CN113463046A - Coating material for enhancing wear resistance of water pump impeller and coating method - Google Patents
Coating material for enhancing wear resistance of water pump impeller and coating method Download PDFInfo
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- CN113463046A CN113463046A CN202110759043.8A CN202110759043A CN113463046A CN 113463046 A CN113463046 A CN 113463046A CN 202110759043 A CN202110759043 A CN 202110759043A CN 113463046 A CN113463046 A CN 113463046A
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- sputtering
- power supply
- coating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses: a coating material for enhancing the wear resistance of a water pump impeller and a coating method are characterized in that a vacuum pump is used for pumping a cavity to the vacuum degree of 3-6 x 10-3Pa, the bias voltage is adjusted to 175-5.5 Pa, a sample is subjected to sputtering cleaning under the condition of pure argon, the working air pressure in the cavity is 4.5-5.5Pa, a sputtering power supply is turned on, the power is adjusted to 650-750W, a Ti target is subjected to sputtering cleaning under the condition of pure argon, a sample baffle is opened, a Ti transition layer is deposited, then the sample baffle is closed, a throttle valve is opened, the argon in the cavity is discharged, and the working air pressure in the cavity is 0.45-0.55 Pa. The power is adjusted to 900W, the sample is sputtered and cleaned, after the film coating is finished, the sputtering power supply is closed, the target material baffle is closed, the sample is cooled to be below 40 ℃ under the vacuum condition, then the machine is shut down to deflate, the sample is taken out, the friction force on the surface of the impeller can be effectively improved, the damage tolerance of the equipment is prevented from being reduced, the equipment is prevented from aging, and the service life is prolonged.
Description
Technical Field
The invention is applied to the field of health care, and particularly relates to a coating material for enhancing the wear resistance of a water pump impeller and a coating method.
Background
The impeller of a water pump, especially a centrifugal pump, is a main part for transferring energy, and needs to be told to rotate to drive water flow to transmit when in use, because the told rotation is in contact with the water flow, the impeller is often abraded and also needs to bear the influence of cavitation erosion, so the impeller is also listed as a vulnerable part for the operation of the water pump, and often needs to be replaced, and the aging of equipment and the shortening of the practical service life are realized, and therefore, the coating material for enhancing the wear resistance of the water pump impeller and the coating method are provided.
Disclosure of Invention
The invention aims to provide a coating material for enhancing the wear resistance of a water pump impeller and a coating method, so as to solve the problems in the background technology.
In order to achieve the purpose, the invention provides the following technical scheme: a coating material for enhancing the wear resistance of a water pump impeller and a coating method are characterized in that; pumping the cavity to a vacuum degree of 3-6 x 10-3Pa by using a vacuum pump, heating the sample to 350-400 ℃ by using a heating power supply, pumping the cavity to a value below 3 x 10-3Pa by using a molecular pump, adding argon into the cavity to ensure that the air pressure is 0.5Pa, opening a bias power supply, adjusting the bias voltage to 175-225V, carrying out sputtering cleaning on the sample under the condition of pure argon, after the background vacuum reaches 3 x 10-3Pa, firstly adjusting the gas flow, adjusting the flow value of the argon to 45-55SCCM, ensuring that the working air pressure in the cavity is 4.5-5.5Pa, opening the sputtering power supply, adjusting the power to 650-750W, cleaning the Ti target under the condition of pure argon sputtering, then opening a sample baffle, starting to deposit a transition layer of Ti, then closing the sample baffle, opening a throttle valve, and discharging the argon in the cavity, when the pressure reaches 2.5X 10-3-3.5X 10-3Pa again, the flow values of argon and nitrogen are respectively adjusted to 36SCCM and 36SCCM, and the working pressure in the cavity is 0.45-0.55 Pa. Adjusting the power to 900W, carrying out sputtering cleaning on the sample, then opening a baffle of a sample table to start depositing a TiAlN coating for 120min, closing the baffle of the sample table after the time, turning off a sputtering power supply after the coating is finished, turning off a target baffle, cooling the sample to be below 40 ℃ under the vacuum condition, then shutting down to release gas, and taking out the sample.
Preferably, the time for sputter cleaning is five to ten minutes.
Preferably, the vacuum system comprises an equipment chamber, a mechanical pump, a molecular pump and a vacuum gauge.
Preferably, the circulating water system mainly comprises a circulating water machine and a circulating water pipe. The circulating water system is used for cooling the molecular pump. So that the device can maintain a normal working state and does not generate an overheating phenomenon.
Preferably, the sputtering device comprises 4 sputtering target positions, two sets of direct current inversion sputtering power supplies, one set of radio frequency sputtering power supply and one set of intermediate frequency sputtering power supply.
Compared with the prior art, the invention has the beneficial effects that: can effectual improvement impeller surface frictional force, prevent to reduce the endurance of equipment simultaneously, prevent that equipment from ageing, improve life.
Detailed Description
In order that the above objects, features and advantages of the present invention can be more clearly understood, the present invention will be described in further detail with reference to specific embodiments. It should be noted that the embodiments and features of the embodiments of the present application may be combined with each other without conflict.
