CN113384992A - Helium three-gas purification device - Google Patents
Helium three-gas purification device Download PDFInfo
- Publication number
- CN113384992A CN113384992A CN202110776937.8A CN202110776937A CN113384992A CN 113384992 A CN113384992 A CN 113384992A CN 202110776937 A CN202110776937 A CN 202110776937A CN 113384992 A CN113384992 A CN 113384992A
- Authority
- CN
- China
- Prior art keywords
- helium
- gas
- cooling unit
- processing unit
- purification device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007789 gas Substances 0.000 title claims abstract description 197
- 239000001307 helium Substances 0.000 title claims abstract description 113
- 229910052734 helium Inorganic materials 0.000 title claims abstract description 113
- 238000000746 purification Methods 0.000 title claims abstract description 62
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 title claims abstract 23
- 238000001816 cooling Methods 0.000 claims abstract description 117
- 238000012545 processing Methods 0.000 claims abstract description 64
- 239000000203 mixture Substances 0.000 claims abstract description 22
- 230000005855 radiation Effects 0.000 claims description 58
- 238000009413 insulation Methods 0.000 claims description 30
- 238000001914 filtration Methods 0.000 claims description 25
- 238000001179 sorption measurement Methods 0.000 claims description 15
- 230000007246 mechanism Effects 0.000 claims description 14
- 238000005057 refrigeration Methods 0.000 claims description 10
- 239000002245 particle Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 abstract description 7
- 230000008569 process Effects 0.000 abstract description 6
- 238000001514 detection method Methods 0.000 abstract description 2
- 238000005516 engineering process Methods 0.000 abstract description 2
- GGXKPGRXHBSVNO-UHFFFAOYSA-N helium Chemical compound [He].[He].[He].[He] GGXKPGRXHBSVNO-UHFFFAOYSA-N 0.000 description 91
- YZCKVEUIGOORGS-NJFSPNSNSA-N Tritium Chemical compound [3H] YZCKVEUIGOORGS-NJFSPNSNSA-N 0.000 description 18
- 229910052722 tritium Inorganic materials 0.000 description 18
- 230000000694 effects Effects 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- 239000012535 impurity Substances 0.000 description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- 230000009467 reduction Effects 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 230000000149 penetrating effect Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 238000007711 solidification Methods 0.000 description 3
- 230000008023 solidification Effects 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000000112 cooling gas Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- -1 for example Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000002285 radioactive effect Effects 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/002—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by condensation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D8/00—Cold traps; Cold baffles
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B23/00—Noble gases; Compounds thereof
- C01B23/001—Purification or separation processes of noble gases
- C01B23/0036—Physical processing only
- C01B23/0052—Physical processing only by adsorption in solids
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0029—Obtaining noble gases
- C01B2210/0031—Helium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0043—Impurity removed
- C01B2210/0046—Nitrogen
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0043—Impurity removed
- C01B2210/0053—Hydrogen
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Separation By Low-Temperature Treatments (AREA)
Abstract
The invention discloses a helium three-gas purification device, and relates to the technical field of low-temperature technology, energy and safety detection. The helium three-gas purification device comprises a main body, a gas processing unit, a primary cooling unit and a secondary cooling unit. The body defines a vacuum chamber. The two ends of the gas processing unit are arranged outside the main body, the middle part of the gas processing unit is arranged in the vacuum cavity, and the gas processing unit is used for purifying helium three-gas mixture. The first-stage cooling unit is arranged in the vacuum cavity and used for refrigerating the helium three-gas mixture to a first preset temperature. The second-stage cooling unit is arranged in the vacuum cavity and used for refrigerating the helium three-gas mixture to a second preset temperature, the second preset temperature is lower than the first preset temperature, and the second preset temperature is not more than 10K. The helium tri-gas purification device can realize multi-time efficient helium tri-purification, is simpler, requires less supporting auxiliary equipment, consumes less time in the working process, and further can save manpower and equipment cost.
Description
Technical Field
The invention relates to the technical field of low-temperature technology, energy and safety detection, in particular to a helium three-gas purification device.
