used for being disconnected when the current of the interference signal is too large and recovering when the current is small;
the second TVS tube is used for limiting the voltage of the interference signal to a target voltage value;
and the digital signal isolation chip is used for separating the control signal between the signal switching unit and the industrial personal computer.
The signal switching unit of photoetching machine excimer laser in the embodiment of the application, through gas discharge tube, interference signal voltage restriction in the signal of photoetching machine carries out the first layer protection within the fixed range by first TVS pipe, through the self-resuming fuse when the interference signal current too big break off when the current becomes little resume and second TVS pipe carries out the second layer protection with interference signal's voltage restriction for the target voltage value, control signal through digital signal isolation chip between with signal switching unit and the industrial computer separately carries out the third layer protection, can effectively restrain outside photoetching machine transmission great static, interference signal such as surge. Compared with the prior art, this application is aimed at the molecule laser instrument specially and is designed, and when the signal switching unit in this application realized excimer laser instrument signal switching function, can also effectively reduce outside interference, other hardware units in the protection excimer laser instrument, extension excimer laser instrument's life.
Preferably, the signal port of the lithography machine comprises: IO port, serial port, GND.
Preferably, the signal transfer unit further comprises a ground, and the first TVS tube and the gas discharge tube are connected to the ground and used for discharging the interference signal voltage to the ground to limit the voltage within a fixed range.
Preferably, the digital signal isolation chip is also used for separating a power supply and a ground between the signal switching unit and the industrial personal computer.
Preferably, the digital signal isolation chip comprises a signal port and an IO port which are connected, the signal port is connected with the second TVS tube, and the IO port is connected with the industrial personal computer.
Preferably, the digital signal isolation chip further comprises a system ground and a GND which are connected, the system ground is connected with the second TVS tube, and the GND of the digital signal isolation chip is connected with the industrial personal computer.
Preferably, the digital signal isolation chip further comprises a system power supply and a power supply which are connected, the system power supply supplies power to the signal switching unit, and the power supply of the digital signal isolation chip is connected with the industrial personal computer.
The signal transfer unit of the present application applied to an excimer laser of a lithography machine is described in detail with specific examples.
The signal switching unit is externally connected with a photoetching machine and internally connected with a factory, a shutter, a motor, an alarm lamp, an industrial personal computer, a heating belt, interlocking and the like. Secondly, for the whole excimer laser, main interference signals come from an external photoetching machine, signals of the photoetching machine are divided into IO signals, serial port signals and GND signals, and the 3 signals are protected. Finally, three-layer protection is performed on the interference from the photoetching machine, wherein the first-layer protection is that one end connected with the photoetching machine is connected with a gas discharge tube and a first TVS tube, the gas discharge tube and the first TVS tube are connected in parallel, the gas discharge tube and the first TVS tube are connected with the ground, when an interference signal is large, the voltage is discharged to the ground through the gas discharge tube, and the voltage is limited within a fixed range; the second layer of protection is that the signal passing through the gas discharge tube and the first TVS tube passes through the self-recovery fuse, and then the signal passes through the second TVS tube, the other end of the second TVS tube is connected to the system ground, the self-recovery fuse aims to be disconnected when the current of the interference signal is too large, and recovers when the current is small, and the voltage is fixed to the target voltage through the second TVS tube; the third layer of protection is that the signal after the second layer of protection is connected to a digital signal isolation chip and finally connected with an industrial personal computer, and the digital signal isolation chip not only separates the control signal connected with the industrial personal computer from a circuit board, but also separates a power supply from the ground. The selection of the fuse is to select a self-recovery fuse with high disconnection speed and proper current, the selection of the TVS tube is selected according to the output voltage of the interface, and the selection of the digital signal isolation chip is selected according to the difference of the input port and the output port.
FIG. 2 is a connection block diagram of the excimer laser, in which the signal flow direction of the excimer laser is divided into an external portion and an internal portion, and the lithography machine is connected to the excimer laser through a signal transfer unit; the excimer laser is internally provided with a factory, a shutter, a motor, a signal transfer unit, a shutter, a heating band, an interlock, an alarm lamp, an industrial personal computer and the like, wherein the signal transfer unit is respectively connected with the photoetching machine, the factory, the shutter, the motor, the shutter, the heating band, the interlock, the alarm lamp, the industrial personal computer and the like. The industrial personal computer is used for controlling the external photoetching machine, the internal works, the shutter, the motor, the signal transfer unit, the shutter, the heating belt, the interlock, the alarm lamp and the like, and simultaneously acquiring information required to be acquired, such as the external photoetching machine, the internal works, the shutter, the motor, the signal transfer unit, the shutter, the heating belt, the interlock, the alarm lamp and the like.
