CN113355647B - Porous metal, and method and apparatus for producing same - Google Patents
Porous metal, and method and apparatus for producing same Download PDFInfo
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- CN113355647B CN113355647B CN202110631300.XA CN202110631300A CN113355647B CN 113355647 B CN113355647 B CN 113355647B CN 202110631300 A CN202110631300 A CN 202110631300A CN 113355647 B CN113355647 B CN 113355647B
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- 239000002184 metal Substances 0.000 title claims abstract description 94
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 94
- 238000000034 method Methods 0.000 title claims abstract description 84
- 238000000576 coating method Methods 0.000 claims abstract description 97
- 239000011248 coating agent Substances 0.000 claims abstract description 95
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 69
- 239000000463 material Substances 0.000 claims abstract description 53
- 238000002360 preparation method Methods 0.000 claims abstract description 24
- 238000004519 manufacturing process Methods 0.000 claims abstract description 23
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 230000003014 reinforcing effect Effects 0.000 claims abstract description 17
- 238000012546 transfer Methods 0.000 claims description 20
- 238000010438 heat treatment Methods 0.000 claims description 15
- 238000003860 storage Methods 0.000 claims description 15
- 239000002923 metal particle Substances 0.000 claims description 13
- 239000007888 film coating Substances 0.000 claims description 11
- 238000009501 film coating Methods 0.000 claims description 11
- 238000007599 discharging Methods 0.000 claims description 5
- 230000032683 aging Effects 0.000 claims description 4
- 238000010891 electric arc Methods 0.000 claims description 4
- 238000011068 loading method Methods 0.000 claims description 3
- 231100000252 nontoxic Toxicity 0.000 claims description 2
- 230000003000 nontoxic effect Effects 0.000 claims description 2
- 239000006261 foam material Substances 0.000 claims 1
- 238000009504 vacuum film coating Methods 0.000 claims 1
- 238000000151 deposition Methods 0.000 abstract description 12
- 239000011148 porous material Substances 0.000 abstract description 9
- 238000009826 distribution Methods 0.000 abstract description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 11
- 229910052802 copper Inorganic materials 0.000 description 11
- 239000010949 copper Substances 0.000 description 11
- 230000007613 environmental effect Effects 0.000 description 4
- 239000007769 metal material Substances 0.000 description 4
- 231100000331 toxic Toxicity 0.000 description 4
- 230000002588 toxic effect Effects 0.000 description 4
- 238000007747 plating Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000002679 ablation Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000003562 lightweight material Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0005—Separation of the coating from the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The application provides a porous metal, a preparation method and a manufacturing device thereof. The preparation method of the porous metal comprises the following steps: preparing a base material with specified porosity, transferring the base material to a first coating chamber, performing primary vacuum coating on the base material, and depositing a porous base layer on the surface of the base material to form a first process product; transferring the first process product to a second coating chamber, performing secondary vacuum coating on the first process product, depositing a porous reinforced layer on the surface of the porous base layer, and burning off the base material to form a second process product; and transferring the second process product to a third coating chamber, carrying out three-stage vacuum coating on the second process product, and depositing a porous covering layer on the surface of the porous reinforcing layer to form a porous metal product. According to the preparation method of the porous metal, multiple vacuum coating is carried out on the porous substrate, and the substrate is burnt out in the vacuum coating process, so that the porosity and the pore size distribution of a finished product are ensured, and the unit manufacturing cost is reduced.
Description
Technical Field
The application relates to the technical field of porous metal manufacturing, in particular to porous metal and a preparation method and manufacturing equipment thereof.
Background
Research on porous metals originates from the need for lightweight materials, i.e., on the premise of maintaining certain strength and rigidity, the density of the metal material is reduced by introducing a large number of pores, so as to achieve the goal of lightweight and high strength. Copper has many advantages such as high strength and good conductivity, and is widely used in the field of porous metals. At present, the preparation routes of porous copper strips on the market are mainly technical methods such as an electrodeposition method, a sintering method and the like, and impurities such as NaCl, copper sulfate and the like are easy to remain in the finished porous copper strip products manufactured by the methods. The porosity of the porous copper strip prepared by the method is not high, the pore size distribution and porosity of the finished product are difficult to control, and the electrolyte can also cause pollution to the environment.