Background
Helium III gas is an isotope of helium, the content of helium III in nature is very rare, and the existing helium III is generally obtained by decay of a nuclear reaction product. Helium III plays an important role in low-temperature physical experiments, low-temperature engineering and the like. After the tritium produced by the nuclear reaction decays with a half-life of 12.5 years, helium tri-gas is obtained. However, in this case, the helium tri-helium is mixed with a radioactive gas tritium and cannot be used as it is. In the prior art, a filter membrane made of metal palladium is often adopted to repeatedly clean the tritium-containing mixed gas, but the method has limited times of filtration and cleaning, tritium is difficult to be completely filtered, and the whole filtration and cleaning process is time-consuming, labor-consuming and quite high in cost.
Therefore, a helium tri-gas purification device is needed to improve the purification effect and efficiency of helium tri and reduce the purification cost of helium tri.
Disclosure of Invention
The invention aims to provide a helium tri-gas purification device which can improve the purification effect and purification efficiency of helium tri and reduce the purification cost of helium tri.
In order to achieve the technical effects, the technical scheme of the invention is as follows:
a helium tri-gas purification apparatus comprising: a body defining a vacuum cavity; the two ends of the gas processing unit are arranged outside the main body, the middle part of the gas processing unit is arranged in the vacuum cavity, and the gas processing unit is used for purifying helium tri-mixed gas; the primary cooling unit is arranged in the vacuum cavity and is used for refrigerating the helium tri-mixed gas to a first preset temperature; and the second-stage cooling unit is arranged in the vacuum cavity and used for refrigerating the helium three-gas mixture to a second preset temperature, the second preset temperature is lower than the first preset temperature, and the second preset temperature is not more than 10K.
Furthermore, the gas processing unit comprises a filtering cold trap, an adsorption structure is arranged in the filtering cold trap and used for adsorbing particles solidified at the second preset temperature in the helium three-gas mixture, and the filtering cold trap is arranged in the secondary cooling unit.
Further, the secondary cooling unit comprises: the secondary heat radiation heat insulation cavity is arranged in the primary cooling unit; the secondary cooling plate is arranged on the top wall of the secondary heat radiation heat insulation cavity, and the filtering cold trap penetrates through the secondary cooling plate and extends into the secondary heat radiation heat insulation cavity.
Further, the primary cooling unit comprises: a primary thermal radiation heat insulation cavity; the one-level cold dish, the one-level cold dish is established the roof in the thermal-insulated chamber of one-level thermal radiation, the gas processing unit still includes the refrigeration body, the refrigeration body wears to establish in the one-level cold dish and stretch into the thermal-insulated intracavity of one-level thermal radiation.
Further, the helium tri-gas purification device further comprises a pre-cooling unit, the pre-cooling unit is arranged in the vacuum cavity and is located between the first-stage cooling unit and the second-stage cooling unit, and the pre-cooling unit is used for pre-cooling gas located in the gas processing unit.
Further, the pre-cooling unit comprises: the gas treatment device comprises a cold head and a precooling heat exchanger, wherein the cold head is arranged on the main body, the precooling heat exchanger is arranged in the vacuum cavity and connected with the cold head, and the gas treatment unit comprises a gas supply pipe wound on the precooling heat exchanger.
Furthermore, the helium tri-gas purification device further comprises a collecting mechanism, wherein the collecting mechanism is communicated with the gas outlet end of the gas processing unit, and the collecting mechanism is used for collecting gas exhausted by the gas processing unit.
Furthermore, the helium tri-gas purification device further comprises a radiation shield, the main body is arranged on the inner side of the radiation shield, and two ends of the gas processing unit extend out of the outer side of the radiation shield.
Furthermore, the helium tri-gas purification device further comprises a safety pressure release valve, and the main body and the gas processing unit are respectively provided with the safety pressure release valve.
Furthermore, the helium tri-gas purification device further comprises a bypass pipeline, the bypass pipeline is arranged on the outer side of the main body, two ends of the bypass pipeline are respectively communicated with two ends of the gas treatment unit, and a bypass valve is arranged in the bypass pipeline.