Referring to fig. 1 specifically, for the whole excimer laser, the main interference signal comes from an external lithography machine, the signal of the lithography machine is divided into an IO signal, a serial port signal and a GND signal, the 3 signals are protected, the IO signal, the serial port signal and the GND signal output by the lithography machine are directly connected with a gas discharge tube and a first TVS tube of a signal transfer unit, the gas discharge tube and the first TVS tube in the signal transfer unit are connected in parallel, one end of the gas discharge tube and the first TVS tube is connected with the IO port, the serial port and the GND of the lithography machine, the other end of the gas discharge tube and the first TVS tube is connected with a self-recovery fuse, and the other end of the first TVS tube is also connected with the ground; one end of the self-recovery fuse is connected with the gas discharge tube and the first TVS tube, and the other end of the self-recovery fuse is connected with the second TVS tube; one end of the second TVS tube is connected with the self-recovery fuse, the other end of the second TVS tube is connected with a signal port of the digital signal isolation chip, the signal port of the digital signal isolation chip is connected with the second TVS tube, a system power supply is a system power supply of the signal transfer unit, the system ground is a system ground of the signal transfer unit, the power supply of the digital signal isolation chip is connected with a power supply of the industrial personal computer, the GND of the digital signal isolation chip is connected with the GND of the industrial personal computer, and the IO of the digital signal isolation chip is connected with the IO of the industrial personal computer. The gas discharge tube and the first TVS tube are used for first-level protection, the self-recovery fuse and the second TVS tube are used for second-level protection, and the digital signal isolation chip is used for third-level protection.
Example 2
According to another embodiment of the present application, there is provided a lithography system comprising a signal relay unit of a lithography machine excimer laser as defined in any one of the above.
The photoetching system in this application embodiment, through gas discharge tube, interference signal voltage restriction in the signal of photoetching machine carries out the first layer protection within fixed range by first TVS pipe, through the self-resuming fuse when the interference signal current too big break off when the current hour resume and second TVS pipe carries out the second floor protection with interference signal's voltage restriction for the target voltage value, control signal through digital signal isolation chip between with signal switching unit and the industrial computer separately carries out the third layer protection, can effectively restrain the great static that outside photoetching machine transmitted, interference signal such as surge. Compared with the prior art, this application is aimed at the molecule laser instrument specially and is designed, and when the signal switching unit in this application realized excimer laser instrument signal switching function, can also effectively reduce outside interference, other hardware units in the protection excimer laser instrument, extension excimer laser instrument's life.
Preferably, the lithography system further comprises: lithography machines, excimer lasers; the excimer laser includes: the system comprises a signal switching unit, a factory, a shutter, a motor, an alarm lamp, an industrial personal computer, a heating belt and an interlock; the signal switching unit is connected with the photoetching machine, and the signal switching unit is respectively connected with the factory, the shutter, the motor, the alarm lamp, the industrial personal computer, the heating belt and the interlocking.
Preferably, the photoetching machine comprises an IO port, a serial port and a GND, and the industrial personal computer comprises a power supply, the IO port and the GND; IO port, serial ports, GND on the photoetching machine are respectively connected with gas discharge tube, the first TVS tube on the signal switching unit, and power, IO port, GND on the industrial computer are connected with power, IO port, GND on the signal switching unit in a one-to-one correspondence manner.
The lithography system of the present application is described in detail below with specific embodiments.
The signal switching unit is externally connected with a photoetching machine and internally connected with a factory, a shutter, a motor, an alarm lamp, an industrial personal computer, a heating belt, interlocking and the like. Secondly, for the whole excimer laser, main interference signals come from an external photoetching machine, signals of the photoetching machine are divided into IO signals, serial port signals and GND signals, and the 3 signals are protected. Finally, three-layer protection is performed on the interference from the photoetching machine, wherein the first-layer protection is that one end connected with the photoetching machine is connected with a gas discharge tube and a first TVS tube, the gas discharge tube and the first TVS tube are connected in parallel, the gas discharge tube and the first TVS tube are connected with the ground, when an interference signal is large, the voltage is discharged to the ground through the gas discharge tube, and the voltage is limited within a fixed range; the second layer of protection is that the signal passing through the gas discharge tube and the first TVS tube passes through the self-recovery fuse, and then the signal passes through the second TVS tube, the other end of the second TVS tube is connected to the system ground, the self-recovery fuse aims to be disconnected when the current of the interference signal is too large, and recovers when the current is small, and the voltage is fixed to the target voltage through the second TVS tube; the third layer of protection is that the signal after the second layer of protection is connected to a digital signal isolation chip and finally connected with an industrial personal computer, and the digital signal isolation chip not only separates the control signal connected with the industrial personal computer from a circuit board, but also separates a power supply from the ground. The selection of the fuse is to select a self-recovery fuse with high disconnection speed and proper current, the selection of the TVS tube is selected according to the output voltage of the interface, and the selection of the digital signal isolation chip is selected according to the difference of the input port and the output port.