Disclosure of Invention
In view of the above situation, the present application provides a porous metal, a method for preparing the same, and a device for manufacturing the same, in which a porous substrate is subjected to vacuum deposition for a plurality of times, and the substrate is burned off during the vacuum deposition, thereby greatly improving the yield of the porous metal, ensuring the porosity and pore size distribution of the finished product, and reducing the unit manufacturing cost. No toxic and harmful products are generated in the vacuum coating process, and the method is favorable for solving the environmental protection problem in the porous metal preparation process.
An embodiment of the present application provides a porous metal preparation method, including the steps of:
preparing a base material with specified porosity, transferring the base material to a first coating chamber, carrying out primary vacuum coating on the base material by the first coating chamber, and depositing a porous base layer on the surface of the base material to form a first process product;
transferring the first process product to a second coating chamber, performing secondary vacuum coating on the first process product by the second coating chamber, depositing a porous reinforcing layer on the surface of the porous base layer, burning off the base material, and coating the porous base layer with the porous reinforcing layer to form a second process product;
and transferring the second process product to a third coating chamber, carrying out three-stage vacuum coating on the second process product by the third coating chamber, depositing a porous covering layer on the surface of the porous reinforcing layer, and coating the porous reinforcing layer by the porous covering layer to form a porous metal product.
In some embodiments, the primary vacuum coating mode includes multi-arc ion vacuum coating, the power supply of the first coating chamber is a constant-current direct-current power supply, the working current of the first coating chamber is 50-80A, and the coating time of the primary vacuum coating is 5-20min.
In some embodiments, the secondary vacuum coating mode comprises arc discharge vacuum coating, the power supply of the second coating chamber is a constant current direct current power supply, the working current of the second coating chamber is 100-155A, and the coating time of the secondary vacuum coating is 10-35 min.
In some embodiments, the working temperature of the second coating chamber is 450-600 ℃.
In some embodiments, the three-stage vacuum coating mode includes glow discharge vacuum coating, the power supply of the third coating chamber is a constant-voltage direct-current power supply, the working current of the third coating chamber is 8-25A, and the coating time of the three-stage vacuum coating is 15-30 min.
In some embodiments, the diameter of the metal particles generated in the tertiary vacuum coating process is smaller than the diameter of the metal particles generated in the secondary vacuum coating process.
In some embodiments, the porous metal preparation method further comprises the steps of: and carrying out aging heat treatment on the porous metal product.
In some embodiments, the porosity of the substrate is greater than or equal to 94%.
The embodiment of the application also provides a porous metal manufacturing device, and the porous metal preparation method is applied to the porous metal manufacturing device, and the porous metal manufacturing device comprises a charging chamber, a transfer chamber, a first film coating chamber, a second film coating chamber, a third film coating chamber, a storage chamber and a discharging frame which are sequentially arranged; the charging chamber is used for loading a substrate to be used; the transfer chamber is connected with the first coating chamber and is used for temporarily storing the base material and transferring the base material to the first coating chamber; the first coating chamber is used for carrying out primary coating on the base material to form a first process product; the second film coating chamber is used for carrying out secondary film coating on the first process product to form a second process product; the third coating chamber is used for carrying out three-stage coating on the second process product to form a porous metal product; the storage chamber is used for heat treatment of the porous metal product; and the discharging chamber is used for storing the porous metal product after the heat treatment is finished.
Embodiments of the present application also provide a porous metal prepared by the porous metal preparation method described in the above embodiments.
According to the preparation method of the porous metal, multiple times of vacuum coating are carried out on the porous base material, and the base material is burnt off in the vacuum coating process, so that the yield of the porous metal is greatly improved, the porosity and the pore size distribution of a finished product are ensured, and the unit manufacturing cost is reduced. And no toxic and harmful product is generated in the vacuum coating process, so that the environmental protection problem in the porous metal preparation process is favorably solved.
Drawings
Fig. 1 is a schematic structural view of a porous metal manufacturing apparatus in one embodiment.
FIG. 2 is a flow diagram of a porous metal preparation method in one embodiment.