The invention has the beneficial effects that: according to the helium tri-gas purification device, various impurity elements such as nitrogen and tritium in the helium tri-gas mixture can be solidified through the treatment of the primary cooling unit and the secondary cooling unit, so that pure and safe commercial helium tri-gas can be obtained. Compared with the scheme that tritium is filtered by a filter membrane made of multiple layers of palladium to purify helium III in the prior art, the helium tri-gas purification device can realize multiple times of efficient helium tri-purification, and is simpler, less in required supporting auxiliary equipment and less in time consumption in the working process, so that manpower and equipment cost can be saved.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
Fig. 1 is a schematic structural diagram of a helium three-gas purification apparatus according to an embodiment of the present invention.
Reference numerals
1. A main body; 11. a vacuum chamber;
2. a gas processing unit; 21. filtering the cold trap; 22. a refrigerating body; 23. an air supply pipe; 24. an intake valve; 25. an air outlet pipe;
3. a primary cooling unit; 31. a primary thermal radiation heat insulation cavity; 32. a primary cold plate;
4. a secondary cooling unit; 41. a secondary thermal radiation heat insulation cavity; 42. a secondary cooling plate;
51. cooling the head; 52. a precooling heat exchanger; 53. a thermal conductance switch; 54. a temperature controller;
6. a collection mechanism;
71. a radiation shield; 72. a radiation monitor meter;
8. a safety pressure relief valve;
9. a bypass line; 91. a bypass pipe; 92. a bypass valve; 93. and a pressure gauge.
Detailed Description
In order to make the technical problems solved, the technical solutions adopted and the technical effects achieved by the present invention clearer, the technical solutions of the present invention are further described below by way of specific embodiments with reference to the accompanying drawings.
In the description of the present invention, unless expressly stated or limited otherwise, the terms "connected," "connected," and "fixed" are to be construed broadly, e.g., as meaning permanently connected, removably connected, or integral to one another; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
In the present invention, unless otherwise expressly stated or limited, "above" or "below" a first feature means that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact with each other via another feature therebetween. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.
It will be understood that the terms "central," "longitudinal," "transverse," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like are used in an orientation or positional relationship indicated in the drawings for convenience and simplicity of description only and do not indicate or imply that the device or element so referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be considered as limiting the invention. In the description of the present invention, "a plurality" means two or more unless otherwise specified. Furthermore, the terms "first" and "second" are used only for descriptive purposes and are not intended to have a special meaning.
The specific structure of the helium three-gas purification apparatus of the embodiment of the present invention is described below with reference to fig. 1.
As shown in fig. 1, fig. 1 discloses a helium tri-gas purification apparatus, which includes a main body 1, a gas processing unit 2, a primary temperature reduction unit 3, and a secondary temperature reduction unit 4. The body 1 defines a vacuum chamber 11. Both ends of the gas processing unit 2 are arranged outside the main body 1, the middle part of the gas processing unit 2 is arranged in the vacuum cavity 11, and the gas processing unit 2 is used for purifying helium three-gas mixture. The primary cooling unit 3 is arranged in the vacuum chamber 11, and the primary cooling unit 3 is used for refrigerating the helium three-gas mixture to a first preset temperature. The secondary cooling unit 4 is arranged in the vacuum cavity 11, and the secondary cooling unit 4 is used for refrigerating the helium three-gas mixture to a second preset temperature, wherein the second preset temperature is lower than the first preset temperature, and the second preset temperature is not more than 10K.
