CN113429586A - Radiation degradation resistant chitosan solution and radiation sterilization method thereof - Google Patents
Radiation degradation resistant chitosan solution and radiation sterilization method thereof Download PDFInfo
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- CN113429586A CN113429586A CN202110798236.4A CN202110798236A CN113429586A CN 113429586 A CN113429586 A CN 113429586A CN 202110798236 A CN202110798236 A CN 202110798236A CN 113429586 A CN113429586 A CN 113429586A
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
- C08J3/03—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in aqueous media
- C08J3/07—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in aqueous media from polymer solutions
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
- A61L2/02—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using physical phenomena
- A61L2/08—Radiation
- A61L2/087—Particle radiation, e.g. electron-beam, alpha or beta radiation
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08J2305/00—Characterised by the use of polysaccharides or of their derivatives not provided for in groups C08J2301/00 or C08J2303/00
- C08J2305/08—Chitin; Chondroitin sulfate; Hyaluronic acid; Derivatives thereof
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/05—Alcohols; Metal alcoholates
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/05—Alcohols; Metal alcoholates
- C08K5/053—Polyhydroxylic alcohols
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Abstract
The invention relates to chitosan, in particular to a chitosan solution resistant to radiation degradation and a radiation sterilization method thereof, belonging to the technical field of biological material processing. The invention discloses an irradiation degradation resistant chitosan solution, which is characterized by comprising the following components in percentage by mass: 0.5 to 2 percent of chitosan; glacial acetic acid 0.25% -1%; 4% -6% of glycerol; 3% -4% of n-butyl alcohol; 0.6 to 1 percent of propylene glycol; the balance of water; according to the invention, glycerol, n-butanol and propylene glycol are added into the chitosan solution, so that the degradation of chitosan in the irradiation process of the chitosan solution can be reduced, the stability of the chitosan solution is improved, and the film-forming bacteria-resistant effect of the chitosan solution is improved.
Description
Technical Field
The invention relates to a radiation degradation resistant chitosan solution and a radiation sterilization method thereof, belonging to the technical field of biological material processing.
Background
Chitosan is a chitin deacetylation hormone product widely found in shrimp, crab and insect surgery. The chitosan is used as a natural polymer material, is widely applied to the field of medical materials, and can be used for manufacturing chitosan films and chitosan stents. The chitosan can also be dissolved in an acid solution to prepare the chitosan antibacterial film-forming spray. The existing sterilization of medical materials adopts damp and hot steam sterilization and irradiation sterilization, which can cause the molecular weight of chitosan to be reduced. After the chitosan is sterilized by cobalt-60, the beta- (1 → 4) ether bond on the chitosan main chain is initiated to break, so that the viscosity of the chitosan is greatly reduced, and the film forming property and the antibacterial property of the chitosan solution are influenced.
Chinese patent CN1563106A discloses a method for preparing small molecular weight or water-soluble sugar by radiation, Chinese patent ZL201710883206.7 discloses a method for preparing low molecular weight chitosan, the prior art only discloses a method for preparing low molecular weight chitosan by radiation, and no technology for reducing radiation degradation of liquid chitosan exists at present. Therefore, there is a need for a method of radiation sterilization that can perform effective sterilization and slow down the degradation of chitosan solutions.
Disclosure of Invention
In order to solve the problems, the invention provides the chitosan solution with irradiation degradation resistance, so that the degradation of the chitosan solution is slowed down, and the irradiation sterilization effect is improved.
The degradation of chitosan is induced by the irradiation of chitosan solution in air, and the inventors have surprisingly found that the degradation of chitosan can be reduced by adding glycerol, n-butanol and propylene glycol to the chitosan solution.