In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention, however, the present invention may be practiced otherwise than as specifically described herein, and thus the scope of the present invention is not limited by the specific embodiments disclosed below.
A coating material and a coating method for enhancing the wear resistance of a water pump impeller according to claims 1 to 5, wherein; pumping the cavity to a vacuum degree of 3-6 x 10-3Pa by using a vacuum pump, heating the sample to 350-400 ℃ by using a heating power supply, pumping the cavity to a value below 3 x 10-3Pa by using a molecular pump, adding argon into the cavity to ensure that the air pressure is 0.5Pa, opening a bias power supply, adjusting the bias voltage to 175-225V, carrying out sputtering cleaning on the sample under the condition of pure argon, after the background vacuum reaches 3 x 10-3Pa, firstly adjusting the gas flow, adjusting the flow value of the argon to 45-55SCCM, ensuring that the working air pressure in the cavity is 4.5-5.5Pa, opening the sputtering power supply, adjusting the power to 650-750W, cleaning the Ti target under the condition of pure argon sputtering, then opening a sample baffle, starting to deposit a transition layer of Ti, then closing the sample baffle, opening a throttle valve, and discharging the argon in the cavity, when the pressure reaches 2.5X 10-3-3.5X 10-3Pa again, the flow values of argon and nitrogen are respectively adjusted to 36SCCM and 36SCCM, and the working pressure in the cavity is 0.45-0.55 Pa. Adjusting the power to 900W, carrying out sputtering cleaning on the sample, then opening a baffle of a sample table to start depositing a TiAlN coating for 120min, closing the baffle of the sample table after the time, turning off a sputtering power supply after the coating is finished, turning off a target baffle, cooling the sample to be below 40 ℃ under the vacuum condition, then shutting down to release gas, and taking out the sample.
Specifically, the time for the sputter cleaning is five to ten minutes.
Specifically, the vacuum system includes an equipment chamber, a mechanical pump, a molecular pump, and a vacuum gauge.
Under the condition that the sealing performance of the equipment cavity is good, the cavity is vacuumized to be below 5Pa by using a mechanical pump, then the cavity is vacuumized to be in the required vacuum degree by using a molecular pump, the mechanical pump is used for assisting the molecular pump to operate at the moment, and the vacuum gauge is used for detecting the vacuum degree of the cavity.
Specifically, the circulating water system mainly comprises a circulating water machine and a circulating water pipe. The circulating water system is used for cooling the molecular pump.
The circulating water system is used for cooling the molecular pump to maintain the molecular pump in a normal working state without overheating.
Specifically, the sputtering device comprises 4 sputtering target positions, two sets of direct current inversion sputtering power supplies, one set of radio frequency sputtering power supply and one set of intermediate frequency sputtering power supply.
When the finished coating is subjected to a film-substrate binding force test, when the scratch loading force is 90N, the coating does not fall off on the scratch appearance, and the binding force of the coating is more than 90N. The indentation loading force is respectively 50N and 100N, the coating does not crack and fall off when the indentation loading force is 50N, the edge of the coating cracks when the indentation loading force is 100N, and the falling off phenomenon occurs in a few areas, which indicates that the film-based binding force is between 90 and 100N.
In the description of the present specification, the terms "connect", "mount", "fix", and the like are to be understood in a broad sense, for example, "connect" may be a fixed connection, a detachable connection, or an integral connection; may be directly connected or indirectly connected through an intermediate. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the description herein, the description of the terms "one embodiment," "some embodiments," "specific embodiments," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
The above is only a preferred embodiment of the present invention, and is not intended to limit the present invention, and various modifications and changes will occur to those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (5)
1. A coating material for enhancing the wear resistance of a water pump impeller and a coating method are characterized in that; pumping the cavity to a vacuum degree of 3-6 x 10-3Pa by using a vacuum pump, heating the sample to 350-400 ℃ by using a heating power supply, pumping the cavity to a value below 3 x 10-3Pa by using a molecular pump, adding argon into the cavity to ensure that the air pressure is 0.5Pa, opening a bias power supply, adjusting the bias voltage to 175-225V, carrying out sputtering cleaning on the sample under the condition of pure argon, after the background vacuum reaches 3 x 10-3Pa, firstly adjusting the gas flow, adjusting the flow value of the argon to 45-55SCCM, ensuring that the working air pressure in the cavity is 4.5-5.5Pa, opening the sputtering power supply, adjusting the power to 650-750W, cleaning the Ti target under the condition of pure argon sputtering, then opening a sample baffle, starting to deposit a transition layer of Ti, then closing the sample baffle, opening a throttle valve, and discharging the argon in the cavity, when the pressure reaches 2.5X 10-3-3.5X 10-3Pa again, the flow values of argon and nitrogen are respectively adjusted to 36SCCM and 36SCCM, and the working pressure in the cavity is 0.45-0.55 Pa. Adjusting the power to 900W, carrying out sputtering cleaning on the sample, then opening a baffle of a sample table to start depositing a TiAlN coating for 120min, closing the baffle of the sample table after the time, turning off a sputtering power supply after the coating is finished, turning off a target baffle, cooling the sample to be below 40 ℃ under the vacuum condition, then shutting down to release gas, and taking out the sample.