It can be understood that the vacuum chamber 11 defined by the main body 1 can accommodate the gas processing unit 2, the primary temperature reduction unit 3 and the secondary temperature reduction unit 4, thereby providing a safe and reliable operation space for purifying helium. The primary cooling unit 3 and the secondary cooling unit 4 can sectionally cool the helium tri-mixed gas in the gas processing unit 2, and can sequentially solidify other gases in the helium tri-mixed gas, for example, impurities such as nitrogen and the like can be solidified at the primary cooling unit 3, so as to improve the helium tri-purity of the helium tri-mixed gas entering the secondary cooling unit 4; and the helium three-mixed gas can be ensured to reach below 10K under the refrigeration of the secondary cooling unit 4, so that the refrigeration of the helium three-mixed gas is facilitated. In addition, the primary cooling unit 3 and the secondary cooling unit 4 are only provided with two sections of refrigeration processes, so that the refrigeration flow of helium three-mixed gas can be reduced, and the overall structure of the device is simplified. When the helium tri-mixed gas is cooled to the second preset temperature under the action of the secondary cooling unit 4, because the second preset temperature is not more than 10K and the solidification temperature of tritium in the helium tri-mixed gas is 19K, the tritium in the helium tri-mixed gas in the gas processing unit 2 in the secondary cooling unit 4 can be solidified in the gas processing unit 2, and therefore, the gas in the gas processing unit 2 output from the secondary cooling unit 4 only comprises the helium tri-gas, and the purification of the helium tri-gas in the helium tri-mixed gas is better realized.
According to the helium tri-gas purification device of the embodiment, through the treatment of the primary cooling unit 3 and the secondary cooling unit 4, various impurity elements such as nitrogen and tritium in the helium tri-gas mixture can be solidified, so that pure and safe commercial helium tri-gas can be obtained. Compared with the scheme that tritium is filtered by a filter membrane made of multiple layers of palladium to purify helium III in the prior art, the helium tri-gas purification device can realize multiple times of efficient helium tri-purification, and is simpler, less in required supporting auxiliary equipment and less in time consumption in the working process, so that manpower and equipment cost can be saved.
In some embodiments, as shown in fig. 1, the gas processing unit 2 includes a filtering cold trap 21, an adsorption structure is disposed in the filtering cold trap 21, the adsorption structure is configured to adsorb particles in the helium three-gas mixture solidified at the second preset temperature, and the filtering cold trap 21 is disposed in the secondary cooling unit 4.
It is understood that a filter cold trap 21 is additionally provided in the gas processing unit 2, and an adsorption structure capable of adsorbing impurity elements such as tritium which are solidified is provided in the filter cold trap 21. In addition, when the adsorption capacity of the adsorption structure is close to the upper limit, the user can also ensure the adsorption of tritium in the gas treatment unit 2 again by replacing the filtering cold trap 21, so that the repeated adsorption of impurity elements such as tritium and the like is conveniently realized, the repeated use of the helium tri-gas purification device is ensured, the cost of replacing the adsorption structure is low, and the purification cost of helium tri is also reduced.
It should be noted that, in this embodiment, the filtering cold trap 21 refers to a structure for adsorbing and filtering the solid tritium gas, and the structure can be detachably disposed in the gas processing unit 2, so as to facilitate replacement by a user, so as to ensure that radiation of the solid tritium gas in the filtering cold trap 21 does not cause damage to a human body.
Specifically, in this embodiment, the adsorption structure includes activated carbon, and the porous sponge in the activated carbon can play better adsorption effect to the tritium after the solidification. Of course, in other embodiments of the present invention, the adsorption structure may also be made of other materials, and need not be limited specifically.
In some embodiments, as shown in fig. 1, the secondary cooling unit 4 includes a secondary thermal radiation insulating cavity 41 and a secondary cold plate 42. The secondary thermal radiation heat insulation cavity 41 is arranged in the primary cooling unit 3. The secondary cold plate 42 is arranged on the top wall of the secondary heat radiation heat insulation cavity 41, and the filtering cold trap 21 is arranged in the secondary cold plate 42 in a penetrating manner and extends into the secondary heat radiation heat insulation cavity 41.
It can be understood that the second-stage cold plate 42 can play a refrigeration role in the second-stage heat radiation heat insulation cavity 41, so that the temperature in the second-stage heat radiation heat insulation cavity 41 is reduced to the second preset temperature, and the filtering cold trap 21 is matched in the second-stage heat radiation heat insulation cavity 41, so that the temperature of helium three mixed gas in the filtering cold trap 21 can be better guaranteed to reach the second preset temperature, the solidification of tritium in the filtering cold trap 21 is better guaranteed, and the purification effect of helium three is improved.