FIG. 2 is a connection block diagram of the excimer laser, in which the signal flow direction of the excimer laser is divided into an external portion and an internal portion, and the lithography machine is connected to the excimer laser through a signal transfer unit; the excimer laser is internally provided with a factory, a shutter, a motor, a signal transfer unit, a shutter, a heating band, an interlock, an alarm lamp, an industrial personal computer and the like, wherein the signal transfer unit is respectively connected with the photoetching machine, the factory, the shutter, the motor, the shutter, the heating band, the interlock, the alarm lamp, the industrial personal computer and the like. The industrial personal computer is used for controlling the external photoetching machine, the internal works, the shutter, the motor, the signal transfer unit, the shutter, the heating belt, the interlock, the alarm lamp and the like, and simultaneously acquiring information required to be acquired, such as the external photoetching machine, the internal works, the shutter, the motor, the signal transfer unit, the shutter, the heating belt, the interlock, the alarm lamp and the like.
Referring to fig. 1 specifically, for the whole excimer laser, the main interference signal comes from an external lithography machine, the signal of the lithography machine is divided into an IO signal, a serial port signal and a GND signal, the 3 signals are protected, the IO signal, the serial port signal and the GND signal output by the lithography machine are directly connected with a gas discharge tube and a first TVS tube of a signal transfer unit, the gas discharge tube and the first TVS tube in the signal transfer unit are connected in parallel, one end of the gas discharge tube and the first TVS tube is connected with the IO port, the serial port and the GND of the lithography machine, the other end of the gas discharge tube and the first TVS tube is connected with a self-recovery fuse, and the other end of the first TVS tube is also connected with the ground; one end of the self-recovery fuse is connected with the gas discharge tube and the first TVS tube, and the other end of the self-recovery fuse is connected with the second TVS tube; one end of the second TVS tube is connected with the self-recovery fuse, the other end of the second TVS tube is connected with a signal port of the digital signal isolation chip, the signal port of the digital signal isolation chip is connected with the second TVS tube, a system power supply is a system power supply of the signal transfer unit, the system ground is a system ground of the signal transfer unit, the power supply of the digital signal isolation chip is connected with a power supply of the industrial personal computer, the GND of the digital signal isolation chip is connected with the GND of the industrial personal computer, and the IO of the digital signal isolation chip is connected with the IO of the industrial personal computer. The gas discharge tube and the first TVS tube are used for first-level protection, the self-recovery fuse and the second TVS tube are used for second-level protection, and the digital signal isolation chip is used for third-level protection.
The above-mentioned serial numbers of the embodiments of the present application are merely for description and do not represent the merits of the embodiments.
In the above embodiments of the present application, the descriptions of the respective embodiments have respective emphasis, and for parts that are not described in detail in a certain embodiment, reference may be made to related descriptions of other embodiments.
In the embodiments provided in the present application, it should be understood that the disclosed technology can be implemented in other ways. The above-described system embodiments are merely illustrative, and for example, a division of a unit may be a logical division, and an actual implementation may have another division, for example, multiple units or components may be combined or integrated into another system, or some features may be omitted, or not executed. In addition, the shown or discussed mutual coupling or direct coupling or communication connection may be an indirect coupling or communication connection through some interfaces, units or modules, and may be in an electrical or other form.
The units described as separate parts may or may not be physically separate, and parts displayed as units may or may not be physical units, may be located in one place, or may be distributed on a plurality of units. Some or all of the units can be selected according to actual needs to achieve the purpose of the solution of the embodiment.
In addition, functional units in the embodiments of the present application may be integrated into one processing unit, or each unit may exist alone physically, or two or more units are integrated into one unit. The integrated unit can be realized in a form of hardware, and can also be realized in a form of a software functional unit.
The integrated unit, if implemented in the form of a software functional unit and sold or used as a stand-alone product, may be stored in a computer readable storage medium. Based on such understanding, the technical solution of the present application may be substantially implemented or contributed to by the prior art, or all or part of the technical solution may be embodied in a software product, which is stored in a storage medium and includes instructions for causing a computer device (which may be a personal computer, a server, or a network device) to execute all or part of the steps of the method of the embodiments of the present application. And the aforementioned storage medium includes: a U-disk, a Read-Only Memory (ROM), a Random Access Memory (RAM), a removable hard disk, a magnetic or optical disk, and other various media capable of storing program codes.