Description of the main element symbols:
the specific implementation mode is as follows:
the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only some embodiments of the present application, and not all embodiments.
It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. When an element is referred to as being "disposed on" another element, it can be directly on the other element or intervening elements may also be present. The terms "vertical," "horizontal," "left," "right," and the like are used herein for purposes of illustration only.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein in the description of the present application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. As used herein, the term "or/and" includes any and all combinations of one or more of the associated listed items.
The application provides a porous metal preparation method, which comprises the following steps:
preparing a base material with specified porosity, transferring the base material to a first coating chamber, carrying out primary vacuum coating on the base material by the first coating chamber, and depositing a porous base layer on the surface of the base material to form a first process product;
transferring the first process product to a second coating chamber, performing secondary vacuum coating on the first process product by the second coating chamber, depositing a porous reinforced layer on the surface of the porous base layer, and burning off the base material to form a second process product;
and transferring the second process product to a third coating chamber, carrying out three-stage vacuum coating on the second process product by the third coating chamber, and depositing a porous covering layer on the surface of the porous reinforcing layer to form a porous metal product.
According to the preparation method of the porous metal, the porous base material is subjected to vacuum coating for multiple times, and the base material is burnt off in the vacuum coating process, so that the yield of the porous metal is greatly improved, the porosity and the pore size distribution of a finished product are ensured, and the unit manufacturing cost is reduced. And no toxic and harmful product is generated in the vacuum coating process, so that the environmental protection problem in the porous metal preparation process is favorably solved.
Some embodiments of the present application are described in detail. In the following embodiments, features of the embodiments may be combined with each other without conflict.
Referring to fig. 1, in one embodiment, a porous metal manufacturing apparatus 10 includes a charging chamber 1, a transfer chamber 2, a first coating chamber 3, a second coating chamber 4, a third coating chamber 5, a storage chamber 6, and a discharge chamber 7, which are sequentially disposed. The charging chamber 1 is used for loading a substrate to be used. The transfer chamber 2 is connected with the first coating chamber 3, and the transfer chamber 2 is used for temporarily storing the base material. After the base material is transferred to the transfer chamber 2, the transfer chamber 2 is firstly sealed and vacuumized, and after the vacuum degree meets the preset requirement, the transfer chamber 2 transfers the base material to the first coating chamber 3. The first coating chamber 3 is used for primary coating of the base material to form a first process product. And the second film coating chamber 4 is used for carrying out secondary film coating on the first process product to form a second process product. And the third coating chamber 5 is used for carrying out three-stage coating on the product in the second process to form a porous metal product. The storage chamber 6 is used for carrying out heat treatment on the porous metal product, and the mechanical property of the porous metal product is improved. And the discharging chamber 7 is used for storing the porous metal product after the heat treatment is finished.
Referring to fig. 1 and 2, the method for preparing the porous metal applied to the porous metal manufacturing apparatus 10 includes the steps of:
step S1, preparing a base material with specified porosity, and mounting the base material to a charging frame.
Specifically, the substrate includes a porous structure having, in embodiments herein, a porosity of greater than or equal to 94%. In other embodiments, the porosity of the porous structure of the substrate may be any value less than 94% as long as the actual design requirements are met. The material of the substrate includes, but is not limited to, non-toxic, high temperature decomposable materials with uniform pore structure such as foam. The substrate to be used is first mounted into the charging stand 8 of the charging chamber 1 for standby.
And S2, transferring the base material to a first coating chamber, carrying out primary vacuum coating on the base material, and depositing a porous base layer on the surface of the base material to form a first process product.
Specifically, the charging frame 8 filled with the substrate is firstly transferred into the transfer chamber 2, the transfer chamber 2 is firstly sealed and vacuumized, after the vacuum degree meets the preset requirement, the transfer chamber 2 is communicated with the first coating chamber 3, and the charging frame 8 filled with the substrate is transferred to the first coating chamber 3 by the transfer chamber 2. In the embodiment of the application, when the transfer chamber 2 is communicated with the first coating chamber 3, the vacuum degree of the transfer chamber 2 is less than or equal to 0.05pa, so that the influence of external air on the vacuum coating quality in the substrate transfer process is reduced.