In some embodiments, as shown in fig. 1, the primary cooling unit 3 comprises a primary thermal radiation insulating cavity 31 and a primary cold plate 32. The primary cold plate 32 is arranged on the top wall of the primary heat radiation heat insulation cavity 31, the gas processing unit 2 further comprises a refrigerating body 22, and the refrigerating body 22 is arranged in the primary cold plate 32 in a penetrating mode and extends into the primary heat radiation heat insulation cavity 31.
It can be understood that, one-level cold plate 32 can play the refrigeration effect in the thermal-insulated chamber 31 of one-level heat radiation, thereby reduce the temperature in the thermal-insulated chamber 31 of one-level heat radiation to first preset temperature, simultaneously because the cooperation of the refrigeration body 22 is in the thermal-insulated chamber 31 of one-level heat radiation, thereby can guarantee better that the temperature that filters the three thoughtlessly gas of helium in cold trap 21 reaches first preset temperature, can play the cooling effect of first stage to three thoughtlessly gas of helium, can also filter impurity gases such as nitrogen gas in the three thoughtlessly gas of helium in advance, be favorable to the cooling of three thoughtlessly gas of helium in second grade cooling unit 4.
In addition, it should be noted that the cooling principle of the secondary cooling plate 42, the secondary thermal radiation heat insulation cavity 41, the primary cooling plate 32 and the primary thermal radiation heat insulation cavity 31 can be obtained according to the related knowledge in the prior art, and the cooling principle need not be described herein again.
In some specific embodiments, the gas processing unit 2 further includes an air inlet valve 24 and an air outlet pipe 25, the air outlet pipe 25 is communicated with the filtering cold trap 21, the air inlet valve 24 is disposed on the main body 1, the air inlet valve 24 can control the air supply switch of the gas processing unit 2, and the air outlet pipe 25 can facilitate the gas to be supplied to the outside of the main body 1, so as to better realize the air supply function of the gas processing unit 2.
In some embodiments, as shown in fig. 1, the helium tri-gas purification apparatus further includes a pre-cooling unit disposed in the vacuum chamber 11, the pre-cooling unit being located between the primary cooling unit 3 and the secondary cooling unit 4, and the pre-cooling unit being configured to pre-cool the gas located in the gas processing unit 2.
It can be understood that the pre-cooling unit can pre-cool the helium tri-gas mixture, so that the temperature of the helium tri-gas mixture is between the first preset temperature and the second preset temperature, which can not only be convenient for ensuring that the secondary cooling unit 4 reduces the temperature of the helium tri-gas mixture to the second preset temperature, but also can further filter out impurity gases incompletely filtered at the primary cooling unit 3 in the pre-cooling process, and better ensure that the helium tri-gas mixture entering the secondary cooling unit 4 mainly comprises the helium tri-gas and tritium, so as to improve the purification precision of the helium tri-gas.
In some embodiments, as shown in fig. 1, the pre-cooling unit includes a cold head 51 and a pre-cooling heat exchanger 52. The cold head 51 is provided on the main body 1, the pre-cooling heat exchanger 52 is provided in the vacuum chamber 11 and connected to the cold head 51, and the gas processing unit 2 includes the gas supply pipe 23 wound around the pre-cooling heat exchanger 52.
It can be understood that the cold head 51 can cool the pre-cooling heat exchanger 52, and the gas feeding pipe 23 wound around the pre-cooling heat exchanger 52 can increase the contact area between the gas processing unit 2 and the pre-cooling heat exchanger 52, thereby increasing the pre-cooling effect of the helium tri-gas mixture. Specifically, in the present embodiment, the pre-cooling heat exchanger 52 is located inside the primary cooling unit 3.
In some specific embodiments, as shown in fig. 1, the pre-cooling unit further includes a thermal conductance switch 53 and a temperature controller 54 disposed in the primary cooling unit 3, which can facilitate adjusting the pre-cooling temperature of the pre-cooling heat exchanger 52.