The foregoing is only a preferred embodiment of the present application and it should be noted that those skilled in the art can make several improvements and modifications without departing from the principle of the present application, and these improvements and modifications should also be considered as the protection scope of the present application.

Claims (7)

1. A signal switching unit of an excimer laser of a lithography machine is characterized by comprising: the device comprises a gas discharge tube, a first TVS tube, a self-recovery fuse, a second TVS tube and a digital signal isolation chip; gas discharge tube, parallelly connected back one end of first TVS pipe with lithography machine's signal mouth is connected, the other end in proper order with self-resuming fuse, second TVS pipe, digital signal keep apart the chip and connect, digital signal keeps apart the chip and is connected with the industrial computer, wherein:
the gas discharge tube and the first TVS tube are used for limiting the voltage of an interference signal in a signal of the photoetching machine within a fixed range;
the self-recovery fuse is used for being disconnected when the current of the interference signal is too large, and recovering when the current is small;
the second TVS tube is used for limiting the voltage of the interference signal to a target voltage value;
the digital signal isolation chip is used for separating control signals between the signal transfer unit and the industrial personal computer.
2. The signal switching unit of an excimer laser of a lithography machine according to claim 1, wherein the signal port of the lithography machine comprises: IO port, serial port, GND.
3. The signal transfer unit of an excimer laser of claim 1, wherein the signal transfer unit further comprises an earth ground, and the first TVS tube and the gas discharge tube are connected to the earth ground for discharging an interference signal voltage to the earth ground, so as to limit the voltage within a fixed range.
4. The signal switching unit of an excimer laser of a lithography machine according to claim 1, wherein the digital signal isolation chip is further used for separating a power supply and a ground between the signal switching unit and the industrial personal computer.
5. The signal switching unit of the excimer laser of the lithography machine as claimed in claim 1, wherein the digital signal isolation chip comprises a signal port and an IO port which are connected, the signal port is connected with the second TVS tube, and the IO port is connected with the industrial personal computer.
6. The signal switching unit of the excimer laser of the lithography machine as claimed in claim 5, wherein the digital signal isolation chip further comprises a system ground and a GND connected, the system ground is connected with the second TVS tube, and the GND of the digital signal isolation chip is connected with the industrial personal computer.
7. The signal switching unit of the excimer laser of the lithography machine as claimed in claim 6, wherein the digital signal isolation chip further comprises a system power supply and a power supply which are connected, the system power supply supplies power to the signal switching unit, and the power supply of the digital signal isolation chip is connected with the industrial personal computer.
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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN202121317U (en) * 2011-06-20 2012-01-18 深圳市安信技术有限公司 Lightning protection device having overvoltage and overcurrent protection functions
DE102011050420B3 (en) * 2011-05-17 2012-11-08 Phoenix Contact Gmbh & Co. Kg Surge protection device for protection of electrical device against transient voltages, has temperature-dependent resistors arranged in series with current-controlled semiconductor components in a state thermally coupled to components
CN103236835A (en) * 2013-04-09 2013-08-07 浙江威星智能仪表股份有限公司 Signal isolation grid circuit
KR20160061021A (en) * 2014-11-21 2016-05-31 (주)용진일렉콤 Surge protective device
CN205692164U (en) * 2016-05-24 2016-11-16 深圳市赛盛技术股份有限公司 A kind of RS422 interface electromagnetic compatible design circuit
CN208190247U (en) * 2018-06-01 2018-12-04 上海音特电子有限公司 A kind of RS232 protection circuit
CN109638618A (en) * 2019-01-27 2019-04-16 北京科益虹源光电技术有限公司 A kind of multi-parameters sampling control system of excimer laser

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011050420B3 (en) * 2011-05-17 2012-11-08 Phoenix Contact Gmbh & Co. Kg Surge protection device for protection of electrical device against transient voltages, has temperature-dependent resistors arranged in series with current-controlled semiconductor components in a state thermally coupled to components
CN202121317U (en) * 2011-06-20 2012-01-18 深圳市安信技术有限公司 Lightning protection device having overvoltage and overcurrent protection functions
CN103236835A (en) * 2013-04-09 2013-08-07 浙江威星智能仪表股份有限公司 Signal isolation grid circuit
KR20160061021A (en) * 2014-11-21 2016-05-31 (주)용진일렉콤 Surge protective device
CN205692164U (en) * 2016-05-24 2016-11-16 深圳市赛盛技术股份有限公司 A kind of RS422 interface electromagnetic compatible design circuit
CN208190247U (en) * 2018-06-01 2018-12-04 上海音特电子有限公司 A kind of RS232 protection circuit
CN109638618A (en) * 2019-01-27 2019-04-16 北京科益虹源光电技术有限公司 A kind of multi-parameters sampling control system of excimer laser

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