2. The coating material and the coating method for enhancing the wear resistance of the water pump impeller according to claim 1, wherein; the time for sputter cleaning is five to ten minutes.
3. The coating material and the coating method for enhancing the wear resistance of the water pump impeller according to claim 1, wherein; the vacuum system comprises an equipment cavity, a mechanical pump, a molecular pump and a vacuum gauge.
4. The coating material and the coating method for enhancing the wear resistance of the water pump impeller according to claim 1, wherein; the circulating water system mainly comprises a circulating water machine and a circulating water pipe. The circulating water system is used for cooling the molecular pump.
5. The coating material and the coating method for enhancing the wear resistance of the water pump impeller according to claim 1, wherein; the sputtering device comprises 4 sputtering target positions, two sets of direct current inversion sputtering power supplies, a set of radio frequency sputtering power supply and a set of intermediate frequency sputtering power supply.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110759043.8A CN113463046A (en) | 2021-07-05 | 2021-07-05 | Coating material for enhancing wear resistance of water pump impeller and coating method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110759043.8A CN113463046A (en) | 2021-07-05 | 2021-07-05 | Coating material for enhancing wear resistance of water pump impeller and coating method |
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| Publication Number | Publication Date |
|---|---|
| CN113463046A true CN113463046A (en) | 2021-10-01 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110759043.8A Pending CN113463046A (en) | 2021-07-05 | 2021-07-05 | Coating material for enhancing wear resistance of water pump impeller and coating method |
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0558061A1 (en) * | 1992-02-27 | 1993-09-01 | Hauzer Holding B.V. | Improvements in physical vapour deposition processes |
| CN101798679A (en) * | 2010-03-31 | 2010-08-11 | 北京科技大学 | Preparation method of composite coating used for gas bearing |
| CN102345099A (en) * | 2011-09-15 | 2012-02-08 | 西北工业大学 | Preparation method of multilayer pitting corrosion-resistant coating of steam turbine blade material surface |
| CN103071819A (en) * | 2012-12-31 | 2013-05-01 | 四川大学 | Ti/TiN/MaN composite coating on surface of cutter and preparation method of Ti/TiN/MaN composite coating |
| CN103161733A (en) * | 2013-03-15 | 2013-06-19 | 鲁东大学 | Ti / TiCrN nanometer multilayer coating impeller and preparation method thereof |
| CN103334082A (en) * | 2013-06-09 | 2013-10-02 | 华南理工大学 | Ti/TiN/TiAlN composite coating on surface of cutting tool material and preparation method of Ti/TiN/TiAlN composite coating |
| CN104928638A (en) * | 2015-05-21 | 2015-09-23 | 广东工业大学 | AlCrSiN-based multilayer nanometer composite cutter coating layer and preparation method thereof |
| CN108531874A (en) * | 2018-03-10 | 2018-09-14 | 石河子大学 | A kind of preparation method of CrAlN/TiAlN nanometer multi-layer horniness coatings |
-
2021
- 2021-07-05 CN CN202110759043.8A patent/CN113463046A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0558061A1 (en) * | 1992-02-27 | 1993-09-01 | Hauzer Holding B.V. | Improvements in physical vapour deposition processes |
| CN101798679A (en) * | 2010-03-31 | 2010-08-11 | 北京科技大学 | Preparation method of composite coating used for gas bearing |
| CN102345099A (en) * | 2011-09-15 | 2012-02-08 | 西北工业大学 | Preparation method of multilayer pitting corrosion-resistant coating of steam turbine blade material surface |
| CN103071819A (en) * | 2012-12-31 | 2013-05-01 | 四川大学 | Ti/TiN/MaN composite coating on surface of cutter and preparation method of Ti/TiN/MaN composite coating |
| CN103161733A (en) * | 2013-03-15 | 2013-06-19 | 鲁东大学 | Ti / TiCrN nanometer multilayer coating impeller and preparation method thereof |
| CN103334082A (en) * | 2013-06-09 | 2013-10-02 | 华南理工大学 | Ti/TiN/TiAlN composite coating on surface of cutting tool material and preparation method of Ti/TiN/TiAlN composite coating |
| CN104928638A (en) * | 2015-05-21 | 2015-09-23 | 广东工业大学 | AlCrSiN-based multilayer nanometer composite cutter coating layer and preparation method thereof |
| CN108531874A (en) * | 2018-03-10 | 2018-09-14 | 石河子大学 | A kind of preparation method of CrAlN/TiAlN nanometer multi-layer horniness coatings |
Non-Patent Citations (2)
| Title |
|---|
| 卢龙等: "40Cr钢表面离子镀TiAlN涂层的膜基结合力研究", 《铸造技术》, no. 12, 18 December 2015 (2015-12-18), pages 2889 - 2891 * |
| 袁建鹏等: "Al含量对多弧离子镀Ti_(1-x)Al_xN涂层微观结构及性能的影响", 《有色金属》, no. 04, 15 November 2009 (2009-11-15), pages 26 - 29 * |
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Application publication date: 20211001 |
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