In some embodiments, as shown in fig. 1, the helium tri-gas purification apparatus further comprises a collection mechanism 6, wherein the collection mechanism 6 is in communication with the gas outlet end of the gas treatment unit 2, and the collection mechanism 6 is used for collecting the gas exhausted from the gas treatment unit 2.
It can be understood that the collecting mechanism 6 can collect the gas exhausted from the gas processing unit 2, that is, the helium tri-gas purified by the primary temperature reduction unit 3 and the secondary temperature reduction unit 4, so as to better realize the collection of the pure helium tri-gas. Specifically, the collecting mechanism 6 may be configured as a storage tank, or may be configured as a pipeline communicated with other processing equipment, and the specific type of the collecting mechanism 6 may be determined according to actual requirements.
In some embodiments, as shown in FIG. 1, the helium tri-gas purification apparatus further comprises a radiation shield 71, the main body 1 is disposed inside the radiation shield 71, and both ends of the gas processing unit 2 extend outside the radiation shield 71.
It can be understood that, since he mixed gas is generally obtained by decay of the products of the nuclear reaction, so that it has a certain radioactivity, the safety of purification of he mixed gas can be improved after the radiation-proof cover 71 is covered on the main body 1.
In some embodiments, as shown in fig. 1, the helium tri-gas purification apparatus further comprises a radiation monitor 72, the radiation monitor 72 is disposed on the radiation shield 71, and the radiation monitor 72 can monitor the radiation intensity in the radiation shield 71 in real time to further improve the purification safety.
In some embodiments, as shown in fig. 1, the helium tri-gas purification apparatus further comprises a safety pressure relief valve 8, and the main body 1 and the gas processing unit 2 are respectively provided with the safety pressure relief valve 8.
It can be understood that the pressure in the vacuum chamber 11 and the gas supply pipe 23 in the main body 1 may change, and in case that the pressure in the vacuum chamber 11 and the gas supply pipe 23 is too high, the safety pressure relief valve 8 can communicate the vacuum chamber 11 and the gas processing unit 2 with the space in the radiation shield 71, thereby preventing the safety problem caused by the too high pressure and further improving the safety of the helium tri-gas purification.
In some embodiments, as shown in fig. 1, the helium tri-gas purification apparatus further comprises a bypass line 9, the bypass line 9 is disposed outside the main body 1, two ends of the bypass line 9 are respectively communicated with two ends of the gas processing unit 2, and a bypass valve 92 is disposed in the bypass line 9.
It will be appreciated that during operation of the helium tri-gas purification apparatus, there is a possibility that the gas purified by the secondary cooling unit 4 will still be insufficiently pure. In this embodiment, by arranging the bypass pipeline 9, the helium tri-gas mixture with purity not meeting the requirement can be conveyed to one end of the gas processing unit 2 communicated with the first-stage cooling unit 3, so that the recycling function is realized, and the application range of the helium tri-gas purification device is widened.
Specifically, in the present embodiment, the bypass line 9 includes a bypass pipe 91, the bypass valve 92 is disposed in the bypass pipe 91, and a pressure gauge 93 is further disposed in the bypass pipe 91, and can be used for monitoring the pressure in the bypass pipe 91 in real time.
Example (b):
a helium tri-gas purification apparatus according to an embodiment of the present invention is described below with reference to fig. 1.
The helium three-gas purification device of the embodiment comprises a main body 1, a gas processing unit 2, a primary cooling unit 3, a secondary cooling unit 4, a precooling unit, a radiation-proof cover 71, a bypass pipeline 99, a collecting mechanism 6 and a safety pressure release valve 8.
The body 1 defines a vacuum chamber 11.
Both ends of the gas processing unit 2 are arranged outside the main body 1, the middle part of the gas processing unit 2 is arranged in the vacuum cavity 11, and the gas processing unit 2 is used for purifying helium three-gas mixture. The gas processing unit 2 comprises a filtering cold trap 21, an adsorption structure is arranged in the filtering cold trap 21 and used for adsorbing particles solidified at a second preset temperature in the helium three-gas mixture, and the filtering cold trap 21 is arranged in the secondary cooling unit 4.