After the carriage 8 with the substrate is transferred to the first coating chamber 3, the connection passage between the first coating chamber 3 and the transfer chamber 2 is closed. The substrate is subjected to primary vacuum coating in a first coating chamber 3, and a porous base layer is deposited on the surface of the substrate to form a first process product. The primary vacuum coating mode includes, but is not limited to, multi-arc ion vacuum coating, metal particles are sputtered from a metal target under the conditions of low voltage and high current, and the sputtered metal particles are rapidly attached to and deposited on the surface of a substrate to form the porous base layer. In an embodiment of the present application, the material of the metal target is common-type copper or high-purity copper, and in other embodiments, the material of the metal target may also be other metal materials, which is not limited in this application.
Further, in the primary vacuum coating process, an arc power supply of the first coating chamber 3 is a constant-current direct-current power supply, the working current is controlled to be 50-80A, the coating time is controlled to be 5-20min, the problems of excessive high heat ablation and substrate damage generated in the coating process are solved, and the uniform pores and the complete molding structure of the porous base layer are ensured.
And S3, transferring the first process product to a second coating chamber, carrying out secondary vacuum coating on the first process product, depositing a porous reinforced layer on the surface of the porous base layer, and burning off the base material to form a second process product.
Specifically, the passage between the second coating chamber 4 and the first coating chamber 3 is opened, the first process product is moved to the second coating chamber 4 together with the charging stand 8, and then the second coating chamber 4 is closed. The first process product is subjected to secondary vacuum coating in the second coating chamber 4. The secondary vacuum coating mode includes, but is not limited to, high-current arc discharge vacuum coating, metal particles generated by a metal target under the action of high-current arc discharge are rapidly deposited on the porous base layer, a porous reinforcing layer is formed on the surface of the porous base layer, and the porous reinforcing layer completely covers the porous base layer. The porous base layer and the porous reinforcing layer are combined to form a skeleton structure of porous metal so as to ensure the structural integrity of a product. And releasing a large amount of heat energy from the metal particles in the deposition process to promote the base material to be heated, decomposed and quickly volatilized, and completing the secondary vacuum coating process until the base material is completely burnt out to form a product in the second process.
Further, in the process of secondary vacuum coating, the arc power supply of the second coating chamber 4 is a constant current direct current power supply, the working current is controlled to be 100-155A, the temperature of the second coating chamber 4 is controlled to be 450-600 ℃, and the coating time is controlled to be 10-35 min. The material of the metal target is common type copper or high-purity copper, in other embodiments, the material of the metal target may also be other metal materials, and the application is not limited thereto. And a heating device is also arranged in the second coating chamber 4 and is used for assisting in heating the second process product so as to remove residual base materials in the second process product. The heating device includes, but is not limited to, a heating resistance wire.
And S4, transferring the second process product to a third coating chamber, carrying out three-stage vacuum coating on the second process product, and depositing a porous covering layer on the surface of the porous reinforcing layer to form the porous metal product.
Specifically, the passage between the third coating chamber 5 and the second coating chamber 4 is opened, the second process product is moved to the third coating chamber 5 together with the charging stand 8, and then the third coating chamber 5 is closed. And the product of the second process is subjected to three-stage vacuum coating in a third coating chamber 5.
The three-stage vacuum coating mode includes but is not limited to glow discharge vacuum coating, and simultaneously, the magnetron sputtering technology is matched to enable metal particles generated by a metal target under the action of glow discharge to be deposited on the surface of the porous reinforcing layer, a porous covering layer is formed on the surface of the porous reinforcing layer, and the porous covering layer completely covers the porous reinforcing layer, so that the preparation of the porous metal product is completed. The material of the metal target is common-type copper or high-purity copper, and in other embodiments, the material of the metal target may also be other metal materials, which is not limited in this application. The diameter of metal particles generated by the metal target in the third-stage vacuum coating process is smaller than that of metal particles generated by the metal target in the second-stage vacuum coating process.
Furthermore, the power supply of the third film plating chamber 5 selects a constant voltage direct current power supply in the process of carrying out three-stage vacuum film plating, the current is controlled to be 8-25A, the film plating time is controlled to be 15-30 min, and the thickness of the obtained porous metal product is about 0.8-2.5 mu m.
Because the diameter of metal particles generated in the high-current arc light coating process is larger, the surface of a product obtained in the second process through secondary vacuum coating is rougher, and the product in the second process is easy to generate the problems of powder falling and slag falling after simple mechanical extrusion. In the third-stage vacuum coating process, the small-diameter metal particles are deposited on the surface of the porous reinforcing layer, so that a porous covering layer with a compact structure and a smooth surface is formed on the surface of the porous reinforcing layer, the surface quality of a product in the second process is effectively improved, and the processing performance of the porous metal product is favorably improved.
And S5, carrying out aging heat treatment on the porous metal product.
Specifically, the passage between the third coating chamber 5 and the storage chamber 6 is opened, the porous metal product is transferred to the storage chamber 6 along with the charging stand 8, and then the storage chamber 6 is closed. When the porous metal product is transferred from the third coating chamber 5 to the storage chamber 6, the temperature of the porous metal product is 260-430 ℃. After the porous metal product is transferred to the storage chamber 6, protective gas is continuously introduced into the storage chamber 6 while vacuumizing, so that the porous metal product formed after three-stage vacuum coating is prevented from being directly exposed in the atmosphere. The porous metal product is subjected to natural aging heat treatment in the storage chamber 6, the mechanical property of the porous metal product is improved, and the dryness and hardness of the porous metal product caused by excessive temperature difference are reduced. The protective gas includes, but is not limited to, inert gases such as argon.
When the porous metal product is subjected to heat treatment in the storage chamber 6 and cooled to below 100 ℃, the porous metal product is transferred to the discharging chamber 7 along with the charging rack 8, and the whole preparation process of the porous metal product is completed.
In the steps of the porous metal preparation method, the process of sequentially moving the materials from the transfer chamber 2 to the first coating chamber 3, the second coating chamber 4, the third coating chamber 5 and the storage chamber 6 is carried out in a vacuum environment, and the vacuum degree is less than or equal to 0.05pa.
The preparation method and the manufacturing equipment of the porous metal depend on a mode of vacuum coating multiple times on the porous substrate, and burn off the substrate in the vacuum coating process, so that the porosity of the porous metal can reach more than 94 percent, and the pore size distribution is uniform. The porous metal is formed by multiple vacuum coating modes, so that the porous metal has high-purity metal content, for example, the copper content can be greater than or equal to 99.9%, the equipment investment cost is relatively low, and the production cost is reduced. No toxic and harmful products are generated in the vacuum coating process, which is beneficial to solving the environmental protection problem in the porous metal manufacturing process.
Embodiments of the present application also provide a porous metal prepared by the porous metal preparation method described in the above embodiments.
Although the present application has been described in detail with reference to the preferred embodiments, it will be understood by those skilled in the art that various changes may be made and equivalents may be substituted without departing from the spirit and scope of the present application.
Claims (6)
1. A porous metal preparation method is characterized by comprising the following steps:
preparing a base material with specified porosity, wherein the base material comprises a non-toxic high-temperature decomposable foam material, the base material is transferred to a first coating chamber, the first coating chamber carries out primary vacuum coating on the base material, and a porous base layer is deposited on the surface of the base material to form a first process product;
the first process product is transferred to a second coating chamber, the second coating chamber carries out secondary vacuum coating on the first process product, a porous reinforced layer is deposited on the surface of the porous base layer, the base material is burnt off, the porous reinforced layer coats the porous base layer to form a second process product, the secondary vacuum coating mode comprises arc discharge vacuum coating, and a power supply of the second coating chamber is a constant current direct current power supply;
the second process product is transferred to a third film coating chamber, the third film coating chamber carries out three-stage vacuum film coating on the second process product, a porous covering layer is deposited on the surface of the porous reinforcing layer, and the porous covering layer covers the porous reinforcing layer to form a porous metal product; the primary vacuum coating mode comprises multi-arc ion vacuum coating, a power supply of the first coating chamber is a constant-current direct-current power supply, the working current of the first coating chamber is 50-80A, and the coating time of the primary vacuum coating is 5-20min; the working current of the second coating chamber is 100-155A, and the coating time of the secondary vacuum coating is 10-35 min; the working temperature of the second coating chamber is 450-600 ℃; the three-stage vacuum coating mode comprises glow discharge vacuum coating, the power supply of the third coating chamber is a constant-voltage direct-current power supply, the working current of the third coating chamber is 8-25A, and the coating time of the three-stage vacuum coating is 15-30 min.
2. The porous metal preparation method of claim 1, wherein the diameter of the metal particles generated in the tertiary vacuum coating process is smaller than the diameter of the metal particles generated in the secondary vacuum coating process.
3. The porous metal preparation method of claim 1, further comprising the step of:
and carrying out aging heat treatment on the porous metal product.
4. The method of claim 1, wherein the substrate has a porosity of 94% or greater.
5. A porous metal manufacturing apparatus characterized in that the porous metal manufacturing method according to any one of claims 1 to 4 is applied to the porous metal manufacturing apparatus, and the porous metal manufacturing apparatus comprises a charging chamber, a transfer chamber, a first coating chamber, a second coating chamber, a third coating chamber, a storage chamber and a discharging chamber which are arranged in sequence; the charging chamber is used for loading a substrate to be used; the transfer chamber is connected with the first coating chamber and is used for temporarily storing the base material and transferring the base material to the first coating chamber; the first coating chamber is used for carrying out primary coating on the base material to form a first process product; the second film coating chamber is used for carrying out secondary film coating on the first process product to form a second process product; the third coating chamber is used for carrying out three-stage coating on the second process product to form a porous metal product; the storage chamber is used for carrying out heat treatment on the porous metal product; and the discharge chamber is used for storing the porous metal product after the heat treatment is finished.
6. A porous metal produced by the method for producing a porous metal according to any one of claims 1 to 4.
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| JPH08165590A (en) * | 1994-12-14 | 1996-06-25 | Shin Etsu Chem Co Ltd | Production of porous metal |
| CN1147030A (en) * | 1996-06-18 | 1997-04-09 | 武汉市三合实业公司 | Foam metal copper and its producing technique |
| US6605316B1 (en) * | 1999-07-31 | 2003-08-12 | The Regents Of The University Of California | Structures and fabrication techniques for solid state electrochemical devices |
| CN1155734C (en) * | 2002-05-27 | 2004-06-30 | 长沙力元新材料股份有限公司 | Process and apparatus for preparing porous metal by combined physical gas-phase deposition techinque |
| CN101184862B (en) * | 2005-05-30 | 2011-06-29 | 格里洛股份公司 | Porous metal foam body |
| CN101396661B (en) * | 2007-09-26 | 2010-06-23 | 中国科学院金属研究所 | High aperture-ratio foam manganese dioxide catalyst material and preparation method and use thereof |
| JP5342946B2 (en) * | 2008-07-03 | 2013-11-13 | 日本碍子株式会社 | Ceramic structure and manufacturing method thereof |
| CN102212791A (en) * | 2011-06-02 | 2011-10-12 | 爱蓝天高新技术材料(大连)有限公司 | Equipment and method for performing magnetron-controlled sputter coating on polyester type polyurethane foam matrix |
| CN102383088B (en) * | 2011-10-20 | 2016-03-09 | 中国第一汽车股份有限公司 | Calcination process for foam metal carrier |
| JP6055379B2 (en) * | 2013-06-27 | 2016-12-27 | 住友電気工業株式会社 | Porous metal body, method for producing porous metal body, and fuel cell |
| EP3287206B1 (en) * | 2015-04-24 | 2023-08-16 | Sumitomo Electric Industries, Ltd. | Composite material and method for producing same |
| EP3333948B1 (en) * | 2015-08-07 | 2021-02-17 | Sumitomo Electric Industries, Ltd. | Metallic porous body, fuel cell, and method for manufacturing metallic porous body |
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| CN112310367A (en) * | 2020-10-09 | 2021-02-02 | 上海交通大学 | Ultrathin porous metal material for lithium battery electrode and preparation method and application thereof |
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