The invention provides a chitosan solution resistant to irradiation degradation, which is characterized by comprising the following components in percentage by mass:
0.5 to 2 percent of chitosan;
glacial acetic acid 0.25% -1%;
4% -6% of glycerol;
3% -4% of n-butyl alcohol;
0.6 to 1 percent of propylene glycol;
the balance of water;
preferably, the chitosan solution contains the following components:
0.9 to 1.6 percent of chitosan;
glacial acetic acid 0.45% -0.8%;
4.5% -5.3% of glycerin;
3.2 to 3.7 percent of n-butyl alcohol;
0.73% -0.92% of propylene glycol;
the balance of water;
preferably, the chitosan solution contains the following components:
1% of chitosan;
glacial acetic acid 0.5%;
5% of glycerol;
3.5 percent of n-butyl alcohol;
0.8 percent of propylene glycol;
the balance of water;
preferably, the viscosity-average molecular weight of the chitosan is 110-423 KDa.
Preferably, the viscosity average molecular weight of the chitosan is 231 KDa.
Preferably, the deacetylation degree of the chitosan is more than or equal to 85 percent;
preferably, the mass ratio of the glycerol to the chitosan to the propylene glycol is (40-60): (30-40): (6-10).
Preferably, the mass ratio of the glycerol to the chitosan to the propylene glycol is (45-53): (32-37): (7.3-9.2).
Preferably, the mass ratio of the glycerol to the chitosan to the propylene glycol is 50: 35: 8.
the invention also provides an irradiation sterilization method of the irradiation degradation resistant chitosan solution, which comprises the following steps:
1) packaging the chitosan solution resistant to radiation degradation;
2) and (5) performing irradiation sterilization.
Preferably, the irradiation in step 2) is 60 Co-gamma rays.
Preferably, the irradiation dose in step 2) is 3 KGy to 30 KGy.
Advantageous effects
According to the invention, glycerol, n-butanol and propylene glycol are added into the chitosan solution resistant to radiation degradation, so that the degradation of chitosan in the radiation process of the chitosan solution can be reduced, the stability of the chitosan solution is improved, and the film-forming and bacterium-inhibiting effect of the chitosan solution is improved.
Detailed Description
The present invention will be further described with reference to the following specific examples, but the present invention is not limited to these examples.
The reagents used in the following examples were purchased commercially;
and (3) chitosan: the deacetylation degree of the chemical reagent company Aladdin is more than or equal to 85 percent, and the viscosity-average molecular weights are 110KDa, 231KDa and 423KDa respectively.
Example 1:
preparing a chitosan solution resistant to radiation degradation:
adding 5g of chitosan with the viscosity-average molecular weight of 110KDa and the deacetylation degree of more than or equal to 90% into 500g of purified water, adding 2.5g of glacial acetic acid, stirring to fully dissolve the chitosan, continuously stirring, adding 40g of glycerol, 30g of n-butanol and 6g of propylene glycol, keeping the volume constant to 1L, and stirring for 10 minutes until the solution is uniformly mixed;
sterilizing the chitosan solution resistant to radiation degradation:
1) filling the mixed solution into a chitosan solution;
2) the chitosan solution is irradiated by 60Co gamma-ray at room temperature (Guangzhou Huada Biotechnology Co., Ltd.), the dose is 3-6kGy, and the viscosity average molecular weight of the irradiated chitosan is 80.3 KDa.
Example 2:
preparing a chitosan solution resistant to radiation degradation:
adding 10g of chitosan with the viscosity-average molecular weight of 231KDa and the deacetylation degree of more than or equal to 90% into 500g of purified water, adding 5g of glacial acetic acid, stirring to fully dissolve the chitosan, continuously stirring, adding 50g of glycerol, 35g of n-butanol and 8g of propylene glycol, fixing the volume to 1L, and stirring for 10 minutes until the solution is uniformly mixed;
sterilizing the chitosan solution resistant to radiation degradation:
1) filling the mixed solution into a chitosan solution;
2) the chitosan solution is irradiated and sterilized by 60Co gamma-ray irradiation (Guangzhou Hua Dai Biotech Co., Ltd.), the dose is 8-16kGy, and the viscosity average molecular weight of the irradiated chitosan is 194 KDa.
Example 3:
preparing a chitosan solution resistant to radiation degradation:
adding 20g of chitosan with the viscosity-average molecular weight of 423KDa and the deacetylation degree of more than or equal to 90% into 500g of purified water, adding 10g of glacial acetic acid, stirring to fully dissolve the chitosan, continuously stirring, adding 60g of glycerol, 40g of n-butanol and 10g of propylene glycol, fixing the volume to 1L, and stirring for 10 minutes until the solution is uniformly mixed;
sterilizing the chitosan solution resistant to radiation degradation:
1) filling the mixed solution into a chitosan solution;
2) the chitosan solution is irradiated and sterilized by 60Co gamma-ray irradiation (Kyowa DaBiotechnology Co., Ltd.) with the dose of 14-28kGy, and the viscosity average molecular weight of the irradiated chitosan is 308.79 KDa.
Example 4:
preparing a chitosan solution resistant to radiation degradation:
adding 9g of chitosan with the viscosity-average molecular weight of 231KDa and the deacetylation degree of more than or equal to 90% into 500g of purified water, adding 4.5g of glacial acetic acid, stirring to fully dissolve the chitosan, continuously stirring and adding 45g of glycerol, 32g of n-butanol and 7.3g of propylene glycol, keeping the constant volume to 1L, and stirring for 10 minutes until the solution is uniformly mixed;
sterilizing the chitosan solution resistant to radiation degradation:
1) filling the mixed solution into a chitosan solution;
2) the chitosan solution is irradiated and sterilized by 60Co gamma-ray irradiation (Kyowa DaBiotechnology Co., Ltd.) with the dosage of 8-16kGy and the viscosity average molecular weight of the irradiated chitosan is 179.5 KDa.
Example 5:
preparing a chitosan solution resistant to radiation degradation:
adding 16g of chitosan with the viscosity-average molecular weight of 231KDa and the deacetylation degree of more than or equal to 90% into 500g of purified water, adding 8g of glacial acetic acid, stirring to fully dissolve the chitosan, continuously stirring, adding 53g of glycerol, 37g of n-butanol and 9.2g of propylene glycol, keeping the volume constant to 1L, and stirring for 10 minutes until the solution is uniformly mixed;
sterilizing the chitosan solution resistant to radiation degradation:
1) filling the mixed solution into a chitosan solution;
2) the chitosan solution is irradiated and sterilized by 60Co gamma-ray irradiation (Kyowa DaBiotechnology Co., Ltd.) with the dosage of 8-16kGy and the viscosity average molecular weight of the irradiated chitosan is 179.5 KDa.
Comparative example 1:
the only difference compared to example 2 is that comparative example 1 contains no n-butanol, only 43g propylene glycol;
comparative example 2:
the only difference compared to example 2 is that comparative example 2 contains no propylene glycol, only 43g of n-butanol;
comparative example 3:
the only difference compared to example 2 is that comparative example 3 contains 10g of n-butanol and 33g of propylene glycol;
comparative example 4:
the only difference compared to example 2 is that comparative example 4 contains no n-butanol and propylene glycol, 43g isopropanol;
control group:
in contrast to example 2, the chitosan solution was not sterilized;
test example I molecular weight measurement
Test materials: examples 1-5, comparative examples 1-4
The test method comprises the following steps: the viscosity-average molecular weight of chitosan was measured by the method of Ubbelohde viscometer, Panzuren, high molecular chemistry, fifth edition, chemical industry Press, 2014.1, using Ubbelohde viscometer in a constant temperature water bath at 25 + -0.5 deg.C, as shown in Table 1:
| sample (I) | Initial viscosity average molecular weight/. multidot.KDa | Viscosity average molecular weight/. multidot.KDa after irradiation | Ratio of decrease in molecular weight |
| Example 1 | 110 | 80.3 | 27.30% |
| Example 2 | 231 | 194 | 16% |
| Example 3 | 423 | 308.79 | 27% |
| Example 4 | 231 | 179.5 | 22.3% |
| Example 5 | 231 | 183.4 | 20.6% |
| Comparative example 1 | 231 | 109 | 52.8% |
| Comparative example 2 | 231 | 86 | 62.7% |
| Comparative example 3 | 231 | 62 | 73.20% |
| Comparative example 4 | 231 | 137 | 40.70% |
| Control group | 231 | 224 | 3% |
As can be seen from Table 1, the molecular weight of chitosan in the chitosan solution, the addition of propylene glycol, glycerol and n-butanol can affect the degradation of the chitosan solution after irradiation, the smaller the molecular weight is, the higher the degradation rate is, compared with example 2, comparative examples 1-4 are different in the content of propylene glycol and n-butanol, comparative example 1 does not contain n-butanol, the viscosity average molecular weight of chitosan is reduced by 52.8%, comparative example 2 does not contain propylene glycol, the viscosity average molecular weight of chitosan is reduced by 62.7%, comparative example 3 contains 10g of n-butanol, contains 33g of propylene glycol, the viscosity average molecular weight of chitosan is reduced by 73.2%, comparative example 4 does not contain n-butanol, and the viscosity average molecular weight of chitosan is reduced by 40.7% by replacing n-butanol with isopropanol.
Test example 2 film Forming Properties of Chitosan solution
The chitosan solution prepared in examples 1-3, comparative examples 1-4 and control group is sprayed on dry plate glass for casting and paving under the conditions of temperature of 20-25 ℃ and relative humidity of 70%, and the film forming time is tested.
TABLE 2 film formation time
| Sample (I) | Film Forming time (min) |
| Example 1 | 9 |
| Example 2 | 8 |
| Example 3 | 7 |
| Comparative example 1 | 23 |
| Comparative example 2 | 25 |
| Comparative example 3 | 22 |
| Comparative example 4 | 12 |
| Control group | 9 |
As can be seen from Table 2, the film forming time can be shortened by adding glycerol, n-butanol and propylene glycol to the chitosan solution, the film forming time is determined by the molecular weight of chitosan, the molecular weight is reduced after the chitosan solution is irradiated, the irradiation degradation of chitosan can be reduced by adding glycerol, n-butanol and glycerol to the examples 1-3, the film forming property is better as the molecular weight is larger, and therefore, the film forming time of the examples 1-3 is lower than that of the comparative example.
Test example 3, bacteria-blocking performance test:
materials:
firstly, strains: and (3) standard staphylococcus aureus strains, wherein typical colonies can be seen after enrichment on a culture medium and can be normally passaged.
Sample II: the chitosan solutions of examples 1-3 and comparative examples 1-4.
Experiment:
the chitosan solutions of examples 1-3 were sprayed onto the surface of the agar medium in an amount of 1mL per square centimeter, respectively, in the agar medium plate. Comparative examples 1 to 4 were applied to the surface of a culture medium in an amount of 1mL per square centimeter, and after the chitosan film was applied, the culture dish was placed in an aseptic environment to form a 40mm by 40mm square chitosan solution area, which was then formed into a film. After 60min, spraying serratia aerosol on the surface of the culture medium, and covering the cover of the culture dish. Culturing at 37 deg.C for 24h, and observing the growth status of the colonies at the covered and uncovered positions of chitosan membrane.
Then removing the chitosan film, placing the culture medium without the chitosan film at 37 ℃ for continuous culture for 24h, and observing the growth conditions of colonies at the covered part and the uncovered part. Each group was operated 3 times in succession to observe reproducibility. The results are shown in table 3 below.
TABLE 3 bacteria-inhibiting effect test
| Sample (I) | Example 1 | Example 2 | Example 3 | Comparative example 1 | Comparative example 2 | Comparative example 3 | Comparative example 4 |
| Bacterial colony with uncovered chitosan film Growth conditions | The original chitosan film covered part is not The colonies grow, the rest Overgrowth of bacteria | The original chitosan film covered part is not The colonies grow, the rest Overgrowth of bacteria | The original chitosan film covered part is not The colonies grow, the rest Overgrowth of bacteria | Covering with chitosan film The other part and the rest part Long bacteria | Covering with chitosan film The other part and the rest part Long bacteria | Covering with chitosan film The other part and the rest part Long bacteria | Covering with chitosan film The other part and the rest part Long bacteria |
| Bacteria with chitosan film removed Growth of the colony | The original chitosan film covered part is not The colonies grow, the rest Overgrowth of bacteria | The original chitosan film covered part is not The colonies grow, the rest Overgrowth of bacteria | The original chitosan film covered part is not The colonies grow, the rest Overgrown withBacteria | Covering with chitosan film The other part and the rest part Long bacteria | Covering with chitosan film The other part and the rest part Long bacteria | Covering with chitosan film The other part and the rest part Long bacteria | Covering with chitosan film The other part and the rest part Long bacteria |
| Original shell of chitosan film when not uncovered Bacterial colony at the covered part of polysaccharide membrane Length/(%) | / | / | / | 25.6±7.8 | 15.8±5.9 | 27.6±8.2 | 23.9±6.9 |
| Uncovering the original shell after chitosan film Bacterial colony at the covered part of polysaccharide membrane Length/(%) | / | / | / | 32.5±6.7 | 29.6±9.6 | 38.9±7.6 | 34.8±8.4 |
As can be seen from Table 3, the original chitosan film covered part of the culture medium of examples 1-3 grows aseptically, while the rest part grows with bacteria, and the state when the chitosan film is not removed is completely the same as the state after the chitosan film is removed and the culture is continued for 24h, which shows that the chitosan film can be formed by simultaneously adding glycerol, n-butanol and propylene glycol into the chitosan solution and has the bacteria-blocking effect, while the chitosan film of comparative examples 1-4 grows aseptically after the chitosan film is not removed and the chitosan film is removed and the culture continues for 24h, which shows that the n-butanol and glycerol of the chitosan solution can promote the film formation of the chitosan solution.
The foregoing is a preferred embodiment of the present invention, and it should be noted that it would be apparent to those skilled in the art that various modifications and enhancements can be made without departing from the principles of the invention, and such modifications and enhancements are also considered to be within the scope of the invention.
Claims (10)
1. The radiation degradation resistant chitosan solution is characterized by comprising the following components in percentage by mass:
0.5 to 2 percent of chitosan;
glacial acetic acid 0.25% -1%;
4% -6% of glycerol;
3% -4% of n-butyl alcohol;
0.6 to 1 percent of propylene glycol;
the balance being water.
2. The radiation degradation resistant chitosan solution of claim 1, wherein the chitosan solution comprises the following components:
0.9 to 1.6 percent of chitosan;
glacial acetic acid 0.45% -0.8%;
4.5% -5.3% of glycerin;
3.2 to 3.7 percent of n-butyl alcohol;
0.73% -0.92% of propylene glycol;
the balance of water;
preferably, the chitosan solution contains the following components:
1% of chitosan;
glacial acetic acid 0.5%;
5% of glycerol;
3.5 percent of n-butyl alcohol;
0.8 percent of propylene glycol;
the balance being water.
3. The radiation degradation resistant chitosan solution of claim 1, wherein the chitosan has a viscosity average molecular weight of 110-.
4. The chitosan solution of claim 1, wherein the chitosan has a viscosity average molecular weight of 231 KDa.
5. The radiation degradation resistant chitosan solution of claim 1, wherein the chitosan has a degree of deacetylation of at least 85%.
6. The radiation degradation resistant chitosan solution of claim 1, wherein the glycerin, chitosan, and propylene glycol are present in a mass ratio of (45-53): (32-37): (7.3-9.2), preferably, the mass ratio of the glycerol to the chitosan to the propylene glycol is (40-60): (30-40): (6-10).
7. The radiation degradation resistant chitosan solution of claim 6, wherein the mass ratio of glycerol, chitosan, and propylene glycol is 50: 35: 8.
8. the radiation sterilization method of the radiation degradation resistant chitosan solution is characterized by comprising the following steps:
1) packaging the chitosan solution resistant to radiation degradation of any one of claims 1-6;
2) and (5) performing irradiation sterilization.
9. The radiation sterilization method according to claim 8, wherein the irradiation in the step 2) is 60 Co-gamma rays.
10. The radiation sterilization method according to claim 9, wherein the irradiation dose in the step 2) is 3 KGy to 28 KGy.
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