The primary cooling unit 3 is arranged in the vacuum chamber 11, and the primary cooling unit 3 is used for refrigerating the helium three-gas mixture to a first preset temperature. The primary cooling unit 3 comprises a primary thermal radiation heat insulation cavity 31 and a primary cold plate 32. The primary cold plate 32 is arranged on the top wall of the primary heat radiation heat insulation cavity 31, the gas processing unit 2 further comprises a refrigerating body 22, and the refrigerating body 22 is arranged in the primary cold plate 32 in a penetrating mode and extends into the primary heat radiation heat insulation cavity 31.
The secondary cooling unit 4 is arranged in the vacuum cavity 11, and the secondary cooling unit 4 is used for refrigerating the helium three-gas mixture to a second preset temperature, wherein the second preset temperature is lower than the first preset temperature, and the second preset temperature is not more than 10K. The secondary cooling unit 4 comprises a secondary thermal radiation heat insulation cavity 41 and a secondary cooling disc 42. The secondary thermal radiation heat insulation cavity 41 is arranged in the primary cooling unit 3. The secondary cold plate 42 is arranged on the top wall of the secondary heat radiation heat insulation cavity 41, and the filtering cold trap 21 is arranged in the secondary cold plate 42 in a penetrating manner and extends into the secondary heat radiation heat insulation cavity 41.
The pre-cooling unit is arranged in the vacuum cavity 11, is positioned between the first-stage cooling unit 3 and the second-stage cooling unit 4, and is used for pre-cooling the gas positioned in the gas processing unit 2. The pre-cooling unit comprises a cold head 51 and a pre-cooling heat exchanger 52. The cold head 51 is provided on the main body 1, the pre-cooling heat exchanger 52 is provided in the vacuum chamber 11 and connected to the cold head 51, and the gas processing unit 2 includes the gas supply pipe 23 wound around the pre-cooling heat exchanger 52.
The main body 1 is disposed inside the radiation shield 71, and both ends of the gas processing unit 2 extend outside the radiation shield 71. The main body 1 and the gas processing unit 2 are respectively provided with a safety pressure relief valve 8.
The bypass line 9 is provided outside the main body 1, both ends of the bypass line 9 are respectively communicated with both ends of the gas treatment unit 2, and a bypass valve 92 is provided in the bypass line 9.
In the description herein, references to the description of "some embodiments," "other embodiments," or the like, mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
The above description is only a preferred embodiment of the present invention, and for those skilled in the art, the present invention should not be limited by the description of the present invention, which should be interpreted as a limitation.
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110776937.8A CN113384992A (en) | 2021-07-09 | 2021-07-09 | Helium three-gas purification device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110776937.8A CN113384992A (en) | 2021-07-09 | 2021-07-09 | Helium three-gas purification device |
Publications (1)
Publication Number | Publication Date |
---|---|
CN113384992A true CN113384992A (en) | 2021-09-14 |
Family
ID=77625605
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202110776937.8A Pending CN113384992A (en) | 2021-07-09 | 2021-07-09 | Helium three-gas purification device |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN113384992A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114931840A (en) * | 2022-06-02 | 2022-08-23 | 散裂中子源科学中心 | Helium three-gas purification system |
CN115318031A (en) * | 2022-07-26 | 2022-11-11 | 南方科技大学 | A high-purity helium three-gas purification and hydrogen extraction device and method |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001248964A (en) * | 2000-03-08 | 2001-09-14 | Sumisho Fine Gas Kk | Apparatus and method for gas refining |
