CN113441448B - Post-treatment device and post-treatment method for residual alkali metal - Google Patents
Post-treatment device and post-treatment method for residual alkali metal Download PDFInfo
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- CN113441448B CN113441448B CN202010229912.1A CN202010229912A CN113441448B CN 113441448 B CN113441448 B CN 113441448B CN 202010229912 A CN202010229912 A CN 202010229912A CN 113441448 B CN113441448 B CN 113441448B
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- 150000001340 alkali metals Chemical class 0.000 title claims abstract description 29
- 229910052783 alkali metal Inorganic materials 0.000 title claims abstract description 28
- 238000000034 method Methods 0.000 title claims abstract description 14
- 239000007788 liquid Substances 0.000 claims abstract description 42
- 238000005507 spraying Methods 0.000 claims abstract description 25
- 238000012545 processing Methods 0.000 claims abstract description 22
- 238000005086 pumping Methods 0.000 claims abstract description 19
- 239000007921 spray Substances 0.000 claims abstract description 14
- 238000004065 wastewater treatment Methods 0.000 claims abstract description 12
- 239000002351 wastewater Substances 0.000 claims abstract description 5
- 239000007789 gas Substances 0.000 claims description 64
- 239000002699 waste material Substances 0.000 claims description 23
- 239000000243 solution Substances 0.000 claims description 11
- 239000001257 hydrogen Substances 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 238000002347 injection Methods 0.000 claims description 10
- 239000007924 injection Substances 0.000 claims description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 9
- 238000007789 sealing Methods 0.000 claims description 8
- 238000007599 discharging Methods 0.000 claims description 5
- 206010061218 Inflammation Diseases 0.000 claims description 3
- 230000004054 inflammatory process Effects 0.000 claims description 3
- 238000004891 communication Methods 0.000 claims description 2
- 238000000889 atomisation Methods 0.000 abstract description 4
- 238000002485 combustion reaction Methods 0.000 abstract 1
- 230000001788 irregular Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000003517 fume Substances 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/20—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
- B08B9/28—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking
- B08B9/34—Arrangements of conduits or nozzles
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Treating Waste Gases (AREA)
Abstract
The invention discloses a residual alkali metal post-treatment device and a post-treatment method, wherein the post-treatment device comprises a tank body, a treatment cavity is formed in the tank body, and a slope support plate is fixed in the treatment cavity; the vacuum maintaining system comprises a vacuumizing pipeline with one end communicated with the processing cavity and a vacuum generator connected with the other end of the vacuumizing pipeline; the liquid spraying system comprises a spraying pipe fixed on the tank body, a spraying pipe stop valve assembled on the spraying pipe and an atomization spray head arranged at the end part of the spraying pipe; the tail gas treatment system comprises a tail gas treatment pipeline communicated with the treatment cavity and a tail gas pipe stop valve assembled on the tail gas treatment pipeline, wherein a tail gas combustion part is formed at a discharge outlet of the tail gas treatment pipeline; the waste water treatment system comprises a waste water treatment pipeline communicated with the treatment cavity and a waste water stop valve assembled on the waste water treatment pipeline; the tank body is also fixed with a pumping and inflating interface communicated with the processing cavity.
Description
Technical Field
The invention relates to the technical field of alkali metal, in particular to a residual alkali metal post-treatment device and a post-treatment method.
Background
The alkali metal is generally active in nature, if the residual active alkali metal is not treated improperly after the experiment, inflammable and explosive gas can be generated or a large amount of heat can be generated, a small amount of the residual alkali metal is left in a common experiment instrument (such as a beaker), and the beaker is placed in an ice bath environment and is treated by using a post-treatment solution in a fume hood.
However, the alkali metal attached to the irregular experimental instrument cannot be treated in the fume hood, the first step cannot be treated cleanly, the second step is more in inflammable gas generated, and potential safety hazards exist, so that a residual alkali metal post-treatment device is needed to treat the residual alkali metal on the irregular experimental equipment in the experimental process.
Disclosure of Invention
The invention aims to solve the problem that the residual alkali metal on irregular experimental equipment in the prior art is inconvenient to treat, and provides a residual alkali metal post-treatment device.
Another object of the present invention is to provide a post-treatment method of the post-treatment device.
The technical scheme adopted for realizing the purpose of the invention is as follows:
A residual alkali metal post-treatment device, includes the inside jar body that forms the treatment chamber, for the liquid spray system of treatment fluid is provided to the treatment chamber, discharge the waste water treatment system of treatment intracavity waste water, and discharge the tail gas treatment system of treatment intracavity tail gas and burning, wherein:
The processing cavity is internally fixed with a slope supporting plate for bearing an experimental instrument to be processed, the side wall of the tank body is provided with an air pumping and inflating interface communicated with the processing cavity, and the air pumping and inflating interface is used for selectively communicating a vacuum maintaining system and a buffer gas injection system;
the liquid spraying system comprises a spraying pipe fixed on the tank body and an atomizing nozzle which is arranged at the end part of the spraying pipe and is positioned above the slope supporting plate;
the tail gas treatment system comprises a tail gas treatment pipeline communicated with the treatment cavity and a tail gas inflammation part fixed on a discharge port of the tail gas treatment pipeline;
the wastewater treatment system includes a waste treatment conduit in communication with the treatment chamber.
In the above technical scheme, a shower pipe stop valve is mounted on the shower pipe, and a waste liquid stop valve is mounted on the waste liquid treatment pipeline and mounted on the waste liquid treatment pipeline.
In the technical scheme, the slope supporting plate has an inclination of 30-60 degrees.
In the above technical solution, the spray port of the atomizer is a slit structure facing vertically downward.
In the above technical scheme, the tank body comprises a tank body and a cover body which is connected to the opening at the top of the tank body in a sealing and detachable manner, and the slope support plate is fixed on the inner wall of the lower part of the tank body.
In the technical scheme, a sealing gasket is arranged at the connecting position of the tank body and the cover body.
In the above technical scheme, the tail gas treatment pipeline is a bent pipe.
In the above technical scheme, the return bend includes vertical section and horizontal segment, vertical section is fixed in on the open-top of lid, the tail gas pipe stop valve assemble in on the horizontal segment.
In the above technical solution, a discharge port is formed at the lowest end of the slope support plate, and the waste liquid treatment pipe is communicated with the discharge port.
In the above technical scheme, the spray pipe and the atomizing nozzle are of an integrated tubular structure, the end part of the tubular structure is sealed, and a vertical gap is formed on the lower pipe wall of the tubular structure, which is close to the end part, for atomizing and spraying the treatment liquid.
In another aspect of the present invention, the post-treatment method of the residual alkali metal post-treatment device includes the steps of:
step 1, after a tank body is opened, placing an experimental instrument to be treated on a slope supporting plate, and sealing the tank body;
Step2, the pumping and inflating interface is communicated with a vacuum maintaining system, air in the processing cavity is pumped through the vacuum maintaining system, and when the vacuum degree in the processing cavity reaches the Pa level, the vacuum maintaining system is closed;
step 3, the pumping and inflating interface is communicated with the buffer gas injection system, buffer gas is inflated through the pumping and inflating interface, when the inside of the treatment cavity reaches one atmosphere, the flow rate of the buffer gas is kept according to the process, meanwhile, the tail gas pipe stop valve is sequentially opened, the spray pipe stop valve is opened, different post-treatment solutions are sprayed into the treatment cavity through the spray pipe, and at the moment, hydrogen generated by reaction in the treatment cavity reaches the tail gas burning part through the tail gas treatment pipeline and is burnt;
and step 4, after the post-treatment is finished, closing the buffer gas injection system, opening the waste liquid stop valve to enable the waste liquid in the treatment cavity to flow out, and carrying out centralized treatment on the waste liquid.
Compared with the prior art, the invention has the beneficial effects that:
1. This residual alkali metal's aftertreatment device is through punching into buffer gas and aftertreatment solution into the main cavity, has guaranteed when handling alkali metal residue, can safe and reliable discharge the burning with the hydrogen safe and reliable who produces in the handling process, has avoided the possibility of emergence accident because of the heat is lighted hydrogen in the reaction when the aftertreatment, safe and effective completion aftertreatment.
2. The device has the advantages of simple structure, low production cost, convenient popularization and application, and wide application range, and is suitable for experimental instruments to be treated with different structures and different sizes.
3. In this device, wait to handle experimental apparatus can fully contact with atomizing aftertreatment liquid, does not keep the dead angle, and the processing cleanliness factor is high.
Drawings
Fig. 1 is a schematic diagram of the structure of the present invention.
Fig. 2 is a schematic structural view of the atomizer.
In the figure: 1-a tank body; 2-a waste liquid treatment pipeline; 3-slope support plates; 4-a tail gas treatment pipeline; 5-spraying pipes; 6-tail gas flaming part; 7-pumping and inflating interfaces; 8-a spray pipe stop valve; 9-a waste liquid stop valve; 10-a tail gas pipe stop valve; 11-cover body, 12-atomizer.
Detailed Description
The invention is described in further detail below with reference to the drawings and the specific examples. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the invention.
Example 1
A residual alkali metal post-treatment device comprising a tank 1, a liquid spray system for supplying a treatment liquid, a wastewater treatment system for discharging wastewater, and an exhaust gas treatment system for treating exhaust gas, wherein:
A processing cavity is formed in the tank body 1, a slope supporting plate 3 for bearing an experimental instrument to be processed is fixed in the processing cavity, a pumping and inflating interface 7 communicated with the processing cavity is arranged on the side wall of the tank body 1, and the pumping and inflating interface 7 is used for selectively communicating a vacuum maintaining system and a buffer gas injection system;
the liquid spraying system comprises a spraying pipe 5 fixed on the tank body 1, a spraying pipe stop valve 8 assembled on the spraying pipe 5 and an atomizing nozzle 12 arranged at the end part of the spraying pipe 5 and positioned above the slope support plate 3;
The exhaust gas treatment system comprises an exhaust gas treatment pipeline 4 communicated with the treatment cavity and an exhaust gas pipe stop valve 10 assembled on the exhaust gas treatment pipeline 4, wherein an exhaust port of the exhaust gas treatment pipeline 4 forms an exhaust gas inflammation part 6;
The waste water treatment system comprises a waste water treatment pipeline 2 communicated with the treatment cavity and a waste water stop valve 9 arranged on the waste water treatment pipeline 2;
The tank body 1 is also fixedly provided with an air pumping and inflating interface 7 communicated with the processing cavity.
The slope support plate 3 is used for bearing experimental instruments to be treated, the vacuum holding system is used for vacuumizing the treatment cavity, the liquid spraying system is used for spraying vaporific treatment liquid, the tail gas treatment system is used for discharging hydrogen and burning the hydrogen, the hydrogen is burnt at the tail gas burning part, the tail gas burning part can be a burner assembled on the discharge port, the burner is of a general structure and is not repeated, and the waste water treatment system is used for discharging treated waste liquid.
The slope supporting plate 3 and the inner side wall of the tank body 1 form a support, so that the experimental instrument to be processed is suspended in the processing cavity, each part of the experimental instrument is ensured to be fully contacted with the processing liquid in an atomized state sprayed by the atomizing nozzle 12, and no dead angle is left in processing. In addition, the treatment liquid flows down along the slope support plate 3 and does not remain in the treatment chamber.
The experimental instrument to be treated is convenient to place, and the slope supporting plate 3 has an inclination of 30-60 degrees. The device is suitable for experimental instruments with different sizes and shapes, and has wide application range.
The vacuum maintaining system comprises a vacuumizing pipeline communicated with the processing cavity at one end and a vacuum generator connected with the other end of the vacuumizing pipeline.
In order to display the vacuum degree in the processing cavity and the pressure of buffer gas, a pressure gauge is arranged on the tank body 1.
Example 2
The post-treatment method of the residual alkali metal post-treatment device described in embodiment 1, comprising the steps of:
step1, placing an experimental instrument to be treated on a slope support plate 3;
step2, the pumping and inflating interface 7 is communicated with a vacuum maintaining system, the vacuum maintaining system pumps air in the processing cavity, and when the vacuum degree in the processing cavity reaches the Pa level, the vacuum maintaining system is closed;
Step 3, the pumping and inflating interface 7 is communicated with a buffer gas injection system, buffer gas is inflated through the pumping and inflating interface 7, when the buffer gas reaches one atmosphere pressure, the buffer flow speed is kept according to the process, meanwhile, the tail gas pipe stop valve 9 is sequentially opened, the spray pipe stop valve 8 is opened, the after-treatment solution is sprayed into the treatment cavity through the spray pipe 5, a large amount of hydrogen is generated by reaction in the treatment cavity, the hydrogen reaches the tail gas burning part 6 through the tail gas treatment pipeline 4, and the hydrogen is ignited;
and step 4, after the post-treatment is finished, closing the buffer gas injection system, opening the waste liquid stop valve 9 to enable the waste liquid in the treatment cavity to flow out, and carrying out centralized treatment on the waste liquid.
The buffer gas is inert gas, and argon is the main material. The post-treatment solution adopts acid solutions with different concentrations. The concentration of the acid solution is adjusted according to the process requirement. The amount of the post-treatment solution introduced or the post-treatment time may be determined in advance before the treatment, and whether the gas generation is continued or not may be observed, and whether the burner burns or not may be observed to determine whether the post-treatment is ended or not.
Example 3
In order to uniformly atomize the post-treatment liquid sprayed from the atomizer 12, the spraying opening of the atomizer 12 has a vertically downward slit structure. The aftertreatment liquid can be sprayed to the cavity in an atomization state rapidly and uniformly, so that the whole experimental instrument to be treated can be fully contacted with the aftertreatment liquid, and the treatment cleanliness is high.
In order to facilitate placement and removal of experimental instruments to be treated, the tank body 1 comprises a tank body and a cover body 11 which is connected to the opening of the top of the tank body in a sealing and detachable manner, and the slope support plate 3 is fixed to the lower portion of the tank body 1.
The sealing gasket is arranged at the connecting position of the tank body and the cover body 11, the sealing degree is guaranteed, the tank body and the cover body are connected in a threaded connection or a buckle connection mode, when the experimental instrument to be treated is required to be placed or taken out, the cover body 11 is opened, the experimental instrument to be treated is placed on the slope support plate 3, or after the experimental instrument to be treated is taken down from the slope support plate 3, the cover body 11 is covered.
In order to avoid direct exhaust of the tail gas, the tail gas treatment pipeline 4 is a bent pipe. The structure of the bent pipe can control the flow velocity of the tail gas, and the safety coefficient of the device is improved.
Still further, the elbow includes a vertical section fixed to the top opening of the cover 11 and a horizontal section to which the exhaust pipe shut-off valve 10 is fitted.
In order to ensure complete discharge of the treatment liquid, the lowermost end of the slope support plate 3 is formed with a discharge port, with which the waste liquid treatment pipe 2 communicates.
The pumping and inflating interface 7 is arranged on the side wall of the tank body 1, so that the injection of buffer gas is facilitated.
In order to improve the atomization effect, the spray pipe 5 and the atomization nozzle 12 are of an integrated tubular structure, the end part of the tubular structure is sealed, and a vertical gap is formed on the lower pipe wall of the tubular structure, which is close to the end part, for atomizing and spraying the treatment liquid. The cost is saved in the realization of being convenient for, for the atomizer of structure complicacy, the shower nozzle of this structure is more suitable for alkali metal treatment environment, effectively increase of service life.
Spatially relative terms, such as "upper," "lower," "left," "right," and the like, may be used in the embodiments for ease of description to describe one element or feature's relationship to another element or feature's illustrated in the figures. It will be understood that the spatial terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as "under" other elements or features would then be oriented "over" the other elements or features. Thus, the exemplary term "lower" may encompass both an upper and lower orientation. The device may be otherwise positioned (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.
Moreover, relational terms such as "first" and "second", and the like, may be used solely to distinguish one element from another element having the same name, without necessarily requiring or implying any actual such relationship or order between such elements.
The foregoing is merely a preferred embodiment of the present invention and it should be noted that modifications and adaptations to those skilled in the art may be made without departing from the principles of the present invention, which are intended to be comprehended within the scope of the present invention.
Claims (9)
1. A residual alkali metal post-treatment device, which is characterized by comprising a tank body with a treatment cavity formed therein, a liquid spraying system for providing treatment liquid for the treatment cavity, a wastewater treatment system for discharging wastewater in the treatment cavity, and a tail gas treatment system for discharging tail gas in the treatment cavity and burning, wherein:
The processing cavity is internally fixed with a slope supporting plate for bearing an experimental instrument to be processed, the side wall of the tank body is provided with an air pumping and inflating interface communicated with the processing cavity, and the air pumping and inflating interface is used for selectively communicating a vacuum maintaining system and a buffer gas injection system;
The liquid spraying system comprises a spraying pipe fixed on the tank body and an atomizing nozzle arranged at the end part of the spraying pipe and positioned above the slope support plate, and the spraying outlet of the atomizing nozzle is of a vertically downward slit structure;
The spray pipe and the atomizing nozzle are of an integrated tubular structure, the end part of the tubular structure is sealed, and a vertical gap is formed on the lower pipe wall of the tubular structure, which is close to the end part, for atomizing and spraying treatment liquid;
the tail gas treatment system comprises a tail gas treatment pipeline communicated with the treatment cavity and a tail gas inflammation part fixed on a discharge port of the tail gas treatment pipeline;
the wastewater treatment system includes a waste treatment conduit in communication with the treatment chamber.
2. The residual alkali metal post-treatment device according to claim 1, wherein a shower pipe shutoff valve is provided on the shower pipe, and a waste liquid shutoff valve is provided on the waste liquid treatment pipe and on the waste liquid treatment pipe.
3. The residual alkali metal post-treatment device according to claim 1, wherein the slope support plate has an inclination of 30-60 °.
4. The residual alkali metal post-treatment device according to claim 1, wherein the tank body comprises a tank body and a cover body which is connected to the opening at the top of the tank body in a sealing and detachable manner, and the slope support plate is fixed on the inner wall of the lower part of the tank body.
5. The residual alkali metal post-treatment device according to claim 4, wherein a gasket is provided at a connection position of the tank body and the cover body.
6. The residual alkali metal aftertreatment device of claim 5, wherein the off-gas treatment conduit is an elbow.
7. The residual alkali metal aftertreatment device of claim 6, wherein the elbow includes a vertical section and a horizontal section, the vertical section being secured to the top opening of the cover, and an off-gas pipe shut-off valve being fitted to the horizontal section.
8. The residual alkali metal post-treatment device according to claim 1, wherein a discharge port is formed at a lowermost end of the slope support plate, and the waste liquid treatment pipe communicates with the discharge port.
9. The post-treatment method of the residual alkali metal post-treatment device according to any one of claims 1 to 8, comprising the steps of:
step 1, after a tank body is opened, placing an experimental instrument to be treated on a slope supporting plate, and sealing the tank body;
Step2, the pumping and inflating interface is communicated with a vacuum maintaining system, air in the processing cavity is pumped through the vacuum maintaining system, and when the vacuum degree in the processing cavity reaches the Pa level, the vacuum maintaining system is closed;
step 3, the pumping and inflating interface is communicated with the buffer gas injection system, buffer gas is inflated through the pumping and inflating interface, when the inside of the treatment cavity reaches one atmosphere, the flow rate of the buffer gas is kept according to the process, meanwhile, the tail gas pipe stop valve is sequentially opened, the spray pipe stop valve is opened, different post-treatment solutions are sprayed into the treatment cavity through the spray pipe, and at the moment, hydrogen generated by reaction in the treatment cavity reaches the tail gas burning part through the tail gas treatment pipeline and is burnt;
and step 4, after the post-treatment is finished, closing the buffer gas injection system, opening the waste liquid stop valve to enable the waste liquid in the treatment cavity to flow out, and carrying out centralized treatment on the waste liquid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010229912.1A CN113441448B (en) | 2020-03-27 | 2020-03-27 | Post-treatment device and post-treatment method for residual alkali metal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010229912.1A CN113441448B (en) | 2020-03-27 | 2020-03-27 | Post-treatment device and post-treatment method for residual alkali metal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN113441448A CN113441448A (en) | 2021-09-28 |
| CN113441448B true CN113441448B (en) | 2024-04-19 |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN113441448A (en) | 2021-09-28 |
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