CN107621121A (en) * | 2017-09-22 | 2018-01-23 | 清华大学 | Compound helium purification device |
CN108870821A (en) * | 2018-06-27 | 2018-11-23 | 中国科学院理化技术研究所 | Low-temperature cooling equipment using refrigerator as cold source |
CN111298596A (en) * | 2020-04-14 | 2020-06-19 | 中船重工鹏力(南京)超低温技术有限公司 | Rare gas purification device based on low-temperature cold source |
CN112850668A (en) * | 2019-11-27 | 2021-05-28 | 中天科技精密材料有限公司 | Chlorine-containing tail gas helium purification system |
CN213454351U (en) * | 2021-03-19 | 2021-06-15 | 北京飞斯科科技有限公司 | Reverse-flow closed-cycle cryogenic cooling system |
CN215506213U (en) * | 2021-07-09 | 2022-01-14 | 深圳市福田区南科大量子技术与工程研究院 | Helium three-gas purification device |
-
2021
- 2021-07-09 CN CN202110776937.8A patent/CN113384992A/en active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001248964A (en) * | 2000-03-08 | 2001-09-14 | Sumisho Fine Gas Kk | Apparatus and method for gas refining |
CN107621121A (en) * | 2017-09-22 | 2018-01-23 | 清华大学 | Compound helium purification device |
CN108870821A (en) * | 2018-06-27 | 2018-11-23 | 中国科学院理化技术研究所 | Low-temperature cooling equipment using refrigerator as cold source |
CN112850668A (en) * | 2019-11-27 | 2021-05-28 | 中天科技精密材料有限公司 | Chlorine-containing tail gas helium purification system |
CN111298596A (en) * | 2020-04-14 | 2020-06-19 | 中船重工鹏力(南京)超低温技术有限公司 | Rare gas purification device based on low-temperature cold source |
CN213454351U (en) * | 2021-03-19 | 2021-06-15 | 北京飞斯科科技有限公司 | Reverse-flow closed-cycle cryogenic cooling system |
CN215506213U (en) * | 2021-07-09 | 2022-01-14 | 深圳市福田区南科大量子技术与工程研究院 | Helium three-gas purification device |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114931840A (en) * | 2022-06-02 | 2022-08-23 | 散裂中子源科学中心 | Helium three-gas purification system |
CN114931840B (en) * | 2022-06-02 | 2024-02-13 | 散裂中子源科学中心 | A helium three gas purification system |
CN115318031A (en) * | 2022-07-26 | 2022-11-11 | 南方科技大学 | A high-purity helium three-gas purification and hydrogen extraction device and method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3934885B2 (en) | Surplus anesthetic gas treatment device | |
CN113384992A (en) | Helium three-gas purification device | |
CN206985717U (en) | A kind of helium purifies recovery system | |
CN111773878B (en) | Air separation energy-saving control device and method | |
CN215506213U (en) | Helium three-gas purification device | |
CN111530228A (en) | Vertical adsorber and gas purification adsorption system and method | |
CN107621121B (en) | Compound helium purification device | |
CN105097060B (en) | A kind of high temperature gas-cooled heap optimization helium purification regenerative system and renovation process | |
CN115274171A (en) | Helium gas purification system and operation method | |
CN201537447U (en) | Novel adsorption and desorption device | |
JPS6156009B2 (en) | ||
JP2001248964A (en) | Apparatus and method for gas refining | |
JP2006263475A (en) | Process and apparatus for treating residual anesthetic gas | |
CN218740944U (en) | High-purity helium three-gas purification and hydrogen extraction device | |
CN212982464U (en) | Dedicated H of semiconductor2Purification system | |
CN115382389A (en) | Exhaust gas treatment method and system | |
CN112808176B (en) | Orthopara-hydrogen conversion device and orthopara-hydrogen high-performance conversion method | |
CN212881882U (en) | Hydrogen isotope low-temperature rectification separation system | |
JP3054062B2 (en) | Purifier | |
CN108735324A (en) | A kind of off-line equipment for the cooling of spent fuel transport container helium purification | |
CN209607425U (en) | A kind of high temperature lithium circuit purification hot trap system | |
CN109372611B (en) | Special filter equipment of automobile exhaust | |
CN109859868B (en) | Hot trap system for purifying high-temperature lithium loop | |
CN101745287A (en) | Waste gas reclamation treatment system for waste refrigerating electric appliances and method | |
CN220238195U (en) | Device for removing nitrous oxide from rare gas raw materials |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination |